JP4541798B2 - 荷電粒子線レンズアレイ、及び該荷電粒子線レンズアレイを用いた荷電粒子線露光装置 - Google Patents

荷電粒子線レンズアレイ、及び該荷電粒子線レンズアレイを用いた荷電粒子線露光装置 Download PDF

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Publication number
JP4541798B2
JP4541798B2 JP2004230957A JP2004230957A JP4541798B2 JP 4541798 B2 JP4541798 B2 JP 4541798B2 JP 2004230957 A JP2004230957 A JP 2004230957A JP 2004230957 A JP2004230957 A JP 2004230957A JP 4541798 B2 JP4541798 B2 JP 4541798B2
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electrode
charged particle
lens array
electron
particle beam
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Expired - Fee Related
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JP2004230957A
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Japanese (ja)
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JP2006049702A (ja
JP2006049702A5 (enrdf_load_stackoverflow
Inventor
太 廣瀬
治人 小野
兼一 長永
真人 村木
恭宏 染田
康成 早田
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Canon Inc
Hitachi High Tech Corp
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Hitachi High Technologies Corp
Canon Inc
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Publication of JP2006049702A5 publication Critical patent/JP2006049702A5/ja
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JP2004230957A 2004-08-06 2004-08-06 荷電粒子線レンズアレイ、及び該荷電粒子線レンズアレイを用いた荷電粒子線露光装置 Expired - Fee Related JP4541798B2 (ja)

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JP2004230957A JP4541798B2 (ja) 2004-08-06 2004-08-06 荷電粒子線レンズアレイ、及び該荷電粒子線レンズアレイを用いた荷電粒子線露光装置

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JP2004230957A JP4541798B2 (ja) 2004-08-06 2004-08-06 荷電粒子線レンズアレイ、及び該荷電粒子線レンズアレイを用いた荷電粒子線露光装置

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JP2006049702A JP2006049702A (ja) 2006-02-16
JP2006049702A5 JP2006049702A5 (enrdf_load_stackoverflow) 2007-09-13
JP4541798B2 true JP4541798B2 (ja) 2010-09-08

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12243714B2 (en) 2020-02-28 2025-03-04 Asml Netherlands B.V. Lens designs

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4648087B2 (ja) * 2005-05-25 2011-03-09 キヤノン株式会社 偏向器の作製方法、荷電粒子線露光装置、および、デバイス製造方法
DE102008010123B4 (de) * 2007-02-28 2024-11-28 Ims Nanofabrication Gmbh Vielstrahl-Ablenkarray-Einrichtung für maskenlose Teilchenstrahl-Bearbeitung
JP2012195097A (ja) * 2011-03-15 2012-10-11 Canon Inc 荷電粒子線レンズおよびそれを用いた露光装置
JP5669636B2 (ja) * 2011-03-15 2015-02-12 キヤノン株式会社 荷電粒子線レンズおよびそれを用いた露光装置
JP2013004216A (ja) 2011-06-14 2013-01-07 Canon Inc 荷電粒子線レンズ
JP2013004680A (ja) * 2011-06-15 2013-01-07 Canon Inc 荷電粒子線レンズ
WO2013142068A1 (en) * 2012-03-19 2013-09-26 Kla-Tencor Corporation Pillar-supported array of micro electron lenses
EP3893263A1 (en) * 2020-04-06 2021-10-13 ASML Netherlands B.V. Aperture assembly, beam manipulator unit, method of manipulating charged particle beams, and charged particle projection apparatus

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3763446B2 (ja) * 1999-10-18 2006-04-05 キヤノン株式会社 静電レンズ、電子ビーム描画装置、荷電ビーム応用装置、および、デバイス製造方法
JP2001284230A (ja) * 2000-03-31 2001-10-12 Canon Inc 電子光学系アレイ、これを用いた荷電粒子線露光装置ならびにデバイス製造方法
JP4585661B2 (ja) * 2000-03-31 2010-11-24 キヤノン株式会社 電子光学系アレイ、荷電粒子線露光装置およびデバイス製造方法
JP4947842B2 (ja) * 2000-03-31 2012-06-06 キヤノン株式会社 荷電粒子線露光装置
JP2001283756A (ja) * 2000-03-31 2001-10-12 Canon Inc 電子光学系アレイ、これを用いた荷電粒子線露光装置ならびにデバイス製造方法
JP4615816B2 (ja) * 2002-11-14 2011-01-19 キヤノン株式会社 電子レンズ、その電子レンズを用いた荷電粒子線露光装置、デバイス製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12243714B2 (en) 2020-02-28 2025-03-04 Asml Netherlands B.V. Lens designs

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