JP4751297B2 - Manufacturing method of glass substrate having convex portions and glass substrate having convex portions - Google Patents
Manufacturing method of glass substrate having convex portions and glass substrate having convex portions Download PDFInfo
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Description
本発明は、表面に凸部を有するガラス基板の製造方法に関し、詳しくは、ガラス基板の表面に圧縮応力部を形成し、圧縮応力部と圧縮応力部以外の領域とのエッチングレートの差を利用して凸部を形成するガラス基板の製造方法に関する。 The present invention relates to a method for producing a glass substrate having a convex portion on the surface, and more specifically, a compressive stress portion is formed on the surface of the glass substrate, and a difference in etching rate between the compressive stress portion and a region other than the compressive stress portion is used. And a method of manufacturing a glass substrate for forming a convex portion.
近年では、磁気記録媒体用基板、光学素子等において、表面に微小な凹凸を有するガラス材料が用いられており、表面が高精密に加工されたガラス材料の製造技術が高い注目を集めている。これまでに、本出願人は、特開２００２−１６０９４３号公報などに、表面に凹凸を有するガラス基材の製造方法を提案してきた。 In recent years, glass materials having minute irregularities on the surface thereof are used for substrates for magnetic recording media, optical elements, and the like, and the manufacturing technology of glass materials whose surfaces are processed with high precision has attracted high attention. So far, the present applicant has proposed a method for producing a glass substrate having irregularities on the surface thereof in Japanese Patent Application Laid-Open No. 2002-160943.
特開２００２−１６０９４３号公報に記載の方法は、応力を印加（押圧）することにより、ガラスの表面に高密度化された圧縮応力部を形成し、圧縮応力部のエッチングレートが圧縮応力部以外の領域に比べて低下する現象を利用してガラスの表面に凸部を形成するものである。当該方法は、押圧した後、エッチングするだけという単純なプロセスで微細加工が可能であり、フォトマスクを使用することなく任意のパターンを形成できるといった利点がある。
しかしながら、上記従来方法では以下の課題が残されていた。 However, the following problems remain in the conventional method.
表面が高精密に加工されたガラス材料に関しては、段差を有する凸部、高さの異なる凸部といった、高さの異なる隆起のある表面形状が求められる場合がある。しかし、上記特開２００２−１６０９４３号公報の開示では、高さの異なる隆起のある表面形状を有するガラス基板を作製するまでに至っていない。 With respect to a glass material whose surface is processed with high precision, there may be a demand for surface shapes with ridges having different heights such as convex portions having steps and convex portions having different heights. However, in the disclosure of the above-mentioned Japanese Patent Application Laid-Open No. 2002-160943, a glass substrate having surface shapes with ridges having different heights has not been produced.
本発明は、このような従来技術の問題点に着目してなされたもので、その目的は、押圧とエッチングによるガラス表面の凹凸形成方法を改良し、段差を有する凸部、高さの異なる凸部といった、高さの異なる隆起のある表面形状を有するガラス基板の製造方法を提供することにある。 The present invention has been made paying attention to such problems of the prior art, and its purpose is to improve the method of forming irregularities on the glass surface by pressing and etching, and to provide convex portions having steps and convex portions having different heights. An object of the present invention is to provide a method for manufacturing a glass substrate having a surface shape with raised portions having different heights, such as a portion.
本発明は、ガラス基板の表面の所定領域を押圧して第１圧縮応力部を形成し、前記第１圧縮応力部の少なくとも一部が残留するように前記表面をエッチングして、前記表面に凸部を形成する工程と、前記凸部の頂部を研磨して残留した第１圧縮応力部を除去し、前記凸部の頂部の一部を押圧して第２圧縮応力部を形成し、前記表面をエッチングして、前記凸部の側部に段差部を形成する工程とを実施する、凸部を有するガラス基板の製造方法である。 According to the present invention, a predetermined region on the surface of the glass substrate is pressed to form a first compressive stress portion, the surface is etched so that at least a part of the first compressive stress portion remains, and the surface is convex. Forming a second portion, removing the remaining first compressive stress portion by polishing the top portion of the convex portion, pressing a part of the top portion of the convex portion to form a second compressive stress portion, and And a step of forming a stepped portion on the side portion of the convex portion, and a method of manufacturing a glass substrate having a convex portion .
本発明の製造方法によれば、フォトマスクを使用することなく、押圧およびエッチング、または押圧、エッチング、および研磨という単純なプロセスによって、表面に段差を有する凸部のある、または高さの異なる凸部のあるガラス基板を製造することができる。 According to the manufacturing method of the present invention, without using a photomask, protrusions having steps or different heights on the surface are formed by a simple process of pressing and etching, or pressing, etching, and polishing. A glass substrate with a part can be manufactured.
図１は、本発明に係るガラス基板の製造方法の工程を示すフロー図である。Ａに示す例は、本発明の第１の実施態様の例であり、ガラス基板の表面の押圧による第１圧縮応力部の形成、エッチングによる第１凸部の形成、第１凸部のサイド（第１凸部以外のガラス基板の表面の、第１凸部に隣接する第２領域）を押圧することによる第２圧縮応力部の形成、エッチングによる段差を有する凸部の形成、という工程を含む。Ｂに示す例は、本発明の第２の実施態様の例であり、ガラス基板の表面の押圧による第１圧縮応力部の形成、エッチングによる凸部の形成、研磨による凸部の頂部に残留する第１圧縮応力部の除去、凸部の頂部の押圧による第２圧縮応力部の形成、エッチングによる段差を有する凸部の形成、という工程を含む。ＡとＢのプロセスの違いは、段差を有する凸部を形成する手法の差である。 FIG. 1 is a flowchart showing the steps of a method for producing a glass substrate according to the present invention. The example shown in A is an example of the first embodiment of the present invention. The first compressive stress part is formed by pressing the surface of the glass substrate, the first convex part is formed by etching, the side of the first convex part ( Including a step of forming a second compressive stress part by pressing a second region adjacent to the first convex part on the surface of the glass substrate other than the first convex part, and forming a convex part having a step by etching. . The example shown in B is an example of the second embodiment of the present invention. The first compressive stress part is formed by pressing the surface of the glass substrate, the convex part is formed by etching, and remains on the top part of the convex part by polishing. It includes steps of removing the first compressive stress portion, forming a second compressive stress portion by pressing the top of the convex portion, and forming a convex portion having a step by etching. The difference between the processes of A and B is the difference in the method of forming a convex part having a step.
本発明において、圧縮応力部とは、押圧により高密度化された領域であって、所定のエッチングにおいて、エッチングレートが、押圧されていない領域（すなわち、圧縮応力部以外の領域。以下、非圧縮応力部ともいう。）のエッチングレートよりも低くなる程度にまで高密度化された領域をいう。本発明において、非圧縮応力部は、押圧されていない領域であるが、圧縮応力部とのエッチングレートの差がなくならない程度に弱く圧力が印加されてあってもかまわない。 In the present invention, the compressive stress portion is a region that has been densified by pressing, and is a region where the etching rate is not pressed in a predetermined etching (that is, a region other than the compressive stress portion. (It is also referred to as a stress portion.) A region that has been densified to an extent that is lower than the etching rate. In the present invention, the non-compressive stress portion is a non-pressed region, but the pressure may be applied so weak that the difference in etching rate from the compressive stress portion is not lost.
本発明の製造方法に使用されるガラス基板は、圧縮応力部と非圧縮応力部とでエッチングレートに差が出るものであれば、いかなる組成のものでもよい。例示すると、アルミノシリケート系ガラス、ホウ珪酸系ガラス、無アルカリガラス、石英ガラスなどがある。 The glass substrate used in the production method of the present invention may have any composition as long as the etching rate differs between the compressive stress portion and the non-compressive stress portion. Illustrative examples include aluminosilicate glass, borosilicate glass, alkali-free glass, and quartz glass.
本発明において、ガラス基板の好ましいガラス組成は、以下の通りである：
ＳｉＯ2：５５mol％〜７２mol％、
Ａｌ2Ｏ3：１mol％〜１２．５mol％、
アルカリ土類金属酸化物（例、ＭｇＯ、ＣａＯ、ＳｒＯおよびＢａＯ）：総計で２mol％〜１６mol％、
Ｌｉ2Ｏ：５mol％〜２０mol％、
Ｎａ2Ｏ：１２mol％以下。
In the present invention, the preferred glass composition of the glass substrate is as follows:
SiO 2 : 55 mol% to 72 mol%
Al 2 O 3: 1mol% ~12.5mol %,
Alkaline earth metal oxides (eg, MgO, CaO, SrO and BaO): 2 mol% to 16 mol% in total,
Li 2 O: 5 mol% to 20 mol%,
Na 2 O: 12 mol% or less.
上記ガラス基板は、表面の平滑性および平坦性の向上、または火造り面の除去などを目的とした前処理がなされたものを使用することが好ましい。当該前処理には、酸化セリウム系研磨剤による研磨が、研磨レートが高く経済性にも優れることから好適である。酸化セリウム系研磨剤による研磨について、当該研磨の後の洗浄方法は、特に限定はなく、公知の手法を用いることができ、例えば、１質量％ＫＯＨなどの強アルカリ性の薬液を用いて洗浄すればよい。また、ビルダーなどの洗剤成分を添加してもよい。 It is preferable to use the glass substrate that has been subjected to pretreatment for the purpose of improving the smoothness and flatness of the surface or removing the fired surface. For the pretreatment, polishing with a cerium oxide-based abrasive is preferable because of its high polishing rate and excellent economy. Regarding the polishing with the cerium oxide-based abrasive, the cleaning method after the polishing is not particularly limited, and a known method can be used. For example, if cleaning is performed using a strong alkaline chemical such as 1% by mass KOH. Good. Moreover, you may add detergent components, such as a builder.
本発明の製造方法の第１の実施態様の最初の工程では、まずガラス基板の表面の所定領域（第１領域）を押圧して第１圧縮応力部を形成する。ここで、押圧する第１領域は、段差を有する凸部の最も高さの大きい部分、または最も高さの大きい凸部を形成させる領域である。 In the first step of the first embodiment of the production method of the present invention, first, a predetermined region (first region) on the surface of the glass substrate is pressed to form a first compressive stress portion. Here, the 1st area | region to press is an area | region which forms the largest height part of the convex part which has a level | step difference, or the convex part with the highest height.
ガラス基板の表面の第１領域の押圧は、任意の手法を用いて行うことができる。典型的には、例えば、図２（ａ）に示すように、ガラス基板１０の表面の所定領域を、圧子１１を回転させながら圧力を印加しつつ掃引することにより押圧する手法がある（図２（ａ）、（ｃ）および図３（ａ）、（ｄ）の矢印は押圧することを示す。）。圧子１１は、例えば、ダイアモンド；炭化タングステン（ＷＣ）および炭化ケイ素（ＳｉＣ）などの超硬合金；または立方晶窒化ホウ素（ｃＢＮ）などからなる。 The pressing of the first region on the surface of the glass substrate can be performed using any method. Typically, for example, as shown in FIG. 2A, there is a method of pressing a predetermined region on the surface of the glass substrate 10 by sweeping while applying pressure while rotating the indenter 11 (FIG. 2). (A), (c) and the arrows in FIGS. 3 (a), 3 (d) indicate pressing. The indenter 11 is made of, for example, diamond; cemented carbide such as tungsten carbide (WC) and silicon carbide (SiC); or cubic boron nitride (cBN).
上記のようにして第１圧縮応力部１２が形成された、ガラス基板の凹凸が形成される表面を、第１圧縮応力部１２の少なくとも一部が残留するようにエッチングして凸部１３を形成する（図２（ｂ））。 The convex surface 13 is formed by etching the surface of the glass substrate on which the first compressive stress portion 12 is formed as described above so that at least part of the first compressive stress portion 12 remains. (FIG. 2B).
第１圧縮応力部１２の少なくとも一部が残留するように前記表面をエッチングするには、圧縮応力部のエッチングレートが、非圧縮応力部のエッチングレートよりも低くなる条件でエッチングを行えばよい。そのようなエッチングは、例えば、化学的エッチングにおいては、エッチング液にフッ化水素酸を用いればよい。フッ化水素酸の濃度は、０．０１〜１．０質量％程度でよく、また、エッチング液には、ｐＨ調整剤（フッ化アンモニウム等）、強酸（硫酸等）、キレート剤（ＥＤＴＡ等）などが添加されていてもよい。なお、ガラス基板が石英ガラスであった場合には、フッ化水素酸の濃度は高めに設定するのがよい。 In order to etch the surface so that at least a part of the first compressive stress portion 12 remains, the etching may be performed under the condition that the etching rate of the compressive stress portion is lower than the etching rate of the non-compressive stress portion. For such etching, for example, in chemical etching, hydrofluoric acid may be used as an etchant. The concentration of hydrofluoric acid may be about 0.01 to 1.0% by mass, and the etching solution includes a pH adjuster (such as ammonium fluoride), a strong acid (such as sulfuric acid), and a chelating agent (such as EDTA). Etc. may be added. When the glass substrate is quartz glass, the concentration of hydrofluoric acid is preferably set high.
以上のようにして最初の工程を実施することにより、ガラス基板の表面に第１凸部が形成される。次に、本発明の製造方法の第１の実施態様では、前記第１凸部以外の前記表面の第２領域を押圧して第２圧縮応力部を形成し、前記表面をエッチングして、前記第１凸部の側部に段差部を形成する、または前記第１凸部から離間した第２凸部を前記表面に形成する工程が行われる。 By performing the first step as described above, the first convex portion is formed on the surface of the glass substrate. Next, in the first embodiment of the manufacturing method of the present invention, the second region of the surface other than the first convex portion is pressed to form a second compressive stress portion, the surface is etched, A step of forming a stepped portion on the side of the first convex portion or forming a second convex portion spaced from the first convex portion on the surface is performed.
まず、前記第１凸部以外のガラス基板の表面の所定領域（第２領域）が押圧されるが、ここで、第２領域は、第１凸部以外のガラス基板の表面の一部であって、凸部の側部の段差部を、または第１凸部より低い高さの第２凸部を形成させる領域である。第２領域を、第１凸部に隣接する領域とすれば、段差を有する凸部を形成することができ、第２領域を第１凸部に隣接していない領域とすれば、第１凸部から離間した、第１凸部と異なる高さの第２凸部を形成することができる。 First, a predetermined region (second region) on the surface of the glass substrate other than the first convex portion is pressed. Here, the second region is a part of the surface of the glass substrate other than the first convex portion. Thus, the step portion on the side of the convex portion or the second convex portion having a height lower than that of the first convex portion is formed. If the second region is a region adjacent to the first convex portion, a convex portion having a step can be formed, and if the second region is a region not adjacent to the first convex portion, the first convex portion is formed. The 2nd convex part of the height different from the 1st convex part spaced apart from the part can be formed.
第２領域を押圧する手法は、上記と同様であり、当該押圧により、第２圧縮応力部１４が形成される（図２（ｃ））。 The method of pressing the second region is the same as described above, and the second compressive stress portion 14 is formed by the pressing (FIG. 2C).
次に、ガラス基板の表面をエッチングするが、当該手法も上記と同様である。当該エッチングにより、第１凸部の側部に段差部が、または第１凸部から離間した第２凸部が形成される。図２は、第２領域を、第１凸部のサイド（第１凸部１３に隣接する領域）にした場合であり、段差を有する凸部１５が形成されている（図２（ｄ））。 Next, the surface of the glass substrate is etched, and the method is the same as described above. By the etching, a stepped portion is formed on the side of the first convex portion, or a second convex portion separated from the first convex portion is formed. FIG. 2 shows a case where the second region is the side of the first convex portion (region adjacent to the first convex portion 13), and a convex portion 15 having a step is formed (FIG. 2D). .
このようにしてガラス基板の表面に段差を有する凸部（２段の段差を有する凸部）または、高さの異なる凸部（２種の高さの凸部）を形成することができるが、３段以上の段差を有する凸部、または３種以上の高さの凸部を形成したい場合には、圧縮応力部が凸部に残留するようにしておき、上述の、前記第１凸部の側部に段差部を形成する、または前記第１凸部から離間した第２凸部を前記表面に形成する工程と同様の工程（凸部以外の前記表面の所定領域を押圧して新たに圧縮応力部を形成し、前記表面をエッチングする工程）を、必要な回数実施すればよい。 In this way, a convex portion having a step (a convex portion having two steps) or a convex portion having different heights (two types of convex portions) can be formed on the surface of the glass substrate. When it is desired to form a convex portion having three or more steps or a convex portion having three or more heights, the compressive stress portion remains on the convex portion, and the above-described first convex portion A step similar to the step of forming a stepped portion on the side portion or forming a second convex portion separated from the first convex portion on the surface (pressing a predetermined region on the surface other than the convex portion to newly compress the surface. The step of forming the stress portion and etching the surface) may be performed as many times as necessary.
以上説明したように、本発明の製造方法の第１の実施態様によれば、フォトマスクを使用することなく、押圧およびエッチングという単純なプロセスによって、表面に２段の段差（さらには３段以上の段差）を有する凸部が形成されたガラス基板、または表面に高さの異なる（２種さらには３種以上の高さの）凸部が形成されたガラス基板を製造することができる。さらに、一部の凸部のみが段差を有し、高さの異なる凸部がいくつも形成されているような表面凹凸形状を有するガラス基板も容易に製造可能であり、ガラス基板の表面形状の設計の自由度が高い。 As described above, according to the first embodiment of the manufacturing method of the present invention, two steps (or three or more steps) are formed on the surface by a simple process of pressing and etching without using a photomask. Or a glass substrate having convex portions with different heights (two or three or more heights) formed on the surface. Furthermore, it is possible to easily manufacture a glass substrate having a surface irregularity shape in which only some of the convex portions have steps and a number of convex portions having different heights are formed. High degree of design freedom.
次に本発明の製造方法の第２の実施態様について説明する。第２の実施態様では、まず、上記した第１の実施態様の最初の工程と同様の工程が行われる。すなわち、例えば、図３に示すように、上記と同様にして圧子２１を用いて押圧を行い、ガラス基板２０の表面に第１圧縮応力部２２を形成する（図３（ａ））。その後、ガラス基板２０の表面を、第１圧縮応力部２２の少なくとも一部が残留するようにエッチングして凸部２３を形成する（図３（ｂ））。 Next, a second embodiment of the production method of the present invention will be described. In the second embodiment, first, the same process as the first process of the first embodiment described above is performed. That is, for example, as shown in FIG. 3, the first compressive stress portion 22 is formed on the surface of the glass substrate 20 by pressing using the indenter 21 in the same manner as described above (FIG. 3A). Thereafter, the surface of the glass substrate 20 is etched so that at least a part of the first compressive stress portion 22 remains, thereby forming a convex portion 23 (FIG. 3B).
次に、前記凸部の頂部を研磨して残留した第１圧縮応力部を除去し、前記凸部の頂部の一部を押圧して第２圧縮応力部を形成し、前記表面をエッチングして、前記凸部の側部に段差部を形成する工程が行われる。 Next, the top portion of the convex portion is polished to remove the remaining first compressive stress portion, a part of the top portion of the convex portion is pressed to form a second compressive stress portion, and the surface is etched. Then, a step of forming a stepped portion on the side of the convex portion is performed.
まず、凸部２３の頂部に残留する圧縮応力部２２を研磨により除去するが（図３（ｃ））、この際、圧縮応力部２２の除去は、圧縮応力部２２の下の非圧縮応力部が露出するまで行い、また、ガラス基板の表面に凸形状が残るように行う。当該研磨において、研磨剤には特に限定はなく、公知の研磨剤を用いることができる。例えば、コロイダルシリカ系の研磨剤を用いることができる。当該研磨による圧縮応力部の除去によって、図３（ｃ）に示すように、頂部に圧縮応力部のない凸部２４が形成される。 First, the compressive stress portion 22 remaining on the top of the convex portion 23 is removed by polishing (FIG. 3C). At this time, the compressive stress portion 22 is removed by an uncompressed stress portion below the compressive stress portion 22. Until the surface of the glass substrate remains convex. In the said grinding | polishing, there is no limitation in particular in an abrasive | polishing agent, A well-known abrasive | polishing agent can be used. For example, a colloidal silica-based abrasive can be used. By removing the compressive stress portion by the polishing, a convex portion 24 having no compressive stress portion is formed on the top as shown in FIG.
次に、凸部２４の頂部の一部（凸部２４の頂部に露出した非圧縮応力部の表面の一部の領域）を押圧して第２圧縮応力部２５を形成する（図３（ｄ））。本発明の第１の実施態様では、第２圧縮応力部は、第１凸部以外の領域に設けられ、第１圧縮応力部が、凸部の最も高さの大きい部分に変わるが、本発明の第２の実施態様では、第２圧縮応力部は、第１圧縮応力部が設けられていた領域の下に設けられ、第２圧縮応力部が、凸部の最も高さの大きい部分に変わる。従って、ここで、押圧する領域は、段差を有する凸部の頂部となる領域である。 Next, a part of the top part of the convex part 24 (a part of the surface of the non-compressive stress part exposed at the top part of the convex part 24) is pressed to form the second compressive stress part 25 (FIG. 3D). )). In the first embodiment of the present invention, the second compressive stress portion is provided in a region other than the first convex portion, and the first compressive stress portion is changed to a portion having the largest height of the convex portion. In the second embodiment, the second compressive stress portion is provided below the region where the first compressive stress portion was provided, and the second compressive stress portion is changed to a portion having the largest height of the convex portion. . Therefore, here, the area to be pressed is an area that becomes the top of the convex part having a step.
押圧は、上記と同様の手法で行えばよく、これにより、凸部２４の頂部より幅の細い第２圧縮応力部２５が形成される。その後、上記と同様の手法により、ガラス基板の表面をエッチングする（図３（ｅ））。ここで、第１圧縮応力部が形成されなかった領域および、第１圧縮応力部の下にあって、第２圧縮応力部が形成されなかった領域が優先的にエッチングされる。 The pressing may be performed by the same method as described above, whereby the second compressive stress portion 25 narrower than the top of the convex portion 24 is formed. Thereafter, the surface of the glass substrate is etched by the same method as described above (FIG. 3E). Here, a region where the first compressive stress portion is not formed and a region under the first compressive stress portion where the second compressive stress portion is not formed are preferentially etched.
このようにして、図３（ｅ）に示すような２段の段差（段差を有する凸部２６）を形成することができる。３段以上の段差を形成したい場合には、段差を有する凸部の頂部に圧縮応力部が残留するようにエッチングしておき、上述の、凸部の側部に段差部を形成する工程と同様の工程（段差を有する凸部の頂部を研磨して残留した圧縮応力部を除去し、凸部の頂部の一部を押圧して新たな圧縮応力部を形成し、ガラス基板の表面をエッチングする工程）を、必要な回数実施すればよい。 In this way, a two-step difference (a convex portion 26 having a step) as shown in FIG. 3E can be formed. When it is desired to form three or more steps, etching is performed so that the compressive stress portion remains on the top of the convex portion having the step, and the same step as the above-described step of forming the step portion on the side of the convex portion. Step (polishing the top of the convex part having a step to remove the remaining compressive stress part, pressing a part of the top part of the convex part to form a new compressive stress part, and etching the surface of the glass substrate Step) may be performed as many times as necessary.
以上説明したように、本発明の製造方法の第２の実施態様によれば、フォトマスクを使用することなく、押圧、エッチング、および研磨という単純なプロセスによって、表面に段差を有する凸部のあるガラス基板を製造することができる。 As described above, according to the second embodiment of the manufacturing method of the present invention, there is a convex portion having a step on the surface by a simple process of pressing, etching, and polishing without using a photomask. A glass substrate can be manufactured.
以下、実施例により本発明をより詳細に説明する。 Hereinafter, the present invention will be described in more detail with reference to examples.
実施例１
ＳｉＯ2：６４．７ｍｏｌ％、Ａｌ2Ｏ3：１０．２ｍｏｌ％、Ｎａ2Ｏ：１０．６ｍｏｌ％、Ｌｉ2Ｏ：７．５ｍｏｌ％、ＣａＯ：４．０ｍｏｌ％、ＭｇＯ：２．８ｍｏｌ％、Ｋ2Ｏ：０．２ｍｏｌ％という組成を有するガラス基板を使用した。このガラス基板の表面の平滑性を向上させるべく、表面を片面研磨機により酸化セリウム系研磨剤で研磨した後、研磨剤を除去するために洗浄を行った。
Example 1
SiO 2: 64.7mol%, Al 2 O 3: 10.2mol%, Na 2 O: 10.6mol%, Li 2 O: 7.5mol%, CaO: 4.0mol%, MgO: 2.8mol%, A glass substrate having a composition of K 2 O: 0.2 mol% was used. In order to improve the smoothness of the surface of the glass substrate, the surface was polished with a cerium oxide-based abrasive with a single-side polishing machine, and then washed to remove the abrasive.
このガラス基板の表面の所定領域を、先端Ｒが１．０ｍｍのｃＢＮ製圧子を用い、当該圧子を５０回転／秒（3,000rpm）の速度で回転させつつ、約１００ｇｆ（０．９８Ｎ）の荷重を加えながらＸＹステージを用いて所定方向に掃引して押圧し、圧縮応力部を形成させた。その後、このガラス基板を４０℃の０．１質量％フッ酸水溶液に４０分間浸漬してエッチングし、凸部を形成した。次に、該凸部のサイドに、再び先端Ｒが１．０ｍｍのｃＢＮ製圧子を用い、当該圧子を５０回転／秒（3,000rpm）の速度で回転させつつ、約１００ｇｆ（０．９８Ｎ）の荷重を加えながら、該凸部と平行するように押圧を行った。その後、このガラス基板を４０℃の０．１質量％フッ酸水溶液に４０分間浸漬してエッチングし、試験片を作製した。 Using a cBN indenter having a tip R of 1.0 mm, a predetermined area on the surface of the glass substrate, and rotating the indenter at a speed of 50 revolutions / second (3,000 rpm), a load of about 100 gf (0.98 N) While compressing, a XY stage was used to sweep and press in a predetermined direction to form a compressive stress portion. Then, this glass substrate was etched by being immersed in a 0.1% by mass hydrofluoric acid aqueous solution at 40 ° C. for 40 minutes to form convex portions. Next, a cBN indenter having a tip R of 1.0 mm is again used on the side of the convex portion, and the indenter is rotated at a speed of 50 revolutions / second (3,000 rpm), and about 100 gf (0.98 N). While applying a load, pressing was performed in parallel with the convex portion. Then, this glass substrate was immersed in a 0.1% by mass hydrofluoric acid aqueous solution at 40 ° C. for 40 minutes and etched to prepare a test piece.
試験片に形成された凸部形状を、走査電子顕微鏡（ＳＥＭ）および三次元形状測定機（三鷹光器社製ＮＨ−３）で観察した。図４にＳＥＭ写真を、図５に三次元形状測定機で測定した凸部形状の断面プロファイルを示した。これらの結果より、高さが４μｍと２μｍの２段の段差があるガラス基板を製造できたことが確認できた。 The convex shape formed on the test piece was observed with a scanning electron microscope (SEM) and a three-dimensional shape measuring instrument (NH-3 manufactured by Mitaka Kogyo Co., Ltd.). FIG. 4 shows an SEM photograph, and FIG. 5 shows a cross-sectional profile of a convex shape measured by a three-dimensional shape measuring machine. From these results, it was confirmed that a glass substrate having two steps with a height of 4 μm and 2 μm could be manufactured.
実施例２
ＳｉＯ2：６３．４ｍｏｌ％、Ａｌ2Ｏ3：１１．５ｍｏｌ％、Ｎａ2Ｏ：１０．６ｍｏｌ％、Ｌｉ2Ｏ：７．５ｍｏｌ％、ＣａＯ：４．０ｍｏｌ％、ＭｇＯ：２．８ｍｏｌ％、Ｋ2Ｏ：０．２ｍｏｌ％という組成を有するガラス基板を使用し、実施例１と同様にして前処理を行った。
Example 2
SiO 2: 63.4mol%, Al 2 O 3: 11.5mol%, Na 2 O: 10.6mol%, Li 2 O: 7.5mol%, CaO: 4.0mol%, MgO: 2.8mol%, A glass substrate having a composition of K 2 O: 0.2 mol% was used, and pretreatment was performed in the same manner as in Example 1.
圧縮応力部を形成させるまでのプロセスを、実施例１と同様にして行った後、このガラス基板を、４０℃に保持した０．１質量％フッ酸水溶液に４０分間浸漬してエッチングし、凸部を形成した。該凸部の頂部に残留する圧縮応力部を除去すべく、凸部上層を片面研磨機によりコロイダルシリカで研磨して除去した後、研磨剤を除去するために洗浄を行った。次いで、凸部の頂部の一部である所定領域を、先端Ｒが１．０ｍｍのｃＢＮ製圧子を用い、当該圧子を５０回転／秒（3,000rpm）の速度で回転させつつ、約１００ｇｆ（０．９８Ｎ）の荷重を加えながらＸＹステージを用いて所定方向に掃引して押圧し、圧縮応力部を形成させた。その後このガラス基板を、４０℃に保持した０．１質量％フッ酸水溶液に４０分間浸漬してエッチングし、試験片を作製した。 After the process up to the formation of the compressive stress portion was performed in the same manner as in Example 1, this glass substrate was etched by being immersed in a 0.1% by mass hydrofluoric acid aqueous solution maintained at 40 ° C. for 40 minutes. Part was formed. In order to remove the compressive stress portion remaining on the top of the convex portion, the upper portion of the convex portion was removed by polishing with colloidal silica using a single-side polishing machine, and then washed to remove the abrasive. Next, a predetermined region, which is a part of the top of the convex portion, is moved to about 100 gf (0) while rotating the indenter at a speed of 50 revolutions / second (3,000 rpm) using a cBN indenter having a tip R of 1.0 mm. A compressive stress portion was formed by sweeping and pressing in a predetermined direction using an XY stage while applying a load of .98N). Thereafter, the glass substrate was etched by being immersed in a 0.1% by mass hydrofluoric acid aqueous solution maintained at 40 ° C. for 40 minutes to produce a test piece.
試験片に形成された凸部形状を、ＳＥＭおよび三次元形状測定機（三鷹光器社製ＮＨ−３）で観察した。図６にＳＥＭ写真を、図７に三次元形状測定機で測定した凸部形状の断面プロファイルを示した。これらの結果より、表面に高さが４０μｍと２０μｍの２段の段差を有するガラス基板を製造できたことが確認できた。 The convex shape formed on the test piece was observed with an SEM and a three-dimensional shape measuring instrument (NH-3 manufactured by Mitaka Kogyo Co., Ltd.). FIG. 6 shows an SEM photograph, and FIG. 7 shows a sectional profile of the convex shape measured by a three-dimensional shape measuring machine. From these results, it was confirmed that a glass substrate having two steps with a height of 40 μm and 20 μm on the surface could be produced.
なお、本発明の技術範囲は、これら実施例に限定されるものではなく、本発明の趣旨を逸脱しない範囲において種々の変更を加えることも可能である。 The technical scope of the present invention is not limited to these examples, and various modifications can be made without departing from the spirit of the present invention.
前記各実施例では、圧子の先端を１．０ｍｍのＲのものとしたが、Ｒはこれらに限られるものではなく、先端の形状は、角錐、円錐、ドリル状に変えても構わない。圧子はｃＢＮ製としたが、これに限られるものではない。また、圧子のｃＢＮの部分は、少なくともガラス基板の表面と接触する部分がｃＢＮ製であればよい。さらに、圧子を回転させながら掃引を行ったが、圧子を回転させることなく掃引を行ってもよい。 In each of the above-described embodiments, the tip of the indenter has a radius of 1.0 mm, but R is not limited thereto, and the shape of the tip may be changed to a pyramid, a cone, or a drill. The indenter is made of cBN, but is not limited to this. Further, the cBN portion of the indenter only needs to be made of cBN at least at the portion in contact with the surface of the glass substrate. Further, although the sweep is performed while rotating the indenter, the sweep may be performed without rotating the indenter.
本発明の製造方法は、表面に凸部を有するガラス基板の製造方法として有用であり、当該製造方法で得られたガラス基板は、磁気記録媒体用基板、光学素子等の用途において有用である。 The production method of the present invention is useful as a production method of a glass substrate having a convex portion on the surface, and the glass substrate obtained by the production method is useful in applications such as a magnetic recording medium substrate and an optical element.
１０、２０ ガラス基板
１１、２１ 圧子
１２、１４、２２、２５ 圧縮応力部
１３、１５、２３、２６ 凸部
10, 20 Glass substrate 11, 21 Indenter 12, 14, 22, 25 Compressive stress part 13, 15, 23, 26 Convex part
Claims (1)
前記凸部の頂部を研磨して残留した第１圧縮応力部を除去し、前記凸部の頂部の一部を押圧して第２圧縮応力部を形成し、前記表面をエッチングして、前記凸部の側部に段差部を形成する工程とを実施する、凸部を有するガラス基板の製造方法。 A predetermined region on the surface of the glass substrate is pressed to form a first compressive stress portion, and the surface is etched so that at least a part of the first compressive stress portion remains, thereby forming a convex portion on the surface. Process,
Polishing the top of the convex part to remove the remaining first compressive stress part, pressing a part of the top part of the convex part to form a second compressive stress part, etching the surface, The manufacturing method of the glass substrate which has a convex part which implements the process of forming a level | step-difference part in the side part of a part.
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