JP4597490B2 - 発光装置の作製方法 - Google Patents

発光装置の作製方法 Download PDF

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Publication number
JP4597490B2
JP4597490B2 JP2003171833A JP2003171833A JP4597490B2 JP 4597490 B2 JP4597490 B2 JP 4597490B2 JP 2003171833 A JP2003171833 A JP 2003171833A JP 2003171833 A JP2003171833 A JP 2003171833A JP 4597490 B2 JP4597490 B2 JP 4597490B2
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Japan
Prior art keywords
light
substrate
solution
light emitting
emitting device
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Expired - Lifetime
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JP2003171833A
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English (en)
Japanese (ja)
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JP2004087465A5 (enExample
JP2004087465A (ja
Inventor
舜平 山崎
崇 浜田
哲史 瀬尾
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2003171833A priority Critical patent/JP4597490B2/ja
Publication of JP2004087465A publication Critical patent/JP2004087465A/ja
Publication of JP2004087465A5 publication Critical patent/JP2004087465A5/ja
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Publication of JP4597490B2 publication Critical patent/JP4597490B2/ja
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Expired - Lifetime legal-status Critical Current

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  • Electroluminescent Light Sources (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP2003171833A 2002-06-19 2003-06-17 発光装置の作製方法 Expired - Lifetime JP4597490B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003171833A JP4597490B2 (ja) 2002-06-19 2003-06-17 発光装置の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002179078 2002-06-19
JP2002189409 2002-06-28
JP2003171833A JP4597490B2 (ja) 2002-06-19 2003-06-17 発光装置の作製方法

Related Child Applications (2)

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JP2003172320A Division JP4451082B2 (ja) 2002-06-19 2003-06-17 発光装置の作製方法
JP2009230186A Division JP2009302076A (ja) 2002-06-19 2009-10-02 発光装置の作製方法

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Publication Number Publication Date
JP2004087465A JP2004087465A (ja) 2004-03-18
JP2004087465A5 JP2004087465A5 (enExample) 2006-08-03
JP4597490B2 true JP4597490B2 (ja) 2010-12-15

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JP2003171833A Expired - Lifetime JP4597490B2 (ja) 2002-06-19 2003-06-17 発光装置の作製方法

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4742622B2 (ja) * 2005-03-03 2011-08-10 セイコーエプソン株式会社 発光素子、発光装置および電子機器
KR101290099B1 (ko) * 2005-03-23 2013-07-26 가부시키가이샤 한도오따이 에네루기 켄큐쇼 복합재료, 발광소자용 재료, 발광소자, 발광장치 및전자기기
WO2015168036A1 (en) * 2014-04-30 2015-11-05 Kateeva, Inc. Gas cushion apparatus and techniques for substrate coating
US10569291B2 (en) * 2014-05-23 2020-02-25 Shincron Co., Ltd. Film formation method and film formation apparatus for thin film
JPWO2016152956A1 (ja) * 2015-03-25 2018-01-25 リンテック株式会社 ガスバリア層付き成形物の製造装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3162313B2 (ja) * 1997-01-20 2001-04-25 工業技術院長 薄膜製造方法および薄膜製造装置
JP3928120B2 (ja) * 1999-02-05 2007-06-13 株式会社リコー 表示インク
JP4351321B2 (ja) * 1999-02-22 2009-10-28 大日本印刷株式会社 基板塗布装置
JP4854840B2 (ja) * 1999-10-12 2012-01-18 株式会社半導体エネルギー研究所 発光装置の作製方法
JP4785257B2 (ja) * 2000-02-04 2011-10-05 株式会社半導体エネルギー研究所 発光装置の作製方法
JP2001300394A (ja) * 2000-02-17 2001-10-30 Konica Corp エクストルージョン塗布方法及び塗布装置
JP2001308082A (ja) * 2000-04-20 2001-11-02 Nec Corp 液体有機原料の気化方法及び絶縁膜の成長方法

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