JP4666858B2 - 重ね合せレジストレーションのランごとの制御のための方法および装置 - Google Patents

重ね合せレジストレーションのランごとの制御のための方法および装置 Download PDF

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Publication number
JP4666858B2
JP4666858B2 JP2001516238A JP2001516238A JP4666858B2 JP 4666858 B2 JP4666858 B2 JP 4666858B2 JP 2001516238 A JP2001516238 A JP 2001516238A JP 2001516238 A JP2001516238 A JP 2001516238A JP 4666858 B2 JP4666858 B2 JP 4666858B2
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Japan
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control input
step size
semiconductor device
processing
program storage
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Expired - Fee Related
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JP2001516238A
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Japanese (ja)
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JP2003506898A (ja
JP2003506898A5 (enExample
Inventor
トプラック，アンソニー・ジェイ
ボード，クリストファー・エイ
エドワーズ，リチャード・ディ
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Advanced Micro Devices Inc
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Advanced Micro Devices Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2001516238A 1999-08-10 2000-04-18 重ね合せレジストレーションのランごとの制御のための方法および装置 Expired - Fee Related JP4666858B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/371,550 US6405096B1 (en) 1999-08-10 1999-08-10 Method and apparatus for run-to-run controlling of overlay registration
US09/371,550 1999-08-10
PCT/US2000/010249 WO2001011678A1 (en) 1999-08-10 2000-04-18 Method and apparatus for run-to-run controlling of overlay registration

Publications (3)

Publication Number Publication Date
JP2003506898A JP2003506898A (ja) 2003-02-18
JP2003506898A5 JP2003506898A5 (enExample) 2007-04-26
JP4666858B2 true JP4666858B2 (ja) 2011-04-06

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001516238A Expired - Fee Related JP4666858B2 (ja) 1999-08-10 2000-04-18 重ね合せレジストレーションのランごとの制御のための方法および装置

Country Status (5)

Country Link
US (2) US6405096B1 (enExample)
EP (1) EP1208592A1 (enExample)
JP (1) JP4666858B2 (enExample)
KR (1) KR100734526B1 (enExample)
WO (1) WO2001011678A1 (enExample)

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Also Published As

Publication number Publication date
US6622061B1 (en) 2003-09-16
JP2003506898A (ja) 2003-02-18
EP1208592A1 (en) 2002-05-29
US6405096B1 (en) 2002-06-11
WO2001011678A1 (en) 2001-02-15
KR20020020964A (ko) 2002-03-16
KR100734526B1 (ko) 2007-07-03

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