JP4413364B2 - Planar optical waveguide circuit and manufacturing method thereof - Google Patents

Planar optical waveguide circuit and manufacturing method thereof Download PDF

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JP4413364B2
JP4413364B2 JP2000068292A JP2000068292A JP4413364B2 JP 4413364 B2 JP4413364 B2 JP 4413364B2 JP 2000068292 A JP2000068292 A JP 2000068292A JP 2000068292 A JP2000068292 A JP 2000068292A JP 4413364 B2 JP4413364 B2 JP 4413364B2
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waveguide
slab waveguide
cut
metal film
arrayed
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JP2001255431A (en
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一久 柏原
一孝 奈良
昌伸 根角
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THE FURUKAW ELECTRIC CO., LTD.
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THE FURUKAW ELECTRIC CO., LTD.
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
    • G02B6/12009—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides
    • G02B6/12014—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides characterised by the wavefront splitting or combining section, e.g. grooves or optical elements in a slab waveguide
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
    • G02B6/12009—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides
    • G02B6/12026—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides characterised by means for reducing the temperature dependence
    • G02B6/1203—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides characterised by means for reducing the temperature dependence using mounting means, e.g. by using a combination of materials having different thermal expansion coefficients
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/136—Integrated optical circuits characterised by the manufacturing method by etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Integrated Circuits (AREA)

Description

【０００１】
【発明の属する技術分野】
本発明は、光通信等に使用されるアレイ導波路型回折格子の平面光導波回路およびその製造方法に関するものである。
【０００２】
【従来の技術】
近年、光通信においては、その伝送容量を飛躍的に増加させる方法として、光波長多重通信の研究開発が盛んに行なわれ、実用化が進みつつある。光波長多重通信は、例えば互いに異なる波長を有する複数の光を波長多重化して伝送させるものであり、このような光波長多重通信のシステムにおいては、伝送される複数の光から、光受信側で波長ごとの光を取り出すために、予め定められた波長の光のみを透過する光透過素子等を、システム内に設けることが不可欠である。
【０００３】
光透過素子の一例として、例えば図７に示すような、平面光導波回路としてのアレイ導波路型回折格子(ＡＷＧ；Ａｒｒａｙｅｄ Ｗａｖｅｇｕｉｄｅ Ｇｒａｔｉｎｇ)がある。アレイ導波路型回折格子は、シリコン等の基板１１上に、同図に示すような導波路構成を形成したものであり、この導波路構成は、１本以上の並設された光入力導波路１２の出射側に、第１のスラブ導波路１３が接続され、該第１のスラブ導波路１３の出射側には、複数の並設されたアレイ導波路１４が接続され、該複数のアレイ導波路１４の出射側には第２のスラブ導波路１５が接続され、該第２のスラブ導波路１５の出射側には複数の並設された光出力導波路１６が接続されて形成されている。
【０００４】
前記アレイ導波路１４は、第１のスラブ導波路１３から導出された光を伝搬するものであり、互いに異なる長さに形成されている。なお、光入力導波路１２や光出力導波路１６は、例えばアレイ導波路型回折格子によって分波される互いに異なる波長の信号光の数に対応させて設けられるものであり、アレイ導波路１４は、通常、例えば１００本といったように多数設けられるが、同図においては、図の簡略化のために、これらの各導波路１２，１４，１６の本数を簡略的に示してある。
【０００５】
光入力導波路１２には、例えば送信側の光ファイバが接続されて、波長多重光が導入されるようになっており、光入力導波路１２を通って第１のスラブ導波路１３に導入された光は、その回折効果によって広がって複数の各アレイ導波路１４に入射し、各アレイ導波路１４を伝搬する。
【０００６】
この各アレイ導波路１４を伝搬した光は、第２のスラブ導波路１５に達し、さらに、光出力導波路１６に集光されて出力されるが、各アレイ導波路１４の長さが互いに異なることから、各アレイ型導波路１４を伝搬した後に個々の光の位相にずれが生じ、このずれ量に応じて集束光の波面が傾き、この傾き角度により集光する位置が決まるため、波長の異なった光の集光位置は互いに異なることになり、その位置に光出力導波路１６を形成することによって、波長の異なった光を各波長ごとに異なる光出力導波路１６から出力できる。
【０００７】
例えば、同図に示すように、１本の光入力導波路１２から波長λ１，λ２，λ３，・・・λｎ(ｎは２以上の整数)の波長多重光を入力させると、これらの光は、第１のスラブ導波路１３で広げられ、アレイ導波路１４に到達し、第２のスラブ導波路１５を通って、前記の如く、波長によって異なる位置に集光され、互いに異なる光出力導波路１６に入射し、それぞれの光出力導波路１６を通って、光出力導波路１６の出射端から出力される。そして、各光出力導波路１６の出射端に光出力用の光ファイバを接続することにより、この光ファイバを介して、前記各波長の光が取り出される。
【０００８】
このアレイ型導波路回折格子においては、回折格子の波長分解能が回折格子を構成する各アレイ導波路１４の長さの差（ΔＬ）に比例するために、ΔＬを大きく設計することにより、従来の回折格子では実現できなかった波長間隔の狭い波長多重光の光合分波が可能となり、高密度の光波長多重通信の実現に必要とされている、複数の信号光の光合分波機能、すなわち、波長間隔が１ｎｍ以下の複数の光信号を分波または合波する機能を果たすことができる。
【０００９】
また、上記アレイ導波路回折格子において、各光出力導波路１６から出力される光の光透過特性（アレイ導波路回折格子の透過光強度の波長特性）は、各光透過中心波長（例えばλ１，λ２，λ３，・・・λｎ）を中心とし、それぞれの対応する光透過中心波長から波長がずれるにしたがって光透過率が小さくなる光透過特性を示す。
【００１０】
上記各光透過中心波長λ０は、アレイ導波路１４の等価屈折率ｎｃと、隣り合うアレイ導波路１４の長さの差ΔＬと、回折次数ｍとにより決定され、次式（１）により示されるものであり、したがって、１つの光出力導波路１６について、前記光透過特性を示す波長は１つとは限らず、設定される回折次数によって複数の中心波長が存在しうる。
【００１１】
λ０＝ｎｃΔＬ／ｍ・・・・・（１）
【００１２】
また、アレイ導波路回折格子は、光回路の相反性（可逆性）の原理を利用しているため、光分波器としての機能と共に、光合波器としての機能も有している。すなわち、図７とは逆に、各光出力導波路１６から互いに波長が異なる複数の光を入射させると、これらの光は、上記と逆の伝搬経路を通り、アレイ導波路１４によって合波され、１本の光入力導波路１２から出射される。
【００１３】
【発明が解決しようとする課題】
ところで、アレイ導波路型回折格子は、その作製誤差により、光透過中心波長がグリッド波長等の設定波長からずれるので、この光透過中心波長のずれをアニール処理によって補正して設定波長とすることが、特願平１０−３４１１４６号に提案されている。この提案によれば、例えば７００℃〜８００℃といった高温の予め設定した設定温度雰囲気下にアレイ導波路型回折格子を置き、予め設定した設定時間経過させることにより、前記光透過中心波長のずれを補正することができる。
【００１４】
一方、上記のアレイ導波路回折格子は、元来、石英系ガラス材料を主とするために、この石英系ガラス材料の温度依存性に起因してアレイ導波路１４の等価屈折率ｎｃが変化し、アレイ導波路回折格子の前記光透過中心波長が温度に依存してシフトすることが問題となるので、この温度依存シフト性を抑制できるアレイ導波路回折格子が特願平１１−３７０４５７号に提案されている。この提案は未だ公開になっていないものであり、この提案のアレイ導波路回折格子の基本構成が図４に示されている。
【００１５】
同図に示すアレイ導波路回折格子は、基板１１上に石英系ガラスによって形成された導波路形成領域１０を形成している。導波路形成領域１０は従来例とほぼ同様の導波路構成を有している（図７では光入力導波路１２を複数本としたが図４では光入力導波路１２を１本としている）が、図４に示すアレイ導波路回折格子においては、第１のスラブ導波路１３が、第１のスラブ導波路１３を通る光の経路と交わる切断面８で切断分離されている。なお、光入力導波路１２の本数は特に限定されるものではなく、適宜設定されるものである。
【００１６】
切断面８は導波路形成領域１０の一端側（図の上端側）から導波路形成領域の途中部にかけて設けられており、この切断面８に連通させて、切断面８と直交する切断面１８が形成されている。
【００１７】
この提案のアレイ導波路型回折格子は、切断面８と切断面１８とによって、導波路形成領域１０を、一方側の分離スラブ導波路１３ａを含む第１の導波路形成領域１０ａと、他方側の分離スラブ導波路１３ｂを含む第２の導波路形成領域１０ｂとに切断分離しており、導波路形成部１０ｂの平面形状はＬ字形状と成している。
【００１８】
また、第１の導波路形成領域１０ａと第２の導波路形成領域とに跨る態様で、導波路形成領域１０および基板１１よりも熱膨張係数が大きいスライド移動部材１７が設けられており、スライド移動部材１７は、第１の導波路形成領域１０ａを、切断面８に沿って第２の導波路形成領域１０ｂに対して移動させる構成と成している。なお、スライド移動部材１７は、例えば熱膨張係数が１．６５×１０−５（１／Ｋ）の銅板により形成される。
【００１９】
スライド移動部材１７の下側には、破線の斜線で示す部位に半田３０が設けられ、この半田３０の下側には金属膜１が設けられており、金属膜１と半田３０とを介して、導波路形成領域１０ａ，１０ｂの固定用部位にスライド移動部材１７が固定されている。
【００２０】
この提案のアレイ導波路型回折格子を作製する際、まず、図５の（ａ）に示すように、基板１１上に従来のアレイ導波路型回折格子と同様の導波路構成を有する導波路形成領域１０を形成し、チップ化し（１つのアレイ導波路型回折格子に分離し）、次に、導波路形成領域１０の表面側に、同図の（ｂ）に示すようなレジストマスク４０の形成を行なう。なお、このレジストマスク４０の形成は、フォトリソグラフィーにより行なうものであり、まず、導波路形成領域１０の表面にレジストを塗布し、このレジストを予め定めた設定パターンに合わせて露光し、その後、現像することにより行なう。
【００２１】
そして、このレジストマスク４０を介して、導波路形成領域１０の表面側に、ＥＢ（電子ビーム）蒸着やスパッタリング等により、同図の（ｃ）に示すように金属膜１を形成する。なお、金属膜１は半田３０の下地になるものであり、図６の（ｂ）に示すような形状に、互いに間隔を介して形成される。その後、リフトオフを行なってレジストマスク４０を溶剤で剥離させ、除去し、図６の（ａ）、（ｂ）に示すように、金属膜１の間のＡに示す領域内に切断面１８を形成するアレイ導波路型回折格子の一次切断を行う。
【００２２】
次に、金属膜１の上に、Ｓｎ／Ｐｂ（６０％／４０％）半田３０（図６には図示せず）を配した後、図５の（ｄ）に示すように、スライド移動部材１７を配置した状態で半田３０を溶融させることにより、スライド移動部材１７を導波路形成領域１０に半田固定する（ロッド固定工程）。なお、半田３０の溶融は、ホットプレートによって半田３０のチップを溶融することにより行われる。前記金属膜１は、導波路形成領域１０の表面（ガラス面）と半田３０との密着性を上げるために設け、半田３０は金属膜１とスライド移動部材１７とを密着させるために設ける。
【００２３】
その後、図５の（ｅ）に示すように、ダイシングソー等によってアレイ導波路回折格子の二次切断を行ない、切断面８を形成する。切断面８は、図６の（ｄ）に示すように、第１のスラブ導波路１３を通る光の経路に交わるように形成することにより、図４に示したようなアレイ導波路型回折格子が形成される。なお、図６の（ｃ）の５０は、溝部を示している。
【００２４】
この提案のアレイ導波路型回折格子においては、図４に示すように、スライド移動部材１７によって第１の導波路形成領域１０ａを切断面８に沿って矢印Ｃ、Ｄ方向に移動することにより、アレイ導波路回折格子の各光透過中心波長の温度依存性を補償することができる。
【００２５】
しかも、スライド移動部材１７を、第１の導波路形成領域１０ａと第２の導波路形成領域１０ｂとに跨って設けることによって、導波路形成領域１０ａのスライド移動時に、導波路形成領域１０ａが前記ベースに対して上方側（ＸＹ平面に垂直なＺ軸方向）に変位しないようにできるし、装置構成を簡略化することができ、装置の低コスト化および製造歩留まりの向上を図ることができる。
【００２６】
この提案のアレイ導波路型回折格子は、上記優れた効果を奏することができるので、本発明者は、このアレイ導波路型回折格子の構成と、前記アニール処理により光透過中心波長ずれを補正する方法とを組み合わせれば、温度によらず、アレイ導波路型回折格子の各光透過中心波長を常にほぼ設定波長とすることができる優れたアレイ導波路型回折格子とすることができると考えた。
【００２７】
しかしながら、図４に示した提案のアレイ導波路型回折格子にアニール処理を施すと、前記高温の処理によって金属膜１の溶融や酸化劣化が生じるため、上記組み合わせを実現するためには、アレイ導波路型回折格子の作製において、金属膜１の作製前にアニール処理を施す必要があるが、従来は、図５の（ａ）に示した回路構成形成から、同図の（ｂ）に示した金属膜１の作製等の工程を経て、同図の（ｅ）に示したアレイ導波路回折格子の二次切断に至るまで、アレイ導波路型回折格子の作製装置によって一連して各工程を実施していたために、この一連の工程の途中にアニール処理の工程を割り込ませることは難しい。
【００２８】
そして、従来のアレイ導波路型回折格子への金属膜作製工程は、前記の如く、フォトリソグラフィーによるレジストマスクの形成、金属膜の蒸着又はスパッタリング、レジストマスクのリフトオフを行なうものであり、これらを自動的に行なう装置の構成は複雑となるために、仮に、図５の（ａ）に示したアレイ導波路型回折格子の回路構成作製後、チップ化、光透過中心波長の測定、アニール処理を行ない、その後、図５の（ｂ）で金属膜１を作製し、同図の（ｅ）に至るまでの工程を行なえる装置を新たに作ろうとすると、新たに作製する装置コストは非常に高くなる。
【００２９】
したがって、図４に示した提案のアレイ導波路型回折格子の構成と、前記アニール処理により光透過中心波長ずれを補正する方法とを組み合わせるために、本発明者は、装置コストが安く、簡単な操作で金属膜を作製できる金属膜作製方法を提案し、アニール処理と組み合わせることにより、温度によらず、アレイ導波路型回折格子の各光透過中心波長を常に設定波長とすることができるアレイ導波路型回折格子を提案することが重要であると考えた。
【００３０】
本発明は、上記課題を解決するためになされたものであり、その目的は、温度によらず光透過中心波長を常に設定波長にすることが可能なアレイ導波路型回折格子の平面光導波回路を作製できるようにする、平面光導波回路への金属膜の作製方法およびその方法を用いて作製した金属膜を備えた平面光導波回路を提供することにある。
【００３１】
【課題を解決するための手段】
上記目的を達成するために、本発明は次のような構成をもって課題を解決するための手段としている。すなわち、第１の発明は平面光導波回路の製造方法に関し、１本以上の並設された光入力導波路と、該光入力導波路の出射側に接続された第１のスラブ導波路と、該第１のスラブ導波路の出射側に接続されて該第１のスラブ導波路から導出された光を伝搬する互いに異なる長さの複数の並設されたアレイ導波路と、該複数のアレイ導波路の出射側に接続された第２のスラブ導波路と、該第２のスラブ導波路の出射側に接続された複数の並設された光出力導波路とを有するアレイ導波路型回折格子の導波路を基板上に形成する工程と、当該工程の後にアレイ導波路型回折格子の導波路が形成された基板をアニール処理する工程と、然る後に、前記第１のスラブ導波路と第２のスラブ導波路の少なくとも一方の切断対象のスラブ導波路側において、前記アレイ導波路型回折格子の導波路が形成されていない基板面部分に前記切断対象のスラブ導波路を通る光の進行方向とは交差する方向に間隔を介してそれぞれ金属膜を作製する工程と、前記間隔を介して形成された金属膜間の前記アレイ導波路型回折格子の導波路が形成されていない基板面部分に基板端面側から前記切断対象のスラブ導波路内の光の進行方向に該切断対象のスラブ導波路の形成領域の深さまで切り込んだ一次切断を行う工程と、前記基板およびアレイ導波路型回折格子の導波路よりも熱膨張係数の大きいスライド部材を前記一次切断の切断ラインに跨る態様で配置し、かつ該スライド部材の両端側に対応する位置に作製された前記金属膜に半田を介して接続固定する工程と、当該工程後に前記一次切断の切り込み端面とは異なる基板の端面側から前記切断対象のスラブ導波路内の光の進行方向とは交差する方向に前記一次切断の切断ラインに達する二次切断を行って切断対象のスラブ導波路を切断分離する工程とを有し、前記金属膜を作製する工程は、基板面に作製する金属膜形状とほぼ同一形状の穴を有するマスクを用意し、該マスクの穴を前記金属膜の作製部位に対応させて前記マスクを配置し、蒸着により該金属膜の作製部位に金属膜を作製することと成し、前記スライド部材が温度変化に応じて伸縮することによって、切断対象のスラブ導波路の切断分離された一方側の分離スラブ導波路が他方側の分離スラブ導波路に対して前記二次切断の切断面に沿ってスライド移動して前記アレイ導波路型回折格子の各光透過中心波長の温度依存性が補償される構成をもって課題を解決する手段としている。
【００３３】
さらに、第２の発明は、平面光導波回路に関し、１本以上の並設された光入力導波路と、該光入力導波路の出射側に接続された第１のスラブ導波路と、該第１のスラブ導波路の出射側に接続されて該第１のスラブ導波路から導出された光を伝搬する互いに異なる長さの複数の並設されたアレイ導波路と、該複数のアレイ導波路の出射側に接続された第２のスラブ導波路と、該第２のスラブ導波路の出射側に接続された複数の並設された光出力導波路とを有するアレイ導波路型回折格子の導波路が基板上に形成され、前記第１のスラブ導波路と第２のスラブ導波路の少なくとも一方の切断対象のスラブ導波路側において、前記アレイ導波路型回折格子の導波路が形成されていない基板面部分に基板端面側から前記切断対象のスラブ導波路内の光の進行方向に該切断対象のスラブ導波路の形成領域の深さまで切り込んだ一次切断の切断ラインと、基板面に前記一次切断の切断ラインを挟んで当該ラインの両側に間隔を介して作製された金属膜とを備え、当該金属膜は、前記アレイ導波路型回折格子の導波路が形成された基板がアニール処理された後であって、かつ、前記一次切断の切断ラインが形成される前に作製されるものであり、当該金属膜の作製は、基板面に作製する金属膜形状とほぼ同一形状の穴を有するマスクを用意し、該マスクの穴を前記金属膜の作製部位に対応させて前記マスクを配置し、蒸着により該金属膜の作製部位に金属膜を作製する工程によって作製されているものであり、前記基板およびアレイ導波路型回折格子の導波路よりも熱膨張係数の大きいスライド部材が前記一次切断の切断ラインに跨る態様で配置されて該スライド部材の両端側が前記一次切断の切断ラインの両側に作製されている対応する金属膜に半田を介して接続固定されており、前記一次切断の切り込み端面とは異なる基板の端面側から前記切断対象のスラブ導波路内の光の進行方向とは交差する方向に前記一次切断の切断ラインに達する二次切断によって切断対象のスラブ導波路が切断分離されており、前記スライド部材が温度変化に応じて伸縮することによって、切断対象のスラブ導波路の切断分離された一方側の分離スラブ導波路が他方側の分離スラブ導波路に対して前記二次切断の切断面に沿ってスライド移動して前記アレイ導波路型回折格子の各光透過中心波長の温度依存性が補償される構成をもって課題を解決する手段としている。
【００３７】
【発明の実施の形態】
以下、本発明の実施の形態を図面に基づいて説明する。なお、本実施形態例の説明において、従来例と同一名称部分には同一符号を付し、その重複説明は省略する。図１には、本発明に係る平面光導波回路への金属膜の作製方法の一実施形態例を適用したアレイ導波路型回折格子の作製工程が示されている。また、図２には、図１の作製工程にて作製したアレイ導波路型回折格子の導波路を備えた平面光導波回路の構成が平面図により示されている。
【００３８】
図２に示すアレイ導波路型回折格子は、図４に示した提案のアレイ導波路型回折格子とほぼ同様に構成されているが、図２に示すアレイ導波路型回折格子は、基板１１および導波路形成領域１０に、光透過波長の中心波長を設定波長に補正するアニール処理を施してあり、アレイ導波路型回折格子の作製誤差による光透過中心波長の設定波長（例えばグリッド波長）からのずれを殆ど零としている。
【００３９】
以下、図１および図２、６に基づいて、本実施形態例の金属膜の作製方法を適用したアレイ導波路型回折格子の作製工程を説明する。まず、図１の（ａ）に示すように、基板１１上に従来のアレイ導波路型回折格子と同様の導波路構成（図７参照）を有する導波路形成領域１０を形成し、チップ化する。次に、図１の（ｂ）に示す工程にて、アレイ導波路型回折格子の光透過中心波長を周知の測定方法によって測定する。
【００４０】
次に、この測定結果に基づき、前記光透過中心波長の設定波長からのずれを補正するために、同図の（ｃ）に示すように、アレイ導波路型回折格子のチップのアニール処理を行なう。
【００４１】
その後、アレイ導波路型回折格子のチップを例えば常温に戻し、同図の（ｄ）に示すように、作製する金属膜形状とほぼ同一形状の穴２を有する（予め形成してある）マスク（マスクジグ）３の穴２を金属膜の作製部位に対応させて、マスク３を配置し、金属膜作製部位に金属膜１を蒸着等により作製する。金属膜１の作製後、マスク３は取り外す。
【００４２】
なお、マスク３は、同図に示すように、アレイ導波路型回折格子の導波路形成領域１０の表面側を覆う上板部４とアレイ導波路型回折格子の側面がわを覆う側板部５とを有する形状にすると、チップをマスク（マスクジグ）３に入れることにより、金属膜作製部位の位置決めが簡単にできる。さらに、マスク３を基板用のウェハと同一形状にしておくことにより、従来使用していた装置にそのまま取り付けることができ、マスク３を取り付けるための治具などを新たに作製する必要がなく、金属膜１を作製しやすい。また、アレイ導波路型回折格子のチップの取り外しも、単に、マスク３を装置から取り外し、マスク３の中からチップを取り出す（またはアレイ導波路型回折格子のチップの位置を他に移す）だけでよいため、非常に簡単に行なえる。
【００４３】
また、本実施形態例では、マスク３をテフロン板により形成しており、このようにテフロンの板を用いることにより、金属膜１の作製後にマスク３の取り外してマスク３を洗浄し、マスク３を再利用できる。
【００４４】
次に、同図の（ｅ）で導波路形成領域１０と基板１１の一次切断を行なう。なお、この一次切断は、図６の（ａ）、（ｂ）に示したような、金属膜１の間のＡに示す領域内に切断面１８を形成するものである。その後、図１の（ｆ）、（ｇ）の工程にて、図５の（ｄ）、（ｅ）と同様に、スライド移動部材１７の固定（ロッド固定）および二次切断を行なう。
【００４５】
そして、図２に示すように、光入力導波路１２側に、光ファイバ配列具２１に固定された光ファイバ２３を接続（ボンディング）し、光出力導波路１６側に、光ファイバアレイ２２に固定された光ファイバテープ２４を接続（ボンディング）し、図２に示したアレイ導波路型回折格子を完成する。
【００４６】
なお、図２において、第１の導波路形成領域１０ａと第２の導波路形成領域１０ｂは間隔を介して配置されており、例えば、同図に示すＡ部の間隔（切断面１８同士の間隔）は１００μｍ程度であり、同図に示すＢ部の間隔（切断面８同士の間隔）は２５μｍ程度である。
【００４７】
また、金属膜１には、Ｃｒ／Ｃｕを、それぞれ順に、０．１／０．５（単位はμｍ）、Ｃｒ／Ｔｉ／Ｐｔ／Ａｕを、それぞれ順に、０．１／０．１／０．１／０．６（単位はμｍ）ずつ積層して形成したものや、Ｔｉ／Ｐｔ／Ａｕを、それぞれ順に、０．１／０．１／０．６（単位はμｍ）ずつ積層して形成したものを適用した。
【００４８】
本実施形態例によれば、従来の金属膜作製方法のように、フォトリソグラフィーによるレジストマスクの形成やレジストマスクのリフトオフといった煩雑な操作を必要とせず、作製する金属膜形状とほぼ同一形状の穴を有する３マスクを用意し、該マスク３の穴を金属膜作製部位に対応させてマスク３を配置し、金属膜作製部位に金属膜１を作製するといった簡単な操作であり、金属膜１の作製後はマスク３を装置から取り外し、マスク３の中からチップを取り出すだけでよいため、これらの操作を行なう装置構成も簡単になり、装置コストも安くできる。
【００４９】
したがって、上記金属膜１の作製を前記アニール処理後に行なうようにし、金属膜作製後に、金属膜１を介して、スライド移動部材１７を第１の導波路形成領域１０ａと第２の導波路形成領域１０ｂとに跨る態様で設けることにより、温度によらず、アレイ導波路型回折格子の各光透過中心波長を常にほぼ設定波長とすることができるアレイ導波路型回折格子を非常に簡単に、低コストで作製できる。
【００５０】
なお、本発明は上記実施形態例に限定されることはなく、様々な実施の態様を採り得る。例えば、上記実施形態例では、マスク３をテフロンの板により形成したが、マスク３の形成材料などは特に限定されるものではなく、適宜設定されるものである。ただし、マスク３をテフロンの板により形成すると、穴２の加工や、金属膜１の作製後のマスク３の洗浄を容易に行なうことができる。
【００５１】
また、図２に示したアレイ導波路型回折格子の作製工程において、半田３０のチップを用いる代わりに、半田３０を金属膜１と同様に、マスク３を用いてＥＢ蒸着や抵抗加熱蒸着等によって形成してもよい。この場合、図１の（ａ）、（ｂ）に示した工程の後、図３の（ａ）、（ｂ）に示すように、図１の（ｃ）、（ｄ）と同様に、アレイ導波路型回折格子のアニール処理後に金属膜１を作製し、その後、図３の（ｃ）に示すように、マスク３を用いて半田３０を形成する。
【００５２】
その後、図１の（ｅ）、（ｆ）、（ｇ）と同様に、図３の（ｄ）、（ｅ）、（ｆ）の工程を行ない、図２に示した光ファイバ配列具２１、光ファイバアレイ２３を接続すれば、図２に示したアレイ導波路型回折格子が完成する。
【００５３】
さらに、本発明の平面光導波回路への金属膜の作製方法により形成する金属膜１の種類や、膜形状、大きさなどは特に限定されるものではなく、適宜設定されるものであり、作製する金属膜形状とほぼ同一形状の穴を有するマスク３を用いて、様々な金属膜１の作製を行なうことができる。また、金属膜１の作製位置は、平面光導波回路の表面側に限定されるものではなく、平面光導波回路の表面側と裏面側の少なくとも一方に形成すればよい。
【００５４】
さらに、図２においては、アレイ導波路型回折格子の表面側の導波路形成領域１０側に金属膜１を形成したが、アレイ導波路型回折格子の裏面側（基板１１の裏面側）に金属膜１を形成してもよい。
【００５６】
【発明の効果】
本発明の平面光導波回路の製造方法においての金属膜の作製方法は、従来の金属膜作製方法のように、フォトリソグラフィーによるレジストマスクの形成やレジストマスクのリフトオフといった煩雑な操作を必要とせず、作製する金属膜形状とほぼ同一形状の穴を有するマスクを用いた簡単な操作により作製できる方法であるため、この操作を行なう装置構成も簡単になり、装置コストも安くできる。
【００５７】
そして、この金属膜作製を前記アニール処理後に行なうようにし、金属膜作製後に、金属膜を介してアレイ導波路型回折格子の光透過中心波長の温度依存性を補正可能なスライド移動部材の両端側を基板表面に固定すれば、温度によらず、アレイ導波路型回折格子の各光透過中心波長を常にほぼ設定波長とすることができるアレイ導波路型回折格子の導波路を備えた平面光導波回路を、容易に、かつ、低作製コストで歩留まり良く提供することができる。
【図面の簡単な説明】
【図１】 本発明に係る平面光導波回路の製造方法においての金属膜の作製方法の一実施形態例を適用したアレイ導波路型回折格子の作製工程例を示す説明図である。
【図２】図１に示した工程により作製されるアレイ導波路型回折格子を平面図により示す要部構成図である。
【図３】図２のアレイ導波路型回折格子の他の作製工程例を示す説明図である。
【図４】光透過中心波長の温度依存性を低減可能なアレイ導波路型回折格子の構成例を示す説明図である。
【図５】図４に示すアレイ導波路型回折格子の従来の作製工程例を示す説明図である。
【図６】アレイ導波路型回折格子の一次切断（ａ）と二次切断（ｂ）の説明図である。
【図７】従来のアレイ導波路型回折格子の構成例をその動作と共に示す説明図である。
【符号の説明】
１ 金属膜
２ 穴
３ マスク
４ 上板部
５ 側板部
８ 切断面
１０ 導波路形成領域
１１ 基板
１２ 光入力導波路
１３ 第１のスラブ導波路
１４ アレイ導波路
１５ 第２のスラブ導波路
１６ 光出力導波路
１７ スライド移動部材[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an arrayed waveguide type diffraction case used for optical communication and the like. Of child Planar optical waveguide circuit And manufacturing method thereof It is about.
[0002]
[Prior art]
In recent years, in optical communication, research and development of optical wavelength division multiplexing communication has been actively conducted as a method for dramatically increasing the transmission capacity, and practical application is being advanced. In the optical wavelength division multiplexing communication, for example, a plurality of lights having different wavelengths are wavelength-multiplexed and transmitted. In such an optical wavelength multiplexing communication system, a plurality of transmitted lights are transmitted from the optical receiver side. In order to extract light for each wavelength, it is essential to provide a light transmission element or the like that transmits only light of a predetermined wavelength in the system.
[0003]
An example of the light transmissive element is an arrayed waveguide grating (AWG) as a planar optical waveguide circuit as shown in FIG. The arrayed waveguide type diffraction grating has a waveguide configuration as shown in the figure formed on a substrate 11 such as silicon, and this waveguide configuration includes one or more optical input waveguides arranged in parallel. The first slab waveguide 13 is connected to the exit side of the plurality 12, and the arrayed waveguides 14 arranged in parallel are connected to the exit side of the first slab waveguide 13, and the plurality of array waveguides are connected. A second slab waveguide 15 is connected to the output side of the waveguide 14, and a plurality of light output waveguides 16 arranged in parallel are connected to the output side of the second slab waveguide 15. .
[0004]
The arrayed waveguide 14 propagates light derived from the first slab waveguide 13 and has different lengths. The optical input waveguide 12 and the optical output waveguide 16 are provided corresponding to the number of signal lights having different wavelengths that are demultiplexed by, for example, an arrayed waveguide type diffraction grating. Usually, for example, a large number such as 100 is provided, but in the figure, the number of each of these waveguides 12, 14, and 16 is simply shown for the sake of simplicity.
[0005]
For example, an optical fiber on the transmission side is connected to the optical input waveguide 12 so that wavelength-division multiplexed light is introduced. The optical input waveguide 12 is introduced into the first slab waveguide 13 through the optical input waveguide 12. The light spreads by the diffraction effect and enters each of the plurality of arrayed waveguides 14 and propagates through each of the arrayed waveguides 14.
[0006]
The light propagating through each arrayed waveguide 14 reaches the second slab waveguide 15 and is further collected and output to the light output waveguide 16, but the lengths of the respective arrayed waveguides 14 are different from each other. Therefore, the phase of each light is shifted after propagating through each arrayed waveguide 14, and the wavefront of the focused light is tilted according to the shift amount, and the focusing position is determined by this tilt angle. Different light condensing positions are different from each other. By forming the light output waveguide 16 at the position, light having different wavelengths can be output from the light output waveguides 16 different for each wavelength.
[0007]
For example, as shown in the figure, when wavelength multiplexed light of wavelengths λ1, λ2, λ3,... Λn (n is an integer of 2 or more) is input from one optical input waveguide 12, these lights are The optical output waveguides are spread by the first slab waveguide 13, reach the arrayed waveguide 14, pass through the second slab waveguide 15, and are condensed at different positions depending on the wavelength as described above, and are different from each other. 16, passes through each light output waveguide 16, and is output from the output end of the light output waveguide 16. Then, by connecting an optical fiber for light output to the output end of each light output waveguide 16, light of each wavelength is extracted through this optical fiber.
[0008]
In this arrayed waveguide diffraction grating, the wavelength resolution of the diffraction grating is proportional to the difference in length (ΔL) between the arrayed waveguides 14 constituting the diffraction grating. Optical multiplexing / demultiplexing of wavelength-multiplexed light with a narrow wavelength interval that could not be realized with a diffraction grating is possible, and optical multiplexing / demultiplexing functions of a plurality of signal lights required for realizing high-density optical wavelength-division multiplexing communication, that is, A function of demultiplexing or multiplexing a plurality of optical signals having a wavelength interval of 1 nm or less can be achieved.
[0009]
In the arrayed waveguide grating, the light transmission characteristics of light output from each light output waveguide 16 (wavelength characteristics of the transmitted light intensity of the arrayed waveguide diffraction grating) are the light transmission center wavelengths (for example, λ1, The light transmission characteristic is such that the light transmittance is reduced as the wavelength shifts from the corresponding light transmission center wavelength with λ2, λ3,.
[0010]
Each light transmission center wavelength λ 0 Is the equivalent refractive index n of the arrayed waveguide 14 c And the length difference ΔL between the adjacent arrayed waveguides 14 and the diffraction order m, and are expressed by the following equation (1). The wavelength indicating the characteristic is not limited to one, and a plurality of center wavelengths may exist depending on the set diffraction order.
[0011]
λ 0 = N c ΔL / m (1)
[0012]
Further, since the arrayed waveguide diffraction grating utilizes the principle of reciprocity (reversibility) of an optical circuit, it has a function as an optical demultiplexer as well as a function as an optical multiplexer. That is, contrary to FIG. 7, when a plurality of lights having different wavelengths are incident from the respective light output waveguides 16, these lights pass through the reverse propagation path and are combined by the arrayed waveguide 14. The light is emitted from one optical input waveguide 12.
[0013]
[Problems to be solved by the invention]
By the way, in the arrayed waveguide type diffraction grating, the light transmission center wavelength shifts from the set wavelength such as the grid wavelength due to the manufacturing error. Therefore, the shift of the light transmission center wavelength can be corrected by the annealing process to be the set wavelength. This is proposed in Japanese Patent Application No. 10-341146. According to this proposal, for example, by placing the arrayed waveguide type diffraction grating in a preset temperature atmosphere set at a high temperature such as 700 ° C. to 800 ° C. and allowing a preset set time to elapse, the shift of the light transmission center wavelength can be reduced. It can be corrected.
[0014]
On the other hand, since the above-mentioned arrayed waveguide diffraction grating is primarily made of a silica-based glass material, the equivalent refractive index n of the arrayed waveguide 14 is caused by the temperature dependence of the silica-based glass material. c Changes, and the light transmission center wavelength of the arrayed waveguide diffraction grating shifts depending on temperature. Therefore, an arrayed waveguide diffraction grating that can suppress this temperature-dependent shift is disclosed in Japanese Patent Application No. 11-370457. Proposed in the issue. This proposal has not been disclosed yet, and the basic configuration of the proposed arrayed waveguide grating is shown in FIG.
[0015]
The arrayed waveguide diffraction grating shown in FIG. 1 has a waveguide forming region 10 formed of quartz glass on a substrate 11. The waveguide forming region 10 has substantially the same waveguide configuration as that of the conventional example (in FIG. 7, a plurality of optical input waveguides 12 are provided, but in FIG. 4, only one optical input waveguide 12 is provided). In the arrayed waveguide diffraction grating shown in FIG. 4, the first slab waveguide 13 is cut and separated by a cut surface 8 that intersects the light path passing through the first slab waveguide 13. The number of the optical input waveguides 12 is not particularly limited, and is set as appropriate.
[0016]
The cut surface 8 is provided from one end side (the upper end side in the drawing) of the waveguide forming region 10 to a middle portion of the waveguide forming region. The cut surface 18 communicates with the cut surface 8 and is orthogonal to the cut surface 8. Is formed.
[0017]
The proposed arrayed waveguide type diffraction grating includes a cut surface 8 and a cut surface 18, and a waveguide forming region 10, a first waveguide forming region 10 a including a separation slab waveguide 13 a on one side, and the other side. The second waveguide forming region 10b including the separated slab waveguide 13b is cut and separated, and the planar shape of the waveguide forming portion 10b is L-shaped.
[0018]
In addition, a slide moving member 17 having a thermal expansion coefficient larger than that of the waveguide forming region 10 and the substrate 11 is provided in a manner straddling the first waveguide forming region 10a and the second waveguide forming region. The moving member 17 is configured to move the first waveguide formation region 10a along the cut surface 8 with respect to the second waveguide formation region 10b. The slide moving member 17 has a coefficient of thermal expansion of 1.65 × 10, for example. -5 It is formed of a (1 / K) copper plate.
[0019]
Below the slide moving member 17, a solder 30 is provided at a portion indicated by a broken diagonal line, and a metal film 1 is provided below the solder 30, and the metal film 1 and the solder 30 are interposed therebetween. The slide moving member 17 is fixed to the fixing portions of the waveguide forming regions 10a and 10b.
[0020]
When producing the proposed arrayed waveguide type diffraction grating, first, as shown in FIG. 5A, a waveguide having a waveguide structure similar to that of a conventional arrayed waveguide type diffraction grating is formed on the substrate 11. The region 10 is formed and formed into chips (separated into one arrayed waveguide type diffraction grating), and then a resist mask 40 is formed on the surface side of the waveguide forming region 10 as shown in FIG. To do. The formation of the resist mask 40 is performed by photolithography. First, a resist is applied to the surface of the waveguide forming region 10, the resist is exposed in accordance with a predetermined setting pattern, and then developed. To do so.
[0021]
Then, the metal film 1 is formed on the surface side of the waveguide forming region 10 through the resist mask 40 by EB (electron beam) vapor deposition, sputtering or the like as shown in FIG. The metal film 1 is a base for the solder 30, and is formed in a shape as shown in FIG. Thereafter, lift-off is performed, and the resist mask 40 is peeled off with a solvent and removed. As shown in FIGS. 6A and 6B, a cut surface 18 is formed in the region indicated by A between the metal films 1. The primary cutting of the arrayed waveguide grating is performed.
[0022]
Next, after Sn / Pb (60% / 40%) solder 30 (not shown in FIG. 6) is disposed on the metal film 1, as shown in FIG. By melting the solder 30 in a state where the 17 is disposed, the slide moving member 17 is fixed to the waveguide forming region 10 by soldering (rod fixing step). The solder 30 is melted by melting the chip of the solder 30 with a hot plate. The metal film 1 is provided to increase the adhesion between the surface (glass surface) of the waveguide forming region 10 and the solder 30, and the solder 30 is provided to adhere the metal film 1 and the slide moving member 17.
[0023]
Thereafter, as shown in FIG. 5E, the arrayed waveguide diffraction grating is secondarily cut by a dicing saw or the like to form a cut surface 8. The cut surface 8 is formed so as to intersect the light path passing through the first slab waveguide 13 as shown in FIG. 6 (d), whereby an arrayed waveguide grating as shown in FIG. Is formed. In addition, 50 of FIG.6 (c) has shown the groove part.
[0024]
In the proposed arrayed waveguide grating, as shown in FIG. 4, the first waveguide forming region 10a is moved in the directions of arrows C and D along the cut surface 8 by the slide moving member 17, The temperature dependence of each light transmission center wavelength of the arrayed waveguide grating can be compensated.
[0025]
In addition, by providing the slide moving member 17 across the first waveguide forming region 10a and the second waveguide forming region 10b, the waveguide forming region 10a can be used when the waveguide forming region 10a slides. It can be prevented from being displaced upward (Z-axis direction perpendicular to the XY plane) with respect to the base, the apparatus configuration can be simplified, the cost of the apparatus can be reduced, and the manufacturing yield can be improved.
[0026]
Since the proposed arrayed waveguide grating can achieve the above-described excellent effects, the present inventor corrects the light transmission center wavelength shift by the configuration of the arrayed waveguide grating and the annealing treatment. When combined with this method, we thought that it would be possible to obtain an excellent arrayed waveguide type diffraction grating in which each light transmission center wavelength of the arrayed waveguide type diffraction grating could always be almost the set wavelength regardless of the temperature. .
[0027]
However, if the proposed arrayed waveguide type diffraction grating shown in FIG. 4 is annealed, the metal film 1 is melted or oxidized due to the high temperature treatment. In the production of the waveguide type diffraction grating, it is necessary to perform an annealing process before the metal film 1 is produced. Conventionally, from the formation of the circuit configuration shown in FIG. Each process is carried out in series by the arrayed waveguide type diffraction grating manufacturing apparatus until the secondary cutting of the arrayed waveguide diffraction grating shown in (e) of FIG. Therefore, it is difficult to interrupt the annealing process during this series of processes.
[0028]
And, as described above, the conventional metal film fabrication process for the arrayed waveguide type diffraction grating involves forming a resist mask by photolithography, vapor deposition or sputtering of a metal film, and lift-off of the resist mask. Since the structure of the apparatus to be performed is complicated, it is assumed that the circuit configuration of the arrayed waveguide type diffraction grating shown in FIG. Then, if the metal film 1 is manufactured in FIG. 5B and a new apparatus capable of performing the steps up to (e) in FIG. 5 is to be manufactured, the cost of the newly manufactured apparatus becomes very high. .
[0029]
Therefore, in order to combine the configuration of the proposed arrayed waveguide grating shown in FIG. 4 and the method of correcting the light transmission center wavelength shift by the annealing process, the present inventor has achieved a low apparatus cost and a simple We propose a metal film production method that can produce a metal film by operation, and by combining it with an annealing treatment, an array waveguide that can always set each light transmission center wavelength of the arrayed waveguide grating to the set wavelength regardless of the temperature. We thought it important to propose a waveguide type diffraction grating.
[0030]
The present invention has been made in order to solve the above-described problems, and an object of the present invention is to provide a planar optical waveguide circuit of an arrayed waveguide type diffraction grating that can always set a light transmission center wavelength to a set wavelength regardless of temperature. A method for producing a metal film on a planar optical waveguide circuit and a method for producing the same Planar optical waveguide with metal film The road It is to provide.
[0031]
[Means for Solving the Problems]
In order to achieve the above object, the present invention has the following configuration as means for solving the problems. That is, the first invention relates to a method for manufacturing a planar optical waveguide circuit, one or more optical input waveguides arranged in parallel, a first slab waveguide connected to the output side of the optical input waveguide, A plurality of arrayed waveguides of different lengths connected to the output side of the first slab waveguide and propagating light derived from the first slab waveguide, and the plurality of array waveguides A second slab waveguide connected to the output side of the waveguide, and a plurality of juxtaposed optical output waveguides connected to the output side of the second slab waveguide; Have The step of forming the waveguide of the arrayed waveguide grating on the substrate, and after the step A step of annealing the substrate on which the waveguide of the arrayed waveguide type diffraction grating is formed, and then the side of the slab waveguide to be cut of at least one of the first slab waveguide and the second slab waveguide The metal films are respectively formed on the substrate surface portion where the waveguide of the arrayed waveguide type diffraction grating is not formed at intervals in the direction crossing the traveling direction of the light passing through the slab waveguide to be cut. Between the process and the metal film formed through the gap From the substrate end face side to the depth of the region where the slab waveguide to be cut is formed in the traveling direction of light in the slab waveguide to be cut on the substrate surface portion where the waveguide of the arrayed waveguide grating is not formed A step of performing the cut primary cut, and a slide member having a thermal expansion coefficient larger than that of the substrate and the waveguide of the arrayed waveguide type diffraction grating is arranged so as to straddle the cut line of the primary cut, and both ends of the slide member Made in the position corresponding to the side Said The step of connecting and fixing to the metal film via solder, and after the step, from the end surface side of the substrate different from the cut end surface of the primary cutting, in the direction crossing the light traveling direction in the slab waveguide to be cut A process of cutting and separating the slab waveguide to be cut by performing a secondary cutting that reaches the cutting line of the primary cutting. The step of producing the metal film includes preparing a mask having holes having substantially the same shape as the shape of the metal film to be produced on the substrate surface, and making the mask corresponding to the production site of the metal film. Place the metal film on the metal film production site by vapor deposition To do The sliding member expands and contracts according to the temperature change, so that the separated slab waveguide on one side of the slab waveguide to be cut is separated from the separated slab waveguide on the other side by the secondary. The temperature dependence of each light transmission center wavelength of the arrayed waveguide grating is compensated by sliding along the cutting plane. This is a means to solve the problem.
[0033]
In addition 2 The present invention relates to a planar optical waveguide circuit, one or more optical input waveguides arranged in parallel, a first slab waveguide connected to an output side of the optical input waveguide, and the first slab waveguide. A plurality of arrayed waveguides of different lengths connected to the output side of the waveguide and propagating light derived from the first slab waveguide, and connected to the output side of the plurality of arrayed waveguides A second slab waveguide formed, and a plurality of optical output waveguides arranged in parallel connected to the emission side of the second slab waveguide Have A waveguide of an arrayed waveguide type diffraction grating is formed on a substrate, and at least one of the first slab waveguide and the second slab waveguide on the slab waveguide side to be cut, the arrayed waveguide type diffraction grating A cutting line for primary cutting that is cut from the substrate end face side to the depth of the formation region of the slab waveguide to be cut in the traveling direction of light in the slab waveguide to be cut from the substrate surface portion where the waveguide is not formed And a metal film produced through a gap on both sides of the line across the cutting line of the primary cutting on the substrate surface, The metal film is formed after the substrate on which the waveguide of the arrayed waveguide grating is formed is annealed and before the cutting line for the primary cutting is formed. The metal film is prepared by preparing a mask having holes having substantially the same shape as the shape of the metal film to be formed on the substrate surface, and arranging the mask in such a manner that the holes of the mask correspond to the metal film manufacturing site, It is produced by a process of producing a metal film at the production site of the metal film by vapor deposition, A slide member having a thermal expansion coefficient larger than that of the substrate and the waveguide of the arrayed waveguide type diffraction grating is arranged in such a manner as to straddle the cutting line for primary cutting, and both ends of the sliding member are on both sides of the cutting line for primary cutting. Connected and fixed to the corresponding metal film being manufactured via solder, and intersects the traveling direction of light in the slab waveguide to be cut from the end face side of the substrate different from the cut end face of the primary cutting. The slab waveguide to be cut is cut and separated by secondary cutting that reaches the cutting line of the primary cutting in the direction, and the slab waveguide to be cut is cut and separated by expanding and contracting according to the temperature change. The separated slab waveguide on one side slides along the cut surface of the secondary cut with respect to the separated slab waveguide on the other side, and the arrayed waveguide type circuit Temperature dependence of the light transmission center wavelength of the grating is a means for solving the problems with the arrangement to be compensated.
[0037]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the description of the present embodiment, the same reference numerals are assigned to the same name portions as in the conventional example, and the duplicate description thereof is omitted. FIG. 1 shows a fabrication process of an arrayed waveguide type diffraction grating to which an embodiment of a method for fabricating a metal film on a planar optical waveguide circuit according to the present invention is applied. FIG. 2 also shows the arrayed waveguide grating produced in the production process of FIG. Planar optical waveguide circuit with waveguide The configuration is shown in plan view.
[0038]
The arrayed waveguide grating shown in FIG. 2 is configured in substantially the same manner as the proposed arrayed waveguide grating shown in FIG. 4, but the arrayed waveguide grating shown in FIG. The waveguide forming region 10 is annealed to correct the center wavelength of the light transmission wavelength to the set wavelength, and the light transmission center wavelength from the set wavelength (for example, the grid wavelength) due to the manufacturing error of the arrayed waveguide grating The deviation is almost zero.
[0039]
Hereinafter, based on FIGS. 1, 2, and 6, an array waveguide type diffraction grating manufacturing process to which the metal film manufacturing method of this embodiment is applied will be described. First, as shown in FIG. 1A, a waveguide forming region 10 having a waveguide configuration similar to that of a conventional arrayed waveguide type diffraction grating (see FIG. 7) is formed on a substrate 11 to form a chip. . Next, in the step shown in FIG. 1B, the light transmission center wavelength of the arrayed waveguide grating is measured by a known measuring method.
[0040]
Next, in order to correct the deviation of the light transmission center wavelength from the set wavelength based on the measurement result, as shown in FIG. .
[0041]
Thereafter, the arrayed waveguide grating chip is returned to room temperature, for example, and a mask (having been formed in advance) having a hole 2 having substantially the same shape as the shape of the metal film to be produced, as shown in FIG. (Mask jig) The hole 3 of the mask 3 is made to correspond to the metal film production site, the mask 3 is arranged, and the metal film 1 is produced by vapor deposition or the like at the metal film production site. After the metal film 1 is produced, the mask 3 is removed.
[0042]
As shown in the figure, the mask 3 includes an upper plate portion 4 that covers the surface side of the waveguide formation region 10 of the arrayed waveguide type diffraction grating, and a side plate portion 5 that covers the side surface of the arrayed waveguide type diffraction grating. When the chip has a shape having the above, the chip can be placed in the mask (mask jig) 3 to easily position the metal film production site. Furthermore, by making the mask 3 the same shape as the wafer for the substrate, it can be attached as it is to a conventionally used apparatus, and it is not necessary to newly prepare a jig or the like for attaching the mask 3, and metal The film 1 is easy to produce. Also, the removal of the chip of the arrayed waveguide grating can be performed simply by removing the mask 3 from the apparatus and taking out the chip from the mask 3 (or moving the position of the chip of the arrayed waveguide grating to another). Because it is good, it is very easy to do.
[0043]
In this embodiment, the mask 3 is formed of a Teflon plate. By using the Teflon plate in this way, the mask 3 is removed after the metal film 1 is manufactured, and the mask 3 is washed. Can be reused.
[0044]
Next, primary cutting of the waveguide forming region 10 and the substrate 11 is performed in FIG. In this primary cutting, a cut surface 18 is formed in a region indicated by A between the metal films 1 as shown in FIGS. 6 (a) and 6 (b). Thereafter, in the steps (f) and (g) of FIG. 1, the slide moving member 17 is fixed (rod fixed) and subjected to secondary cutting similarly to (d) and (e) of FIG.
[0045]
Then, as shown in FIG. 2, the optical fiber 23 fixed to the optical fiber array 21 is connected (bonded) to the optical input waveguide 12 side, and the optical output waveguide is obtained. 16 On the side, an optical fiber tape 24 fixed to the optical fiber array 22 is connected (bonded) to complete the arrayed waveguide grating shown in FIG.
[0046]
In FIG. 2, the first waveguide formation region 10 a and the second waveguide formation region 10 b are arranged with an interval therebetween. For example, the interval between the A portions shown in FIG. ) Is about 100 μm, and the interval between the B portions (interval between the cut surfaces 8) shown in the figure is about 25 μm.
[0047]
The metal film 1 has Cr / Cu in order of 0.1 / 0.5 (unit: μm) and Cr / Ti / Pt / Au in order of 0.1 / 0.1 / 0, respectively. 1 / 0.6 (unit is μm) and Ti / Pt / Au are laminated in order of 0.1 / 0.1 / 0.6 (unit is μm). The formed was applied.
[0048]
According to the present embodiment example, unlike the conventional metal film manufacturing method, there is no need for complicated operations such as formation of a resist mask by photolithography and lift-off of the resist mask, and the hole has substantially the same shape as the metal film to be manufactured. 3 is prepared, the mask 3 is arranged with the holes of the mask 3 corresponding to the metal film production site, and the metal film 1 is produced at the metal film production site. After fabrication, the mask 3 is simply removed from the apparatus and the chip is simply taken out of the mask 3, so that the apparatus configuration for performing these operations is simplified and the apparatus cost can be reduced.
[0049]
Therefore, the metal film 1 is manufactured after the annealing process, and after the metal film is manufactured, the slide moving member 17 is moved through the metal film 1 to the first waveguide forming region 10a and the second waveguide forming region. 10b, an array waveguide type diffraction grating that can always set each light transmission center wavelength of the arrayed waveguide type diffraction grating to almost the set wavelength regardless of temperature is very simple and low. Can be manufactured at a low cost.
[0050]
In addition, this invention is not limited to the said embodiment example, Various aspects can be taken. For example, in the above embodiment, the mask 3 is formed of a Teflon plate, but the material for forming the mask 3 is not particularly limited, and is set as appropriate. However, if the mask 3 is formed of a Teflon plate, the processing of the hole 2 and the cleaning of the mask 3 after the metal film 1 is manufactured can be easily performed.
[0051]
Further, in the manufacturing process of the arrayed waveguide type diffraction grating shown in FIG. It may be formed. In this case, after the steps shown in FIGS. 1A and 1B, as shown in FIGS. 3A and 3B, as shown in FIGS. After annealing the waveguide type diffraction grating, the metal film 1 is produced, and then, as shown in FIG. 3C, solder 30 is formed using the mask 3.
[0052]
Thereafter, the steps (d), (e), and (f) in FIG. 3 are performed in the same manner as (e), (f), and (g) in FIG. When the optical fiber array 23 is connected, the arrayed waveguide type diffraction grating shown in FIG. 2 is completed.
[0053]
Further, the type, film shape, size, and the like of the metal film 1 formed by the method for producing a metal film on the planar optical waveguide circuit of the present invention are not particularly limited, and are set as appropriate. Various metal films 1 can be manufactured using a mask 3 having holes having substantially the same shape as the shape of the metal film to be formed. Further, the production position of the metal film 1 is not limited to the front surface side of the planar optical waveguide circuit, and may be formed on at least one of the front surface side and the back surface side of the planar optical waveguide circuit.
[0054]
Further, in FIG. 2, the metal film 1 is formed on the waveguide forming region 10 side on the surface side of the arrayed waveguide type diffraction grating, but metal is formed on the back side of the arrayed waveguide type diffraction grating (the back side of the substrate 11). The film 1 may be formed.
[0056]
【The invention's effect】
Planar optical waveguide circuit of the present invention In the manufacturing method The metal film manufacturing method does not require complicated operations such as resist mask formation by photolithography and resist mask lift-off unlike the conventional metal film manufacturing method, and a hole having substantially the same shape as the metal film shape to be manufactured is formed. Since the method can be manufactured by a simple operation using a mask having the mask, the configuration of the apparatus for performing this operation is simplified and the apparatus cost can be reduced.
[0057]
Then, this metal film production is performed after the annealing treatment, and after the metal film production, a slide moving member capable of correcting the temperature dependence of the light transmission center wavelength of the arrayed waveguide type diffraction grating through the metal film. Both sides of the board surface If fixed to, the arrayed waveguide type diffraction grating can always set the light transmission center wavelength of the arrayed waveguide type diffraction grating to almost the set wavelength regardless of the temperature. Planar optical waveguide circuit with multiple waveguides Can be easily provided at a low production cost and with a high yield.
[Brief description of the drawings]
FIG. 1 shows a planar optical waveguide circuit according to the present invention. In the manufacturing method It is explanatory drawing which shows the example of a manufacturing process of the arrayed waveguide type diffraction grating to which one embodiment of the manufacturing method of the metal film is applied.
2 is a main part configuration diagram showing an arrayed waveguide type diffraction grating manufactured by the process shown in FIG. 1 in a plan view. FIG.
3 is an explanatory view showing another manufacturing process example of the arrayed waveguide type diffraction grating of FIG. 2; FIG.
FIG. 4 is an explanatory diagram showing a configuration example of an arrayed waveguide grating capable of reducing the temperature dependence of the light transmission center wavelength.
FIG. 5 is an explanatory view showing an example of a conventional manufacturing process of the arrayed waveguide grating shown in FIG.
FIG. 6 is an explanatory diagram of primary cutting (a) and secondary cutting (b) of an arrayed waveguide grating.
FIG. 7 is an explanatory view showing a configuration example of a conventional arrayed waveguide type diffraction grating together with its operation.
[Explanation of symbols]
1 Metal film
2 holes
3 Mask
4 Upper plate
5 Side plate
8 Cut surface
10 Waveguide formation region
11 Substrate
12 Optical input waveguide
13 First slab waveguide
14 Arrayed waveguide
15 Second slab waveguide
16 Optical output waveguide
17 Slide moving member

Claims (2)

１本以上の並設された光入力導波路と、該光入力導波路の出射側に接続された第１のスラブ導波路と、該第１のスラブ導波路の出射側に接続されて該第１のスラブ導波路から導出された光を伝搬する互いに異なる長さの複数の並設されたアレイ導波路と、該複数のアレイ導波路の出射側に接続された第２のスラブ導波路と、該第２のスラブ導波路の出射側に接続された複数の並設された光出力導波路とを有するアレイ導波路型回折格子の導波路を基板上に形成する工程と、当該工程の後にアレイ導波路型回折格子の導波路が形成された基板をアニール処理する工程と、然る後に、前記第１のスラブ導波路と第２のスラブ導波路の少なくとも一方の切断対象のスラブ導波路側において、前記アレイ導波路型回折格子の導波路が形成されていない基板面部分に前記切断対象のスラブ導波路を通る光の進行方向とは交差する方向に間隔を介してそれぞれ金属膜を作製する工程と、前記間隔を介して形成された金属膜間の前記アレイ導波路型回折格子の導波路が形成されていない基板面部分に基板端面側から前記切断対象のスラブ導波路内の光の進行方向に該切断対象のスラブ導波路の形成領域の深さまで切り込んだ一次切断を行う工程と、前記基板およびアレイ導波路型回折格子の導波路よりも熱膨張係数の大きいスライド部材を前記一次切断の切断ラインに跨る態様で配置し、かつ該スライド部材の両端側に対応する位置に作製された前記金属膜に半田を介して接続固定する工程と、当該工程後に前記一次切断の切り込み端面とは異なる基板の端面側から前記切断対象のスラブ導波路内の光の進行方向とは交差する方向に前記一次切断の切断ラインに達する二次切断を行って切断対象のスラブ導波路を切断分離する工程とを有し、前記金属膜を作製する工程は、基板面に作製する金属膜形状とほぼ同一形状の穴を有するマスクを用意し、該マスクの穴を前記金属膜の作製部位に対応させて前記マスクを配置し、蒸着により該金属膜の作製部位に金属膜を作製することと成し、前記スライド部材が温度変化に応じて伸縮することによって、切断対象のスラブ導波路の切断分離された一方側の分離スラブ導波路が他方側の分離スラブ導波路に対して前記二次切断の切断面に沿ってスライド移動して前記アレイ導波路型回折格子の各光透過中心波長の温度依存性が補償される平面光導波回路の製造方法。One or more optical input waveguides arranged in parallel, a first slab waveguide connected to the output side of the optical input waveguide, and a first slab waveguide connected to the output side of the first slab waveguide A plurality of arrayed waveguides having different lengths propagating light derived from one slab waveguide, and a second slab waveguide connected to the output side of the plurality of arrayed waveguides; Forming a waveguide of an arrayed waveguide grating having a plurality of light output waveguides arranged in parallel connected to the output side of the second slab waveguide on a substrate, and an array after the step Annealing the substrate on which the waveguide of the waveguide type diffraction grating is formed, and then, on the slab waveguide side to be cut of at least one of the first slab waveguide and the second slab waveguide The waveguide of the arrayed waveguide grating is not formed A step of the traveling direction of light to make each metal film via a gap in a direction crossing through the cutting target of the slab waveguide plate face portion, said array of inter-metal film formed over the interval Cut into the depth of the region where the slab waveguide to be cut is formed in the traveling direction of light in the slab waveguide to be cut from the substrate end surface side to the substrate surface portion where the waveguide of the waveguide type diffraction grating is not formed A step of performing primary cutting, and a slide member having a thermal expansion coefficient larger than that of the substrate and the waveguide of the arrayed waveguide grating is disposed in a manner straddling the cutting line of the primary cutting, and on both ends of the slide member corresponding a step of solder through the connecting and fixing to said metal film produced at a position, in the slab waveguide of the cutting object from an end face side of the substrate different from the cut end surface of the primary cut after the step It possesses a step of cutting and separating the slab waveguide to be cut by performing secondary cutting reaching the cutting line of the primary cutting in a direction crossing the traveling direction of light, making the metal film process, the substrate Prepare a mask having holes having substantially the same shape as the shape of the metal film to be formed on the surface, place the mask so that the holes in the mask correspond to the metal film production site, and deposit the mask on the metal film production site. Forming a metal film, and the sliding member expands and contracts in response to a temperature change, so that one separated slab waveguide of the slab waveguide to be cut is separated from the other separated slab waveguide. method of manufacturing a planar optical waveguide circuit temperature dependency Ru is compensated for the light transmission central wavelengths of the arrayed waveguide grating to slide along the cut surface of the secondary cutting against. １本以上の並設された光入力導波路と、該光入力導波路の出射側に接続された第１のスラブ導波路と、該第１のスラブ導波路の出射側に接続されて該第１のスラブ導波路から導出された光を伝搬する互いに異なる長さの複数の並設されたアレイ導波路と、該複数のアレイ導波路の出射側に接続された第２のスラブ導波路と、該第２のスラブ導波路の出射側に接続された複数の並設された光出力導波路とを有するアレイ導波路型回折格子の導波路が基板上に形成され、前記第１のスラブ導波路と第２のスラブ導波路の少なくとも一方の切断対象のスラブ導波路側において、前記アレイ導波路型回折格子の導波路が形成されていない基板面部分に基板端面側から前記切断対象のスラブ導波路内の光の進行方向に該切断対象のスラブ導波路の形成領域の深さまで切り込んだ一次切断の切断ラインと、基板面に前記一次切断の切断ラインを挟んで当該ラインの両側に間隔を介して作製された金属膜とを備え、当該金属膜は、前記アレイ導波路型回折格子の導波路が形成された基板がアニール処理された後であって、かつ、前記一次切断の切断ラインが形成される前に作製されるものであり、当該金属膜の作製は、基板面に作製する金属膜形状とほぼ同一形状の穴を有するマスクを用意し、該マスクの穴を前記金属膜の作製部位に対応させて前記マスクを配置し、蒸着により該金属膜の作製部位に金属膜を作製する工程によって作製されているものであり、前記基板およびアレイ導波路型回折格子の導波路よりも熱膨張係数の大きいスライド部材が前記一次切断の切断ラインに跨る態様で配置されて該スライド部材の両端側が前記一次切断の切断ラインの両側に作製されている対応する金属膜に半田を介して接続固定されており、前記一次切断の切り込み端面とは異なる基板の端面側から前記切断対象のスラブ導波路内の光の進行方向とは交差する方向に前記一次切断の切断ラインに達する二次切断によって切断対象のスラブ導波路が切断分離されており、前記スライド部材が温度変化に応じて伸縮することによって、切断対象のスラブ導波路の切断分離された一方側の分離スラブ導波路が他方側の分離スラブ導波路に対して前記二次切断の切断面に沿ってスライド移動して前記アレイ導波路型回折格子の各光透過中心波長の温度依存性が補償されることを特徴とする平面光導波回路。One or more optical input waveguides arranged in parallel, a first slab waveguide connected to the output side of the optical input waveguide, and a first slab waveguide connected to the output side of the first slab waveguide A plurality of arrayed waveguides having different lengths propagating light derived from one slab waveguide, and a second slab waveguide connected to the output side of the plurality of arrayed waveguides; An arrayed waveguide grating having a plurality of light output waveguides arranged in parallel connected to the output side of the second slab waveguide is formed on a substrate, and the first slab waveguide is formed. At least one of the slab waveguides to be cut and the second slab waveguide, the slab waveguide to be cut from the substrate end surface side on the substrate surface portion where the waveguide of the arrayed waveguide grating is not formed The formation area of the slab waveguide to be cut in the light traveling direction Of the cutting line of the primary cutting that cut to a depth, and a metal film which is manufactured through a gap on both sides of the line across the cutting line of the primary cut in the substrate surface, the metal film, the array guide After the substrate on which the waveguide of the waveguide type diffraction grating is formed is annealed and before the cutting line for the primary cutting is formed, the production of the metal film is as follows: A mask having holes having substantially the same shape as the shape of the metal film to be produced on the substrate surface is prepared, the mask is arranged with the holes of the mask corresponding to the production site of the metal film, and the production site of the metal film by vapor deposition to be those that are produced by the steps of producing a metal film, arranged in a manner that a large sliding member in thermal expansion coefficient than the waveguide of the substrate and the array waveguide diffraction grating spans cutting line of the primary cutting The both ends of the slide member are connected and fixed to corresponding metal films formed on both sides of the cutting line for the primary cutting via solder, and from the end surface side of the substrate different from the cutting end surface for the primary cutting. The slab waveguide to be cut is separated by secondary cutting that reaches the cutting line of the primary cutting in a direction crossing the traveling direction of light in the slab waveguide to be cut, and the temperature of the slide member changes Accordingly, the separated slab waveguide on one side of the slab waveguide to be cut is slid along the cut surface of the secondary cut with respect to the separated slab waveguide on the other side. A planar optical waveguide circuit, wherein the temperature dependence of each light transmission center wavelength of the arrayed waveguide grating is compensated.
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KR20020070459A (en) 2000-10-13 2002-09-09 후루까와덴끼고오교 가부시끼가이샤 Array waveguide type diffraction grating and light transmitting center wavelength correcting method
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US20030118308A1 (en) * 2001-12-21 2003-06-26 Terry Bricheno Thermal compensation and alignment for optical devices
US6842572B2 (en) * 2002-05-15 2005-01-11 Intel Corporation Techniques to guide optical signals
JP2007065562A (en) * 2005-09-02 2007-03-15 Furukawa Electric Co Ltd:The Array waveguide diffraction grating
KR100841223B1 (en) * 2006-02-28 2008-06-26 (주)포인테크 Temperature Insensitive Arrayed Waveguide Grating Multiplexer for Optical Property Compensation and The Manufacturing Method Thereof
KR100796982B1 (en) * 2006-11-21 2008-01-22 삼성전기주식회사 Printed circuit board and method of manufacturing thereof
JP5100175B2 (en) * 2007-03-28 2012-12-19 古河電気工業株式会社 Arrayed waveguide grating type multiplexer / demultiplexer
US20110085761A1 (en) * 2009-05-26 2011-04-14 Furukawa Electric Co., Ltd. Arrayed waveguide grating and method of manufacturing arrayed waveguide grating
CN102081192B (en) * 2010-12-29 2012-05-09 武汉光迅科技股份有限公司 Joint-cutting method used for arrayed waveguide grating (AWG) chip
CN102621638A (en) * 2011-01-31 2012-08-01 广东海粤集团有限公司 Planar waveguide array grating wave division multiplexer based on thermal insensitive
US8676009B2 (en) * 2011-03-15 2014-03-18 Alcatel Lucent Monolithic photonic integrated circuit
CN102354028A (en) * 2011-11-10 2012-02-15 武汉光迅科技股份有限公司 Athermal arrayed waveguide grating wavelength-division multiplexer (WDM) and manufacturing method thereof

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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JPH10189579A (en) * 1996-12-27 1998-07-21 Toshiba Corp Manufacture of semiconductor device
US7202497B2 (en) * 1997-11-27 2007-04-10 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
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US6531713B1 (en) * 1999-03-19 2003-03-11 Semiconductor Energy Laboratory Co., Ltd. Electro-optical device and manufacturing method thereof
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