JP4520470B2 - 蒸気、液体又は固体表面の活性化処理方法及び活性化処理装置 - Google Patents
蒸気、液体又は固体表面の活性化処理方法及び活性化処理装置 Download PDFInfo
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Description
11 空間
20 光照射手段
30 磁界印加手段
40 容器
41 水
80 板
81、85 表面
82 筒体
83 内部表面
84 球体
図3は、リン酸バッファー液(PBS)又は水における人工培養細胞のカルシウムイオン(Ca++)チャネルの応答の測定結果を示す図である。ここで、図3(a)は活性化処理された水が添加されたPBS又は活性化処理された水におけるものであり、図3(b)は活性化処理されていない水が添加されたPBS又は活性化処理されていない水におけるものであり、図3(c)はATPが添加されたPBS又はATPが添加された活性化処理されていない水におけるものであり、図3(d)は活性化処理された水及びATP受容体阻害剤であるスラミンが添加されたPBS又はスラミンが添加された活性化処理された水におけるものである。なお、図3において、横軸は時間を示し、縦軸はCa++濃度の増加率を示している。
図6は、固体表面におけるルシフェリン−ルシフェラーゼ反応による発光を実証する写真である。ここで、図6(a)は、6ヘルツ、10ミリガウスの交流磁界、40℃の温度下で可視光を照射して、72時間活性化処理した水を入れたポリプロピレン製容器等の写真であり、図6(b)は図6(.a)で示される活性化処理した容器等から水を除去後、常温下で乾燥させてからルシフェリン−ルシフェラーゼ溶液を浸した状態にあるポリプロピレン製容器等の写真であり、図6(c)は図6(a)、図6(b)の合成写真である。
Claims (16)
- 外部磁界が遮蔽された遮蔽容器内で蒸気又は液体と前記蒸気又は液体が入れられた容器の温度を一定に保ち、
前記蒸気又は液体と前記容器とに交流磁界を印加し、
前記蒸気又は液体と前記容器とに光を照射し、
前記外部磁界が遮蔽され、かつ温度が一定に保たれた蒸気又は液体と容器とに、交流磁界の印加及び光の照射を72時間以上行ってから、前記容器内表面の前記蒸気又は液体を抽出する
ことを特徴とする蒸気又は液体の活性化処理方法。 - 前記蒸気又は液体と前記容器との温度を20℃〜60℃に調節する
ことを特徴とする請求項1に記載の蒸気又は液体の活性化処理方法。 - 前記蒸気又は液体と前記容器とに印加する交流磁界の周波数は、0.01ヘルツ〜1メガヘルツである
ことを特徴とする請求項1又は2に記載の蒸気又は液体の活性化処理方法。 - 前記蒸気又は液体と前記容器とに印加する交流磁界の強度は、0.1ミリガウス〜100ガウスである
ことを特徴とする請求項1〜3のいずれか1項に記載の蒸気又は液体の活性化処理方法。 - 前記蒸気又は液体と前記容器とに照射する光は、光量が500〜10万ルクスの可視光である
ことを特徴とする請求項1〜4のいずれか1項に記載の蒸気又は液体の活性化処理方法。 - 固体表面を蒸気又は液体で覆い、
外部磁界が遮蔽された遮蔽容器内で前記蒸気又は液体と前記固体の温度を一定に保ち、
前記蒸気又は液体と前記固体とに交流磁界を印加し、
前記蒸気又は液体と前記固体とに光を照射し、
前記外部磁界が遮蔽され、かつ温度が一定に保たれた蒸気又は液体と固体とに、交流磁界の印加及び光の照射を72時間以上行ってから、前記固体表面から前記蒸気又は液体を除去する
ことを特徴とする固体表面の活性化処理方法。 - 前記蒸気又は液体と前記固体との温度を20℃〜60℃に調節する
ことを特徴とする請求項6に記載の固体表面の活性化処理方法。 - 前記蒸気又は液体と前記固体とに印加する交流磁界の周波数は、0.01ヘルツ〜1メガヘルツである
ことを特徴とする請求項6又は7に記載の固体表面の活性化処理方法。 - 前記蒸気又は液体と前記固体とに印加する交流磁界の強度は、0.1ミリガウス〜100ガウスである
ことを特徴とする請求項6〜8のいずれか1項に記載の固体表面の活性化処理方法。 - 前記蒸気又は液体と前記固体とに照射する光は、光量が500〜10万ルクスの可視光である
ことを特徴とする請求項6〜9のいずれか1項に記載の固体表面の活性化処理方法。 - 蒸気又は液体と固体表面とを活性化処理する装置であって、
前記蒸気又は液体と前記固体とを取り囲み、外部磁界から遮蔽する磁界遮蔽手段と、
前記磁界遮蔽手段で取り囲まれた空間に配設され、前記蒸気又は液体と前記固体を一定の温度に保つ温度調節手段と、
前記蒸気又は液体と前記固体とに交流磁界を印加する磁界印加手段と、
前記蒸気又は液体と前記固体とに光を照射する光照射手段とを含み、
前記交流磁界の印加及び光の照射は、72時間以上行われる
ことを特徴とする活性化処理装置。 - 前記磁界遮蔽手段は、強磁性体から構成される容器である
ことを特徴とする請求項11に記載の活性化処理装置。 - 前記温度調節手段は、前記蒸気又は液体と前記固体との温度を20℃〜60℃に調節する
ことを特徴とする請求項11又は12に記載の活性化処理装置。 - 前記磁界印加手段は、0.01ヘルツ〜1メガヘルツの周波数の交流磁界を前記蒸気又は液体と前記固体とに印加する
ことを特徴とする請求項11〜13のいずれか1項に記載の活性化処理装置。 - 前記磁界印加手段は、0.1ミリガウス〜100ガウスの強度の交流磁界を前記蒸気又は液体と前記固体とに印加する
ことを特徴とする請求項11〜14のいずれか1項に記載の活性化処理装置。 - 前記光照射手段は、光量が500〜10万ルクスの可視光を前記蒸気又は液体と前記固体とに照射する
ことを特徴とする請求項11〜15のいずれか1項に記載の活性化処理装置。
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PCT/JP2005/000198 WO2006075358A1 (ja) | 2005-01-11 | 2005-01-11 | 蒸気、液体又は固体表面の活性化処理方法及び活性化処理装置ならびにそれらを用いて活性化処理された蒸気、液体または固体 |
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JPWO2006075358A1 JPWO2006075358A1 (ja) | 2008-06-12 |
JP4520470B2 true JP4520470B2 (ja) | 2010-08-04 |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH02211288A (ja) * | 1989-02-10 | 1990-08-22 | Nippon Gijutsu Kaihatsu Center:Kk | 水又は水を含有する物質の活性化方法 |
JPH05123677A (ja) * | 1991-08-23 | 1993-05-21 | Hiroshi Tachibana | 水処理装置 |
JPH06190368A (ja) * | 1992-12-25 | 1994-07-12 | Makoto Yafuji | ミネラル含有物質からのミネラル成分のイオン化方法およびこのイオン化に使用する装置 |
JP2003088873A (ja) * | 2001-09-19 | 2003-03-25 | Japan Science & Technology Corp | 水分子の導電率の増殖的増加方法およびその装置 |
JP2004223342A (ja) * | 2003-01-21 | 2004-08-12 | Japan Science & Technology Agency | 水分子及び生命の活性化磁界発生方法及び装置 |
JP2004283776A (ja) * | 2003-03-24 | 2004-10-14 | Hamamatsu Photonics Kk | 機能水の製造装置及び製造方法 |
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JPH10276597A (ja) * | 1997-04-09 | 1998-10-20 | Ryoda Sato | 活性水を用いた水耕栽培システム及び養殖システム |
JP2000254652A (ja) * | 1999-03-05 | 2000-09-19 | Kankyo Hozen Kk | 水の磁気処理装置 |
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Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02211288A (ja) * | 1989-02-10 | 1990-08-22 | Nippon Gijutsu Kaihatsu Center:Kk | 水又は水を含有する物質の活性化方法 |
JPH05123677A (ja) * | 1991-08-23 | 1993-05-21 | Hiroshi Tachibana | 水処理装置 |
JPH06190368A (ja) * | 1992-12-25 | 1994-07-12 | Makoto Yafuji | ミネラル含有物質からのミネラル成分のイオン化方法およびこのイオン化に使用する装置 |
JP2003088873A (ja) * | 2001-09-19 | 2003-03-25 | Japan Science & Technology Corp | 水分子の導電率の増殖的増加方法およびその装置 |
JP2004223342A (ja) * | 2003-01-21 | 2004-08-12 | Japan Science & Technology Agency | 水分子及び生命の活性化磁界発生方法及び装置 |
JP2004283776A (ja) * | 2003-03-24 | 2004-10-14 | Hamamatsu Photonics Kk | 機能水の製造装置及び製造方法 |
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JPWO2006075358A1 (ja) | 2008-06-12 |
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