JP4490747B2 - Gas-liquid distribution structure and distiller - Google Patents

Description

  The present invention relates to a gas-liquid distribution structure and a distiller that efficiently perform distillation and partial condensation.

Conventionally, a gas-liquid distribution structure and a distiller for performing distillation and partial condensation have been known. For example, in Patent Document 1 below, a liquid flow path and a gas discharge flow path are provided adjacent to each other, and the liquid flow path uniformly distributes the liquid introduced into the liquid flow path within the liquid flow path. There is disclosed a gas-liquid distribution structure characterized in that the liquid distribution flow path is configured as described above.
JP 2004-89835 A

  However, the thing of patent document 1 is the gas-liquid distribution structure incorporated in a part of layer of the plate fin heat exchanger, and achieved the simplification of the structure of the whole apparatus. When the flow rate of the liquid decreases, the flow rate of the liquid becomes uneven in the width direction of the flow path, and as a result, the efficiency of distillation may decrease.

  Therefore, an object of the present invention is to provide a gas-liquid distribution structure that suppresses the deviation of the liquid flow rate, a compact heat exchange distiller with high distillation efficiency using the gas-liquid distribution structure, and a gas-liquid contact area. And to provide a still having a structure with high distillation efficiency.

Means and effects for solving the problems

The gas-liquid distribution structure according to the present invention includes a gas-liquid contact channel for contacting the flowing liquid and the rising gas, two liquid lower channels connected to the gas-liquid contact channel through which the liquid flows, and the 2 one of the liquids channel you supplied by overflow liquid to the liquid downstream path, and a gas discharge flow path for discharging the gas from the gas-liquid contact flow path, the two liquid downstream path the gas It is arranged on both sides across the discharge channel.
With the above configuration, even when the flow rate of the supplied liquid is reduced, the liquid flow rate is not biased in the width direction of the flow path, so that it is possible to suppress a reduction in distillation efficiency.
In another aspect, the gas-liquid distribution structure according to the present invention includes a gas-liquid contact channel for contacting the flowing liquid and the rising gas, and a liquid lower channel connected to the gas-liquid contact channel through which the liquid flows. , A liquid flow path for supplying liquid to the liquid lower flow path by overflow, and two gas discharge flow paths for discharging gas from the gas-liquid contact flow path, the two gas discharge flow paths being It is arranged on both sides across the liquid lower flow path .

In the gas-liquid distribution structure of the present invention, it is preferable that fins are provided in one or more of the liquid channel, the gas discharge channel, and the gas-liquid contact channel.
With the above configuration, the heat transfer performance is improved, the heat exchange efficiency is improved, the distillation efficiency is also improved, and further, the members forming the respective flow paths can be reinforced.

  The gas-liquid distribution structure of the present invention is preferably a rectangular parallelepiped type.

The heat exchange type distiller of the present invention comprises a combination of a plurality of at least one gas-liquid distribution structure selected from any of the gas-liquid distribution structures described above, and the adjacent gas-liquid distribution structures. It is preferable that these gas-liquid contact flow paths are adjacent. The heat exchange-type distiller refers to a distiller in which a high-temperature side gas-liquid distribution structure and a low-temperature side gas-liquid distribution structure are alternately arranged.
By the said structure, the distiller which improved the heat exchange efficiency can be provided.

  Hereinafter, embodiments of the present invention will be described with reference to the drawings. 1A is an upper cross-sectional view of the gas-liquid distribution structure according to the first embodiment of the present invention, FIG. 1B is a cross-sectional view taken along the line II in FIG. 1A, and FIG. These are the II-II arrow sectional drawing of Fig.1 (a). In FIG. 1A, the fins are omitted.

  As shown in FIG. 1, the gas-liquid distribution structure 10 according to the first embodiment has a rectangular parallelepiped shape, and the flowing liquid (black arrow in FIG. 1) and the rising gas (white arrow in FIG. 1). A gas-liquid contact channel 21 for contacting the gas, a gas discharge channel 22 for discharging the gas from the gas-liquid contact channel 21, and a liquid channel 23 for supplying liquid to the gas-liquid contact channel 21 by overflow And a liquid lower flow path 24 through which the liquid flows down. The gas discharge channel 22 is provided below the liquid channel 23 via a space 25. In addition, the gas discharge channel 22 and the liquid channel 23 are disposed downstream of the liquid via the partition plate 2 that is perpendicular to the ground and close to the side plate 1 at a predetermined interval in the gas-liquid distribution structure 10. It is provided adjacent to the path 24. Further, the gas-liquid contact channel 21 is provided below the gas discharge channel 22 and the liquid lower channel 24.

  The gas-liquid contact channel 21 is a space surrounded by partition plates 4 a and 4 b provided in parallel to the partition plate 2 and side plates 9 a and 9 b provided perpendicular to the side end surfaces of the partition plate 2. As shown in FIGS. 1B and 1C, fins 21a are provided in the gas-liquid contact channel 21 so that gas and liquid flow in the vertical direction. The type of the fin 21a is not particularly limited, and for example, a straight fin, a serrated fin, a perforated fin, or the like can be used. The same applies to the fins shown below.

  The gas discharge channel 22 is a space surrounded by the partition plates 2 and 4b, the plate member 3b fixed so as to be sandwiched between the partition plates 2 and 4b in a state of being horizontal to the ground, and the side plate 9a. is there. A gas discharge header 6 through which gas is discharged is provided outside the gas discharge port 22e of the gas discharge flow path 22, and a gas discharge nozzle 8 is provided at the tip thereof. For example, as shown in FIG. 1C, the gas discharge channel 22 includes fins 22 a through which gas flows in the horizontal direction and fins 22 b through which gas flows in the upper right direction of the gas-liquid distribution structure 10. And are provided. These fins 22a and 22b are in contact with each other at the boundary 22c, and are formed so that gas flows continuously. Further, the fin 22b and the fin 21a are in contact with each other at the boundary 22d, or have a gap of about 1 mm, for example, so that the gas continuously flows from the fin 21a to the fin 22b. .

  The liquid flow path 23 is fixed so as to be sandwiched between the partition plates 2 and 4b, the partition plates 2 and 4b in a horizontal state with respect to the ground, and the plate member 3a provided on the top of the plate member 3b and the side plate 9a. And the side plates 1 provided at the upper ends of the partition plates 4a and 4b and the side plates 9a and 9b. A liquid supply header 5 to which liquid is supplied is provided outside the liquid supply port 23f of the liquid channel 23, and a liquid supply nozzle 7 is provided at the tip thereof. For example, as shown in FIG. 1C, the liquid flow path 23 includes fins 23 a through which the liquid flows in the horizontal direction and fins 23 b through which the liquid flows in the diagonally upper left direction of the gas-liquid distribution structure 10. In addition, a so-called hardway type fin 23c is provided that resists the flow of the liquid and promotes spreading in the horizontal direction. The fins 23a and 23b are in contact with each other at the boundary 23d, and are formed so that the liquid flows continuously. The fin 23c is in contact with the fin 23b at the boundary 23e, or has a gap of about 1 mm, for example, so that the liquid from the fin 23b flows continuously to the fin 23c. Although not shown, the fin 23c may be a so-called easy-way type in which the direction of the fin is the vertical direction.

  The liquid lower flow path 24 is a space surrounded by the partition plates 2 and 4a, the side plates 9a and 9b, and the side plate 1, and is continuous with the liquid flow path 23 in the upper part and the gas-liquid contact flow path 21 in the lower part. It is a space. For example, as shown in FIG. 1 (b), the liquid lower flow path 24 includes vertical fins 24a and so-called hardway type fins 24b that resist the flow of liquid and promote horizontal expansion. Is provided. The fins 24a and 24b are in contact with each other at the boundary 24c, or have a gap of about 1 mm, for example, so that the liquid flows continuously. Further, the fin 24b and the fin 21a are in contact with each other at the boundary 24d, or have a gap of about 1 mm, for example, so that the liquid continuously flows from the fin 24b to the fin 21a. . The fins 24b may be vertical fins.

  The space 25 is a closed space surrounded by the partition plate 2, the plate members 3a and 3b, the partition plate 4b, and the side plates 9a and 9b, and does not allow fluid to enter. It should be noted that a predetermined interval needs to be provided between the liquid supply header 5 and the gas discharge header 6 so as not to hinder the welding operation of the liquid supply header 5 and the gas discharge header 6. Is provided. Inside the space 25, fins 25a are usually provided to increase the strength.

  Next, the operation of the gas-liquid distribution structure 10 will be described. First, the liquid supplied to the liquid supply nozzle 7 is supplied to the liquid supply header 5 and stored in the liquid flow path 23 including the fins 23a, 23b, and 23c. When the upper limit of the stored liquid exceeds the height of the partition plate 2, the supplied liquid overflows while promoting spreading in the horizontal direction, and the liquid flows down to the liquid lower flow path 24 including the fins 24a and 24b. To do. Thereafter, the liquid that has flowed down comes into contact with the gas rising from the lower part of the gas-liquid distribution structure 10 through the gas-liquid contact channel 21 provided with the fins 21a, and performs distillation. On the other hand, since the gas cannot enter the liquid lower flow path 24 filled with the liquid, the gas rises in the gas discharge flow path 22 including the fins 22 a and 22 b, and the gas discharge nozzle 8 passes through the gas discharge header 6. Discharged from.

  With such a configuration, even when the flow rate of the supplied liquid is reduced, the liquid flow rate is not biased in the width direction of the flow path, so that it is possible to suppress a reduction in distillation efficiency. Moreover, since the contact efficiency between gas and liquid is improved, the heat exchange efficiency can be improved. Further, the fins can enhance the heat transfer efficiency and the heat exchange efficiency, and can reinforce the members forming the respective flow paths.

  In addition, although the partition plate 2 in the gas-liquid distribution structure of the first embodiment has been separated from the side plate 1 at the top, as shown in FIG. May be bonded to the side plate 1. Further, the partition plate 12 may be provided such that the upper portion thereof is spaced from the side plate 1. The same applies to the following embodiments and modifications.

  Next, the gas-liquid distribution structure according to the second embodiment of the present invention will be described. 3A is an upper cross-sectional view of the gas-liquid distribution structure according to the second embodiment of the present invention, FIG. 3B is a cross-sectional view taken along the line III-III in FIG. 3A, and FIG. FIG. 4 is a cross-sectional view taken along the line IV-IV in FIG. In FIG. 3A, fins are omitted. In the following description of each embodiment, the description of the same parts as those in the first embodiment may be omitted.

  As shown in FIG. 3, the gas-liquid distribution structure 20 according to the second embodiment has a rectangular parallelepiped shape, and the flowing liquid (black arrow in FIG. 3) and the rising gas (white arrow in FIG. 3). Liquid in the gas-liquid contact channel 21, the gas discharge channel 26 for discharging the gas from the gas-liquid contact channel 21, the liquid lower channel 27 in which the liquid flows down, and the liquid in the gas-liquid contact channel 21 And a liquid flow path 29 for supplying the liquid by overflow. The gas discharge channel 26 is provided above the liquid channel 29 and the liquid lower channel 27. In addition, the liquid flow path 29 is adjacent to the liquid lower flow path 27 through the partition plate 2 that is disposed perpendicularly to the ground and spaced apart from the side plate 1 within the gas-liquid distribution structure 20. Is provided. The gas-liquid contact channel 21 is provided below the liquid channel 29 and the liquid lower channel 27.

  The gas discharge passage 26 is a space surrounded by the partition plates 4a and 4b and the side plates 1 and 9a. A gas discharge header 6 through which gas is discharged is provided outside the gas discharge port 26e of the gas discharge channel 26, and a gas discharge nozzle 8 is provided at the tip thereof. As shown in FIG. 3B, the gas discharge channel 26 includes fins 26 a through which gas flows in the horizontal direction and fins 26 b through which gas flows in the upper right direction of the gas-liquid distribution structure 20. Is provided. These fins 26a and 26b are in contact with each other at the boundary 26c, and are formed so that gas flows continuously.

  The liquid lower flow path 27 is a space surrounded by the partition plates 2, 4 a and the side plates 9 a, 9 b, the liquid flow path 29 and the gas discharge flow path 26 in the upper part, and the gas-liquid contact flow path 21 in the lower part. It is a continuous space. As shown in FIG. 3B, the liquid lower flow path 27 is provided with fins 27a in the vertical direction. In addition, since the gas discharge flow path 26 is provided in the upper part of the liquid lower flow path 27, the gas rising from below can pass through the flow path of the liquid lower flow path 27.

  The liquid flow path 29 includes a partition plate 2, 4b, a plate member 28a fixed so as to be sandwiched between the lower end of the partition plate 2 and the partition plate 4b in a horizontal state with respect to the ground, and the partition plate 4b. Is a space surrounded by a plate member 28b which is fixed in a horizontal state with respect to the ground and is spaced from the upper end of the partition plate 2 and the side plates 9a and 9b. A liquid supply header 5 for supplying a liquid is provided outside the liquid supply port 29f of the liquid channel 29, and a liquid supply nozzle 7 is provided at the tip thereof. For example, as shown in FIG. 3C, the liquid channel 29 includes fins 29 a through which the liquid flows in the horizontal direction and fins 29 b through which the liquid flows in the upper left direction of the gas-liquid distribution structure 20. Further, a so-called hardway type fin 29c is provided that adds resistance to the flow of liquid and promotes spreading in the horizontal direction. The fins 29a and 29b are in contact with each other at the boundary 29d, and are formed so that the liquid flows continuously. The fin 29c is in contact with the fin 29b at the boundary 29e, or has a gap of about 1 mm, for example, so that the liquid from the fin 29b flows continuously to the fin 29c. Although not shown, the fin 29c may be a so-called easy-way type in which the direction of the fin is the vertical direction.

  Next, the operation of the gas-liquid distribution structure 20 will be described. First, the liquid supplied to the liquid supply nozzle 7 is supplied to the liquid supply header 5 and stored in the liquid flow path 29 including the fins 29a and 29b. When the upper limit of the stored liquid exceeds the height of the partition plate 2, the supplied liquid overflows while promoting spreading in the horizontal direction, and the liquid flows down to the liquid lower flow path 27 including the fins 27a. Thereafter, the liquid that has flowed down comes into contact with the gas rising from the lower part of the gas-liquid distribution structure 20 through the gas-liquid contact channel 21 provided with the fins 21a, and performs distillation. On the other hand, gas cannot enter the liquid flow path 29 filled with the liquid, but the gas discharge flow path 26 is provided above the liquid lower flow path 27, so that the gas rises in the flow path of the liquid lower flow path 27. Then, the gas enters the gas discharge channel 26 and is discharged from the gas discharge nozzle 8 through the gas discharge header 6.

  By adopting such a configuration, the same effect as the gas-liquid distribution structure 10 of the first embodiment can be obtained.

  Next, a gas-liquid distribution structure according to a third embodiment of the present invention will be described. FIG. 4A is an upper cross-sectional view of a gas-liquid distribution structure according to a third embodiment of the present invention, and FIG. 4B is a modification of the cross-sectional view taken along the line II in FIG. In FIG. 4A, the fins are omitted.

  As shown in FIG. 4A, the gas-liquid distribution structure 30 according to the third embodiment has a rectangular parallelepiped shape, and the flowing liquid (black arrow in FIG. 4A) and the rising gas (FIG. 4). 4 (a), the gas-liquid contact channel 21 for contacting, the gas discharge channel 32 for discharging the gas from the gas-liquid contact channel 21, and the liquid in the gas-liquid contact channel 21 A liquid channel 33 supplied by overflow and liquid lower channels 24 and 31 through which the liquid flows down are provided. The gas discharge channel 32 is provided below the liquid channel 33 via a space 35. In addition, the gas discharge flow path 32 and the liquid flow path 33 are provided inside the gas-liquid distribution structure 30 via partition plates 2 and 34 that are disposed perpendicular to the ground and at a predetermined interval from the side plate 1. It is provided in a state sandwiched between the liquid lower flow paths 24 and 31. Further, the gas-liquid contact channel 21 is provided below the gas discharge channel 32 and the liquid lower channels 24 and 31.

  The gas discharge channel 32 is a space surrounded by the partition plates 2 and 34, the plate member 3b fixed so as to be sandwiched between the partition plates 2 and 34 in a state of being horizontal to the ground, and the side plate 9a. is there. In addition, the structure of a fin, the gas discharge header, and the gas discharge nozzle is the same as that of the gas discharge flow path 22 shown in FIG.1 (c).

  The liquid flow path 33 is fixed to the partition plates 2 and 34 so as to be sandwiched between the partition plates 2 and 34 in a state of being horizontal to the ground, and the plate member 3a provided on the upper portion of the plate member 3b and the side plate 9a. And the side plates 1 provided at the upper ends of the partition plates 4a and 4b and the side plates 9a and 9b. The configuration of the fins, the liquid supply header, and the liquid supply nozzle is the same as that of the liquid flow path 23 shown in FIG.

  The liquid lower flow path 31 is a space surrounded by the partition plates 4b and 34, the side plates 9a and 9b (not shown), and the side plate 1, and the liquid flow path 33 in the upper part and the gas-liquid contact flow in the lower part. The space is continuous with the road 21. Here, as shown in FIG. 4B, in order to evenly distribute the liquid to the liquid lower flow paths 24 and 31, the upper end of the fin 24a is a hard-way fin 24e, and the fin 24a and the fin 24e May contact at the boundary 24f.

  The space 35 is a closed space surrounded by the partition plates 2 and 34, the plate members 3a and 3b, and the side plates 9a and 9b, and does not allow fluid to enter. It is provided for the same reason as that of the space 25 described above, and although not shown, fins similar to the space 25 are provided inside the space 35 in order to increase the strength.

  Next, the operation of the gas-liquid distribution structure 30 will be described. First, the liquid supplied to the liquid supply nozzle 7 is supplied to the liquid supply header 5 and stored in the liquid flow path 23 including the fins 23a, 23b, and 23c (see FIG. 1C having the same configuration). ). When the upper limit of the stored liquid exceeds the height of the partition plates 2 and 34, the supplied liquid overflows while promoting the spread in the horizontal direction, and the liquid flows into the liquid lower flow path 24 including the fins 24a and 24b and It flows down to the liquid lower flow path 31 having the same fins as the fins 24a and 24b. Thereafter, the liquid that has flowed down comes into contact with the gas rising from the lower part of the gas-liquid distribution structure 30 through the gas-liquid contact channel 21 provided with the fins 21a, and performs distillation. On the other hand, since the gas cannot enter the liquid lower flow paths 24 and 31 filled with the liquid, the gas rises in the gas discharge flow path 22 including the fins 22a and 22b and is used for gas discharge through the gas discharge header 6. The ink is discharged from the nozzle 8 (see FIG. 1C having the same configuration).

  By adopting such a configuration, it is possible to obtain the same effect as the gas-liquid distribution structure of each of the above embodiments.

  Next, a gas-liquid distribution structure according to a fourth embodiment of the present invention will be described. FIG. 5A is an upper cross-sectional view of a gas-liquid distribution structure according to a fourth embodiment of the present invention, and FIG. 5B is a perspective view of the gas-liquid distribution structure of FIG. It is a figure which shows the supply and gas discharge side. In FIG. 5A, the fins are omitted.

  As shown in FIG. 5, the gas-liquid distribution structure 40 has a rectangular parallelepiped shape, and the gas for bringing the flowing liquid (black arrow in FIG. 5) into contact with the rising gas (white arrow in FIG. 5). A liquid contact channel 21; gas discharge channels 22 and 42 for discharging gas from the gas-liquid contact channel 21; and liquid channels 23 and 43 for supplying liquid to the gas-liquid contact channel 21 by overflow; And a liquid lower flow path 44 through which the liquid flows down. The gas discharge channels 22 and 42 are provided below the liquid channels 23 and 43 via spaces 25 and 45, respectively. In addition, the gas discharge flow paths 22 and 42 and the liquid flow paths 23 and 43 are partition plates 2 and 41 that are provided in the gas-liquid distribution structure 40 so as to be perpendicular to the ground and close to the side plate 1 at a predetermined interval. Is provided in a state of sandwiching the liquid lower flow path 44 therebetween. The gas-liquid contact channel 21 is provided below the gas discharge channels 22 and 42 and the liquid lower channel 44.

  The gas discharge flow path 42 has the same configuration as the gas discharge flow path 22 in FIG. 1, and a partition plate 41 and a plate member 46b fixed so as to be sandwiched between the partition plates 4a and 41 in a state horizontal to the ground. And a space surrounded by the side plate 9a (not shown). In addition, the structure of a fin is the same as that of the gas exhaust flow path 22 shown in FIG.1 (c). The gas discharge header 47 shown in FIG. 5B has a shape in which the cylinder is halved in the axial direction, and each gas discharge port (not shown in FIG. ) And the same as 22e), and the gas from this gas discharge port can be collected. The gas discharge nozzle 48 shown in FIG. 5 (b) is provided so as to communicate with the inside at the axial center portion of the curved surface of the gas discharge header 47.

  The liquid channel 43 has the same configuration as the liquid channel 23 in FIG. 1 and is fixed so as to be sandwiched between the partition plates 4a and 41 and the partition plates 4a and 41 in a state of being parallel to the ground, and a plate member 46b. This is a space surrounded by a plate member 46a provided at the top of the plate, a side plate 9a (not shown), and the side plates 1 provided at the upper ends of the partition plates 4a and 4b and the side plates 9a and 9b. In addition, the structure of a fin is the same as that of the liquid flow path 23 shown in FIG.1 (c). The liquid supply header 49 shown in FIG. 5B has a shape in which the cylinder is halved in the axial direction, and each liquid supply port (not shown, but not shown in FIG. 1C). The same as 23f of No. 2) is attached so that the liquid can be uniformly distributed and supplied to the liquid supply port. The liquid supply nozzle 50 shown in FIG. 5 (b) is provided so as to communicate with the inside at the axial center portion of the curved surface of the liquid supply header 49.

  The liquid lower flow path 44 is a space surrounded by the partition plates 2 and 41, the side plates 9a and 9b (not shown), and the side plate 1. The liquid flow paths 23 and 43 in the upper part and the gas-liquid in the lower part. The space is continuous with the contact channel 21.

  The space 45 is a closed space surrounded by the partition plates 4a and 41, the plate members 46a and 46b, and the side plates 9a and 9b (not shown), and does not allow fluid to enter. It is provided for the same reason as that of the space 25 described above, and although not shown, a fin similar to the space 25 is provided inside the space 45 in order to increase the strength.

  Next, the operation of the gas-liquid distribution structure 40 will be described. First, the liquid supplied to the liquid supply nozzle 50 is supplied to the liquid supply header 49, and the liquid flow path 23 having the fins 23a, 23b, and 23c (the same configuration as that of FIG. 1C) and the fins are provided. It is stored in a liquid channel 43 having fins similar to those of 23a, 23b, and 23c. When the upper limit of the stored liquid exceeds the height of the partition plates 2 and 41, the supplied liquid overflows while promoting the spread in the horizontal direction, and the liquids are fins 24a and 24b shown in FIG. The liquid flows down to the liquid lower flow path 44 having the same fins. Thereafter, the liquid that has flowed down contacts the gas rising from the lower part of the gas-liquid distribution structure 40 through the gas-liquid contact channel 21 provided with the fins 21a, and performs distillation. On the other hand, since the gas cannot enter the liquid lower flow path 44 filled with the liquid, the gas discharge rises in the gas discharge flow paths 22 and 42 and collects the gas discharged from the gas discharge flow paths 22 and 42. The gas is discharged from the gas discharge nozzle 48 through the header 47.

  By adopting such a configuration, it is possible to obtain the same effect as the gas-liquid distribution structure of each of the above embodiments.

  Next, a distiller according to an embodiment of the present invention will be described. FIG. 6 is a perspective view of a part of the still according to the embodiment of the present invention. FIG. 7 is a perspective view when the liquid supply nozzle, the liquid supply header, the gas discharge nozzle, and the gas discharge header of the still shown in FIG. 6 are removed.

  The distiller 60 alternately arranges the gas-liquid distribution structures 10a and 10b, and performs heat exchange between adjacent flow paths through the partition plates. In addition, the liquid supply port and the gas discharge port are provided so as to be opposite to the gas-liquid distribution structures 10a and 10b. The gas-liquid distribution structure 10a has the same configuration as the gas-liquid distribution structure 10 according to the first embodiment shown in FIG. 1 except for the liquid supply nozzle, the liquid supply header, the gas discharge nozzle, and the gas discharge header. It is. The same applies to the gas-liquid distribution structure 10b.

  Each gas-liquid distribution structure 10a is attached with a liquid supply header 61 having a shape in which the cylinder is halved in the axial direction so as to cover each liquid supply port 63 shown in FIG. The liquid supply header 61 is provided so as to communicate with the inside at the axial center of the curved surface. Further, each gas-liquid distribution structure 10a is attached with a gas discharge header 65 having a shape in which the cylinder is halved in the axial direction so as to cover each gas discharge port 64 shown in FIG. Is provided so as to communicate with the inside at the axial center of the curved surface of the gas discharge header 65.

  In each gas-liquid distribution structure 10b, a liquid supply header 61 and a liquid supply nozzle 62 that cover the liquid supply port of each gas-liquid distribution structure 10b on the opposite side of the liquid supply side of each gas-liquid distribution structure 10a. , A liquid supply header 67 having the same configuration as the gas discharge header 65 and the gas discharge nozzle 66 covering the gas discharge port of each gas-liquid distribution structure 10b, a liquid supply nozzle (not shown), and a gas discharge header 68. And a gas discharge nozzle (not shown).

  Next, the operation of the distiller 60 will be described. For example, if the gas-liquid distribution structure 10a is a high-temperature channel and the gas-liquid distribution structure 10b is a low-temperature channel, heat exchange is performed between the gas-liquid distribution structure 10a and the gas-liquid distribution structure 10b. And distillation is performed in each flow path of the gas-liquid distribution structure 10a and the gas-liquid distribution structure 10b.

  With the above configuration, it is possible to provide a distiller in which the deviation of the liquid flow rate is suppressed, the gas-liquid contact efficiency is improved, high distillation efficiency is obtained, and the structure of the entire apparatus is simplified.

  In the distiller 60, the gas-liquid distribution structure 10 is used. However, the present invention is not limited to this, and the same effect as the distiller 60 can be obtained by combining a plurality of gas-liquid distribution structures of the above embodiment. It may be a distiller.

  Next, a distiller according to another embodiment of the present invention will be described. FIG. 8 is a perspective view of a part of the still according to the embodiment of the present invention. FIG. 9 is a perspective view when the liquid supply nozzle, the liquid supply header, the gas discharge nozzle, and the gas discharge header of the still shown in FIG. 8 are removed. 10 (a) is a cross-sectional view of a low-temperature gas-liquid distribution structure used in the distiller of FIG. 8, FIG. 10 (b) is a cross-sectional view taken along the line VI-VI in FIG. 10 (a), and FIG. ) Is a sectional view taken along arrow VII-VII in FIG. FIG. 11 is a cross-sectional view of the gas-liquid distribution structure on the high temperature side used in the distiller of FIG.

  In the distiller 80, the gas-liquid distribution structures 100 and 110 are alternately arranged in parallel, and heat exchange is performed between the adjacent flow paths via the partition plates. Although not shown, the liquid supply port and the gas discharge port are provided so that the gas-liquid distribution structure 100 and the gas-liquid distribution structure 110 are in opposite directions.

  Each gas-liquid distribution structure 100 is provided with a liquid supply header 81 having a shape in which the cylinder is halved in the axial direction so as to cover the liquid supply ports 103g and 104g shown in FIG. Is provided at the central portion of the curved surface of the liquid supply header 81 so as to communicate with the inside thereof. Further, each gas-liquid distribution structure 100 is attached with a gas discharge header 83 having a shape in which the cylinder is halved in the axial direction so as to cover each gas discharge port 101f shown in FIG. However, it is provided so as to communicate with the inside at the axial center portion of the curved surface of the gas discharge header 83.

  In each gas-liquid distribution structure 110, a liquid supply header 81 and a liquid supply nozzle 82 that cover the liquid supply port of each gas-liquid distribution structure 110 on the opposite side of the liquid supply side of each gas-liquid distribution structure 100. The liquid supply header 85, the liquid supply nozzle 85 (not shown), and the gas discharge header 86 having the same configuration as the gas discharge header 83 and the gas discharge nozzle 84 covering the gas discharge port of each gas-liquid distribution structure 110 are provided. And a gas discharge nozzle (not shown).

  The gas-liquid distribution structure 100 has a rectangular parallelepiped shape, and a gas-liquid contact channel 21 for contacting a flowing liquid (black arrow in FIG. 10) and a rising gas (white arrow in FIG. 10), A gas discharge channel 101 that discharges gas, a gas ascending channel 102 that causes gas to rise and pass from the gas-liquid contact channel 21 to the gas discharge channel 101, and a liquid channel that supplies liquid to the gas-liquid contact channel 21 103 and 104. The gas ascending flow path 102 is sandwiched between the liquid flow paths 103 and 104 via partition plates 105 and 106 provided at a predetermined interval perpendicular to the ground inside the gas-liquid distribution structure 100. It is provided in the state. The gas discharge channel 101 is disposed above the gas ascending channel 102 and the liquid channels 103 and 104, and the gas-liquid contact channel 21 is disposed below the gas ascending channel 102 and the liquid channels 103 and 104.

  The gas discharge channel 101 includes partition plates 4a and 4b, side plates 1 and 9a, a plate member 107 fixed to the upper end of the partition plates 4a and 105 in a state horizontal to the ground, and the partition plates 4b and 106. It is a space surrounded by a plate member 108 fixed to the upper end portion in a state of being horizontal to the ground. For example, as shown in FIG. 10B, the gas discharge channel 101 has fins 101 a through which gas flows in the horizontal direction and fins 101 b through which gas flows in the upper right direction of the gas-liquid distribution structure 100. And fins 101c through which gas flows in the vertical direction. The fins 101a and 101b are at the boundary 101d, and the fins 101b and 101c are in contact with each other at the boundary 101e, or a gap is provided so that gas continuously flows at each boundary. ing.

  The gas ascending channel 102 is a space surrounded by the partition plates 105 and 106 and the side plates 9a and 9b. The gas ascending flow path 102 is provided with fins 102a through which gas flows in the vertical direction. The fins 102a are in contact with the fins 101c at the boundary 102b and the fins 21a at the boundary 102c, or are slightly provided with gaps. It is formed so that gas continuously flows at the boundary portion.

  The liquid channel 103 is a space surrounded by the partition plates 4a and 105, the plate member 107, and the side plates 9a and 9b. For example, as shown in FIG. 10C, the liquid flow path 103 includes fins 103 a through which the liquid flows in the horizontal direction and fins 103 b through which the liquid flows in the diagonally downward left direction of the gas-liquid distribution structure 100. And a hard way type fin 103c. The fins 103a and 103b are portions of the boundary 103d, the fins 103b and 103c are portions of the boundary 103e, and the fins 21a and 103c are in contact with the portion of the boundary 103f, or a small gap is provided, and liquid is formed at each boundary portion. Is formed to flow continuously.

  The liquid flow path 104 is a space surrounded by the partition plates 4b and 106, the plate member 108, and the side plates 9a and 9b. The liquid channel 104 is provided with fins having the same configuration as the liquid channel 103.

  As shown in FIG. 11, the gas-liquid distribution structure 110 has a rectangular parallelepiped shape, and the gas for flowing liquid (black arrow in FIG. 11) and rising gas (white arrow in FIG. 11) come into contact with each other. Liquid contact channel 21, gas discharge channel 111 for discharging gas, gas ascending channels 112 and 113 for allowing gas to rise and pass from gas-liquid contact channel 21 to gas discharge channel 111, and gas-liquid contact channel 21 is provided with a liquid flow path 114 for supplying a liquid to 21. The liquid flow path 114 is sandwiched between the gas ascending flow paths 112 and 113 via partition plates 115 and 116 provided at a predetermined interval perpendicular to the ground inside the gas-liquid distribution structure 110. It is provided in the state. In addition, a gas discharge channel 111 is disposed above the gas ascending channels 112 and 113 and the liquid channel 114, and a gas-liquid contact channel 21 is disposed below. In addition, the structure of the VIII-VIII arrow cross section in FIG. 11 is the same as that of FIG.10 (b), and the structure of the IX-IX arrow cross section is the same as that of FIG.10 (c).

  The gas discharge channel 111 includes partition plates 4a and 4b, a side plate 1, a side plate 9a (not shown), and a plate member 117 fixed to the upper ends of the partition plates 115 and 116 in a state horizontal to the ground. It is a space surrounded by. The gas discharge channel 111 has fins having the same configuration as the gas discharge channel 101 in FIG.

  The gas ascending channel 112 is a space surrounded by the partition plates 4a and 115 and the side plates 9a and 9b (not shown). The gas ascending channel 112 has fins having the same configuration as the gas ascending channel 102 in FIG.

  The gas rising channel 113 is a space surrounded by the partition plates 4b and 116 and the side plates 9a and 9b (not shown). The gas ascending channel 113 has fins having the same configuration as the gas ascending channel 112.

  The liquid flow path 114 is a space surrounded by the partition plates 115 and 116, the plate member 117, and the side plates 9a and 9b. The liquid channel 114 is provided with fins having the same configuration as the liquid channel 104 in FIG.

Next, the operation of the distiller 80 will be described. Since the gas-liquid distribution structure 100 is a low-temperature channel and the gas-liquid distribution structure 110 is a high-temperature channel, the gas-liquid distribution structure 100 is heated by its adjacent gas-liquid distribution structure 110. Is done. Here, in the gas / liquid distribution structure 100, when liquid is supplied so as to flow down along the partition plate on the gas / liquid distribution structure 110 side adjacent to the gas / liquid contact flow path of the gas / liquid distribution structure 100, On the partition wall surface of the liquid distribution structure 100, the liquid boils while flowing down, and a part of the liquid evaporates to become a gas, away from the partition wall surface of the gas-liquid distribution structure 100, and ascending the flow path. At that time, the surface of the liquid flowing down is disturbed and accompanied by minute droplets, so that the surface area of the liquid flowing down, in other words, the contact area of the gas-liquid is increased.
On the other hand, in the gas-liquid distribution structure 110, the partition plate is cooled by the adjacent gas-liquid distribution structure 100. Here, in the gas-liquid distribution structure 110, the liquid is supplied from the liquid channel 114 to the gas-liquid contact channel 21. The gas rising in the gas-liquid contact channel 21 is partially condensed by the partition plates 4a and 4b, and flows down the gas-liquid contact channel 21 while forming a liquid film along the inner surfaces of the partition plates 4a and 4b. As a result, the surface area of the liquid in the gas-liquid contact channel 21, in other words, the gas-liquid contact area is increased.

  With the above configuration, the gas-liquid contact efficiency is improved, whereby a high distillation efficiency can be obtained, and a distiller in which the structure of the entire apparatus is simplified can be provided.

  The present invention can be modified in design without departing from the scope of the claims, and is not limited to the above embodiment.

(A) is upper part sectional drawing of the gas-liquid distribution structure which concerns on 1st Embodiment of this invention, (b) is II sectional view taken on the II arrow of (a), (c) is II-II of (a). It is arrow sectional drawing. It is a figure which shows the modification of the partition plate. (A) is upper part sectional drawing of the gas-liquid distribution structure which concerns on 2nd Embodiment of this invention, (b) is III-III arrow sectional drawing of (a), (c) is IV-IV of (a). It is arrow sectional drawing. (A) is upper part sectional drawing of the gas-liquid distribution structure which concerns on 3rd Embodiment of this invention, (b) is VV arrow sectional drawing of (a). It is a top sectional view of the gas-liquid distribution structure concerning a 4th embodiment of the present invention. It is a one part perspective view of the still according to the embodiment of the present invention. It is a perspective view at the time of removing the liquid supply nozzle, the liquid supply header, the gas discharge nozzle, and the gas discharge header of the still shown in FIG. It is a one part perspective view of the still according to the embodiment of the present invention. It is a perspective view at the time of removing the nozzle for liquid supply of the distiller of FIG. 8, the header for liquid supply, the nozzle for gas discharge, and the header for gas discharge. (A) is sectional drawing of the gas-liquid distribution structure of the low temperature side used for the distiller of FIG. 8, (b) is VI-VI arrow sectional drawing of (a), (c) is VII- of (a). It is VII arrow sectional drawing. It is sectional drawing of the gas-liquid distribution structure of the high temperature side used for the distiller of FIG.

5, 49, 61, 67, 81, 85 Liquid supply header 6, 47, 65, 68, 83, 86 Gas discharge header 7, 50, 62, 82 Liquid supply nozzle 8, 48, 66, 84 Gas discharge Nozzle 10, 10a, 10b, 20, 30, 40 Gas-liquid distribution structure 21 Gas-liquid contact flow path 22e, 26e, 64, 101f Gas discharge port 22, 26, 32, 42, 101, 111 Gas discharge flow path 23f , 29f, 63, 103g Liquid supply port 23, 29, 33, 43, 103, 104, 114 Liquid flow path 24, 27, 31, 44 Liquid lower flow path 25, 35, 45 Space 60, 80 Distiller 100, 110 Air Liquid distribution structure 102, 112, 113 Gas ascending channel

Claims (5)

A gas-liquid contact channel for contacting the flowing liquid and the rising gas;
Two liquid lower flow paths leading to the liquid-liquid contact flow path and the liquid-liquid contact flow path;
A liquid fluid flow passage you supplied by overflow liquid to the two liquid downstream path,
A gas discharge flow path for discharging gas from the gas-liquid contact flow path,
A gas-liquid distribution structure in which the two liquid lower flow paths are arranged on both sides of the gas discharge flow path. A gas-liquid contact channel for contacting the flowing liquid and the rising gas;
A liquid lower flow path where the liquid flows down and is connected to the gas-liquid contact flow path;
A liquid flow path for supplying liquid to the liquid lower flow path by overflow;
Two gas discharge flow paths for discharging the gas from the gas-liquid contact flow path,
A gas-liquid distribution structure in which the two gas discharge channels are arranged on both sides of the liquid lower channel .   The gas-liquid distribution structure according to claim 1 or 2, wherein fins are provided in one or more of the liquid channel, the gas discharge channel, and the gas-liquid contact channel.   The gas-liquid distribution structure according to any one of claims 1 to 3, which is a rectangular parallelepiped type.   A gas-liquid contact flow between the gas-liquid distribution structures adjacent to each other, wherein a plurality of gas-liquid distribution structures selected from the gas-liquid distribution structures according to any one of claims 1 to 4 are combined. A heat-exchange distiller with adjacent paths.

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