JP4268295B2 - Processing equipment - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a processing apparatus. More specifically, the present invention relates to a development processing apparatus for a tabular silver halide photographic material having a silver halide photosensitive layer on a support having an average thickness of 2 mm or more.
[0002]
[Prior art]
According to Isao Tanabe, Yoichi Takehana and Morihisa Homoto, “The Story of Photomask Technology” Industrial Research Council (1996), in recent years, with the fine patterning of printed circuit boards, the basics of exposure masks for manufacturing printed circuit boards The material is moving from film to glass. In addition, since an exposure mask for manufacturing a liquid crystal display, LSI, or the like requires high accuracy, a thick substrate such as glass is required.
[0003]
As an exposure mask material based on glass, an emulsion mask having a silver halide emulsion layer on a substrate is inexpensive and simple. In addition, in Japanese Patent Application No. 10-170418 and Japanese Patent Application No. 11-111050, we have already proposed an exposure mask (DTR mask) in which a silver image is directly formed on a transparent substrate by a diffusion transfer method. . However, in both the emulsion mask and the DTR mask, the so-called “Daizen”, which is manually immersed in the processing solution in the vat, is the mainstream, and an automatic development processing apparatus with high workability has been awaited. However, due to the thickness of the substrate, a large amount of waste liquid is generated when the liquid level during non-immersion is controlled by overflow, as in existing automatic development processing equipment for film, and can be processed stably with a small amount of processing liquid. The developing machine was considered difficult.
[0004]
[Problems to be solved by the invention]
An object of the present invention is to provide an automatic development processing apparatus capable of stably developing a halogenated photographic silver photosensitive material composed of a thick support with a small amount of processing solution.
[0005]
[Means for Solving the Problems]
  As a result of the study, the present inventors have developed a processing apparatus for a tabular silver halide photographic light-sensitive material having a photosensitive silver halide emulsion layer on a support having an average thickness of 2 mm or more, and comprises two or more processing tanks. At least one of which determines the maximum liquid level by an overflow mechanism, andThe liquid level when the photosensitive material is not immersed is lower than the overflow surface.The above-described problems can be solved by a processing apparatus having a function of replenishing the processing solution so that the liquid level during immersion of the photosensitive material always becomes an overflow surface. More preferably, it is composed of a processing tank of at least three steps of development, fixing and washing, at least the developing tank and the fixing tank determine the maximum liquid level by an overflow mechanism, andThe liquid level when the photosensitive material is not immersed is lower than the overflow surface.The above problems could be solved by a processing apparatus having a function of replenishing the processing solution so that the liquid level during immersion of the photosensitive material always becomes an overflow surface. More preferably, it has at least two types of replenishment methods of replenishment at the end of processing and replenishment at the elapse of a fixed time, and more preferably has a replenishment method at startup after stopping the processing apparatusThe liquid level when the photosensitive material is not immersed is lower than the overflow surface.By having a function of replenishing the liquid surface to become an overflow surface when the photosensitive material is immersed, the above problem can be solved. More preferably, at least the maximum liquid amount in the developing tank and the fixing tank is not more than 30 times the maximum size of the photosensitive material to be processed, whereby the above problem can be solved. More preferably, the photosensitive material is supported so that the photosensitive layer surface of the photosensitive material stands upright in the vertical direction, the photosensitive material is lowered and immersed in the processing tank, and after a certain time, the photosensitive material is raised and transferred to the next processing tank. Processing equipmentAt the topWe were able to solve the problem.
[0006]
DETAILED DESCRIPTION OF THE INVENTION
The present invention is described in detail below.
[0007]
The silver halide photographic light-sensitive material processed by the processing apparatus of the present invention refers to a flat plate, that is, a thin plate having a thickness of 2 mm to 10 mm, preferably 2 mm to 6 mm used for photomask applications. A flat plate is not a term for the shape of silver halide grains. Since the thickness varies due to the accuracy of the manufacturing process, it is expressed in the present invention as an average thickness that is an average value of 10 or more thicknesses. Examples of the flat photosensitive material include the above-described emulsion mask. Furthermore, the DTR mask described above includes steps that are difficult to perform manually, such as removing the silver halide emulsion. In addition, by stabilizing the processing conditions by automation, a very high-quality photomask can be obtained. Therefore, it can be said that this is the most suitable photosensitive material for the development processing apparatus of the present invention.
[0008]
The DTR mask forms a silver film on a glass substrate according to the principle of a silver complex diffusion transfer method (DTR method). As described in US Pat. No. 2,235,2014 or “Photographic Silver Halide Diffusion Processes”, Andre Rott, Edith Weyde, The Focal Press (1972), the DTR method dissolves unexposed silver halide. Then, it is converted into a soluble silver complex compound, which diffuses in the silver halide emulsion layer and is developed at the location of physical development nuclei to form a silver film. On the other hand, latent image nuclei are formed on the exposed silver halide by light irradiation, and are chemically developed in the emulsion layer. When this is washed with warm water after development, the silver halide photographic photosensitive layer containing water-soluble gelatin as the main binder is removed, and only the silver film formed on the physical development nuclei in the unexposed area remains on the glass substrate. , Form an image.
[0009]
As the thick support for the photosensitive material processed by the processing apparatus of the present invention, any transparent support known to those skilled in the art such as a glass plate and an acrylic plate can be used, but the price, heat resistance, strength, etc. In general, a glass plate is most preferable. The glass plate needs to be selected depending on the application, required performance, etc., for example, soda lime glass such as soda lime, white crown, low expansion glass such as borosilicate, alkali-free, aluminosilicate, synthetic quartz glass, etc. Is mentioned. The thickness of the support of the present invention is preferably defined as an average thickness in consideration of thickness fluctuation caused by production equipment and the like, and the average thickness is 2 mm or more. As a support for a photomask, a photosensitive layer having a thickness of 450 mm × 450 mm or less is 2.3 mm in thickness, and a photomask having a thickness of 5.0 mm or more is generally used.
[0010]
As the photosensitive silver halide emulsion processed by the processing apparatus of the present invention, any emulsion known to those skilled in the art can be used. Examples are described in “The Basics of Revised Photo Engineering” edited by the Japan Photography Society, Corona (1998) and Japanese Patent Application No. 11-111050. As the type of silver halide emulsion, silver chloride, silver chlorobromide, silver chloroiodide, and silver chloroiodobromide are used, and those having a halogen composition of 70 mol% or more are particularly preferable. The average grain size of the silver halide crystals is 0.15 to 0.5 μm, preferably 0.2 to 0.4 μm. The crystal habit of the silver halide crystal may be any of regular hexahedron, regular octahedron, regular hexahedron, flat plate, etc., but regular hexahedron is preferable. A core-shell structure can also be taken. Further, the silver halide emulsion of the present invention can be subjected to chemical sensitization such as reduction sensitization, sulfur sensitization, gold sensitization, gold sulfur sensitization and the like, if necessary, to obtain higher sensitivity. The above silver halide emulsion may be used depending on the sensitizing dye used in ordinary silver halide photographic emulsions for the purpose of adapting to various light sources such as argon laser, helium / neon laser, semiconductor laser, and light emitting diode. Spectral sensitization can be performed. It is necessary to select according to the wavelength and intensity of the light source and the kind of the compound to be added. be able to. Further, in order to cope with image deterioration due to irradiation or halation, dyes and pigments used in ordinary silver halide photographic emulsions can be added.
[0011]
Furthermore, the following additives known to those skilled in the art can be added to the above emulsion as necessary. Anionic, cationic, betaine, nonionic surfactants, thickeners such as carboxymethylcellulose, coating aids such as antifoaming agents, chelating agents such as ethylenediaminetetraacetate, hydroquinone, polyhydroxybenzenes, 3-pyrazolidinones A developing agent such as In addition, stabilizers such as azaindenes and heterocyclic mercapto compounds, and fogging inhibitors can be added. As the binder for the silver halide emulsion layer, water-soluble gelatin alone or in combination with casein, dextrin, gum arabic, polyvinyl alcohol, starch and the like can be used. As the water-soluble gelatin, any of acid-treated gelatin, alkali-treated gelatin, gelatin derivatives, grafted gelatin, low molecular weight gelatin and the like can be used. In the present invention, a hardener known to those skilled in the art may be added to harden the silver halide emulsion layer. However, in the case of a DTR mask, in order to facilitate removal with hot water after development, Therefore, it is preferable not to add a hardener.
[0012]
The physical development nuclei used in the DTR mask may be known ones commonly used in the silver complex diffusion transfer method. For example, metal colloids such as gold and silver or water-soluble salts such as silver, palladium and zinc are mixed with sulfides. Metal sulfides can be used. Various hydrophilic colloids can also be used as the protective colloid. For details and manufacturing methods thereof, see, for example, Japanese Patent Publication No. 48-30562, Japanese Patent Publication Nos. 48-55402, 53-21602, Focal Press, London New York (1972), written by Andre Lot and Edith Weide. , "Photographic Silver Halide Diffusion Processes". Further, a surfactant can be contained as a coating aid.
[0013]
The emulsion mask and DTR mask processing steps are each composed of at least three steps of development, fixing, and water washing. Among these, development and fixing are different in processing principle and processing liquid configuration. The processing steps for emulsion masks are well known to those skilled in the art, and the principles and composition are described in Corona, Inc. (1998), “Basics of Revised Photographic Engineering” edited by the Japan Photographic Society.
[0014]
On the other hand, in the development process of the DTR mask, the latent image nucleus formed by light irradiation with the silver halide in the exposed portion is chemically developed, and the silver halide in the unexposed portion is dissolved with a silver halide solvent to form a soluble silver complex compound. This is a step of diffusing in the silver halide emulsion layer and developing at the location of the physical development nuclei to form a silver film. In the developer of the present invention, developing agents such as polyhydroxybenzenes, 3-pyrazolidinones, alkaline substances such as potassium hydroxide, sodium hydroxide, lithium hydroxide, tribasic sodium phosphate, amine compounds, preservatives Sodium sulfite, thickeners such as carboxymethyl sesulose, antifoggants such as potassium bromide, development modifiers such as polyoxyalkylene compounds, silver halide solvents such as thiosulfates, thiocyanates, cyclic imides In addition, additives such as thiosalicylic acid and mesoionic compounds can be included. The pH of the developer is usually 10-14, preferably 12-14.
[0015]
The fixing process of the DTR mask is a process of removing the silver halide emulsion layer, exposing the glass substrate surface in the non-image area, and exposing the metallic silver image in the image area. Since the main purpose is to remove the silver halide emulsion, the fixing solution of the present invention contains water as a main component and may contain a proteolytic enzyme and a pH buffer component. Moreover, a preservative can be contained in order to prevent the removed gelatin from being spoiled. It is also possible to provide a stopping step between the developing step and the fixing step, neutralize the pH, and further cause the proteolytic enzyme to act, so that the fixing step can be advanced rapidly. Methods for removing the silver halide emulsion include a method in which the roller is brought into contact with the film surface and wound around the roller, and a method in which the roller is brought into contact with the film surface and then slipped off. In order to induce holes, the treatment apparatus according to a preferred embodiment of the present invention uses a shower to peel off in a non-contact manner.
[0016]
The water washing step is the same purpose for the emulsion mask and DTR mask, and the chemicals adhering to the surface are washed away by the previous step, preferably replaced with pure water in the final tank to prevent the precipitation of salt after drying. It is better to improve the preservation. Although pure water can be easily obtained by ion exchange, the conductivity is 2 μS / cm or less, preferably 1 μS / cm or less. Further, for the purpose of improving the storability of the image after washing with water, a step of applying an overcoat protective layer after washing with water and before drying or after washing with water and drying can be provided in the processing apparatus. As the drying step, either hot air drying or room temperature blowing drying can be used. Preferably, a drying method in which a large amount of air is supplied from an air gun or a blower and surface water is blown off by an air knife is preferable.
[0017]
In the processing apparatus of the present invention, at least one tank determines the highest liquid level of the tank by an overflow mechanism. The overflow mechanism is known to those skilled in the art and is used in an automatic film developing machine or the like. FIG. 1 illustrates a cross-sectional structure of a tank having an overflow mechanism as seen from the horizontal direction. FIG. 1 shows a state where the photosensitive material is not immersed. FIG. 2 shows a state in which the photosensitive material 6 is immersed. In a state where the photosensitive material 6 is not immersed, the processing liquid level 5 is at a position lower than the overflow surface 3. When the photosensitive material 6 is immersed in this tank, the liquid level becomes high, and the processing liquid exceeding the overflow level 3 is discharged from the overflow liquid discharge port 1. If the liquid level in the non-immersed state does not exceed the lower limit liquid level 4, it will not be immersed in the processing solution up to the upper part of the photosensitive material.
[0018]
In the automatic film processor, there is almost no discharge of the processing liquid by immersing the film, and the liquid level can be easily maintained by replenishing the amount of liquid taken out to the film and the liquid volume reduced by evaporation. In the case of processing a photosensitive material having a thickness, the processing liquid corresponding to the volume is discharged, and therefore it is not preferable to maintain the liquid level in the state where the photosensitive material is not immersed by overflow.
[0019]
The inventors have found a management method for maintaining the liquid level by replenishment so that the liquid level in a state where the photosensitive material is not immersed exceeds the lower limit liquid level 4. According to this method, the liquid level in the state in which the photosensitive material is not immersed is not always at a constant level, but it may be higher than the lower limit liquid level 4 and not higher than the overflow level 3, and is very strict. There is an advantage that it is not necessary to be a replenishment mechanism.
[0020]
In the processing apparatus of the present invention, various processing solution replenishment methods known to those skilled in the art can be adopted, but the simplest is to use a processing solution which does not require dilution (a type using a stock solution) and has a single concentration. It is a preferred embodiment to combine the two methods of replenishing the above solution without dilution water every time one sheet is processed (replenishment at the end of processing) and replenishing after a certain period of time (replenishment after a certain period of time). As a more preferable aspect, it is preferable to combine a start-up replenishment method that replenishes the processing apparatus after it has been stopped for a long time.
[0021]
In the case of a processing device that targets a flexible support such as an automatic film processor, the photosensitive material is deflected using a roll and a guide so that the photosensitive material enters the liquid, so that the liquid stays in the liquid even if the liquid level drops slightly. Although the time slightly changes, this is not a big problem. However, when the liquid level is lowered in the processing apparatus of the present invention, a portion where the photosensitive material is not immersed in the liquid is induced. Therefore, in the processing apparatus of the present invention, replenishment at the end of processing not only compensates for the fatigue of the liquid due to the processing, but also has a great meaning of replenishing the amount of processing liquid that has decreased during processing and making the liquid level higher than the lower limit liquid level. There is. Since the degree of fatigue varies depending on the composition of the processing solution, the composition of the photosensitive material, the type of processing solution, the structure of the tank, and the like, the optimum replenishment amount cannot be specified unconditionally. It is necessary to set the larger of the replenishment amount necessary for the fatigue of the liquid and the replenishment amount determined to maintain the liquid level. When there are a plurality of sizes of photosensitive materials to be processed, it is easiest to determine the liquid level corresponding to the maximum size and set the replenishment amount. Preferably, setting the liquid level corresponding to the size and determining the replenishment amount corresponding to the size is effective in terms of liquid saving.
[0022]
Similarly, replenishment after a certain period of time not only compensates for liquid fatigue due to air oxidation, but also compensates for liquid level drop due to evaporation. Since the degree of air oxidation differs depending on the structure of the processing tank, the stirring conditions, the temperature and composition of the processing solution, the composition of the photosensitive material, etc., the optimum replenishment amount cannot be specified unconditionally. It is necessary to set the larger one of the replenishment amount required for maintaining the liquid level and the replenishment amount necessary for the liquid fatigue due to oxidation.
[0023]
The purpose of the start-up replenishment method is to compensate for the liquid level drop due to evaporation during the stationary period and to compensate for liquid fatigue due to air oxidation. Since the degree of fatigue varies depending on the composition of the processing solution, the composition of the photosensitive material, the type of processing solution, the structure of the tank, and the like, the optimum replenishment amount cannot be specified unconditionally. It is possible to omit the start-up replenishment method and replenish with a replenishment at the elapse of a certain time, but it is preferable to set a replenishment amount according to the stoppage time after a long stoppage such as the end of consecutive holidays.
[0024]
The inventors of the present invention have found that at least the developing tank and the fixing tank can be stably processed for a long period of time while reducing the amount of processing liquid used by combining the above-described replenishment methods. However, since the liquid level may drop due to troubles such as pump abnormalities, lack of replenishing liquid, tank leakage, etc., the liquid level of the float sensor or the like is preferably at the lowest liquid level that can completely immerse the photosensitive material. It is preferable to attach a sensor and monitor the abnormality.
[0025]
As processing tanks of the processing apparatus of the present invention, processing tanks of any shape known to those skilled in the art can be used. Preferably, however, the photosensitive surface of the photosensitive material is lowered in a substantially vertical direction as shown in FIG. It is preferable to immerse the photosensitive material in the processing solution.
[0026]
FIG. 3 shows a side view of a processing apparatus including a processing tank which is a preferred embodiment of the present invention, and a moving path of the photosensitive material. The processing tank is composed of a developing tank 7, a fixing tank 8, and two washing tanks 9 and 10. The photosensitive material 13 has the photosensitive silver halide emulsion surface 12 standing upright in the vertical direction, first descends into the developing tank 7, rises after a certain time, and descends into the fixing tank 8. After a certain period of time, it rises and falls into the washing tank 9. In the same manner, the liquid is then lowered into the water washing tank 10, raised after a certain time, moved to the drying tank, and dried. In FIG. 3, drying is performed by a method in which the photosensitive material is raised at a slow speed while water is dropped by the air knife 14, but drying can be performed by various methods as described above.
[0027]
Furthermore, as a preferred embodiment of the present invention, as shown in FIG. 4, a tank 16 having a shape in which the width 17 of the tank in the thickness direction of the photosensitive material 15 is reduced, and at least when the developing tank and the fixing tank are full (in the overflow surface). The volume of the processing solution is preferably 30 times or less, more preferably 10 to 20 times the maximum size of the photosensitive material. Thereby, while reducing the amount of processing liquid, the same stability as a large capacity processing tank can be obtained.
[0028]
As a preferred embodiment of the present invention, in at least one of the processing tanks of the processing apparatus of the present invention, the processing in the tank is performed on the image forming surface or the image forming surface and the back surface when the photosensitive material rises after being immersed in the bath for a certain time. It is better to send the liquid and spray it with a shower method. In order to process uniformly over the entire surface of the photosensitive material, it is effective to stir the inside of the solution, but the present inventors have found that it is more effective to spray the processing solution when the photosensitive material is raised. In a processing apparatus that immerses in a processing solution by raising and lowering a photosensitive material, since the immersion time is different between the upper part and the lower part, it is very important to perform uniform processing. In particular, the emulsion mask and the DTR mask are effective in the steps of stopping, fixing, and washing with water.
[0029]
As a more preferred embodiment, in the DTR mask, at least one of the fixing tanks, when the photosensitive material is repeatedly raised and lowered after being immersed in the tank for a certain period of time, and the reciprocating motion of rising and lowering is started. Until the point where the rise is completed after a certain number of reciprocations, the fixing process is stabilized by feeding the processing liquid in the tank to the image forming surface or the image forming surface and the back surface and spraying it with a shower method. I found it. Of course, the liquid in the tank can be sprayed during the up-and-down operation even outside the fixing step. In particular, it is very effective in the water washing process.
[0030]
As a more preferred embodiment, in at least one of the washing tanks, when the photosensitive material is pulled up after being immersed in the washing water, the surface can be finished more cleanly by applying at least the image forming surface with the washing water. Here, the clean water means not to feed and apply the flush water in the flush tank but to apply flush water that has not been used yet, that is, a new liquid. The washing water is preferably pure water and sprayed by a shower method. The pure water tank may be simply sprayed with pure water on the photosensitive material without storing pure water in the tank. When the pure water is accumulated in the tank, the replenishment of the pure water into the tank is preferably carried out by using a clean pure water that has been dropped by showering as described above.
[0031]
In the processing apparatus of the present invention, the photosensitive material is preferably fixed with a fixing jig. Fixing type jigs that grab the periphery of the photosensitive material are the easiest and most stable, but there are problems such as the processing liquid remaining in the gripping part, causing stains, and poor drying. A fixing type jig that does not contact the image forming surface and the back surface as shown in FIG. Further, in the case of a processing apparatus having a shower spraying process, there is a problem that the shower cannot be sprayed on the entire surface unless the fixing jig has a structure in which the glass is exposed. Was found to be effective. In FIG. 5, the photosensitive material 18 is fixed by a fixing part 20 attached to a frame 19 of a jig. The fixing component 20 has a groove as shown in FIG. 5, and the photosensitive material is supported by the groove. Therefore, when the jig shown in FIG. 5 is used, the photosensitive material is supported only at 10 points. Further, when the photosensitive silver halide emulsion surface is erected in the vertical direction, it may be inclined from the vertical direction due to the strength of the jig or the weight of the photosensitive material. In the present invention, the vertical direction does not mean a strict vertical direction, but merely defines a movement type in which the photosensitive material is inserted in a direction substantially perpendicular to the liquid surface, and is in contact with the processing tank wall. There is no problem with the tilt in the range that does not.
[0032]
【Example】
EXAMPLES Hereinafter, although an Example demonstrates this invention further in detail, it is not limited to these.
[0033]
Example 1
On a 508 mm × 610 mm × 4.9 mm soda lime glass base material, a titania sol TA-15 manufactured by Nissan Chemical Industries, Ltd. was applied to a film thickness of 0.3 μm after drying, and heated at 200 ° C. for 30 minutes.
[0034]
<Preparation of emulsion mask>
The silver halide emulsion was prepared by the following method. Using alkali-processed gelatin and doping with 0.006 mmol of potassium hexachloroiridium (IV) having an average particle diameter of 0.25 μm by a control double jet method per mol of silver, 15 mol% of silver bromide, 0 of silver iodide A 0.4 mol% silver chloroiodobromide emulsion was prepared. Thereafter, this emulsion was desalted by a flocculation method. Further, this emulsion was subjected to gold / sulfur sensitization. Further, 1-phenyl-5-mercaptotetrazole was added to this silver halide emulsion at a rate of 10 per mole of silver halide.^-3Mole was added. Then, a hardener was added, and final adjustment was performed so that the gelatin became 1.3 g with respect to 1.0 g of silver halide, and 8 g / m.²Then, it was applied on a glass substrate coated with the above titania sol and dried to prepare an emulsion mask.
[0035]
<Production of processing equipment>
Four treatment tanks (length 742 mm × width 50 mm × height up to overflow level 593 mm, capacity 22 L) having the structure of FIG. 1 were prepared and arranged as shown in FIG. A fixing jig having the structure shown in FIG. 5 was attached to a single-axis robot, and this robot was connected to a sequencer to produce a processing apparatus capable of moving in a vertical direction and a vertical direction by a program. The liquid in the tank is circulated while filtering the liquid in the magnet pump. Separately, the replenisher tank, bellows pump, and treatment tank are connected by a hose, and a replenishment system that can send the replenisher liquid into the tank is installed and connected to the sequencer. Program control.
[0036]
The first tank was used as a developing tank, and a developer eckor manufactured by Mitsubishi Paper Industries Co., Ltd. was injected to the overflow level, and the temperature was kept at 20 ° C. by combining a heater, a chiller, and a temperature controller. The second tank was used as a fixing tank, a fixer diamond super fix manufactured by Mitsubishi Paper Industries Co., Ltd. was injected to the overflow level, and the temperature was kept at 25 ° C. by combining a heater and a temperature controller. The 3rd tank was made into the washing tank, and clean water was inject | poured to the overflow level. The fourth tank was also a washing tank, and pure water was injected to the overflow level.
[0037]
The emulsion mask was image-exposed with a contact printer P-615-D manufactured by Dainippon Screen Mfg. Co., Ltd., and then this was attached to a fixing jig of an automatic processor and processed automatically. It was immersed in the first tank for 4 minutes and in the second tank for 5 minutes. After dipping in the third tank for 5 minutes and in the fourth tank for 5 minutes, it was dried.
[0038]
When the obtained exposure mask was observed, there was no image unevenness or film damage, and a very good mask was obtained.
[0039]
Example 2
In the processing apparatus of Example 1, after the processing of one emulsion mask is completed, the second emulsion mask is immersed in the first tank, and the developer is injected until the liquid level reaches the overflow level. The amount was measured. This liquid amount is the replenishment amount at the end of the minimum processing, but 1.1 times the amount was taken as the replenishment amount at the end of the processing in consideration of slight fluctuations. Similarly, the replenishment amount at the end of the processing was obtained for the second tank to the fourth tank.
[0040]
Next, in the above processing apparatus, the processing liquid in the first tank was poured to the overflow level, and stirring was continued while adjusting the temperature for 10 hours, and the amount of liquid decreased was measured. One-tenth of this liquid amount is the replenishment amount at the time of the minimum fixed time, but 1.1 times the replenishment amount at the elapse of the fixed time was taken into consideration with some fluctuations. Similarly, for the second tank to the fourth tank, the replenishment amount after a predetermined time was obtained.
[0041]
Next, in the above processing apparatus, the processing liquid in the first tank was injected to the overflow level, and stopped for 14 hours, and the amount of liquid decreased was measured. This liquid amount is the replenishment amount at the start after the processing device is stopped, and 1.1 times the replenishment amount at the start after the processing device is stopped is taken into consideration. Similarly, for the second tank to the fourth tank, the replenishment amount at the start after the processing apparatus stopped was determined.
[0042]
The treatment apparatus was operated for 10 hours and stopped for 14 hours for 5 days. Each time one sheet is processed, each tank is replenished with a replenishing amount of processing liquid at the end of processing, each time one hour elapses, each tank is replenished with a replenishing amount of processing liquid when a certain period of time elapses, and each tank is treated with a processing device. After stopping, the program was operated to replenish the replenishment amount at the time of startup. The above-mentioned emulsion mask was exposed and processed 10 times a day in the same manner as in Example 1, and a total of 50 exposure masks obtained were observed. A good mask was obtained. On the other hand, when the above replenishment was not performed, unevenness of the non-immersed part started to occur due to a decrease in liquid level on the fifth sheet after the start of operation.
[0043]
Example 3
The same processing apparatus as in Example 1 except that the width of the first tank was changed to 50 mm, 80 mm, and 110 mm (the maximum size of the photosensitive material is 610 mm × 5 mm × 508 mm and its volume is about 1.55 L, so the capacity of the tank is After each of the liquids in the respective tanks was poured to the overflow level and continuously operated for 48 hours without replenishment, the maximum size of the photosensitive material was 14.2 times, 22.7 times, and 31.2 times. The emulsion mask was exposed and processed in the same manner as in No. 1, and the resulting exposure mask was observed. When a tank with a width of 110 mm was used, a decrease in the optical density of blackened silver was observed. And an 80 mm wide tank were not observed.
[0044]
Example 4
[0045]
<Production of DTR mask>
A palladium sulfide physical development nucleus solution was prepared in an aqueous polyethylene glycol / alkyl ether solution, and the palladium sulfide nucleus amount was 1.0 mg / m on the glass substrate coated with the titania sol of Example 1.²It applied so that it might become. A gelatin solution containing an antihalation dye was applied to the back surface. An emulsion identical to the emulsion mask of Example 1 except that no hardener was included was coated on the physical development nuclei to produce a DTR mask.
[0046]
<Preparation of DTR mask developer>
The following DTR mask developer was prepared.
Sodium hydroxide 20g
Hydroquinone 20g
1-phenyl-3-pyrazolidinone 2g
80 g of anhydrous sodium sulfite
Monomethylethanolamine 6g
Anhydrous sodium thiosulfate 6g
Ethylenediaminetetraacetic acid sodium salt 5g
Made up to 1000 ml with deionized water.
pH (35 ° C.) = 13.3
[0047]
<Preparation of fixer for DTR mask>
A fixing solution for a DTR mask having a pH of 6.0 containing 1 g / L of bioprose 30G manufactured by Nagase Sangyo Co., Ltd. and containing potassium dihydrogen phosphate + sodium hydroxide buffer component was prepared.
[0048]
The first tank of the processing apparatus of Example 1 was used as a developing tank, and the DTR mask developer was injected to the overflow level, and the temperature was kept at 35 ° C. by combining a heater, a chiller, and a temperature controller. The second tank was used as a fixing tank, and the DTR mask fixing solution was injected to the overflow level, and the temperature was kept at 40 ° C. by combining a heater and a temperature controller. The 3rd tank was made into the washing tank, and clean water was inject | poured to the overflow level. The fourth tank was also a washing tank, and pure water was injected to the overflow level.
[0049]
The above DTR mask was image-exposed with a close contact printer P-615-D manufactured by Dainippon Screen Mfg. Co., Ltd., then attached to a fixing jig of an automatic processor, and processed automatically. It was immersed in the first tank for 1 minute and in the second tank for 2 minutes. After dipping in the third tank for 3 minutes and in the fourth tank for 1 minute, it was dried.
[0050]
When the obtained exposure mask was observed, there was no image unevenness or film damage, and a very good mask was obtained. Also, with a combination of DTR mask developer, DTR mask fixer, and DTR mask, replenishment at the end of processing, replenishment after a certain period of time, replenishment at start-up after stopping the processing device as in Example 2 under the above processing conditions. Combined operation, continuous operation for 5 days, 10 exposures per day, processing, and observation of a total of 50 exposure masks obtained, no image unevenness or film damage, very good A mask was obtained. On the other hand, when the above replenishment was not performed, unevenness of the non-immersed part started to occur due to the liquid level drop on the second sheet after the start of operation.
[0051]
Example 5
In the second tank, which is the fixing tank, the photosensitive material is repeatedly raised and lowered for 1 minute every 10 seconds after immersion, and at that time, the liquid in the tank is fed by a magnet pump and then discharged from the shower nozzle. A mask for exposure was prepared in the same manner as in Example 4 except that was sprayed on both sides of the photosensitive material. When the shower was not sprayed (Example 4), a decrease in gloss of the image was observed at the 50th sheet, but no decrease in gloss was observed when the shower was sprayed. Moreover, after processing 50 sheets, when the 3rd tank and the 4th tank which are washing tanks were observed, when not spraying a shower (Example 4), turbidity was observed in the liquid, but turbidity was observed when showering. Was not.
[0052]
Example 6
In Example 5, the liquid in the second tank was processed by 50 sheets without spraying, and the gloss of the image was lowered. In the fourth tank, which was a washing tank containing pure water, 1 minute passed after immersion. When pulling up the photosensitive material from the above, if pure water was fed from a separately prepared pure water tank and sprayed with a shower, the gloss did not decrease. Further, even when 50 sheets were processed continuously, no decrease in gloss was observed, and the turbidity of the fourth tank was improved.
[0053]
【The invention's effect】
As described above, according to the present invention, it is possible to provide an automatic development processing apparatus capable of stably developing a halogenated photographic silver photosensitive material composed of a thick support with a small amount of processing solution.
[Brief description of the drawings]
FIG. 1 is a schematic sectional view of a tank having an overflow mechanism (photosensitive material not immersed)
FIG. 2 is a schematic cross-sectional view of a tank having an overflow mechanism (immersed photosensitive material)
FIG. 3 is a schematic side view of a processing apparatus.
FIG. 4 is a schematic view of a treatment tank having a preferred shape.
FIG. 5 is a schematic view of a jig for fixing a photosensitive material.
[Explanation of symbols]
1 Overflow waste liquid outlet
2 Treatment liquid
3 Overflow level
4 Lower liquid level
5 Treatment liquid level
6, 13, 15, 18 Photosensitive material
7 Developer tank
8 Fixing tank
9, 10 Flush tank
11 Drying section
12 Silver halide emulsion surface
14 Air knife
16 Thin tank
17 Width of tank in thickness direction
19 Fixing jig frame
20 Fixing parts for fixing jig

Claims (6)

In a development processing apparatus for a tabular silver halide photographic material having at least one photosensitive silver halide emulsion layer on a support having an average thickness of 2 mm or more, it comprises two or more processing tanks, of which at least First, the maximum liquid level is determined by the overflow mechanism, and the liquid level when the photosensitive material is not immersed is lower than the overflow surface, and the liquid level when the photosensitive material is immersed is always the overflow surface. A processing apparatus having a function of replenishing a liquid. It consists of a processing tank of at least three steps of development, fixing, and water washing. At least the developing tank and the fixing tank determine the maximum liquid level by the overflow mechanism, and the liquid level when the photosensitive material is not immersed is lower than the overflow surface. 2. The processing apparatus according to claim 1, wherein the processing apparatus has a function of replenishing the processing solution so that the liquid level during immersion of the photosensitive material always becomes an overflow surface. At least the developing tank and the fixing tank have at least two types of replenishment methods: replenishment at the end of processing and replenishment after a lapse of a certain time, and the liquid level when the photosensitive material is not immersed is lower than the overflow surface . 3. The processing apparatus according to claim 1, wherein replenishment is performed so that the liquid level becomes an overflow surface during immersion. At least the developer tank and the fixing tank have a replenishment system at startup after the processing apparatus is stopped so that the liquid level when the photosensitive material is not immersed is lower than the overflow surface, and the liquid level becomes the overflow surface when the photosensitive material is immersed. The processing apparatus according to claim 3, wherein the processing apparatus is replenished.   5. The processing apparatus according to claim 2, wherein at least the maximum liquid amount in the developing tank and the fixing tank is not more than 30 times the maximum size of the photosensitive material to be processed.   The photosensitive material is supported so that the photosensitive layer surface of the photosensitive material stands upright in a substantially vertical direction, the photosensitive material is lowered and immersed in the processing tank, and after a certain time, the photosensitive material is raised and transferred to the next processing tank. The processing apparatus according to claim 1, wherein the processing apparatus is characterized.

Images