JP4691610B2 - 電子顕微鏡 - Google Patents
電子顕微鏡 Download PDFInfo
- Publication number
- JP4691610B2 JP4691610B2 JP2010115882A JP2010115882A JP4691610B2 JP 4691610 B2 JP4691610 B2 JP 4691610B2 JP 2010115882 A JP2010115882 A JP 2010115882A JP 2010115882 A JP2010115882 A JP 2010115882A JP 4691610 B2 JP4691610 B2 JP 4691610B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- ceramic
- acceleration
- electrodes
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000001133 acceleration Effects 0.000 claims description 44
- 239000000919 ceramic Substances 0.000 claims description 41
- 238000010894 electron beam technology Methods 0.000 claims description 12
- 230000005684 electric field Effects 0.000 claims description 9
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000002245 particle Substances 0.000 description 14
- 229910045601 alloy Inorganic materials 0.000 description 11
- 239000000956 alloy Substances 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 239000010936 titanium Substances 0.000 description 10
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 9
- 230000001629 suppression Effects 0.000 description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 8
- 238000002844 melting Methods 0.000 description 5
- 230000008018 melting Effects 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910001069 Ti alloy Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 206010028980 Neoplasm Diseases 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 201000011510 cancer Diseases 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000005658 nuclear physics Effects 0.000 description 1
- 230000005469 synchrotron radiation Effects 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
Images
Landscapes
- Particle Accelerators (AREA)
- Electron Sources, Ion Sources (AREA)
Description
放電抑制層の電気抵抗率を108Ω*cm以上1015Ω*cm以下にすることにより、充分に放電抑制層の表面に付着したクランプの周囲の電界が下がる。その結果、放電のきっかけとなるクランプを加速する静電力が小さくなり、クランプの離脱を抑制することができる。
2 外側電極
3 絶縁管
4 分割抵抗
5 加速電源
6 加熱電源
7 引出電圧発生電源
8 引き出し電源
9 陰極
10 陽極
11 電子軌跡
12 セラミックス
100 電子ビーム
101 電子銃
102 加速管
103 収束レンズ
104 試料
105 対物レンズ
106 中間レンズ
107 投影レンズ
108 蛍光板
109 観察窓
110 カメラ室
Claims (4)
- 電子線を放射する電子銃と、
当該電子銃から放射された電子線を所定のエネルギーまで加速する加速管と、
当該加速管を通過した電子線を収束して試料に照射するレンズ手段とを備え、
更に、前記加速管は、
前記電子線の軌道を囲うように設けられた絶縁管と、
前記電子線を加速する電界を発生させる複数の電極とを備え、
前記複数の電極の少なくとも一部が、1重量%以上20重量%以下のTiO2またはTiCを含有するAl2O3により構成されるセラミックスで被覆されていることを特徴とする電子顕微鏡。 - 請求項1に記載の電子顕微鏡において、
前記加速管は、
前記絶縁管の内壁側に設けられた内側電極と該絶縁管の外側に設けられた外側電極との組が複数段積み重ねられた構造を有し、
当該複数段積み重ねられた内側電極および外側電極のうち、該内側電極の隣接する電極と対向する面が前記セラミックスにより被覆されたことを特徴とする電子顕微鏡。 - 請求項2に記載の電子顕微鏡において、
前記内側電極が全て前記セラミックスにより被覆されたことを特徴とする電子顕微鏡。 - 請求項1から3のいずれか1項に記載の電子顕微鏡において、
前記セラミックスの電気抵抗率は、108Ω*cm以上1015Ω*cm以下であることを特徴とする電子顕微鏡。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010115882A JP4691610B2 (ja) | 2010-05-20 | 2010-05-20 | 電子顕微鏡 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010115882A JP4691610B2 (ja) | 2010-05-20 | 2010-05-20 | 電子顕微鏡 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008035441A Division JP4576437B2 (ja) | 2008-02-18 | 2008-02-18 | 荷電粒子加速装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010186756A JP2010186756A (ja) | 2010-08-26 |
JP4691610B2 true JP4691610B2 (ja) | 2011-06-01 |
Family
ID=42767268
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010115882A Expired - Fee Related JP4691610B2 (ja) | 2010-05-20 | 2010-05-20 | 電子顕微鏡 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4691610B2 (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03133100A (ja) * | 1989-10-17 | 1991-06-06 | Toshiba Corp | 多連高周波加速空胴 |
JPH05290749A (ja) * | 1992-04-07 | 1993-11-05 | Nissin Electric Co Ltd | イオン源 |
JPH1013102A (ja) * | 1996-06-20 | 1998-01-16 | Toshiba Corp | 高周波透過窓構体およびその製造方法 |
JPH1040844A (ja) * | 1996-07-26 | 1998-02-13 | Shinko Pantec Co Ltd | 高耐圧無放電対電極 |
JPH1092363A (ja) * | 1996-09-19 | 1998-04-10 | Jeol Ltd | 電子線用加速管 |
-
2010
- 2010-05-20 JP JP2010115882A patent/JP4691610B2/ja not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03133100A (ja) * | 1989-10-17 | 1991-06-06 | Toshiba Corp | 多連高周波加速空胴 |
JPH05290749A (ja) * | 1992-04-07 | 1993-11-05 | Nissin Electric Co Ltd | イオン源 |
JPH1013102A (ja) * | 1996-06-20 | 1998-01-16 | Toshiba Corp | 高周波透過窓構体およびその製造方法 |
JPH1040844A (ja) * | 1996-07-26 | 1998-02-13 | Shinko Pantec Co Ltd | 高耐圧無放電対電極 |
JPH1092363A (ja) * | 1996-09-19 | 1998-04-10 | Jeol Ltd | 電子線用加速管 |
Also Published As
Publication number | Publication date |
---|---|
JP2010186756A (ja) | 2010-08-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4576437B2 (ja) | 荷電粒子加速装置 | |
JP5472944B2 (ja) | 大電流直流陽子加速器 | |
WO2011046116A1 (ja) | ガス電解電離イオン源、イオンビーム装置 | |
Nishimori et al. | Experimental investigation of an optimum configuration for a high-voltage photoemission gun for operation at≥ 500 kV | |
Russkikh et al. | Small-sized vacuum-arc-discharge x-ray radiograph | |
JP4691610B2 (ja) | 電子顕微鏡 | |
Bowes et al. | Visualization of a pseudospark-sourced electron beam | |
US20090295269A1 (en) | Electron beam generator | |
CN108701575B (zh) | 用于x射线发射装置的靶组件和x射线发射装置 | |
Yamamoto et al. | High voltage threshold for stable operation in a dc electron gun | |
JP4821011B2 (ja) | 荷電変換薄膜および粒子加速器 | |
JP6095338B2 (ja) | 電子銃および荷電粒子線装置 | |
JP2004138460A (ja) | X線顕微検査装置 | |
Tusche et al. | A low energy ion source for electron capture spectroscopy | |
Horino et al. | Focused high-energy heavy ion beams | |
US10172223B2 (en) | X-ray generation from a super-critical field | |
US9548182B2 (en) | Charged particle beam generating apparatus, charged particle beam apparatus, high voltage generating apparatus, and high potential apparatus | |
Behling | Cathodes of medical X-ray tubes | |
JP2008077914A (ja) | X線管 | |
JP6377920B2 (ja) | 高輝度電子銃、高輝度電子銃を用いるシステム及び高輝度電子銃の動作方法 | |
JP4735805B2 (ja) | 低エネルギーイオン照射による導電体物質からの特性x線発生方法とその装置 | |
Plies et al. | Experimental results using a “low-voltage booster” in a conventional SEM | |
JP5625965B2 (ja) | X線管 | |
Hutsel et al. | Charged-particle emission and self-biasing of a piezoelectric transformer plasma source | |
DE102015001440A1 (de) | Miniaturisierte Röntgenröhre mit Kathode und Anode aus Koops-GranMat und mit Verzögerer |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100520 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100521 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20100803 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100820 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20101012 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101028 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20101221 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110106 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20110125 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20110221 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140225 Year of fee payment: 3 |
|
LAPS | Cancellation because of no payment of annual fees |