JP4428112B2 - Appearance inspection method and appearance inspection apparatus - Google Patents

Description

  The present invention is a visual inspection method suitable for application to pattern inspection, foreign matter inspection, etc. for detecting a pattern formed on an inspection target substrate such as a liquid crystal display or an organic EL (Electronic Luminescent) display, for example. And an appearance inspection apparatus.

  For example, FIG. 6 to FIG. 13 show conventional techniques such as a pattern inspection for performing a defect inspection by detecting a pattern formed on a substrate to be inspected such as a flat panel display such as a liquid crystal display or an organic EL display, and a foreign matter inspection. The description will be given with reference. In addition, the same code | symbol is attached | subjected and shown to the corresponding part of each drawing.

  FIG. 6 shows a pixel pattern configuration in which an RGB color filter of a flat panel display is removed as an example of an inspection object. In FIG. 6, for example, a pixel 50 has an active matrix pixel structure, 51 is a-Si (amorphous silicon), 52 is a source electrode, 53 is a drain electrode, 54 is a storage capacitor element, 55 is a scanning line, Reference numeral 56 denotes a signal line.

  FIG. 7 is a flowchart of an appearance inspection process for inspecting the appearance of an inspection object that is generally performed. First, a macro inspection is performed using a low magnification microscope to check the entire panel surface (step S1).

  FIG. 8 is a plan view schematically showing a pixel pattern of the flat panel display (hereinafter also referred to as a panel) shown in FIG. 6, and “A” indicates a pixel (hereinafter also referred to as a unit image). Show. If the panel has a defect 100 as shown in FIG. 8, the position data of the defect indicating the position of the defect on the entire panel surface as shown in FIG. S2).

  In the appearance inspection method for inspecting the object to be inspected based on the difference between the inspected image taken with the imaging device and the reference image and using the repeatability of the pattern in one screen at the time of macro inspection, the design drawing etc. The defect information can be obtained by defining the repetition interval and cutting out all the repeated patterns from one screen and detecting the difference between the cut out images. Further, in the macro inspection process, position data is generated for all detectable defects on the entire panel surface.

  Next, a micro inspection process (also called a review inspection process) is performed based on the above-described defect position data. In the micro inspection process, the defect position is enlarged and displayed with a microscope having a higher magnification, and detailed defect information is acquired. The defect information generally includes the size, color, shape, etc. of the defect, and the defect information can be classified based on such information. First, an image of a defect position is acquired with a high-magnification microscope according to the defect position data calculated in the macro inspection process. Hereinafter, this image is called an inspection image, and FIG. 10 shows an example of the inspection image.

  In order to extract defect information from the image to be inspected shown in FIG. 10, generally a reference image having no defect at the same position is required. Hereinafter, such an image is referred to as a reference image, and FIG. 11 shows an example of the reference image.

  If there is repeatability in the defect image, defect information can be extracted using only the defect image even if there is no reference image, but if there is no pattern repeatability in the defect image as shown in FIG. An image (see FIG. 11) is usually required. As a method of creating a reference image, generally, an image at the same position of adjacent pixels is acquired, and the image is used as a reference image.

  FIG. 12 shows an example of the configuration of a conventional appearance inspection apparatus, in which the above-described reference image creation is realized using two imaging apparatuses. In FIG. 12, 101 is an object to be inspected, 102 and 104 are imaging devices capable of adjusting the enlargement ratio, and 103 and 105 are inspected image memories for storing the inspected image 103a and the reference image 105a captured by the imaging device, respectively. , 108 is an image difference detection circuit that detects the difference by comparing the inspected image 104a and the reference image memory 105a. Further, 109 is a difference information data memory for storing the image difference 108 a detected by the difference detection circuit 108, and 110 is information in the defect information database 111 regarding the image difference supplied from the difference information data memory 109. The defect classification circuits 110 and 112 for classifying which type of defect belongs to the defect classification information memory for storing the classified defect information.

  According to the configuration in FIG. 12, the inspected images 103a (p × q images) and 105a (p × q images) of adjacent pixels are acquired using the two imaging devices 102 and 104. Inspecting the image to be inspected 103a (see FIG. 10) and the reference image 105a by pattern matching to detect an image difference 108a including the defect 100, and whether the image difference is a defect from the image difference and the defect information database, Moreover, if it is a defect, it can classify | categorize what kind of defect it is. Here, the p × q image indicates the size of the image and is represented by the number of pixels in the vertical and horizontal directions (number of unit images).

  On the other hand, for example, an optimum partial pattern extraction device that provides optimum partial pattern extraction that can reduce the amount of computation at the time of pattern matching and shorten the computation time even if the number of pixels of the base image that is the basis of the reference image increases is proposed (For example, see Patent Document 1)

  FIG. 13 is for explaining the outline of the optimum partial pattern extraction apparatus described in Patent Document 1. In FIG. 13, a reference image (m × n image) 121 a supplied from the reference image memory 121 by the pattern search circuit 122 and an inspection image (p × q image (p> m, p> m, p) supplied from the inspection image memory 103. q> n)) Perform a predetermined pattern matching with 103a.

  Here, the predetermined pattern matching means that reference part data having a predetermined number of pixels is sequentially extracted from the reference image data by changing the coordinates, and each reference part data is shifted by a predetermined number of pixels in each direction with respect to the reference image data. The highest matching degree is obtained from the matching degrees. Next, a predetermined matching degree is detected from these matching degrees, and an optimum matching degree is determined from each matching degree detected for each reference partial data having different coordinates. The reference portion data of the coordinates shown is adopted, and this reference portion data is used for positioning the reference image data and the input image data.

Then, the image shift circuit 123 performs alignment by shifting the coordinates of the reference image based on the optimum alignment data obtained as a result of pattern matching between the reference image 121a and the inspected image 103b. Is stored in the reference image memory 124 as a reference image (p × q image) 124a. Then, the image difference detection circuit 108 compares the reference image 124a and the image 104b to be inspected to perform defect inspection, and detects the image difference 108b including the defect 100. The subsequent processing is performed in the same manner as in FIG.
JP-A-5-28271

  However, the conventional example shown in FIG. 12 is a method of extracting defect information by comparing a reference image with an image to be inspected using a defect-free image at another position having the same repeating pattern as a reference image, As shown in FIG. 12, first, there are two imaging devices, and precise position adjustment of these two imaging devices is required, and the possibility that the reference image has a defect cannot be excluded. In addition, a method of taking a reference image by moving one imaging device is also conceivable, but in this case, there is a problem that the moving time of the imaging device is required and the inspection time becomes long.

  Further, in the case described in Patent Document 1, when the photographing magnification is increased in order to detect a smaller difference, the position of the defect is known particularly in the first appearance inspection called macro inspection, and the defect type is recognized. When it is necessary to increase the enlargement ratio as in the second appearance inspection called micro inspection, there is a problem that the pattern in one screen is not repeated and this inspection method cannot be used.

  In view of such a point, an object of the present invention is to reduce an inspection time while suppressing the number of used imaging apparatuses.

In order to solve the above-mentioned problems and achieve the object, the present invention provides a mother board that covers all the minimum repetitive patterns of the inspected image in advance when inspecting the inspected object based on the difference between the inspected image and the reference image. An image is generated, the location of the mother image in the inspected image is searched, a region including the predetermined location of the searched mother image is extracted as a child image, and this child image is a reference image for the inspected image As described above, a difference from the image to be inspected is detected.
At this time, the mother image is inspected based on a difference between a composite image obtained by joining a plurality of images captured at different positions and an image captured at another place having the same repeating pattern as the composite image, It is preferable that the image is created using only an image that has been confirmed to be free of defects in advance.
Further, a characteristic part of a unit image constituting each mother image is extracted as a feature image from a plurality of mother images, the image to be inspected is compared with each feature image, and a feature image included in the image to be inspected is determined. It is preferable that a mother image to be used is selected from a plurality of mother images composed of the respective feature images, and an area including a predetermined location of the selected mother image is extracted as a child image.

  According to the present invention, a mother image that covers all the minimum repetitive patterns is generated before the inspection, the position of the inspection image in the mother image is searched at the time of inspection, and an area including the position is searched. By using it as a reference image, a reference image corresponding to the image to be inspected can be automatically generated, so that it is not necessary to take a reference image at the time of inspection.

  According to the present invention, since it is possible to automatically generate a reference image corresponding to an image to be inspected, it is not necessary to take a reference image at the time of inspection. Therefore, for example, even when the inspection magnification of the image to be inspected is high and does not include a repetitive pattern, only one imaging device is required, and it is not necessary to move the imaging device, thereby reducing inspection costs and inspection time. There is an effect that it can be realized.

  Hereinafter, an example of an embodiment of the present invention will be described with reference to FIGS. In this example, a micro inspection process performed on a flat panel display (hereinafter referred to as a panel) having, for example, a pixel 50 having a pixel structure shown in FIG. 7 as an object to be inspected will be described. Note that a pixel is a minimum unit constituting a repetitive pattern, and in this example, such a pixel is referred to as a unit image.

  As described with reference to FIGS. 8 and 9, when there is a defect 100 in a certain part of the panel shown in FIG. 8, the entire surface of the panel is checked by a macro inspection process, and as shown in FIG. Defect position data indicating whether or not there is a defect is generated. Then, position data is generated for all detectable defects on the entire panel surface.

  FIG. 1 is a block diagram showing an example of an embodiment of the present invention. As shown in FIG. 1, an imaging device 2, an image memory 3 to be inspected, a mother image memory (mother image storage means) 4, a pattern search circuit (search means) 5, an image extraction circuit (image extraction means) 6, a reference image It comprises a memory (reference image storage means) 7, an image difference extraction circuit (image difference extraction means) 8, a difference information data memory 9, a defect classification circuit 10, a defect information database 11, and a defect classification information memory 12. .

  An imaging apparatus 2 shown in FIG. 1 is configured by a camera or a microscope configured with, for example, a CCD (Charge Coupled Device) element capable of adjusting an enlargement ratio for imaging the surface of an inspection object 1 such as a flat panel display. . Based on the position data of the defect found in the macro inspection process, an image is taken with the high-magnification imaging device 2 to obtain an enlarged image of the defect position.

  The inspected image memory 3 stores an enlarged image of the defect imaged by the imaging device 2 as an inspected image 3a (p × q image).

  In this example, an image serving as a basis for generating a reference image is called a mother image 4 a and is stored in the mother image memory 4. The mother image 4a is inspected based on a difference between a composite image obtained by joining a plurality of images captured at different positions and an image captured at another location having the same repeating pattern as the composite image, It is created using only images that are confirmed to be free of defects. The size of the mother image, that is, the number of unit images included is set to m × n so as to be larger in both vertical and horizontal directions than the image to be inspected. However, an image for the entire panel surface is not necessary as a mother image, and it is sufficient if several repeating patterns are included. For example, if the image to be inspected does not include the entire repeating pattern, the number of unit images in the vertical and horizontal directions of the mother image should be at least twice each of the minimum size image including the minimum unit repeating pattern at the same magnification. That's fine.

  The pattern search circuit 5 searches the inspection image 3a using the mother image 4a stored in the mother image memory 4 as a target. That is, an image having the same pattern as the mother image 4 a is searched from the image to be inspected 3 a by pattern matching, and the search result is output to the image extraction circuit 6.

  Further, the image extraction circuit 6 extracts the image having the highest pattern matching degree from the search result from the mother image 4 a to create a child image (p × q image) and outputs it to the reference image memory 7.

  The reference image memory 7 stores the child image sent from the image extraction circuit 6 as a reference image 7a for the image to be inspected 3a.

  The image difference detection circuit 8 detects an image difference 8 a between the reference image 7 a stored in the reference image memory 7 and the inspected image 3 a taken by the imaging device 2, and outputs it to the difference information data memory 9. To do.

  The difference information data memory 9 stores the image difference 8 a detected by the image difference detection circuit 8.

  Further, the defect classification circuit 10 classifies the image difference 8a supplied from the difference information data memory 9 as to what type of defect it is based on various defect information registered in the defect information database 11. Defect classification information is generated and output to the defect classification information memory 12 for storage.

  A micro inspection process by the appearance inspection apparatus of FIG. 1 configured as described above will be described. First, an enlarged image of the inspection object 1 is taken by the imaging device 2 based on the defect position data in the macro inspection process, and the obtained inspection image 3 a of the enlarged image is temporarily stored in the inspection image memory 3. Next, the pattern search circuit 5 searches the inspected image 3a using the mother image 4a stored in the mother image memory 4 by pattern matching as a target, and extracts an image having the highest pattern matching degree from the search result. A child image is created and stored in the reference image memory 7 as a reference image.

  Then, the image difference detection circuit 8 detects an image difference 8a between the reference image 7a stored in the reference image memory 7 and the inspected image 3a stored in the inspected image memory 3, and the difference information Store in the data memory 9. Further, the defect classification circuit 10 generates defect classification information based on the image difference 8a and the defect information in the defect information database 11, and stores the defect classification information in the defect classification information memory 12, thereby completing the micro inspection. If necessary, defect classification information is appropriately output from the defect classification information memory 12 to a display device and displayed.

  According to the example of FIG. 1 described above, even when the inspection magnification is high and the image to be inspected in the screen does not include a repetitive pattern as in the micro inspection process, the image pickup apparatus 2 is moved or the image pickup apparatus 2 is moved. Since it is not necessary to use a table, the inspection time can be shortened and the inspection cost can be reduced.

  Also, since the mother image is generated based on the actual image, details of the pattern information (design drawing, etc.) such as the interval between adjacent repeated patterns are not required in advance. Furthermore, even if only a part of the repetitive pattern is included, if one or a plurality of images including the entire inspection region such as the upper surface of the flat panel display are prepared as a mother image, a reference image can be automatically generated, so an appearance inspection can be performed. Yes.

  Next, the case where the generation of the reference image fails depending on the pattern configuration of the inspection object will be described with reference to FIGS.

FIG. 2 shows an example of a mother image created by the above-described method, and has a pattern configuration in which the pixel structures “A ⁺ ” and “A ⁻ ” of the unit image are inverted. When a very similar but different repetitive pattern exists in the mother image stored in the mother image memory 3, the image generated as the reference image may be different depending on the result included in the inspected image. For example, as shown in FIG. 2, the pattern is composed of a combination of very similar pixel structures “A ⁺ ” and “A ⁻ ”.

3A shows an example of a reference image to be compared and contrasted by the image difference detection circuit 8, and FIG. 3B shows an example of the inspected image. In the micro inspection process, when the image to be inspected at the defect position is an image including the defect 13 in “A ⁺ ” as shown in FIG. 3B, “A ⁻ ” shown in FIG. May be extracted. As described above, when the image of “A ⁺ ” is extracted, an erroneous reference image is extracted because the pixel structure is similar.

  FIG. 4 shows images of image differences detected by the image difference detection circuit 8. As a result of extracting an incorrect reference image (see FIG. 3A), as shown in FIG. 4, a symbol 14 with a horizontal line drawn from a plus sign is detected together with the defect 13 as image differences, thereby obtaining accurate defect information. I can't.

  An example of another embodiment in which accurate defect information can be acquired even in the above case will be described with reference to FIG. FIG. 5 shows a configuration diagram of an example of another embodiment of the present invention. In the configuration example of FIG. 5, only an image of a portion (hereinafter referred to as a feature image) that is a feature of a pixel pattern that is similar and non-existing in advance is selected, and one of the feature images is first selected. Accordingly, the mother image based on the reference image is switched.

In FIG. 5, the feature image memories 21 and 22 store the feature images in the unit images constituting the mother images 25a and 26a, respectively. In this example, the “+” part of “A ⁺ ” is the feature. The portion of “−” in the image 21a and “A ⁻ ” becomes the feature image 22a. Note that the size of the feature image is r × s (r <p, s <q).

  Further, the image selection circuit 23 switches each feature image recorded in the feature image memories 21 and 22 and supplies it to the pattern search circuit 24.

  Further, the pattern search circuit 24 searches the feature images 21a and 22a in order with the inspection image (p × q image (p <m, q <n)) 3b photographed by the imaging device 2 as a target, It is determined which feature image the image to be inspected 3 b has and the result is output to the image selection circuit 27.

The mother image memories 25 and 26 store mother images (m × n images) 25a and 26a, respectively. In this example, the mother images 25a and 26a are the same as those in FIG. The image is such that “A ⁺ ” and “A ⁻ ” are reversed from each other.

  Further, the image selection circuit 27 receives the search result of the pattern search circuit 24, and selects either the mother image memory 25 or the mother image memory 26 to switch the mother image memory in which the mother image to be used is recorded.

  The pattern search circuit 5 searches the inspection image 3b using the mother image in the mother image memory selected by the image selection circuit 27 as a target, and an image having the same pattern as the mother image 4a is found in the inspection image 3a. Whether it is included or not is searched by pattern matching, and the search result is output to the image extraction circuit 6. Otherwise, the configuration shown in FIG. 5 is the same as the configuration example of FIG.

  The micro inspection process by the appearance inspection apparatus of FIG. 5 configured as described above will be described. First, an enlarged image of the inspection object 1 is taken by the imaging device 2 based on the defect position data in the macro inspection process, and the obtained inspection image 3 a of the enlarged image is temporarily stored in the inspection image memory 3. Next, in the pattern search circuit 24, the feature images 21 a and 22 a stored in the feature image memories 21 and 22 by pattern matching via the image selection circuit 23 with the inspection image 3 a stored in the inspection image memory 3 as a target. Search 22a in order. Based on the search result, it is determined which characteristic the inspected image 3 a has, and the determination result is output to the image selection circuit 27.

  Next, the image selection circuit 27 switches the mother image memory to be used to the mother image memory 25 or the mother image memory 26 based on the above determination result. In this example, the mother image 25a is selected if the pattern search of the feature image 21a is successful, and the mother image 26a is selected if the pattern search of the feature image 22a is successful. Then, the pattern search circuit 5 searches the inspection image 3b using the mother image selected by pattern matching as a target. An image having the highest pattern matching degree is extracted from the search result to create a child image, and this child image is stored in the reference image memory 7 as a reference image 7b.

  Then, the image difference detection circuit 8 detects an image difference 8b between the reference image 7b stored in the reference image memory 7 and the inspected image 3b stored in the inspected image memory 3, and the difference information Store in the data memory 9. Further, the defect classification circuit 10 generates defect classification information (defect 13) based on the image difference 8b and the defect information in the defect information database 11 and stores it in the defect classification information memory 12, thereby completing the micro inspection. If necessary, defect classification information is appropriately output from the defect classification information memory 12 to a display device and displayed.

According to the configuration described above, a feature image of a portion that is a feature of a repetitive pattern that is similar in advance is cut out, and a pattern search is performed on the feature images 21a and 22a and the inspected image 3a to generate a mother image. Therefore, the reference image 7b having the same unit image “A ⁺ ” as the inspection image 3b can be extracted. Therefore, the image difference 8b including only the defect 13 is detected, and accurate defect information can be acquired.

  In addition to the above-described embodiments, the present invention can be applied to appearance inspections of semiconductor wafers, photomasks, magnetic disks, and the like.

  Further, the present invention is not limited to the above-described embodiments, and various other configurations can be taken without departing from the gist of the present invention.

It is a block diagram of the external appearance inspection apparatus of the example of one embodiment of this invention. It is a figure which shows an example of the mother image in the example of one embodiment of this invention. It is a figure which shows the example of the reference image and inspection image which are input into the image difference detection circuit of the example of one embodiment of this invention. It is a figure which shows the example of the image difference in the example of one embodiment of this invention. It is a block diagram of the external appearance inspection apparatus of the example of other embodiment of this invention. It is a figure showing the schematic pixel pattern of a flat panel display as an example of a to-be-inspected object. It is a flowchart which shows a general appearance inspection process. It is a schematic diagram of the pixel pattern of a test object. It is a figure which shows the example of the positional data on a defect. It is a figure which shows the example of a to-be-inspected image. It is a figure which shows the example of a reference image. It is a block diagram which shows an example of a prior art. It is a block diagram which shows the other example of a prior art.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 1 ... Test object, 2 ... Imaging device, 3 ... Test image memory, 3a, 3b ... Test image, 5, 24 ... Pattern search circuit, 6 ... Image extraction circuit, 7 ... Reference image memory, 7a, 7b ... Reference image, 8 ... Image difference detection circuit, 8a, 8b ... Image difference image, 9 ... Difference information data memory, 10 ... Defect classification circuit, 11 ... Defect information database, 12 ... Defect classification information memory, 13 ... Defect , 14 ... Image differences 21, 22 ... Feature image memory, 21a, 22a ... Feature image, 23, 27 ... Image selection circuit, 25, 26 ... Mother image memory, 25a, 26a ... Mother image

Claims (4)

An appearance inspection method for inspecting an inspection object based on a difference between an inspection image and a reference image,
Generating a mother image that covers all the minimum repeating patterns of the image to be inspected in advance,
Search where the image to be inspected is in the mother image,
An area including a predetermined location of the searched mother image is extracted as a child image,
Detecting the difference between the child image as the reference image for the inspection image and the inspection image ;
The mother image is inspected based on a difference between a composite image obtained by joining a plurality of images captured at different positions and an image captured at another location having the same repeating pattern as the composite image, and is previously defective. An appearance inspection method created using only images that have been confirmed to be free of defects. An appearance inspection method for inspecting an inspection object based on a difference between an inspection image and a reference image,
Generating a plurality of mother images that cover all the minimum repeating patterns of the image to be inspected in advance,
Extracting a characteristic part of a unit image constituting each mother image from the plurality of mother images as a feature image;
Compare the image to be inspected with each feature image,
Determining a feature image included in the inspected image;
Select a mother image to be used for inspection from a plurality of mother images composed of the respective feature images,
Search for where in the selected mother image the image to be inspected is,
An area including a predetermined location of the selected mother image is extracted as a child image,
The child image is used as the reference image for the image to be inspected to detect a difference from the image to be inspected.
Appearance inspection method. An appearance inspection apparatus for inspecting an inspection object based on a difference between an inspection image and a reference image,
A mother image storage means for storing a mother image that covers all the minimum repetitive patterns of the image to be inspected in advance;
Search means for searching for the location of the mother image stored in the mother image storage means for the image to be inspected;
Image extracting means for extracting a region including a predetermined location of the searched mother image as a child image;
Reference image storage means for storing the child image as the reference image;
Image difference detection means for detecting a difference between the reference image stored in the reference image storage means and the image to be inspected,
The mother image is inspected based on a difference between a composite image obtained by joining a plurality of images captured at different positions and an image captured at another location having the same repeating pattern as the composite image, and is previously defective. Created using only images that are confirmed to have no
Appearance inspection device. An appearance inspection apparatus for inspecting an inspection object based on a difference between an inspection image and a reference image,
A plurality of mother image storage means for storing a mother image that covers all the minimum repeating patterns of the inspected image in advance;
Search means for searching for the location of the mother image stored in the mother image storage means for the image to be inspected;
Image extracting means for extracting a region including a predetermined location of the searched mother image as a child image;
Reference image storage means for storing the child image as the reference image;
Image difference detection means for detecting a difference between the reference image stored in the reference image storage means and the image to be inspected;
Feature image storage means for storing feature images obtained by extracting characteristic portions of unit images constituting each mother image stored in the plurality of mother image storage means;
A discriminating unit for comparing the image to be inspected with each feature image stored in the feature image storage unit and discriminating a feature image included in the image to be inspected;
Image selecting means for selecting a mother image to be used for examination from the plurality of mother images based on the determination result of the determining means and outputting the selected image to the searching means.
Appearance inspection device.

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