JP4487609B2 - 磁気記録媒体 - Google Patents
磁気記録媒体 Download PDFInfo
- Publication number
- JP4487609B2 JP4487609B2 JP2004089362A JP2004089362A JP4487609B2 JP 4487609 B2 JP4487609 B2 JP 4487609B2 JP 2004089362 A JP2004089362 A JP 2004089362A JP 2004089362 A JP2004089362 A JP 2004089362A JP 4487609 B2 JP4487609 B2 JP 4487609B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- recording
- magnetic
- recording medium
- magnetic recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000010410 layer Substances 0.000 claims description 179
- 239000011241 protective layer Substances 0.000 claims description 54
- 239000000463 material Substances 0.000 claims description 52
- 239000000696 magnetic material Substances 0.000 claims description 18
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 6
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 description 33
- 239000000758 substrate Substances 0.000 description 26
- 230000003746 surface roughness Effects 0.000 description 20
- 238000000034 method Methods 0.000 description 17
- 239000007789 gas Substances 0.000 description 13
- 238000001039 wet etching Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 238000005530 etching Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 238000005498 polishing Methods 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 5
- 238000001020 plasma etching Methods 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000007598 dipping method Methods 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 4
- 239000010702 perfluoropolyether Substances 0.000 description 4
- 239000000956 alloy Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 230000001050 lubricating effect Effects 0.000 description 2
- 230000005389 magnetism Effects 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000599 Cr alloy Inorganic materials 0.000 description 1
- 229910018503 SF6 Inorganic materials 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910021385 hard carbon Inorganic materials 0.000 description 1
- 238000007542 hardness measurement Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 description 1
- 229960000909 sulfur hexafluoride Drugs 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
Images
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004089362A JP4487609B2 (ja) | 2003-03-27 | 2004-03-25 | 磁気記録媒体 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003088408 | 2003-03-27 | ||
| JP2004089362A JP4487609B2 (ja) | 2003-03-27 | 2004-03-25 | 磁気記録媒体 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004311007A JP2004311007A (ja) | 2004-11-04 |
| JP2004311007A5 JP2004311007A5 (enExample) | 2007-03-22 |
| JP4487609B2 true JP4487609B2 (ja) | 2010-06-23 |
Family
ID=33478414
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004089362A Expired - Fee Related JP4487609B2 (ja) | 2003-03-27 | 2004-03-25 | 磁気記録媒体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4487609B2 (enExample) |
-
2004
- 2004-03-25 JP JP2004089362A patent/JP4487609B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2004311007A (ja) | 2004-11-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4076889B2 (ja) | 磁気記録媒体の製造方法 | |
| US7741229B2 (en) | Method for manufacturing magnetic recording medium | |
| JP4188125B2 (ja) | 磁気記録媒体の製造方法及び製造装置 | |
| US7488429B2 (en) | Method of dry etching, method of manufacturing magnetic recording medium, and magnetic recording medium | |
| US7300595B2 (en) | Method for filling concave portions of concavo-convex pattern and method for manufacturing magnetic recording medium | |
| US20080078739A1 (en) | Method for manufacturing magnetic recording medium | |
| JP2012069173A (ja) | 磁気記録媒体 | |
| US7597972B2 (en) | Magnetic recording medium including a patterned intermediate layer and a non-patterned soft magnetic layer and manufacturing method thereof | |
| KR20040084715A (ko) | 자기기록매체 및 자기기록매체의 제조방법 | |
| US20060292400A1 (en) | Magnetic recording medium, magnetic recording and reproducing apparatus, and method for manufacturing magnetic recording medium | |
| US7417826B2 (en) | Magnetic recording medium | |
| JP3881350B2 (ja) | 磁気記録媒体及び磁気記録再生装置 | |
| JP2008217959A (ja) | 磁気記録媒体およびその製造方法 | |
| US7682713B2 (en) | Magnetic recording medium with recording layer having a predetermined concavo-convex pattern and magnetic recording and reproducing apparatus | |
| JP4487609B2 (ja) | 磁気記録媒体 | |
| JP2007280609A (ja) | 磁気記録媒体の製造方法 | |
| US7230795B2 (en) | Recording medium having reduced surface roughness | |
| JP2006252772A (ja) | 磁気記録媒体の製造方法 | |
| JP4226586B2 (ja) | 磁気記録媒体 | |
| US20090242508A1 (en) | Method for manufacturing magnetic recording medium | |
| JP2008091031A (ja) | 磁気記録媒体の製造方法 | |
| JP2010049740A (ja) | 磁気記録媒体の製造方法および磁気記録媒体 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070202 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070202 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20081212 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090106 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090306 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20091117 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100118 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20100309 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20100322 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130409 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| LAPS | Cancellation because of no payment of annual fees |