JP4551666B2 - 照明装置及び露光装置 - Google Patents

照明装置及び露光装置 Download PDF

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Publication number
JP4551666B2
JP4551666B2 JP2004042802A JP2004042802A JP4551666B2 JP 4551666 B2 JP4551666 B2 JP 4551666B2 JP 2004042802 A JP2004042802 A JP 2004042802A JP 2004042802 A JP2004042802 A JP 2004042802A JP 4551666 B2 JP4551666 B2 JP 4551666B2
Authority
JP
Japan
Prior art keywords
light
mirror unit
exposure apparatus
illumination
reticle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004042802A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005235999A5 (enExample
JP2005235999A (ja
Inventor
豊 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004042802A priority Critical patent/JP4551666B2/ja
Priority to US11/062,024 priority patent/US7190436B2/en
Publication of JP2005235999A publication Critical patent/JP2005235999A/ja
Publication of JP2005235999A5 publication Critical patent/JP2005235999A5/ja
Application granted granted Critical
Publication of JP4551666B2 publication Critical patent/JP4551666B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/54—Lamp housings; Illuminating means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
JP2004042802A 2004-02-19 2004-02-19 照明装置及び露光装置 Expired - Fee Related JP4551666B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004042802A JP4551666B2 (ja) 2004-02-19 2004-02-19 照明装置及び露光装置
US11/062,024 US7190436B2 (en) 2004-02-19 2005-02-18 Illumination apparatus and exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004042802A JP4551666B2 (ja) 2004-02-19 2004-02-19 照明装置及び露光装置

Publications (3)

Publication Number Publication Date
JP2005235999A JP2005235999A (ja) 2005-09-02
JP2005235999A5 JP2005235999A5 (enExample) 2007-04-05
JP4551666B2 true JP4551666B2 (ja) 2010-09-29

Family

ID=34857989

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004042802A Expired - Fee Related JP4551666B2 (ja) 2004-02-19 2004-02-19 照明装置及び露光装置

Country Status (2)

Country Link
US (1) US7190436B2 (enExample)
JP (1) JP4551666B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008042462B4 (de) * 2008-09-30 2010-11-04 Carl Zeiss Smt Ag Beleuchtungssystem für die EUV-Mikrolithographie
DE102013223935A1 (de) * 2013-11-22 2015-05-28 Carl Zeiss Smt Gmbh Beleuchtungssystem für die EUV-Belichtungslithographie
NL2016266A (en) * 2015-03-02 2016-09-30 Asml Netherlands Bv Radiation System.

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3371510B2 (ja) * 1994-02-23 2003-01-27 株式会社ニコン 照明装置及び露光装置
US6038279A (en) * 1995-10-16 2000-03-14 Canon Kabushiki Kaisha X-ray generating device, and exposure apparatus and semiconductor device production method using the X-ray generating device
JP3618856B2 (ja) * 1995-10-20 2005-02-09 キヤノン株式会社 Ｘ線露光装置、及びこれを用いたデバイス生産方法
JP3817848B2 (ja) * 1997-07-18 2006-09-06 株式会社ニコン 照明装置
US6144495A (en) * 1997-12-23 2000-11-07 Canon Kabushiki Kaisha Projection light source
DE10053587A1 (de) * 2000-10-27 2002-05-02 Zeiss Carl Beleuchtungssystem mit variabler Einstellung der Ausleuchtung
US7109497B2 (en) * 1998-05-05 2006-09-19 Carl Zeiss Smt Ag Illumination system particularly for microlithography
US6438199B1 (en) * 1998-05-05 2002-08-20 Carl-Zeiss-Stiftung Illumination system particularly for microlithography
US6285743B1 (en) * 1998-09-14 2001-09-04 Nikon Corporation Method and apparatus for soft X-ray generation
JP4521896B2 (ja) * 1999-06-08 2010-08-11 キヤノン株式会社 照明装置、投影露光装置及びデバイス製造方法
JP2001307985A (ja) * 2000-04-24 2001-11-02 Takeshi Kawabata リソグラフィ用露光装置
JP2002006096A (ja) 2000-06-23 2002-01-09 Nikon Corp 電磁波発生装置、これを用いた半導体製造装置並びに半導体デバイスの製造方法
JP3605055B2 (ja) * 2001-07-31 2004-12-22 キヤノン株式会社 照明光学系、露光装置及びデバイス製造方法
JP3634782B2 (ja) * 2001-09-14 2005-03-30 キヤノン株式会社 照明装置、それを用いた露光装置及びデバイス製造方法
JP2004335575A (ja) * 2003-05-01 2004-11-25 Canon Inc 露光装置

Also Published As

Publication number Publication date
US20050185165A1 (en) 2005-08-25
US7190436B2 (en) 2007-03-13
JP2005235999A (ja) 2005-09-02

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