JP4488214B2 - 滴形ターゲットを形成するための装置及び方法 - Google Patents
滴形ターゲットを形成するための装置及び方法 Download PDFInfo
- Publication number
- JP4488214B2 JP4488214B2 JP2004559610A JP2004559610A JP4488214B2 JP 4488214 B2 JP4488214 B2 JP 4488214B2 JP 2004559610 A JP2004559610 A JP 2004559610A JP 2004559610 A JP2004559610 A JP 2004559610A JP 4488214 B2 JP4488214 B2 JP 4488214B2
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- Prior art keywords
- several
- nozzle
- drop
- target
- extension passage
- Prior art date
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- 238000000034 method Methods 0.000 title claims description 11
- 239000007788 liquid Substances 0.000 claims abstract description 29
- 239000007789 gas Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 7
- 239000012212 insulator Substances 0.000 claims description 3
- 239000011261 inert gas Substances 0.000 claims description 2
- 238000001816 cooling Methods 0.000 claims 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- 239000003595 mist Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000003993 interaction Effects 0.000 description 4
- 239000007787 solid Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000006378 damage Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000004513 sizing Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
- H05G2/006—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state details of the ejection system, e.g. constructional details of the nozzle
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- X-Ray Techniques (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
- Structure Of Belt Conveyors (AREA)
Description
Claims (8)
- 滴形ターゲットを形成するための装置であって、高圧を有するターゲット液を収容するための容器と、該容器と結合された、数msのパルス幅で切り換わる電磁弁と、ノズルとを少なくとも有している形式のものにおいて、
ノズルが超音速ノズル(4)として形成されており、電磁弁(1)が該超音速ノズル(4)と伸張通路(2)を介して結合されており、該伸張通路(2)の周囲に加熱手段(3)が、過飽和蒸気が該伸張通路(2)内に形成される値へ温度が調節可能なように形成されており、該電磁弁(1)と該加熱手段(3)との間に熱絶縁体(5)が配置されていることを特徴とする、滴形ターゲットを形成するための装置。 - 前記電磁弁(1)が2msのパルス幅で作動する、請求項1記載の装置。
- 伸張通路(2)が、数mm〜数十mmの長さ及び数百μm〜数mmの直径を有している、請求項1記載の装置。
- 超音速ノズル(4)が、数度〜数十度の円錐形の開度2Θ、数百μmの直径の入口開口及び数mmの長さが円錐形に成形された区分を有している、請求項1記載の装置。
- ‐不活性ガスによって内部で高圧が実現された容器にターゲット液を充填し、
‐脈動電磁弁によって前記容器を一時的に開放し、
‐ターゲット液を伸張通路へ断続的に導入し、
‐過飽和液体蒸気が形成されるように伸張通路を加熱し、
‐伸張通路と結合された超音速ノズルを通走する際に気体を冷却し、
‐ノズルの出口開口から液滴を流出させることを特徴とする、滴形ターゲットを形成するための方法。 - 数msのパルス幅を有する脈動電磁弁を使用する、請求項5記載の方法。
- 数mm〜数十mmの長さ及び数百μm〜数mmの直径を有する伸張通路を使用する、請求項5記載の方法。
- 数度〜数十度の円錐形の開度2Θ、数百μmの直径の入口開口及び数mmの長さが円錐形に成形された区分を有する超音速ノズルを使用する、請求項5記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10260376A DE10260376A1 (de) | 2002-12-13 | 2002-12-13 | Vorrichtung und Verfahren zur Erzeugung eines Tröpfchen-Targets |
PCT/DE2003/004129 WO2004056158A2 (de) | 2002-12-13 | 2003-12-11 | Vorrichtung und verfahren zur erzeugung eines tröpfchen-targets |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006510176A JP2006510176A (ja) | 2006-03-23 |
JP4488214B2 true JP4488214B2 (ja) | 2010-06-23 |
Family
ID=32519270
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004559610A Expired - Lifetime JP4488214B2 (ja) | 2002-12-13 | 2003-12-11 | 滴形ターゲットを形成するための装置及び方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7306015B2 (ja) |
EP (1) | EP1574116B1 (ja) |
JP (1) | JP4488214B2 (ja) |
AT (1) | ATE363819T1 (ja) |
AU (1) | AU2003300494A1 (ja) |
DE (2) | DE10260376A1 (ja) |
WO (1) | WO2004056158A2 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7405416B2 (en) * | 2005-02-25 | 2008-07-29 | Cymer, Inc. | Method and apparatus for EUV plasma source target delivery |
DE102004036441B4 (de) | 2004-07-23 | 2007-07-12 | Xtreme Technologies Gmbh | Vorrichtung und Verfahren zum Dosieren von Targetmaterial für die Erzeugung kurzwelliger elektromagnetischer Strahlung |
EP1854121B1 (en) * | 2005-02-25 | 2013-05-29 | Cymer, Inc. | Method and apparatus for euv light source target material handling |
DE102006017904B4 (de) | 2006-04-13 | 2008-07-03 | Xtreme Technologies Gmbh | Anordnung zur Erzeugung von extrem ultravioletter Strahlung aus einem energiestrahlerzeugten Plasma mit hoher Konversionseffizienz und minimaler Kontamination |
DE102009018021B4 (de) | 2009-04-18 | 2013-09-05 | Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh | Mikrodosiersystem mit einem gepulsten Laser |
WO2014120985A1 (en) | 2013-01-30 | 2014-08-07 | Kla-Tencor Corporation | Euv light source using cryogenic droplet targets in mask inspection |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE364469A (ja) | 1928-10-13 | |||
US4962886A (en) * | 1988-10-14 | 1990-10-16 | The Board Of Trustees Of The University Of Maine | High flow rate nozzle system with production of uniform size droplets |
FR2799667B1 (fr) * | 1999-10-18 | 2002-03-08 | Commissariat Energie Atomique | Procede et dispositif de generation d'un brouillard dense de gouttelettes micrometriques et submicrometriques, application a la generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie |
US6711233B2 (en) * | 2000-07-28 | 2004-03-23 | Jettec Ab | Method and apparatus for generating X-ray or EUV radiation |
US6324256B1 (en) * | 2000-08-23 | 2001-11-27 | Trw Inc. | Liquid sprays as the target for a laser-plasma extreme ultraviolet light source |
US6498832B2 (en) * | 2001-03-13 | 2002-12-24 | Euv Llc | Electrode configuration for extreme-UV electrical discharge source |
US6738452B2 (en) * | 2002-05-28 | 2004-05-18 | Northrop Grumman Corporation | Gasdynamically-controlled droplets as the target in a laser-plasma extreme ultraviolet light source |
US6792076B2 (en) * | 2002-05-28 | 2004-09-14 | Northrop Grumman Corporation | Target steering system for EUV droplet generators |
-
2002
- 2002-12-13 DE DE10260376A patent/DE10260376A1/de not_active Ceased
-
2003
- 2003-12-11 JP JP2004559610A patent/JP4488214B2/ja not_active Expired - Lifetime
- 2003-12-11 EP EP03813077A patent/EP1574116B1/de not_active Expired - Lifetime
- 2003-12-11 AT AT03813077T patent/ATE363819T1/de not_active IP Right Cessation
- 2003-12-11 WO PCT/DE2003/004129 patent/WO2004056158A2/de active IP Right Grant
- 2003-12-11 AU AU2003300494A patent/AU2003300494A1/en not_active Abandoned
- 2003-12-11 US US10/538,802 patent/US7306015B2/en not_active Expired - Lifetime
- 2003-12-11 DE DE50307397T patent/DE50307397D1/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
AU2003300494A1 (en) | 2004-07-09 |
ATE363819T1 (de) | 2007-06-15 |
WO2004056158A2 (de) | 2004-07-01 |
US20060054238A1 (en) | 2006-03-16 |
WO2004056158A3 (de) | 2004-09-16 |
DE10260376A1 (de) | 2004-07-15 |
DE50307397D1 (de) | 2007-07-12 |
JP2006510176A (ja) | 2006-03-23 |
EP1574116B1 (de) | 2007-05-30 |
EP1574116A2 (de) | 2005-09-14 |
US7306015B2 (en) | 2007-12-11 |
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