JP4348351B2 - Pattern forming body - Google Patents

Description

  The present invention relates to a pattern forming body that can be used for various applications such as a color filter and a microlens.

  Conventionally, various types of pattern forming bodies in which various patterns such as designs, images, characters, circuits, etc. have been formed on a substrate have been manufactured. Accordingly, formation of a high-definition pattern is required for such a pattern forming body.

  As such a high-definition pattern forming body, a pattern forming body using a photocatalyst by the present inventors and a manufacturing method thereof have been proposed (Japanese Patent Laid-Open No. 11-344804). According to this, since it is possible to obtain a pattern formed body on which a pattern having different wettability is formed by pattern exposure, the pattern formed body can be obtained easily and accurately. Since various functional elements can be manufactured by utilizing the difference in wettability of the pattern forming body having patterns with different wettability, functional elements such as color filters and microlenses can be efficiently and highly enhanced. The effect is that it can be obtained with quality.

  However, the above-described pattern forming body changes the wettability of the portion irradiated with energy by using the action of the photocatalyst to form patterns with different wettability. It takes a predetermined time to cause the difference. If this time can be shortened, further efficiency can be achieved.

  Further, in order to obtain a functional element with high accuracy, it is preferable to form a large wettability difference on the pattern forming body. However, such a large wettability can be obtained within a predetermined time allowed for efficiency. In order to form the difference, it is necessary to improve the rate of change of the critical surface tension due to exposure on the surface of the pattern forming body.

  This invention is made | formed in view of the said situation, and it aims at providing the pattern formation body which formed efficiently the pattern which consists of a site | part from which the wettability differs by irradiation of energy.

In order to achieve the above object, the present invention provides a substrate according to claim 1 and a layer provided on the substrate, the wettability of which is changed so that the contact angle with the liquid is lowered by the action of a photocatalyst accompanying energy irradiation. And at least a photocatalyst, a metal element as a second component that improves the rate of decrease in the contact angle with the liquid when irradiated with energy, and a photocatalyst containing layer containing a binder, the photocatalyst containing A pattern forming body having a pattern composed of a part having different wettability on the surface of the layer, and a functional part arranged on a part corresponding to the pattern having a different wettability on the pattern forming body; A functional element is provided.

  Thus, in the invention described in claim 1, the photocatalyst-containing layer, which is a layer in which wettability changes, contains the metal element as the second component that improves the rate of decrease in the contact angle with the liquid. Therefore, the rate of change of wettability on the photocatalyst-containing layer when irradiated with energy is fast, so when forming a pattern having a predetermined wettability difference, it can be formed with short-time irradiation. In addition, the manufacturing efficiency of the pattern formed body is improved, and a cost-effective pattern formed body can be provided. In addition, it is possible to form a pattern with different wettability with a greater difference in wettability within an irradiation time that is efficiently allowed, and thus a function obtained by attaching a functional part on this pattern forming body. The effect is that the conductive element can be manufactured with high accuracy.

In the invention of the first aspect, as described in the second aspect , the binder is Y _n SiX _(4-n) (where Y is an alkyl group, a fluoroalkyl group, a vinyl group, an amino group). 1 represents a phenyl group or an epoxy group, X represents an alkoxyl group or a halogen, and n represents an integer of 0 to 3. An organopolysiloxane that is a decomposition condensate is preferable. It is preferable that the binder contained in the photocatalyst-containing layer should have a binding energy that is not decomposed by the action of the photocatalyst, and that the binder itself can change the wettability of the photocatalyst-containing layer by the action of the photocatalyst. From the above, the above organopolysiloxane is preferred.

In the pattern forming body according to claim 1 or 2, as described in claim 3 , the photocatalyst-containing layer is a liquid having a surface tension of 40 mN / m in a portion not irradiated with energy. It is preferable that the photocatalyst-containing layer has a contact angle larger than the contact angle with a liquid having a surface tension of 40 mN / m at a portion irradiated with energy by at least 1 degree. If the wettability is changed so that the contact angle with the liquid having a surface tension of 40 mN / m is different by 1 degree or more by irradiating energy on the photocatalyst-containing layer, the pattern having different wettability is followed. This is because the functional part can be formed.

Further, the present invention provides a substrate, a photocatalyst-containing layer provided on the substrate, and a photocatalyst-containing layer provided on the photocatalyst-containing layer when irradiated with energy. A wettability variable layer whose wettability changes so that a contact angle with the liquid is lowered by the action, the photocatalyst-containing layer is at least a photocatalyst, and the liquid of the wettability variable layer when energy is irradiated A pattern formed body having a metal element as a second component for improving the rate of decrease in the contact angle, and further having a pattern composed of different wettability surfaces on the wettability variable layer surface, and the pattern formed body There is provided a functional element having a functional portion arranged on a portion corresponding to a pattern having different wettability .

  Thus, in the present invention, the photocatalyst-containing layer contains the metal element as the second component that improves the rate of decrease in the contact angle with the liquid in the wettability variable layer. In this case, the change rate of wettability in the wettability variable layer can be improved. Therefore, as in the case of the invention described in claim 1, when a pattern having a predetermined wettability difference is formed, the pattern can be formed by a short irradiation, and the manufacturing efficiency of the pattern forming body is improved. In addition, a cost-effective pattern forming body can be provided. In addition, it is possible to form a pattern with different wettability with a greater difference in wettability within an irradiation time that is efficiently allowed, and thus a function obtained by attaching a functional part on this pattern forming body. The effect is that the conductive element can be manufactured with high accuracy.

  Furthermore, in this case, since the functional part is formed on the wettability variable layer, the functional part and the photocatalyst-containing layer are not in direct contact. Therefore, since there is little possibility that the functional part deteriorates due to the action of the photocatalyst in the photocatalyst-containing layer, a functional element that is less likely to cause problems can be obtained.

In the invention described in claim 4 , as described in claim 5 , the wettability variable layer is made of Y _n SiX _(4-n) (where Y is an alkyl group, a fluoroalkyl group, a vinyl Group, amino group, phenyl group or epoxy group, X represents an alkoxyl group or halogen, and n is an integer from 0 to 3. An organopolysiloxane that is a product or a cohydrolyzed condensate is preferred for the same reason as in the invention described in claim 2 above.

In the invention according to claim 4 or claim 5 , as described in claim 6 , the wettability variable layer has a surface tension of 40 mN / m in a portion not irradiated with energy. The wettability variable layer having a contact angle that is at least 1 degree larger than a contact angle with a liquid having a surface tension of 40 mN / m in a portion irradiated with energy. It is preferable for the same reason as in the case.

Furthermore, as described in claim 7, the present invention provides a substrate, a photocatalyst-containing layer provided on the substrate, and an action of the photocatalyst-containing layer provided on the photocatalyst-containing layer when irradiated with energy. The photocatalyst-containing layer has at least a photocatalyst, and a metal element as a second component that improves the decomposition / removal rate of the decomposition / removal layer when irradiated with energy, Furthermore, the decomposition removal layer has a pattern forming body formed in a pattern on the photocatalyst-containing layer, and a functional part arranged on a portion corresponding to a pattern having different wettability on the pattern forming body. A functional element is provided.

  Thus, in the present invention, the photocatalyst-containing layer contains the metal element as the second component for improving the decomposition / removal speed of the decomposition / removal layer. The decomposition and removal rate can be improved. Therefore, it is possible to form a pattern from which the decomposition and removal layer has been removed by short-time energy irradiation, thereby improving the manufacturing efficiency of the pattern forming body and providing a cost-effective pattern forming body. .

In the case of the invention described in claim 7 , as described in claim 8 , the decomposition removal layer is preferably a hydrocarbon-based, fluorine-based or silicone-based nonionic surfactant.

In the invention according to any one of claims 1 to 8 , as described in claim 9 , the metal element as the second component is vanadium (V), iron (Fe ), Cobalt (Co), nickel (Ni), copper (Cu), zinc (Zn), ruthenium (Ru), rhodium (Rh), palladium (Pb), silver (Ag), osmium (Os), iridium (Ir) ), Platinum (Pt), and gold (Au), preferably at least one metal element selected from the group consisting of gold (Au). In particular, as described in claim 10 , the metal element as the second component is Fe (iron) is particularly preferable.

In the pattern formation according to any one of claims of claims 1 to 10, as described in claim 11, the photocatalyst is titanium oxide (TiO _2), zinc oxide (ZnO ), Tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), bismuth oxide (Bi ₂ O ₃ ), and iron oxide (Fe ₂ O ₃ ) is preferably a species or more substances, as described inter alia in claim 12, it is particularly preferable that the photocatalyst is titanium oxide (TiO _2). This is because titanium dioxide has a high band gap energy and is effective as a photocatalyst, and is chemically stable, non-toxic and easily available.

In the invention described in any one of claims 1 to 12 , as described in claim 13 , the metal as the second component for the photocatalyst in the photocatalyst containing layer. The molar ratio of the elements is preferably in the range of 0.00001 to 0.5 when the photocatalyst is 1. If the amount is less than the above range, it is not preferable because the effect of improving the wettability change rate or the decomposition removal rate of the decomposition removal layer does not appear remarkably. Is not preferable because it does not significantly affect the effect of improving the decomposition / removal rate of the decomposition / removal layer, and may adversely affect the layer to be added, such as a change in wettability.

The present invention is characterized in that a functional part is arranged on a portion corresponding to a pattern having different wettability on the pattern forming body according to any one of claims 1 to 13. providing sexual element, in particular as claimed in claim 14, when the functional portion of the functional element according to claim 13, wherein is a color filter, which is a pixel portion, also claim 15 As described above, a case where the functional part of the functional element according to claim 13 is a microlens characterized by being a lens can be a preferable utilization mode.

  In the present invention, the photocatalyst-containing layer contains a metal element as the second component that improves the rate of decrease in the contact angle with the liquid, so that the wettability of the photocatalyst-containing layer and the like changes when irradiated with energy. Since the rate of change of wettability on the layer is fast, when forming a pattern having a predetermined difference in wettability, it can be formed by irradiation for a short time, improving the manufacturing efficiency of the pattern forming body, A cost-effective pattern forming body can be provided. In addition, it is possible to form a pattern with different wettability with a greater difference in wettability within an irradiation time that is efficiently allowed, and thus a function obtained by attaching a functional part on this pattern forming body. The effect is that the conductive element can be manufactured with high accuracy.

  Hereinafter, the pattern forming body of the present invention will be described in detail. The pattern forming body of the present invention includes a pattern forming body in which patterns having different wettability are formed on the photocatalyst containing layer (first embodiment), a wettability variable layer formed on the photocatalyst containing layer, and the wettability variable layer. A pattern formed body having a pattern with different wettability formed thereon (second embodiment) and a decomposition removal layer are formed on the photocatalyst-containing layer, and this decomposition removal layer is partially removed to form a pattern. There are three embodiments of the pattern former (third embodiment). In the following, each embodiment will be described separately.

A. First Embodiment A first embodiment of the pattern forming body of the present invention is a substrate and the wettability is changed so that the contact angle with the liquid is reduced by the action of the photocatalyst accompanying the irradiation with energy. And a photocatalyst-containing layer containing at least a photocatalyst, a metal element as a second component that improves the rate of decrease in contact angle with the liquid when irradiated with energy, and a binder. It has a pattern which consists of a part from which wettability differs on the surface of a content layer.

  In this embodiment, when the photocatalyst-containing layer is irradiated with energy, it has a metal element as a second component that improves the rate of decrease in the contact angle with the liquid on the photocatalyst-containing layer. The change rate of wettability on the photocatalyst-containing layer can be greatly improved. This has two advantages as shown below.

  First, when a functional element is formed by forming a functional part along a pattern with different wettability of the pattern formation body, the wettability according to the material of the functional part is included in the pattern with different wettability. The difference is needed. The formation of the wettability difference is performed by energy irradiation. Thus, in order to form a predetermined wettability difference, it is only necessary to pattern-irradiate energy onto the photocatalyst-containing layer, so that such a pattern-formed body is originally produced efficiently. .

  However, depending on the material constituting the photocatalyst-containing layer and the type of energy to be irradiated, it may be necessary to irradiate energy for a relatively long time, and even if the energy irradiation time is within an allowable range for efficiency. If the irradiation time of this energy can be shortened, it becomes more efficient.

  In this embodiment, as described above, the metal element as the second component is contained in the photocatalyst-containing layer. Therefore, even if the photocatalyst-containing layer and the energy are somewhat insensitive, the energy irradiation is performed in a short time. In the case of a photocatalyst-containing layer or energy formed of a material having no problem in terms of sensitivity, it is possible to produce a pattern forming body more efficiently. It has the advantage of being able to.

  In addition, as a second advantage, in the case of forming a high-definition functional element using the difference in wettability of the pattern forming body or in the case where the viscosity of the coating liquid for forming the functional part is high, etc. In some cases, the difference in wettability in the pattern must be increased. In such a case, a material having a low critical surface tension of the photocatalyst containing layer in a portion where no energy is irradiated is used, and this is irradiated with energy to greatly increase the critical surface tension, resulting in a difference in wettability. Need to take large. However, in such a case, there is a possibility that problems such as a long energy irradiation time or a limited type of energy to be irradiated may occur.

  In the present embodiment, since the metal element as the second component is contained in the photocatalyst containing layer, even when it is necessary to take a large difference in wettability, it is relatively short so as not to cause a problem in efficiency. The energy irradiation time may be sufficient, and the irradiation energy is not limited.

  Hereinafter, each configuration of the pattern forming body of the present embodiment will be described in detail.

1. Photocatalyst-containing layer The photocatalyst-containing layer in this embodiment is a layer that is provided on a substrate and whose wettability changes so that the contact angle with a liquid is reduced by energy irradiation. In this way, the wettability is reduced so that the contact angle with the liquid is reduced by exposure (in the present invention, not only light is irradiated but also energy is applied). By providing a photocatalyst-containing layer that changes, wettability can be easily changed by performing pattern irradiation of energy, etc., and a lyophilic region with a small contact angle with the liquid can be obtained. Thus, only the portion to be the functional part can be easily made a lyophilic region. Therefore, a pattern forming body having different wettability can be manufactured efficiently, which is advantageous in terms of cost. In this case, light containing ultraviolet light is usually used as energy.

  Here, the lyophilic region is a region having a small contact angle with the liquid, and refers to a region having good wettability with respect to various functional part forming coating liquids. Further, the liquid repellent region is a region having a large contact angle with the liquid, and refers to a region having poor wettability with respect to various functional part forming coating liquids.

  In the photocatalyst-containing layer in this embodiment, the contact angle with the liquid with a surface tension of 40 mN / m in the unexposed part is 1 degree or more larger than the contact angle with the liquid with a surface tension of 40 mN / m in the exposed part. A layer that can be a corner is preferred.

  Specifically, in an unexposed portion, the contact angle with a liquid having a surface tension of 40 mN / m is 10 degrees or more, preferably the contact angle with a liquid having a surface tension of 30 mN / m is 10 degrees or more, particularly the surface tension. The contact angle with a liquid of 20 mN / m is preferably 10 degrees or more. This is because the non-exposed part is a part that requires liquid repellency in the present invention, so when the contact angle with the liquid is small, the liquid repellency is not sufficient, and various functional parts are formed. This is because there is a possibility that the coating liquid for coating remains.

  In addition, the photocatalyst-containing layer has a contact angle with a liquid that decreases when exposed to light, and a contact angle with a liquid with a surface tension of 40 mN / m is less than 9 degrees, preferably a liquid with a surface tension of 50 mN / m. It is preferable that the layer has a contact angle with a liquid of 10 degrees or less, particularly a surface tension of 60 mN / m, of 10 degrees or less. If the contact angle of the exposed part with the liquid is high, the spread of various functional part forming coating liquids in this part may be inferior, and the functional part may not be formed accurately. Because there is.

  In addition, the contact angle with the liquid here is measured using a contact angle measuring instrument (Kyowa Interface Science Co., Ltd. CA-Z type) with a liquid having various surface tensions (from the microsyringe to the liquid. 30 seconds after dropping), and the result was obtained or the result was graphed. In this measurement, as a liquid having various surface tensions, a wetting index standard solution manufactured by Pure Chemical Co., Ltd. was used.

  The photocatalyst-containing layer in this embodiment is composed of at least a photocatalyst, a metal element as a second component that improves the rate of decrease in the contact angle with the liquid when irradiated with energy, and a binder. By using such a layer, it is possible to increase the critical surface tension on the photocatalyst-containing layer by the action of the photocatalyst by pattern irradiation with energy, and it is possible to form patterns with different contact angles with the liquid. .

  In such a photocatalyst-containing layer, the mechanism of action of a photocatalyst represented by titanium oxide as described later is not necessarily clear, but carriers generated by light irradiation react directly with nearby compounds, or It is considered that the active oxygen species generated in the presence of oxygen and water change the chemical structure of organic matter.

  In the photocatalyst-containing layer in this embodiment, the photocatalyst is used to make the exposed portion wettable by changing the wettability of the exposed portion by using an organic group that is a part of the binder or an action such as oxidation or decomposition of a decomposition substance described later. A large difference in wettability with the non-exposed portion can be produced. Therefore, by improving the acceptability (lyophilicity) and repellent property (liquid repellency) with various functional part forming coating liquids, a pattern forming body having good quality and advantageous in terms of cost is obtained. be able to.

  Hereinafter, the photocatalyst, the metal element as the second component, and the binder, which are the main components of such a photocatalyst-containing layer, will be described.

(photocatalyst)
Examples of the photocatalyst used in the present invention include titanium oxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), which are known as optical semiconductors. Bismuth oxide (Bi ₂ O ₃ ) and iron oxide (Fe ₂ O ₃ ) can be mentioned, and one or a mixture of two or more selected from these can be used.

  In the present invention, titanium oxide is particularly preferably used because it has a high band gap energy, is chemically stable, has no toxicity, and is easily available. Titanium oxide includes anatase type and rutile type, and both can be used in the present invention, but anatase type titanium oxide is preferable. Anatase type titanium oxide has an excitation wavelength of 380 nm or less.

  Examples of such anatase-type titanium oxide include hydrochloric acid peptizer-type anatase-type titania sol (STS-02 manufactured by Ishihara Sangyo Co., Ltd. (average particle size 7 nm), ST-K01 manufactured by Ishihara Sangyo Co., Ltd.), nitric acid solution An anatase type titania sol (TA-15 manufactured by Nissan Chemical Co., Ltd. (average particle size 12 nm)) and the like can be mentioned.

  The smaller the particle size of the photocatalyst, the more effective the photocatalytic reaction occurs. The average particle size is preferably 50 nm or less, and it is particularly preferable to use a photocatalyst of 20 nm or less. Further, the smaller the particle size of the photocatalyst, the smaller the surface roughness of the formed photocatalyst-containing layer, which is preferable. When the particle size of the photocatalyst exceeds 100 nm, the centerline average surface roughness of the photocatalyst-containing layer becomes coarse, and the photocatalyst The liquid repellency of the non-exposed part of the containing layer is lowered, and the lyophilic expression of the exposed part becomes insufficient.

  The content of the photocatalyst in the photocatalyst containing layer can be set in the range of 5 to 60% by weight, preferably 20 to 40% by weight.

(Metal element as the second component)
The metal element as the second component, which is a feature of the present embodiment, means that the metal element is different from the metal element introduced as the photocatalyst, and the wetting on the photocatalyst containing layer of the photocatalyst The metal element which has the function to improve the speed which changes property is shown.

  The type of metal element used in this embodiment is not particularly limited as long as it has a function of improving the speed of changing the wettability of the photocatalyst containing layer on the photocatalyst containing layer as described above. Specific examples include metals included in Group 5A, Group 6A, Group 7A, Group 1B, Group 2B, Group 3B, and the like. Specifically, vanadium (V ), Iron (Fe), cobalt (Co), nickel (Ni), copper (Cu), zinc (Zn), ruthenium (Ru), rhodium (Rh), palladium (Pb), silver (Ag), osmium (Os) ), Iridium (Ir), platinum (Pt), and gold (Au). The metal element is preferably at least one metal element, and particularly preferably Fe (iron).

  The state of such a metal element in the photocatalyst-containing layer may exist as a metal such as a metal fine particle, or as a metal compound such as a metal chloride or a metal oxide. It is not particularly limited as long as it has a function of improving the speed of changing the wettability on the photocatalyst containing layer by the action of the photocatalyst.

  In this embodiment, the molar ratio of the metal element as the second component to the photocatalyst is within the range of 0.00001 to 0.5, particularly within the range of 0.0001 to 0.01, assuming that the photocatalyst is 1. It is preferable to be within.

(Binder)
In this embodiment, when the change of wettability on the photocatalyst-containing layer is performed by the action of the photocatalyst on the binder itself (first form), the photocatalyst-containing layer is decomposed by the action of the photocatalyst by energy irradiation. There are three forms: a case where the photocatalyst containing layer is changed by containing a decomposition substance capable of changing the wettability (second form) and a case where these are combined (third form). Can be divided. The binder used in the first and third embodiments needs to have a function capable of changing the wettability on the photocatalyst-containing layer by the action of the photocatalyst. In the second embodiment, such a binder is used. No special function is required.

  Hereinafter, the binder used in the second embodiment, that is, the binder that does not particularly require the function of changing the wettability on the photocatalyst-containing layer by the action of the photocatalyst will be described, and then the first and third embodiments will be described. The binder used, that is, the binder having a function of changing the wettability on the photocatalyst containing layer by the action of the photocatalyst will be described.

  The binder used in the second embodiment and does not particularly require the function of changing the wettability on the photocatalyst-containing layer by the action of the photocatalyst has a high binding energy such that the main skeleton is not decomposed by photoexcitation of the photocatalyst. If it is a thing, it will not specifically limit. Specific examples include polysiloxanes having no organic substituents or having some organic substituents, and these can be obtained by hydrolysis and polycondensation of tetramethoxysilane, tetraethoxysilane and the like. .

  When such a binder is used, the photocatalyst-containing layer contains a decomposition substance that can be decomposed by the action of a photocatalyst by energy irradiation described later as an additive, thereby changing the wettability on the photocatalyst-containing layer. It is essential.

  Next, the binder that is used in the first and third embodiments and requires the function of changing the wettability on the photocatalyst containing layer by the action of the photocatalyst will be described. As such a binder, one having a high binding energy such that the main skeleton is not decomposed by photoexcitation of the photocatalyst and having an organic substituent that is decomposed by the action of the photocatalyst is preferable. (1) An organopolysiloxane that exerts great strength by hydrolyzing and polycondensing chloro or alkoxysilane by sol-gel reaction, etc. (2) An organopolysiloxane crosslinked with a reactive silicone excellent in water repellency and oil repellency Etc.

In the case of (1) above, the general formula:
Y _n SiX _(4-n)
(Here, Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, X represents an alkoxyl group, an acetyl group or a halogen. N is an integer from 0 to 3. )
It is preferable that it is the organopolysiloxane which is a 1 type, or 2 or more types of hydrolysis condensate or cohydrolysis condensate of the silicon compound shown by these. Here, the number of carbon atoms of the group represented by Y is preferably in the range of 1 to 20, and the alkoxy group represented by X is a methoxy group, an ethoxy group, a propoxy group, or a butoxy group. preferable.

Specifically, methyltrichlorosilane, methyltribromosilane, methyltrimethoxysilane, methyltriethoxysilane, methyltriisopropoxysilane, methyltri-t-butoxysilane; ethyltrichlorosilane, ethyltribromosilane, ethyltrimethoxysilane, Ethyltriethoxysilane, ethyltriisopropoxysilane, ethyltri-t-butoxysilane; n-propyltrichlorosilane, n-propyltribromosilane, n-propyltrimethoxysilane, n-propyltriethoxysilane, n-propyltriisopropoxy Silane, n-propyltri-t-butoxysilane; n-hexyltrichlorosilane, n-hexyltribromosilane, n-hexyltrimethoxysilane, n-hexyltriethoxysilane, n-hexyl Lutriisopropoxysilane, n-hexyltri-t-butoxysilane; n-decyltrichlorosilane, n-decyltribromosilane, n-decyltrimethoxysilane, n-decyltriethoxysilane, n-decyltriisopropoxysilane, n -Decyltri-t-butoxysilane; n-octadecyltrichlorosilane, n-octadecyltribromosilane, n-octadecyltrimethoxysilane, n-octadecyltriethoxysilane, n-octadecyltriisopropoxysilane, n-octadecyltri-t-butoxysilane Phenyltrichlorosilane, phenyltribromosilane, phenyltrimethoxysilane, phenyltriethoxysilane, phenyltriisopropoxysilane, phenyltri-t-butoxysilane; tetrachlorosilane Tetrabromosilane, tetramethoxysilane, tetraethoxysilane, tetrabutoxysilane, dimethoxydiethoxysilane; dimethyldichlorosilane, dimethyldibromosilane, dimethyldimethoxysilane, dimethyldiethoxysilane; diphenyldichlorosilane, diphenyldibromosilane, Diphenyldimethoxysilane, diphenyldiethoxysilane; phenylmethyldichlorosilane, phenylmethyldibromosilane, phenylmethyldimethoxysilane, phenylmethyldiethoxysilane;
Trichlorohydrosilane, tribromohydrosilane, trimethoxyhydrosilane, triethoxyhydrosilane, triisopropoxyhydrosilane, tri-t-butoxyhydrosilane; vinyltrichlorosilane, vinyltribromosilane, vinyltrimethoxysilane, vinyltriethoxysilane, vinyltriisopropoxysilane , Vinyltri-t-butoxysilane; trifluoropropyltrichlorosilane, trifluoropropyltribromosilane, trifluoropropyltrimethoxysilane, trifluoropropyltriethoxysilane, trifluoropropyltriisopropoxysilane, trifluoropropyltri-t-butoxysilane Γ-glycidoxypropylmethyldimethoxysilane, γ-glycidoxypropylmethyldiethoxysilane, γ Glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, γ-glycidoxypropyltriisopropoxysilane, γ-glycidoxypropyltri-t-butoxysilane; γ-methacryloxypropylmethyldimethoxysilane , Γ-methacryloxypropylmethyldiethoxysilane, γ-methacryloxypropyltrimethoxysilane, γ-methacryloxypropyltriethoxysilane, γ-methacryloxypropyltriisopropoxysilane, γ-methacryloxypropyltri t-butoxysilane; γ-aminopropylmethyldimethoxysilane, γ-aminopropylmethyldiethoxysilane, γ-aminopropyltrimethoxysilane, γ-aminopropyltriethoxysilane, γ-aminopropyltriisosilane Ropoxysilane, γ-aminopropyltri-t-butoxysilane; γ-mercaptopropylmethyldimethoxysilane, γ-mercaptopropylmethyldiethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-mercaptopropyltriethoxysilane, γ-mercaptopropyltri Isopropoxysilane, γ-mercaptopropyltri-t-butoxysilane; β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, β- (3,4-epoxycyclohexyl) ethyltriethoxysilane; and their partial hydrolysis Degradation products; and mixtures thereof can be used.

As the binder, polysiloxane containing a fluoroalkyl group can be particularly preferably used. Specifically, one or more of the following hydrocondensation condensates and cohydrolysis condensates of fluoroalkylsilanes can be used. And those generally known as fluorine-based silane coupling agents can be used.
_{CF 3 (CF 2) 3 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 5 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 7 CH} 2 CH 2 Si (OCH 3) 3;
_{CF 3 (CF 2) 9 CH} 2 CH 2 Si (OCH 3) 3;
(CF ₃ ) ₂ CF (CF ₂ ) ₄ CH ₂ CH ₂ Si (OCH ₃ ) ₃ ;
_{(CF 3) 2 CF (CF} 2) 6 CH 2 CH 2 Si (OCH 3) 3;
_{(CF 3) 2 CF (CF} 2) 8 CH 2 CH 2 Si (OCH 3) 3;
_{CF 3 (C 6 H 4)} C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 3 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 5 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 7 (} C 6 H 4) C 2 H 4 Si (OCH 3) 3;
_{CF 3 (CF 2) 3 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 5 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 7 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 9 CH} 2 CH 2 SiCH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 4 CH 2 CH 2 SiCH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 6 CH 2 CH 2 Si CH 3 (OCH 3) 2;
_{(CF 3) 2 CF (CF} 2) 8 CH 2 CH 2 Si CH 3 (OCH 3) 2;
_{CF 3 (C 6 H 4)} C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 3 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 5 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 7 (} C 6 H 4) C 2 H 4 SiCH 3 (OCH 3) 2;
_{CF 3 (CF 2) 3 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 5 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 7 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 9 CH} 2 CH 2 Si (OCH 2 CH 3) 3;
_{CF 3 (CF 2) 7 SO} 2 N (C 2 H 5) C 2 H 4 CH 2 Si (OCH 3) 3
By using a polysiloxane containing a fluoroalkyl group as described above as a binder, the liquid repellency of the non-exposed part of the photocatalyst containing layer is greatly improved, and the function of preventing the adhesion of various functional part forming coating liquids. To express.

  Examples of the reactive silicone (2) include compounds having a skeleton represented by the following general formula.

However, n is an integer of 2 or more, R ^1, R ² are each a substituted or unsubstituted alkyl having 1 to 10 carbon atoms, alkenyl, aryl or cyanoalkyl group, the total molar ratio of 40% or less Vinyl, phenyl and phenyl halide. Further, those in which R ¹ and R ² are methyl groups are preferable because the surface energy becomes the smallest, and the methyl groups are preferably 60% or more by molar ratio. In addition, the chain end or side chain has at least one reactive group such as a hydroxyl group in the molecular chain.

  In addition to the above organopolysiloxane, a stable organosilicon compound that does not undergo a crosslinking reaction, such as dimethylpolysiloxane, may be mixed in the binder.

(Degradable substance)
In the second and third embodiments, the photocatalyst-containing layer needs to contain a decomposition substance that can be further decomposed by the action of the photocatalyst by energy irradiation and thereby change the wettability on the photocatalyst-containing layer. is there. That is, when the binder itself does not have a function of changing the wettability on the photocatalyst-containing layer, and when such a function is insufficient, a decomposition substance as described above is added to the photocatalyst-containing layer. It causes a change in wettability or assists in such a change.

  Examples of such a decomposing substance include a surfactant having a function of decomposing by the action of a photocatalyst and changing the wettability of the photocatalyst-containing layer surface by decomposing. Specifically, hydrocarbons such as NIKKOL BL, BC, BO, BB series manufactured by Nikko Chemicals Co., Ltd., ZONYL FSN, FSO manufactured by DuPont, Surflon S-141, 145 manufactured by Asahi Glass Co., Ltd., Dainippon Megafac F-141, 144 manufactured by Ink Chemical Industry Co., Ltd., Footgent F-200, F251 manufactured by Neos Co., Ltd., Unidyne DS-401, 402 manufactured by Daikin Industries, Ltd., Fluorard FC-170 manufactured by 3M Co., Ltd. Fluorine-based or silicone-based nonionic surfactants such as 176 can be used, and cationic surfactants, anionic surfactants, and amphoteric surfactants can also be used.

  Besides surfactants, polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin, polycarbonate, polyvinyl chloride, polyamide, polyimide Styrene butadiene rubber, chloroprene rubber, polypropylene, polybutylene, polystyrene, polyvinyl acetate, nylon, polyester, polybutadiene, polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide, polyisoprene, oligomers, polymers, and the like.

(Fluorine content)
Moreover, in this embodiment, when the photocatalyst containing layer contains fluorine, and the fluorine content on the surface of the photocatalyst containing layer is irradiated with energy to the photocatalyst containing layer, the photocatalyst containing layer is irradiated with energy by the action of the photocatalyst. It is preferable that the photocatalyst-containing layer is formed so as to decrease in comparison.

  In the pattern forming body having such characteristics, by irradiating the pattern with energy, it is possible to easily form a pattern composed of a portion having a small fluorine content as will be described later. Here, fluorine has an extremely low surface energy. Therefore, the surface of a substance containing a large amount of fluorine has a smaller critical surface tension. Therefore, the critical surface tension of the portion having a small fluorine content is larger than the critical surface tension of the surface of the portion having a large fluorine content. This means that the portion with a low fluorine content is a lyophilic region compared to the portion with a high fluorine content. Therefore, forming a pattern composed of a portion having a lower fluorine content than the surrounding surface forms a pattern of a lyophilic region in the liquid repellent region.

  Therefore, when such a photocatalyst-containing layer is used, the pattern of the lyophilic region can be easily formed in the liquid-repellent region by irradiating the pattern with energy. Can be easily formed, and a pattern forming body having high utility value can be obtained. In addition, the present invention is characterized in that the photocatalyst containing layer contains a metal element as the second component, and the rate of change in wettability of the photocatalyst containing layer surface by the action of the photocatalyst is increased. Therefore, even when the critical surface tension is reduced by containing a relatively large amount of fluorine, the critical surface tension is increased by exposure for a relatively short time, that is, the wettability required for the exposed area is obtained. Is possible, and there is no problem in manufacturing efficiency. Therefore, it can be said that the addition of fluorine in this embodiment is particularly effective in that the pattern accuracy can be improved without any problem in efficiency.

  As described above, the fluorine content contained in the photocatalyst containing layer containing fluorine is not irradiated with energy in the lyophilic region having a low fluorine content formed by energy irradiation. When the fluorine content of the part is 100, it is preferably 10 or less, preferably 5 or less, particularly preferably 1 or less.

  By setting it within such a range, it is possible to make a large difference in lyophilicity between the energy-irradiated portion and the unirradiated portion. Therefore, by forming the functional part in such a photocatalyst-containing layer, it becomes possible to form the functional part accurately only in the lyophilic region having a reduced fluorine content, and to obtain a functional element with high accuracy. Because it can. This rate of decrease is based on weight.

  For the measurement of the fluorine content in the photocatalyst-containing layer, various commonly used methods can be used. For example, X-ray photoelectron spectroscopy (ES-ray photoelectron spectroscopy, ESCA) for Chemical Analysis)), and any method that can quantitatively measure the amount of fluorine on the surface, such as X-ray fluorescence analysis and mass spectrometry, is not particularly limited.

  In this embodiment, titanium dioxide is preferably used as the photocatalyst as described above. When titanium dioxide is used in this manner, the content of fluorine contained in the photocatalyst-containing layer is X-ray. When analyzed and quantified by photoelectron spectroscopy, when the titanium (Ti) element is defined as 100, fluorine (F) element is 500 or more, preferably 800 or more, particularly preferably 1200 or more. F) It is preferable that the element is contained in the surface of the photocatalyst containing layer.

  Fluorine (F) is included in the photocatalyst-containing layer to such an extent that the critical surface tension on the photocatalyst-containing layer can be sufficiently lowered, so that the liquid repellency on the surface can be secured, thereby irradiating the pattern with energy. This is because the difference in wettability with the lyophilic region on the surface of the pattern portion where the fluorine content is reduced can be increased, and the accuracy of the finally obtained pattern formed body can be improved. .

  Further, in such a pattern forming body, the fluorine content in the parent ink region formed by pattern irradiation with energy is 50 or less, preferably when the titanium (Ti) element is 100. Is preferably contained in a ratio of 20 or less, particularly preferably 10 or less.

  If the fluorine content in the photocatalyst-containing layer can be reduced to this extent, sufficient lyophilicity can be obtained to form the functional part, and the liquid repellency of the part where the energy is not irradiated is obtained. Due to the difference in wettability, the functional part can be formed with high accuracy, and a pattern forming body with high utility value can be obtained.

  In this embodiment, as a method of incorporating such fluorine into the photocatalyst containing layer, a method of bonding a fluorine compound with a relatively weak binding energy to a binder having a high binding energy, a binding with a relatively weak binding energy. The method etc. which mix the made fluorine compound in a photocatalyst content layer can be mentioned. By introducing fluorine by such a method, when energy is irradiated, a fluorine bonding site having a relatively low binding energy is first decomposed, and thus fluorine can be removed from the photocatalyst containing layer. is there.

  Examples of the first method, that is, a method of bonding a fluorine compound with a relatively weak binding energy to a binder having a high binding energy include a method of introducing a fluoroalkyl group as a substituent into the organopolysiloxane. be able to.

For example, as described in (1) in the description of the binder, as a method for obtaining an organopolysiloxane, an organopolysiloxane that exhibits high strength by hydrolyzing and polycondensing chloro or alkoxysilane by sol-gel reaction or the like is used. Obtainable. Here, in this method, as described above, the above general formula:
Y _n SiX _(4-n)
(Here, Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, X represents an alkoxyl group, an acetyl group or a halogen. N is an integer from 0 to 3. )
An organopolysiloxane is obtained by hydrolyzing or co-hydrolyzing and condensing one or two or more of the silicon compounds represented by formula (1). In this general formula, silicon having a fluoroalkyl group as the substituent Y By synthesizing using a compound, an organopolysiloxane having a fluoroalkyl group as a substituent can be obtained. When an organopolysiloxane having such a fluoroalkyl group as a substituent is used as a binder, the carbon bond portion of the fluoroalkyl group is decomposed by the action of the photocatalyst in the photocatalyst-containing layer when irradiated with energy. Therefore, the fluorine content in the portion where the surface of the photocatalyst containing layer is irradiated with energy can be reduced.

  The silicon compound having a fluoroalkyl group used at this time is not particularly limited as long as it has a fluoroalkyl group, but has at least one fluoroalkyl group, and the carbon number of the fluoroalkyl group A silicon compound in which is 4 to 30, preferably 6 to 20, particularly preferably 6 to 16, is preferably used. Specific examples of such a silicon compound are as described above, and among these, the above silicon compound having a fluoroalkyl group having 6 to 8 carbon atoms, that is, a fluoroalkylsilane is preferable.

  In the present invention, such a silicon compound having a fluoroalkyl group may be used in combination with the above-mentioned silicon compound having no fluoroalkyl group, and these cohydrolyzed condensates may be used as the organopolysiloxane. In addition, one or two or more silicon compounds having such a fluoroalkyl group may be used, and these hydrolyzed condensates and cohydrolyzed condensates may be used as the organopolysiloxane.

  In the organopolysiloxane having a fluoroalkyl group thus obtained, among the silicon compounds constituting the organopolysiloxane, the silicon compound having the fluoroalkyl group is 0.01 mol% or more, preferably 0.1%. It is preferable that it is contained in mol% or more.

  By including this degree of fluoroalkyl group, the liquid repellency on the photocatalyst-containing layer can be increased, and the difference in wettability with the portion that has been made lyophilic by irradiation with energy can be increased. Because.

In the method shown in (2) in the description of the binder, organopolysiloxane is obtained by crosslinking reactive silicone having excellent water repellency and oil repellency. By making either or both of R ¹ and R ^{2 in} the formula a fluorine-containing substituent such as a fluoroalkyl group, the photocatalyst-containing layer can contain fluorine and is irradiated with energy. In this case, the portion of the fluoroalkyl group having a bond energy lower than that of the siloxane bond is decomposed, so that the fluorine content on the surface of the photocatalyst containing layer can be reduced by energy irradiation.

  On the other hand, the latter example, that is, a method of introducing a fluorine compound bonded with an energy weaker than the binding energy of the binder includes, for example, a method of introducing a low molecular weight fluorine compound as the decomposition substance, for example, a fluorine-based interface. The method of mixing an activator etc. can be mentioned. Examples of the method of introducing a high molecular weight fluorine compound include a method of mixing a fluorine resin having high compatibility with the binder resin.

(Method for producing photocatalyst-containing layer)
The photocatalyst-containing layer is prepared by dispersing a photocatalyst, a metal element as the second component, and a binder in a solvent together with other additives as necessary to prepare a photocatalyst-containing layer forming coating solution. The photocatalyst-containing layer can be formed by applying the liquid on a substrate described later. As the solvent to be used, alcohol-based organic solvents such as ethanol and isopropanol are preferable. The coating can be performed by a known coating method such as spin coating, spray coating, dip coating, roll coating or bead coating. When an ultraviolet curable component is contained as the binder, the photocatalyst-containing layer can be formed by irradiating ultraviolet rays and performing a curing treatment.

  The content of the photocatalyst in the photocatalyst-containing layer forming coating solution can be set in the range of 5 to 60% by weight, preferably 20 to 40% by weight of the solid content. Further, the addition amount of the metal element is such that the molar ratio of the metal element is in the range of 0.00001 to 0.5, particularly in the range of 0.0001 to 0.01, assuming that the photocatalyst is 1. preferable.

  The addition of the metal element as the second component may be added, for example, as a metal compound or as a metal fine powder, and ultimately improves the change rate of wettability on the photocatalyst-containing layer. If it can do, it will not specifically limit. Specific examples that can be used include gold chloride (III) acid tetrahydrate, ferric chloride, ferrous chloride, nickel (II) chloride, chloroplatinic acid (IV) hexahydrate, Rhodium (III) chloride, ruthenium (III) chloride hydrate, silver (I) chloride, zinc chloride, cobalt chloride (II), copper chloride (I), copper chloride (II) dihydrate, copper acetate monohydrate When used as a solution in which a Japanese product, silver lactate or the like is dissolved, the above-described metals, that is, vanadium (V), iron (Fe), cobalt (Co), nickel (Ni), copper (Cu), zinc (Zn), ruthenium (Ru), rhodium (Rh), palladium (Pb), silver (Ag), osmium (Os), iridium (Ir), platinum (Pt), and fine powders such as gold (Au) are uniformly dispersed in the liquid. When used as a dispersed liquid, and when used in combination Can be mentioned.

  The photocatalyst-containing layer thus obtained preferably has a thickness in the range of 0.05 to 10 μm.

2. Base material In the pattern formation body of this embodiment, the photocatalyst containing layer mentioned above is formed on a base material from the relationship with intensity | strength and a final functional element. Examples of such a substrate include metals such as glass, aluminum, and alloys thereof, plastics, woven fabrics, nonwoven fabrics, and the like, depending on the intended use of the pattern forming body or functional elements formed from the pattern forming body. Can do.

3. Pattern consisting of parts having different wettability The pattern formed body of this embodiment has a pattern formed by the difference in wettability on the photocatalyst-containing layer, and this is formed by pattern irradiation of energy on the photocatalyst-containing layer. Is formed.

  Here, in the pattern formed by the difference in wettability, the contact angle with the liquid with the surface tension of 40 mN / m in the unexposed part is larger than the contact angle with the liquid with the surface tension of 40 mN / m in the exposed part. A pattern having a contact angle larger by 1 degree or more is preferable.

  Specifically, the unexposed area in the pattern has a contact angle with a liquid with a surface tension of 40 mN / m of 10 degrees or more, preferably a contact angle with a liquid with a surface tension of 30 mN / m of 10 degrees or more, particularly a surface. The contact angle with a liquid having a tension of 20 mN / m is preferably 10 degrees or more. This is because the portion that is not exposed in the pattern is a portion that requires liquid repellency in the present invention, so when the contact angle with the liquid is small, the liquid repellency is not sufficient, and various functionalities This is because part forming coating liquid or the like may remain, which is not preferable.

  Further, the area of the exposed portion of the pattern has a contact angle with a liquid with a surface tension of 40 mN / m of less than 9 degrees, preferably a contact angle with a liquid with a surface tension of 50 mN / m is 10 degrees or less, particularly a surface tension of 60 mN / m. It is preferable that the layer has a contact angle of 10 degrees or less with the liquid m. If the contact angle of the exposed part with the liquid is high, the spread of various functional part forming coating liquids in this part may be inferior, and the functional part may not be formed accurately. Because there is.

  Hereinafter, the energy used and the pattern irradiation method will be described.

(energy)
Energy pattern irradiation is performed to form the pattern-formed body, and the energy used here is particularly limited as long as it can excite the photocatalyst used in the photocatalyst-containing layer. is not. For example, a combination of light and heat energy may be used as described in detail in the section of pattern irradiation, but normal light is preferably used.

  The photocatalyst used in this embodiment differs in the wavelength of light that causes a catalytic reaction depending on its band gap. For example, cadmium sulfide has a visible light of 496 nm and iron oxide has a light of 539 nm, and titanium dioxide has an ultraviolet light of 388 nm. Therefore, any light, visible light or ultraviolet light, can be used in this embodiment. However, as described above, titanium dioxide is preferably used as the photocatalyst because it is effective as a photocatalyst because of its high band gap energy, is chemically stable, has no toxicity, and is easily available. Light including ultraviolet light that causes a catalytic reaction of titanium is preferable.

  Examples of such a light source including ultraviolet light include a mercury lamp, a metal halide lamp, and a xenon lamp. The wavelength of the light used for this exposure can be set in the range of 400 nm or less, preferably in the range of 380 nm or less, and the amount of light irradiation during the exposure is made lyophilic by the action of the photocatalyst. The irradiation dose required for expression can be obtained.

(Pattern irradiation)
In this embodiment, it is necessary to irradiate such energy in a pattern. The method of irradiating in a pattern is not particularly limited, but is usually performed by a method using a photomask.

  As a method other than the method using the photomask, pattern irradiation of energy may be performed by a method of drawing and irradiating energy using a laser or the like. Specifically, a method of drawing and irradiating in a pattern using a laser such as excimer or YAG can be mentioned. However, such a method may have problems such as an expensive apparatus, difficult handling, and inability to perform continuous output.

  Therefore, in this embodiment, the photocatalytic reaction initiation energy is added to the photocatalyst containing layer, and the pattern of the lyophilic region is obtained by adding the reaction rate increasing energy in a pattern to the region where the photocatalytic reaction initiation energy is added. May be formed. By forming a pattern using such an energy irradiation method, it is possible to use a reaction rate increasing energy that is relatively inexpensive and easy to handle, such as an infrared laser, during pattern formation. This is because no problem occurs.

  The reason why the pattern of the lyophilic region having changed wettability can be formed by applying such energy is as follows. That is, the photocatalytic reaction initiation energy is first applied to the region where the pattern is formed, thereby starting the catalytic reaction of the photocatalyst with respect to the photocatalyst containing layer. And reaction rate increase energy is added in the area | region where this photocatalytic reaction start energy was added. By adding the reaction rate increasing energy in this way, the photocatalytic reaction initiation energy is already added, and the reaction in the photocatalyst containing layer in which the reaction is initiated by the catalytic action of the photocatalyst is rapidly accelerated. Then, by adding the reaction rate increasing energy for a predetermined time, the change of the property in the property changing layer is changed to a desired range, and the pattern to which the reaction rate increasing energy is added is changed to the lyophilic region where the wettability is changed. It can be a pattern.

a. Photocatalytic reaction initiation energy The photocatalytic reaction initiation energy used in this energy irradiation method refers to the energy with which the photocatalyst initiates a catalytic reaction for changing the characteristics of the compound in the photocatalyst containing layer.

  The amount of photocatalytic reaction initiation energy added here is an amount that does not cause a sudden change in wettability in the photocatalyst-containing layer. When the amount of photocatalytic reaction initiation energy added is small, it is not preferable because the sensitivity at the time of forming a pattern by adding reaction rate increasing energy is lowered, and when this amount is too large, the photocatalyst added with photocatalytic reaction initiation energy is not preferable. It is not preferable because the degree of change in the characteristics of the containing layer becomes too large and the difference from the region to which the reaction rate increasing energy is added becomes unclear. The amount of energy to be added is determined by conducting a preliminary experiment or the like in advance on the amount of energy to be added and the amount of change in wettability in the photocatalyst containing layer.

  The photocatalytic reaction initiation energy in this method is not particularly limited as long as it is an energy capable of initiating the photocatalytic reaction, but light is particularly preferable. Since this light is the same as that described in the section of energy above, description thereof is omitted here.

  In the present embodiment, the range in which the photocatalytic reaction initiation energy is applied may be a part of the photocatalyst-containing layer. For example, the photocatalytic reaction initiation energy is added to the pattern, and the reaction rate increase energy described later is also patterned. It is possible to form a lyophilic region pattern with altered wettability by adding the photocatalytic reaction initiation energy to the entire region where the pattern is formed for reasons such as simplification and simplification of the process. It is preferable to add the reaction rate increasing energy to the region where the photocatalytic reaction initiation energy is applied over the entire surface in this manner, thereby forming a pattern of the lyophilic region on the photocatalyst-containing layer. It is preferable.

b. About reaction rate increase energy Next, the reaction rate increase energy used for this method is demonstrated. The reaction rate increasing energy used in this method refers to energy for increasing the reaction rate of the reaction for changing the wettability of the photocatalyst containing layer initiated by the photocatalytic reaction initiation energy. In the present embodiment, any energy can be used as long as it has such an action, but it is preferable to use thermal energy.

  The method of applying such thermal energy to the photocatalyst containing layer in a pattern is not particularly limited as long as it can form a heat pattern on the photocatalyst containing layer, but it is not limited to a method using an infrared laser or a thermal head. The method etc. can be mentioned. As such an infrared laser, for example, an infrared YAG laser (1064 nm) having an advantage of strong directivity and a long irradiation distance, and a diode laser (LED; 830 nm, 1064 nm, 1100 nm) having an advantage of being relatively inexpensive. In addition to the above, a semiconductor laser, a He—Ne laser, a carbon dioxide laser, and the like can be given.

  In this method, by adding the photocatalytic reaction initiation energy described above, the photocatalyst is activated to initiate a change in wettability due to the catalytic reaction in the photocatalyst-containing layer, and the reaction rate at the portion where the change in wettability occurs. By adding the increased energy to promote the catalytic reaction of the part, the pattern of the lyophilic region is formed by the difference in the reaction rate between the region where the reaction rate increasing energy is added and the region where it is not added. Can do.

B. Second Embodiment Next, a second embodiment of the pattern forming body of the present invention will be described. The pattern forming body of the second embodiment includes a substrate, a photocatalyst-containing layer provided on the substrate, a liquid formed by the action of the photocatalyst-containing layer provided on the photocatalyst-containing layer and irradiated with energy. The wettability variable layer has a wettability variable layer whose wettability changes so that the contact angle decreases, and the photocatalyst-containing layer has at least a photocatalyst, and the rate of decrease in the contact angle with the liquid of the wettability variable layer when irradiated with energy It has a metal element as a second component for improving the surface property, and further has a pattern composed of parts having different wettability on the wettability variable layer surface.

  Thus, in the present invention, the photocatalyst-containing layer contains the metal element as the second component that improves the rate of decrease in the contact angle with the liquid in the wettability variable layer. In this case, the change rate of wettability in the wettability variable layer can be improved. Therefore, it has the same advantage as the first embodiment. Moreover, since a functional part is formed on a wettability variable layer, a functional part and a photocatalyst content layer do not contact directly. Therefore, there is no possibility that the functional part deteriorates due to the action of the photocatalyst in the photocatalyst-containing layer, and it is possible to obtain a functional element that is less likely to cause problems.

  Hereinafter, each configuration of the pattern forming body of the present embodiment will be described in detail.

1. Photocatalyst-containing layer The photocatalyst-containing layer in this embodiment comprises at least a photocatalyst and a metal element as a second component that improves the rate of decrease in the contact angle between the liquid of the wettability variable layer when irradiated with energy. It is contained and is different from the photocatalyst containing layer in the first embodiment in that it does not matter whether or not a binder is present.

  In this embodiment, when the photocatalyst-containing layer has a binder, it is the same as the photocatalyst-containing layer described in the first embodiment, and the same applies to the method of containing the metal element as the second component. The description here is omitted. However, in the second embodiment, the wettability on the photocatalyst-containing layer does not need to change, so even if there is no change in wettability due to the action of the photocatalyst on the binder itself, There is no need to include a decomposition substance in the photocatalyst containing layer as in the embodiment.

  On the other hand, as a case where there is no binder, for example, in the case of titanium oxide, there is a method of forming amorphous titania on a transparent substrate and then changing the phase to crystalline titania by firing. The metal element as the second component is added during the formation of amorphous titania. As the amorphous titania used here, for example, hydrolysis, dehydration condensation, tetraethoxytitanium, tetraisopropoxytitanium, tetra-n-propoxytitanium, tetrabutoxytitanium, titanium inorganic salts such as titanium tetrachloride and titanium sulfate, An organic titanium compound such as tetramethoxytitanium can be obtained by hydrolysis and dehydration condensation in the presence of an acid.

  About the said photocatalyst and the metal element as a 2nd component, since it is the same as that of the said 1st embodiment regarding the kind, addition amount, etc., description here is abbreviate | omitted. Moreover, since the manufacturing method of the photocatalyst content layer when it has a binder is the same as that of the 1st embodiment mentioned above, explanation about this is also omitted.

2. Wettability variable layer In this embodiment, a wettability variable layer is formed on the photocatalyst-containing layer. The wettability variable layer is not particularly limited as long as the wettability is changed by the action of the photocatalyst containing layer, but is formed of the same material as the binder in the photocatalyst containing layer of the first embodiment. It is preferable. In addition, since the material and the forming method of the wettability variable layer when formed with the same material as the binder in the photocatalyst containing layer of the first embodiment are the same as those of the first embodiment, The description in is omitted.

  In the present embodiment, the thickness of the wettability variable layer is preferably 0.001 μm to 1 μm, particularly preferably in the range of 0.01 to 0.1 μm, in consideration of the change rate of wettability due to the photocatalyst. It is.

  By using the wettability variable layer of the above-described component in the present invention, by the action of the photocatalyst in the adjacent photocatalyst-containing layer, the action of oxidation, decomposition or the like of the organic group or additive which is a part of the above component is used. By changing the wettability of the exposed part to make it lyophilic, a large difference in wettability with the non-exposed part can be produced. Therefore, by increasing the acceptability (lyophilicity) and the repellent property (liquid repellency) with various functional part forming coating agents, it is possible to obtain a pattern forming body having high utility value.

  In the wettability variable layer in this embodiment, the contact angle with the liquid having a surface tension of 40 mN / m in the unexposed part is one degree or more larger than the contact angle with the liquid having a surface tension of 40 mN / m in the exposed part. It is preferable that the layer has a contact angle. Thus, it is because it will become easy to apply | coat various functional part formation coating liquid along a lyophilic area | region, if the difference of a contact angle is 1 degree or more at least.

  Specifically, in an unexposed portion, the contact angle with a liquid having a surface tension of 40 mN / m is 10 degrees or more, preferably the contact angle with a liquid having a surface tension of 30 mN / m is 10 degrees or more, particularly the surface tension. The contact angle with a liquid of 20 mN / m is preferably 10 degrees or more. This is because the non-exposed part is a part that requires liquid repellency in the present invention, so when the contact angle with the liquid is small, the liquid repellency is not sufficient, and various functional parts are formed. This is because there is a possibility that the coating liquid for coating remains.

  Further, when the wettability variable layer is exposed to light, the contact angle with the liquid decreases, and the contact angle with the liquid having a surface tension of 40 mN / m is less than 9 degrees, preferably the contact angle with the liquid having a surface tension of 50 mN / m. Is preferably a layer such that the contact angle with a liquid having a surface tension of 60 mN / m is 10 degrees or less. If the contact angle of the exposed part with the liquid is high, the spread of various functional part forming coating liquids in this part may be inferior, and the functional part may not be formed accurately. Because there is.

  The wettability variable layer can contain the same fluorine as described in the section of “fluorine inclusion” in the description of the photocatalyst-containing layer in the first embodiment.

3. The pattern which consists of a base material and the site | part from which wettability differs About the base material of this embodiment, since it is the same as that of the said 1st embodiment, description here is abbreviate | omitted. In addition, for patterns consisting of different wettability sites, the pattern is formed on the photocatalyst-containing layer in the first embodiment, except that the wettability variable layer in this embodiment, Since it is the same as that of the 1st embodiment, explanation here is omitted.

C. Third Embodiment Finally, a third embodiment of the pattern forming body of the present invention will be described. The pattern forming body of the third embodiment is provided with a substrate, a photocatalyst-containing layer provided on the substrate, and provided on the photocatalyst-containing layer, and is decomposed and removed by the action of the photocatalyst-containing layer when irradiated with energy. The photocatalyst-containing layer has at least a photocatalyst, and a metal element as a second component that improves the decomposition / removal rate of the decomposition / removal layer when irradiated with energy. The layer is formed in a pattern on the photocatalyst-containing layer.

  Thus, by having the decomposition removal layer on the photocatalyst containing layer that can be decomposed and removed by the action of the photocatalyst in the photocatalyst containing layer, the exposed portion is decomposed and removed by the action of the photocatalyst. Therefore, the photocatalyst-containing layer remains on the surface of the exposed portion, and the decomposition removal layer is exposed on the surface of the unexposed portion. Thus, for example, the decomposition / removal layer is formed of a liquid repellent material, the photocatalyst-containing layer is formed of a lyophilic material, and the portion of the decomposition / removal layer is removed by irradiating the pattern with energy to act the photocatalyst. As a result, patterns with different wettability can be formed on the photocatalyst-containing layer.

  In this case, in this embodiment, the photocatalyst-containing layer contains a metal element as the second component that improves the decomposition / removal rate of the decomposition / removal layer. Therefore, the decomposition / removal speed of the decomposition / removal layer when energy is irradiated can be improved. Therefore, it is possible to form a pattern from which the decomposition / removal layer has been removed by short-time energy irradiation, thereby improving the manufacturing efficiency of the pattern forming body and providing a cost-effective pattern forming body. .

  In the present embodiment, as exemplified in the above description, it is preferable that the decomposition removal layer is liquid repellent and the photocatalyst-containing layer is lyophilic, but the present invention is not limited to this. That is, the photocatalyst-containing layer may be liquid repellent and the decomposition removal layer may be lyophilic. In this case, the liquid repellent portion is exposed to decompose and remove the decomposition / removal layer to expose the photocatalyst-containing layer. Thereby, the exposed part becomes lyophobic, and the part that has not been exposed becomes lyophilic with the decomposition removal layer remaining.

  Here, the contact angle difference between the decomposition removal layer and the exposed photocatalyst-containing layer with respect to the liquid having a surface tension of 40 mN / m is preferably different by at least 1 degree, more preferably by 10 degrees or more. This is because, when the difference in contact angle with the liquid is small, it is difficult to form a functional part using the difference in contact angle with the liquid.

1. Photocatalyst containing layer Since the photocatalyst containing layer in this embodiment is the same as that of the said 2nd embodiment, description here is abbreviate | omitted. However, it is necessary that the surface exposed by removing the decomposition removal layer has a wettability different from the wettability of the decomposition removal layer. In this case, as described above, the photocatalyst-containing layer is preferably lyophilic, and the contact angle with respect to a liquid having a surface tension of 40 mN / m is preferably less than 19 degrees, and more preferably 10 degrees or less. That is.

  In this embodiment, the exposed portion is decomposed and removed by the action of the photocatalyst. Therefore, the photocatalyst containing layer is exposed on the surface of the exposed portion. Since this part is a part that requires lyophilicity, when the contact angle with respect to the liquid having a surface tension of 40 mN / m on the photocatalyst-containing layer exceeds the above range, various functional part forming coatings in this part are used. This is because the spread of the working liquid or the like may be inferior, which may cause a problem in the quality of the obtained functional element.

  The photocatalyst-containing layer may have a contact angle with the liquid that is reduced by exposure and falls within the above range. This is because, when the decomposition / removal layer transmits light, the photocatalyst-containing layer is exposed through the decomposition / removal layer when the decomposition / removal layer is exposed.

2. Decomposition removal layer The decomposition removal layer in this embodiment is formed on the photocatalyst containing layer. The decomposition removal layer is not particularly limited as long as it is decomposed and removed by the action of the photocatalyst in the photocatalyst-containing layer when exposed, but the contact angle with respect to a liquid having a surface tension of 40 mN / m is 20 degrees. As described above, it is particularly preferably 30 ° or more.

  This means that the decomposition removal layer remains in the portion that is not exposed in this embodiment. Here, the portion that is not exposed is preferably a portion that exhibits liquid repellency as described above. Therefore, when the contact angle with respect to the liquid having a surface tension of 40 mN / m on the decomposition removal layer is smaller than the above range, the liquid repellency is not sufficient, and there is a possibility that various functional part forming coating liquids remain. Therefore, it is not preferable.

  Further, the decomposition / removal layer remaining after the exposure remains between the exposed portions, that is, between the lyophilic regions. In such a case, the decomposition / removal layer can be used as a liquid-repellent convex portion that divides the lyophilic region, and can be applied accurately when applying various functional part-forming coating liquids. Can do.

  The material used for such a decomposition / removal layer is a material that is decomposed and removed by the above-described characteristics of the decomposition / removal layer, that is, the action of the photocatalyst in the adjacent photocatalyst-containing layer by exposure, and preferably has a surface tension of 40 mN / m This is a material whose contact angle with respect to the liquid falls within the above-mentioned range.

  Examples of such materials include hydrocarbon-based, fluorine-based, and silicone-based nonionic surfactants. Specific examples of such compounds include polyoxyethylene alkyl ethers, polyoxyethylene alkyl phenyl ethers, perfluoroalkyl ethylene oxide adducts, and perfluoroalkyl amine oxides.

  If such a material is a hydrocarbon-based nonionic surfactant, NIKKOL BL, BC, BO, BB series (trade name, manufactured by Nippon Surfactant Co., Ltd.), fluorine-based or silicon-based nonionic Surfactants such as ZONYL FSN, FSO (trade name, manufactured by DuPont), Surflon S-141, 145 (trade name, manufactured by Asahi Glass Co., Ltd.), MegaFuck F-141, 144 (trade name, Dainippon Ink) ), Aftergent F200, F251 (trade name, manufactured by Neos), Unidyne DS-401, 402 (trade name, manufactured by Daikin Industries), Florad FC-170, 176 (trade name, manufactured by 3M) can do.

  As the material for the decomposition removal layer, other cationic, anionic and amphoteric surfactants can be used. Specifically, sodium alkylbenzenesulfonate, alkyltrimethylammonium salt, perfluoroalkylcarboxylate And perfluoroalkylbetaine.

  Furthermore, as a material for the decomposition removal layer, various polymers or oligomers can be used in addition to the surfactant. Examples of such polymers or oligomers include polyvinyl alcohol, unsaturated polyester, acrylic resin, polyethylene, diallyl phthalate, ethylene propylene diene monomer, epoxy resin, phenol resin, polyurethane, melamine resin, polycarbonate, polyvinyl chloride, polyamide, polyimide Styrene butadiene rubber, chloroprene rubber, polypropylene, polybutylene, polystyrene, polyvinyl acetate, nylon, polyester, polybutadiene, polybenzimidazole, polyacrylonitrile, epichlorohydrin, polysulfide, polyisoprene, and the like. In the present invention, it is particularly preferable to use a liquid repellent polymer having a high contact angle with water, such as polyethylene, polypropylene, polystyrene, and polyvinyl chloride.

  Such a decomposition and removal layer can be formed by dispersing the above-mentioned components in a solvent together with other additives as necessary to prepare a coating solution, and coating this coating solution on the photocatalyst-containing layer. it can. The coating can be performed by a known coating method such as spin coating, spray coating, dip coating, roll coating or bead coating.

  In this embodiment, the thickness of the decomposition removal layer is preferably 0.001 μm to 1 μm, particularly preferably in the range of 0.01 to 0.1 μm, in view of the decomposition rate by the photocatalyst.

3. Substrate and Decomposition Removal Layer Pattern Since the substrate is the same as that in the first embodiment, description thereof is omitted here. In addition, the energy and energy pattern irradiation method for forming the decomposition / removal layer pattern are the same as those in the first embodiment described above, and therefore the description thereof is omitted here. However, regarding the change in wettability of the surface, this embodiment is the formation of a pattern due to the difference in wettability by removing the decomposition removal layer as described above. It is formed as described in the present embodiment, and a specific difference in wettability is formed by a difference in wettability on the decomposition removal layer and wettability on the photocatalyst-containing layer.

D. Functional element Various functional elements can be obtained by disposing the functional part on the part corresponding to the pattern on the pattern forming body of the three aspects as described above.

  Here, the term “functionality” means optical (light selective absorption, reflectivity, polarization, light selective transmission, nonlinear optical property, luminescence such as fluorescence or phosphorescence, photochromic property, etc.), magnetic (hard magnetism, soft magnetism, etc.). , Non-magnetic, magnetically permeable, etc.), electrical / electronic (conductive, insulating, piezoelectric, pyroelectric, dielectric, etc.), chemical (adsorptive, desorbable, catalytic, water-absorbing, ionic conductivity) , Redox, electrochemical properties, electrochromic, etc.), mechanical (wear resistance, etc.), thermal (heat transfer, heat insulation, infrared radiation, etc.), biofunctional (biocompatibility, antithrombotic, etc.) ) Means various functions.

  Since the functional part is arranged in a part corresponding to the pattern of the functional part pattern forming body, a pattern having a changed wettability is formed. By applying it on top, only the lyophilic area with good wettability will adhere the functional part forming composition coating liquid, and easily place the functional part on the part corresponding to the pattern of the pattern forming body. can do. In this case, it is desirable that the unexposed portion of the pattern forming body has a critical surface tension of 50 mN / m or less, preferably 30 mN / m or less.

  As described above, the functional part-forming coating solution used in the present invention varies greatly depending on the function of the functional element, the method of forming the functional element, etc. A composition that is not diluted with a solvent to be diluted, a liquid composition diluted with a solvent, or the like can be used. Moreover, as a functional part formation coating liquid, since a pattern can be formed in a short time, so that a viscosity is low, it is especially preferable. However, in the case of a liquid composition diluted with a solvent, it is desirable that the solvent has low volatility because an increase in viscosity and a change in surface tension occur due to volatilization of the solvent during pattern formation.

  The functional part forming coating solution used in the present invention may be a functional part by being attached to the pattern forming body or the like, and may be disposed on the pattern forming body. Thereafter, the functional part may be treated with a medicine or treated with ultraviolet rays, heat, or the like. In this case, as a binder for the functional part forming coating liquid, when it contains a component that is effective with ultraviolet rays, heat, electron beam, etc., the functional part can be formed quickly by performing a curing treatment. To preferred.

  The functional element forming method will be described in detail. The functional part forming coating liquid is a coating means such as dip coating, roll coating, blade coating, and spin coating, a nozzle discharging means including an inkjet, etc. The functional part is formed on the pattern of the lyophilic region formed on the pattern forming body using the above means.

  Specific examples of the functional element thus obtained include a color filter and a microlens.

  The color filter is used in a liquid crystal display device or the like, and has a plurality of pixel portions such as red, green, and blue formed on a glass substrate or the like in a high-definition pattern. By using the pattern formed body of the present invention for the production of this color filter, it is possible to obtain a high-definition color filter at low cost. That is, the pixel portion (functional portion) can be easily formed by adhering and curing ink (functional portion forming coating liquid) to the lyophilic region on the pattern having changed wettability by, for example, an ink jet apparatus or the like. Thus, a high-definition color filter can be obtained with a small number of steps.

  Further, when the functional element is a microlens, when the lens forming composition (functional part forming coating solution) is dropped on the lyophilicity of the pattern having changed wettability, this lens forming composition Spreads only in the lyophilic region, and the contact angle of the droplet can be increased by further dropping. By curing this lens forming composition, it is possible to obtain various shapes or focal lengths, and high-definition microlenses can be obtained.

  The present invention is not limited to the above embodiment. The above-described embodiment is an exemplification, and the present invention has substantially the same configuration as the technical idea described in the claims of the present invention, and any device that exhibits the same function and effect is the present invention. It is included in the technical scope of the invention.

Example 1
3 g of isopropyl alcohol, fluoroalkylsilane (manufactured by Tochem Products, trade name: MF-160E, N- [3- (trimethoxysilyl) propyl] -N ethylperfluorooctanesulfonamide 50 wt% solution in isopropyl ether) 0.001 g, 2 g of titanium oxide sol (trade name: STK-01, manufactured by Ishihara Sangyo Co., Ltd.) and 0.001 g of ferric chloride were mixed and stirred at 100 ° C. for 20 minutes. In this case, when the titanium oxide is 1, the molar ratio as iron is about 0.005.

  This solution was coated on a non-alkali glass substrate having a thickness of 0.7 mm by a spin coating method, and after heating at 150 ° C. for 20 minutes, a photocatalyst-containing layer having a thickness of 0.15 μm was formed.

  The contact angle of this photocatalyst-containing layer with respect to a 40 mN / m wetting index standard solution was measured with a contact angle measuring instrument (CA-Z type manufactured by Kyowa Interface Science), and was found to be 70 degrees.

The surface of this photocatalyst-containing layer was irradiated with ultraviolet rays at an illuminance of 20 mW / cm ² (365 nm) with an ultrahigh pressure mercury lamp, and as a result, it took 30 seconds until the contact angle with respect to the 40 mN / m wetting index standard solution became 0 degrees. .

(Comparative Example 1)
A photocatalyst-containing layer was similarly produced without adding the ferric chloride of Example 1 above. The contact angle of this photocatalyst-containing layer with respect to a 40 mN / m wetting index standard solution was measured with a contact angle measuring instrument (CA-Z type manufactured by Kyowa Interface Science), and was found to be 70 degrees.

The surface of the photocatalyst-containing layer was irradiated with ultraviolet rays at an illuminance of 20 mW / cm ² (365 nm) with an ultrahigh pressure mercury lamp. As a result, it took 120 seconds for the 40 mN / m wetting index standard solution to reach 0 degree.

(Example 2)
3 g of isopropyl alcohol, 2 g of titanium oxide sol (trade name: STK-01, manufactured by Ishihara Sangyo Co., Ltd.) and 0.001 g of ferric chloride were mixed and stirred at 100 ° C. for 20 minutes. In this case, when the titanium oxide is 1, the molar ratio as iron is about 0.005.

  This solution was coated on a non-alkali glass substrate having a thickness of 0.7 mm by a spin coating method, and after heating at 150 ° C. for 20 minutes, a photocatalyst-containing layer having a thickness of 0.15 μm was obtained.

  Next, fluoroalkylsilane (trade name: MF-160E, N- [3- (trimethoxysilyl) propyl] -N ethylperfluorooctanesulfonamide 50 wt% solution in isopropyl ether) 0.001 g Then, 0.6 g of silica sol Glasca HPC7002 (trade name, manufactured by Nippon Synthetic Rubber) and 0.2 g of alkyl alkoxysilane HPC402H (trade name, manufactured by Nippon Synthetic Rubber) were mixed and stirred at 100 ° C. for 20 minutes. This solution was similarly coated on the photocatalyst-containing layer and heated at 150 ° C. for 20 minutes to obtain a wettability variable layer having a thickness of 0.05 μm.

  The contact angle of this wettability changing layer with respect to a 40 mN / m wetness index standard solution was measured by a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science), and was found to be 65 degrees.

As a result of irradiating the surface of this wettability changing layer with ultraviolet light at an illuminance of 20 mW / cm ² (365 nm) with an ultra-high pressure mercury lamp, it takes 60 seconds until the contact angle with respect to the 40 mN / m wetting index standard solution becomes 0 degrees. did.

(Comparative Example 2)
A photocatalyst-containing layer was produced in the same manner without adding the ferric chloride of Example 2. Next, a wettability changing layer was formed in the same manner as in Example 2. The contact angle with a 40 mN / m wetting index standard solution was measured with a contact angle measuring instrument (CA-Z type manufactured by Kyowa Interface Science), and was found to be 65 degrees.

As a result of UV irradiation at illuminance of the wettability variable layer surface by an ultra-high pressure mercury lamp ^{20mW / cm 2 (365nm),} 180 seconds is needed until the contact angle with respect to wettability index standard solution of 40 mN / m becomes 0 degrees did.

(Example 3)
3 g of isopropyl alcohol, 2 g of titanium oxide sol (trade name: STK-01, manufactured by Ishihara Sangyo Co., Ltd.) and 0.001 g of ferric chloride were mixed and stirred at 100 ° C. for 20 minutes. In this case, when the titanium oxide is 1, the molar ratio as iron is about 0.005.

  This solution was coated on a non-alkali glass substrate having a thickness of 0.7 mm by a spin coating method, and after heating at 150 ° C. for 20 minutes, a photocatalyst-containing layer having a thickness of 0.15 μm was obtained.

  Next, an IPA 10% solution of ZONYLFSN100 manufactured by DuPont was prepared and coated on the photocatalyst-containing layer by a spin coating method. After heating at 150 ° C. for 20 minutes, a decomposition removal layer having a thickness of 0.1 μm was formed.

  The contact angle of this decomposition removal layer with respect to a 40 mN / m wetting index standard solution was measured by a contact angle measuring device (CA-Z type manufactured by Kyowa Interface Science), and was found to be 55 degrees.

As a result of ultraviolet irradiation at an intensity of 20 mW / cm ² by an ultra-high pressure mercury lamp in the decomposition removal layer surface (365 nm), decomposition removal layer is decomposed and removed, the contact angle with respect to wettability index standard solution of 40 mN / m is 0 degrees It took 40 seconds for the photocatalyst-containing layer to appear.

(Comparative Example 3)
A photocatalyst-containing film was prepared in the same manner without adding the ferric chloride of Example 3. Next, a decomposition removal layer was formed in the same manner as in Example 3. The contact angle with a 40 mN / m wetting index standard solution was measured with a contact angle measuring instrument (CA-Z type manufactured by Kyowa Interface Science), and found to be 55 degrees.

As a result of irradiating ultraviolet rays with an illuminance of 20 mW / cm ² (365 nm) onto the surface of the decomposition removal layer with an illuminance of 20 mW / cm ² (365 nm), the decomposition removal layer was decomposed and removed, and the contact angle with respect to the 40 mN / m wetness index standard solution was 0 degree. It took 165 seconds for the photocatalyst-containing layer to appear.

Claims (15)

A substrate and a layer provided on the substrate, the wettability of which is changed so that the contact angle with the liquid is lowered by the action of the photocatalyst associated with energy irradiation, and at least the photocatalyst and the liquid upon energy irradiation And a photocatalyst containing layer containing a binder as a second component that improves the rate of decrease of the contact angle, and the photocatalyst containing layer has a pattern composed of parts with different wettability on the surface. A functional element comprising: a pattern forming body; and a functional part disposed on a portion corresponding to a pattern having different wettability on the pattern forming body. The binder is Y _n SiX _(4-n) (wherein Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, X represents an alkoxyl group or a halogen, and n represents It is an integer from 0 to 3.) It is an organopolysiloxane which is one kind or two or more kinds of hydrolyzed condensates or cohydrolyzed condensates of silicon compounds represented by the formula (1). Functional elements. The photocatalyst-containing layer has a contact angle with a liquid with a surface tension of 40 mN / m in a portion not irradiated with energy, which is 1 degree or more larger than a contact angle with a liquid with a surface tension of 40 mN / m in a portion irradiated with energy. The functional element according to claim 1, wherein the functional element is a photocatalyst-containing layer having a contact angle . The substrate, the photocatalyst-containing layer provided on the substrate, and the photocatalyst-containing layer provided on the photocatalyst-containing layer have wettability so that the contact angle with the liquid is reduced by the action of the photocatalyst-containing layer when irradiated with energy. A metal as a second component that has a variable wettability variable layer, the photocatalyst-containing layer is at least a photocatalyst, and improves the rate of decrease in contact angle with the liquid of the wettability variable layer when irradiated with energy A pattern forming body having an element and a pattern having different wettability on the wettability variable layer surface, and a pattern forming body on the pattern forming body corresponding to the pattern having different wettability. And a functional part. The wettability variable layer is Y _n SiX _(4-n) (where Y represents an alkyl group, a fluoroalkyl group, a vinyl group, an amino group, a phenyl group or an epoxy group, and X represents an alkoxyl group or a halogen). Wherein n is an integer from 0 to 3.) It is an organopolysiloxane which is one or two or more hydrolysis condensates or cohydrolysis condensates of a silicon compound represented by 4. The functional element according to 4 . The wettability variable layer has a contact angle with a liquid with a surface tension of 40 mN / m in a portion not irradiated with energy, which is 1 degree or more than a contact angle with a liquid with a surface tension of 40 mN / m in a portion irradiated with energy. The functional element according to claim 4, wherein the functional element is a wettability variable layer having a large contact angle . A substrate, a photocatalyst-containing layer provided on the substrate, and a decomposition removal layer provided on the photocatalyst-containing layer and decomposed and removed by the action of the photocatalyst-containing layer when irradiated with energy, The inclusion layer has at least a photocatalyst and a metal element as a second component that improves the decomposition / removal rate of the decomposition / removal layer when irradiated with energy, and the decomposition / removal layer is patterned on the photocatalyst-containing layer. A functional element comprising: a formed pattern forming body; and a functional part disposed on a portion corresponding to a pattern having different wettability on the pattern forming body. The functional element according to claim 7, wherein the decomposition removal layer is a hydrocarbon-based, fluorine-based, or silicone-based nonionic surfactant . The metal element as the second component is vanadium (V), iron (Fe), cobalt (Co), nickel (Ni), copper (Cu), zinc (Zn), ruthenium (Ru), rhodium (Rh). And at least one metal element selected from the group consisting of palladium (Pb), silver (Ag), osmium (Os), iridium (Ir), platinum (Pt), and gold (Au) The functional element according to any one of claims 1 to 8 . The functional element according to claim 9, wherein the metal element as the second component is Fe (iron) . The photocatalyst is composed of titanium oxide (TiO ₂ ), zinc oxide (ZnO), tin oxide (SnO ₂ ), strontium titanate (SrTiO ₃ ), tungsten oxide (WO ₃ ), bismuth oxide (Bi ₂ O ₃ ), and oxide. The functional element according to any one of claims 1 to 10, wherein the functional element is one or two or more substances selected from iron (Fe ₂ O ₃ ) . The functional element according to claim 11, wherein the photocatalyst is titanium oxide (TiO ₂ ) . The molar ratio of the metal element as the second component with respect to the photocatalyst in the photocatalyst containing layer is within a range of 0.00001 to 0.5 when the photocatalyst is 1. The functional element according to any one of claims 1 to 12 . A color filter, wherein the functional portion of the functional element according to any one of claims 1 to 13 is a pixel portion. A microlens, wherein the functional part of the functional element according to any one of claims 1 to 13 is a lens.