JP4161804B2 - Heat shielding member of silicon single crystal pulling device - Google Patents

Heat shielding member of silicon single crystal pulling device Download PDF

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Publication number
JP4161804B2
JP4161804B2 JP2003153950A JP2003153950A JP4161804B2 JP 4161804 B2 JP4161804 B2 JP 4161804B2 JP 2003153950 A JP2003153950 A JP 2003153950A JP 2003153950 A JP2003153950 A JP 2003153950A JP 4161804 B2 JP4161804 B2 JP 4161804B2
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Japan
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cylinder member
single crystal
silicon single
outer cylinder
bottom wall
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JP2004352581A (en
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純 古川
洋二 鈴木
和浩 原田
賢二 宗実
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Sumco Corp
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Sumco Corp
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Description

【0001】
【発明の属する技術分野】
本発明は、シリコン単結晶棒を引上げて育成する装置に設けられた熱遮蔽部材に関するものである。
【0002】
【従来の技術】
従来、この種のシリコン単結晶引上げ装置として、チャンバ内にシリコン融液が貯留された石英るつぼが収容され、シリコン単結晶棒の外周面と石英るつぼの内周面との間にシリコン単結晶棒を包囲するように熱遮蔽部材が挿入された引上げ装置(例えば、特許文献1参照。)が開示されている。この装置における熱遮蔽部材は熱的に安定な黒鉛により作られ、引上げられるシリコン単結晶棒の外周面を包囲しかつ下端がシリコン融液表面から間隔をあけて上方に位置しヒータからの輻射熱を遮る筒部を有する。そしてこの熱遮蔽部材はシリコン単結晶棒の外周面と筒部の内周面との間を流下する不活性ガスをスムーズに導くように構成される。この引上げ装置では、露出した石英るつぼの内周壁からの輻射熱を熱遮蔽部材が遮ることにより、輻射熱がシリコン単結晶棒の外周面に達することを防止して、引上げ中のシリコン単結晶棒の凝固を促進し、シリコン単結晶棒を速やかに冷却するようになっている。
【0003】
一方、シリコン融液から引上げられるシリコン単結晶棒中のシリコン融液近傍の温度分布は、シリコン単結晶棒の外周面からの放熱量が多いため、中心部で最も高く外周面に向うに従って次第に低くなり、外周部で急激に低くなる。特に、シリコン単結晶棒の大口径化が進むと、上記シリコン単結晶棒の中心部と外周部との温度差は更に大きくなることが予想される。このため、シリコン単結晶棒中に上記温度差に基づく熱的ストレスが発生するおそれがある。このため、筒部の下部に筒内の方向に膨出して設けられた膨出部を形成し、その膨出部の内部にシリコン単結晶棒の下部外周面を包囲するリング状の蓄熱部材を設けたシリコン単結晶引上げ装置の熱遮蔽部材が提案されている(例えば、特許文献2参照。)。この熱遮蔽部材では、シリコン単結晶棒からの放熱が膨出部によって反射されるか、又は膨出部自体が高温のヒータ及びシリコン融液によって温度上昇することにより、シリコン単結晶棒の外周部の急激な温度低下を阻止し、シリコン単結晶棒中の温度分布を中心から外周面に向って略均一にして、シリコン単結晶棒中の熱的ストレスの発生を抑制することができるものとしている。
【0004】
【特許文献1】
特公昭57−40119号公報
【特許文献2】
特開2000−24776号公報
【0005】
【発明が解決しようとする課題】
しかし、膨出部を有する熱遮蔽部材では、シリコン原料融解時又はシリコン原料供給時に溶融シリコンがはねてそのシリコン融液が膨出部の下面に付着したり、シリコン融液表面から蒸発するSiOガスに膨出部がさらされている。その下面における黒鉛がSiC化することで、膨出部表面の変質劣化が発生する。また、特に膨出部の下面にはシリコン付着物がつきやすい。膨出部表面の材質が劣化すると、熱輻射率が変化し、熱遮蔽部材の特性が変化することにより、引き上げられるシリコン単結晶棒の品質に経時変化を生じさせる不具合がある。また、膨出部に付着した付着物が引き上げ中に融液に落下することがあり、シリコン単結晶棒が有転位化する不具合がある。
この点を解消するために、遮蔽部材の膨出部の下面が変質劣化することに起因してシリコン単結晶棒の品質に影響を与える前に、熱遮蔽部材全体を交換し、引き上げられるシリコン単結晶棒の品質を均一化させている。しかし、本来有効な部分を含むにもかかわらず熱遮蔽部材全体を交換することはシリコン単結晶棒の引き上げ費用を押し上げる不具合があった。
本発明の目的は、多数回シリコン単結晶を引き上げたときに変質劣化しやすい膨出部底部のみを交換可能なシリコン単結晶引上げ装置の熱遮蔽部材を提供することにある。
【0006】
【課題を解決するための手段】
請求項1に係る発明は、図3に示すように、石英るつぼ13の外周面を包囲するヒータ18により加熱されてその石英るつぼ13に貯留されたシリコン融液12からシリコン単結晶棒25を引上げる装置に設けられ、下端がシリコン融液12表面から間隔をあけて上方に位置しかつシリコン単結晶棒25の外周面を包囲してヒータ18からの輻射熱を遮る外筒部材34と、外筒部材34の下部に筒内の方向に膨出して設けられた膨出部41と、膨出部41の内部に設けられシリコン単結晶棒25の下部外周面を包囲するリング状の蓄熱部材47とを備えた熱遮蔽部材の改良である。
その特徴ある構成は、図1に示すように、外筒部材34の下部内周にフランジ34aが全周に形成され、膨出部41は、外筒部材34に上側から挿入され外周がフランジ34aに設置され内周がシリコン単結晶棒25の外周面近傍に達するリング状の底壁42と、外筒部材34に上側から挿入され底壁42の内周に下縁が密接する円筒状の縦壁44と、縦壁44の上縁に内周が連設されて縦壁44と一体的に形成され外周が外筒部材34に接続される上壁46とにより構成され、底壁42の外周下部にフランジ34aの厚さに等しい段部42aが形成されて底壁42の外周がフランジ34aに設置された状態で段部42aの外周面がフランジ34aの内周面に対向して断面クランク状の接合線を形成するように構成され、縦壁44の下縁に下方に突出する凸条44aが全周に形成され、底壁42の内周に凸条44aが挿入可能な凹溝42bが全周に形成されたたところにある。
【0007】
この請求項1に記載されたシリコン単結晶引上げ装置の熱遮蔽部材は、多数回シリコン単結晶を引き上げた後、その底壁42が変質劣化する。この場合には図2に示すように、一体的に形成された縦壁44と上壁46を上方に移動して外筒部材34から一旦取り出し、引続いて蓄熱部材47を取り出した後、変質した底壁42を上方に移動して外筒部材34から取り出す。次に新しい底壁42を外筒部材34に上方から挿入してその外周を外筒部材34の底部に形成されたフランジ34aに設置する。その後一旦取り出していた蓄熱部材47、縦壁44及び上壁46を外筒部材34に上方から順次挿入して縦壁44の下端を底壁42の内周を密接させる。このようにして多数回シリコン単結晶を引き上げたときに変質劣化し易い底壁42のみを交換することができ、他の部分を交換することなく引き続いて使用することができる。
そして、膨出部41内部に設けられた蓄熱部材47から生じる脱ガスやパーティクルがこの接合部分から外部に放出されることを抑制することができ、これらに起因して引き上げられるシリコン単結晶棒25が有転位化すること又は汚染されることを防止することができる。
【0008】
請求項2に係る発明は、請求項1に係る発明であって、外筒部材34と所定の間隔を開けて外筒部材34と同心に設けられた内筒部材37と、外筒部材34と内筒部材37の間に介在された断熱材38とを更に備え、内筒部材37は下端が上壁46の外周に連設されて上壁46及び縦壁44と一体的に形成されたシリコン単結晶引上げ装置の熱遮蔽部材である。
この請求項2に記載されたシリコン単結晶引上げ装置の熱遮蔽部材では、内筒部材37及び断熱材38がヒータ18や石英るつぼ13の内周壁からシリコン単結晶棒25に向う輻射熱を有効に遮り、膨出部41を越えて引上げられたシリコン単結晶棒25の冷却を促進させることができる。また、内筒部材37を上壁46と一体的に形成することにより、底壁42を交換する際に内筒部材37を上壁46と一緒に取り外すことができ、その交換作業に支障をきたすことはない。
【0010】
【発明の実施の形態】
次に本発明の実施の形態を図面に基づいて説明する。
図3に示すように、シリコン単結晶の引上げ装置10のチャンバ11内には、シリコン融液12を貯留する石英るつぼ13が設けられ、この石英るつぼ13の外周面は黒鉛サセプタ14により被覆される。石英るつぼ13の下面は上記黒鉛サセプタ14を介して支軸16の上端に固定され、この支軸16の下部はるつぼ駆動手段17に接続される。るつぼ駆動手段17は図示しないが石英るつぼ13を回転させる第1回転用モータと、石英るつぼ13を昇降させる昇降用モータとを有し、これらのモータにより石英るつぼ13が所定の方向に回転し得るとともに、上下方向に移動可能となっている。石英るつぼ13の外周面は石英るつぼ13から所定の間隔をあけてヒータ18により包囲され、このヒータ18は保温筒19により包囲される。ヒータ18は石英るつぼ13に投入された高純度のシリコン多結晶体を加熱・融解してシリコン融液12にする。
【0011】
またチャンバ11の上端には円筒状のケーシング21が接続される。このケーシング21には引上げ手段22が設けられる。引上げ手段22はケーシング21の上端部に水平状態で旋回可能に設けられた引上げヘッド(図示せず)と、このヘッドを回転させる第2回転用モータ(図示せず)と、ヘッドから石英るつぼ13の回転中心に向って垂下されたワイヤケーブル23と、上記ヘッド内に設けられワイヤケーブル23を巻取り又は繰出す引上げ用モータ(図示せず)とを有する。ワイヤケーブル23の下端にはシリコン融液12に浸してシリコン単結晶棒25を引上げるための種結晶24が取付けられる。
更にチャンバ11にはこのチャンバ11のシリコン単結晶棒側に不活性ガスを供給しかつ上記不活性ガスをチャンバ11のるつぼ内周面側から排出するガス給排手段28が接続される。ガス給排手段28は一端がケーシング21の周壁に接続され他端が上記不活性ガスを貯留するタンク(図示せず)に接続された供給パイプ29と、一端がチャンバ11の下壁に接続され他端が真空ポンプ(図示せず)に接続された排出パイプ30とを有する。供給パイプ29及び排出パイプ30にはこれらのパイプ29,30を流れる不活性ガスの流量を調整する第1及び第2流量調整弁31,32がそれぞれ設けられる。
【0012】
一方、引上げ用モータの出力軸(図示せず)にはエンコーダ(図示せず)が設けられ、るつぼ駆動手段17には支軸16の昇降位置を検出するエンコーダ(図示せず)が設けられる。2つのエンコーダの各検出出力はコントローラ(図示せず)の制御入力に接続され、コントローラの制御出力は引上げ手段22の引上げ用モータ及びるつぼ駆動手段の昇降用モータにそれぞれ接続される。またコントローラにはメモリ(図示せず)が設けられ、このメモリにはエンコーダの検出出力に対するワイヤケーブル23の巻取り長さ、即ちシリコン単結晶棒25の引上げ長さが第1マップとして記憶される。また、メモリには、シリコン単結晶棒25の引上げ長さに対する石英るつぼ13内のシリコン融液12の液面レベルが第2マップとして記憶される。コントローラは、引上げ用モータにおけるエンコーダの検出出力に基づいて石英るつぼ13内のシリコン融液12の液面を常に一定のレベルに保つように、るつぼ駆動手段17の昇降用モータを制御するように構成される。
【0013】
シリコン単結晶棒25の外周面と石英るつぼ13の内周面との間にはシリコン単結晶棒25の外周面を包囲する熱遮蔽部材33が設けられる。この熱遮蔽部材33は円筒状に形成されヒータ18からの輻射熱を遮る外筒部材34と、この外筒部材34の上縁に連設され外方に略水平方向に張り出すフランジ部36とを有する。上記フランジ部36を保温筒19上に載置することにより、外筒部材34の下縁がシリコン融液12表面から所定の距離だけ上方に位置するように熱遮蔽部材33はチャンバ11内に固定される。図1に示すように、外筒部材34には、その外筒部材34と所定の間隔を開けるように構成された内筒部材37が挿入され、その内筒部材37は外筒部材34と同心に設けられる。外筒部材34と内筒部材37の間には断熱材38が充填される。この実施の形態における外筒部材34は下方に向かって縮径するコーン状の筒状体であり、断熱材38は、カーボン繊維からなるフェルト材からなる。そしてこの外筒部材34の下部には筒内の方向に膨出する膨出部41が設けられる。
【0014】
図1に示すように、膨出部41は、リング状の底壁42と、円筒状の縦壁44と、この縦壁44の上縁に連設された上壁46とにより構成される。リング状の底壁42の外径は外筒部材34の下部内径と略同一か或いは僅かに小さく形成され、外筒部材34の下部内周には内方に向かってフランジ34aが全周に形成される。底壁42の外周にはその下部にフランジ34aの厚さに等しい段部42aが形成され、リング状の底壁42はその外筒部材34に上側から挿入されてその外周がフランジ34aに設置される。底壁42の外周がフランジ34aに設置された状態で段部42aの外周面がフランジ34aの内周面に対向して断面クランク状の接合線を形成するように構成される。一方、底壁42の内周は引き上げられるシリコン単結晶棒25の外周面近傍に達するように形成され、円筒状の縦壁44はその内径がリング状に形成された底壁42の内径と略同一に形成される。底壁42の外周がフランジ34a上に設置された状態で縦壁44は外筒部材34に上側から挿入され、底壁42の内周に下縁が密接される。
【0015】
ここで、縦壁44の下縁には下方に突出する凸条44aが全周に形成され、その下縁に対向する底壁42の内周にはその凸条44aが挿入可能な凹溝42bが全周に形成される。縦壁44の下端が底壁42の内周に当接した状態で凸条44aが凹溝42bに挿入することにより、縦壁44の下縁と底壁42の内周は密接される。上壁46は縦壁44の上縁に内周が連設されて縦壁44と一体的に形成される。上壁46の外周には内筒部材37の下端が連接され、内筒部材37は上壁46及び立壁44と一体的に形成される。内筒部材37の上端にはリング状のフランジ37aが外側に向かって形成され、外筒部材34の上端にはそのフランジ37aの外周が設置される段部34bが形成される。このフランジ37aの外周を段部34bに設置することにより内筒部材37の上部と外筒部材34の上部との接続箇所における断面がクランク状の接合面が形成される。上壁46の外周はこの内筒部材37を介して外筒部材34に接続される。内筒部材37,外筒部材34,底壁42,縦壁44及び上壁46は、熱的に安定で高純度な黒鉛或いは表面にSiCがコーティングされた黒鉛によって作ることが好ましいが、熱的に安定なMo(モリブデン)やW(タングステン)等の材料を使うこともできる。
【0016】
外筒部材34の下部と底壁42と縦壁44と上壁46とにより囲まれる膨出部41の内部にはリング状の蓄熱部材47が設けられる。この実施の形態における蓄熱部材47は、膨出部41の内部にカーボン繊維からなる0.05〜0.50g/cm3のフェルト材で充填することにより形成され、このカーボン繊維を蓄熱部材47として用いることにより、その蓄熱部材47の熱伝導率は5W/(m・℃)以下に制限される。但し、蓄熱部材47は、このカーボン繊維からなるフェルト材に限らず、熱伝導率が5W/(m・℃)以下であれば、アルミナ等の断熱材を使用することも可能である。
【0017】
このように構成されたシリコン単結晶の引上げ装置の動作を説明する。
本実施の形態のシリコン単結晶引上げ装置の熱遮蔽部材33では、膨出部41より下方のシリコン融液12近傍におけるシリコン単結晶棒25の周囲は高温のヒータ18及びシリコン融液12によって積極的に加熱される。一方、膨出部41の内部に設けられた蓄熱部材47も高温のヒータ18及びシリコン融液12によって積極的に加熱され、この膨出部41に対向するシリコン単結晶棒25の周囲は加熱された蓄熱部材47によって加熱される。これにより、シリコン単結晶棒25の下部外周部の急激な温度低下は阻止され、この部分におけるシリコン単結晶棒25の軸方向における温度勾配の径方向分布が略均一にとなり、ボロンコフのV/Gモデルにより、グローイン欠陥の検出されないシリコン単結晶棒25を製造することができる。
【0018】
シリコン単結晶棒25の製造に際して、シリコン原料融解時又はシリコン原料供給時に溶融シリコンがはねてそのシリコン融液が膨出部41の下面に付着したり、シリコン融液表面から蒸発するSiOガスに膨出部41がさらされている。そのため、シリコン単結晶棒25の製造を繰り返すと膨出部41の下面を構成する底壁42の黒鉛がSiC化することで、底壁42が変質劣化する。その一方、他の部分、即ち外筒部材34、縦壁44、上壁46及び内筒部材37におけるシリコン融液の付着及びSiOガスにさらされる量は底壁42に比較して少ない。従って、これらの部分は底壁42に比較して変質する程度が少なく、底壁42が変質したとしても十分に使用可能である。また、底壁42にはシリコン融液はねが付着しやすい。
【0019】
このため、多数回シリコン単結晶を引き上げたときに変質劣化し易い底壁42のみを交換することにより、他の部分は交換することなく引き続いて使用することができる。この底壁42を取り替えるには、図2に示すように、一体的に形成された縦壁44、上壁46及び内筒部材37を上方に移動して外筒部材34から一旦取り出し、引続いて断熱材38及び蓄熱部材47をこの順序で取り出した後、変質した底壁42を上方に移動して外筒部材34から取り出す。次に新しい底壁42を外筒部材34に上方から挿入してその外周を外筒部材34の底部に形成されたフランジ34aに設置する。その後一旦取り出されていた蓄熱部材47及び断熱材38をこの順序で挿入する。更に縦壁44、上壁46及び内筒部材37を外筒部材34に上方から挿入して縦壁44の下端に形成された凸条44aを底壁42の内周に形成された凹溝42bに挿入し、縦壁44の下縁と底壁42の内周を密接させる。このようにして多数回シリコン単結晶を引き上げたときに変質劣化し易い底壁42のみを交換することができ、熱遮蔽部材全体を交換する従来に比較して熱遮蔽部材の費用が低減され、比較的安価にシリコン単結晶棒25を引き上げることが可能になる。
【0020】
また、この実施の形態では、内筒部材37の上端に形成されたフランジ37aの外周が設置される段部34bを外筒部材34の上端に形成し、内筒部材37の上部と外筒部材34の上部との接続箇所に断面クランク状の接合面を形成したので、外筒部材34と内筒部材37の間に介在された断熱材38から生じる脱ガスやパーティクルがこの接合部分から外部に放出されることを抑制することができる。また、底壁42の外周がフランジ34aに設置された状態で断面クランク状の接合線を形成するように構成され、縦壁44の下縁に形成された凸条44aを底壁42の内周に形成された凹溝42bに挿入させるので、膨出部41内部に設けられた蓄熱部材47から生じる脱ガスやパーティクルがこの接合部分から外部に放出されることも抑制することができる。この結果、脱ガスやパーティクルが漏れることに起因して引き上げられるシリコン単結晶棒25が有転位化し又は汚染されることを防止することができる。
【0021】
なお、上記実施の形態では、外筒部材34を下方に向うに従って直径が小さくなる中空の円錐台状に形成したが、外筒部材34は円筒状に形成してもよい。
また、上記実施の形態では、内筒部材37と外筒部材34の間に断熱材38を充填したが、外筒部材34における熱遮蔽効果が十分である限り内筒部材37及び断熱材38は必ずしも設けなくても良い。
【0022】
【発明の効果】
以上述べたように、本発明によれば、外筒部材の下部内周にフランジを全周に形成し、そのフランジにリング状の底壁の外周を設置し、底壁の内周に縦壁の下縁を密接させ、縦壁の上縁に内周が連設された上壁の外周を外筒部材に接続することにより膨出部を構成するので、縦壁と上壁を上方に移動して外筒部材から一旦取り出し、引き続いて断熱材及び蓄熱部材を取り出し、その後底壁を上方に移動することにより膨出部の下部を構成する底壁を外筒部材から比較的容易に取り出すことができる。そして新しい底壁を外筒部材に上方から挿入してその外周を外筒部材の底部に形成されたフランジに設置し、その後一旦取り出されていた蓄熱部材及び断熱材を挿入し、更に縦壁及び上壁を外筒部材に上方から挿入して縦壁の下端を底壁の内周を密接させるだけの作業で底壁のみを交換することができる。この結果、他の部分を交換することなく引き続いて使用することができ、シリコン単結晶棒の引き上げ費用を安価にさせることができる。
【0023】
また、外筒部材と所定の間隔を開けて外筒部材と同心に設けられた内筒部材と、外筒部材と内筒部材の間に介在された断熱材とを更に備えれば、内筒部材及び断熱材がヒータや石英るつぼの内周壁からシリコン単結晶棒に向う輻射熱を有効に遮り、膨出部を越えて引上げられたシリコン単結晶棒の冷却を促進させることができる。この場合、内筒部材は下端を上壁の内周に連設させて上壁及び縦壁と一体的に形成すれば、底壁を交換する際に内筒部材を上壁と一緒に取り外すことができ、その交換作業に支障を来すことを防止することができる。
更に、縦壁の下縁に下方に突出する凸条を全周に形成し、底壁の内周に凸条が挿入可能な凹溝を全周に形成すれば、膨出部内部に設けられた蓄熱部材から生じる脱ガスやパーティクルがこの接合部分から外部に放出されることを抑制することができ、これらに起因して引き上げられるシリコン単結晶棒が有転位化することや汚染されることを防止することができる。
【図面の簡単な説明】
【図1】本発明シリコン単結晶引上げ装置の熱遮蔽部材33を示す図3のA部拡大断面図。
【図2】その熱遮蔽部材の構成を示す分解構成図。
【図3】そのシリコン単結晶引上げ装置の断面構成図。
【符号の説明】
13 石英るつぼ
12 シリコン融液
18 ヒータ
25 シリコン単結晶棒
34 外筒部材
34a フランジ
37 内筒部材
38 断熱材
41 膨出部
42 底壁
42b 凹溝
44 縦壁
44a 凸条
46 上壁
47 蓄熱部材
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a heat shielding member provided in an apparatus for pulling and growing a silicon single crystal rod.
[0002]
[Prior art]
Conventionally, as this type of silicon single crystal pulling apparatus, a quartz crucible in which a silicon melt is stored in a chamber is accommodated, and a silicon single crystal rod is interposed between the outer peripheral surface of the silicon single crystal rod and the inner peripheral surface of the quartz crucible. A pulling device (see, for example, Patent Document 1) in which a heat shielding member is inserted so as to surround the frame is disclosed. The heat shielding member in this apparatus is made of thermally stable graphite, surrounds the outer peripheral surface of the silicon single crystal rod to be pulled up, and the lower end is located above the surface of the silicon melt and radiates heat from the heater. It has a blocking cylinder. The heat shielding member is configured to smoothly guide the inert gas flowing between the outer peripheral surface of the silicon single crystal rod and the inner peripheral surface of the cylindrical portion. In this pulling device, the heat shielding member blocks the radiant heat from the exposed inner wall of the quartz crucible, thereby preventing the radiant heat from reaching the outer peripheral surface of the silicon single crystal rod and solidifying the silicon single crystal rod being pulled. The silicon single crystal rod is promptly cooled.
[0003]
On the other hand, the temperature distribution in the vicinity of the silicon melt in the silicon single crystal rod pulled up from the silicon melt is highest at the center and gradually lowers toward the outer surface because of the large amount of heat released from the outer surface of the silicon single crystal rod. And rapidly decreases at the outer periphery. In particular, when the diameter of the silicon single crystal rod is increased, the temperature difference between the center portion and the outer peripheral portion of the silicon single crystal rod is expected to be further increased. For this reason, there is a possibility that thermal stress based on the temperature difference is generated in the silicon single crystal rod. For this reason, a ring-shaped heat storage member is formed in the lower portion of the cylinder portion so as to bulge in the direction in the cylinder and surround the lower outer peripheral surface of the silicon single crystal rod inside the bulge portion. A heat shielding member for a provided silicon single crystal pulling apparatus has been proposed (see, for example, Patent Document 2). In this heat shielding member, the heat radiation from the silicon single crystal rod is reflected by the bulging portion, or the bulging portion itself rises in temperature by a high-temperature heater and silicon melt, so that the outer peripheral portion of the silicon single crystal rod The temperature distribution in the silicon single crystal rod can be made substantially uniform from the center to the outer peripheral surface to suppress the occurrence of thermal stress in the silicon single crystal rod. .
[0004]
[Patent Document 1]
Japanese Patent Publication No.57-40119 [Patent Document 2]
Japanese Patent Laid-Open No. 2000-24776
[Problems to be solved by the invention]
However, in the heat shielding member having the bulging portion, SiO melts when the silicon raw material melts or the silicon raw material is supplied and the silicon melt adheres to the lower surface of the bulging portion or evaporates from the silicon melt surface. The bulge is exposed to gas. As the graphite on the lower surface is converted to SiC, deterioration of the surface of the bulging portion occurs. In particular, silicon deposits are likely to adhere to the lower surface of the bulging portion. When the material of the surface of the bulging portion is deteriorated, the heat radiation rate is changed, and the characteristics of the heat shielding member are changed, thereby causing a problem that the quality of the silicon single crystal rod pulled up is changed with time. Moreover, the deposit | attachment adhering to the bulging part may fall into a melt during pulling up, and there exists a malfunction which a silicon single crystal rod becomes dislocation.
In order to solve this problem, the entire heat shielding member is replaced and pulled up before it affects the quality of the silicon single crystal rod due to the deterioration of the lower surface of the bulging portion of the shielding member. The quality of the crystal rod is made uniform. However, replacing the entire heat shielding member, despite including the originally effective portion, has a problem of raising the cost of pulling up the silicon single crystal rod.
An object of the present invention is to provide a heat shielding member of a silicon single crystal pulling apparatus capable of exchanging only a bottom portion of a bulging portion, which is easily deteriorated when the silicon single crystal is pulled many times.
[0006]
[Means for Solving the Problems]
As shown in FIG. 3, the invention according to claim 1 draws the silicon single crystal rod 25 from the silicon melt 12 heated by the heater 18 surrounding the outer peripheral surface of the quartz crucible 13 and stored in the quartz crucible 13. An outer cylinder member 34 which is provided in a lifting device and whose lower end is positioned above the surface of the silicon melt 12 and which surrounds the outer peripheral surface of the silicon single crystal rod 25 and shields radiant heat from the heater 18; A bulging portion 41 that bulges in the direction of the cylinder in the lower portion of the member 34; a ring-shaped heat storage member 47 that is provided inside the bulging portion 41 and surrounds the lower outer peripheral surface of the silicon single crystal rod 25; It is improvement of the heat shielding member provided with.
As shown in FIG. 1, the characteristic structure is that a flange 34a is formed on the entire inner periphery of the lower portion of the outer cylinder member 34, and the bulging portion 41 is inserted into the outer cylinder member 34 from the upper side, and the outer periphery is flange 34a. A ring-shaped bottom wall 42 whose inner periphery reaches the vicinity of the outer peripheral surface of the silicon single crystal rod 25, and a cylindrical vertical wall that is inserted into the outer cylinder member 34 from above and has a lower edge closely contacting the inner periphery of the bottom wall 42. A wall 44 and an upper wall 46 that is formed integrally with the vertical wall 44 at the upper edge of the vertical wall 44 and that is integrally formed with the vertical wall 44 are connected to the outer cylinder member 34 . A stepped portion 42a equal to the thickness of the flange 34a is formed in the lower outer periphery, and the outer peripheral surface of the stepped portion 42a faces the inner peripheral surface of the flange 34a in a state where the outer periphery of the bottom wall 42 is installed on the flange 34a. Is formed to form a joint line, Protrusions 44a protruding is formed on the entire circumference, the inner circumferential ridge 44a can be inserted into a groove 42b of the bottom wall 42 is in place, which is formed on the entire circumference.
[0007]
In the heat shielding member of the silicon single crystal pulling apparatus according to the first aspect, the bottom wall 42 deteriorates and deteriorates after the silicon single crystal is pulled many times. In this case, as shown in FIG. 2, the integrally formed vertical wall 44 and upper wall 46 are moved upward to once remove them from the outer cylinder member 34, and subsequently take out the heat storage member 47, and then change the quality. The bottom wall 42 is moved upward and taken out from the outer cylinder member 34. Next, a new bottom wall 42 is inserted into the outer cylinder member 34 from above, and the outer periphery thereof is installed on a flange 34 a formed at the bottom of the outer cylinder member 34. Thereafter, the heat storage member 47, the vertical wall 44, and the upper wall 46 once taken out are sequentially inserted into the outer cylinder member 34 from above, and the lower end of the vertical wall 44 is brought into close contact with the inner periphery of the bottom wall 42. In this way, it is possible to replace only the bottom wall 42 that easily deteriorates and deteriorates when the silicon single crystal is pulled many times, and it is possible to continue using it without replacing other portions.
And the degassing and particle | grains which arise from the thermal storage member 47 provided in the bulging part 41 can be suppressed from being discharged | emitted outside from this junction part, The silicon single crystal rod 25 pulled up resulting from these Can be prevented from being rearranged or contaminated.
[0008]
The invention according to claim 2 is the invention according to claim 1, wherein an inner cylinder member 37 provided concentrically with the outer cylinder member 34 at a predetermined interval from the outer cylinder member 34, and the outer cylinder member 34 And a heat insulating material 38 interposed between the inner cylinder members 37, and the inner cylinder member 37 has a lower end continuous to the outer periphery of the upper wall 46 and is formed integrally with the upper wall 46 and the vertical wall 44. It is a heat shielding member of a single crystal pulling apparatus.
In the heat shielding member of the silicon single crystal pulling apparatus described in claim 2, the inner cylindrical member 37 and the heat insulating material 38 effectively shield the radiant heat from the inner peripheral wall of the heater 18 and the quartz crucible 13 toward the silicon single crystal rod 25. Cooling of the silicon single crystal rod 25 pulled up beyond the bulging portion 41 can be promoted. Further, by forming the inner cylinder member 37 integrally with the upper wall 46, the inner cylinder member 37 can be removed together with the upper wall 46 when the bottom wall 42 is replaced, which hinders the replacement operation. There is nothing.
[0010]
DETAILED DESCRIPTION OF THE INVENTION
Next, embodiments of the present invention will be described with reference to the drawings.
As shown in FIG. 3, a quartz crucible 13 for storing a silicon melt 12 is provided in the chamber 11 of the silicon single crystal pulling apparatus 10, and the outer peripheral surface of the quartz crucible 13 is covered with a graphite susceptor 14. . The lower surface of the quartz crucible 13 is fixed to the upper end of the support shaft 16 via the graphite susceptor 14, and the lower portion of the support shaft 16 is connected to the crucible driving means 17. Although not shown, the crucible driving means 17 has a first rotating motor for rotating the quartz crucible 13 and a lifting motor for moving the quartz crucible 13 up and down, and the quartz crucible 13 can be rotated in a predetermined direction by these motors. At the same time, it is movable in the vertical direction. The outer peripheral surface of the quartz crucible 13 is surrounded by a heater 18 at a predetermined interval from the quartz crucible 13, and the heater 18 is surrounded by a heat retaining cylinder 19. The heater 18 heats and melts the high-purity silicon polycrystal charged in the quartz crucible 13 to form the silicon melt 12.
[0011]
A cylindrical casing 21 is connected to the upper end of the chamber 11. The casing 21 is provided with a pulling means 22. The pulling means 22 is a pulling head (not shown) provided at the upper end of the casing 21 so as to be turnable in a horizontal state, a second rotating motor (not shown) for rotating the head, and a quartz crucible 13 from the head. And a pulling motor (not shown) that is provided in the head and winds or feeds the wire cable 23. A seed crystal 24 is attached to the lower end of the wire cable 23 to immerse the silicon single crystal rod 25 in the silicon melt 12.
Further, a gas supply / discharge means 28 for supplying an inert gas to the silicon single crystal rod side of the chamber 11 and discharging the inert gas from the crucible inner peripheral surface side of the chamber 11 is connected to the chamber 11. The gas supply / discharge means 28 has one end connected to the peripheral wall of the casing 21 and the other end connected to a tank (not shown) for storing the inert gas, and one end connected to the lower wall of the chamber 11. The other end has a discharge pipe 30 connected to a vacuum pump (not shown). The supply pipe 29 and the discharge pipe 30 are respectively provided with first and second flow rate adjusting valves 31 and 32 for adjusting the flow rate of the inert gas flowing through the pipes 29 and 30.
[0012]
On the other hand, an encoder (not shown) is provided on the output shaft (not shown) of the pulling motor, and an encoder (not shown) for detecting the raising / lowering position of the support shaft 16 is provided on the crucible driving means 17. Each detection output of the two encoders is connected to a control input of a controller (not shown), and the control output of the controller is connected to a lifting motor of the pulling means 22 and a lifting motor of the crucible driving means. The controller is also provided with a memory (not shown), and the memory stores the winding length of the wire cable 23 with respect to the detection output of the encoder, that is, the pulling length of the silicon single crystal rod 25 as a first map. . Further, the memory stores the liquid level of the silicon melt 12 in the quartz crucible 13 with respect to the pulled length of the silicon single crystal rod 25 as a second map. The controller is configured to control the raising / lowering motor of the crucible driving means 17 so as to always keep the liquid level of the silicon melt 12 in the quartz crucible 13 at a constant level based on the detection output of the encoder in the pulling motor. Is done.
[0013]
Between the outer peripheral surface of the silicon single crystal rod 25 and the inner peripheral surface of the quartz crucible 13, a heat shielding member 33 that surrounds the outer peripheral surface of the silicon single crystal rod 25 is provided. The heat shielding member 33 is formed in a cylindrical shape and includes an outer cylinder member 34 that shields radiant heat from the heater 18, and a flange portion 36 that is connected to the upper edge of the outer cylinder member 34 and projects outward in a substantially horizontal direction. Have. By placing the flange portion 36 on the heat retaining cylinder 19, the heat shielding member 33 is fixed in the chamber 11 so that the lower edge of the outer cylinder member 34 is located a predetermined distance above the surface of the silicon melt 12. Is done. As shown in FIG. 1, an inner cylinder member 37 configured to be spaced apart from the outer cylinder member 34 is inserted into the outer cylinder member 34, and the inner cylinder member 37 is concentric with the outer cylinder member 34. Is provided. A heat insulating material 38 is filled between the outer cylinder member 34 and the inner cylinder member 37. In this embodiment, the outer cylindrical member 34 is a cone-shaped cylindrical body whose diameter is reduced downward, and the heat insulating material 38 is made of a felt material made of carbon fiber. A bulging portion 41 that bulges in the direction of the cylinder is provided at the lower portion of the outer cylinder member 34.
[0014]
As shown in FIG. 1, the bulging portion 41 includes a ring-shaped bottom wall 42, a cylindrical vertical wall 44, and an upper wall 46 that is connected to the upper edge of the vertical wall 44. The outer diameter of the ring-shaped bottom wall 42 is formed to be substantially the same as or slightly smaller than the lower inner diameter of the outer cylinder member 34, and a flange 34 a is formed on the entire inner circumference of the lower inner periphery of the outer cylinder member 34. Is done. A step portion 42a having a thickness equal to the thickness of the flange 34a is formed on the outer periphery of the bottom wall 42. The ring-shaped bottom wall 42 is inserted into the outer cylindrical member 34 from the upper side, and the outer periphery thereof is installed on the flange 34a. The In the state where the outer periphery of the bottom wall 42 is installed on the flange 34a, the outer peripheral surface of the stepped portion 42a is opposed to the inner peripheral surface of the flange 34a to form a crank-shaped joint line. On the other hand, the inner periphery of the bottom wall 42 is formed so as to reach the vicinity of the outer peripheral surface of the silicon single crystal rod 25 to be pulled up, and the cylindrical vertical wall 44 has an inner diameter substantially equal to the inner diameter of the bottom wall 42 formed in a ring shape. Formed identically. The vertical wall 44 is inserted into the outer cylinder member 34 from the upper side with the outer periphery of the bottom wall 42 installed on the flange 34 a, and the lower edge is in close contact with the inner periphery of the bottom wall 42.
[0015]
Here, the lower edge of the vertical wall 44 is formed with a protruding ridge 44a that protrudes downward, and the groove 42b into which the ridge 44a can be inserted on the inner periphery of the bottom wall 42 facing the lower edge. Is formed all around. The protrusion 44a is inserted into the concave groove 42b with the lower end of the vertical wall 44 in contact with the inner periphery of the bottom wall 42, whereby the lower edge of the vertical wall 44 and the inner periphery of the bottom wall 42 are brought into close contact with each other. The upper wall 46 is formed integrally with the vertical wall 44 by connecting the inner periphery to the upper edge of the vertical wall 44. The lower end of the inner cylinder member 37 is connected to the outer periphery of the upper wall 46, and the inner cylinder member 37 is formed integrally with the upper wall 46 and the standing wall 44. A ring-shaped flange 37a is formed outward at the upper end of the inner cylinder member 37, and a step 34b on which the outer periphery of the flange 37a is installed is formed at the upper end of the outer cylinder member 34. By installing the outer periphery of the flange 37a on the step portion 34b, a joint surface having a crank-like cross section at the connection portion between the upper portion of the inner cylinder member 37 and the upper portion of the outer cylinder member 34 is formed. The outer periphery of the upper wall 46 is connected to the outer cylinder member 34 via the inner cylinder member 37. The inner cylinder member 37, the outer cylinder member 34, the bottom wall 42, the vertical wall 44, and the upper wall 46 are preferably made of thermally stable and high-purity graphite or graphite whose surface is coated with SiC. It is also possible to use materials such as Mo (molybdenum) and W (tungsten) which are stable.
[0016]
A ring-shaped heat storage member 47 is provided inside the bulging portion 41 surrounded by the lower portion of the outer cylinder member 34, the bottom wall 42, the vertical wall 44, and the upper wall 46. The heat storage member 47 in this embodiment is formed by filling the bulging portion 41 with a felt material of 0.05 to 0.50 g / cm 3 made of carbon fiber, and this carbon fiber is used as the heat storage member 47. By using it, the thermal conductivity of the heat storage member 47 is limited to 5 W / (m · ° C.) or less. However, the heat storage member 47 is not limited to the felt material made of carbon fiber, and a heat insulating material such as alumina can be used as long as the thermal conductivity is 5 W / (m · ° C.) or less.
[0017]
The operation of the silicon single crystal pulling apparatus configured as described above will be described.
In the heat shielding member 33 of the silicon single crystal pulling apparatus according to the present embodiment, the periphery of the silicon single crystal rod 25 in the vicinity of the silicon melt 12 below the bulging portion 41 is positively affected by the high-temperature heater 18 and the silicon melt 12. To be heated. On the other hand, the heat storage member 47 provided inside the bulging portion 41 is also positively heated by the high-temperature heater 18 and the silicon melt 12, and the periphery of the silicon single crystal rod 25 facing the bulging portion 41 is heated. The heat storage member 47 is heated. As a result, a rapid temperature drop in the lower outer peripheral portion of the silicon single crystal rod 25 is prevented, and the radial distribution of the temperature gradient in the axial direction of the silicon single crystal rod 25 in this portion becomes substantially uniform. According to the model, the silicon single crystal rod 25 in which no glow-in defect is detected can be manufactured.
[0018]
When the silicon single crystal rod 25 is manufactured, the molten silicon splashes when the silicon raw material is melted or the silicon raw material is supplied, and the silicon melt adheres to the lower surface of the bulging portion 41, or the SiO gas evaporates from the silicon melt surface. The bulging part 41 is exposed. Therefore, when the production of the silicon single crystal rod 25 is repeated, the graphite of the bottom wall 42 constituting the lower surface of the bulging portion 41 is converted to SiC, so that the bottom wall 42 is deteriorated and deteriorated. On the other hand, the amount of silicon melt adhering to the other portions, that is, the outer cylindrical member 34, the vertical wall 44, the upper wall 46, and the inner cylindrical member 37 and the amount exposed to the SiO gas is smaller than that of the bottom wall 42. Therefore, these portions are less likely to be degenerated than the bottom wall 42, and even if the bottom wall 42 is denatured, it can be used sufficiently. Further, the silicon melt splash tends to adhere to the bottom wall 42.
[0019]
For this reason, by exchanging only the bottom wall 42 that easily deteriorates when the silicon single crystal is pulled many times, other portions can be used continuously without being exchanged. In order to replace the bottom wall 42, as shown in FIG. 2, the integrally formed vertical wall 44, upper wall 46, and inner cylinder member 37 are moved upward to be temporarily removed from the outer cylinder member 34, and subsequently. After the heat insulating material 38 and the heat storage member 47 are taken out in this order, the altered bottom wall 42 is moved upward and taken out from the outer cylinder member 34. Next, a new bottom wall 42 is inserted into the outer cylinder member 34 from above, and the outer periphery thereof is installed on a flange 34 a formed at the bottom of the outer cylinder member 34. Thereafter, the heat storage member 47 and the heat insulating material 38 once taken out are inserted in this order. Further, the vertical wall 44, the upper wall 46 and the inner cylinder member 37 are inserted into the outer cylinder member 34 from above, and a ridge 44 a formed at the lower end of the vertical wall 44 is formed into a groove 42 b formed on the inner periphery of the bottom wall 42. The bottom edge of the vertical wall 44 and the inner periphery of the bottom wall 42 are brought into close contact with each other. In this way, it is possible to replace only the bottom wall 42 which is easily deteriorated when the silicon single crystal is pulled many times, and the cost of the heat shielding member is reduced as compared with the conventional case where the entire heat shielding member is replaced, The silicon single crystal rod 25 can be pulled up at a relatively low cost.
[0020]
Further, in this embodiment, a step portion 34b on which the outer periphery of the flange 37a formed at the upper end of the inner cylinder member 37 is installed is formed at the upper end of the outer cylinder member 34, and the upper portion of the inner cylinder member 37 and the outer cylinder member Since a joint surface having a crank-shaped cross section is formed at the connection point with the upper portion of 34, degassing and particles generated from the heat insulating material 38 interposed between the outer cylinder member 34 and the inner cylinder member 37 are exposed to the outside from the joint portion. Release can be suppressed. The bottom wall 42 is configured to form a crank-shaped joint line with the outer periphery of the bottom wall 42 being installed on the flange 34 a, and the ridge 44 a formed on the lower edge of the vertical wall 44 is connected to the inner periphery of the bottom wall 42. Therefore, it is possible to suppress degassing and particles generated from the heat storage member 47 provided inside the bulging portion 41 from being released to the outside from the joint portion. As a result, it is possible to prevent dislocation or contamination of the silicon single crystal rod 25 that is pulled up due to degassing or leakage of particles.
[0021]
In the above embodiment, the outer cylinder member 34 is formed in a hollow truncated cone shape whose diameter decreases as it goes downward, but the outer cylinder member 34 may be formed in a cylindrical shape.
Moreover, in the said embodiment, although the heat insulating material 38 was filled between the inner cylinder member 37 and the outer cylinder member 34, as long as the heat shielding effect in the outer cylinder member 34 is enough, the inner cylinder member 37 and the heat insulating material 38 are It does not necessarily have to be provided.
[0022]
【The invention's effect】
As described above, according to the present invention, the flange is formed on the entire inner periphery of the lower portion of the outer cylinder member, the outer periphery of the ring-shaped bottom wall is installed on the flange, and the vertical wall is formed on the inner periphery of the bottom wall. Since the bulge is formed by connecting the outer periphery of the upper wall with the inner periphery connected to the upper edge of the vertical wall in close contact with the upper edge of the vertical wall, the vertical wall and the upper wall are moved upward Then, take out from the outer cylinder member once, then take out the heat insulating material and the heat storage member, and then move the bottom wall upward to remove the bottom wall constituting the lower part of the bulging portion relatively easily from the outer cylinder member. Can do. Then, a new bottom wall is inserted into the outer cylinder member from above, and the outer periphery thereof is installed on the flange formed on the bottom of the outer cylinder member. Thereafter, the heat storage member and the heat insulating material once taken out are inserted, and the vertical wall and Only the bottom wall can be replaced by inserting the upper wall into the outer cylinder member from above and bringing the lower end of the vertical wall into close contact with the inner periphery of the bottom wall. As a result, the other parts can be used continuously without replacement, and the cost of pulling up the silicon single crystal rod can be reduced.
[0023]
Further, if the inner cylinder member provided concentrically with the outer cylinder member at a predetermined interval from the outer cylinder member, and a heat insulating material interposed between the outer cylinder member and the inner cylinder member, the inner cylinder The member and the heat insulating material can effectively block the radiant heat from the inner peripheral wall of the heater or the quartz crucible toward the silicon single crystal rod, and the cooling of the silicon single crystal rod pulled up beyond the bulging portion can be promoted. In this case, if the inner cylinder member is formed integrally with the upper wall and the vertical wall by connecting the lower end to the inner periphery of the upper wall, the inner cylinder member can be removed together with the upper wall when replacing the bottom wall. It is possible to prevent the replacement work from being hindered.
Furthermore, if a convex ridge protruding downward is formed on the lower edge of the vertical wall on the entire circumference, and a concave groove on the inner periphery of the bottom wall is formed on the entire circumference, it is provided inside the bulging portion. The degassing and particles generated from the heat storage member can be prevented from being released to the outside from this joint, and the silicon single crystal rod pulled up due to these can be dislocated or contaminated. Can be prevented.
[Brief description of the drawings]
FIG. 1 is an enlarged cross-sectional view of a part A in FIG. 3 showing a heat shielding member 33 of a silicon single crystal pulling apparatus according to the present invention.
FIG. 2 is an exploded configuration diagram showing the configuration of the heat shielding member.
FIG. 3 is a cross-sectional configuration diagram of the silicon single crystal pulling apparatus.
[Explanation of symbols]
13 Quartz crucible 12 Silicon melt 18 Heater 25 Silicon single crystal rod 34 Outer cylinder member 34a Flange 37 Inner cylinder member 38 Insulating material 41 Swelling part 42 Bottom wall 42b Groove 44 Vertical wall 44a Projection 46 Top wall 47 Heat storage member

Claims (2)

石英るつぼ(13)の外周面を包囲するヒータ(18)により加熱されて前記石英るつぼ(13)に貯留されたシリコン融液(12)からシリコン単結晶棒(25)を引上げる装置に設けられ、下端が前記シリコン融液(12)表面から間隔をあけて上方に位置しかつ前記シリコン単結晶棒(25)の外周面を包囲して前記ヒータ(18)からの輻射熱を遮る外筒部材(34)と、前記外筒部材(34)の下部に筒内の方向に膨出して設けられた膨出部(41)と、前記膨出部(41)の内部に設けられ前記シリコン単結晶棒(25)の下部外周面を包囲するリング状の蓄熱部材(47)とを備えた熱遮蔽部材において、
前記外筒部材(34)の下部内周にフランジ(34a)が全周に形成され、
前記膨出部(41)は、前記外筒部材(34)に上側から挿入され外周が前記フランジ(34a)に設置され内周が前記シリコン単結晶棒(25)の外周面近傍に達するリング状の底壁(42)と、
前記外筒部材(34)に上側から挿入され前記底壁(42)の内周に下縁が密接する円筒状の縦壁(44)と、
前記縦壁(44)の上縁に内周が連設されて前記縦壁(44)と一体的に形成され外周が前記外筒部材(34)に接続される上壁(46)とにより構成され、
前記底壁 (42) の外周下部に前記フランジ (34a) の厚さに等しい段部 (42a) が形成されて前記底壁 (42) の外周が前記フランジ (34a) に設置された状態で前記段部 (42a) の外周面が前記フランジ (34a) の内周面に対向して断面クランク状の接合線を形成するように構成され、
前記縦壁 (44) の下縁に下方に突出する凸条 (44a) が全周に形成され、
前記底壁 (42) の内周に前記凸条 (44a) が挿入可能な凹溝 (42b) が全周に形成された
ことを特徴とするシリコン単結晶引上げ装置の熱遮蔽部材。
Provided in a device for pulling up the silicon single crystal rod (25) from the silicon melt (12) stored in the quartz crucible (13) by being heated by a heater (18) surrounding the outer peripheral surface of the quartz crucible (13). An outer cylinder member whose lower end is located above and spaced from the surface of the silicon melt (12) and surrounds the outer peripheral surface of the silicon single crystal rod (25) to block radiant heat from the heater (18) ( 34), a bulge portion (41) provided to bulge in the direction of the cylinder at the lower portion of the outer cylinder member (34), and the silicon single crystal rod provided inside the bulge portion (41) In a heat shielding member comprising a ring-shaped heat storage member (47) surrounding the lower outer peripheral surface of (25),
A flange (34a) is formed on the entire inner periphery of the lower inner periphery of the outer cylinder member (34),
The bulging portion (41) is inserted into the outer cylinder member (34) from the upper side, the outer periphery is installed on the flange (34a), and the inner periphery reaches the vicinity of the outer peripheral surface of the silicon single crystal rod (25). The bottom wall (42) of the
A cylindrical vertical wall (44) inserted from above into the outer cylinder member (34) and having a lower edge in close contact with the inner periphery of the bottom wall (42),
The upper wall (46) is connected to the outer cylinder member (34) by forming an inner periphery continuously with the upper edge of the vertical wall (44) and integrally forming with the vertical wall (44). It is,
A step portion (42a) equal to the thickness of the flange (34a) is formed at the lower outer periphery of the bottom wall (42), and the outer periphery of the bottom wall (42 ) is installed on the flange (34a). The outer peripheral surface of the stepped portion (42a) is configured to form a joint line having a crank-shaped cross section facing the inner peripheral surface of the flange (34a) ,
A ridge (44a) projecting downward is formed on the entire periphery of the lower edge of the vertical wall (44) ,
A heat shielding member for a silicon single crystal pulling apparatus , wherein a groove (42b) into which the protrusion (44a) can be inserted is formed on the inner periphery of the bottom wall (42) .
外筒部材(34)と所定の間隔を開けて前記外筒部材(34)と同心に設けられた内筒部材(37)と、前記外筒部材(34)と前記内筒部材(37)の間に介在された断熱材(38)とを更に備え、
前記内筒部材(37)は下端が上壁(46)の外周に連設されて前記上壁(46)及び縦壁(44)と一体的に形成された請求項1記載のシリコン単結晶引上げ装置の熱遮蔽部材。
An inner cylinder member (37) provided concentrically with the outer cylinder member (34) at a predetermined interval from the outer cylinder member (34), and the outer cylinder member (34) and the inner cylinder member (37). A heat insulating material (38) interposed therebetween,
The silicon single crystal pulling-up method according to claim 1, wherein the inner cylindrical member (37) is formed integrally with the upper wall (46) and the vertical wall (44) with a lower end provided continuously with an outer periphery of the upper wall (46). Heat shield member of the device.
JP2003153950A 2003-05-30 2003-05-30 Heat shielding member of silicon single crystal pulling device Expired - Lifetime JP4161804B2 (en)

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JP2007182355A (en) * 2006-01-10 2007-07-19 Sumco Corp Heat shielding member of silicon single crystal pulling apparatus
US8152921B2 (en) * 2006-09-01 2012-04-10 Okmetic Oyj Crystal manufacturing
KR101494521B1 (en) * 2013-04-30 2015-02-17 웅진에너지 주식회사 Heat shield structure
TWM485251U (en) 2014-04-03 2014-09-01 Globalwafers Co Ltd Crystal growth apparatus and thermal insulation cover thereof
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CN106521617A (en) * 2016-12-13 2017-03-22 宝鸡市宏佳有色金属加工有限公司 Molybdenum guide cylinder and single crystal furnace
DE102018217509A1 (en) * 2018-10-12 2020-04-16 Siltronic Ag Device for pulling a single crystal of semiconductor material according to the CZ method from a melt and method using the device
CN111172585A (en) * 2018-11-12 2020-05-19 上海新昇半导体科技有限公司 Reflecting screen of single crystal growth furnace and single crystal growth furnace
DE112021004653T5 (en) 2020-09-02 2023-06-29 Xi'an ESWIN Material Technology Co., Ltd. Cylinder arrangement of a single crystal pulling device and a single crystal pulling device
CN114197034B (en) * 2020-09-02 2024-08-16 西安奕斯伟材料科技股份有限公司 Combined sleeve of single crystal furnace and single crystal furnace

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