JP4427315B2 - Polishing equipment - Google Patents

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JP4427315B2
JP4427315B2 JP2003426436A JP2003426436A JP4427315B2 JP 4427315 B2 JP4427315 B2 JP 4427315B2 JP 2003426436 A JP2003426436 A JP 2003426436A JP 2003426436 A JP2003426436 A JP 2003426436A JP 4427315 B2 JP4427315 B2 JP 4427315B2
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stone
segment
metal
polishing
turntable
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JP2005177961A (en
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一雄 小林
順行 持丸
悟 井出
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Okamoto Machine Tool Works Ltd
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本発明は、露光装置用ガラスプレ−トや鉄プレ−ト、セラミックプレ−ト、KNbO光学結晶、フォトマスク基板等の一辺の寸法が1000〜3500mm大型の板状体ワ−ク平面を研磨(ラップ)加工する直径が4〜12mの研磨定盤(ラップ定盤)を備える研磨装置に関する。 The present invention polishes a plate-like workpiece plane having a large size of 1000 to 3500 mm on one side, such as a glass plate for exposure apparatus, an iron plate, a ceramic plate, a KNbO 3 optical crystal, a photomask substrate ( The present invention relates to a polishing apparatus including a polishing surface plate (lapping surface plate) having a diameter of 4 to 12 m to be processed.

高精度の平面研磨が要求される上記板状体ワ−クの寸法としては、大型化が顕著となり、従来は高々1300mmx1100mm寸法のフォトマスク基板を研磨できる研磨装置であった(たとえば、非特許文献1参照)。
かかる研磨装置として、研磨定盤にキャリアに保持したワ−クを押し付け、キャリアおよび定盤を回転させてワ−ク面が定盤によってサイクロイド曲線で掃引されて研磨する平面研磨装置が提案されている(たとえば、特許文献1参照)。
また、研磨定盤の回転軸を中心とする同心円状に3分割された3重同心円定盤より構成された研磨定盤に、キャリアに保持したワ−ク(LCD用ガラス板)を押し付け、キャリアおよび研磨定盤を回転させてワ−ク面を研磨定盤によって研磨する平面研磨装置が提案されている(たとえば、特許文献2参照)。
さらに、平坦な砥石接着面を有する円板状台座に砥石板を接着剤で接着するとともに、該砥石板の上面に前記台座の砥石接着面にまで達する複数の切り溝を形成し、該砥石板を複数のセグメント状の砥石板に分割し、該セグメント状の砥石板と砥石板の間に該切り溝に相当する格子状隙間を設けた基板研磨用砥石も提案されている(たとえば、特許文献3参照)。
および、円環セグメント、規則的な多角形の輪郭を有する円環または角隅セグメントの2〜4000個を砥石基台の上に円環状に並べて鋳造金属製円環状砥石を形成した研磨定盤(ラップ盤)も提案されている(たとえば、特許文献4参照)。
゛週刊ダイヤモンド”、2002年9月7日号、p.62−63 特開2000−42911号公報 特開2002−346917号公報 特開平11−277445号公報 特開2001−88038号公報
As the dimensions of the plate-like workpieces that require high-precision planar polishing, the size of the plate-like workpiece has increased significantly. Conventionally, it has been a polishing apparatus capable of polishing a photomask substrate having a size of at most 1300 mm × 1100 mm (for example, non-patent literature). 1).
As such a polishing apparatus, a planar polishing apparatus has been proposed in which a workpiece held by a carrier is pressed against a polishing surface plate, the carrier and the surface plate are rotated, and the work surface is swept by a cycloid curve by the surface plate and polished. (For example, see Patent Document 1).
In addition, a work (LCD glass plate) held by a carrier is pressed against a polishing platen composed of a triple concentric platen that is divided into three concentric circles around the rotation axis of the polishing platen. In addition, there has been proposed a flat polishing apparatus that rotates a polishing platen to polish a work surface with the polishing platen (see, for example, Patent Document 2).
Further, the grindstone plate is bonded to a disc-shaped pedestal having a flat grindstone bonding surface with an adhesive, and a plurality of kerfs reaching the grindstone bonding surface of the pedestal are formed on the upper surface of the grindstone plate. Has also been proposed (see, for example, Patent Document 3), in which a segmented grindstone plate is divided and a lattice-like gap corresponding to the kerf is provided between the segmented grindstone plate and the grindstone plate. ).
Also, a polishing surface plate in which 2 to 4000 circular segments, circular rings having regular polygonal outlines or corner corner segments are arranged in an annular shape on a grindstone base to form a cast metal circular grindstone ( A lapping machine has also been proposed (see, for example, Patent Document 4).
“Weekly Diamond”, September 7, 2002, p.62-63 JP 2000-42911 A JP 2002-346917 A Japanese Patent Laid-Open No. 11-277445 JP 2001-88038 A

近時、スパッタ装置用鉄プレ−ト、ガラスプレ−ト、ELDやフォトマスク基板として一辺の長さが2000〜3500mmの板状体が要求され、従来の大型の研磨装置(ラッピング装置)では研磨が応じきれない。
また、上記特許文献1、特許文献2は研磨定盤の素材を開示していないが、研磨定盤の素材としては、金属よりも軽く、熱伝導率、熱膨張率が小さい石材がよい。花崗岩、大理石、黒御影石等の石材は、熱伝導率が2.4〜2.7Kcal/mh℃と小さく、熱膨張率7〜7.5x10−6/℃も小さく、かつ、比重が2.4〜2.9と軽く、耐熱性が455〜570℃と高く、圧縮強度も1400〜1600kg/cmと高いので、金属やABS等の樹脂を用いるよりも精密寸法性、平坦性の優れた加工されたワ−クを与えるので好ましい。
Recently, a plate-like body with a side length of 2000 to 3500 mm is required as an iron plate, glass plate, ELD or photomask substrate for a sputtering apparatus, and polishing is performed with a conventional large polishing apparatus (lapping apparatus). I can't respond.
Moreover, although the said patent document 1 and the patent document 2 do not disclose the raw material of a polishing surface plate, as a raw material of an polishing surface plate, the stone material which is lighter than a metal, and has a small thermal conductivity and a thermal expansion coefficient is good. Granite, marble, the stone such as black granite, the thermal conductivity is as small as 2.4~2.7Kcal / mh ℃, thermal expansion coefficient 7~7.5x10- 6 / ℃ is small, and a specific gravity of 2.4 -2.9 lighter, heat resistance as high as 455-570 [deg.] C., and compressive strength as high as 1400-1600 kg / cm < 2 >, so processing with better precision dimensionality and flatness than using resin such as metal or ABS This is preferable because it gives a finished work.

Figure 0004427315
Figure 0004427315

研磨されるワ−クの寸法が小さいうちは、一枚の石材で研磨定盤を賄うことができるが、ワ−ク寸法が数十インチの角型液晶ディスプレイ用ガラスプレ−ト、スパッタリング装置用の次世代の2000mm鉄プレ−ト、次々世代の2500mm鉄プレ−トのように大型のものとなると、研磨定盤の直径も4〜12mと大型となる。しかし、研磨定盤素材の石材を搬送・搬入する作業において道路交通法で定められた幅があり、日本における現状では高々幅が4.5mの石材の搬送・搬入が可能というのが実情である。本発明は、石材を研磨工具として用いる研磨装置において、直径が4〜12mの研磨定盤を有する研磨装置の提供を目的とする。   As long as the size of the workpiece to be polished is small, it is possible to cover the polishing platen with a single piece of stone. As the next-generation 2000 mm iron plate and the next-generation 2500 mm iron plate become large, the diameter of the polishing surface plate will be as large as 4 to 12 m. However, there is a width specified by the Road Traffic Act in the work of transporting and transporting stones for polishing surface plate materials, and the current situation in Japan is that it is possible to transport and transport stones with a maximum width of 4.5 m. . An object of the present invention is to provide a polishing apparatus having a polishing surface plate having a diameter of 4 to 12 m in a polishing apparatus using a stone material as a polishing tool.

請求項1の発明は、回転軸に軸承された直径が4〜12mの円板状もしくは円環状の金属製タ−ンテ−ブル上に直径が4〜12mの円板状もしくは円環状石材を格子状に等間隔に9〜121個に切断した砥石セグメントを接着剤で固着して形成した円板状もしくは円環状石材表面に、キャリアで保持した板状体ワ−クを載せ、キャリアおよび研磨定盤を回転させて板状体ワ−ク表面を研磨する研磨装置であって、前記金属製タ−ンテ−ブルは前記回転軸の軸受の直径よりは幅広の略長尺状柱の中央セグメントと、この中央セグメントの左右に継がれた円弧状柱の右セグメントおよび左セグメントの金属製三部材で構成されており、金属製タ−ンテ−ブルの各セグメント継ぎ目面と前記石材の砥石セグメントの格子状接着面が成す平面は平行ではなく、交差するように設けられていることを特徴とする、板状体ワ−クの平面研磨に用いる研磨装置を提供するものである。   According to the first aspect of the present invention, a disc-shaped or annular stone material having a diameter of 4 to 12 m is latticed on a disc-shaped or annular metal turntable having a diameter of 4 to 12 m supported by a rotating shaft. A plate-like work piece held by a carrier is placed on the surface of a disc-like or annular stone formed by adhering 9 to 121 grindstone segments cut at regular intervals with an adhesive. A polishing apparatus for polishing a plate-like workpiece surface by rotating a board, wherein the metal turntable has a central segment of a substantially elongated column wider than the diameter of the bearing of the rotary shaft. The center segment is composed of three metal members of a right segment and a left segment of an arc column connected to the left and right of the central segment, each segment joint surface of the metal turntable and a lattice of the grindstone segments of the stone The plane formed by the adhesive surface is parallel Without and being provided so as to cross the plate-like body Wa - there is provided a polishing apparatus used for surface polishing of click.

請求項2の発明は、前記研磨装置において、上記石材は、各砥石セグメントを無機粉含有硬化型樹脂接着剤で接着・硬化して円板状もしくは円環状石材と成した後、この硬化した無機粉含有硬化型樹脂接着剤の上面を研削加工もしくは研磨加工して石材の表面を面一に形成したものであることを特徴とする。   According to a second aspect of the present invention, in the polishing apparatus, the stone material is formed by bonding and curing each grindstone segment with an inorganic powder-containing curable resin adhesive to form a disc-shaped or annular stone material. The upper surface of the powder-containing curable resin adhesive is ground or polished so that the surface of the stone material is flush.

請求項3の発明は、前記研磨装置において、石材が大理石、花崗岩、黒御影石より選ばれたものであり、無機粉硬化型樹脂接着剤が鉄粉を5〜65重量%含有する硬化型エポキシ樹脂接着剤であることを特徴とする。   The invention of claim 3 is the curable epoxy resin in which the stone material is selected from marble, granite, and black granite in the polishing apparatus, and the inorganic powder curable resin adhesive contains 5 to 65% by weight of iron powder. It is an adhesive.

請求項4の発明は、前記研磨装置において、金属製タ−ンテ−ブルと石材の間には、タ−ンテ−ブルを構成する金属の硬度よりは小さい硬度を有するスペ−サが撓み改良材として同心円状に複数挿入されていることを特徴とする。   According to a fourth aspect of the present invention, in the polishing apparatus, a spacer having a hardness smaller than the hardness of the metal constituting the turntable is deformed between the metal turntable and the stone. A plurality of concentric circles are inserted.

表面に石材セグメントを接着する金属製タ−ンテ−ブルを、回転軸の軸受の直径よりは幅広の略長尺状柱の中央セグメントと、この中央セグメントの左右に接着された円弧状柱の右セグメントおよび左セグメントの3部材に分割して構成することにより、各セグメントの搬送を可能とし、各セグメントの継ぎ目面積を小さくし、かつ、タ−ンテ−ブルの金属が撓むのを小さくすることができた。
なお、円板状石材を中央で2分割する方が継ぎ目面積をより小さくすることができるが、継ぎ目面が研磨定盤の回転軸上に架かり、回転軸の振動応力が円柱状石材の継ぎ目面に集中し、研磨定盤の寿命を短くする。金属製タ−ンテ−ブルを扇状に4〜8分割した形状のセグメントを繋ぐことは、継ぎ目面積が増大するし、継ぎ目面が研磨定盤の回転軸上に架かり、回転軸の振動応力が金属製タ−ンテ−ブルの継ぎ目面に集中し、研磨定盤の寿命を短くする。
A metal turntable for bonding a stone segment to the surface is divided into a central segment of a substantially long column that is wider than the diameter of the bearing of the rotating shaft, and a right side of an arc column bonded to the left and right of this central segment. By dividing the segment into three members, the segment and the left segment, each segment can be transported, the seam area of each segment can be reduced, and the turntable metal can be less bent. I was able to.
It is possible to reduce the joint area by dividing the disk-shaped stone into two at the center. However, the joint surface hangs on the rotating shaft of the polishing surface plate, and the vibration stress of the rotating shaft causes the joint of the columnar stone. Concentrate on the surface to shorten the life of the polishing surface plate. Connecting segments of a metal turntable divided into 4 to 8 in a fan shape increases the seam area, the seam surface hangs on the rotation axis of the polishing surface plate, and the vibration stress of the rotation axis is reduced. Concentrate on the seam surface of the metal turntable to shorten the life of the polishing surface plate.

金属製タ−ンテ−ブルの各セグメント継ぎ目面と前記石材の砥石セグメントの格子状接着面が成す平面を平行ではなく、交差するように設けることにより金属製タ−ンテ−ブルの継ぎ目面にかかる石材の荷重が分散され、金属製タ−ンテ−ブルの撓みが小さくなる。   It is applied to the joint surface of the metal turntable by providing the joint surface of each segment of the metal turntable and the plane formed by the grid-like adhesive surface of the stone grindstone segment of the stone material so as not to be parallel to each other. The load of the stone material is dispersed, and the deflection of the metal turntable is reduced.

接着剤に鉄粉、銅粉等の金属粉や花崗岩粉、石灰粉、タルク等の石粉などの無機粉を含有させることにより接着剤層の熱伝導率、熱膨張率をより石材のそれらに近づけることができ、加工ワ−クの寸法精度を向上できる。また、石材と無機粉含有硬化型樹脂接着剤との外観を類似させることができる。石材の熱伝導率は2.5〜2.7Kcal/mh℃であり、鉄の熱伝導率は45〜50Kcal/mh℃、鉄粉含有硬化型樹脂接着剤の熱伝導率は40〜44Kcal/mh℃である。鉄は、他の金属である銅、アルミニウム合金と比較して熱伝導度が小さく、熱による変形が小さいので寸法精度の良好な加工ワ−クを与える。   By making the adhesive contain inorganic powders such as iron powder, copper powder and other metal powders, granite powder, lime powder, talc and other stone powders, the thermal conductivity and thermal expansion coefficient of the adhesive layer are made closer to those of stone materials. Therefore, the dimensional accuracy of the workpiece can be improved. Moreover, the external appearances of the stone and the inorganic powder-containing curable resin adhesive can be made similar. The thermal conductivity of the stone is 2.5 to 2.7 Kcal / mh ° C., the thermal conductivity of iron is 45 to 50 Kcal / mh ° C., and the thermal conductivity of the iron powder-containing curable resin adhesive is 40 to 44 Kcal / mh. ° C. Iron has a low thermal conductivity compared to other metals such as copper and aluminum alloys, and since deformation due to heat is small, it gives a work with good dimensional accuracy.

直径が4〜12mの石材の荷重による金属製タ−ンテ−ブルが撓むと、ワ−ク加工時に回転している石材上面の軌跡が回転軸中心回りの同一円周上からブレるので厚み分布の良好な加工ワ−クが得られない。本発明のように撓み改良材のスペ−サを、石材裏面と金属製タ−ンテ−ブル表面間に存在させることにより石材の荷重により撓んだ金属製タ−ンテ−ブルの撓みを補正し、ワ−ク加工時に回転している石材上面の軌跡が回転軸中心回りの同一円周上からブレるのを防ぐ。   Thickness distribution because when the metal turntable is bent due to the load of 4 to 12m in diameter, the trajectory of the upper surface of the rotating stone will be blurred from the same circumference around the axis of rotation. Cannot be obtained. As described in the present invention, the deflection of the metal turntable deflected by the load of the stone is corrected by the presence of the spacer of the bending improvement material between the stone back surface and the metal turntable surface. This prevents the trajectory of the upper surface of the stone that is rotating at the time of workpiece machining from blurring from the same circumference around the center of the rotation axis.

以下、図面を用いて本発明を詳細に説明する。
図1は研磨装置の正面図、図2は研磨装置の下定盤の平面図、および図3は円板状または円環状石材を載せる前のタ−ンテ−ブルの平面図、図4は石材の格子状接着面(実線)とタ−ンテ−ブルの継ぎ目面(仮想線)の位置関係を示す石材の平面図、および図5は別の態様を示す研磨装置の平面図である。
Hereinafter, the present invention will be described in detail with reference to the drawings.
FIG. 1 is a front view of the polishing apparatus, FIG. 2 is a plan view of a lower surface plate of the polishing apparatus, FIG. 3 is a plan view of a turn table before placing a disk-like or annular stone, and FIG. FIG. 5 is a plan view of a stone material showing a positional relationship between a lattice-shaped adhesive surface (solid line) and a turntable joint surface (imaginary line), and FIG. 5 is a plan view of a polishing apparatus showing another embodiment.

図1から図3に示す研磨装置1において、研磨装置1は主に研磨定盤(下定盤)2と下面にキャリア4を備える上定盤3とより構成される。
研磨定盤2は、図に示されていない駆動モ−タにより回転駆動される回転軸8とこの回転軸の上方部に設けられたベアリング5を備える軸受6と、前記回転軸8に軸承された中央部が空洞の円環状の金属製タ−ンテ−ブル10と、このタ−ンテ−ブル表面上にボルトナットで固定された撓み改良材スペ−サ11と、タ−ンテ−ブル10表面上に載置された直径が4〜12mの円板状または円環状石材よりなる加工具9とから構成される。12は基台、13は研磨剤供給管、14は接着剤、15は平板状ワ−ク、18は修正リング(サ−フェ−サ−)である。
In the polishing apparatus 1 shown in FIGS. 1 to 3, the polishing apparatus 1 mainly includes a polishing surface plate (lower surface plate) 2 and an upper surface plate 3 having a carrier 4 on the lower surface.
The polishing surface plate 2 is supported by a rotating shaft 8 that is driven to rotate by a driving motor (not shown), a bearing 6 that includes a bearing 5 provided above the rotating shaft, and the rotating shaft 8. An annular metal turntable 10 having a hollow central portion, a deflection improving material spacer 11 fixed with bolts and nuts on the turntable surface, and the turntable 10 surface. It is comprised from the processing tool 9 which consists of a disk shape with a diameter of 4-12 m mounted on the top, or an annular | circular shaped stone material. Reference numeral 12 is a base, 13 is an abrasive supply pipe, 14 is an adhesive, 15 is a plate-like work, and 18 is a correction ring (surfacer).

上記タ−ンテ−ブル10の金属素材としては、鋳鉄、ステンレス鋼、真鍮、銅等が挙げられるが、安価で剛性の高いステンレス鋼が好ましい。金属は石材と比較して比重が大きい(鉄の比重は、7.9)ので□状の枠体とし、中央部10cを空洞化して全体の重さを軽くするのが好ましい。具体的には、金属製タ−ンテ−ブルを回転軸の軸受の直径よりは幅広の略長尺状柱の中央セグメント10aと、この中央セグメントの左右に継ながれる円弧状柱の右セグメント10bおよび左セグメント10bの3部材に分割して構成する。各セグメント10a,10b,10bの中央部を利用し、中央セグメント10aと左右のセグメント10b,10bの継ぎ目面をボルトナットで連結し、中央部10cが空洞化した円柱状タ−ンテ−ブル10とする。各□状セグメント10a,10b,10bの連結により上面は円板状または円環状を呈する。このタ−ンテ−ブル10下側の円環状の内側を軸受6に固定する。   Examples of the metal material of the turntable 10 include cast iron, stainless steel, brass, copper and the like, but inexpensive and highly rigid stainless steel is preferable. Since the specific gravity of the metal is larger than that of the stone (the specific gravity of iron is 7.9), it is preferable to form a □ -shaped frame body and hollow the central portion 10c to reduce the overall weight. Specifically, a metal turntable has a central segment 10a of a substantially elongated column wider than the diameter of the bearing of the rotary shaft, and a right segment 10b of an arcuate column connected to the left and right of the central segment, and The left segment 10b is divided into three members. A column-shaped turntable 10 in which the center portion of each segment 10a, 10b, 10b is utilized, the joint surface of the center segment 10a and the left and right segments 10b, 10b are connected with bolts and nuts, and the center portion 10c is hollow. To do. The upper surface of the □ -shaped segments 10a, 10b, and 10b has a disk shape or an annular shape due to the connection. The annular inner side of the turn table 10 is fixed to the bearing 6.

セグメント10a,10b,10bの金属板厚みは50〜150mm、高さは300〜1000mmである。円柱状タ−ンテ−ブル10の直径は、円柱状石材9の直径に略等しく、4〜12mである。   The segment 10a, 10b, 10b has a metal plate thickness of 50 to 150 mm and a height of 300 to 1000 mm. The diameter of the cylindrical turntable 10 is approximately equal to the diameter of the cylindrical stone material 9 and is 4 to 12 m.

金属製タ−ンテ−ブル10と円板状または円環状石材9の間に分散して介在されるスペ−サ11は、円柱状タ−ンテ−ブル10の素材金属の硬さよりは小さい(柔らかい)硬さを有するアルミニウム板、亜鉛板、加硫ゴム板、エラストマ−板、合成樹脂板などが用いられる。撓み改良材であるスペ−サ11の厚みは、25〜100mmであり、形状は扇形、長方形、三角形、正方形、楕円、円盤、円環、ド−ナッツリング等、いずれであってもよい。スペ−サ11は、金属製タ−ンテ−ブル10の表面に予め同心円状に複数分散して固定され(図2参照)、その上に石材9が載置される。金属製タ−ンテ−ブル10と石材9間に介在されたスペ−サ11は、平板状ワ−ク15の研磨加工時に回転している石材上面外縁の移動軌跡が回転軸中心回りの同一円周上からブレるのを小さくするかブレを無くする。スペ−サ11がなす同心円の条数は2〜6が好ましい。   Spacers 11 dispersed and interposed between the metal turntable 10 and the disc-shaped or annular stone material 9 are smaller than the hardness of the material metal of the cylindrical turntable 10 (softer). ) A hard aluminum plate, zinc plate, vulcanized rubber plate, elastomer plate, synthetic resin plate and the like are used. The thickness of the spacer 11 which is a deflection improving material is 25 to 100 mm, and the shape may be any of a sector, a rectangle, a triangle, a square, an ellipse, a disk, a ring, a donut ring, and the like. A plurality of spacers 11 are preliminarily dispersed and fixed concentrically on the surface of the metallic turntable 10 (see FIG. 2), and a stone material 9 is placed thereon. The spacer 11 interposed between the metal turntable 10 and the stone 9 has the same circular path around the rotation axis center of the stone upper surface rotating when the flat work 15 is polished. Decrease the blur from the lap or eliminate the blur. The number of concentric stripes formed by the spacer 11 is preferably 2-6.

回転軸8の直径は、1,000〜2,800mm、軸受6の直径1,020〜2,840mmである。   The diameter of the rotating shaft 8 is 1,000 to 2,800 mm, and the diameter of the bearing 6 is 1,020 to 2,840 mm.

石材としては、圧縮強度、曲げ強度の面から大理石、花崗岩、黒御影石より選ばれたものが好ましい。搬送・搬入の制約から切断された石材セグメント幅の上限が決定される。現在は、幅が4.5m以下である。従って、現在では直径4.5mを越えるものは、分割して搬送し、研磨装置を設置する現場で分割したセグメントを接着剤14で接着し、円板状または円環状とする。   The stone is preferably selected from marble, granite, and black granite in terms of compressive strength and bending strength. The upper limit of the cut stone segment width is determined due to the restrictions on conveyance and carry-in. Currently, the width is 4.5 m or less. Therefore, at present, those having a diameter of more than 4.5 m are divided and conveyed, and the segments divided at the site where the polishing apparatus is installed are bonded with the adhesive 14 to form a disk shape or an annular shape.

平板状ワ−クの研磨(ラップ)加工具である石材9は、図4に示すように、直径4〜12mの円板状または円環状石材を縦および横方向、それぞれn本(nは2〜10本)の平行で等間隔な直線状切断面で切断した砥石セグメントを接着剤で接着させて1枚の石材とした構造を取る。よって、砥石セグメントの総数は、円板状石材のときは、(n+1)の二乗本数の9個以上、121個以下となる。図4aは、n=2の9個に分割された砥石セグメントを接着した石材9を、図4bは、n=3の16個に分割された砥石セグメントを接着した石材9を、図4cは、n=8の73個に分割された砥石セグメントを接着した石材9を示す。石材9の高さは、300〜600mmが好ましい。   As shown in FIG. 4, the stone 9 which is a flat work polishing (lapping) processing tool is a disc-like or annular stone having a diameter of 4 to 12 m, and n pieces (n is 2) in the vertical and horizontal directions. To 10) parallel and equally-spaced linear cut surfaces, and the grindstone segments are bonded with an adhesive to form a single stone. Therefore, the total number of grindstone segments is 9 or more and 121 or less of the square number of (n + 1) when it is a disk-shaped stone. FIG. 4a shows a stone material 9 to which n = 2 grindstone segments are bonded, FIG. 4b shows a stone material 9 to which n = 3 grindstone segments are bonded, and FIG. The stone material 9 which adhere | attached the grindstone segment divided | segmented into 73 pieces of n = 8 is shown. The height of the stone material 9 is preferably 300 to 600 mm.

石材の各砥石セグメントを接着する接着剤14は、エポキシ樹脂などの構造接着剤が好ましく、更に無機粉が5〜65重量%含有されている硬化型樹脂接着剤がより好ましい。無機粉としては、炭酸カルシウム、クレイ、大理石粉、黒御影石粉、花崗岩粉、シリカ粉、大谷石粉、カ−ボン粉末等の無機充填剤、100〜400メッシュ篩を通過した鋳鉄粉、鉄粉、銅粉、亜鉛粉、真鍮粉、アルミニウム粉等の金属粉が挙げられる。金属粉と無機充填剤を併用してもよい。金属粉や無機充填剤の配合は、金属粉含有硬化型樹脂接着剤14の熱伝導率を鋳鉄や石材の熱伝導率に近似させるのに使用する。
混合系接着剤である無機粉含有硬化型樹脂接着剤の熱伝導率αは、配合される物質の体積率Vとその熱伝導率αとの積の和で近似できる。
α=ΣV x α
The adhesive 14 for adhering each stone segment of the stone is preferably a structural adhesive such as an epoxy resin, and more preferably a curable resin adhesive containing 5 to 65% by weight of inorganic powder. As inorganic powders, calcium carbonate, clay, marble powder, black granite powder, granite powder, silica powder, Otani stone powder, carbon powder and other inorganic fillers, cast iron powder passing through 100-400 mesh sieve, iron powder, Examples thereof include metal powders such as copper powder, zinc powder, brass powder and aluminum powder. Metal powder and inorganic filler may be used in combination. The blending of the metal powder and the inorganic filler is used to approximate the thermal conductivity of the metal powder-containing curable resin adhesive 14 to the thermal conductivity of cast iron or stone.
The thermal conductivity α of the inorganic powder-containing curable resin adhesive that is a mixed adhesive can be approximated by the sum of the products of the volume ratio V i of the substance to be blended and its thermal conductivity α i .
α = ΣV i x α i

無機粉含有硬化型樹脂接着剤の熱伝導率の調整し易さから金属粉としては鉄粉が、無機充填剤としては、大理石粉、花崗岩粉、黒御影石粉を用いるのが好ましい。構造接着剤である硬化型樹脂接着剤としては、硬化剤、必要により硬化促進剤が配合された一液型または二液型エポキシ樹脂、エポキシ・ノボラック/フェノリック樹脂、ポリイミド、不飽和ポリエステル樹脂、芳香族ポリベンゾイミダゾ−ル系接着剤が使用できる。耐熱性、価格の面から二液硬化型エポキシ樹脂が好ましい。   From the viewpoint of easy adjustment of the thermal conductivity of the inorganic powder-containing curable resin adhesive, it is preferable to use iron powder as the metal powder and marble powder, granite powder, or black granite powder as the inorganic filler. The curable resin adhesive, which is a structural adhesive, includes a curing agent, one-pack or two-pack epoxy resin, epoxy novolak / phenolic resin, polyimide, unsaturated polyester resin, aromatic A polybenzimidazole adhesive can be used. From the viewpoint of heat resistance and cost, a two-component curable epoxy resin is preferable.

エポキシ樹脂としては、ビスフェノ−ルAのジグリシジルエ−テル、ビスフェノ−ルFのジグリシジルエ−テル、ビフェニルジグリシジルエ−テル、水添化ビフェニルジグリシジルエ−テルなどが、硬化剤としては、ジシアンジアミド、バ−サアミドなどが、促進剤としては、2−メチルイミダゾ−ル、2−ウンデシルイミダゾ−ル、2,4−ジメチルイミダゾ−ルなどが挙げられる。   Examples of epoxy resins include bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, biphenyl diglycidyl ether, hydrogenated biphenyl diglycidyl ether, and the like. Curing agents include dicyandiamide, Examples of accelerators include 2-methyl imidazole, 2-undecyl imidazole, and 2,4-dimethyl imidazole.

鉄粉含有二液硬化型エポキシ樹脂接着剤は、デブコン(Devcon)社からDEVCON A(登録商標)の商品名で市販されている。DEVCON Aは、線熱膨張率11.5〜13.5x10−6/℃、熱伝導率0.120〜0.130cal/cm・sec・degree、比重7.2である。 An iron powder-containing two-component curable epoxy resin adhesive is commercially available from Devcon under the trade name DEVCON A (registered trademark). DEVCON A has a linear thermal expansion coefficient of 11.5 to 13.5 × 10 −6 / ° C., a thermal conductivity of 0.120 to 0.130 cal / cm · sec · degree, and a specific gravity of 7.2.

砥石セグメントを接着させる接着剤を砥石セグメント側面全面に塗布せずに砥石セグメント表面より1〜15mm低い位置の側面高さまで接着剤を塗布し、硬化させて石材9の表面に研磨剤の流れる深さ1〜15mmの格子状溝を形成してもよい。   The depth at which the abrasive flows on the surface of the stone material 9 by applying the adhesive to the side surface height of 1 to 15 mm lower than the surface of the grindstone segment without applying the adhesive for adhering the grindstone segment to the entire side surface of the grindstone segment. You may form a grid-like groove | channel of 1-15 mm.

図1に示すように、金属製タ−ンテ−ブル10はその下面において回転軸8に軸承される。回転軸8は図示されていない駆動モ−タの駆動力を歯車7で受けて金属製タ−ンテ−ブル10を0.01〜10rpmの回転数で回転させる。   As shown in FIG. 1, the metal turntable 10 is supported on the rotating shaft 8 on the lower surface thereof. The rotating shaft 8 receives the driving force of a driving motor (not shown) by the gear 7 and rotates the metallic turntable 10 at a rotational speed of 0.01 to 10 rpm.

図4に示すように、下定盤2の金属製タ−ンテ−ブル10上に載置される直径4〜12mの石材9は、金属製タ−ンテ−ブルの各砥石セグメント継ぎ目面と前記石材の砥石セグメントの格子状接着面が成す平面が、平行ではなく、交差するように設けられる。交差角は、30〜60度が好ましく、より好ましい交差角は45度である。   As shown in FIG. 4, the stone material 9 having a diameter of 4 to 12 m placed on the metal turntable 10 of the lower surface plate 2 includes the grindstone segment joint surface of the metal turntable and the stone material. The planes formed by the grid-like adhesion surfaces of the grindstone segments are provided not to be parallel but to intersect. The crossing angle is preferably 30 to 60 degrees, and a more preferable crossing angle is 45 degrees.

図1に示す研磨装置1を用い、平板状のワ−ク15を研磨するには、上定盤3のキャリア4の下面にワ−ク15を固定し、ワ−ク下面を研磨下定盤2の石材9表面に圧接(5〜100kPa)し、研磨剤供給管13より石材9表面上に研磨剤を10〜100リットル/分の割合で供給しつつ、金属製タ−ンテ−ブル10を0.01〜10rpmの回転数で回転させることにより下定盤2を水平方向に回転させる。この際、ワ−ク15を下面に固定している上定盤3のスピンドル19は図示されていない駆動用モ−タにより回転駆動される。研磨剤としては、セリア、シリカ、アルミナ、ベ−マイト等の砥粒を含有する水分散液を用いる。   In order to polish the plate-like workpiece 15 using the polishing apparatus 1 shown in FIG. 1, the workpiece 15 is fixed to the lower surface of the carrier 4 of the upper surface plate 3, and the lower surface of the workpiece is polished to the lower surface plate 2. The metal turntable 10 is brought into contact with the surface of the stone 9 (5 to 100 kPa) while the abrasive is supplied from the abrasive supply pipe 13 onto the surface of the stone 9 at a rate of 10 to 100 liters / minute. The lower surface plate 2 is rotated in the horizontal direction by rotating at a rotation speed of 01 to 10 rpm. At this time, the spindle 19 of the upper surface plate 3 fixing the work 15 to the lower surface is rotated by a driving motor (not shown). As the abrasive, an aqueous dispersion containing abrasive grains such as ceria, silica, alumina, and boehmite is used.

図5に示すラッピング装置1は、図2に示す研磨装置の上定盤3の代わりに、駆動ロ−ラ16aと固定ロ−ラ16bで回転駆動されるリング状キャリア4下面またはリング内にワ−ク15を固定する機構のもので、かつ、調整リング(サ−フェ−シング)18をスピンドル20で軸承して図示されていない昇降機構を用いて下定盤2の石材9表面に当てるようにした研磨装置1である。ワ−ク15をクレ−ンで吊るし、下定盤2上のリング状キャリア4内に移し、下定盤2上にワ−クを載せるか、キャリア4下面にワ−クを固定し、ワ−クごとキャリアをクレ−ンで吊るし、下定盤2上に載せる。   The lapping apparatus 1 shown in FIG. 5 is not attached to the upper surface plate 3 of the polishing apparatus shown in FIG. 2, but is attached to the lower surface of the ring-shaped carrier 4 or the ring that is rotationally driven by the drive roller 16a and the fixed roller 16b. A mechanism for fixing the shaft 15 and an adjustment ring (surfacing) 18 supported by a spindle 20 so as to be brought into contact with the surface of the stone 9 of the lower surface plate 2 using a lifting mechanism (not shown). The polishing apparatus 1 thus obtained. The work 15 is hung with a crane and moved into the ring-shaped carrier 4 on the lower surface plate 2, and the work is placed on the lower surface plate 2, or the work is fixed to the lower surface of the carrier 4, and the work is fixed. The carrier is suspended by a crane and placed on the lower surface plate 2.

実施例1
直径10m、高さ450mmの黒御影石製円柱体を、縦方向2本、横方向2本の等間隔な格子状の切断面で切断し、合計で9個の砥石セグメント(セグメントの最大の一辺長は約3.333m)を得、これを作業現場に搬入した。これら砥石セグメントの切断面に、鉄粉含有二液硬化型エポキシ樹脂接着剤 DEVCON A(登録商標)を厚み40μmとなるよう塗布し、各黒御影石製セグメントを接着して直径約10m、高さ450mmの円柱状となし、10日放置して接着剤の硬化を完全となした後、この黒御影石製円柱状石材の表裏面を研磨して面一とし、円柱状黒御影石製石材の研磨加工具を製造した。
Example 1
A black granite cylinder with a diameter of 10 m and a height of 450 mm is cut with two equally spaced grids in the vertical direction and two in the horizontal direction, for a total of nine grindstone segments (maximum one side length of the segment). Obtained approximately 3.333 m) and carried it to the work site. On the cut surfaces of these grindstone segments, an iron powder-containing two-component curable epoxy resin adhesive DEVCON A (registered trademark) is applied to a thickness of 40 μm, and each black granite segment is bonded to each other to have a diameter of about 10 m and a height of 450 mm. After 10 days of standing, the adhesive is completely cured, and then the black and white granite columnar stone is polished to be flush with each other, and the cylindrical black granite stone polishing tool Manufactured.

径方向の上面幅が3760mm、高さ580mm、最大長さ10000mm、厚み40mmのステンレス鋼(SS400)製の中央部が空洞の断面□状枠中央セグメントと、径方向の上面幅が2940mm、高さ800mm、厚み40mmのステンレス鋼(SS400)製の中央部が空洞の断面□状枠右セグメントおよび左セグメント一対の合計3個の枠セグメントを作業現場に搬入した。これら枠セグメントの継ぎ目部をボルトナットで閉め付け、直径約10mの円柱状の金属製タ−ンテ−ブルを製造した。   A cross-sectional □ -shaped frame center segment made of stainless steel (SS400) having a radial upper surface width of 3760 mm, a height of 580 mm, a maximum length of 10,000 mm, and a thickness of 40 mm, and a central portion made of stainless steel (SS400), and a radial upper surface width of 2940 mm, a height A total of three frame segments, a right-segment and a left-segment pair of 800 mm and 40 mm-thick stainless steel (SS400) with a hollow central section, were carried into the work site. The joints of these frame segments were closed with bolts and nuts to produce cylindrical metal turntables having a diameter of about 10 m.

このステンレス鋼製タ−ンテ−ブルの上面に、厚み20mm、幅150mmの扇状アルミニウム製板を素材とするスペ−サを図2に示すように同心円状に5条となるように敷設し、ボルトナットでタ−ンテ−ブル表面に固定した。   On the upper surface of the stainless steel turntable, a spacer made of a fan-shaped aluminum plate having a thickness of 20 mm and a width of 150 mm is laid in a concentric circle shape as shown in FIG. The nut was fixed to the surface of the turntable.

前記スペ−サを備えた鋳鉄製タ−ンテ−ブルを直径2100mmの回転軸に軸承させ、更に、その鋳鉄製タ−ンテ−ブルのスペ−サを備える上面に前記円柱状黒御影石製石材を載置し、直径10mの下定盤を作成した。   The cast iron turntable provided with the spacer is supported on a rotating shaft having a diameter of 2100 mm, and the columnar black granite stone material is provided on the upper surface of the cast iron turntable provided with the spacer. It was placed and a lower surface plate having a diameter of 10 m was prepared.

縦2500mm、横3200mm、厚み4mmの長方形鉄プレ−トを、図5に示す研磨装置の下定盤上に設けられたリング状キャリア内に搬送し、キャリア内に固定し、キャリアを0.4rpmで回転させるとともに、研磨剤供給管より御影石材表面上にセリア水分散液(研磨剤)を20リットル/分の割合供給しつつ、金属製タ−ンテ−ブルを0.2rpmの回転数で回転させることにより研磨下定盤を水平方向に回転させ、48時間かけて鉄プレ−トの研磨を行った。得られた研磨加工鉄プレ−トの表面は、平坦性の優れたものであった。   A rectangular iron plate having a length of 2500 mm, a width of 3200 mm, and a thickness of 4 mm is conveyed into a ring-shaped carrier provided on the lower platen of the polishing apparatus shown in FIG. 5, fixed in the carrier, and the carrier is rotated at 0.4 rpm. While rotating, the metal turntable is rotated at a rotational speed of 0.2 rpm while supplying a ceria water dispersion (abrasive) at a rate of 20 liters / minute from the abrasive supply pipe onto the granite surface. Thus, the polishing lower platen was rotated in the horizontal direction, and the iron plate was polished for 48 hours. The surface of the obtained polished iron plate was excellent in flatness.

本発明の研磨装置は、直径が4m以上の石材よりなる研磨加工具を備えるので、1辺の長辺長さが2m以上の平板状ワ−クを研磨することができる。
また、石材は、トラック搬送が許可を得ることなく搬送できる幅が4m以下の砥石セグメントを接着して形成されたものであり、かつ、石材を載せる金属タ−ンテ−ブルもトラック搬送が許される最大の幅が4m以下の3つの型枠セグメントを繋いで形成されたもので、この型枠セグメントは、研磨定盤の回転軸の軸受の直径よりは幅広の略長尺状柱の中央セグメントと、この中央セグメントの左右に継がれる円弧状柱の右セグメントおよび左セグメントの3部材で構成され、かつ、金属製タ−ンテ−ブルの各セグメント継ぎ目面と前記石材の砥石セグメントの格子状接着面が成す平面は平行ではなく、交差するように設けられているので、石材の荷重が金属製タ−ンテ−ブルの各セグメント継ぎ目に集中することなく分散されるので、金属製タ−ンテ−ブルの撓みが小さい。
Since the polishing apparatus of the present invention includes a polishing tool made of a stone having a diameter of 4 m or more, a flat work having a long side length of 2 m or more can be polished.
Further, the stone is formed by adhering a grindstone segment having a width of 4 m or less that can be transported without permission for truck transportation, and the metal turntable on which the stone is placed is also permitted to be transported by truck. It is formed by connecting three formwork segments with a maximum width of 4 m or less. This formwork segment is composed of a central segment of a substantially long column that is wider than the diameter of the bearing of the rotating shaft of the polishing surface plate. The center segment is composed of three members, a right segment and a left segment of an arc-shaped column that is connected to the left and right of the central segment, and each segment joint surface of the metal turntable and the lattice-shaped adhesive surface of the stone grinding stone segment Since the planes formed by are not parallel but are provided so as to intersect, the load on the stone is distributed without concentrating on each segment seam of the metal turntable. Data - integrators - Bull deflection is small.

本発明の研磨装置の正面図である。It is a front view of the polish device of the present invention. 本発明の実施に用いる下定盤の平面図である。It is a top view of the lower surface plate used for implementation of this invention. 石材が載置される前のタ−ンテ−ブルの平面図である。It is a top view of the turntable before a stone is mounted. 石材の格子状接着面とタ−ンテ−ブルの継ぎ目面の位置関係を示す石材の平面図である。It is a top view of the stone which shows the positional relationship of the grid-like adhesion surface of a stone, and the joint surface of a turntable. 別の態様を示す研磨装置の平面図であるIt is a top view of the polish device showing another mode.

符号の説明Explanation of symbols

1 研磨装置
2 研磨定盤(下定盤)
3 上定盤
4 キャリア
5 ベアリング
6 軸受
8 下定盤の回転軸
9 石材よりなる研磨加工具
10 金属製タ−ンテ−ブル
10a 中央枠セグメント
10b 左枠セグメント、右枠セグメント
11 撓み改良材(スペ−サ)
14 接着剤
15 平板状ワ−ク
17 枠セグメントの継ぎ目
18 修正リング
19 上定盤の回転軸
1 Polishing device 2 Polishing surface plate (lower surface plate)
3 Upper surface plate 4 Carrier 5 Bearing 6 Bearing 8 Rotating shaft of lower surface plate 9 Polishing tool made of stone 10 Metal turntable 10a Center frame segment 10b Left frame segment, right frame segment 11 Deflection improver (space Sa)
14 Adhesive 15 Flat work 17 Frame segment joint 18 Correction ring 19 Rotating shaft of upper surface plate

Claims (4)

回転軸に軸承された直径が4〜12mの円板状もしくは円環状の金属製タ−ンテ−ブル上に直径が4〜12mの円板状もしくは円環状石材を格子状に9〜121個に切断した砥石セグメントを接着剤で固着して形成した円板状もしくは円環状石材表面に、キャリアで保持した板状体ワ−クを載せ、キャリアおよび研磨定盤を回転させて板状体ワ−ク表面を研磨する研磨装置であって、前記金属製タ−ンテ−ブルは前記回転軸の軸受の直径よりは幅広の略長尺状柱の中央セグメントと、この中央セグメントの左右に継がれた円弧状柱の右セグメントおよび左セグメントの金属製三部材で構成されており、金属製タ−ンテ−ブルの各セグメント継ぎ目面と前記石材の砥石セグメントの格子状接着面が成す平面は平行ではなく、交差するように設けられていることを特徴とする、板状体ワ−クの平面研磨に用いる研磨装置。   9 to 121 discs or toroidal stones with a diameter of 4 to 12 m on a disc-shaped or toric metal turntable with a diameter of 4 to 12 m supported by a rotating shaft. A plate-like workpiece held by a carrier is placed on the surface of a disc-like or annular stone formed by fixing the cut grindstone segments with an adhesive, and the carrier and polishing platen are rotated to obtain a plate-like workpiece. A polishing apparatus for polishing the surface of the metal shaft, wherein the metal turntable is connected to a central segment of a substantially elongated column wider than the diameter of the bearing of the rotary shaft and to the left and right of the central segment. It consists of three metal members of the right segment and left segment of the arc column, and the plane formed by the grid joint surface of each segment of the metal turntable and the grindstone segment of the stone is not parallel , Provided to cross Is characterized in that is, the plate-like body Wa - polishing apparatus used in the surface polishing of the click. 上記石材は、各砥石セグメントを無機粉含有硬化型樹脂接着剤で接着・硬化して円板状もしくは円環状石材と成した後、この硬化した無機粉含有硬化型樹脂接着剤の上面を研削加工もしくは研磨加工して石材の表面を面一に形成したものであることを特徴とする、請求項1に記載の研磨装置。   The above stone materials are bonded and cured to each disc segment with a curable resin adhesive containing inorganic powder to form a disc-shaped or annular stone material, and then the upper surface of the cured curable resin adhesive containing inorganic powder is ground. Alternatively, the polishing apparatus according to claim 1, wherein the surface of the stone is formed to be flush with each other. 石材が大理石、花崗岩、黒御影石より選ばれたものであり、無機粉硬化型樹脂接着剤が鉄粉を5〜65重量%含有する硬化型エポキシ樹脂接着剤であることを特徴とする、請求項2に記載の研磨装置。   The stone material is selected from marble, granite, and black granite, and the inorganic powder curable resin adhesive is a curable epoxy resin adhesive containing 5 to 65% by weight of iron powder. 2. The polishing apparatus according to 2. 金属製タ−ンテ−ブルと石材の間には、タ−ンテ−ブルを構成する金属の硬度よりは小さい硬度を有するスペ−サが撓み改良材として同心円状に複数挿入されていることを特徴とする、請求項1に記載の研磨装置。   Between the metal turntable and the stone, a plurality of spacers having a hardness smaller than the hardness of the metal constituting the turntable are inserted concentrically as a bending improver. The polishing apparatus according to claim 1.
JP2003426436A 2003-12-24 2003-12-24 Polishing equipment Expired - Lifetime JP4427315B2 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102152190A (en) * 2011-01-26 2011-08-17 金华久隆机械有限公司 Full-automatic ornament grinding and polishing machine

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101409947B1 (en) 2009-10-08 2014-06-19 주식회사 엘지화학 Glass setting plate for glass polishing system
JP2012218121A (en) * 2011-04-12 2012-11-12 Bando Chemical Industries Ltd Polishing plate
JP6963446B2 (en) * 2017-09-06 2021-11-10 富士紡ホールディングス株式会社 Holding pad

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102152190A (en) * 2011-01-26 2011-08-17 金华久隆机械有限公司 Full-automatic ornament grinding and polishing machine
CN102152190B (en) * 2011-01-26 2013-07-31 金华久隆机械有限公司 Full-automatic ornament grinding and polishing machine

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