JP4455283B2 - Exposure apparatus and device manufacturing method - Google Patents

Description

  The present invention relates to an exposure apparatus for transferring a mask pattern onto a photosensitive substrate and a device manufacturing method using the same.

  Liquid crystal display devices and semiconductor devices are manufactured through a photolithography process in which a pattern formed on a mask is transferred onto a photosensitive substrate. An exposure apparatus used in this photolithography process includes a substrate stage that holds a photosensitive substrate and moves two-dimensionally, and a mask stage that holds a mask and moves two-dimensionally, and masks a pattern formed on the mask. The stage and the substrate stage are transferred to the photosensitive substrate through the projection system while being sequentially moved. As an exposure device, mainly a batch type exposure device that simultaneously transfers the entire mask pattern onto the photosensitive substrate and a mask pattern that is continuously transferred onto the photosensitive substrate while synchronously scanning the mask stage and the substrate stage. Two types of scanning exposure apparatuses are known. Among these, when manufacturing a liquid crystal display device, a scanning exposure apparatus is mainly used because of a demand for an increase in display area.

  FIG. 18 is a perspective view showing a schematic configuration of a projection exposure apparatus used for transferring a circuit pattern to a large exposure substrate such as a liquid crystal display panel. In FIG. 18, the circuit pattern formed on the mask 51 is projected and transferred onto the substrate 55 to be exposed through a projection system including a trapezoidal mirror 52, a convex mirror 53, a concave mirror 54, and the like. The mask 51 is held by a mask stage 57.

  In this exposure apparatus, when the circuit pattern is transferred onto the substrate 55 to be exposed, the mask 51 is illuminated with exposure light by the illumination system 56. The exposure light transmitted through the pattern formed on the mask 51 (so-called mask pattern) forms a mask pattern image on the tourist substrate 55 via the trapezoidal mirror 52, the convex mirror 53, and the concave mirror 54 constituting the projection system.

  Here, it is inconvenient in terms of the area, weight, stability and cost of the apparatus to equip a large-diameter projection system capable of exposing a desired circuit pattern on a large exposure substrate. For this reason, by scanning the mask and the photosensitive substrate 55 in synchronization with the projection system while illuminating a part of the mask pattern with slit light, the mask 51 is illuminated with the slit light and the photosensitive substrate 55. It is useful to scan the upper exposure area and configure pattern exposure on a large photosensitive substrate by a small projection system.

  In the exposure apparatus shown in FIG. 18, the mask 51 and the photosensitive substrate 55 are mounted on a mask stage 57 and a substrate stage 56, respectively, and the photosensitive substrate 55 is scan-exposed by scanning the stages 57 and 56. The

  By the way, the mask is bent by its own weight when it is enlarged. There is a problem that the pattern transferred to the photosensitive substrate is distorted by the bending of the mask. As a technique for correcting the deflection of the mask, in Patent Document 1 and Patent Document 2, a chamber member is provided on the upper surface of the mask, and the pressure in the space formed between the chamber member and the mask is made negative. Techniques for correcting mask deflection have been disclosed.

The techniques described in Patent Documents 1 and 2 relate to a batch type exposure apparatus that performs exposure processing in a state where a mask stage that supports a mask is substantially stationary, and a tube is connected to a space between a chamber member and the mask. The pressure in the space is made negative through the tube. However, when the above technique is applied to a scanning exposure apparatus in which the mask stage moves while pulling one end of the tube during the exposure process, the tube is deformed between the chamber member and the pressure control device, so that the exposure accuracy is satisfied. Insufficient pressure control to perform As a scanning exposure apparatus, Patent Document 3 discloses a technique for correcting mask deflection.
JP 59-96730 A JP-A-5-315218 JP 2004-95653 A

  As the mask becomes larger, bending due to the weight of the mask within the exposure apparatus occurs, making it difficult to obtain high exposure resolution. In the exposure apparatus, since the mask is supported only at the peripheral portion thereof, when the mask is enlarged, the mask is bent due to its own weight, and the margin of the focal depth of the projection system is consumed on the mask side. Therefore, it becomes difficult to secure a manufacturing margin such as flatness on the photosensitive substrate side, and as a result, it becomes difficult to obtain a desired exposure resolution.

If the material of the mask is quartz (specific gravity 2.2) and the thickness is 10 mm, the self-weight pressure of the mask is 2.2 g · f / cm ² = 2.2 × 10 ² Pa and the atmospheric pressure is 1 atm. = 0.2% of 1.013 × 10 ⁵ Pa. Therefore, in order to cancel the weight of the mask and sufficiently correct the deflection, the pressure in the space between the mask and the chamber member (hereinafter also referred to as a deflection control space) is set to about −2.2 × 10 ² Pa (gauge pressure). ), And it is desirable to make the pressure fluctuation within the target value ± several Pa.

  When controlling the pressure in the deflection control space with high accuracy, the influence of the vibration of the pressure value of the pressure supply source that supplies air to the pressure control device on the pressure control in the deflection control space cannot be ignored. In addition, since the pipeline distance between the pressure supply source and the deflection control space is long, when it is necessary to suck a large amount of air from the deflection control space, an air flow rate necessary for the pipeline resistance is ensured. I can't. If a servo valve for controlling the pressure in the deflection control space is arranged on a member fixed to the frame of the exposure apparatus, the tube connecting the mask stage and the servo valve moves and deforms when the mask stage is moved. For this reason, the pressure in the deflection control space varies.

  The present invention has been made against the background of the above-mentioned problem recognition. For example, the pressure of the space defined by the mask and the space definition member provided thereto is controlled with high accuracy, thereby increasing the shape of the mask. The purpose is to control with accuracy.

An exposure apparatus according to one aspect of the present invention is configured as an exposure apparatus that transfers a mask pattern onto a substrate, and a mask stage that moves the mask together with a space definition member that defines a space with the mask surface as a boundary. And a servo valve communicating with the space, and a pressure controller for controlling the pressure of the space by controlling the servo valve, the servo valve being disposed on the mask stage.
An exposure apparatus according to another aspect of the present invention is configured as an exposure apparatus that transfers a mask pattern onto a substrate, and a mask stage that moves the mask together with a space definition member that defines a space with the mask surface as a boundary. A servo valve communicating with the space and a pressure controller for controlling the pressure of the space by controlling the servo valve, the servo valve moving while maintaining a certain positional relationship with the mask stage Is placed on the mounting stage.
An exposure apparatus according to a preferred embodiment of the present invention relates to an exposure apparatus that transfers a mask pattern onto a substrate, and the exposure apparatus moves the mask together with a space definition member that defines a space with the mask surface as a boundary. A mask stage, a servo valve for controlling the pressure of the space, a buffer tank disposed between the servo valve and a pressure control line, and controlling the pressure of the space by controlling the servo valve And the servo valve is arranged to move while maintaining a substantially constant positional relationship with the mask.

  According to a preferred embodiment of the present invention, the servo valve may be disposed on the mask stage. Alternatively, the servo valve may be arranged on a mounting stage that moves while maintaining a substantially constant positional relationship with the mask stage.

  According to a preferred embodiment of the present invention, the servo valve and the buffer tank can be connected via a flexible interface. Thus, the servo valve can move relative to the buffer tank.

  According to a preferred embodiment of the present invention, the exposure apparatus further includes a pressure sensor that detects the pressure of the space, and the pressure controller controls the servo valve based on an output of the pressure sensor. Is preferred. The exposure apparatus according to any one of claims 1 to 3, wherein:

According to a preferred embodiment of the present invention, the pressure sensor is substantially are preferably arranged to move while maintaining a fixed positional relationship between said mask. For example, the pressure sensor may be disposed on the mask stage. Alternatively, the pressure sensor may be arranged on a mounting stage that moves while maintaining a substantially constant positional relationship with the mask stage.

  According to a preferred embodiment of the present invention, it is preferable that the exposure apparatus further includes a measuring instrument that measures the deflection of the mask, and the pressure controller determines the pressure of the space based on the output of the measuring instrument. Is preferably controlled.

  According to a preferred embodiment of the present invention, it is preferable that the space defining member is disposed above the mask, and the pressure control line is a decompression line.

  According to a preferred embodiment of the present invention, the mask and the space defining member are in contact with each other through a member made of foamed fluororubber, and the mask may be made of quartz.

  According to a preferred embodiment of the present invention, it is preferable that the interface portion between the mask and the space defining member is configured such that a limited amount of gas moves between the space and the external space.

An exposure apparatus according to another preferred embodiment of the present invention is configured as an exposure apparatus that transfers a mask pattern onto a substrate, and moves the mask together with a space defining member that defines a space with the mask surface as a boundary. A mask stage; a servo valve disposed between a pressure control line and the space for controlling the pressure of the space; and a pressure controller for controlling the pressure of the space by controlling the servo valve. And the servo valve is arranged to move while maintaining a substantially constant positional relationship with the mask.

  The device manufacturing method of the present invention includes a step of transferring a mask pattern onto a photosensitive substrate using the above exposure apparatus, and a step of developing the photosensitive substrate to which the pattern has been transferred.

  According to the present invention, for example, the pressure of the space defined by the mask and the space definition member provided thereto can be controlled with high accuracy, and thereby the shape of the mask can be controlled with high accuracy.

  Hereinafter, an exposure apparatus according to a preferred embodiment of the present invention will be described.

  1 and 2 are a perspective view and a side view, respectively, showing a schematic configuration of an exposure apparatus according to a preferred embodiment of the present invention. FIG. 3 is an enlarged view of a part of FIG. FIG. 4 is a diagram schematically showing the configuration of the mask stage, the mask, and the deflection correction mechanism of the exposure apparatus shown in FIGS.

  1, 2, and 3, the exposure apparatus EX is supported by a mask stage MST that holds and moves a mask M on which a pattern is formed, a substrate stage PST that supports a photosensitive substrate P, and a mask stage MST. An illumination optical system IL that illuminates the mask M with the exposure light EL, a projection optical system PL that projects and transfers the pattern of the mask M illuminated with the exposure light EL onto the photosensitive substrate P held by the substrate stage PST, and a mask And a loader ML. The exposure apparatus EX preferably further includes a deflection measuring device 60 that measures the deflection amount of the mask M.

  On the upper part of the mask M, a deflection control unit (a space defining member that defines the space S) 1 that forms a deflection control space S with the surface of the mask M as a part of the boundary is disposed. The mask M held on the mask stage MST and the photosensitive substrate P held on the substrate stage PST are arranged in a conjugate positional relationship via the projection optical system PL. The exposure apparatus EX of this embodiment is configured as a so-called mirror scan type exposure apparatus having a large concave mirror. The photosensitive substrate P is typically a glass plate (glass substrate) coated with a photosensitive agent (photoresist).

  In this embodiment, the exposure apparatus EX is configured as a scanning exposure apparatus, and the mask M and the photosensitive substrate P are moved synchronously with respect to the illumination optical system IL that emits the exposure light EL, so that the pattern of the mask M is obtained. Is transferred onto the photosensitive substrate P by scanning exposure. In the following, the optical axis direction of the projection optical system PL is the Z-axis direction, the direction perpendicular to the Z-axis direction is the synchronous movement direction of the mask M and the photosensitive substrate P is the Y-axis direction (scanning direction), the Z-axis direction and the Y-axis direction. The direction orthogonal to the X axis direction is taken as the X axis direction. The directions around the X axis, the Y axis, and the Z axis are the θX direction, the θY direction, and the θZ direction.

  The illumination optical system IL includes, for example, a light source including a high pressure mercury lamp and the like, an elliptical mirror that condenses the light emitted from the light source, and a condenser lens that expands the light collected by the elliptical mirror and converts it into a parallel light A limiting slit plate disposed at a position conjugate with the mask M in order to cut a portion of the parallel light flux from the condenser lens that is not used as irradiation light to the mask M and define an illumination area having a predetermined area; A mirror that reflects the light beam from the slit plate and irradiates the mask M with the slit-shaped illumination light beam can be included.

The exposure light EL generated by the illumination optical system IL is, for example, a far-field such as KrF excimer laser light (wavelength 248 nm) in addition to the ultraviolet emission lines (g-line, h-line, i-line) emitted from the mercury lamp. Ultraviolet light (DUV light), vacuum ultraviolet light (VUV light) such as ArF excimer laser light (wavelength 193 nm) and F ₂ laser light (wavelength 157 nm) can be used. The illumination optical system IL can be configured as a so-called Koehler illumination system.

  The mask stage MST is configured to scan the mask M with respect to the illumination optical system IL, has a long stroke in the Y-axis direction (scanning direction), and an appropriate stroke in the X-axis direction orthogonal to the scanning direction. Have. The mask stage MST has a suction unit 40 for holding the mask M. The suction unit 40 is connected to a vacuum device (not shown), and the mask M is vacuum-sucked and held by the suction unit 40. The mask stage drive unit MSTD drives the mask stage MST in the X axis direction and the Y axis direction. The mask stage driving unit MSTD can be controlled by the main control system.

  As shown in FIG. 1, movable mirrors 32a and 32b are provided in directions orthogonal to each end edge in the X-axis direction and the Y-axis direction on the mask stage MST. A laser interferometer Mx1 is arranged so as to face the moving mirror 32a, and a plurality (two in this embodiment) of laser pedometers My1 and My2 are arranged so as to face the moving mirror 32b. The laser interferometers My1 and My2 irradiate the movable mirror 32b with laser light, and detect the distance between the laser interferometers My1 and My2 and the movable mirror 32b. The detection results of the laser interferometers My1 and My2 are output to the main control system, and the main control system determines the position of the mask stage MST in the Y-axis direction and the amount of rotation about the Z-axis based on the detection results of the laser interferometers My1 and My2. Is calculated. The laser interferometer Mx1 irradiates the movable mirror 32a with laser light, and detects the distance between the laser interferometer Mx1 and the movable mirror 32a. The detection result of the laser interferometer Mx1 is output to the main control system, and the main control system obtains the position of the mask stage MST in the X-axis direction based on the detection result of the laser interferometer Mx1. The main control system controls the mask stage drive unit MSTD while monitoring the position (posture) of the mask stage MST from the outputs of the laser interferometers Mx1, Mx2, and My1, thereby bringing the mask stage MST to a desired position (posture). Set.

  The exposure light EL that has passed through the mask M enters the projection optical system PL. The projection optical system PL forms an image of a pattern existing in the illumination area of the mask M on the photosensitive substrate P. As shown in FIG. 2, the projection optical system PL can form an image of the pattern of the mask M on the photosensitive substrate P via, for example, a trapezoidal mirror 52, a convex mirror 53, and a concave mirror 54. The projection area of the projection optical system PL onto the photosensitive substrate P is set to a predetermined shape (for example, an arc shape).

  The substrate stage PST for driving the photosensitive substrate P serves as a substrate holder for holding the photosensitive substrate P. Similar to mask stage MST, substrate stage PST has a scanning stroke in the Y-axis direction (scanning direction) and a stroke for step movement in the X-axis direction orthogonal to the scanning direction. Further, the substrate stage PST is configured to be movable in the Z-axis direction and the θX, θY, and θZ directions. The substrate stage drive unit PSTD drives the substrate stage PST in the X axis direction and the Y axis direction. The substrate stage drive unit PSTD is controlled by the main control system.

  As shown in FIG. 1, movable mirrors 33a and 33b are installed in the directions orthogonal to the respective end edges in the Y-axis direction and X-axis direction on the substrate stage PST. A plurality of (for example, three) laser interferometers Pxl, Px2, and Px3 are arranged so as to face the movable mirror 33a extending in the X-axis direction. A plurality of (for example, two) laser interferometers Pyl and Py2 are arranged so as to face the movable mirror 33b extending in the Y-axis direction. The plurality of laser interferometers Pxl to Px3 are arranged at equal intervals along the Y-axis direction. The laser interferometers Pyl and Py2 irradiate the moving mirror 33b with laser light, and detect the distance between the laser interferometers Pyl and Py2 and the moving mirror 33b. The detection results of the laser interferometers Pyl and Py2 are output to the main control system, and the main control system determines the position of the substrate stage PST in the Y-axis direction and the amount of rotation about the Z-axis based on the detection results of the laser interferometers Pyl and Py2. Ask for. The laser interferometers Pxl to Px3 irradiate the moving mirror 33a with laser light to detect the distance between the laser interferometers Pxl to Px3 and the moving mirror 33a. Here, since the substrate stage PST has a long scanning stroke in the Y-axis direction, the laser interferometers Pxl to Px3 can be switched according to the position of the substrate stage PST. The detection results of the laser interferometers Pxl to Px3 are output to the main control system, and the main control system obtains the position of the substrate stage PST in the X-axis force direction based on the detection results of the laser interferometers Pxl to Px3. The main control system monitors the position (posture) of the substrate stage PST from the outputs of the laser interferometers Pyl, Py2, and Pxl to Px3, and controls the substrate stage drive unit PSTD, thereby moving the substrate stage PST to a desired position (posture). Set to.

  The mask stage drive unit MSTD and the substrate stage drive unit PSTD are controlled by the main control system, and the mask stage MST and the substrate stage PST are driven by the mask stage drive unit MSTD and the substrate stage drive unit PSTD, respectively. The main control system controls the driving units PSTD and MSTD while monitoring the positions of the mask stage MST and the substrate stage PST, thereby moving the mask M and the photosensitive substrate P to an arbitrary scanning speed (synchronized with respect to the projection optical system PL). Drives synchronously in the X-axis direction at the moving speed).

In this specification, a configuration example of an exposure apparatus suitable for manufacturing a liquid crystal display device is shown, but the exposure apparatus can also be used for manufacturing a semiconductor chip, a thin film magnetic head, and the like. It is obvious to those skilled in the art that the present invention can be applied to an exposure apparatus suitable for manufacturing a semiconductor chip, a thin film magnetic head or the like. The projection optical system may be an equal magnification system, a reduction system, or an enlargement system. Projection optics, in the case of using the far ultraviolet rays such as an excimer laser is preferably consist of glass material which transmits far ultraviolet rays such as quartz and fluorite, in the case of using the F ₂ laser, catadioptric or refractive It is preferable that the optical system is configured. When a linear motor is used as the driving device for the substrate stage PST and the mask stage MST, for example, an air levitation type using an air bearing and a magnetic levitation type using Lorentz force or reactance can be employed. The stage may be of a type that moves along a guide, or may be a guideless type without a guide. When a flat motor is used as a stage driving device, either the magnet unit or the armature unit is arranged on the stage side, and the other of the magnet unit and the armature unit is arranged on the surface plate (base) side of the stage. Good. The warp generated by the movement of the substrate stage PST can be released mechanically to the floor (ground) using a frame member as described in JP-A-8-166475. The warpage generated by the movement of the mask stage MST can be released mechanically to the floor (ground) using a frame member as described in Japanese Patent Laid-Open No. 8-330224.

  FIG. 3 shows a mask deflection measuring device 60. The deflection measuring device 60 is disposed, for example, above the mask M, and measures the position of the upper surface or the lower surface of the mask M in the Z-axis direction. The deflection control unit (space defining member) 1 disposed on the mask M includes a light transmission member 3 disposed to face the mask M. The deflection measuring device 60 can include, for example, a laser displacement meter, and can measure the deflection of the mask M when the measurement light passes through the light transmitting member 3. The deflection measuring device 60 may be arranged below the mask M and measure the deflection of the mask M from below. As shown in FIG. 5, the measurement result of the deflection measuring device 60 is provided to the arithmetic device CL. The computing device CL computes a pressure command value for correcting the deflection of the mask M based on the provided measurement result, and provides the pressure command value to the pressure control device PRC. The pressure control device PRC controls the pressure in the deflection control space S based on the provided pressure command value.

The amount of deflection of the mask M depends on the pressure in the deflection control space S. Therefore, the deflection amount of the mask M can be controlled by the pressure in the deflection control space S. For example, if the material of the mask M is quartz (specific gravity 2.2) and the thickness is 10 mm, the pressure acting on the mask M by its own weight (self-weight pressure) is 2.2 g · f / cm ² = 2. 2 × 10 ² Pa. That is, the self-weight pressure acting on the mask M is 0.2% of the atmospheric pressure (1 atm = 1.03 × 10 ⁵ Pa). In this case, in order to cancel the self-weight pressure acting on the mask M and correct the deflection of the mask M to such an extent that high-accuracy scanning exposure is possible, the pressure control of the deflection control space S is about −2.2 × 10. ^It is necessary to make it ² Pa (gauge pressure). In addition, it is preferable that the pressure control is performed with an accuracy such that the pressure fluctuation in the deflection control space S is within ± several Pa of the target value of the pressure control.

  When the deflection control unit 1 is disposed above the mask M as described above, in order to correct the deflection of the mask M due to its own pressure, the pressure in the deflection control space S is set to atmospheric pressure (or the pressure of the surrounding environment). ) Must be negative. On the other hand, when the deflection control unit 1 is disposed below the mask M, the pressure in the pressure control space S is set to atmospheric pressure (or the pressure of the surrounding environment) in order to correct the deflection of the mask M due to its own pressure. It is necessary to make positive pressure against. In this embodiment, the configuration example in which the deflection control unit 1 is disposed above the mask M will be mainly described. However, the present invention may include an embodiment in which the deflection control unit 1 is disposed below the mask M. In such an embodiment, a configuration in which the inside of the bending control space S is set to a positive pressure is adopted instead of the configuration in which the inside of the bending control space S is set to a negative pressure.

  Next, a deflection control unit (space definition member) 1 for defining a deflection control space S with the surface of the mask M as a boundary will be described with reference to FIGS. FIG. 4 shows a schematic configuration of the mask M held by the mask stage MST and the deflection control unit 1 in addition to the mask stage MST. FIG. 5 shows a schematic configuration of a deflection correction system or a pressure control system that corrects the deflection of the mask M by controlling the pressure in the deflection control space S.

  The deflection control unit 1 can be configured to include a light transmission plate 3 and a frame 2 facing the mask M. The frame 2 can be typically disposed between the light transmission plate 3 and the mask M so as to follow the outer peripheral edge of the light transmission plate 3. The deflection control unit 1 can be arranged such that the frame 2 is in contact with or close to the mask M. The deflection control unit 1 may be fixed to the mask M by a method removable from the mask M, may be placed on the mask M, and is held by a holding mechanism so as to contact or approach the mask M. May be. The mask M is typically rectangular, and accordingly, the light transmission plate 3 and the frame 2 can also be typically rectangular.

  By arranging the deflection control unit 1 in contact with or close to the mask M, the deflection control space S is defined by the light transmission plate 3 and the frame 2 of the deflection control unit 1 and the mask M.

  The deflection control unit 1 is a flow that connects the connection part 4 for connection with the connection part 6 on the mask stage MST side, and the flow path 6a provided in the connection part 6 on the mask stage MST side. A path 5 may further be included. The connection part 6 on the mask stage MST side is typically arranged on the mask stage MST. In addition, when the connection parts 4 and 6 or the tube or cable connected to it are arrange | positioned in an illumination area, a light-shielding plate (for example, metal) may be provided so that exposure light may not hit them. preferable.

  The frame 3 can be made of a resin that hardly damages the mask M, such as polycarbonate. Polycarbonate is a member that produces a good finished surface with less degassing. The light transmission plate 3 is made of a material that transmits the exposure light EL, such as a glass plate. The frame 2 and the light transmission plate 3 can be fixed by various fixing methods such as screws and adhesives. One or a plurality of grip portions 9 held by a mask loader (operation mechanism) ML can be provided on a predetermined portion of the deflection control unit 1, for example, an upper portion of the light transmission plate 3. In the configuration example shown in FIG. 3, two grip portions 9 are provided on two opposing sides along the Y axis.

  It is preferable that a contact member (interface member) 7 is provided on all or part of the surface of the deflection control unit 1 facing the mask M and the mask M. By disposing the contact member 7 between all or part of the deflection control unit 1 and the mask M, the movement amount is limited while allowing the gas to move between the deflection control space S and the external space. Can do. The contact member 7 may be bonded to the deflection control unit 1 or may be bonded to the mask M.

  The movement of the gas between the deflection control space S and the external space prevents thermal expansion, deformation, dissolution, etc. of the mask M and the deflection control unit 1 due to the temperature rise of the gas in the deflection control space S during exposure. For example, the continuous inflow of gas from the external space into the deflection control space S is effective for cooling the deflection control space S or suppressing temperature fluctuations. Here, if the amount of movement of the gas between the deflection control space S and the external space is too large, it becomes difficult to control the pressure of the deflection control space S, thereby making it difficult to correct the deflection of the mask M. Therefore, as a constituent material of the contact portion 7, rubber that provides a required sealing function with high flexibility is useful. Furthermore, since degassing of siloxane or the like is not preferable in the exposure apparatus, foamed fluororubber is useful among the rubbers. Foamed fluororubber is a useful material because it is a fluororubber and does not generate siloxane, it is a foam and has flexibility, and it is an independent foam and therefore has excellent sealing properties.

  The contact member 7 can also contribute to the suppression of the relative displacement between the deflection control unit 1 and the mask M that can be generated by the scanning movement of the mask M when the mask stage MST is driven. The contact member 7 has a friction coefficient that provides a required frictional force that can be determined by the weight of the deflection control unit 1 and the assumed driving profile (eg, acceleration, speed) of the mask stage MST. The surface finish can be determined. For example, the contact member 7 is preferably made of a synthetic rubber or the like that provides a high frictional force and has low outgassing.

  The frame 2 will be further described. When the frame 2 is thickened, the volume of the deflection control space S increases in proportion thereto. This can reduce the pressure control accuracy of the deflection control space S. On the other hand, when the frame 2 is thinned, for example, when a negative pressure is applied to the deflection control space S more than necessary, the light transmission plate 3 and the mask M can come into contact with each other. Therefore, it is necessary to determine the thickness of the frame 2 in consideration of the amount of bending due to the weight of the mask M, the amount of bending of the light transmission plate 3, and the like.

  The frame 2 and the light transmission plate 3 can be connected by various methods as described above. From the viewpoint of ease of maintenance work, the frame and the light transmission plate 3 can be connected to each other like a method using a fastener such as a screw. It is preferable to use a method that allows easy separation. Here, by sufficiently increasing the surface processing accuracy of each interface surface of the frame 3 and the light transmission plate 3, a sufficiently high sealing function can be obtained even by a connection method using a fastener such as a screw. A sealing material may be interposed between the frame 2 and the light transmission plate 3 as necessary.

  As illustrated in FIGS. 4 and 5, the servo valve 10 and the differential pressure sensor (pressure sensor) 11 are connected to the connection portion 6 disposed on the mask stage MST via the flow paths 10a and 11a, respectively. Has been. The servo valve 10 and the differential pressure sensor 11 may be disposed on the mask stage MST, or may be disposed on a mounting stage that moves with the mask stage MST while maintaining a substantially constant positional relationship with the mask stage MST.

  In the configuration example shown in FIGS. 4 and 5, the servo valve 10 and the differential pressure sensor 11 are arranged on the mask stage MST. The servo valve 10 has two ports, and one port communicates with the flow path 6a of the connecting portion 6 via the flow path 10a (further, the deflection control space S via the flow path 5). The two ports communicate with the gas port of the relay section C1 through the flow path 10g. Further, an electric signal line 10e for driving the servo valve 10 is wired between the servo valve 10 and the relay portion C1. The differential pressure sensor 11 has two ports, and one port communicates with the flow path 6a of the connecting portion 6 via the flow path 11a (further, the deflection control space S via the flow path 5). The other port communicates with the surrounding environment (external space of the deflection control space S and typically the atmosphere). That is, the output of the differential pressure sensor 11 provides a differential pressure between the deflection control space S and the surrounding environment. This differential pressure is a pressure difference acting on the mask M in order to cancel the flexure generated in the mask M due to its own weight. The output signal of the differential pressure sensor 11 is provided to the repeater C1 via the electric signal line 11e.

  The repeater C1 is disposed on the mask stage MST or the mounting stage, and is connected to the repeater C2 disposed on the remote control unit F via a flexible tube 12g and a flexible cable 12e. Typically, the remote control unit F having the repeater C2 can be installed in a fixed part of the exposure apparatus, but the mask stage MST or mounting stage having the repeater C1 moves together with the mask stage MST. Therefore, the relays C1 and C2 are connected by a flexible electrical and mechanical connection material. The flow path 10g connected to one port of the servo valve 10 communicates with the buffer tank 13 via the relay C12, the flexible tube 12g, and the relay C2. When the opening of the servo valve 10 is increased, the amount of gas sucked into the buffer tank 13 from the deflection control space S through the flow path 10g, the relay C12, the flexible tube 12g, and the relay C2 through the servo valve 10 is increased. On the contrary, when the opening degree of the servo valve 10 is decreased, the servo valve 10 is sucked from the deflection control space S to the buffer tank 13 through the flow path 10g, the relay C12, the flexible tube 12g, and the relay C2. The amount of gas produced is reduced. An electric signal for driving the servo valve 10 is provided from the pressure control device PRC to the servo valve 10 via the electric signal line 10e2, the relay C2, the flexible cable 12e, the relay C1, and the electric signal line 10e. The output signal of the differential pressure sensor 11 is provided from the differential pressure sensor 11 to the pressure controller PRC via the electrical signal line 11e, the relay C1, the flexible cable 12e, the relay C2, and the electrical signal line 11e2.

  Here, the flexible tube is an example of a part that can move relative to the other end of the flexible tube and that constitutes the flow path. A flexible cable is an example of a component that can move relative to the other end of one end and can transmit an electrical signal. In this specification, the interface represented by the flexible tube which connects between the repeaters C1 and C2, the flow path formed therein, the flexible cable and the signal line formed thereby is referred to as a flexible interface (12).

  The pressure control device PRC generates a drive signal for the servo valve 10 so that the differential pressure indicated by the output signal of the differential pressure sensor 11 provided through the flexible interface 12 becomes a preset target differential pressure. A drive signal is provided to the servo valve 10 through the flexible interface 12. That is, the pressure control device PRC feedback-controls the differential pressure between the deflection control space S and the external space so that the differential pressure between the deflection control space S and the external space matches the target differential pressure. Here, the drive signal of the servo valve 10 can be, for example, a signal for controlling the opening degree of the servo valve 10 or a signal for intermittently controlling opening and closing of the servo valve 10. The target differential pressure is a differential pressure between the deflection control space S necessary for correcting the deflection of the mask M and its external space, and can be determined based on, for example, the size and thickness of the mask M.

  The configuration example shown in FIG. 5 is based on the premise that external gas flows into the deflection control space S through the space between the mask M and the frame. Therefore, in order to increase the pressure in the deflection control space S, the deflection control space S is used. It does not have a mechanism for forcibly sending gas into the tube. However, it is also useful to provide a mechanism for forcibly sending gas into the deflection control space S. In this case, a pressure control system including a supply servo valve is separately provided, and the supply servo valve is used as the differential pressure sensor 11. The pressure control device PRC may be controlled based on the output. The air supply servo valve is preferably arranged on the mask stage MST or the mounting stage in the same manner as the exhaust servo valve 10 described above, and the air supply servo valve can be controlled by the pressure controller PRC through the flexible interface 12. . In addition, it is preferable that the remote control unit F be provided with an air supply buffer tank for supplying pressurized gas to the air supply servo valve. A pressurization line (pressure control line) connected to a pressure source is connected to the air supply buffer tank.

  It is preferable that the load when driving the mask stage MST, which is a movable part, be as small as possible, particularly in a scanning exposure apparatus. Therefore, the pressure control device PRC and the buffer tank 13 are preferably provided in the remote operation unit F. However, since it is preferable that the differential pressure sensor 11 and the servo valve 10 move while maintaining a certain positional relationship with the mask stage MST, the differential pressure sensor 11 and the servo valve 10 are arranged on the mask stage MST or a mounting stage that moves while maintaining a substantially constant relationship therewith. It is preferable. If the differential pressure sensor 11 and the servo valve 10 are arranged in a portion that moves relative to the mask stage MST (for example, a frame of an exposure apparatus), the differential pressure sensor 11 and the servo valve 10 and the deflection control space S are arranged. Need to be connected by a deformable member having flexibility such as a flexible tube. Such a member is deformed with the movement of the mask stage M, and further vibrates depending on the case. Naturally, the measured value by the differential pressure sensor 11 fluctuates and the pressure on the deflection control space S side of the servo valve 11 also changes. fluctuate.

  The buffer tank 13 is connected to a pressure control line such as a decompression line (not shown). The buffer tank 13 contributes to the improvement of the stability and followability of the pressure control of the deflection control space S. For example, when there is an abrupt variation or regular variation in the pressure of the decompression source or the decompression line, the buffer tank 13 reduces such variation and maintains a substantially constant pressure. Thereby, the pressure fluctuation of the deflection control space S can be suppressed within a target value (target differential pressure) ± several Pa, for example. Further, in the configuration in which the exhaust pipe constituted by the flexible tube 12g or the like is further connected to the decompression line, the pipe resistance increases. Therefore, when the buffer tank 13 is not provided, it takes a long time from when the mask M is transported to the mask stage MST to start the pressure control of the deflection control space S until the pressure of the deflection control space S reaches the target value. Cost. By providing the buffer tank 13, it is difficult to be affected by the pipe line resistance of the decompression line piped between the exposure apparatus and the decompression source, and the throughput can be improved.

  In the configuration in which the differential pressure sensor 11 is disposed on the mask stage MST or a mounting stage that moves while maintaining a substantially constant positional relationship with the mask stage MST, the pressure in the deflection control space S is controlled especially when the mask stage MST is moved in addition to being stationary. In this case, it is important to reduce the measurement error of the differential pressure sensor 11 due to the movement of the differential pressure sensor 11. Here, when a gas flow is generated around the differential pressure sensor 11 as the mask stage MST moves, the pressure in the surrounding environment of the differential pressure sensor 11 fluctuates, which causes a measurement error of the differential pressure sensor 11. In the simplest example, when there is a gas flow around the differential pressure sensor 11, the pressure around the differential pressure sensor 11 becomes lower than the atmospheric pressure by Bernoulli's theorem. Furthermore, in an actual system, a more complicated gas flow occurs, and the pressure around the differential pressure sensor 11 can be lower than atmospheric pressure or vice versa.

  Therefore, it is preferable to provide an enclosure portion 11b that surrounds the periphery of the differential pressure sensor 11 (particularly, a port communicating with the external environment). Furthermore, it is preferable to provide the opening part 11c for making the pressure in the enclosure part 11b correspond with an external environment in the enclosure part 11b. The surrounding part 11b which has the opening part 11c can be made into a structure like a 100-leaf box, for example. However, in order to eliminate the measurement error of the differential pressure sensor 11 due to the movement of the differential pressure sensor 11 or the gas flow that may exist in the vicinity, the opening 11c can be closed as necessary. Is preferable. For example, the enclosure portion 11c preferably includes a closing member 11e for closing the opening portion 11c, and an actuator 11d that drives the closing member 11e in response to a command from the pressure control device PRC or the like. The mechanism including the closing member 11e and the actuator 11d can be configured as an electromagnetic valve or an electromagnetic shutter, for example.

  Typically, the closing member 11e is driven by the actuator 11d so as to close the opening 11c immediately before the start of the movement of the mask stage MST (as a result, the differential pressure sensor 11) and to open the opening 11c after the end of the movement. Can be done. Alternatively, the closing member 11e can be driven by the actuator 11d so as to close the opening 11c immediately before the start of exposure and to open the opening 11c after the exposure ends. According to such control, even when the mask stage MST is moved or exposed, the pressure in the deflection control space S is controlled without being affected by the gas flow in the external environment of the differential pressure sensor 11, and the mask M The deflection can be corrected or corrected. Further, the movement of the mask stage MST causes deformation of the mask M and the deflection control unit 1, which may further cause pressure fluctuations in the deflection control space S, but the differential pressure sensor 11 is also moved when the mask stage MST is moving. By controlling the pressure in the deflection control space S based on the output signal, the deflection of the mask M can be corrected or corrected.

  Next, a method for transferring the pattern of the mask M onto the photosensitive substrate P using the above exposure apparatus will be described. Here, it is assumed that the mask M is bent so as to protrude downward due to its own weight, as shown in FIG. When the mask M to which the deflection control unit 1 is attached is held on the mask stage MST and the photosensitive substrate P is held on the substrate stage PST, the main control system starts scanning exposure after the alignment processing. In the example shown in FIG. 6, the pattern formation surface of the mask M is bent toward the −Z side (downward side) with respect to the ideal position (position where the best focus is obtained) Zr indicated by the broken line. Information on the amount of deflection of the mask M calculated by the calculation device CL based on the output of the deflection measuring device 60 is provided to the pressure control device PRC. The pressure control device PRC controls the pressure of the deflection control space S through the flexible interface 12 so that the deflection of the mask M is corrected based on the information regarding the deflection amount provided from the arithmetic device CL. In the example shown in FIG. 6, the pressure controller PRC increases the opening of the servo valve 10 so that the pattern formation surface of the mask M at the exposure position EX and the ideal position Zr coincide with each other, and the pressure in the deflection control space S Reduce.

  The pressure target value in the deflection control space S is determined by, for example, determining the provisional pressure target value based on the thickness information of the mask M, and then controlling the pressure in the deflection control space S by the pressure controller PRC according to the provisional target pressure value. The mask stage MST is scanned and driven with the deflection of the mask M corrected, and the deflection amount at that time is monitored by the deflection measuring device 60 so that the average value of the deflection amount becomes 0 (that is, the pattern formation of the mask M). The final pressure target value can be determined by a procedure such that the surface coincides with the ideal position Zr). Alternatively, the pressure target value in the deflection control space S is adjusted so that the deflection is corrected based on the measurement result while measuring the deflection amount of the mask M by the deflection measuring device 60 at the time of scanning exposure (that is, the mask M). It may be dynamically changed so that the pattern forming surface coincides with the ideal position Zr). When measuring the amount of deflection of the mask M during the movement of the mask stage MST in this way, the deflection measuring device 60 is arranged to measure the deflection of the mask M in the vicinity of the illumination area where the mask M is illuminated with the exposure light. It is preferred that

  Instead of using the measurement result by the deflection measuring device 60, a pressure command value for correcting the deflection due to its own weight or the like for each of the plurality of masks may be stored in the memory MRY (see FIG. 5). In this case, the pressure control device PRC can read out a pressure command value for correcting the deflection of the mask M to be used from the memory MRY and control the pressure in the deflection control space S based on the pressure command value. . Alternatively, the memory MRY may store information indicating the amount of deflection due to its own weight for each of the plurality of masks. In this case, the calculator CL reads the deflection amount for the mask M to be used from the memory MRY, calculates a pressure command value for correcting the deflection of the mask M, and provides the pressure command value to the pressure controller PRC. To do. Furthermore, by using both of the measurement result (deflection amount) by the deflection measuring device 60 and the deflection amount stored in the memory MRY, the presence / absence of the deflection may be determined by comparing the both. Alternatively, the relationship between the size and thickness of the mask M and the pressure target value for correcting the deflection is stored in advance in the memory MRY. For example, when the mask M is loaded on the mask stage MST, the size and thickness of the mask M are stored. Or obtaining these information based on the ID of the mask M, etc., obtaining a pressure target value corresponding to the size and thickness of the mask M from the memory MRY, and according to the pressure target value, the mask M May be corrected. Alternatively, for a mask that is used for exposure and whose pressure target value is determined at that time, the pressure target value is stored in the memory MRY, and when the mask is used next, the pressure target value is stored. You may read from memory MRY.

  In the above-described embodiment, the deflection of the mask M is corrected by controlling the pressure in the deflection control space S. For example, the mask M is arbitrarily bent such that the mask M is positively bent upward. The pressure in the deflection control space S may be controlled in order to control it. Thereby, the distortion of the pattern image projected on the photosensitive substrate P can be controlled.

  When the exposure is completed and the mask M is no longer needed, the mask M can be returned to the mask stocker. At this time, the mask M and the deflection control unit 1 may be transported together or may be transported separately. The mask M and the deflection control unit 1 can be conveyed or operated by a mask loader (operation mechanism) ML. The mask loader ML can carry only the deflection control unit 1 as shown in FIG. 7 (a), or in a state where the deflection control unit 1 is placed on the mask M as shown in FIG. 7 (b). The mask M and the deflection control unit 1 can also be transported. Furthermore, the mask loader ML may be configured to be able to carry only the mask M alone.

  The mask M may be transported to the mask stage MST in a state where the deflection control unit 1 is arranged on the mask M in advance, or after the mask M is transported to the mask stage MST, the deflection control unit 1 is placed on the mask M. It may be arranged.

  The mask M and the deflection control unit 1 may be mechanically coupled by a coupling tool or a coupling mechanism, but in this case, an operation for coupling or releasing the mask M and the deflection control unit 1 is required. become. Further, it is generally sufficient that the mask M and the deflection control unit 1 are operated in a state where they overlap each other. Therefore, in this embodiment, the mask M and the deflection control unit 1 are operated without being connected by a connecting tool or a connecting mechanism. However, in order to prevent the mask M and the deflection control unit 1 from being displaced from each other during conveyance or scanning exposure, as shown in FIG. Alternatively, it is preferably provided in the deflection control unit 1.

  The exposure apparatus of this embodiment can handle a plurality of types of masks M having different sizes and the like, and can therefore handle a plurality of types of deflection control units 1 having different sizes and the like. The mask M and the deflection control unit 1 can be accommodated in the stocker as will be described later. On mask stage MST, connection part 4 of deflection control unit 1 and connection part 6 arranged on mask stage MST are connected.

As exemplarily shown in FIG. 8, the mask M is in contact with or bonded to the contact member 7 in the peripheral portion thereof. Therefore, since the deflection control space S is not exposed, the shape of the peripheral portion of the mask M cannot be controlled by the pressure control of the deflection control space S. More specifically, even if the deflection control space S is set to a negative pressure with respect to the external environment and an upward pressure is applied to the mask M, the pressure is only in the region S ₁ exposed in the deflection control space S. to join, not applied to the area S ₂ that is not exposed to bending control space S. Therefore, although it is possible to cancel the weight applied to the area S ₁ by the negative pressure deflection control space S, not be canceled in its own weight applied to the area S _2. Therefore, in order to correct the deflection of the peripheral portion of the mask M, it is necessary to support the area S ₂ from below. As shown in FIG. 8, when the size of the mask M matches the size of the mask holder 40h of the mask stage MST, the peripheral portion of the mask M is supported by the mask holder 40h on the four sides. However, as shown in FIG. 9, the size of the mask M in the Y direction is small, and only two sides of the mask M (sides parallel to the Y direction) are supported by the mask holder (suction portion 40) of the mask stage MST. In other words, only the weight of the mask M acts on the other two sides (sides parallel to the X direction), and bending may occur. Therefore, it is preferable that the support mechanism 14 supports the whole or a part (for example, the central portion) of the peripheral portion of the mask M that is not supported by the mask holder (suction portion 40). The support mechanism 14 preferably automatically moves to the retracted position when mask support is unnecessary. Furthermore, it is preferable that the deflection control unit 1 includes a reinforcing beam 15 for reinforcing a portion that is not supported by the mask holder (suction portion 40).

  Next, the mask M replacement mechanism and replacement method will be described with reference to FIGS. The mask exchange mechanism of this embodiment includes a mask buffer BF and a mask operation robot (second operation mechanism) MX in addition to the mask loader ML described above. The mask loader ML includes, for example, a first drive mechanism ML-X that moves the mask M in the horizontal one-axis direction (X direction) and a second drive mechanism ML-Y that moves the mask M in the vertical direction (Z direction). Although it may be configured with a two-axis drive mechanism including, it may be configured with a drive mechanism with three or more axes. As shown in FIG. 10, when the mask M and the deflection correction unit 1 are arranged on the mask stage MST and exposure processing is performed using them, the mask M to be used next is determined by the mask operation robot MX. Prepared in place. In this way, by preparing the next mask M to be used during the execution of the exposure process, it is possible to suppress a decrease in throughput due to mask replacement. When the exposure process is completed, as shown in FIG. 11, the mask M on the mask stage MST and the deflection control unit 1 are transported onto the mask buffer BF by the mask loader ML and temporarily held in the mask buffer BF. Next, as shown in FIG. 12, the deflection control unit 1 on the mask buffer BF is transferred onto the mask M prepared at a predetermined position by the mask operation robot MX by the mask loader ML. As a result, a set of the mask M and the deflection control unit 1 for controlling the deflection thereof is prepared. Next, the mask M and the deflection control unit 1 held by the mask operating robot MX are transferred to the mask stage MST by the mask loader ML. Thereafter, the mask M remaining on the mask buffer BF is transferred to the mask operation robot MX by the mask loader ML. When the received mask M is a mask to be used next, the mask operation robot MX keeps holding the mask M as it is, and when it is not the mask to be used next, returns to the mask stocker. Remove the mask to be used from the mask stocker.

  In the example shown in FIGS. 10 to 13, the deflection control unit 1 attached to the mask M used for the exposure process is also adapted to the mask M to be used for the next exposure process. This is an example in which the same deflection control unit 1 is used. On the other hand, when it is necessary to change the deflection control unit in accordance with the change of the mask to be used, the pair of masks M and the deflection control unit 1 are placed on the mask buffer BF by the mask loader ML after the exposure process is completed. Next, the pair of masks M and the deflection control unit 1 prepared by the mask operation robot MX are transported to the mask stage MST by the mask loader ML, and then the pair of masks M and the deflection control unit on the mask buffer BF. 1 is returned to the mask operation robot MX by the mask loader ML.

  Next, the operation of the mask operation robot MX will be described with reference to FIGS. 14A to 14F. The stocker S is for separating a mask storage unit SM for storing a plurality of masks M, a unit storage unit SCU for storing a plurality of deflection control units 1, and a dustproof cover MC attached to the mask M from the mask M. It includes a work area AOP and a robot OP that operates the dust-proof lid MC. First, as shown in FIG. 14A and FIG. 14B in order, the mask operation robot MX takes out the mask M with the dustproof lid MC accommodated in the mask accommodation unit SM. Next, as shown in FIG. 14C, the mask operation robot MX moves the mask M with the dust cover MC to the work area AOP, and separates the dust cover MC on the mask M from the mask M by the robot OP. The robot OP places the dust cover MC separated from the mask M on a table placed in the work area AOP.

  Next, as shown in FIG. 14D, the mask operation robot MX moves the mask M below the deflection control unit 1 adapted to the mask M. In this state, as shown in FIG. 14E, the support of the corresponding deflection control unit 1 is released, and the deflection control unit 1 is placed on the mask M. Next, as shown in FIG. 14F, the mask operating robot MX takes out the mask M to which the deflection control unit 1 is attached from the stocker S and arranges it at a predetermined position. This state is shown in FIG.

  Here, an example in which the dustproof lid MC is attached to the mask M is shown. However, when the mask M is accommodated in the cassette, the cassette lid is opened instead of separating the dustproof lid MC from the mask M. Then, the mask M may be taken out from the cassette.

As described above, the mask loader (operation mechanism) ML and the mask operation robot (second operation mechanism) that combine the deflection control unit 1 suitable for the mask M to be used for the exposure process among the plurality of deflection control units 1 with the mask M. ), Various masks can be used in one exposure apparatus EX. Further, according to the configuration in which the combination of the mask M and the deflection control unit 1 adapted to the mask M (for example, placing the deflection control unit 1 on the mask M) is performed during the transfer of the mask M from the stocker S to the mask stage MST, Various masks (and deflection correction units corresponding to them) can be used without changing the configuration of an existing exposure apparatus. Further, by combining the mask M to be used next and the deflection control unit 1 before being transferred to the mask stage MST, it is possible to suppress a decrease in throughput due to mask replacement.
If foreign matter adheres to the deflection control unit 1, illuminance unevenness may be caused during exposure. Therefore, as illustrated in FIG. 15, it is preferable to provide the exposure apparatus with a cleaner for removing foreign matter. In the example shown in FIG. 15, the deflection control unit 1 or the deflection control unit 1 with the mask M is conveyed to the cleaner C by the mask operation robot MX. The cleaner C includes, for example, a foreign matter detection sensor DS that detects foreign matter attached to the deflection control unit 1 and a foreign matter removal mechanism B that removes the foreign matter from the deflection control unit 1 when the foreign matter detection sensor DS detects the foreign matter. Can be equipped with a blower.

  Next, a manufacturing process of a device such as a liquid crystal display device using the above exposure apparatus will be described. FIG. 16 is a diagram showing a flow of an entire device manufacturing process. In step 1 (design), a circuit pattern of a device such as a liquid crystal display device or a semiconductor device is designed. In step 2 (mask fabrication), a mask is fabricated based on the designed circuit pattern. On the other hand, in step 3 (substrate manufacture), a substrate is manufactured using a material such as glass or silicon. Step 4 (wafer process) is called a pre-process, and an actual circuit such as a transistor is formed on the substrate by lithography using the mask and the substrate. The next step 5 (assembly) is called a post-process, and a device such as a liquid crystal display device or a semiconductor device is assembled using the substrate produced in step 4. In step 6 (inspection), inspections such as an operation confirmation test and a durability test of the device manufactured in step 5 are performed. The device is completed through these processes and shipped (step 7).

  FIG. 17 is a diagram showing a detailed flow of a lithography process applied to the substrate process. After forming a semiconductor layer, a metal layer, an insulating layer or the like on the substrate, in step 15 (resist processing), a photosensitive agent is applied to the substrate. In step 16 (exposure), the circuit pattern is transferred onto the photosensitive substrate by the exposure apparatus described above. In step 17 (development), the photosensitive substrate to which the circuit pattern has been transferred is developed. In step 18 (etching), portions other than the developed resist image are removed. In step 19 (resist stripping), unnecessary resist after etching is removed. By repeating these steps, the pattern can be phased on the substrate.

1 is a perspective view showing a schematic configuration of an exposure apparatus according to a preferred embodiment of the present invention. It is a side view which shows schematic structure of the exposure apparatus of suitable embodiment of this invention. It is the figure which expanded a part of FIG. It is a figure which shows typically the structure of the mask stage of the exposure apparatus shown in FIGS. 1-3, a mask, and a bending correction mechanism. A schematic configuration of a deflection correction system or a pressure control system that corrects the deflection of the mask M by controlling the pressure in the deflection control space is shown. It is a figure explaining the bending of a mask. It is a figure explaining conveyance of a mask by a mask loader, or a mask and a deflection control unit. It is a figure explaining the force which acts on a mask. It is a figure explaining the holding method of a small size mask. It is a figure explaining the replacement mechanism and replacement method of a mask. It is a figure explaining the replacement mechanism and replacement method of a mask. It is a figure explaining the replacement mechanism and replacement method of a mask. It is a figure explaining the replacement mechanism and replacement method of a mask. It is a figure explaining operation | movement of a mask operation robot. It is a figure explaining operation | movement of a mask operation robot. It is a figure explaining operation | movement of a mask operation robot. It is a figure explaining operation | movement of a mask operation robot. It is a figure explaining operation | movement of a mask operation robot. It is a figure explaining operation | movement of a mask operation robot. It is a figure which shows schematic structure of the system which cleans a bending control unit. It is a figure which shows the flow of the whole manufacturing process of a device. It is a figure which shows the detailed flow of the lithography process applied to a board | substrate process. It is a perspective view which shows schematic structure of the conventional projection exposure apparatus.

Claims (12)

An exposure apparatus for transferring a mask pattern onto a substrate,
A mask stage that moves the mask together with a space defining member that defines a space with the surface of the mask as a boundary;
A servo valve communicating with the space;
A pressure controller for controlling the pressure in the space by controlling the servo valve;
An exposure apparatus comprising: the servo valve disposed on the mask stage . A pressure sensor for detecting the pressure in the space;
The exposure apparatus according to claim 1 , wherein the pressure controller controls the servo valve based on an output of the pressure sensor. The exposure apparatus according to claim 2 , wherein the pressure sensor is disposed on the mask stage. An exposure apparatus for transferring a mask pattern onto a substrate,
A mask stage that moves the mask together with a space defining member that defines a space with the surface of the mask as a boundary;
A servo valve communicating with the space;
A pressure controller for controlling the pressure in the space by controlling the servo valve;
And the servo valve is arranged on a mounting stage that moves while maintaining a certain positional relationship with the mask stage. A pressure sensor for detecting the pressure in the space;
The exposure apparatus according to claim 4, wherein the pressure controller controls the servo valve based on an output of the pressure sensor.   6. The exposure apparatus according to claim 5, wherein the pressure sensor is disposed on the mask stage or the mounting stage.   The exposure apparatus according to claim 1, further comprising a buffer tank that sucks gas from the space through the servo valve. A measuring instrument for measuring the deflection of the mask;
Wherein the pressure controller, an exposure apparatus according to any one of claims 1 to 7, characterized in that to control the pressure of the space on the basis of an output of the instrument. The space defined member is disposed above the mask, the exposure apparatus according to any one of claims 1 to 8, characterized in that the pressure control line is vacuum line. And the mask and the spatial definition member is in contact via the foamed fluorocarbon rubber member, the mask is in any one of claims 1 to 9, characterized in that it is made of quartz The exposure apparatus described. Any of claims 1 to 10, wherein the interface portion of the mask and the space defined member is configured gas limited amount between said space and the external space are moved 2. The exposure apparatus according to item 1. A device manufacturing method comprising:
Transferring the mask pattern to the substrate using the exposure apparatus according to any one of claims 1 to 11;
Developing the substrate to which the pattern has been transferred;
A device manufacturing method comprising:

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