JP4697112B2 - Cleaning device - Google Patents

Description

  The present invention relates to a cleaning apparatus, and more particularly to a cleaning apparatus that cleans a large glass substrate or the like with a jet flow to which ultrasonic waves are applied.

  A glass substrate for a photomask is subjected to a polishing treatment after forming the substrate in order to ensure high flatness. The glass substrate after polishing is subjected to a cleaning process in order to remove dirt such as an abrasive attached to the surface. Conventionally, glass substrates have been cleaned by a dip method or a scrub method.

  In the dip method, a glass substrate is immersed in a cleaning tank filled with a cleaning liquid, and dirt attached to the surface is removed while using vibrations by ultrasonic waves or the like (for example, Patent Document 1).

On the other hand, in the scrub method, while supplying a cleaning liquid to the surface of the glass substrate, a rotating brush is brought into contact with the surface to remove dirt attached to the surface (for example, Patent Document 2).
JP 2001-276759 A JP 2003-29394 A

  However, the scrub method has a drawback that dust is generated by rubbing of the brush, and the glass substrate is soiled by the dust generation.

  On the other hand, the dip method does not have such a problem of dust generation, but has a problem that a cleaning tank corresponding to the size of the glass substrate to be processed must be prepared. For this reason, when the glass substrate to be processed is enlarged, there is a disadvantage that the apparatus is enlarged accordingly. In addition, when the apparatus is enlarged, a large amount of cleaning liquid is required.

  The present invention has been made in view of such circumstances, and an object of the present invention is to provide a cleaning apparatus capable of efficiently cleaning an object to be cleaned with a small amount of cleaning liquid.

Invention, in order to achieve the object, the object to be cleaned a cleaning liquid to which the ultrasonic waves are applied from almost brought close to the surface of the held plate-like object to be cleaned in a vertical posture injection port according to claim 1 In a cleaning apparatus for cleaning the object to be cleaned by spraying toward the surface of the object, the cleaning liquid is attached so as to surround the spray port, and the cleaning liquid sprayed from the spray port is the surface of the spray port and the object to be cleaned holds between the said injection port have a washing solution holding member to form a pool cleaning liquid between the surface of the object to be cleaned, the cleaning liquid retaining member, surrounds the lower and side portions of the injection port Thus, the cleaning device is formed in a U-shape .

  According to the first aspect of the present invention, the cleaning liquid ejected from the ejection port is held between the ejection port and the object to be cleaned by the cleaning liquid holding member, and a cleaning liquid pool is formed between the ejection port and the object to be cleaned. Form. Thereby, ultrasonic waves can be effectively propagated to the surface of the object to be cleaned, and the object to be cleaned can be efficiently cleaned with a small amount of cleaning liquid.

According to a second aspect of the present invention, in order to achieve the object, the cleaning liquid holding member has a liquid injection port for injecting liquid toward the surface of the object to be cleaned, and pressure is applied from the liquid injection port. The cleaning apparatus according to claim 1, wherein the cleaning liquid is ejected and kept in non-contact with the object to be cleaned.

  According to the invention which concerns on Claim 2, the liquid by which the pressure was applied is injected from the liquid injection port provided in the washing | cleaning liquid holding member. Accordingly, the cleaning liquid holding member is kept in non-contact with the object to be cleaned, and the surface of the object to be cleaned can be prevented from being damaged by the contact.

  According to a third aspect of the present invention, there is provided the cleaning apparatus according to the first or second aspect, wherein the cleaning liquid holding member is made of a polymer material in order to achieve the object.

  According to the invention of claim 3, the cleaning liquid holding member is formed of a polymer material. Thereby, even if it is a case where a washing | cleaning liquid holding member contacts the surface of a to-be-cleaned object, it can prevent that the surface of a to-be-cleaned object is damaged. For the purpose of such an action, the polymer material to be used is flexible and does not damage the surface of the object to be cleaned even if the cleaning liquid holding member contacts the surface of the object to be cleaned. Those that do not elute in the cleaning solution are also used. For example, PTFE (polytetrafluoroethylene), PEEK (polyetheretherketone), PVC (polyvinyl chloride), urethane, PET (polyethylene terephthalate), synthetic rubber, silicone rubber, etc. Is used.

The invention according to claim 4 provides the cleaning apparatus according to claim 2 , wherein the liquid ejected from the liquid ejection port is the cleaning liquid or pure water in order to achieve the object. .

  According to the fourth aspect of the present invention, the cleaning liquid or pure water (including ultrapure water) is ejected from the liquid injection port provided in the cleaning liquid holding member, and the object to be cleaned and the cleaning liquid holding member are not in contact with each other. To be kept.

  According to the cleaning apparatus of the present invention, an object to be cleaned can be efficiently cleaned with a small amount of cleaning liquid.

  Hereinafter, preferred embodiments of a cleaning apparatus according to the present invention will be described in detail with reference to the accompanying drawings.

  1 and 2 are a front view and a side view, respectively, showing the configuration of an embodiment of a cleaning apparatus according to the present invention.

  The cleaning device 10 is configured as a cleaning device for a large glass substrate for a photomask, and is transported to a predetermined cleaning position by a transport unit 12 that transports the glass substrate G in a substantially vertical posture. And a pair of cleaning units 14 for cleaning by spraying a cleaning liquid to which ultrasonic waves are applied from both sides of the glass substrate G.

  The transport unit 12 includes a pair of upper and lower roller rows 16A and 16B, holds the upper and lower sides of the glass substrate G, and horizontally transports the glass substrate G in a substantially vertical posture (upright posture). .

  Each of the roller rows 16A and 16B is configured by arranging a plurality of guide rollers 18A and 18B in series. The guide rollers 18A and 18B constituting the roller rows 16A and 16B have V-shaped guide grooves 18a and 18b formed on the outer peripheral surfaces thereof, and the upper side portion of the glass substrate G is formed in the guide grooves 18a and 18b. And the lower side is engaged, and the glass substrate G is held in a substantially vertical posture.

  Each guide roller 18A, 18B is connected to a conveyance motor (not shown) and is driven to rotate by this motor. Then, the guide rollers 18A and 18B are driven by the transport motor to rotate, so that the glass substrate G held by the guide rollers 18A and 18B is transported horizontally while maintaining a vertical posture.

  The cleaning unit 14 performs a cleaning operation in which a cleaning liquid to which an ultrasonic wave is applied to the glass substrate G transported to a predetermined cleaning position (the position illustrated in FIG. 2) is sprayed laterally from a position close to the surface of the glass substrate G. The head 20 is composed of a lifting device 60 that vertically moves the cleaning head 20 along the glass substrate G, and is provided so as to face each other with the glass substrate G transported to a predetermined cleaning position. ing.

  3 to 5 are a perspective view, a sectional perspective view, and a side sectional view showing the configuration of the cleaning head, respectively.

  As shown in the figure, the cleaning head 20 includes a hollow external head 24 having a cleaning liquid ejection port 22 and an internal head 26 that is provided in the external head and applies ultrasonic waves to the cleaning liquid ejected from the ejection port 22. And a cleaning liquid holding frame 50 that holds the cleaning liquid ejected from the ejection port 22 between the ejection port 22 and the glass substrate G and forms a cleaning liquid pool.

  The external head 24 is formed in a rectangular frame shape that is elongated in the horizontal direction, and includes a corner portion 24B formed in a rectangular frame shape, and a tapered portion 24A provided at the tip of the corner portion 24B. Has been.

  A base plate 24C is attached to the base end portion of the corner portion 24B, and the base end opening portion is sealed by the base plate 24C.

  Further, the taper portion 24A is formed so as to taper toward the center in the thickness direction, and the injection port 22 is formed at the tip thereof.

  The injection port 22 is formed in a slit shape at the tip of the tapered portion 24A, and is formed longer than the width of the glass substrate G to be cleaned.

  A cleaning liquid supply port 28 is formed above the corner portion 24 </ b> B, and the cleaning liquid is supplied into the external head 24 from the supply port 28.

  A cleaning liquid supply tank (not shown) is connected to the supply port 28 via a cleaning liquid supply pipe 72, and the cleaning liquid is supplied from the cleaning liquid supply tank to a cleaning liquid supply pump (not shown) to be supplied to the supply port 28. .

  The internal head 26 is formed corresponding to the internal shape of the external head 24, and includes a corner portion 26B formed in a rectangular block shape and a tapered portion 26A provided at the tip of the corner portion 26B. ing.

  A spacer 30 formed in a rectangular frame shape is attached to the outer periphery of the corner portion 26B. The internal head 26 is accommodated inside the external head 24 via the spacer 30. The inner periphery of the corner 24 </ b> B of the external head 24 is slidably supported via the spacer 30.

  In this way, the inner head 26 is accommodated in the inner peripheral portion of the outer head 24 via the spacer 30, whereby the inner head 26 is held at the center of the inner peripheral portion of the outer head 24, and the inner head 26 and the outer A predetermined gap is formed between the head 24 and the head 24. This gap becomes a flow path 32 connecting the supply port 28 and the injection port 22, and the cleaning liquid supplied from the supply port 28 is guided to the injection port 22 through the flow channel 32.

  Further, when the internal head 26 moves back and forth within the external head 24 using the spacer 30 as a guide, the gap formed between the external head 24 and the internal head 26 is expanded and contracted. The cross-sectional area of is enlarged or reduced. And the flow volume of the washing | cleaning liquid injected from the injection port 22 is varied when the cross-sectional area of this flow path 32 expands and contracts.

  Therefore, if the internal head 26 is moved back and forth with respect to the external head 24, the flow rate of the cleaning liquid ejected from the ejection port 22 can be adjusted to a desired flow rate.

  The internal head 26 is driven by a head drive motor. A head drive motor 36 for driving the internal head 26 is attached to the base plate 24 </ b> C attached to the base end portion of the external head 24. A screw rod 38 is attached to the output shaft of the head drive motor 36 along the moving direction of the internal head 26. On the other hand, a nut portion 26 </ b> N that is screwed into the screw rod 38 is formed at the base end portion of the internal head 26. When the head drive motor 36 is driven, the screw rod 38 rotates, and the nut portion 26N moves back and forth along the screw rod 38 by the rotation of the screw rod 38. As a result, the internal head 26 moves back and forth in the external head 24, and the flow rate of the cleaning liquid ejected from the ejection port 22 is varied.

  A packing 42 is attached to the outer periphery of the spacer 30, and the gap between the spacer 30 and the external head 24 is sealed by the packing 42.

  The internal head 26 has an ultrasonic transducer 44 for applying ultrasonic waves to the cleaning liquid ejected from the ejection port 22. The ultrasonic transducer 44 is accommodated and disposed in a recess 46 formed at the tip of the internal head 26.

  The recess 46 is formed to open toward the ejection port 22, and the internal shape thereof is formed along the external shape of the internal head 26. That is, it is composed of a corner portion 46B formed in a square box shape and a tapered portion 46A formed in a tip of the corner portion 46B. Further, the opening 46 </ b> X is formed in a slit shape at the tip of the tapered portion 26 </ b> A of the internal head 26.

  The ultrasonic transducer 44 is accommodated and disposed inside the corner 46B of the recess 46, and an acoustic lens 48 is disposed in the preceding stage. The acoustic lens 48 focuses the ultrasonic wave oscillated from the ultrasonic transducer 44 at a predetermined focal point P.

  The opening 46X of the concave portion 46 that accommodates the ultrasonic transducer 44 is sealed by a lid member 49 that can transmit ultrasonic waves, and a liquid (for example, ultrasonic waves that can propagate ultrasonic waves) (for example, , Pure water or ultrapure water) 47. By sealing the ultrasonic vibrator 44 in this way, it is possible to prevent the outflow of dust from the ultrasonic oscillating unit, and it is possible to eject a cleaning liquid with a high degree of cleaning.

  The cleaning liquid holding frame 50 is formed in a U-shape, and is attached to the tip of the external head 24 so as to surround the lower portion and both side portions of the ejection port 22.

  The cleaning liquid holding frame 50 is formed with a predetermined width (is formed so as to protrude a predetermined amount from the ejection port 22 of the attached external head 24), and the cleaning liquid ejected from the ejection port 22 is ejected from the ejection port 22. And a glass substrate G, and a cleaning liquid pool is formed between the ejection port 22 and the glass substrate G.

  Further, in order to enhance the holding ability of the cleaning liquid, a flange portion 50A having a predetermined width is integrally formed at the tip portion.

  The cleaning head 20 is installed with its position adjusted so that the flange portion 50A does not contact the surface of the glass substrate G during scanning. That is, when the cleaning liquid holding frame 50 comes into contact with the surface of the glass substrate G, there arises a problem that the surface of the glass substrate G is damaged or soiled. On the other hand, if the cleaning liquid holding frame 50 and the glass substrate G are too far apart. Since the cleaning liquid cannot be held, the cleaning liquid holding frame 50 is placed close to the surface of the glass substrate G so as not to come into contact therewith. For example, the position is adjusted so that the distance between the surface of the glass substrate G and the flange portion 50A is about 0.1 mm.

  Thereby, the surface of the glass substrate G can be scanned with the cleaning head 20 in a non-contact state while the cleaning liquid is accumulated between the ejection port 22 and the glass substrate G.

  Note that the cleaning liquid holding frame 50 is preferably formed using a flexible polymer material so that the glass substrate G is not damaged even when the glass substrate G contacts the surface of the glass substrate G. In this case, a polymer material that does not elute into the cleaning solution is selected. For example, PTFE (polytetrafluoroethylene), PEEK (polyetheretherketone), PVC (polyvinyl chloride), urethane, PET (polyethylene terephthalate), synthetic rubber, silicone rubber, etc. Can be used.

  As shown in FIG. 1 and FIG. 2, the lifting device 60 includes a support column 62 erected vertically and a lifting body 64 that moves up and down along the support column 62.

  A guide rail (not shown) is laid on the support 62, and the elevating body 64 is slidably provided on the guide rail. The elevating body 64 moves up and down vertically along the support column 62 by sliding on the guide rail.

  The elevating body 64 is driven by a scanning drive motor (not shown). This scanning drive motor is provided on the column 62, and a screw rod is connected to the output shaft thereof. The screw rod is disposed along the guide rail, and a nut member provided on the elevating body 64 is screwed to the screw rod. When the scanning drive motor is driven, the screw rod rotates, and the nut member moves along the screw rod by the rotation of the screw rod. As a result, the elevating body 64 moves up and down along the column 62.

  The cleaning head 20 is attached to the elevating body 64, and as the elevating body 64 moves up and down, the cleaning head 20 moves up and down along the glass substrate G conveyed to a predetermined cleaning position, and scans the surface of the glass substrate G.

  The cleaning head 20 is positioned above the glass substrate G transferred to a predetermined cleaning position at the top dead center, and is positioned below the glass substrate G transferred to the predetermined cleaning position at the bottom dead center. The movement stroke is set so as to. That is, the movement stroke is set so that scanning is possible over the entire surface of the glass substrate G.

  A tray 70 is installed below the glass substrate G located at the cleaning position, and the cleaning liquid is collected in the tray 70.

  The operation of the cleaning apparatus 10 of the present embodiment configured as described above is as follows.

  FIG. 6 is a schematic diagram of a procedure for cleaning the glass substrate G by the cleaning apparatus 10 of the present embodiment.

  The glass substrate G to be cleaned is set between the upper and lower roller rows 16A and 16B constituting the transport unit 12, and is held in a substantially vertical posture. When a conveyance motor (not shown) is driven in this state, the individual guide rollers 18A and 18B constituting the roller arrays 16A and 16B rotate, and the glass substrate G maintains a vertical posture as shown in FIG. 6A. It is transported horizontally.

  When the glass substrate G is transported to a predetermined cleaning position, the transport motor is stopped. As a result, as shown in FIG. 6B, the glass substrate G is held at the cleaning position in a substantially vertical posture. At this time, the cleaning head 20 of the cleaning unit 14 is located at the top dead center.

  When the glass substrate G is held at the cleaning position, the cleaning liquid is supplied to the supply port 28 of each cleaning head 20 from a cleaning liquid supply tank (not shown). The cleaning liquid supplied to the supply port 28 is guided to the injection port 22 through the flow path 32 formed between the internal head 26 and the external head 24 and is injected laterally from the injection port 22.

  In this case, the flow rate of the cleaning liquid ejected from the ejection port 22 is adjusted by moving the internal head 26 back and forth with respect to the external head 24. That is, when the internal head 26 is moved back and forth with respect to the external head 24, the cross-sectional area of the flow path 32 formed between the internal head 26 and the external head 24 changes. Adjust the flow rate of the cleaning solution.

  Simultaneously with the supply of the cleaning liquid, the ultrasonic transducer 44 is driven to transmit ultrasonic waves. The ultrasonic wave transmitted from the ultrasonic transducer 44 is focused at a predetermined focal point P by the acoustic lens 48 and applied to the cleaning liquid ejected from the ejection port 22.

  When the cleaning liquid is supplied to the supply port 28 and the injection of the cleaning liquid from the injection port 22 is started, a scanning drive motor (not shown) is driven, and the cleaning head 20 starts to descend.

  The cleaning head 20 descends vertically along the surface of the glass substrate G, with the spray port 22 being close to the surface of the glass substrate G. Thereby, as shown in FIGS. 6C and 6D, the surface of the glass substrate G is scanned by the cleaning head 20.

  When the cleaning head 20 passes through the glass substrate G, the cleaning liquid sprayed from the spray port 22 of the cleaning head 20 is applied to remove dirt adhered to the surface. Since ultrasonic waves are applied to the cleaning liquid, dirt can be effectively removed.

  By the way, when the glass substrate G is cleaned with the cleaning liquid to which ultrasonic waves are applied in this way, the cleaning liquid is sufficient between the ejection port 22 and the glass substrate G in order to ensure the cleaning effect by the ultrasonic waves. It is necessary to be satisfied. In particular, when the cleaning liquid is sprayed in the lateral direction, the cleaning liquid flows down due to gravity, so that the cleaning liquid may not be sufficiently filled between the ejection port 22 and the glass substrate G, and the ultrasonic cleaning effect may not be sufficiently provided. There is.

  In this regard, in the cleaning apparatus 10 of the present embodiment, the cleaning liquid sprayed from the spray port 22 by the cleaning liquid holding frame 50 provided at the tip of the cleaning head 20 is held between the spray port 22 and the glass substrate G. Therefore, the space between the ejection port 22 and the glass substrate G can always be filled with the cleaning liquid, and the cleaning effect by the ultrasonic waves can be ensured.

  That is, as shown in FIG. 7, in the cleaning apparatus 10 of the present embodiment, when the cleaning head 20 is scanned along the surface of the glass substrate G, the cleaning liquid holding frame 50 provided at the tip of the cleaning head 20 The lower part and both side parts of the space from the injection port 22 to the glass substrate G are enclosed. As a result, when the cleaning liquid is ejected from the ejection port 22, the cleaning liquid is accumulated in the space surrounded by the cleaning liquid holding frame 50, and the cleaning liquid can be always filled between the ejection port 22 and the glass substrate G (injection). The cleaned cleaning liquid flows down from a slight gap Δd between the upper part of the cleaning liquid holding frame 50 and the glass substrate G). Thereby, the ultrasonic wave applied from the ultrasonic transducer | vibrator 44 can be effectively propagated to the surface of the glass substrate G, and the cleaning effect by an ultrasonic wave can be made to act effectively.

  In this way, the cleaning head 20 is lowered along the glass substrate G while the cleaning liquid is filled between the ejection port 22 and the glass substrate G, and the surface of the glass substrate G is scanned with the cleaning head 20. Wash.

  As shown in FIG. 6E, when the cleaning head 20 reaches the bottom dead center, the drive of the scanning drive motor (not shown) is stopped, and the descent of the cleaning head 20 is stopped. At the same time, the supply of the cleaning liquid and the driving of the ultrasonic vibrator 44 are stopped, and the cleaning ends.

  When the cleaning is completed, a conveyance motor (not shown) is driven, and the guide rollers 18A and 18B are rotationally driven. As shown in FIG. 6F, the glass substrate G is next driven by the rotationally driven guide rollers 18A and 18B. It is conveyed to the process.

  As described above, in the cleaning apparatus 10 of the present embodiment, when the glass substrate G held vertically is scanned by the cleaning head 20 and cleaned, the nozzle 22 of the cleaning head 20 and the glass substrate G Since the cleaning head 20 can always be filled and the cleaning head 20 can be scanned in the meantime, the cleaning effect by ultrasonic waves can always be effectively applied.

  In addition, since the cleaning liquid can be always filled between the ejection port 22 of the cleaning head 20 and the glass substrate G regardless of the flow rate to be sprayed, the cleaning can be performed with the minimum necessary cleaning liquid. Thereby, economical operation can be performed.

  Further, even when cleaning a large glass substrate G, the apparatus configuration can be made compact.

  8 to 10 are a perspective view, a cross-sectional perspective view, and a side cross-sectional view showing a configuration of another embodiment of the cleaning head.

  As shown in the figure, the cleaning liquid holding frame 50 of the cleaning head 20A has a plurality of liquid injection ports 52 formed at regular intervals in the flange portion 50A. The liquid applied with pressure from the liquid injection ports 52 is shown in FIG. To prevent the cleaning liquid holding frame 50 from coming into contact with the surface of the glass substrate G.

  As shown in FIG. 10, the liquid injection port 52 is formed so as to penetrate from the back surface of the flange portion 50 </ b> A to the front surface, and the tip portion thereof is formed by being squeezed. A liquid supply pipe 54 is connected to the base end portion of the liquid injection port 52. The liquid supply pipe 54 is connected to a liquid supply tank (not shown), and the liquid stored in the liquid supply tank is pumped to a pump (not shown) and supplied to the liquid ejection port 52.

  According to the cleaning head 20A configured as described above, when a pump (not shown) is driven and liquid is pumped to the liquid jet port 52, pressure is applied from the tip of the liquid jet port 52 toward the glass substrate G. Liquid is jetted. Thereby, the cleaning liquid holding frame 50 and the glass substrate G are kept at a constant interval, and the cleaning liquid holding frame 50 is prevented from coming into contact with the glass substrate. Thus, the surface of the glass substrate G can be scanned with the cleaning head 20A in a non-contact state, and the surface of the glass substrate G can be cleaned while preventing scratches and dirt.

  The liquid ejected from the liquid ejection port 52 is preferably the same liquid as the cleaning liquid ejected from pure water (including ultrapure water) or the ejection port 22 of the cleaning head 20A.

  Further, since the distance between the glass substrate G and the cleaning liquid holding frame 50 changes depending on the pressure of the liquid ejected from the liquid ejection port 52, it is preferable to eject the liquid with a necessary minimum pressure. Since the pressure also changes depending on the diameter of the liquid injection port 52, the injection pressure may be adjusted by changing the diameter of the liquid injection port 52.

  In the present embodiment, the cleaning head is composed of an internal head and an external head, and the internal head is moved relative to the external head, thereby changing the cross-sectional area of the flow path and Although the flow rate is adjusted, the mechanism for adjusting the flow rate of the cleaning liquid ejected from the ejection port is not limited to this, and may be adjusted using another mechanism.

  When the cleaning head is composed of an internal head and an external head, the cross-sectional area of the flow path may be changed by moving the external head side relative to the internal head. Moreover, it is good also as a structure which moves both an internal head and an external head and changes the cross-sectional area of a flow path.

  Further, in the cleaning apparatus 10 of the present embodiment, the ultrasonic wave applied to the cleaning liquid is focused, but may be applied without focusing.

  However, as in the cleaning apparatus 10 of the present embodiment, by focusing the ultrasonic wave near the surface of the glass substrate G, the cleaning effect by the ultrasonic wave can be further enhanced, and dirt is effectively removed with a small amount of cleaning liquid. Will be able to. That is, when the ultrasonic wave is focused on the surface of the glass substrate G, a high-density and fine bubble group can be generated on the surface of the glass substrate G. This high-density, fine bubble group generates a strong impact force when it collapses, and the powerful impact force can effectively remove fine particles and film-like dirt attached to the surface. . Moreover, since the radical can be efficiently generated by the strong impact force, the chemical cleaning effect by the radical can be enhanced.

  In the present embodiment, the ultrasonic wave oscillated from the ultrasonic transducer is focused by the acoustic lens, but the ultrasonic transducer itself may have a focusing function. For example, the emitted ultrasonic wave may be converged to a predetermined focal point by setting the shape of the ultrasonic wave emission surface to Kane Castle.

  In the present embodiment, the ultrasonic transducer 44 is accommodated in the concave portion 46 formed in the internal head 26, the concave portion 46 is filled with the liquid 47 capable of ultrasonic propagation, and the opening portion 46 </ b> X is covered with the lid material 49. Although it is set as the structure sealed, it is good also as a structure which open | releases the opening part 46X. In this case, the recess 46 is filled with the cleaning liquid supplied from the supply port 28.

  As in the present embodiment, the ultrasonic vibrator 44 is installed in the recess 46 and sealed, so that dust generated from the ultrasonic oscillation source can be prevented from flowing into the cleaning liquid.

  In the case of the configuration in which the ultrasonic transducer 44 is sealed in this way, it is preferable that the liquid filling the concave portion is intermittently replaced or constantly circulated. For this reason, it is preferable that the liquid 47 filled in the recess 46 is configured to be exchanged or circulated. For example, a supply port and a discharge port communicating with the inside of the recess 46 are formed in the internal head 26, and the liquid 47 in the recess can be circulated constantly or intermittently from the supply port and the discharge port. Alternatively, a supply / discharge port communicating with the inside of the recess 46 is formed in the internal head 26, and the liquid 47 in the recess can be exchanged from the supply / discharge port.

  In the present embodiment, no particular mention is made of the type of cleaning liquid to be used, but a cleaning liquid suitable for the cleaning application is used. For example, in the photomask glass substrate cleaning process, the cleaning is usually performed in the steps of chemical solution cleaning → rinsing → detergent cleaning → rinsing → drying, and therefore the cleaning liquid used in each step is used. Therefore, for example, in the chemical solution cleaning step, cleaning is performed using a chemical solution such as sulfuric acid or sulfuric acid / hydrogen peroxide as the cleaning solution, and in the rinsing step, cleaning is performed using pure water, ultrapure water, or the like as the cleaning solution. Further, in the detergent washing step, washing is performed using a detergent solution (for example, a solution obtained by adding a detergent to pure water) as a washing solution.

  In the present embodiment, the cleaning liquid is ejected by a cleaning head having a slit-like ejection port. However, the cleaning liquid may be ejected by a cleaning head in which a large number of nozzles are arranged in a straight line. In this case, the shape of the injection port of each nozzle may be formed in a circular shape or may be formed in a slit shape.

  In this embodiment, the case where a large glass substrate for a photomask is cleaned as an object to be cleaned has been described as an example. However, the application of the present invention is not limited to this, and the liquid crystal The same applies to the case of cleaning a substrate such as a glass substrate or a semiconductor substrate.

  In addition, since the glass substrate for photomasks is required to be cleaned on the entire surface on the order of submicron, the present invention which can be effectively cleaned with a small amount of cleaning liquid works effectively. In particular, since the glass substrate for photomasks tends to increase in size in recent years, the present invention capable of downsizing the apparatus configuration works particularly effectively.

The front view which shows the structure of one Embodiment of the washing | cleaning apparatus which concerns on this invention. The side view which shows the structure of one Embodiment of the washing | cleaning apparatus which concerns on this invention. Perspective view showing the configuration of the cleaning head Cross-sectional perspective view showing configuration of cleaning head Side sectional view showing the configuration of the cleaning head Schematic of cleaning procedure of glass substrate G by cleaning device Illustration of cleaning operation by the cleaning head Perspective view showing the configuration of the cleaning head Cross-sectional perspective view showing configuration of cleaning head Side sectional view showing the configuration of the cleaning head

Explanation of symbols

  G ... Glass substrate, 10 ... Substrate cleaning device, 12 ... Transport unit, 14 ... Cleaning unit, 16A, 16B ... Roller row, 18A, 18B ... Guide roller, 20 ... Cleaning head, 22 ... Injection port, 24 ... External head, DESCRIPTION OF SYMBOLS 26 ... External head, 28 ... Supply port, 32 ... Flow path, 36 ... Head drive motor, 44 ... Ultrasonic vibrator, 46 ... Recessed part, 48 ... Acoustic lens, 49 ... Cover material, 60 ... Lifting device, 50 ... Cleaning liquid Holding frame, 50A ... flange portion, 52 ... liquid injection port, 62 ... support, 64 ... lifting body

Claims (4)

Cleaning the object to be cleaned by spraying a cleaning liquid to which ultrasonic waves are applied from the injection port close to the surface of the plate-shaped object to be cleaned held in a substantially vertical posture toward the surface of the object to be cleaned. In the cleaning device
Mounted so as to surround said injection port, to hold the cleaning liquid ejected from the ejection nozzle between the injection port and the surface of the object to be cleaned, between the injection port and the surface of the object to be cleaned cleaning apparatus have a washing solution holding member to form a pool cleaning liquid, the cleaning liquid holding member, which is characterized by being formed in a U-shape so as to surround the lower and side portions of the injection port to. The cleaning liquid holding member has a liquid injection port for injecting a liquid toward the surface of the object to be cleaned, and a liquid applied with pressure from the liquid injection port is injected between the cleaning object and the object to be cleaned. The cleaning apparatus according to claim 1, wherein the cleaning apparatus is kept in a non-contact state.   The cleaning apparatus according to claim 1, wherein the cleaning liquid holding member is made of a polymer material. The cleaning apparatus according to claim 2 , wherein the liquid ejected from the liquid ejection port is the cleaning liquid or pure water.

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