JP4739575B2 - Sample preparation equipment for metal component analysis - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention enables analysis of metal components in a gas analyzer or the like by subjecting a sample (sample) for analysis of metal components obtained during steel making to a surface treatment with arc plasma in a vacuum state. The present invention relates to an apparatus for preparing a sample for analyzing an in-metal component.
[0002]
[Prior art]
In general, samples taken from molten steel during steelmaking etc. are processed (adjusted) into a sample that has been subjected to a clean surface treatment with a size and shape suitable for the metal component analysis equipment of various analytical methods. After analyzing the components with a gas analyzer or the like, necessary products such as deoxygenation treatment are performed in the steel making process based on the analysis results, thereby producing a product of a predetermined quality.
Conventionally, in the preparation of the sample as described above, the sample taken out from the steelmaking furnace has a black skin (oxide such as carbon) and various deposits (hereinafter referred to as scales) on the surface. Therefore, the scales are removed by using a removing means such as a filer or electrolytic polishing, and after performing a surface treatment such as surface cleaning, an analysis operation is performed on a metal component analysis apparatus such as gas analysis.
[0003]
[Problems to be solved by the invention]
However, the sample adjusting means as described above requires skill in the surface treatment work in order to prevent contamination of foreign matters (contamination), and it takes about 3 minutes to analyze one sample. The number of samples per day is as large as about 50 times, and it takes a lot of time and troublesome labor for analysis work and until accurate analysis results of metal components are obtained, Since the steelmaking furnace must be kept in a standby state for a long time, there are drawbacks such as excessive running costs.
[0004]
On the other hand, it is already known that when metal is surface-treated with arc plasma, scales on the metal surface are arc plasma treated (hereinafter referred to as arc treatment) and removed in about several seconds. Since the means performs surface treatment in an atmosphere in which the vacuum is replaced with argon gas or the like, a special gas body such as argon gas can be obtained by using such a gas replacement arc treatment method as it is for the preparation of the metal component analysis sample. There are problems such as an increase in adjustment cost required for the process and a reduction in work efficiency required for the gas replacement process.
[0005]
[Means for Solving the Problems]
In order to solve the above-described conventional problems, the apparatus for adjusting a metal component analysis sample according to the present invention firstly has a sample W for analyzing a metal component in a processing chamber 2a formed so as to be maintained in a vacuum state. On the cathode part 51 of the surface treatment space H formed between the electrodes between the anode part 50 and the cathode part 51 facing in the vertical direction, and arc treatment of the sample W a sample supply and recovery unit 6a which performs supply and removal of the parts 5, sample supply and recovery unit 6a handling portion 7a and for installing the metallic in component analysis the positioning arc processing unit 5 the supplied sample W from In the sample adjusting apparatus , the surface treatment space H accommodates the sample W on the cathode portion 51 during arc treatment and forms an arc treatment chamber 80 surrounding the space with a gap. Process made of ceramic material A guide 8 is provided, and an open space 83 for opening the arc processing chamber 80 to the processing chamber 2 a is formed between the upper surface of the processing guide 8 and the lower surface of the cathode portion 51, and the sample W is arced in the arc processing chamber 80. It is characterized by being configured to process .
[0006]
Second, an actuator 56 for adjusting the height of the cathode portion 51 is provided, and the processing guide 8 is attached to the anode portion 50 side via an attachment rod 81 .
[0007]
DETAILED DESCRIPTION OF THE INVENTION
An embodiment of the present invention will be described with reference to the drawings. 1 and 2, reference numeral 1 denotes a sample adjusting machine provided with an adjusting device 2 for surface-treating a sample W for analyzing an in-metal component such as for analyzing an in-metal component by a surface treatment method (adjusting method) according to the present invention. The sample adjusting machine 1 shown in the drawing is molded on a movable body frame 10 with casters, and a sample molding machine 1a for processing a sample taken out during steel making into a sample W having an appropriate shape and size. The supply machine 1b having a robot hand for feeding the sample W to the adjusting device 2 and the adjusting device 2 for performing surface treatment such as descaling by generating an arc in the vacuum of the supplied sample W are used in a compact manner. The configuration is easy to arrange.
[0008]
In addition, a vacuum pump 1c is installed at the lower part of the body frame 10 to bring the inside of the hollow processing chamber 2a formed in the adjustment device 2 into a vacuum state at a predetermined atmospheric pressure (about 10 Pa), and a sample adjustment machine is provided on the side. A control box 1d that manages various driving operations is installed.
Then, the processed sample W that has been subjected to the surface treatment is taken out of the processing chamber 2a through the sample supply / extraction unit 3 and exposed to the outside air from the sample supply / extraction unit 3 in a metal such as a gas analyzer. By transferring to the transfer unit 1e as a transfer means for automatically feeding to the component analyzer, the processed sample W is prevented from being oxidized or fouled again, and component analysis in the metal performed in the next step Can be performed accurately and easily.
[0009]
As shown in FIGS. 3 and 4, the adjusting device 2 according to the present invention installed in the sample adjusting machine 1 includes a sample supply / extraction unit 3 described above in a processing chamber 2 a formed by a processing case 20, and A processing unit 5 that performs surface treatment of the sample W by arc processing in a vacuum, and a holder that transfers the sample W to the processing unit 5 from the sample supply / extraction unit 3 and supplies the processed sample W to the processing unit 5 A sample supply / recovery unit 6 a having 6, a sample W supplied to the processing unit 5 and a handling unit 7 a having a chuck 7 that is reversed and recovered and supplied to the holder 6 are installed.
[0010]
Further, the processing case 20 in the illustrated example is formed in a substantially cross-shaped hollow processing chamber 2a in front view so as to have cylindrical openings on the top, bottom, left and right, and each opening is interposed with an insulating member 21. With the lid member 22 closed in an airtight manner, an exhaust pipe 23 is provided on the rear wall side so as to communicate with the vacuum pump 1c, and the inside of the processing chamber 2a is brought into a predetermined vacuum state as quickly as possible by the configuration described later. To be able to.
[0011]
The detailed configuration of each part will be described below. First, the sample supply / extraction unit 3 and the sample supply / recovery unit 6a will be described with reference to FIGS.
The sample supply / extraction unit 3 receives the sample W discharged and supplied from the holder 6 provided in the robot hand of the supply machine 1b by the funnel-shaped receiving unit 30a and puts it in the holder 6 of the sample supply / recovery unit 6a in the standby posture. A pipe-shaped supply cylinder 30 to be supplied, and a take-out cylinder 32 that receives the sample W collected by the holder 6 by a funnel-shaped receiving part 31 and relays the sample W in a fall state to the lower transfer part 1e. Yes.
[0012]
The sample supply / extraction unit 3 arranges the supply cylinder 30 and the extraction cylinder 32 on a substantially vertical line at the stand-by posture position of the holder 6 so that the sample supply and sample extraction operations can be performed accurately and quickly with a simple and inexpensive configuration. To be able to.
Further, a plurality of on-off valves 33 that are automatically opened when the sample W passes and closes when the sample W does not pass are inserted at appropriate positions of the supply cylinder 30 and the extraction cylinder 32, and the inside of the processing chamber 2 a in the sample W supply and extraction process. The vacuum state is efficiently maintained.
[0013]
The sample supply / recovery section 6a supplies a dotted line from the solid standby position shown in FIG. In the posture, the holder 6 can be moved back and forth in a substantially horizontal direction, and the holder 6 can be opened and closed in the standby posture and the supply posture by the operation of the opening and closing actuator 62 by the configuration described later, so that the holder 6 can be moved in an appropriate posture. The held sample W is quickly discharged and can be selectively supplied to the extraction cylinder 32 and the processing unit 5.
[0014]
The holder 6 will be described with reference to FIG. 7. The holder 6 has left and right operation type blocks 65 provided on the end of the support rod 60 so as to open and close in cooperation with the opening and closing actuator 62. Holder pieces 63, 63 made of a plastic material or the like are provided, and the opening / closing actuator 62 is operated to switch from the holding posture shown in FIG. 5B to the discharging posture shown in FIG. ing.
Further, the holder pieces 63, 63 have a holder hole 66 for accommodating the sample W in the holding posture, a conical surface 67 whose bottom surface is formed in a downward conical shape, and a vertical hole that extends above this and has a diameter slightly larger than the outer shape of the sample W. And a receiving surface 69 that forms a funnel portion that expands upward and outward from the vertical wall 68.
[0015]
The holder 6 formed as described above smoothly receives the sample W introduced from above into the holder hole 66 by the receiving surface 69, and at the bottom surface portion, the outer peripheral corner portion of the sample W is a conical cone. Since the contact is restricted by the surface 67 and the sample W is guided and held at the center in the same horizontal posture as the supply posture for supplying the sample W to the processing unit 5 as shown in FIG. When the holder pieces 63, 63 are expanded in a state where the holder pieces 63, 63 are expanded in a state where they are positioned at the processing position immediately above the center of the part 51, the horizontal posture of the sample W is disturbed and greatly rebounds on the flat surface of the cathode part 51. Thus, there is an advantage that the supply speed can be increased by this amount, and the positioning work by the chuck 7 described later can be simplified.
[0016]
Next, the processing unit 5 will be described with reference to FIGS. The processing unit 5 in the illustrated example is in a state in which the rod-shaped anode unit 50 and the cathode unit 51 are vertically supported separately on the lid units 22 and 22 that close the upper and lower openings of the processing case 20. Are connected to an arc plasma generating power source on the control box 1d side.
The anode portion 50 closes the lower end portion of a pipe body 52 made of a conductive member connected to a power source, and a water supply pipe 53 connected to a water supply device (not shown) is passed through the inside thereof. Then, the water that has been cooled and that has cooled the anode part 50 through the water flow interval is discharged from a drain port 55 provided in the upper part of the tube body 52, and the anode part 50 is overheated during the continuous processing of the sample W. Try to prevent.
The cathode unit 51 is also provided with a cooling device (not shown), similar to the above.
[0017]
On the other hand, the cathode portion 51 is provided on the upper portion of the housing 57 of the forward / backward movement actuator 56 that is attached and supported by the lid portion 22 below the processing case 20 so that the height of the cathode portion 51 can be adjusted. It is provided so that it can be moved up and down so as to be in a work posture between a chuck position where W is held by the chuck 7 and a processing position close to the lower surface of the processing guide 8. The housing 57 is connected to a power source.
That is, the cathode portion 51 is slidably fitted into a mounting hole 58 formed in the upper portion of the casing 57 with a copper or iron column member, and is fixed by an attachment screw 59 so that the height can be adjusted. Therefore, the distance between the lower surface of the anode portion 50 and the upper surface of the cathode portion 51 can be adjusted in a small amount with a simple configuration, and arc plasma in a vacuum adapted to the characteristics of the electrode and the power can be generated efficiently. Thus, the surface treatment space H in which the arc treatment of the sample W can be satisfactorily performed using the cleaning effect on the cathode can be accurately set.
[0018]
Further, in the surface treatment space H, a treatment guide 8 is provided that forms an arc treatment chamber 80 that surrounds the sample W and favorably performs the arc treatment.
That is, the processing guide 8 is an arc-resistant member such as a ceramic material having sufficient heat resistance and insulation when an arc is generated. The processing guide 8 is a plate slightly thicker than the sample W and has a diameter smaller than the diameter of the electrode at the center. An arc processing chamber 80 that surrounds the periphery of the sample W is formed on the cathode portion 51 by drilling a hole that is several times the diameter of W.
Further, the processing guide 8 has a plurality of mounting rods 81 standing outside the arc processing chamber 80, and the anode portion is fitted by an appropriate mounting tool 82 in a state where the mounting rods 81 are fitted on the side surfaces of the tubular body 52. The lower surface 50 and the lower surface of the processing guide 8 are supported so that the mounting position can be adjusted so that the distance between the lower surface of the processing guide 8 and the surface processing space H is substantially the same.
[0019]
With this configuration, as shown in FIGS. 8A and 8B, the arc processing chamber 80 has an outer periphery of the sample W during the arc processing in which the sample W is positioned on the cathode portion 51 at the center of the arc processing chamber 80. And an open space 83 is formed between the lower surface of the anode portion 50 and the upper surface of the processing guide 8 in the surface processing space H above the surface of the processing chamber 2a. Open communication.
Therefore, the arc plasma is set for approximately several seconds (in this embodiment, approximately one second is set in consideration of the prevention of overheating of the sample W) set as an appropriate arc processing time between the two electrodes after the power is turned on. When the discharge is performed, the arc processing chamber 80 can determine the generation range of the arc plasma on the cathode portion 51, so that the arc plasma suitable for the surface treatment of the sample W can be stably generated. Therefore, it is possible to evaporate and remove the oxide film and deposits of the sample W.
[0020]
At this time, the sample W may move reflectively on the cathode part 51 due to the large energy of the arc plasma and the arc uneven load accompanying the adhesion state of the scale. While being free to move up, it is held in the surface treatment space H by the treatment guide 8 and subjected to an appropriate arc treatment.
Further, the heat generated by the arc generated continuously in the arc processing chamber 80, the gas to evaporate, the fine particles of the removed scales and the like (hereinafter referred to as divergent materials) are not contained in the surface treatment space H, Since it is freely discharged from the open space 83 to the wide space side of the processing chamber 2a, continuous arc treatment within a predetermined time can be sufficiently performed without causing the divergent matter to reattach to the sample W. Further, there is a feature that a processed sample W suitable for metal component analysis with a metallic luster from which scales have been removed can be obtained easily and efficiently.
[0021]
Next, the handling unit 7a will be described with reference to FIGS. The handling portion 7a supports a support rod 70 provided with the chuck 7 at the tip portion so as to be openable and closable by a rotation actuating actuator 71 provided on the outer side of the lid portion 22 so as to be able to rotate and rotate, and an outer end portion of the support rod 70 4, the left and right claws of the chuck 7 are provided so that they can be opened and closed from the standby position in which the chuck 7 shown by the solid line in FIG.
As a result, the chuck 7 can accurately position the sample W placed on the cathode part 51 by the holder 6 at an appropriate processing position by temporarily grasping the sample W from both sides as shown in FIG. After that, the chuck 7 is quickly moved away from the processing unit 5 by being opened on the spot, so that the sample W can be surface-treated on the cathode unit 51 with high accuracy.
In addition, as shown by the dotted line in FIG. 8, when the open space 83 is covered with the airtight chamber 8a and the airtight chamber 8a is connected to a vacuum pump 1c with a cleaner, the diverging matter can be sucked and removed more reliably. it can.
[0022]
Then, after the sample W completes the front side (one side) surface treatment (hereinafter referred to as the primary surface treatment) as shown in FIG. Is closed again to pinch the sample W and half-rotate by the operation of the rotary actuator 72 in the holding posture, so that the sample W is placed on the chuck 7 with the back side (other side) facing the anode part 50 side. With the opening, it is positioned and mounted again on the cathode part 51, and the secondary surface treatment similar to that at the time of the primary surface treatment is appropriately performed.
[0023]
Further, when the chuck 7 rotates in the reverse direction, the cathode portion 51 descends from the chuck position to the standby position, so that the chuck 7 does not interfere with the reverse rotation, and the sample 7 is placed on the cathode portion 51 with the secondary surface treatment completed. In this state, the holder 6 moves forward on the cathode portion 51 that has been lowered to the chuck position.
Next, the chuck 7 is opened in a state where the holder 6 is in a recovery posture similar to the supply posture of the sample W shown in FIG. 12, and the sample W is put into the holder hole 66 of the holder 6.
Thereafter, the holder 6 is retracted and returned to the sample supply / extraction section 3 side, the holder pieces 63 and 63 are opened, and the sample W accommodated therein is introduced toward the extraction cylinder 62.
[0024]
Next, the surface treatment method and the surface treatment mode of the sample W by the adjusting device 2 configured as described above will be described.
First, a sample W to be processed in this embodiment is a punched piece having a thickness of about 3 mm and a diameter of about 6 mm, which is suitable for a gas analyzer as a metal component analysis apparatus using a material collected in molten steel. The sample W formed in a predetermined shape and size by the sample molding machine 1a is placed in the receiving part 30a of the sample supply / extraction part 3 installed in the adjusting device 2 by the holder 6 of the robot hand of the supply machine 1b. When loaded, the sample W is automatically accommodated from the supply tube 30 into the holder hole 66 of the holder 6 in the standby position shown in FIGS. 3 and 7B.
[0025]
At this time, the operation of the vacuum pump 1c is started, the inside of the processing chamber 2a is set to a predetermined vacuum state, and then the holder 6 moves sideways as shown by the dotted line in FIG. 3 and FIG. The sample W is discharged and placed on the cathode 51 in the posture.
Then, as the holder 6 retreats to the original standby position, the chuck 7 positions the sample W on the cathode part 51 (FIG. 10), and then opens and retracts to open the cathode part 51.
Next, as shown in FIG. 11, the cathode portion 51 stops rising at the processing position, and the surface treatment space H is formed and maintained between the anode portion 50 and the power of the processing portion 5 is turned on so that the anode portion 50 and the cathode are turned on. Arc plasma is generated between the portion 51 and the sample W in contact with the cathode portion 51.
[0026]
As a result, the primary surface of the sample W is subjected to the primary surface treatment, and then the cathode portion 51 is lowered to the chuck position. At this position, the sample W is reversed and rotated by the chuck 7, and the sample W on the cathode portion 51 is rotated. After the surface is positioned, the cathode portion 51 is again raised to the processing position, and the secondary surface treatment on the back side is performed in the same manner as the primary surface treatment.
Therefore, the adjusting device 2 configured and operated as described above efficiently and accurately completes the surface treatment of the entire surface of the sample W by the single processing unit 5 installed in the processing chamber 2a with a simple and inexpensive configuration. There is a feature that can be.
[0027]
In such a sample adjustment operation, the adjustment device 2 is provided with an arc processing section 5 that provides a surface treatment space H between the anode section 50 and the cathode section 51 in a processing chamber 2a formed so as to be maintained in a vacuum state. The surface treatment space H is provided with a treatment guide 8 for forming an arc treatment chamber 80 capable of accommodating a sample W for analyzing metal components, and the sample W is arc-treated in the arc treatment chamber 80. Therefore, as shown in FIGS. 8A and 8B, when arc plasma discharge is performed during arc processing in which the sample W is positioned at the center of the arc processing chamber 80 on the cathode portion 51, arc processing is performed. Arc plasma suitable for the surface treatment of the sample W can be stably generated in the chamber 80, and oxide films, deposits, and the like can be satisfactorily removed.
[0028]
Moreover, even if the sample W moves on the cathode part 51 by the energy of the arc plasma at this time, the sample W moves freely on the cathode part 51 while being held in the surface treatment space H in the arc treatment chamber 80. Therefore, proper arc treatment is uniformly received.
The divergent matter continuously generated in the arc processing chamber 80 is not confined in the surface processing space H, and is widened from the open space 83 formed between the processing guide 8 and the anode portion 50 in the processing chamber 2a. Since these are freely discharged to the space side and are also sucked by the vacuum pump 1c that automatically operates each time, continuous arc treatment can be performed satisfactorily without reattaching the divergent matter to the sample W. It is possible to provide a suitable processed sample W with a metallic luster from which scales have been removed efficiently and easily without the need for gas replacement, and perform subsequent metal component analysis with a gas analyzer accurately. There are features such as being able to.
[0029]
After completing the surface treatment process of the sample W in this way, the cathode portion 51 is lowered to the standby posture with the chuck 7 holding the sample W on the cathode portion 51 again, and then the holder 6 is moved forward. When the recovery posture similar to the supply posture of the sample W shown in FIG. 12 is reached, the chuck 7 is opened and the sample W is put into the holder 6.
Next, the holder 6 containing the sample W is opened in a state of being retracted and returned to the standby posture, and the sample W is put into the take-out cylinder 62 of the sample supply and take-out section 3, and a vacuum atmosphere or argon gas or the like is supplied from the lower end thereof. In the airtight state of the enclosed inert gas atmosphere, it is transferred to the transfer unit 1e that transfers to the gas analyzer and the like, so that contamination and reoxidation are reliably prevented even after the sample W is removed from the processing chamber 2a. However, a series of sample preparation operations and component analysis operations can be completed efficiently and easily.
[0030]
The adjusting device 2 capable of performing such a sample adjusting operation processes each device for automatically arcing the entire surface of the sample W between the electrodes in a processing chamber 2a formed so as to be maintained in a vacuum state. To install and configure the case 20, the processing case 20 is formed in a substantially cross-shaped hollow processing chamber 2 a when viewed from the front, and cylindrical openings are provided on the top, bottom, left, and right, and each opening is closed in an airtight manner. By using the lid portion 22 to be used as a mounting member that is installed in the processing chamber 2a, the apparatus can be compactly and inexpensively configured without compromising the arc processing. The processing chamber 2a having an extremely small capacity is formed so that the vacuum state can be quickly formed by the vacuum pump 1c, and the running cost of the apparatus can be reduced.
[0031]
That is, the upper and lower lid portions 22 of the processing case 20 are provided with the anode portion 50 and the cathode portion 51 constituting the processing portion 5 in the processing chamber 2 a so that the surface treatment space H can be adjusted, and the processing portion 5 has a holder. The supply cylinder 30 and the extraction cylinder 62 of the sample supply / extraction unit 3 are attached and supported so that the sample supply / extraction unit 3 is in the close position, and the sample supply / recovery unit 6a that operates the holder 6 on the left lid 22 as described above. In the right lid portion 22, a handling portion 7a for opening / closing and rotating the chuck 7 is stably installed with an airtight structure.
[0032]
Each lid 22 can be opened and closed, and the processing case 20 is provided with an opening and closing port for maintenance work (not shown), so that maintenance work such as adjustment repair of each device and cleaning of the processing chamber 2a is performed. There is a feature that can be easily performed.
Therefore, it is possible to efficiently and easily perform the sample adjustment work frequently performed in the middle of steelmaking, to obtain an accurate analysis result quickly, and to improve the quality based on this, and to make steelmaking There is an advantage that the running cost can be greatly reduced.
[0033]
【The invention's effect】
The present invention produces the following effects by using the above-described apparatus for preparing a sample for analyzing metal components.
In a processing chamber formed so as to be maintained in a vacuum state, an arc processing unit that arc-processes a sample for analyzing metal components between electrodes, a sample supply and recovery unit that supplies and removes the sample to and from the arc processing unit, By installing the handling unit that positions the sample supplied from the sample supply / recovery unit with the arc processing unit, the surface treatment of the sample is performed reliably in the processing chamber in a vacuum, and the supply and removal of the sample are not contaminated. It can be performed efficiently and easily while preventing oxidation and the like.
[0034]
In the processing chamber that can be maintained in a vacuum state, an arc processing unit is provided to provide a surface treatment space between the anode and cathode, and a sample for analyzing metal components can be accommodated in the surface treatment space. By providing a processing guide that forms an arc processing chamber and arcing the sample in the arc processing chamber, the generation range of the arc plasma can be narrowed and stably generated in the surface treatment space between the two electrodes. It is possible to evaporate and remove the oxide film and deposits of the sample.
Further, even if the sample is moved by the arc plasma, it is held in the arc processing chamber by the processing guide, so that the arc processing can be appropriately received.
[Brief description of the drawings]
FIG. 1 is a front view showing a sample adjusting machine provided with an adjusting device of the present invention.
FIG. 2 is a plan view of FIG.
FIG. 3 is a front sectional view showing a configuration of the adjusting device 2 of FIG. 1;
4 is a plan sectional view showing a configuration of a main part of FIG. 3;
FIG. 5 is a plan view showing a relationship between a chuck and a holder.
FIG. 6 is a front view showing the configuration of a sample supply / extraction unit and a sample supply / recovery unit installed in the adjustment device.
FIG. 7A is a plan view of a holder. (B) is sectional drawing which shows the state which closed the holder piece of (A). (C) is sectional drawing which shows the state which opened the holder piece of (A).
FIG. 8A is a cross-sectional view illustrating a configuration of a processing unit. (B) is a top view of the processing guide of (A).
FIG. 9 is an operation diagram showing a sample supply state in a processing unit.
FIG. 10 is an operation diagram showing a positioning state of a sample in a processing unit.
FIG. 11 is an operation diagram showing a surface treatment state of a sample in a processing unit.
FIG. 12 is an operation diagram showing a sample recovery state in a processing unit.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Sample adjustment machine 1c Vacuum pump 2 Adjustment apparatus 2a Processing chamber 3 Sample supply extraction part 5 Arc processing part (arc plasma processing part)
6 Holder 6a Sample supply / recovery unit 7 Chuck 7a Handling unit 8 Processing guide 20 Processing case 22 Lid 23 Exhaust pipe 50 Anode unit 51 Cathode unit 80 Arc processing chamber H Surface treatment space W Sample

Claims (2)

In the processing chamber (2a) formed so as to be maintained in a vacuum state, a sample (W) for metal component analysis is formed between the electrodes between the anode part (50) and the cathode part (51) facing vertically. An arc processing unit (5) that is placed on the cathode part (51) of the surface treatment space (H) to be arc-processed, and a sample that supplies and removes the sample (W) to and from the arc processing unit (5) supply and recovery unit and (6a), sample supply and recovery unit arc section of the sample (W) supplied from (6a) handling unit for positioning in (5) (7a) and metallic in a component analysis which placed the In the sample adjustment apparatus , an arc processing chamber (80) in which the sample (W) on the cathode part (51) is accommodated in the surface treatment space (H) and surrounded by a gap is provided in the surface treatment space (H). Processing guide (8) made of ceramic material having heat resistance and insulation to be formed An open space (83) for opening the arc processing chamber (80) to the processing chamber (2a) is formed between the upper surface of the processing guide (8) and the lower surface of the cathode part (51), and the sample (W ) Is an arc processing chamber (80) in the arc processing chamber (80) . The metal component according to claim 1, wherein an actuator (56) for adjusting the height of the cathode part (51) is provided, and the processing guide (8) is attached to the anode part (50) side via an attachment rod (81). Sample preparation device for analysis.

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