JP4540395B2 - Filtration device - Google Patents

Description

  The present invention relates to a filtration device, and more particularly to a filtration device having a mechanism for supplying a gas into a fluid.

  In order to purify the water to be treated including the object to be removed, various types of filtration devices are used for reasons such as excellent purification accuracy, a small installation space, and easy operation. However, the object to be removed adheres to the membrane surface as the filtration continues. Accordingly, the object to be removed closes the pores on the membrane surface, and the filtration performance gradually decreases, and finally filtration becomes impossible.

  Accordingly, an example of a filtration device for maintaining filtration performance will be described with reference to FIG. First, the configuration of the filtration device 100 will be described. A plate-like support member 102 is suspended by attaching an opening portion of a filtration membrane 101 in a bag shape. A cover 103 is provided so that the inside and outside of the filtration membrane are separated and the inside communicates with the filtration membrane 101. Further, a spacer 108 is provided so that the filtration membrane 101 does not come into close contact with the filtration pressure. Such a filtration apparatus 100 is immersed in the stock solution storage tank 104 in which the stock solution 105 is stored, and performs filtration by sucking the filtrate 106 from the filtrate collection pipe 110.

Here, a bubble generating device 107 is provided at the lower part of the stock solution storage tank 104 in order to remove the deposit made of the object to be removed deposited on the surface of the filtration membrane 101. Therefore, the filtration performance can be maintained by removing the deposit using bubbles generated from the bubble generation device 107 (see Patent Document 1).
JP-A-7-88338

  However, in the above-described method for generating bubbles, as the concentration of the object to be removed increases, the object begins to accumulate at the bottom of the filtration tank, and gradually the object to be removed accumulates at the bubble outlet 109 of the bubble generation device 107. Clogging will occur. Therefore, there is a problem that the filtration function cannot be maintained for a long time.

  Further, when clogging occurs, the efficiency of removing deposits on the surface of the filtration membrane is deteriorated, so that the work for repairing the bubble generating device 107 is required. However, the transparency of the stock solution 105 is extremely low. Therefore, the repair work in the stock solution 105 is very difficult. Therefore, in order to perform repair work, it is necessary to extract the stock solution 105 from the raw water storage tank 104 or to move the bubble generating device 107 out of the raw water storage tank. However, along with such repair work, the filtration device or the production line having the filtration device must also be stopped, and problems such as cost, period, and productivity reduction required for the repair work have been pointed out. .

  The present invention has been made in view of the above problems. Accordingly, a main object of the present invention is to provide a filtration device that is easy to maintain and manage and that can efficiently maintain a filtration function for a long period of time.

  The filtration device of the present invention generates a gas from the tip of a filtration filter immersed in a fluid containing an object to be removed, and extending from the outside of the fluid to a position below the filtration filter in the liquid. A first pipe, and a second pipe connected to the first pipe for supplying gas to the first pipe, the first pipe and the second pipe being connected to the fluid It is connected externally.

  Further, the filtration device of the present invention includes a filtration filter immersed in a fluid containing an object to be removed, a gas extending from the outside of the fluid to a position below the filtration filter in the fluid, A pipe to be generated and a guide pipe whose position is fixed inside the fluid are provided, and the pipe extends inside the guide pipe.

  According to the filtration device of the present invention, the first pipe that generates bubbles from below the filtration filter and the second pipe that supplies gas to the first pipe are connected outside the fluid. Therefore, it is possible to replace only the first pipe in which the problem occurred while the filtration device is operating without affecting the production line using the filtration device, greatly reducing the cost and time required for maintenance. Can be shortened.

  Further, according to the filtering device of the present invention, the pipe is extended inside the guide pipe whose position is fixed inside the fluid. Therefore, the pipe can be arranged at a predetermined position, and more accurate supply of bubbles is possible. Thereby, the deposit on the filtration filter can be uniformly removed. In addition, when exchanging pipes, it becomes possible to arrange new pipes accurately and easily.

  The present embodiment relates to a filtering device, and more particularly to a bubble generating means used in the device. Here, as an example of the substance to be removed, when slicing a crystal ingot into a wafer, dicing a semiconductor wafer, back grinding, CMP (Chemical-Mechanical Polishing) or wafer polishing, etc. The to-be-removed object generated by the above process includes organic substances such as Si, oxidized Si, Al, SiGe, sealing resin, and other insulating materials and metal materials. In the compound semiconductor, a compound semiconductor such as GaAs is applicable.

  Recently, dicing has been adopted in the manufacture of CSP (chip scale package). In this method, the surface of the wafer is coated with a resin, and the finally sealed resin and the wafer are diced together. There is also a type in which semiconductor chips are arranged in a matrix on a ceramic substrate, the resin is coated including the ceramic substrate, and the sealed resin and the ceramic substrate are finally diced. When these are also diced, an object to be removed is generated.

  On the other hand, there are many places where removed objects are generated even outside the semiconductor field. For example, in an industry that uses glass, in a liquid crystal panel, a panel of an EL display device, and the like, glass waste generated by dicing a glass substrate, polishing a side surface of the substrate, and the like corresponds to an object to be removed. In addition, electric power companies and steel companies employ coal as a fuel, which corresponds to powder generated from coal, and further, powder mixed in smoke emitted from the chimney corresponds to the object to be removed. This is also the case for powders generated from processing minerals, gemstones, and tombstones. Furthermore, metal scraps generated when processing with a lathe, ceramic scraps generated by dicing, polishing, etc. of a ceramic substrate also correspond to objects to be removed.

  These objects to be removed are generated by processes such as polishing, grinding, or pulverization, and a fluid such as water or chemicals is flowed for the purpose of removing the objects to be removed. For this reason, an object to be removed is mixed in the fluid.

  In the following, there are various types of fluids and objects to be removed as described above. Here, it is assumed that water is used as the fluid and the objects to be removed are included in the water. Go.

  First, with reference to FIG. 1, the structure of the filtration apparatus of this form is demonstrated. FIG. 1A is a perspective view of the filtration device of this embodiment as viewed from above, and FIG. 1B is a schematic diagram of the filtration device of this embodiment.

  With reference to FIG. 1 (A), the filtration apparatus of this form of the support body 10 which has an opening part in an upper surface and a bottom face, the several filtration filter 11 accommodated in the inside of the support body 10, and the filtration filter 11 of FIG. An air diffusion mechanism 12 for supplying bubbles from below is installed on the upper portion of the support 10. The air diffusion mechanism 12 includes a hollow second pipe 14 through which gas can pass, and a first pipe for extending the gas to a predetermined position. The first pipe 14 extends from the second pipe 14. It is composed of a pipe 13. The gas flows in from the inlet 15, passes through the second pipe 14, and is sent to the first pipe 13. The first pipe 13 is guided to the lower part of the filtration device by the guide tube 20, and the gas is generated as bubbles from below the filtration filter 11. Here, the solid line arrow in the figure shows the flow of filtered water to be treated, and the broken line arrow shows the flow of gas.

  With reference to FIG. 1 (B), the detail of the filtration apparatus of this form is demonstrated.

  The second pipe 14 is provided with a plurality of inlets 15 through which gas flows. By this mechanism, the flow rate of the gas flowing to each of the first pipes 13 is made uniform. Further, the second pipe 14 and the first pipe 13 are mechanically connected via a connection portion 16, and have a mechanism that can be attached and detached at the connection portion.

  Further, a valve 17 is provided for each first pipe. Thereby, the gas flow rate supplied to each said 1st pipe 13 can be controlled, and the control of the generation amount of a bubble further is attained. Moreover, the first pipe 13 is immersed in the water to be treated. If a problem such as clogging occurs in the first pipe 13, the corresponding valve 17 can be closed and the first pipe 13 can be removed from the connection portion 16 and replaced.

  This mechanism is a feature of the present invention, and as described in the section of the problem to be solved by the invention, without moving the filtering device and the air diffuser mechanism 12 or stopping the entire air diffuser mechanism 12, The replacement work of the first pipe 13 can be performed in a state where the filtering device is in operation. In other words, the replacement work can be performed outside the drainage, thereby improving work efficiency and work accuracy.

  The support 10 has four plates bonded to four columns, and has openings on the top and bottom surfaces. This has a structure in which bubbles that have flowed in through the opening at the bottom can be confirmed. In addition, a guide tube 20 is fixed to the plate located on the side surface of the support 10, and the first pipe 13 passes through the guide tube 20. As can be seen from the figure, the guide tube 20 extends from the upper surface of the support 10 to the side, and is curved inward at the lower end of the plate. Here, the upper part of the guide tube 20 protrudes from the surface of the water to be treated. Accordingly, when only the first pipe 13 in question is exchanged, the new first pipe 13 can be accurately arranged from the outside simply by passing the new first pipe 13 through the guide pipe 20. This can be arranged accurately if the length of the first pipe is determined, and can be fixed at the tip if the tip of the guide tube becomes thinner than the first pipe. Since the drainage is generally cloudy, if such a mechanism is employed, the position of the bubble generation portion can be accurately regulated. Although not shown in the drawing, a groove is formed on the inner side of the support 10, for example, the above-described plate in order to arrange the plate-like filtration filters 11 at equal intervals.

  With reference to FIG. 2, the bubble 18 which generate | occur | produces from the 1st pipe 13 is demonstrated. FIG. 2 is a diagram in which the filtration device is immersed in the water to be treated 19. 2A is a view from the filtration surface, and FIG. 2B is a view from the right hand of FIG. 2A.

  As described above, the first pipe 13 passes through the guide pipe 20 and is disposed at a predetermined position. The bubble 18 is discharged from the jet outlet 24 at the tip of the first pipe 13 and rises. However, the bubbles are flattened by receiving pressure from the water to be treated. For this reason, the bubbles 18 do not rise vertically, and the rising path of the bubbles 18 fluctuates irregularly. As a result, the bubbles 18 are spread over the entire surface of the filter 11.

  Further, the outlet 24 of the first pipe 13 and the bottom surface of the filtration filter 11 are separated by a distance L. Accordingly, the bubbles are dispersed and rub the surface of the filter widely. In this embodiment, appropriate diffusion of the bubbles 18 is realized by setting L = about 400 mm. Furthermore, since the support 10 covers the periphery of the filtration filter 11, the bubbles 18 are not easily affected by the flow of the water to be treated 19, and the bubbles can be uniformly dispersed.

  Further, the jet outlet 24 is arranged at a distance from the bottom surface of the tank, and is installed in the lateral direction parallel to the bottom surface. As a result, even if an object to be removed accumulates in the tank, the mechanism does not cause clogging to a certain extent.

  With reference to FIG. 3, the guide tube 20 installed outside the side surface of the support 10 will be described. FIG. 3A is a perspective view from above of the support 10 on which the guide tube 20 is installed. FIGS. 3B and 3C are top views of the support 10. Here, the first pipes 13 are arranged in a staggered manner.

  With reference to FIG. 3A, the guide tube 20 is mechanically connected to the outside of the side surface of the support 10. The material of the guide tube 20 is a material excellent in workability, water resistance and weather resistance, for example, a pipe-shaped material made of vinyl chloride and having an outer diameter of 6 mm and an inner diameter of 4 mm is used, but is not limited thereto.

  With reference to FIGS. 3B and 3C, a mechanism for making the distribution of bubbles uniform will be described. The elliptical shape indicated by the dotted line is the distribution of bubbles generated from the respective guide tubes, and it is preferable that the ellipses do not overlap as much as possible. As one countermeasure, in FIG. 3B, the opposing guide tubes 20 are arranged alternately. 3C is different from FIG. 3B in that the installation positions of the opposing guide tubes 20 are the same. Instead, one is long and the other is short.

  FIG. 4 shows a mechanism in which the bubble distribution is uniform and clogging is prevented. Here, the guide tube 20 is composed of a first guide tube on one wall, a second guide tube on the other wall, and a third guide tube (this is an aeration tube) that connects the two at the bottom. It has a letter shape. In addition, the third guide tube 20 is provided with a plurality of bubble discharge holes 21 facing downward.

  As shown in FIG. 4C when FIG. 4A is viewed from below, the bubble discharge holes 21 are provided in a staggered arrangement with each other. Furthermore, the first pipe 13 accommodated in the guide tube 20 having such a configuration is connected to the connecting portion 16 at both ends, and is U-shaped like the guide tube. The first pipe 13 is provided with a hole from which bubbles 18 are ejected. Here, in order to prevent gas from flowing out from both ends of the guide tube 20, the space between the guide tube 20 and the first pipe 13 is sealed with resin or the like. The exchange method will be described. First, one end of the old first pipe 13 to be replaced is connected to one end of the new first pipe 13. Next, the other end of the old first pipe 13 is pulled out. In this way, the replacement work of the first pipe 13 can be performed efficiently.

  FIG. 5 is a schematic view of the filter membrane. 30 is a first filter membrane, and 32 is a filter hole. The film formed in a layered manner on the exposed portion of the filter hole 32 and the surface of the first filter film 20 is the objects 33 and 34 to be removed, and these objects 33 and 34 cannot be passed through the filter hole 32. The object to be removed 33 and the small object to be removed 34 that can pass through the filter hole 32 are divided. In FIG. 5, what is indicated by a black circle is a small object 34 to be removed.

  The first filter film 30 that can be employed here can be either organic polymer type or ceramic type in principle. However, here, a polyolefin polymer film was used.

  Above the first filter membrane 30 in FIG. 5A, there is waste water mixed with the object to be removed, and below the first filter membrane 30 is a filtered fluid filtered by the first filter membrane 30. Has been generated. In order to flow the wastewater in the direction of the arrow and filter the wastewater using the first filter membrane 30, the water is naturally dropped or pressurized and moved downward in the figure. Further, drainage is sucked from the side where the filtering fluid is present. In addition, the first filter film 30 is disposed horizontally, but is actually placed vertically.

  As described above, as a result of pressurizing or sucking the wastewater through the filter membrane, the wastewater passes through the first filter membrane 30. At that time, a large object 33 that cannot pass through the filter hole 32 remains on the surface of the first filter film 30.

  In the present invention, a layer in which an object to be removed is captured and left on the surface of the first filter film 30 is used as the second filter film 31.

  Objects to be removed generated by machining such as grinding, polishing or pulverization are distributed within a certain range (size), and the shapes of the objects to be removed are different. Further, objects to be removed are randomly located in the waste water in which the first filter film 30 is immersed. A large object to a small object to be removed moves to the filter holes 32 irregularly. At this time, the removal target 34 smaller than the filter hole 32 passes, but the removal target 33 larger than the filter hole 32 is captured. Then, the captured large object 33 becomes the first layer of the second filter film 31, and this layer forms a filter hole smaller than the filter hole 32, and the large object to be removed 23 passes through this small filter hole. Small objects to be removed 34 are captured. At this time, since the shapes of the objects to be removed are different from each other, gaps of various shapes are formed between the objects to be removed, and water moves through the gaps and is finally filtered. The This is very similar to the good drainage of sandy beaches.

  The second filter film 31 grows gradually while randomly capturing small objects to be removed from large objects 33, and traps the small objects to be removed while securing a water (fluid) passage. become. Moreover, since the second filter film 31 remains in a layer shape and the object to be removed can be easily moved, bubbles are passed near the layer, a water flow is applied, a sound wave or an ultrasonic wave is applied, By applying mechanical vibration or rubbing with a squeegee or the like, the surface layer of the second filter membrane 31 can be easily moved to the drainage side. That is, even if the filter capacity of the second filter film 31 is reduced, it is possible to easily return the capacity by applying an external force to the second filter film 31. In other words, the cause of the decrease in the filter capacity is mainly clogging, and the object to be removed on the surface layer of the second filter film 31 causing the clogging is moved again into the fluid. Can be clogged.

  However, when the first filter film 30 is newly attached, the layers of the objects to be removed 33 and 34 (second filter film 21) are not formed on the surface of the first filter film 30. When a thin layer of the second filter film 31 is formed on one filter film 30, a small object to be removed 34 passes through the filter hole 32. At this time, the filtered fluid is returned again to the side where the wastewater is stored, and the process waits until it is confirmed that the small object to be removed 34 is captured by the second filter film 31. After confirmation, small objects to be removed such as the small objects to be removed 34 that have passed through are captured one after another, and the wastewater is filtered with a predetermined cleanliness.

  Furthermore, in the present invention, when the second filter film 31 is not formed or when a small object to be removed 34 remains in the filtered fluid, the filtered fluid is returned to the drainage side. During the returning process, the removal objects 33 and 34 trapped in the filter hole 32 grow as a layer on the surface of the first filter film 30, and the second filter on the surface of the first filter film 30. The filter film 31 creates various filter hole diameters, and traps those having a small particle diameter and a large particle diameter one after another. Then, it gradually becomes thicker, traps a small object to be removed 34 that has passed through the first filter membrane 30, a size approximately the same as this small object to be removed 34, and smaller objects to be removed. It becomes a clean state with no object to be removed.

  FIG. 5B shows this state. Then, after confirming that an object to be removed of a desired size is not mixed in the filtered fluid (and that the amount is smaller than a predetermined degree of mixing), the filtered fluid may be reused. Furthermore, the filtered fluid may be returned to nature.

  In addition, when a small object to be removed 34 remains in the filtered fluid, the filtered fluid is not returned, but is transferred to another tank, and the object to be removed is about the same size as the small object 34 or the object 34 to be removed. After confirming that the removed matter is captured, the subsequent filtered fluid may be reused or returned to nature.

  Next, the function of the filtration device of the present embodiment will be described with reference to FIG.

  As described above, the cause of the decrease in the filter capacity is mainly clogging, and the object to be removed on the surface layer of the second filter film 31 generating the clogging is moved again into the fluid. Clogging can be eliminated.

  FIG. 6 shows details of a method of removing the second filter film 31 using bubbles. Here, if the pipe 35 side is sucked by a pump or the like, it is filtered by flowing water as indicated by an arrow without hatching. In addition, a second filter film 31 made of an object to be removed is formed on the surface of the first filtration film 30. Since the second filter film 31 is a deposited substance to which an object to be removed adheres, the second filter film 31 can be removed entirely or partially by applying an external force. The removal method can be realized by rubbing the surface using the rising force of bubbles.

  Referring to FIG. 6, the bubble rises in the direction of the arrow indicated by the oblique lines, and the rising force of the bubble and the bursting of the bubble directly apply an external force to the object to be removed, and also occur due to the rising force of the bubble and the bursting of the bubble. Water flow gives external force to the object to be removed. With this external force, the filtration capacity of the second filter membrane 31 is constantly refreshed and maintains a substantially constant value.

  A feature of this embodiment is that the filtration capacity is always maintained by using the air diffusion mechanism 12 shown in FIGS. That is, even if clogging occurs in the second filter film 31 and the filtration capacity thereof is reduced, the external force that moves the object constituting the second filter film 31 is applied as in the case of the bubbles. The to-be-removed object which comprises the 2 filter membranes 21 can be moved to the waste_water | drain side, and a filtration capability can be maintained over a long term.

  In addition, as long as the filtration capability can be maintained, an external force may be applied constantly or intermittently. Further, in the above-described embodiment of the present invention, the specific number of the first pipes is not mentioned, but there is no particular limitation and it is desirable to consider according to the work purpose. In addition, various modifications can be made without departing from the scope of the present invention.

  With reference to FIG. 7, the specific embodiment of the filtration apparatus of this form is described.

  A pipe 40 is provided above the raw water tank 22 as raw water supply means. This pipe 40 is a passage of fluid mixed with an object to be removed. For example, in the semiconductor field, waste water (raw water) mixed with an object to be removed flowing out from a dicing apparatus, a back grinding apparatus, a mirror polishing apparatus, or a CMP apparatus passes. These objects to be removed are generated when the crystal ingot is sliced into a wafer. The drainage will be described as drainage mixed with silicon waste flowing from the dicing apparatus.

  In the water to be treated 19 stored in the raw water tank 22, a filtration device as the device of the present invention is immersed. Further, the filtration filter 11 is connected to a pipe 41 and suction-filters the water to be treated 19 by a small pump 46. Here, the part surrounded by the broken line is the air diffusion mechanism 12. Further, gas is supplied from the blower 50 to the air diffusion mechanism 12. First, the flow rate of the gas supplied to the second pipe 14 by the first valve 48 is set. Next, the gas flow rate supplied to each first pipe by the second valve 49 is set. The filtered water filtered by the filtration filter 11 is selectively transported via the switching valve 42 to the pipe 43 toward the raw water tank 22 and the pipe 44 toward the reuse (or drainage) side. The raw water tank 22 is provided with an outflow pipe 51 and an outflow valve 52.

  The treated water 19 supplied from the pipe 40 is stored in the raw water tank 22 and filtered by the filter 11. The surface of the filter membrane attached to the filtration filter 11 is maintained so that bubbles 18 pass through it, and silicon dust trapped in the filter membrane is moved by the rising force and rupture of the bubbles, so that the filtration ability is not always reduced. Yes.

  In addition, when a filter membrane is newly attached, stopped for a long time due to a holiday, or when silicon waste is mixed in the pipe 41, filtered water is supplied to the raw water tank 22 through the pipe 43 using the switching valve 42. It is designed to circulate. Other than that, the switching valve 42 is switched to the pipe 44 and the filtered water is reused.

  If the object to be removed is higher than the predetermined mixing rate, the filtered water is determined as abnormal water, and the circulation is automatically started, or the pump is stopped and the filtration is stopped. When circulating, the supply of fluid from the pipe 40 to the raw water tank 22 may be stopped in consideration of the overflow of the waste water from the raw water tank 22.

  The sensor 45 constantly senses silicon scrap. The amount of silicon waste in the filtered water can be detected by detecting the transparency of the filtered water using an optical sensor with a light receiving / light emitting element as the sensor 45. The light emitting element may be a light emitting diode or a laser. The sensor 45 may be attached in the middle of the pipe 41 or in the middle of the pipe 44, but in the present invention, a state in which the sensor 45 is attached in the middle of the pipe 41 will be described as an example.

  On the other hand, the raw water tank is concentrated over time. And when it becomes a desired density | concentration, a precipitate is processed by the method of stopping a filtration operation | work and performing the aggregation precipitation or the method of collect | recovering silicon | silicones with a filter press.

  As described above, the system shown in FIG. 7 includes the raw water tank 22, the filtration filter 11, and the small pump 46.

  As described above, the filtration apparatus employed in this embodiment has a refresh mechanism, and is a mechanism that can prevent clogging of the filter. Therefore, the waste water in the tank has a higher concentration than the conventional one. Therefore, the high concentration object to be removed naturally settles in the tank and clogs the bubble generating means arranged below the tank.

However, if the mechanism of the present invention is employed, the problem can be solved with a simple mechanism without stopping the filtration device.

It is the (A) perspective view and (B) schematic diagram which show the filtration apparatus of this invention. It is a (A) and (B) schematic diagram explaining the bubble spreading | diffusion of the filtration apparatus of this invention. It is a (A)-(C) schematic diagram which shows the filtration apparatus of this invention. It is a (A)-(C) schematic diagram which shows the filtration apparatus of this invention. It is a (A) and (B) schematic diagram explaining the filtration mechanism of the filtration device of the present invention. It is a schematic diagram explaining the filtration mechanism of the filtration apparatus of this invention. It is a mimetic diagram explaining an embodiment of a filtration device of the present invention. It is a schematic diagram for demonstrating the conventional filtration apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 Support body 11 Filtration filter 12 Air diffusion mechanism 13 1st pipe 14 2nd pipe 15 Inflow port 16 Connection part 17 Valve 18 Bubble 19 Water to be processed 20 Guide pipe 21 Bubble discharge hole 22 Raw water tank 30 First filter membrane 31 Second filter membrane 32A Large object to be removed 32B Small object to be removed 33 Filter hole

Claims (4)

A filtration filter immersed in a fluid containing an object to be removed;
A support body having a side surface extending vertically in the fluid and located outside the filtration filter;
Fixed to the side surface of the support, has one end above the fluid level of the fluid, enters the fluid, and curves inward from below the side surface of the support toward the filter, A guide tube having the other end below;
A first gas-passing passage that passes through the guide tube from one end of the guide tube to the other end of the guide tube, and whose tip extends to a position spaced downward from the bottom of the filtration filter. Pipes,
A second pipe for passing gas provided on the liquid surface of the fluid;
Have
The second pipe and the first pipe can be attached and detached via a connecting portion,
The gas passes through the first pipe from the second pipe, is discharged from the tip of the first pipe to become bubbles, and the bubbles pass through the surface of the filtration filter. Filtration device. The filtration device according to claim 2, wherein a tip end of the first pipe is spaced apart from a bottom of a tank in which the fluid is accommodated. The filtration device according to claim 1, wherein the second pipe is provided with a plurality of the gas inlets, and the second pipe is attached with a plurality of the first pipes. The support has openings on the top and bottom, has four side surfaces so as to surround the filter, and a plurality of the guide tubes are respectively arranged on two opposing side surfaces to face each other. The filtration apparatus according to claim 3, wherein the first pipe is attached to a pipe.

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