JP4231791B2 - フレキソ印刷版として使用するための感光性エレメント - Google Patents
フレキソ印刷版として使用するための感光性エレメント Download PDFInfo
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- JP4231791B2 JP4231791B2 JP2003577056A JP2003577056A JP4231791B2 JP 4231791 B2 JP4231791 B2 JP 4231791B2 JP 2003577056 A JP2003577056 A JP 2003577056A JP 2003577056 A JP2003577056 A JP 2003577056A JP 4231791 B2 JP4231791 B2 JP 4231791B2
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- Prior art keywords
- layer
- matting agent
- photopolymerizable
- photosensitive element
- matting
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- ONTQJDKFANPPKK-UHFFFAOYSA-L chembl3185981 Chemical compound [Na+].[Na+].CC1=CC(C)=C(S([O-])(=O)=O)C=C1N=NC1=CC(S([O-])(=O)=O)=C(C=CC=C2)C2=C1O ONTQJDKFANPPKK-UHFFFAOYSA-L 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- AOMZHDJXSYHPKS-UHFFFAOYSA-L disodium 4-amino-5-hydroxy-3-[(4-nitrophenyl)diazenyl]-6-phenyldiazenylnaphthalene-2,7-disulfonate Chemical compound [Na+].[Na+].[O-]S(=O)(=O)C1=CC2=CC(S([O-])(=O)=O)=C(N=NC=3C=CC=CC=3)C(O)=C2C(N)=C1N=NC1=CC=C([N+]([O-])=O)C=C1 AOMZHDJXSYHPKS-UHFFFAOYSA-L 0.000 description 1
- WZRZTHMJPHPAMU-UHFFFAOYSA-L disodium;(3e)-3-[(4-amino-3-sulfonatophenyl)-(4-amino-3-sulfophenyl)methylidene]-6-imino-5-methylcyclohexa-1,4-diene-1-sulfonate Chemical compound [Na+].[Na+].C1=C(S([O-])(=O)=O)C(=N)C(C)=CC1=C(C=1C=C(C(N)=CC=1)S([O-])(=O)=O)C1=CC=C(N)C(S(O)(=O)=O)=C1 WZRZTHMJPHPAMU-UHFFFAOYSA-L 0.000 description 1
- 238000004520 electroporation Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- HQQADJVZYDDRJT-UHFFFAOYSA-N ethene;prop-1-ene Chemical group C=C.CC=C HQQADJVZYDDRJT-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 229920005570 flexible polymer Polymers 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000006261 foam material Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000000915 furnace ionisation nonthermal excitation spectrometry Methods 0.000 description 1
- 239000000499 gel Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- UHOKSCJSTAHBSO-UHFFFAOYSA-N indanthrone blue Chemical compound C1=CC=C2C(=O)C3=CC=C4NC5=C6C(=O)C7=CC=CC=C7C(=O)C6=CC=C5NC4=C3C(=O)C2=C1 UHOKSCJSTAHBSO-UHFFFAOYSA-N 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 229910052622 kaolinite Inorganic materials 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 235000001510 limonene Nutrition 0.000 description 1
- 229940087305 limonene Drugs 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 239000004005 microsphere Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000008520 organization Effects 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 235000019809 paraffin wax Nutrition 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 235000019271 petrolatum Nutrition 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000001314 profilometry Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007790 solid phase Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- SKIVFJLNDNKQPD-UHFFFAOYSA-N sulfacetamide Chemical compound CC(=O)NS(=O)(=O)C1=CC=C(N)C=C1 SKIVFJLNDNKQPD-UHFFFAOYSA-N 0.000 description 1
- 238000005211 surface analysis Methods 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000003190 viscoelastic substance Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- XRASPMIURGNCCH-UHFFFAOYSA-N zoledronic acid Chemical compound OP(=O)(O)C(P(O)(O)=O)(O)CN1C=CN=C1 XRASPMIURGNCCH-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N1/00—Printing plates or foils; Materials therefor
- B41N1/12—Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/055—Thermographic processes for producing printing formes, e.g. with a thermal print head
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US36495602P | 2002-03-14 | 2002-03-14 | |
| PCT/US2003/008058 WO2003079114A1 (en) | 2002-03-14 | 2003-03-14 | Photosensitive element for use as flexographic printing plate |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005521083A JP2005521083A (ja) | 2005-07-14 |
| JP2005521083A5 JP2005521083A5 (enExample) | 2006-05-11 |
| JP4231791B2 true JP4231791B2 (ja) | 2009-03-04 |
Family
ID=28041992
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003577056A Expired - Lifetime JP4231791B2 (ja) | 2002-03-14 | 2003-03-14 | フレキソ印刷版として使用するための感光性エレメント |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20050142480A1 (enExample) |
| EP (1) | EP1483624B1 (enExample) |
| JP (1) | JP4231791B2 (enExample) |
| CA (1) | CA2477779A1 (enExample) |
| DE (1) | DE60322030D1 (enExample) |
| WO (1) | WO2003079114A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3693794A1 (en) | 2016-04-01 | 2020-08-12 | Asahi Kasei Kabushiki Kaisha | Flexographic printing plate |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040234886A1 (en) * | 2003-03-12 | 2004-11-25 | Rudolph Michael Lee | Photosensitive element for use as flexographic printing plate |
| US7682775B2 (en) | 2004-03-05 | 2010-03-23 | E. I. Du Pont De Nemours And Company | Process for preparing a flexographic printing plate |
| JP2005288931A (ja) | 2004-04-01 | 2005-10-20 | Konica Minolta Medical & Graphic Inc | 平版印刷版材料、画像記録方法及び印刷方法 |
| US20060154180A1 (en) * | 2005-01-07 | 2006-07-13 | Kannurpatti Anandkumar R | Imaging element for use as a recording element and process of using the imaging element |
| US7625691B2 (en) * | 2005-11-30 | 2009-12-01 | Bryant Laurie A | Photopolymer printing form with reduced processing time |
| US20070134596A1 (en) * | 2005-12-08 | 2007-06-14 | Adrian Lungu | Photosensitive printing element having nanoparticles and method for preparing the printing element |
| JP2009018547A (ja) * | 2007-07-13 | 2009-01-29 | Shinoda Shoji Kk | フレキソ版 |
| US8236479B2 (en) * | 2008-01-23 | 2012-08-07 | E I Du Pont De Nemours And Company | Method for printing a pattern on a substrate |
| US20090191482A1 (en) * | 2008-01-30 | 2009-07-30 | E.I. Du Pont De Nemours And Company | Device and method for preparing relief printing form |
| US8241835B2 (en) | 2008-01-30 | 2012-08-14 | E I Du Pont De Nemours And Company | Device and method for preparing relief printing form |
| EP2562599B1 (en) | 2009-01-29 | 2014-12-10 | Digiflex Ltd. | Process for producing a photomask on a photopolymeric surface |
| US8833258B2 (en) * | 2009-02-09 | 2014-09-16 | Ryan W Vest | Means for attaching a printing plate to a printing cylinder |
| US8899148B2 (en) | 2009-07-02 | 2014-12-02 | E I Du Pont De Nemours And Company | Method for printing a material onto a substrate |
| US8875629B2 (en) * | 2010-04-09 | 2014-11-04 | Presstek, Inc. | Ablation-type lithographic imaging with enhanced debris removal |
| EP2748678B1 (en) | 2011-08-26 | 2018-07-04 | E. I. du Pont de Nemours and Company | Method for preparing a relief printing form |
| US9134612B2 (en) | 2012-03-27 | 2015-09-15 | E I Du Pont De Nemours And Company | Printing form precursor having elastomeric cap layer and a method of preparing a printing form from the precursor |
| US8808968B2 (en) * | 2012-08-22 | 2014-08-19 | Jonghan Choi | Method of improving surface cure in digital flexographic printing plates |
| US9097974B2 (en) | 2012-08-23 | 2015-08-04 | E I Du Pont De Nemours And Company | Method for preparing a relief printing form |
| US20220016879A1 (en) * | 2018-12-11 | 2022-01-20 | Dupont Electronics, Inc. | Flexographic printing form precursor and a method for making the precursor |
Family Cites Families (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB574244A (en) * | 1958-07-25 | 1945-12-28 | Sparklets Ltd | Improvements in or relating to means for producing a spray of atomised liquid |
| NL101499C (enExample) * | 1951-08-20 | |||
| CA1099435A (en) * | 1971-04-01 | 1981-04-14 | Gwendyline Y. Y. T. Chen | Photosensitive block copolymer composition and elements |
| US3796602A (en) * | 1972-02-07 | 1974-03-12 | Du Pont | Process for stripping polymer masks from circuit boards |
| US4072527A (en) * | 1972-09-27 | 1978-02-07 | E. I. Du Pont De Nemours And Company | Oxygen barrier layers for photopolymerizable elements |
| US3891443A (en) * | 1973-02-01 | 1975-06-24 | Polychrome Corp | Mat finish photosensitive relief plates |
| GB1542131A (en) * | 1975-02-19 | 1979-03-14 | Fuji Photo Film Co Ltd | Light-sensitive printing plate precursors and process for the production thereof |
| JPS5512974A (en) * | 1978-07-15 | 1980-01-29 | Konishiroku Photo Ind Co Ltd | Photosensitive printing plate |
| JPS5532086A (en) * | 1978-08-30 | 1980-03-06 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
| DE2926236A1 (de) * | 1979-06-29 | 1981-01-15 | Hoechst Ag | Lichtempfindliches, positiv arbeitendes kopiermaterial mit rauher oberflaeche |
| US4298678A (en) * | 1980-08-14 | 1981-11-03 | E. I. Du Pont De Nemours And Company | Photosensitive compositions and elements containing substituted hydroxylamine |
| US4460675A (en) * | 1982-01-21 | 1984-07-17 | E. I. Du Pont De Nemours And Company | Process for preparing an overcoated photopolymer printing plate |
| US4427759A (en) * | 1982-01-21 | 1984-01-24 | E. I. Du Pont De Nemours And Company | Process for preparing an overcoated photopolymer printing plate |
| US4567128A (en) * | 1982-04-14 | 1986-01-28 | E. I. Du Pont De Nemours And Company | Cover sheet in a photosensitive element |
| JPS58182636A (ja) * | 1982-04-20 | 1983-10-25 | Fuji Photo Film Co Ltd | 感光性印刷版 |
| US4599299A (en) * | 1982-04-22 | 1986-07-08 | E. I. Du Pont De Nemours And Company | Process for preparing overcoated photohardenable element having surface protuberances |
| DE3236560A1 (de) * | 1982-10-02 | 1984-04-05 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches schichtuebertragungsmaterial und verfahren zur herstellung einer photoresistschablone |
| US4587199A (en) * | 1983-07-11 | 1986-05-06 | E. I. Du Pont De Nemours And Company | Controlled roughening of a photosensitive composition |
| DE3433247A1 (de) * | 1984-09-11 | 1986-03-20 | Hoechst Ag, 6230 Frankfurt | Strahlungsempfindliches aufzeichnungsmaterial und verfahren zu seiner herstellung |
| DE3803457A1 (de) * | 1988-02-05 | 1989-08-17 | Basf Ag | Flaechenfoermiges lichtempfindliches aufzeichnungsmaterial |
| CA1320388C (en) * | 1988-05-18 | 1993-07-20 | Masanao Isono | Printing plate |
| US4894315A (en) * | 1988-08-30 | 1990-01-16 | E. I. Du Pont De Nemours And Company | Process for making flexographic printing plates with increased flexibility |
| NZ232095A (en) * | 1989-02-15 | 1992-01-29 | Grace W R & Co | Flatting agent produced by milling a hydrous inorganic oxide hydrogel |
| US6040116A (en) * | 1989-03-17 | 2000-03-21 | Basf Aktiengesellschaft | Photosensitive recording element having a recording layer and a top layer possessing different solubility properties, and its development in one operation |
| US4997735A (en) * | 1989-04-28 | 1991-03-05 | Eastman Kodak Company | Vacuum contacting process for photographic elements |
| US5294474A (en) * | 1989-07-27 | 1994-03-15 | Rhone-Poulenc Films | Composite polyester films and their use as protective layers for photopolymer plates, and photopolymer plates comprising said films |
| US5124227A (en) * | 1990-03-15 | 1992-06-23 | Graphics Technology International Inc. | Protective overcoats for diazo type layers |
| US5254437A (en) * | 1990-06-18 | 1993-10-19 | Nippon Paint Co., Ltd. | Photosensitive resin composition for flexographic printing |
| DE69121329T2 (de) * | 1990-06-18 | 1997-01-02 | Nippon Paint Co Ltd | Lichtempfindliche Flexodruckzusammensetzung |
| US5215859A (en) * | 1990-07-26 | 1993-06-01 | Minnesota Mining And Manufacturing Company | Backside ionizing irradiation in a flexographic printing plate process |
| US5015556A (en) * | 1990-07-26 | 1991-05-14 | Minnesota Mining And Manufacturing Company | Flexographic printing plate process |
| US5175072A (en) * | 1990-07-26 | 1992-12-29 | Minnesota Mining And Manufacturing Company | Flexographic printing plate process |
| EP0469735B1 (en) * | 1990-07-31 | 1998-06-10 | Minnesota Mining And Manufacturing Company | Device for forming flexographic printing plate |
| JP2652095B2 (ja) * | 1991-09-27 | 1997-09-10 | 富士写真フイルム株式会社 | 感光性組成物 |
| CA2082035A1 (en) * | 1991-11-07 | 1993-05-08 | Derek Aldcroft | Silica products |
| US5719009A (en) * | 1992-08-07 | 1998-02-17 | E. I. Du Pont De Nemours And Company | Laser ablatable photosensitive elements utilized to make flexographic printing plates |
| US5262275A (en) * | 1992-08-07 | 1993-11-16 | E. I. Du Pont De Nemours And Company | Flexographic printing element having an IR ablatable layer and process for making a flexographic printing plate |
| DE4335425A1 (de) * | 1993-10-18 | 1995-04-20 | Hoechst Ag | Mattiertes, strahlungsempfindliches Aufzeichnungsmaterial |
| DE4446196A1 (de) * | 1994-12-23 | 1996-06-27 | Basf Lacke & Farben | Mehrschichtiges, flächenförmiges, lichtempfindliches Aufzeichnungsmaterial zur Herstellung von Druckplatten |
| US5830620A (en) * | 1995-09-12 | 1998-11-03 | Nippon Paint Co., Ltd. | Water developable flexographic printing plate |
| US5795647A (en) * | 1996-09-11 | 1998-08-18 | Aluminum Company Of America | Printing plate having improved wear resistance |
| US6358668B1 (en) * | 1999-07-13 | 2002-03-19 | Agfa-Gevaert | Flexographic printing plate precursor comprising an ink-jet receiving layer |
| JP3769171B2 (ja) * | 2000-05-17 | 2006-04-19 | 東京応化工業株式会社 | フレキソ印刷版製造用多層感光材料 |
| JP2002131894A (ja) * | 2000-10-27 | 2002-05-09 | Fuji Photo Film Co Ltd | 湿し水不要平版印刷版の製版方法 |
| US6773859B2 (en) * | 2001-03-06 | 2004-08-10 | E. I. Du Pont De Nemours And Company | Process for making a flexographic printing plate and a photosensitive element for use in the process |
| US20040234886A1 (en) * | 2003-03-12 | 2004-11-25 | Rudolph Michael Lee | Photosensitive element for use as flexographic printing plate |
-
2003
- 2003-03-14 DE DE60322030T patent/DE60322030D1/de not_active Expired - Lifetime
- 2003-03-14 EP EP03714184A patent/EP1483624B1/en not_active Expired - Lifetime
- 2003-03-14 US US10/507,950 patent/US20050142480A1/en not_active Abandoned
- 2003-03-14 WO PCT/US2003/008058 patent/WO2003079114A1/en not_active Ceased
- 2003-03-14 CA CA002477779A patent/CA2477779A1/en not_active Abandoned
- 2003-03-14 JP JP2003577056A patent/JP4231791B2/ja not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3693794A1 (en) | 2016-04-01 | 2020-08-12 | Asahi Kasei Kabushiki Kaisha | Flexographic printing plate |
| US11014395B2 (en) | 2016-04-01 | 2021-05-25 | Asahi Kasei Kabushiki Kaisha | Photosensitive resin constituent for flexographic printing plate and flexographic printing plate |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1483624B1 (en) | 2008-07-09 |
| DE60322030D1 (de) | 2008-08-21 |
| WO2003079114A1 (en) | 2003-09-25 |
| JP2005521083A (ja) | 2005-07-14 |
| EP1483624A1 (en) | 2004-12-08 |
| CA2477779A1 (en) | 2003-09-25 |
| US20050142480A1 (en) | 2005-06-30 |
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