JP4277565B2 - Resin composition for printed wiring board and use thereof - Google Patents
Resin composition for printed wiring board and use thereof Download PDFInfo
- Publication number
- JP4277565B2 JP4277565B2 JP2003117041A JP2003117041A JP4277565B2 JP 4277565 B2 JP4277565 B2 JP 4277565B2 JP 2003117041 A JP2003117041 A JP 2003117041A JP 2003117041 A JP2003117041 A JP 2003117041A JP 4277565 B2 JP4277565 B2 JP 4277565B2
- Authority
- JP
- Japan
- Prior art keywords
- component
- weight
- resin
- printed wiring
- epoxy resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011342 resin composition Substances 0.000 title claims description 21
- 239000003822 epoxy resin Substances 0.000 claims description 55
- 229920000647 polyepoxide Polymers 0.000 claims description 55
- 239000004593 Epoxy Substances 0.000 claims description 32
- 239000002966 varnish Substances 0.000 claims description 24
- 229920005989 resin Polymers 0.000 claims description 23
- 239000011347 resin Substances 0.000 claims description 23
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- 239000011888 foil Substances 0.000 claims description 10
- 239000003795 chemical substances by application Substances 0.000 claims description 8
- 239000011521 glass Substances 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 8
- 125000003700 epoxy group Chemical group 0.000 claims description 5
- 239000002904 solvent Substances 0.000 claims description 5
- 239000002759 woven fabric Substances 0.000 claims description 4
- 239000004745 nonwoven fabric Substances 0.000 claims description 3
- 238000010030 laminating Methods 0.000 claims description 2
- 238000003825 pressing Methods 0.000 claims description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 26
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 24
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 9
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 8
- 239000000126 substance Substances 0.000 description 8
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 239000011889 copper foil Substances 0.000 description 7
- 238000001879 gelation Methods 0.000 description 7
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 6
- 238000000465 moulding Methods 0.000 description 6
- 229920003986 novolac Polymers 0.000 description 6
- 150000001412 amines Chemical class 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- -1 mensendiamine Chemical compound 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 2
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 2
- LLPKQRMDOFYSGZ-UHFFFAOYSA-N 2,5-dimethyl-1h-imidazole Chemical compound CC1=CN=C(C)N1 LLPKQRMDOFYSGZ-UHFFFAOYSA-N 0.000 description 2
- VWSLLSXLURJCDF-UHFFFAOYSA-N 2-methyl-4,5-dihydro-1h-imidazole Chemical compound CC1=NCCN1 VWSLLSXLURJCDF-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 2
- AERZMMNNWVZSNB-UHFFFAOYSA-N 3-dodec-1-ynyloxolane-2,5-dione Chemical compound CCCCCCCCCCC#CC1CC(=O)OC1=O AERZMMNNWVZSNB-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- MTZUIIAIAKMWLI-UHFFFAOYSA-N 1,2-diisocyanatobenzene Chemical compound O=C=NC1=CC=CC=C1N=C=O MTZUIIAIAKMWLI-UHFFFAOYSA-N 0.000 description 1
- ZXHZWRZAWJVPIC-UHFFFAOYSA-N 1,2-diisocyanatonaphthalene Chemical compound C1=CC=CC2=C(N=C=O)C(N=C=O)=CC=C21 ZXHZWRZAWJVPIC-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- SHYARJUKNREDGB-UHFFFAOYSA-N 2-ethyl-5-methyl-4,5-dihydro-1h-imidazole Chemical compound CCC1=NCC(C)N1 SHYARJUKNREDGB-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- NCVGSSQICKMAIA-UHFFFAOYSA-N 2-heptadecyl-4,5-dihydro-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NCCN1 NCVGSSQICKMAIA-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- BKCCAYLNRIRKDJ-UHFFFAOYSA-N 2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1CCN=C1C1=CC=CC=C1 BKCCAYLNRIRKDJ-UHFFFAOYSA-N 0.000 description 1
- FUOZJYASZOSONT-UHFFFAOYSA-N 2-propan-2-yl-1h-imidazole Chemical compound CC(C)C1=NC=CN1 FUOZJYASZOSONT-UHFFFAOYSA-N 0.000 description 1
- BTYIFQSAIPDZQW-UHFFFAOYSA-N 2-propan-2-yl-4,5-dihydro-1h-imidazole Chemical compound CC(C)C1=NCCN1 BTYIFQSAIPDZQW-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- FQHUDZKKDCTQET-UHFFFAOYSA-N 2-undecyl-4,5-dihydro-1h-imidazole Chemical compound CCCCCCCCCCCC1=NCCN1 FQHUDZKKDCTQET-UHFFFAOYSA-N 0.000 description 1
- UPMLOUAZCHDJJD-UHFFFAOYSA-N 4,4'-Diphenylmethane Diisocyanate Chemical compound C1=CC(N=C=O)=CC=C1CC1=CC=C(N=C=O)C=C1 UPMLOUAZCHDJJD-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- CPHGOBGXZQKCKI-UHFFFAOYSA-N 4,5-diphenyl-1h-imidazole Chemical compound N1C=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 CPHGOBGXZQKCKI-UHFFFAOYSA-N 0.000 description 1
- JJUVAPMVTXLLFR-UHFFFAOYSA-N 5-methyl-2-phenyl-4,5-dihydro-1h-imidazole Chemical compound N1C(C)CN=C1C1=CC=CC=C1 JJUVAPMVTXLLFR-UHFFFAOYSA-N 0.000 description 1
- KNDQHSIWLOJIGP-UHFFFAOYSA-N 826-62-0 Chemical compound C1C2C3C(=O)OC(=O)C3C1C=C2 KNDQHSIWLOJIGP-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- 239000005057 Hexamethylene diisocyanate Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- IMUDHTPIFIBORV-UHFFFAOYSA-N aminoethylpiperazine Chemical compound NCCN1CCNCC1 IMUDHTPIFIBORV-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- FLBJFXNAEMSXGL-UHFFFAOYSA-N het anhydride Chemical compound O=C1OC(=O)C2C1C1(Cl)C(Cl)=C(Cl)C2(Cl)C1(Cl)Cl FLBJFXNAEMSXGL-UHFFFAOYSA-N 0.000 description 1
- RRAMGCGOFNQTLD-UHFFFAOYSA-N hexamethylene diisocyanate Chemical compound O=C=NCCCCCCN=C=O RRAMGCGOFNQTLD-UHFFFAOYSA-N 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- QOHMWDJIBGVPIF-UHFFFAOYSA-N n',n'-diethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN QOHMWDJIBGVPIF-UHFFFAOYSA-N 0.000 description 1
- 230000003606 oligomerizing effect Effects 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- QCTJRYGLPAFRMS-UHFFFAOYSA-N prop-2-enoic acid;1,3,5-triazine-2,4,6-triamine Chemical compound OC(=O)C=C.NC1=NC(N)=NC(N)=N1 QCTJRYGLPAFRMS-UHFFFAOYSA-N 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 125000000467 secondary amino group Chemical group [H]N([*:1])[*:2] 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical compound CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- DIHAURBCYGTGCV-UHFFFAOYSA-N xi-4,5-Dihydro-2,4(5)-dimethyl-1H-imidazole Chemical compound CC1CN=C(C)N1 DIHAURBCYGTGCV-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Reinforced Plastic Materials (AREA)
Description
【0001】
【産業上の利用分野】
本発明は、プリント配線板用樹脂組成物、及びこれを用いた樹脂ワニス、プリプレグ及び積層板に関する。
【0002】
【従来の技術】
電気・電子機器等に使用される金属箔張積層板は、例えば、ガラスクロス等の基材にエポキシ樹脂組成物等の熱硬化性樹脂ワニスを含浸した後、加熱して半硬化させることによってプリプレグを作製し、このプリプレグを所要枚数重ねるとともに、銅箔等の金属箔をその片側又は両側に配して積層し、加熱加圧して成形を行うことによって製造されている。また、多層の金属箔張積層板は、上記の方法で得られた金属箔張積層板の表面の金属箔をエッチングして導体回路を形成した後、その導体回路を形成した積層板の表裏に、上記と同様のプリプレグを所要枚数重ねるとともに、金属箔をその片側又は両側に配して積層し、加熱加圧して成形を行うことによって製造されている。エポキシ樹脂組成物としては、エポキシ当量が100〜1000程度の低分子量のエポキシ樹脂とアミン系硬化剤および硬化促進剤が一般的に使用されている。
【0003】
近年、プリント配線板の高密度化、高速伝送性に対する要求に伴い、プリント配線板材料にも絶縁信頼性や高耐熱性およびインピーダンス特性を制御するための板厚精度や層間厚み精度の向上が要求されている。また、プリント配線板の薄型化の要求に伴い、基材や銅箔の薄型化が進んでおり、基材と銅箔の接着強度の向上も要求されている。
【0004】
【発明が解決しようとする課題】
板厚精度の向上には、加熱成形時の成形圧力や加熱条件、および副資材の変更により成形時の樹脂流れを抑制することが有効な手段となっており、とくに加熱条件によるプリプレグの樹脂流れやゲル化時間の最適化により板厚精度の向上が図られている。しかし、上記のような低分子量エポキシを用いた樹脂ワニスでは樹脂流れやゲル化時間の最適化を図っても、成形時の樹脂流れの抑制が困難であり十分な板厚精度が得られない。そこで、直鎖状の高分子量の樹脂成分、ゴム状の成分および充填材を樹脂ワニスに配合することがプリプレグの樹脂流れ抑制に有効な手段となっている。しかし、充填材の配合では、プリント配線板加工時の打抜き特性やドリル加工性や耐熱性などが低下する傾向にあり、直鎖状の高分子量のエポキシ樹脂(例えば、フェノキシ樹脂)やゴム状の成分を単独で配合する場合、添加量が多くなるにつれ乾燥時でのプリプレグの外観が悪化し、また得られた積層板のTgや耐熱性およびピール強度を低下させている。
【0005】
このような要求に対して、エポキシ当量が100〜1000で重量平均分子量が10000以上の反応末端にエポキシ基を有する直鎖状のエポキシ樹脂と、エポキシ当量が100〜1000で重量平均分子量が5000以下のエポキシ樹脂とを組み合わせたエポキシ樹脂組成物により、板厚精度を改善することが提案されている(例えば、特許文献1参照)。しかし、このエポキシ樹脂組成物については、プリント配線板とした際のTg、耐熱性の良好性を保ちつつ、ピール強度を一層改善することが求められていた。
【0006】
【特許文献1】
特開2002−114855号公報
【0007】
【発明が解決しようとする課題】
本発明の目的は、耐熱性、ピール強度が良好で、かつTgが低下することなく、成形時の樹脂流れが向上したプリプレグが得られる、プリント配線板用樹脂組成物を提供することにある。
【0008】
【課題を解決するための手段】
本発明は、(a)エポキシ当量が100以上、かつ300以下であり、重量平均分子量が500以下である、直鎖状エポキシ樹脂、(b)エポキシ当量が500以上、かつ1000以下であり、重量平均分子量が10000以上である、反応末端にエポキシ基を有するエポキシ樹脂、(c)エポキシ当量が100以上、かつ1000以下であり、重量平均分子量が500超、かつ5000以下である、エポキシ樹脂、(d)硬化剤、及び(e)硬化促進剤を含み、かつ(a)成分、(b)成分及び(c)成分の合計100重量部に対し、(a)成分が0.1〜2重量部であり、(b)成分が1〜15重量部である、プリント配線板用樹脂組成物に関する。また、本発明は、このプリント配線板用樹脂組成物を用いたプリント配線板用樹脂ワニス、プリント配線板用プリプレグ及び金属張積層板に関する。
【0009】
本発明の樹脂組成物における、(a)エポキシ当量が100以上、かつ300以下であり、重量平均分子量が500以下で直鎖状のエポキシ樹脂は、特に限定されないが、例えば、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂等の液状のエポキシ樹脂が挙げられる。なお、本明細書において、重量平均分子量は、高速液体クロマトグラフィーで測定した値とする。
【0010】
(a)成分のエポキシ樹脂のエポキシ当量は、150〜250が好ましく、より好ましくは180〜190である。重量平均分子量は、300〜500が好ましく、より好ましくは350〜450である。(a)成分は、耐熱性の点から、99.9%以上の高純度のものが好ましい。また、硬化性及び耐熱性の点から、不純物である加水分解性塩素量が200ppm以下であるものが好ましい。(a)成分のエポキシ樹脂は、単独でも2種以上併用することもできる。ここで、加水分解性塩素量は、エポキシ樹脂を水酸化カリウム溶液で加水分解し、イオン化した塩素の量を水酸化カリウムの消費量を測定することによって求めた値をいうこととする。
【0011】
また、本発明の樹脂組成物における、(b)エポキシ当量が500以上、かつ1000以下であり、重量平均分子量が10000以上の反応末端にエポキシを有するエポキシ樹脂は、特に限定されない。(b)成分のエポキシ樹脂は、直鎖状のユニットを有するエポキシ樹脂が好ましく、直鎖状にオリゴマー化したエポキシ樹脂を、アミン類等で更に高分子化させたものが特に好ましい。例えば、ビスフェノールAジグリシジルエーテルと酸無水物を反応させてオリゴマー化した樹脂を、ジアミノジフェニルメタンで高分子化したものであって、反応末端にエポキシ基を有しており、エポキシ当量が500以上、かつ1000以下であり、重量平均分子量が10000以上のものが挙げられる。
【0012】
(b)成分のエポキシ樹脂のエポキシ当量は、600〜900が好ましく、より好ましくは700〜800である。重量平均分子量は、10,000〜50,000が好ましく、より好ましくは10,000〜30,000である。(b)成分のエポキシ樹脂は、単独でも2種以上併用することもできる。
【0013】
また、本発明の樹脂組成物における、(c)エポキシ当量が100以上、かつ1000以下であり、重量平均分子量が500超、かつ5000以下のエポキシ樹脂は、分子内に2個以上のエポキシ基を有するものであれば特に限定されない。また、(c)成分のエポキシ樹脂は、直鎖状であっても、分岐状であってもよい。例えば、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、脂環式エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、多官能フェノールのジグリシジルエーテル化物,多官能アルコールのジグリシジルエーテル化物、これらのハロゲン化物、これらの水素添加物等が挙げられる。具体的には、臭素化ビスフェノールA型エポキシ樹脂を使用することができる。
【0014】
(c)成分のエポキシ樹脂のエポキシ当量は、300〜600が好ましく、より好ましくは450〜500である。重量平均分子量は、1,000〜3,000が好ましく、より好ましくは1,500〜2,500である。(c)成分のエポキシ樹脂は、単独でも2種以上併用することもできる。
【0015】
本発明の樹脂組成物における、(d)硬化剤としては、エポキシ樹脂の硬化促進剤として用いられるものであれば、特に限定されず、アミン類、フェノール類、酸無水物等が挙げられる。電気絶縁性ワニス用に通常用いられているものが好ましい。
【0016】
アミン類としては、ジエチルアミン、ジエチレントリアミン、トリエチレンテトラミン、ジエチルアミノプロピルアミン、アミノエチルピペラジン、メンセンジアミン、メタキシリレンジアミン、ジシアンジアミド、ジアミノジフェニルメタン、ジアミノジフェニルスルフォン、メチレンジアニリン、メタフェニレンジアミン等が挙げられる。
【0017】
フェノール類としては、ビフェノール、ビスフェノールA、ビスフェノールF、フェノールノボラック、クレゾールノボラック、ビスフェノールAノボラックおよびこれらのハロゲン化物,アルキル基(例えば、メチル基、エチル基等)置換体等が挙げられる。
【0018】
酸無水物としては、無水ヘキサヒドロフタル酸(HPA)、無水テトラヒドロフタル酸(THPA)、無水ピロメリット酸(PMDA)、無水クロレンド酸(HET)、無水ナディック酸(NA)、無水メチルナディック酸(MNA)、無水ドデシニルコハク酸(DDSA)、無水フタル酸(PA)、メチルヘキサヒドロ無水フタル酸(MeHPA)、無水マレイン酸等が挙げられる。
【0019】
(d)成分の硬化剤は、好ましくは、アミン類であり、特に好ましくは、ジシアンジアミドである。(d)成分の硬化剤は、単独でも2種以上併用することもできる。
【0020】
本発明の樹脂組成物における、(e)硬化促進剤としては、イミダゾール化合物、有機リン化合物、第三級アミン、第四級アンモニウム塩等が挙げられるが、第二級アミノ基をアクリロニトリル、イソシアネート、メラミン、アクリレート等でマスク化したイミダゾール化合物が、プリプレグの保存安定性の点から好ましい。
【0021】
イミダゾール化合物としては、イミダゾール、2−メチルイミダゾール、2−エチル−4−メチルイミダゾール、2−フェニルイミダゾール、2−ウンデシルイミダゾール、1−ベンジル−2−メチルイミダゾール、2−ヘプタデシルイミダゾール、4,5−ジフェニルイミダゾール、2−メチルイミダゾリン、2−エチル−4−メチルイミダゾリン、2−フェニルイミダゾリン、2−ウンデシルイミダゾリン、2−ヘプタデシルイミダゾリン、2−イソプロピルイミダゾール、2,4−ジメチルイミダゾール、2−フェニル−4−メチルイミダゾール、2−メチルイミダゾリン、2−イソプロピルイミダゾリン、2,4−ジメチルイミダゾリン、2−フェニル−4−メチルイミダゾリン等が挙げられる。
マスク化剤としてはアクリロニトリル、フェニレンジイソシアネート、トルエンジイソシアネート、ナフタレンジイソシアネート、ヘキサメチレンジイソシアネート、メチレンビスフェニルイソシアネート、メラミンアクリレート等が挙げられる。(e)成分の硬化促進剤は、単独でも2種以上併用することもできる。
【0022】
本発明の樹脂組成物において、(a)成分、(b)成分及び(c)成分のエポキシ樹脂の配合量は、(a)〜(c)成分のエポキシ樹脂の合計100重量部に対して、(a)成分は、0.1〜2重量部であり、好ましくは1〜2重量部であり、(b)成分は、1〜15重量部であり、好ましくは3〜10重量部である。(a)成分を、上記の範囲で配合すると、ピール強度及びTgの点から点から好ましく、(b)成分を、上記の範囲で配合すると、樹脂流れ及びTgの点から好ましい。
【0023】
上記の(a)成分及び(b)成分の配合量から、(c)成分は、(a)〜(c)成分の合計に対して、83〜98.9重量部であり、好ましくは、88〜96重量部である。
【0024】
本発明の樹脂組成物において、(d)成分は、(a)〜(c)成分のエポキシ樹脂の合計100重量部に対して、好ましくは1〜4重量部であり、より好ましくは1.5〜3重量部である。(d)成分を、上記の範囲で配合すると、耐熱性及びTgの点から好ましい。
【0025】
本発明の樹脂組成物において、(e)成分は、(a)〜(c)成分のエポキシ樹脂の合計100重量部に基づいて、好ましくは0.1〜0.5重量部であり、より好ましくは0.2〜0.3重量部である。(e)成分を、上記の範囲で配合すると、耐熱性及びTgの点から好ましい。
【0026】
本発明の樹脂組成物には、上記の成分の他に、必要に応じて着色剤、酸化防止剤、還元剤、紫外線不透過剤等を加えてもよい。また、打抜き加工性やドリル加工性を低下させない程度に充填剤を加えてもよい。
【0027】
本発明の樹脂組成物を溶媒で希釈して樹脂ワニスとすることができる。溶媒は、特に限定されないが、例えば、メチルエチルケトン、アセトン、メチルエチルケトン、メチルイソブチルケトン、シクロヘキサノン等のケトン類;メタノール、エタノール、エチレングリコール、プロピレングリコールモノメチルエーテル等のアルコール類;N−メチルホルムアミド、N,N−ジメチルホルムアミド、N,N−ジメチルアセトアミド、N−メチルピロリドン等のアミド類等の溶媒が挙げられる。溶媒は、樹脂組成物の総重量に対して、30重量%〜70重量%の範囲で使用することが好ましい。
【0028】
また、本発明の樹脂組成物又は上記の樹脂ワニスを、ガラス織布またはガラス不織布に含浸させて、乾燥させることによりプリプレグを得ることができる。プリプレグを製造する時の乾燥条件は、プリプレグ特性に合わせて自由に選択することができるが、例えば、乾燥温度60〜200℃、乾燥時間1〜30分間の範囲とすることが挙げられる。
【0029】
ここで使用するガラス織布またはガラス不織布の種類は、特に限定されないが、例えば、厚さ0.02〜0.4mmの範囲のものを、目的のプリプレグまたは積層板の厚さに合わせて使用することができる。
【0030】
目的とする積層板の厚みに合わせて得られたプリプレグを積層し、その片側または両側に金属箔を重ね、加熱加圧して積層板を製造することができる。金属箔としては主に銅箔やアルミ箔を用いるが、他の金属箔を用いてもよい。金属箔の厚みは、特に限定されないが、5〜200μmの範囲が挙げられる。積層板製造時の加熱温度及び圧力は、プリプレグ特性や、プレス機の能力、目的の積層板の厚み等により選択することができるが、例えば、130〜200℃、好ましくは160〜180℃の加熱温度、0.5〜10MPa、好ましくは1〜4Mpaの圧力が挙げられる。
【0031】
さらに、この積層板の金属箔を回路加工することにより、プリント配線板とすることができる。これらプリプレグ、積層板、プリント配線板の製造においては、当該業界における通常の塗工、積層、回路加工技術を適用することができる。
【0032】
【実施例】
以下、実施例により本発明を具体的に説明するが、本発明はこれらに限られるものではない。なお、「部」は「重量部」を示す。
【0033】
(実施例1)
(a)成分:DER331L(ダウケミカル製) 1部
(ビスフェノールA型エポキシ樹脂、エポキシ当量185、重量平均分子量400)
(b)成分:XZ−92505(ダウケミカル製) 9部
(エポキシ当量800、重量平均分子量10000)
(c)成分:臭素化ビスフェノールA型エポキシ樹脂 90部
(エポキシ当量480、重量平均分子量1900)
(d)成分:ジシアンジアミド 2.5部
(e)成分:2−エチル−4−メチルイミダゾール 0.2部
上記成分をメチルエチルケトンに溶解し、不揮発分65%のワニスを作製した。このワニスの160℃におけるゲル化時間は、200秒であった。このワニスをガラス織布(厚み0.2mm、坪量210g/m2)に樹脂分が45%となるように含浸させ、170℃、5分間で乾燥させて、170℃におけるゲル化時間が70秒となるプリプレグを得た。このプリプレグを4枚重ねたものの両面に、18μmの銅箔を配し、170℃、90分、4MPaでプレス成形し、厚さ0.8mmのFR−4積層板を得た。
【0034】
(実施例2)
(a)成分:DER331L(ダウケミカル製) 2部
(ビスフェノールA型エポキシ樹脂、エポキシ当量185、重量平均分子量400)
(b)成分:XZ−92505(ダウケミカル製) 8部
(エポキシ当量800、重量平均分子量10000)
(c)成分:臭素化ビスフェノールA型エポキシ樹脂 90部
(エポキシ当量480、重量平均分子量1900)
(d)成分:ジシアンジアミド 2.5部
(e)成分:2−エチル−4−メチルイミダゾール 0.2部
上記成分とメチルエチルケトンを使用して、実施例1と同様のプリプレグのゲル化時間になるようにワニスを調製した。次いで、このワニスを使用して、実施例1と同様にしてプリプレグを作製し、厚さ0.8mmのFR−4積層板を得た。
【0035】
(比較例1)
(a)成分:DER331L(ダウケミカル製) 3部
(ビスフェノールA型エポキシ樹脂、エポキシ当量185、重量平均分子量400)
(b)成分:XZ−92505(ダウケミカル製) 7部
(エポキシ当量800、重量平均分子量10000)
(c)成分:臭素化ビスフェノールA型エポキシ樹脂 90部
(エポキシ当量480、重量平均分子量1900)
(d)成分:ジシアンジアミド 2.5部
(e)成分:2−エチル−4−メチルイミダゾール 0.2部
上記成分とメチルエチルケトンを使用して、実施例1と同様のプリプレグのゲル化時間になるようにワニスを調製した。次いで、このワニスを使用して、実施例1と同様にしてプリプレグを作製し、厚さ0.8mmのFR−4積層板を得た。
【0036】
(比較例2)
(b)成分:DER331L(ダウケミカル製) 2部
(ビスフェノールA型エポキシ樹脂、エポキシ当量185、重量平均分子量400)
(c)成分:臭素化ビスフェノールA型エポキシ樹脂 98部
(エポキシ当量480、重量平均分子量1900)
(d)成分:ジシアンジアミド 2.5部
(e)成分:2−エチル−4−メチルイミダゾール 0.2部
上記成分とメチルエチルケトンを使用して、実施例1と同様のプリプレグのゲル化時間になるようにワニスを調製した。次いで、このワニスを使用して、実施例1と同様にしてプリプレグを作製し、厚さ0.8mmのFR−4積層板を得た。
(比較例3)
(b)成分:XZ−92505(ダウケミカル製) 10部
(エポキシ当量800、重量平均分子量10000)
(c)成分:臭素化ビスフェノールA型エポキシ樹脂 90部
(エポキシ当量480、重量平均分子量1900)
(d)成分:ジシアンジアミド 2.5部
(e)成分:2−エチル−4−メチルイミダゾール 0.2部
上記成分とメチルエチルケトンを使用して、実施例1と同様のプリプレグのゲル化時間になるようにワニスを調製した。次いで、このワニスを使用して、実施例1と同様にしてプリプレグを作製し、厚さ0.8mmのFR−4積層板を得た。
【0037】
(比較例4)
(c)成分:臭素化ビスフェノールA型エポキシ樹脂 100部
(エポキシ当量480、重量平均分子量1900)
(d)成分:ジシアンジアミド 2.6部
(e)成分:2−エチル−4−メチルイミダゾール 0.2部
上記成分とメチルエチルケトンを使用して、実施例1と同様のプリプレグのゲル化時間になるようにワニスを調製した。次いで、このワニスを使用して、実施例1と同様にしてプリプレグを作製し、厚さ0.8mmのFR−4積層板を得た。
【0038】
実施例1、2および比較例1〜4で得られたプリプレグについて樹脂流れを測定し、このプリプレグを用いた積層板について板厚精度、Tg、耐熱性、ピール強度(銅箔引き剥がし強さ)を、以下のようにして測定した。
プリプレグの樹脂流れ:JIS-C-6521に準拠し測定した。
板厚精度:JIS-C-6481に準拠し板厚を測定し、標準偏差を算出した。
Tg:TMAを用いてJIS-C-6481に準拠し測定した。
ピール強度:JIS-C-6481に準拠し測定した。
耐熱性:積層板の表面の銅箔をエッチングで除去し、280℃のはんだ浴に20秒間浸漬させ、ミーズリングやフクレの有無について目視にて評価した。評価基準は○は異常なし、△はミーズリング発生あり、×はフクレの発生ありとした。
【0039】
表1の結果より明らかなように、(a)〜(c)成分のエポキシ樹脂を特定の配合量で含むワニスを用いた、実施例1、2では、耐熱性、ピール強度が良好で、かつTgが低下することなく樹脂流れが小さくなり、板厚精度の向上がみられる。一方、(a)成分及び(b)成分の配合量が本発明の範囲外である比較例1では、Tgも低く、耐熱性も劣ることがわかる。また比較例2、3のように、(a)成分及び(b)成分のいずれか一方、又は両方を含まない場合、耐熱性、樹脂流れ、Tg、ピール強度等のいずれかの特性の低下がみられる。
【0040】
【表1】
【0041】
【発明の効果】
本発明の樹脂組成物を用いることにより、ピール強度、耐熱性が良好で、かつTgが低下することなく、成形時の樹脂流れが向上したプリプレグが得られ、またこのプリプレグを使用することで高板厚精度の積層板を提供することができる。[0001]
[Industrial application fields]
The present invention relates to a resin composition for a printed wiring board, and a resin varnish, a prepreg and a laminate using the same.
[0002]
[Prior art]
For example, a metal foil-clad laminate used in electrical and electronic equipment is made by, for example, impregnating a base material such as glass cloth with a thermosetting resin varnish such as an epoxy resin composition, and then heating and semi-curing the prepreg. The prepreg is manufactured by stacking a required number of sheets, laminating a metal foil such as a copper foil on one side or both sides, and forming by heating and pressing. In addition, the multilayer metal foil-clad laminate is formed on the front and back of the laminate on which the conductor circuit is formed after etching the metal foil on the surface of the metal foil-clad laminate obtained by the above method to form a conductor circuit. A prepreg similar to that described above is stacked, and a metal foil is disposed on one side or both sides of the prepreg, stacked, and heated and pressed to form. As the epoxy resin composition, a low molecular weight epoxy resin having an epoxy equivalent of about 100 to 1000, an amine curing agent, and a curing accelerator are generally used.
[0003]
In recent years, with the demand for higher density and high-speed transmission of printed wiring boards, printed wiring board materials are also required to have improved board thickness accuracy and interlayer thickness accuracy to control insulation reliability, high heat resistance, and impedance characteristics. Has been. In addition, with the demand for thinner printed wiring boards, the thickness of base materials and copper foils has been reduced, and the improvement of the adhesive strength between the base material and copper foil is also required.
[0004]
[Problems to be solved by the invention]
In order to improve the plate thickness accuracy, it is an effective means to suppress the resin flow during molding by changing the molding pressure and heating conditions during heating molding and by changing auxiliary materials. In addition, the plate thickness accuracy is improved by optimizing the gel time. However, in the resin varnish using the low molecular weight epoxy as described above, even if the resin flow and the gelation time are optimized, it is difficult to suppress the resin flow during molding, and sufficient plate thickness accuracy cannot be obtained. Therefore, blending a linear high molecular weight resin component, a rubbery component and a filler into the resin varnish is an effective means for suppressing the resin flow of the prepreg. However, the blending of fillers tends to decrease the punching characteristics, drilling workability, heat resistance, etc. when processing printed wiring boards, and linear high molecular weight epoxy resins (for example, phenoxy resins) and rubber-like When the components are blended singly, the appearance of the prepreg at the time of drying deteriorates as the amount added increases, and the Tg, heat resistance and peel strength of the resulting laminate are reduced.
[0005]
In response to such a requirement, a linear epoxy resin having an epoxy group at a reaction terminal having an epoxy equivalent of 100 to 1000 and a weight average molecular weight of 10,000 or more, and an epoxy equivalent of 100 to 1000 and a weight average molecular weight of 5000 or less. It has been proposed to improve plate thickness accuracy by using an epoxy resin composition in combination with an epoxy resin (see, for example, Patent Document 1). However, this epoxy resin composition has been required to further improve the peel strength while maintaining good Tg and heat resistance when used as a printed wiring board.
[0006]
[Patent Document 1]
JP-A-2002-114855 [0007]
[Problems to be solved by the invention]
An object of the present invention is to provide a resin composition for a printed wiring board in which a prepreg having good heat resistance and peel strength and improved resin flow during molding can be obtained without lowering Tg.
[0008]
[Means for Solving the Problems]
The present invention includes (a) a linear epoxy resin having an epoxy equivalent of 100 or more and 300 or less and a weight average molecular weight of 500 or less, and (b) an epoxy equivalent of 500 or more and 1000 or less, and a weight. An epoxy resin having an epoxy group at the reaction terminal having an average molecular weight of 10,000 or more, (c) an epoxy resin having an epoxy equivalent of 100 or more and 1000 or less, and a weight average molecular weight of more than 500 and 5000 or less, ( d) a curing agent, and (e) a curing accelerator, and (a) component is 0.1 to 2 parts by weight with respect to 100 parts by weight in total of component (a), component (b) and component (c). It is related with the resin composition for printed wiring boards whose (b) component is 1-15 weight part. Moreover, this invention relates to the resin varnish for printed wiring boards using this resin composition for printed wiring boards, the prepreg for printed wiring boards, and a metal-clad laminated board.
[0009]
In the resin composition of the present invention, (a) a linear epoxy resin having an epoxy equivalent of 100 or more and 300 or less and a weight average molecular weight of 500 or less is not particularly limited. For example, bisphenol A type epoxy resin And liquid epoxy resins such as bisphenol F-type epoxy resins. In the present specification, the weight average molecular weight is a value measured by high performance liquid chromatography.
[0010]
(A) As for the epoxy equivalent of the epoxy resin of a component, 150-250 are preferable, More preferably, it is 180-190. The weight average molecular weight is preferably 300 to 500, and more preferably 350 to 450. The component (a) preferably has a high purity of 99.9% or more from the viewpoint of heat resistance. Further, from the viewpoint of curability and heat resistance, those having an amount of hydrolyzable chlorine as an impurity of 200 ppm or less are preferable. The epoxy resin as component (a) can be used alone or in combination of two or more. Here, the amount of hydrolyzable chlorine means a value obtained by hydrolyzing an epoxy resin with a potassium hydroxide solution and measuring the amount of ionized chlorine by measuring the consumption amount of potassium hydroxide.
[0011]
In the resin composition of the present invention, (b) the epoxy resin having an epoxy equivalent of 500 or more and 1000 or less and having an epoxy at the reaction terminal having a weight average molecular weight of 10,000 or more is not particularly limited. The epoxy resin as component (b) is preferably an epoxy resin having a linear unit, and an epoxy resin obtained by further oligomerizing a linear oligomerized epoxy resin with an amine or the like is particularly preferable. For example, a resin obtained by reacting bisphenol A diglycidyl ether with an acid anhydride and polymerized with diaminodiphenylmethane, having an epoxy group at the reaction end, having an epoxy equivalent of 500 or more, And those having a weight average molecular weight of 10,000 or more.
[0012]
As for the epoxy equivalent of the epoxy resin of (b) component, 600-900 are preferable, More preferably, it is 700-800. The weight average molecular weight is preferably 10,000 to 50,000, more preferably 10,000 to 30,000. The epoxy resin as component (b) can be used alone or in combination of two or more.
[0013]
In the resin composition of the present invention, (c) an epoxy resin having an epoxy equivalent of 100 or more and 1000 or less, a weight average molecular weight of more than 500, and 5000 or less has two or more epoxy groups in the molecule. If it has, it will not specifically limit. Further, the epoxy resin of component (c) may be linear or branched. For example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, bisphenol S type epoxy resin, alicyclic epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, bisphenol A novolac type epoxy resin, difunctional phenol di Examples thereof include glycidyl etherified products, diglycidyl etherified products of polyfunctional alcohols, halides thereof, and hydrogenated products thereof. Specifically, brominated bisphenol A type epoxy resin can be used.
[0014]
As for the epoxy equivalent of the epoxy resin of (c) component, 300-600 are preferable, More preferably, it is 450-500. The weight average molecular weight is preferably 1,000 to 3,000, more preferably 1,500 to 2,500. The epoxy resin as component (c) can be used alone or in combination of two or more.
[0015]
The (d) curing agent in the resin composition of the present invention is not particularly limited as long as it is used as an epoxy resin curing accelerator, and examples thereof include amines, phenols, and acid anhydrides. Those usually used for electrical insulating varnishes are preferred.
[0016]
Examples of amines include diethylamine, diethylenetriamine, triethylenetetramine, diethylaminopropylamine, aminoethylpiperazine, mensendiamine, metaxylylenediamine, dicyandiamide, diaminodiphenylmethane, diaminodiphenylsulfone, methylenedianiline, and metaphenylenediamine. .
[0017]
Examples of the phenols include biphenol, bisphenol A, bisphenol F, phenol novolak, cresol novolak, bisphenol A novolak, halides thereof, alkyl group (for example, methyl group, ethyl group and the like) substituents, and the like.
[0018]
Acid anhydrides include hexahydrophthalic anhydride (HPA), tetrahydrophthalic anhydride (THPA), pyromellitic anhydride (PMDA), chlorendic anhydride (HET), nadic anhydride (NA), and methyl nadic anhydride (MNA), dodecynyl succinic anhydride (DDSA), phthalic anhydride (PA), methylhexahydrophthalic anhydride (MeHPA), maleic anhydride and the like.
[0019]
The curing agent as component (d) is preferably an amine, and particularly preferably dicyandiamide. (D) The hardening | curing agent of a component can also be used individually or in combination with 2 or more types.
[0020]
Examples of the (e) curing accelerator in the resin composition of the present invention include an imidazole compound, an organic phosphorus compound, a tertiary amine, a quaternary ammonium salt, etc., but the secondary amino group is acrylonitrile, isocyanate, An imidazole compound masked with melamine, acrylate or the like is preferable from the viewpoint of storage stability of the prepreg.
[0021]
As the imidazole compound, imidazole, 2-methylimidazole, 2-ethyl-4-methylimidazole, 2-phenylimidazole, 2-undecylimidazole, 1-benzyl-2-methylimidazole, 2-heptadecylimidazole, 4,5 -Diphenylimidazole, 2-methylimidazoline, 2-ethyl-4-methylimidazoline, 2-phenylimidazoline, 2-undecylimidazoline, 2-heptadecylimidazoline, 2-isopropylimidazole, 2,4-dimethylimidazole, 2-phenyl Examples include -4-methylimidazole, 2-methylimidazoline, 2-isopropylimidazoline, 2,4-dimethylimidazoline, 2-phenyl-4-methylimidazoline.
Examples of the masking agent include acrylonitrile, phenylene diisocyanate, toluene diisocyanate, naphthalene diisocyanate, hexamethylene diisocyanate, methylene bisphenyl isocyanate, and melamine acrylate. (E) The hardening accelerator of a component can also be used individually or in combination with 2 or more types.
[0022]
In the resin composition of the present invention, the amount of the (a) component, the (b) component, and the (c) component epoxy resin is 100 parts by weight in total of the (a) to (c) component epoxy resins. (A) component is 0.1-2 weight part, Preferably it is 1-2 weight part, (b) component is 1-15 weight part, Preferably it is 3-10 weight part. When component (a) is blended within the above range, it is preferable from the viewpoint of peel strength and Tg, and when component (b) is blended within the above range, it is preferable from the viewpoint of resin flow and Tg.
[0023]
From the compounding quantity of said (a) component and (b) component, (c) component is 83-98.9 weight part with respect to the sum total of (a)-(c) component, Preferably, it is 88 -96 parts by weight.
[0024]
In the resin composition of the present invention, the component (d) is preferably 1 to 4 parts by weight, more preferably 1.5 parts with respect to 100 parts by weight of the total of the epoxy resins of the components (a) to (c). ~ 3 parts by weight. When the component (d) is blended in the above range, it is preferable from the viewpoint of heat resistance and Tg.
[0025]
In the resin composition of the present invention, the component (e) is preferably 0.1 to 0.5 parts by weight, more preferably based on 100 parts by weight of the total of the epoxy resins of the components (a) to (c). Is 0.2 to 0.3 parts by weight. When (e) component is mix | blended in said range, it is preferable from the point of heat resistance and Tg.
[0026]
In addition to the above components, a colorant, an antioxidant, a reducing agent, an ultraviolet opaque agent, and the like may be added to the resin composition of the present invention as necessary. Moreover, you may add a filler to such an extent that punch workability and drill workability are not reduced.
[0027]
The resin composition of the present invention can be diluted with a solvent to obtain a resin varnish. The solvent is not particularly limited, but for example, ketones such as methyl ethyl ketone, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone; alcohols such as methanol, ethanol, ethylene glycol, propylene glycol monomethyl ether; N-methylformamide, N, N -Solvents such as amides such as dimethylformamide, N, N-dimethylacetamide and N-methylpyrrolidone. The solvent is preferably used in the range of 30% to 70% by weight with respect to the total weight of the resin composition.
[0028]
Moreover, a prepreg can be obtained by impregnating a glass woven fabric or a glass nonwoven fabric with the resin composition of the present invention or the above resin varnish and drying it. The drying conditions for producing the prepreg can be freely selected according to the prepreg characteristics, and examples include a drying temperature of 60 to 200 ° C. and a drying time of 1 to 30 minutes.
[0029]
Although the kind of glass woven fabric or glass nonwoven fabric used here is not specifically limited, For example, the thing of the range of thickness 0.02-0.4mm is used according to the thickness of the target prepreg or laminated board. be able to.
[0030]
A prepreg obtained according to the thickness of the target laminate can be laminated, a metal foil can be placed on one or both sides, and heated and pressed to produce a laminate. As the metal foil, copper foil or aluminum foil is mainly used, but other metal foil may be used. Although the thickness of metal foil is not specifically limited, The range of 5-200 micrometers is mentioned. The heating temperature and pressure during the production of the laminated plate can be selected depending on the prepreg characteristics, the capacity of the press, the thickness of the desired laminated plate, and the like. For example, heating at 130 to 200 ° C, preferably 160 to 180 ° C The temperature is 0.5 to 10 MPa, preferably 1 to 4 MPa.
[0031]
Furthermore, it can be set as a printed wiring board by carrying out circuit processing of the metal foil of this laminated board. In the production of these prepregs, laminates, and printed wiring boards, ordinary coating, lamination, and circuit processing techniques in the industry can be applied.
[0032]
【Example】
EXAMPLES Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited thereto. “Parts” indicates “parts by weight”.
[0033]
(Example 1)
(A) Component: DER331L (manufactured by Dow Chemical) 1 part (bisphenol A type epoxy resin, epoxy equivalent 185, weight average molecular weight 400)
(B) Component: 9 parts of XZ-92505 (manufactured by Dow Chemical) (epoxy equivalent 800, weight average molecular weight 10,000)
Component (c): 90 parts of brominated bisphenol A type epoxy resin (epoxy equivalent 480, weight average molecular weight 1900)
(D) Component: Dicyandiamide 2.5 parts (e) Component: 2-ethyl-4-methylimidazole 0.2 parts The above components were dissolved in methyl ethyl ketone to prepare a varnish having a nonvolatile content of 65%. The gel time at 160 ° C. of this varnish was 200 seconds. This varnish was impregnated into a glass woven fabric (thickness 0.2 mm, basis weight 210 g / m 2 ) so that the resin content was 45%, dried at 170 ° C. for 5 minutes, and the gelation time at 170 ° C. was 70. A second prepreg was obtained. Four prepregs were stacked, 18 μm copper foil was placed on both sides, and press molded at 170 ° C. for 90 minutes at 4 MPa to obtain a FR-4 laminate having a thickness of 0.8 mm.
[0034]
(Example 2)
(A) Component: DER331L (manufactured by Dow Chemical) 2 parts (bisphenol A type epoxy resin, epoxy equivalent 185, weight average molecular weight 400)
Component (b): XZ-92505 (manufactured by Dow Chemical) 8 parts (epoxy equivalent 800, weight average molecular weight 10,000)
Component (c): 90 parts of brominated bisphenol A type epoxy resin (epoxy equivalent 480, weight average molecular weight 1900)
(D) Component: Dicyandiamide 2.5 parts (e) Component: 2-ethyl-4-methylimidazole 0.2 part Using the above components and methyl ethyl ketone, the same prepreg gelation time as in Example 1 was obtained. A varnish was prepared. Next, using this varnish, a prepreg was produced in the same manner as in Example 1 to obtain a FR-4 laminate having a thickness of 0.8 mm.
[0035]
(Comparative Example 1)
(A) component: DER331L (made by Dow Chemical) 3 parts (bisphenol A type epoxy resin, epoxy equivalent 185, weight average molecular weight 400)
(B) Component: 7 parts of XZ-92505 (manufactured by Dow Chemical) (epoxy equivalent 800, weight average molecular weight 10,000)
Component (c): 90 parts of brominated bisphenol A type epoxy resin (epoxy equivalent 480, weight average molecular weight 1900)
(D) Component: Dicyandiamide 2.5 parts (e) Component: 2-ethyl-4-methylimidazole 0.2 part Using the above components and methyl ethyl ketone, the same prepreg gelation time as in Example 1 was obtained. A varnish was prepared. Next, using this varnish, a prepreg was produced in the same manner as in Example 1 to obtain a FR-4 laminate having a thickness of 0.8 mm.
[0036]
(Comparative Example 2)
(B) Component: DER331L (manufactured by Dow Chemical) 2 parts (bisphenol A type epoxy resin, epoxy equivalent 185, weight average molecular weight 400)
Component (c): 98 parts brominated bisphenol A type epoxy resin (epoxy equivalent 480, weight average molecular weight 1900)
(D) Component: Dicyandiamide 2.5 parts (e) Component: 2-ethyl-4-methylimidazole 0.2 part Using the above components and methyl ethyl ketone, the same prepreg gelation time as in Example 1 was obtained. A varnish was prepared. Next, using this varnish, a prepreg was produced in the same manner as in Example 1 to obtain a FR-4 laminate having a thickness of 0.8 mm.
(Comparative Example 3)
(B) Component: 10 parts of XZ-92505 (manufactured by Dow Chemical) (epoxy equivalent 800, weight average molecular weight 10,000)
Component (c): 90 parts of brominated bisphenol A type epoxy resin (epoxy equivalent 480, weight average molecular weight 1900)
(D) Component: Dicyandiamide 2.5 parts (e) Component: 2-ethyl-4-methylimidazole 0.2 part Using the above components and methyl ethyl ketone, the same prepreg gelation time as in Example 1 was obtained. A varnish was prepared. Next, using this varnish, a prepreg was produced in the same manner as in Example 1 to obtain a FR-4 laminate having a thickness of 0.8 mm.
[0037]
(Comparative Example 4)
Component (c): 100 parts of brominated bisphenol A type epoxy resin (epoxy equivalent 480, weight average molecular weight 1900)
(D) Component: Dicyandiamide 2.6 parts (e) Component: 2-ethyl-4-methylimidazole 0.2 part Using the above components and methyl ethyl ketone, the same prepreg gelation time as in Example 1 was obtained. A varnish was prepared. Next, using this varnish, a prepreg was produced in the same manner as in Example 1 to obtain a FR-4 laminate having a thickness of 0.8 mm.
[0038]
The resin flow was measured for the prepregs obtained in Examples 1 and 2 and Comparative Examples 1 to 4, and the sheet thickness accuracy, Tg, heat resistance, and peel strength (copper foil peel strength) of the laminate using this prepreg. Was measured as follows.
Prepreg resin flow: Measured according to JIS-C-6521.
Plate thickness accuracy: The plate thickness was measured according to JIS-C-6481, and the standard deviation was calculated.
Tg: Measured according to JIS-C-6481 using TMA.
Peel strength: measured in accordance with JIS-C-6481.
Heat resistance: The copper foil on the surface of the laminate was removed by etching, immersed in a solder bath at 280 ° C. for 20 seconds, and the presence or absence of measling or swelling was visually evaluated. The evaluation criteria were as follows: ○: no abnormality, Δ: occurrence of mesuring, and ×: occurrence of swelling.
[0039]
As is clear from the results in Table 1, in Examples 1 and 2 using varnishes containing the epoxy resins of the components (a) to (c) in a specific blending amount, heat resistance and peel strength are good, and The resin flow is reduced without a decrease in Tg, and the plate thickness accuracy is improved. On the other hand, in Comparative Example 1 in which the blending amounts of the component (a) and the component (b) are out of the range of the present invention, it is understood that Tg is low and heat resistance is also inferior. In addition, as in Comparative Examples 2 and 3, when either one or both of the component (a) and the component (b) is not included, any deterioration in characteristics such as heat resistance, resin flow, Tg, and peel strength may occur. Be looked at.
[0040]
[Table 1]
[0041]
【The invention's effect】
By using the resin composition of the present invention, a prepreg having excellent peel strength and heat resistance and improved resin flow at the time of molding without lowering Tg can be obtained. A laminated plate with a plate thickness accuracy can be provided.
Claims (4)
(b)エポキシ当量が500以上、かつ1000以下であり、重量平均分子量が10000以上である、末端にエポキシ基を有するエポキシ樹脂、
(c)エポキシ当量が100以上、かつ1000以下であり、重量平均分子量が500超、かつ5000以下である、エポキシ樹脂、
(d)硬化剤、及び
(e)硬化促進剤
を含み、かつ(a)成分、(b)成分及び(c)成分の合計100重量部に対し、(a)成分が0.1〜2重量部であり、(b)成分が1〜15重量部である、プリント配線板用樹脂組成物。(A) a linear epoxy resin having an epoxy equivalent of 100 or more and 300 or less and a weight average molecular weight of 500 or less;
(B) an epoxy resin having an epoxy group at the terminal, having an epoxy equivalent of 500 or more and 1000 or less, and a weight average molecular weight of 10,000 or more;
(C) an epoxy resin having an epoxy equivalent of 100 or more and 1000 or less, a weight average molecular weight of more than 500 and 5000 or less,
(D) a curing agent, and (e) a curing accelerator, and (a) component is 0.1 to 2 weight with respect to a total of 100 parts by weight of component (a), component (b) and component (c). Part, and the resin composition for printed wiring boards whose (b) component is 1-15 weight part.
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