JP4550488B2 - 検出光学装置及び欠陥検査装置 - Google Patents
検出光学装置及び欠陥検査装置 Download PDFInfo
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- JP4550488B2 JP4550488B2 JP2004164153A JP2004164153A JP4550488B2 JP 4550488 B2 JP4550488 B2 JP 4550488B2 JP 2004164153 A JP2004164153 A JP 2004164153A JP 2004164153 A JP2004164153 A JP 2004164153A JP 4550488 B2 JP4550488 B2 JP 4550488B2
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Claims (4)
- 対物レンズを用いて試料に細いビームの照明光をスキャンしながら照射し、試料からの反射光を同一の対物レンズで捕捉して試料像を結像させる検出光学装置において、
試料面上の法線に対して、任意の入射方向と入射光領域をもった前記照明光を試料に入射させる入射系と、試料からの回折光及び散乱光を含む反射光を画素センサーに導く検出系を有し、前記検出系に反射光の通過光領域を前記入射光領域に対し相対的に保持する回転自在な開口絞りを有する偏心手段を設け、試料上の反射光における前方散乱と後方散乱を異なる効率で捕捉することを特徴とする検出光学装置。 - 請求項1において、前記検出系の反射光の通過光領域位置を入射光領域に対し、正反射光の方向と、前記照明光の方向に戻る方向に相対的に変えることにより、前記試料からの反射光が前記正反射光の方向と前記入射方向のうち、いずれか一方の検出効率を前記偏心手段によって向上させることを特徴とする検出光学装置。
- 請求項1または2において、前記通過光領域は開口絞りの開口、空間フィルターの透明領域または反射ミラーの反射領域であることを特徴とする検出光学装置。
- ウエハ等の試料に描かれたパターンについて、光学装置を用いてパターンを走査してその欠陥を検出する欠陥検査装置において、
前記光学装置は請求項1乃至3のいずれかに記載の検出光学装置を用いることを特徴とする欠陥検査装置。
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004164153A JP4550488B2 (ja) | 2004-06-02 | 2004-06-02 | 検出光学装置及び欠陥検査装置 |
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| Application Number | Priority Date | Filing Date | Title |
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| JP2004164153A JP4550488B2 (ja) | 2004-06-02 | 2004-06-02 | 検出光学装置及び欠陥検査装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005345221A JP2005345221A (ja) | 2005-12-15 |
| JP4550488B2 true JP4550488B2 (ja) | 2010-09-22 |
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| Application Number | Title | Priority Date | Filing Date |
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| JP2004164153A Expired - Fee Related JP4550488B2 (ja) | 2004-06-02 | 2004-06-02 | 検出光学装置及び欠陥検査装置 |
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| JP (1) | JP4550488B2 (ja) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4988223B2 (ja) | 2005-06-22 | 2012-08-01 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置およびその方法 |
| JP4857174B2 (ja) * | 2007-04-25 | 2012-01-18 | 株式会社日立ハイテクノロジーズ | 欠陥検査方法及び欠陥検査装置 |
| US7710557B2 (en) | 2007-04-25 | 2010-05-04 | Hitachi High-Technologies Corporation | Surface defect inspection method and apparatus |
| KR100978600B1 (ko) | 2007-10-23 | 2010-08-27 | 연세대학교 산학협력단 | 초고분해능 주사 광학 측정 장치 |
| WO2010101894A2 (en) * | 2009-03-02 | 2010-09-10 | President & Fellows Of Harvard College | High resolution laser scanning microscopy imaging system and method using spatially patterned cumulative illumination of detection fields |
| JP5629782B2 (ja) * | 2010-12-27 | 2014-11-26 | 株式会社日立ハイテクノロジーズ | 検査装置 |
| KR102822056B1 (ko) * | 2019-09-20 | 2025-06-20 | 삼성전자주식회사 | 스펙트럼 영상 광학계 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6063514A (ja) * | 1983-09-17 | 1985-04-11 | Nippon Kogaku Kk <Nikon> | 暗視野用落射顕微鏡 |
| JPH05203878A (ja) * | 1992-01-27 | 1993-08-13 | Jeol Ltd | 走査型レーザー顕微鏡 |
| JPH07270326A (ja) * | 1994-03-30 | 1995-10-20 | Hitachi Electron Eng Co Ltd | 異物検査装置 |
| JPH0915507A (ja) * | 1995-07-03 | 1997-01-17 | Olympus Optical Co Ltd | 暗視野顕微鏡 |
| JPH10246857A (ja) * | 1997-03-03 | 1998-09-14 | Beitetsuku Kk | 斜光照明装置 |
| JP2002168797A (ja) * | 2000-11-30 | 2002-06-14 | Toshiba Corp | 光学像観察システム |
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| JP2005345221A (ja) | 2005-12-15 |
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