JP4131599B2

JP4131599B2 - Chemical immersion treatment equipment

Info

Publication number: JP4131599B2
Application number: JP15062399A
Authority: JP
Inventors: 幸人松原
Original assignee: Macoho Co Ltd
Current assignee: Macoho Co Ltd
Priority date: 1999-05-28
Filing date: 1999-05-28
Publication date: 2008-08-13
Anticipated expiration: 2019-05-28
Also published as: JP2000334350A

Description

【０００１】
【発明の属する技術分野】
本発明は、薬液浸漬処理装置に関するものである。
【０００２】
【従来の技術及び発明が解決しようとする課題】
プレスなどにより一時加工されたワークに薬液などによって化学処理を行う方法には、薬液溜部に適宜な方法により薬液を注ぎ、薬液を溜めた薬液溜部にワークを浸漬して化学処理を行う薬液浸漬処理方法と、前記薬液浸漬処理方法のように溜めた薬液にワークを浸漬するのではなく、シャワー装置によってワークに薬液を散布するシャワー処理方法とがあるが、ワークの化学処理の際に可及的にワークと空気とを接触させたくない場合などには前記シャワー処理方法は採用することができず、必然的に薬液浸漬処理方法が採用される。
【０００３】
ところで、ワークに表面調整や化成処理の異なる化学処理を続けて行う為に、該ワークを夫々異なる薬液が溜められた複数の薬液溜部に順次浸漬して化学処理を行う場合など、並設された複数の薬液溜部で異なる薬液浸漬処理を順次行う薬液浸漬処理装置は、一般的にワークが各薬液溜部中を通過するように構成されている。
【０００４】
具体的には、図１に図示したように、ワーク３を載置する搬送ライン５は薬液２が溜められている一の薬液溜部と他の薬液溜部との間に設けられる壁部31を乗り越えるように構成される為、該壁部31付近において、搬送ライン５は一旦斜め上方へ上昇し、続いて、壁部31を乗り越え、続いて、斜め下方へ降下するように設定されている（以下、従来例という。尚、実施例と同一構成部分には同一符号を付した。）。
【０００５】
しかし、この従来例では、搬送ライン５が斜め上方に上昇したり斜め下方に降下したりする為、該上昇工程部分と降下工程部分の分、薬液浸漬処理装置全体の長さが長くなってしまうという問題点がある。
【０００６】
更に、例えば、反応性の高いワークの化成処理など、ワーク３を一の薬液溜部１ａから他の薬液溜部１ｂへ可及的に迅速に搬送しなければならない場合、従来例では、前記搬送ライン５が薬液溜部１の壁部31を乗り越える工程が邪魔になるという問題点がある。また、搬送ライン５が薬液溜部１の壁部31を乗り越える時間を可及的に少なくする為には搬送ライン５の移動速度を速めねばならないが、この場合、ワーク３が薬液２に浸漬している時間を必要時間確保しなければならない為、薬液溜部１の前後長が長くなり、薬液浸漬処理装置全体の長さが更に長くなってしまうという問題点がある。
【０００７】
また、前記従来例とは異なり、図２に図示したような、搬送ライン５にワーク３を吊り下げて移動するタイプの薬液浸漬処理装置においても、同様の問題が発生する。
【０００８】
本発明は、上記問題点を解決した薬液浸漬処理装置を提供するものである。
【０００９】
【課題を解決するための手段】
添付図面を参照して本発明の要旨を説明する。
【００１０】
ワーク３に薬液浸漬せしめる薬液浸漬処理装置であって、前記ワーク３を直線状に移動可能とする搬送手段に、前記ワーク３の搬送方向に所定間隔をおいて配設された壁部７により区画されるワーク配設部 25 が該ワーク３の搬送方向に複数並設され、また、前記ワーク配設部 25 は移動不能な区画部６内において近接状態にして移動可能に構成され、前記ワーク配設部 25には薬液２を導入する薬液導入部21及び前記薬液２を導出する薬液導出部22が設けられ、前記ワーク３に薬液浸漬せしめる薬液溜部１は、前記ワーク配設部 25 が前記区画部６内を移動する際、前記壁部７と前記区画部６とにより囲繞され前記薬液導入部 21 からの薬液導入量に比し前記薬液導出部 22 からの薬液導出量が減少することで前記薬液２が溜められて形成される部位であることを特徴とする薬液浸漬処理装置に係るものである。
【００１１】
また、請求項１記載の薬液浸漬処理装置において、前記区画部６には薬液排出部 20 が設けられていることを特徴とする薬液浸漬処理装置に係るものである。
【００１２】
また、請求項１，２いずれか１項に記載の薬液浸漬処理装置において、前記ワーク配設部の移動は、所定時間で進行と停止とを繰り返す間欠式移動が採用されていることを特徴とする薬液浸漬処理装置に係るものである。
【００１３】
また、請求項１〜３いずれか１項に記載の薬液浸漬処理装置において、前記ワーク配設は、無限循環運動する搬送ライン５上に設けられていることを特徴とする薬液浸漬処理装置に係るものである。
【００１４】
また、請求項１〜４いずれか１項に記載の薬液浸漬処理装置において、前記薬液２は前記薬液溜部１の下方から供給されるように構成されていることを特徴とする薬液浸漬処理装置に係るものである。
【００１５】
【発明の作用及び効果】
請求項１記載の発明においては、ワーク３はワーク配設部 25 に配設され、このワーク配設部 25 は適宜な手段により直線状に移動し、また、ワーク配設部 25 は薬液２が導入されたり導出されたりする構成の為、ワーク３をワーク配設部 25 に配設し、このワーク配設部 25 が区画部６内を移動する際に形成される薬液溜部１に薬液２を導入して溜め、該ワーク３を薬液浸漬処理し、続いて、この薬液溜部１から該薬液２を導出し、別の薬液２を該薬液溜部１に導入して薬液浸漬処理し、この繰り返しにより、ワーク３を移動させつつ複数の薬液２でワーク３を薬液浸漬処理することができる。
【００１６】
このように請求項１の発明は、薬液２を上方からシャワーとして散布する方法ではない為、反応性の高い素材のワーク３などでも良好に化学処理することができ、また、ワーク３を浸漬処理する場合、一の薬液２により浸漬処理した後のワーク３の移動は従来例と異なり直線状となるから、薬液浸漬処理装置全体の長さを短くすることや、ワーク３の一の薬液処理から他の薬液処理までの時間を短縮することができる。
【００１７】
本発明は上述のように構成したから、薬液浸漬処理装置全体の長さを短くすることができ、更に一の薬液処理から他の薬液処理までの時間を短縮して薬液浸漬処理を良好に行うことができる実用性に秀れた薬液浸漬処理装置となる。
【００１８】
【発明の実施の形態】
図３〜７は本発明の一実施例を図示したものであり、以下に説明する。
【００１９】
本実施例は、薬液２を溜めるワーク配設部 25 が複数並設され、このワーク配設部 25 にワーク３を配設して該ワーク３に薬液浸漬処理を施す薬液浸漬処理装置４であって、複数のワーク配設部 25 が適宜な手段により直線状に移動可能に構成され、また、この複数のワーク配設部 25 には該ワーク配設部 25 に薬液２の導入する薬液導入部21及び薬液２を導出する薬液導出部22が設けられているものである。
【００２０】
ワーク配設部 25 は無限循環運動する搬送ライン５（ワーク搬送体５）に設けられている。具体的には、搬送ライン５には搬送方向と直交する方向に配設される壁部７が所定間隔を置いて複数並設され、該壁部７間がワーク配設部 25 に設定されている。
【００２１】
即ち、壁部７間にして搬送ライン５の上部はワーク３を載置するワーク配設部 25 に設定されている。
【００２２】
また、ワーク配設部 25 が通液可能に設定されて薬液導入部21及び薬液導出部22が設けられている。具体的には、ワーク配設部 25 はワーク３を支持する支持板材や回転ローラが複数並設された構成で、該支持板材や回転ローラの隙間から導入される薬液２や導出される薬液２が通過できるように構成されている。
【００２３】
また、搬送ライン５は所定時間で進行と停止とを繰り返す間欠動作式の搬送ライン５が採用されており、必然的にワーク配設部 25 も間欠動作しながら移動する。
【００２４】
搬送ライン５と共に移動するワーク配設部 25 の左右側方及び下方には該ワーク配設部 25 と近接状態で薬液２を充填することができる区画部６が移動不能に設けられ、この区画部６は所定長を有し、所定箇所において薬液２の導入及び導出が可能に構成され、更に該区画部６内においてワーク配設部 25 が移動可能に構成されている。
【００２５】
また、区画部６には薬液排出部 20が設けられており、該薬液排出部 20から薬液２が排出されるように構成されている。
【００２６】
また、搬送ライン５の下方にして薬液浸漬処理装置４には、ワーク配設部 25 に薬液２を供給する薬液供給部９が該ワーク配設部 25 の移動方向に沿って複数並設されている。この薬液供給部９から供給された薬液２は、前記搬送ライン５のワーク配設部 25 の薬液導入部21を通過してワーク配設部 25 内のワーク３に達する。
【００２７】
即ち、薬液供給部９から供給された薬液２は、ワーク配設部 25 内のワーク３が前後の壁部７と区画部６とによって囲繞された状態において、該前後の壁部７と区画部６との隙間などからは漏洩するものの、該漏洩される薬液２よりも薬液供給部９から供給される薬液２の方が多ければ該前後の壁部７と区画部６とによって囲繞されて成る薬液溜部１内で薬液２は所定の液位となり、該薬液溜部１内のワーク３を薬液２に浸漬することができる。
【００２８】
また、薬液供給部９から供給される薬液２が多すぎて薬液２の液位が高くなり過ぎた場合、薬液２は前後の壁部７若しくは区画部６を乗り越えて薬液溜部１から排出されるか、若しくは隣接する薬液溜部１に供給される。
【００２９】
薬液供給部９の下方には、前記前後の壁部７と区画部６との隙間などから漏洩された薬液２や、前記前後の壁部７若しくは区画部６を乗り越えて薬液溜部１から排出された薬液２を集めて回収する薬液回収部10がワーク配設部 25 の移動方向に沿って複数設けられている。また、薬液回収部10の下方には、回収された薬液２を貯溜する薬液貯溜部11が夫々設けられている。また、薬液貯溜部11と薬液供給部９とは連結されており、該薬液貯溜部11に貯溜された薬液２は薬液供給部９から再び供給される。
【００３０】
図中、符号12は搬送ライン５のワーク配設部 25 にワーク２を供給するワーク供給部、13は薬液浸漬処理を終えたワーク２を回収するワーク回収部、14は薬液２が薬液浸漬処理装置４外へ漏洩することを防止する外壁部、15は区画部６と外壁部14 との間に設けられ搬送ライン５の搬送方向へ移動して該搬送ライン５、即ちワーク配設部 25 を移動させるチェーン状の駆動部材、16は搬送ライン５の始端と終端とに設けられ前記駆動部材15と噛合し回転して該駆動部材15を移動させる回転体、17は駆動部15を支持して該駆動部15及び搬送ライン５の水平移動を支持する支持部、18は搬送ライン５と駆動部15とを連結し搬送ライン５を吊り下げ状態で支持するアーム部である。
【００３１】
また、外壁部14は、左右方向（搬送ライン５の搬送方向）にスライド移動自在で且つ着脱自在に設けられており、必要に応じて外壁部14を左右にスライドさせたり取り外したりしてワーク配設部 25 や搬送ライン５や区画部６や駆動部材15などの点検，補修などを簡単に行えるように構成している。
【００３２】
以下、本実施例の作用について詳述する。
【００３３】
ワーク配設部 25 内、即ち、搬送ライン５のワーク配設部 25 に載置されたワーク３は、搬送ライン５の移動に伴い、該搬送ライン５の近傍に区画部６が設けられている部位に到達する。
【００３４】
この際、ワーク３の左右側方及び下方には区画部６が設けられ且つ前後には壁部７が設けられた状態となり、この区画部６と壁部７とによって囲繞されて成る薬液溜部１に搬送ライン５の下方の薬液供給部９及び薬液導入部21から供給された薬液２が溜められていき、該溜められた薬液２によってワーク３に薬液浸漬処理が行われる。また、区画部６と壁部７との隙間などから漏洩した薬液２や，区画部６や壁部７の上部からオーバーフローした薬液２は、薬液回収部10を経由して薬液貯溜部11に溜められ、再び薬液供給部９から薬液溜部１に供給される。また、このオーバーフローした薬液２が薬液浸漬処理装置４外へ漏洩することは前記外壁部14によって阻止される。
【００３５】
続いて、搬送ライン５が移動すると、引き続き該搬送ライン５の近傍に区画部６が存在している場合と、搬送ライン５が区画部６の薬液排出部 20に合致する場合とのいずれかの状態となるが、これらの場合、下記のようになる。
【００３６】
引き続き搬送ライン５の近傍に区画部６が存在している部位へ搬送ライン５が移動した場合、同じ薬液２による薬液浸漬処理が可能となる。即ち、区画部６の前後長によって、各薬液２による薬液浸漬処理時間の比を設定することができる。尚、薬液浸漬処理時間の総和の長短は搬送ライン５の前後長や搬送ライン５の移動速度によって設定することができる。
【００３７】
一方、搬送ライン５が薬液排出部 20と合致する部位へ搬送ライン５が移動した場合、ワーク２が浸漬されていた薬液２が該薬液排出部 20から一気に排出され、薬液２の液位が低下し、ワーク２が露出する。尚、薬液溜部１の側方に薬液排出部 20を設けた場合でも下方に薬液排出部 20を設けた場合でも、同様に該薬液排出部 20から薬液２が一気に排出される。
【００３８】
続いて、搬送ライン５が薬液排出部 20に合致する部位を通過した搬送ライン５が、該搬送ライン５の左右に区画部６が存在している部位へ移動し、該部位における搬送ライン５の下方の薬液供給部10から供給される薬液２（例えば、前に使用した薬液２とは別の薬液２。）によってワーク３に再び薬液浸漬処理が行われる。
【００３９】
即ち、ワーク２が区画部６内で薬液浸漬処理された後、一旦区画部６の薬液排出部 20を経由して別の区画部６に達することにより、搬送ライン５を水平移動する薬液浸漬処理装置でありながら、ワーク３に異なる薬液処理を行うことができる。即ち、従来例と異なり、ワーク３を一の薬液処理を行うを一の薬液溜部１から他の薬液処理を行う他の薬液溜部１へと水平移動させることができ、該一の薬液溜部１で使用する薬液２と他の薬液溜部１で使用する薬液２とが混合したりせずに、夫々独立した薬液浸漬処理を行うことができる。
【００４０】
以下、同様に、ワーク３の化学処理に必要な前処理や表面調整処理や薬品浸漬処理や洗浄処理や乾燥処理などが搬送ライン５の移動とともにワーク３に順次施されていく。
【００４１】
本実施例は上述のように、ワーク３が水平方向へ移動する為、ワーク３に薬液浸漬処理を施す薬液溜部１の前後長を必要最低限の長さ、即ち、ワーク３を薬液溜部１内の薬液２に浸漬させる分だけの長さにすることができ、よって、薬液浸漬処理装置４全体の長さを短くすることができる実用性，コンパクト性に秀れた薬液浸漬処理装置となる。
【００４２】
また、従来例のようにワーク３が上方へ移動したり下方へ移動したりしない為、該ワーク３が上方へ移動したり下方へ移動したりする時間の分、ワーク３の一の薬液処理から他の薬液処理までの時間を短縮することができ、異なる薬液浸漬処理を可及的に速やかに連続して行いたい場合などにおいても、該搬送される時間の短縮の分、速やかに異なる薬液浸漬処理を行うことができる実用性に秀れた薬品浸漬処理装置となる。
【００４３】
また、薬液溜部１に薬液２を溜めたり該薬液２が溜められた薬液溜部１から薬液２を除去したりすることで、前後の薬液溜部１間で搬送ライン５を水平移動させても該前後の薬液溜部１の薬液２が混合したりせずに良好に薬液浸漬処理を行うことができる実用性に秀れた薬液浸漬処理装置となる。
【００４４】
また、薬液２が供給される量と薬液２が排出される量との相関によって、薬液溜部１に薬液２を溜めたり該薬液２が溜められた薬液溜部１から薬液２を除去したりすることになるから、簡単な構成で搬送ライン５を水平移動させても前後の薬液溜部１の薬液２が混合したりせずに良好に薬液浸漬処理を行えることになる実用性に秀れた薬液浸漬処理装置となる。
【００４５】
また、薬液溜部１の近傍に区画部６が存在したり存在しなかったりすることにより、薬液溜部１から薬液２が排出される量が変化して薬液２が供給される量と薬液２が排出される量との相関が変化するように構成したから、区画部６の前後長によって同じ薬液２により薬液浸漬処理の時間を設定することができる実用性，設定容易性に秀れた薬液浸漬処理装置となる。
【００４６】
また、薬液２は薬液溜部１の下方から供給されるように構成されているから、薬液２中に気泡が含まれたりせずにワーク３を良好に薬液浸漬処理することができる実用性に秀れた薬液浸漬処理装置となる。
【００４７】
また、搬送ライン５は所定時間で進行と停止とを繰り返す間欠式の搬送ライン５であるから、ワーク３が前後の壁部７と区画部６とによって囲繞された状態を可及的に長時間保持することができ（搬送ライン５が進行のみを行う場合には、搬送ライン５の移動によって区画部６と壁部７との隙間が常に徐々に広がり、該隙間から薬液２が漏洩し易い。）、よって、良好な薬液浸漬処理を行うことができる実用性に秀れた薬液浸漬処理装置となる。
【図面の簡単な説明】
【図１】従来例の説明図である。
【図２】従来例の別例の説明図である。
【図３】本実施例の説明側断面図である。
【図４】本実施例の説明平面図である。
【図５】本実施例の要部の説明斜視図であり、並設されている第１，第２及び第３の３つのワーク配設部 25 の内、第１及び第３のワーク配設部 25 の壁部７を省略している。
【図６】本実施例の説明縦断面図である。
【図７】本実施例の説明縦断面図である。
【符号の説明】
１薬液溜部
２薬液
３ワーク
４薬液浸漬処理装置
５搬送ライン，ワーク搬送体
６区画部
７壁部
19 薬液通液路
20 薬液導出部，切欠部
21 薬液導入部
22 薬液導出部
25 ワーク配設部 [0001]
BACKGROUND OF THE INVENTION
The present invention relates to a chemical liquid immersion treatment apparatus.
[0002]
[Prior art and problems to be solved by the invention]
For chemical processing with a chemical solution or the like on a workpiece that has been temporarily processed by a press or the like, the chemical solution is poured into the chemical solution reservoir by an appropriate method, and the workpiece is immersed in the chemical solution reservoir that stores the chemical solution to perform chemical treatment. There are an immersion treatment method and a shower treatment method in which the chemical solution is sprayed on the workpiece by a shower device instead of immersing the workpiece in the collected chemical solution as in the chemical immersion treatment method. When it is not desired to bring the workpiece and air into contact with each other, the shower treatment method cannot be employed, and the chemical solution immersion treatment method is necessarily employed.
[0003]
By the way, in order to continuously perform chemical treatment with different surface adjustment and chemical conversion treatment on the workpiece, the workpiece is placed side by side in order to perform chemical treatment by sequentially immersing the workpiece in a plurality of chemical solution reservoirs each storing different chemical solutions. In addition, a chemical solution immersion treatment apparatus that sequentially performs different chemical solution immersion treatments in a plurality of chemical solution reservoirs is generally configured such that a workpiece passes through each chemical solution reservoir.
[0004]
Specifically, as shown in FIG. 1, the transfer line 5 on which the workpiece 3 is placed has a wall portion 31 provided between one chemical solution reservoir in which the chemical solution 2 is stored and another chemical solution reservoir. Therefore, in the vicinity of the wall portion 31, the conveyance line 5 is set so as to rise obliquely upward, subsequently over the wall portion 31, and then descend obliquely downward. (Hereinafter, it is referred to as a conventional example. In addition, the same reference numerals are given to the same components as in the embodiment)
[0005]
However, in this conventional example, since the transport line 5 rises obliquely upward or descends obliquely downward, the length of the entire chemical solution immersion treatment apparatus is increased by the ascending process part and the descending process part. There is a problem.
[0006]
Furthermore, for example, when the workpiece 3 must be transported as quickly as possible from one chemical reservoir 1a to another chemical reservoir 1b, such as chemical conversion treatment of a highly reactive workpiece, There is a problem that the process in which the line 5 gets over the wall 31 of the chemical reservoir 1 is an obstacle. Further, in order to minimize the time for the transfer line 5 to get over the wall 31 of the chemical solution reservoir 1, the moving speed of the transfer line 5 must be increased. In this case, the work 3 is immersed in the chemical solution 2. Therefore, there is a problem that the front and rear length of the chemical solution reservoir 1 becomes longer and the entire length of the chemical immersion treatment apparatus becomes further longer.
[0007]
Unlike the conventional example, the same problem occurs in a chemical immersion treatment apparatus of the type that moves the work 3 while being suspended on the transfer line 5 as shown in FIG.
[0008]
This invention provides the chemical | medical solution immersion treatment apparatus which solved the said problem.
[0009]
[Means for Solving the Problems]
The gist of the present invention will be described with reference to the accompanying drawings.
[0010]
A chemical immersion processing apparatus for immersing the chemical in the workpiece 3, which is partitioned by a wall portion 7 disposed at a predetermined interval in the conveyance direction of the workpiece 3 in a conveyance means that allows the workpiece 3 to move linearly. a plurality juxtaposed workpieces arrangement portion 25 in the conveying direction of the workpiece 3 that is, also, the work placement part 25 is movable in the proximity in the immovable partition unit 6, the work distribution the portion 25 chemical derivation unit 22 derives the chemical introduction unit 21 and the chemical solution 2 for introducing a liquid chemical 2 is provided, the drug solution reservoir 1 allowed to chemical immersion in the work 3, the work placement part 25 is the When moving in the partition part 6, the amount of the chemical solution derived from the chemical solution deriving unit 22 is reduced compared to the amount of the chemical solution introduced from the chemical solution introducing unit 21 surrounded by the wall 7 and the partition unit 6. This is a part formed by storing the chemical 2 The present invention relates to a chemical liquid immersion treatment apparatus characterized by:
[0011]
The chemical solution immersion treatment apparatus according to claim 1 , wherein the partition unit 6 is provided with a chemical solution discharge unit 20 .
[0012]
Moreover, in the chemical | medical solution immersion treatment apparatus of any one of Claim 1, 2, the movement of the said workpiece | work arrangement | positioning part is employ | adopted the intermittent type movement which repeats advancing and a stop in predetermined time, It is characterized by the above-mentioned. The present invention relates to a chemical immersion treatment apparatus.
[0013]
Moreover, the chemical | medical solution immersion treatment apparatus of any one of Claims 1-3 WHEREIN : The said workpiece | work arrangement | positioning concerns on the chemical | medical solution immersion treatment apparatus characterized by being provided on the conveyance line 5 which carries out an infinite circulation movement. Is.
[0014]
5. The chemical solution immersion treatment apparatus according to claim 1, wherein the chemical solution 2 is configured to be supplied from below the chemical solution reservoir 1. It is related to.
[0015]
[Action and effect of the invention]
In the first aspect of the present invention, the workpiece 3 is disposed on the work placement part 25, this work placement part 25 is moved linearly by a suitable means, the work placement part 25 is chemical 2 There for configuration or is derived or introduced, the workpiece 3 is disposed on the work placement part 25, the drug reservoir portion 1 which is formed during the work placement part 25 to move the compartment portion 6 The chemical solution 2 is introduced and stored, and the workpiece 3 is immersed in the chemical solution. Subsequently, the chemical solution 2 is led out from the chemical solution reservoir 1, and another chemical solution 2 is introduced into the chemical solution reservoir 1 to be immersed in the chemical solution. And by repeating this, the workpiece | work 3 can be immersed in the chemical | medical solution with the some chemical | medical solution 2 while moving the workpiece | work 3. FIG.
[0016]
Thus, since the invention of claim 1 is not a method of spraying the chemical solution 2 as a shower from above, it is possible to satisfactorily perform chemical treatment even on a highly reactive material such as a workpiece 3, and the workpiece 3 is immersed. In this case, since the movement of the workpiece 3 after the immersion treatment with one chemical solution 2 is linear unlike the conventional example, the length of the whole chemical immersion treatment apparatus is shortened, or one chemical treatment of the workpiece 3 is performed. The time until the other chemical treatment can be shortened.
[0017]
Since the present invention is configured as described above, the entire length of the chemical immersion treatment apparatus can be shortened, and the time from one chemical treatment to another chemical treatment can be shortened to perform the chemical immersion treatment satisfactorily. It becomes a chemical solution immersion processing apparatus excellent in practicality.
[0018]
DETAILED DESCRIPTION OF THE INVENTION
3 to 7 illustrate one embodiment of the present invention, which will be described below.
[0019]
This embodiment, the work placement part 25 Ru reservoir the chemical 2 is more juxtaposed, chemical immersion treatment device is disposed a workpiece 3 to this work placement part 25 performs a chemical immersion process in the workpiece 3 4 a is a plurality of work placement part 25 is configured to be movable linearly by appropriate means, to the plurality of work placement part 25 for introducing the chemical solution 2 to the work placement part 25 chemical The introduction part 21 and the chemical solution outlet 22 for extracting the chemical liquid 2 are provided.
[0020]
The work disposition unit 25 is provided on the transport line 5 (work transport body 5) that moves infinitely. Specifically, a plurality of wall portions 7 arranged in a direction orthogonal to the conveyance direction are arranged in parallel on the conveyance line 5 with a predetermined interval, and a work arrangement portion 25 is set between the wall portions 7. Yes.
[0021]
That is, the upper portion of the conveying line 5 and between the wall portion 7 is set in the work placement part 25 you place the word click 3.
[0022]
In addition , the work placement unit 25 is set to allow liquid to pass therethrough, and a chemical solution introduction unit 21 and a chemical solution discharge unit 22 are provided. Specifically , the work placement unit 25 is configured by a plurality of support plate materials and rotating rollers that support the work 3, and the chemical solution 2 introduced from the gap between the support plate material and the rotation roller and the derived chemical solution 2. Is configured to pass through.
[0023]
Further, the conveyance line 5 employs an intermittent operation type conveyance line 5 that repeats advancing and stopping in a predetermined time, and the work placement unit 25 inevitably moves while being intermittently operated.
[0024]
The left and right sides and below the work placement part 25 that move the lane mark portion 6 which can be filled with the drug solution 2 in proximity with the work placement part 25 is provided immovably together with the conveying line 5, the partition part 6 has a predetermined length, the introduction and derivation of chemical 2 in predetermined positions can be constructed, and is configured to be movable work placement part 25 Te further compartment portion 6 in smell.
[0025]
Also, the partition unit 6 is provided with a drug solution discharge section 2 0, chemical 2 from the liquid chemical discharge unit 2 0 is configured to be discharged.
[0026]
Further, in the chemical immersion treatment device 4 below the conveying line 5, chemical liquid supply unit 9 for supplying a chemical liquid 2 in the work placement part 25 is more arranged along the moving direction of the workpiece placement part 25 Yes. The chemical solution supply unit 9 chemical 2 supplied from reaches the workpiece 3 in the work placement part 25 through the liquid medicine inlet portion 21 of the work placement part 25 of the conveying line 5.
[0027]
That is, the chemical solution 2 supplied from the chemical solution supply unit 9 is in a state where the workpiece 3 in the workpiece placement unit 25 is surrounded by the front and rear wall portions 7 and the partition portion 6. although the like clearance between 6 leaks, is surrounded by the wall portion 7 it is later front the more of the chemical 2 supplied from the chemical liquid supply unit 9 than chemical 2 is the leakage and the partitioning portion 6 In the chemical solution reservoir 1 , the chemical solution 2 becomes a predetermined liquid level, and the workpiece 3 in the chemical solution reservoir 1 can be immersed in the chemical solution 2.
[0028]
Further, when the chemical liquid 2 supplied from the chemical liquid supply unit 9 is too much and the liquid level of the chemical liquid 2 becomes too high, the chemical liquid 2 gets over the front and rear wall parts 7 or the partition parts 6 and is discharged from the chemical liquid storage part 1. Or is supplied to the adjacent chemical reservoir 1.
[0029]
Below the chemical solution supply unit 9, the chemical solution 2 leaked from the gap between the front and rear wall portions 7 and the partitioning portion 6, and over the front and rear wall portion 7 or the partitioning portion 6 and discharged from the chemical solution storage unit 1. A plurality of chemical recovery units 10 that collect and recover the chemicals 2 that have been collected are provided along the direction of movement of the workpiece placement unit 25 . In addition, below the chemical solution recovery unit 10, a chemical solution storage unit 11 for storing the recovered chemical solution 2 is provided. Further, the chemical solution storage unit 11 and the chemical solution supply unit 9 are connected, and the chemical solution 2 stored in the chemical solution storage unit 11 is supplied again from the chemical solution supply unit 9.
[0030]
In the figure, reference numeral 12 denotes a workpiece supply unit that supplies the workpiece 2 to the workpiece placement unit 25 of the transfer line 5, 13 denotes a workpiece collection unit that collects the workpiece 2 after the chemical solution immersion treatment, and 14 denotes a chemical solution 2 immersion treatment. outer wall to prevent leakage of the device 4 outside, 15 partition part 6 and the conveying line 5 and moved to the conveying direction of the conveyor line 5 is provided between the outer wall 14, immediately Chi work placement part 25 A chain-like drive member for moving the drive line 16, a rotating body provided at the start and end of the conveying line 5 that meshes with the drive member 15 and rotates to move the drive member 15, and 17 supports the drive unit 15. The support unit 18 supports the horizontal movement of the drive unit 15 and the transfer line 5, and 18 is an arm unit that connects the transfer line 5 and the drive unit 15 and supports the transfer line 5 in a suspended state.
[0031]
Further, the outer wall portion 14, the left-right direction and and detachably attached freely slide in the (conveyance direction of the conveying line 5), and or removed by sliding the outer wall 14 to the left and right as necessary work distribution Inspection, repair, etc. of the installation part 25 , the conveyance line 5, the partition part 6, the drive member 15, etc. can be performed easily.
[0032]
Hereinafter, the operation of the present embodiment will be described in detail.
[0033]
The workpiece 3 placed in the workpiece placement portion 25 , that is, the workpiece placement portion 25 of the transfer line 5 is provided with a partition 6 in the vicinity of the transfer line 5 as the transfer line 5 moves. Reach the site.
[0034]
At this time, the partition part 6 is provided on the left and right sides and the lower side of the work 3 and the wall part 7 is provided on the front and rear, and the chemical solution reservoir formed by being surrounded by the partition part 6 and the wall part 7. The chemical solution 2 supplied from the chemical solution supply unit 9 and the chemical solution introduction unit 21 below the conveyance line 5 is stored in the unit 1, and the chemical solution immersion process is performed on the workpiece 3 by the stored chemical solution 2. Further, the chemical liquid 2 leaking from the gap between the partition 6 and the wall 7 and the chemical liquid 2 overflowing from the upper part of the partition 6 or the wall 7 are stored in the chemical storage 11 through the chemical recovery unit 10. Then, it is supplied again from the chemical solution supply unit 9 to the chemical solution storage unit 1. Further, the outer wall portion 14 prevents the overflowing chemical liquid 2 from leaking out of the chemical liquid immersion treatment apparatus 4.
[0035]
Subsequently, when the transport line 5 moves, either the case where the partition unit 6 is present in the vicinity of the transport line 5 or the case where the transport line 5 matches the chemical solution discharge unit 20 of the partition unit 6. In these cases, the situation is as follows.
[0036]
When the conveyance line 5 continues to move to a site where the partition 6 exists in the vicinity of the conveyance line 5, the chemical solution immersion treatment with the same chemical solution 2 is possible. That is, the ratio of the chemical solution immersion treatment time for each chemical solution 2 can be set by the longitudinal length of the partition part 6. In addition, the length of the sum total of chemical | medical solution immersion processing time can be set with the front-back length of the conveyance line 5, or the moving speed of the conveyance line 5. FIG.
[0037]
On the other hand, if the transport line 5 has moved the conveying line 5 to a site consistent with the drug solution discharge section 2 0, chemical 2 the work 2 it has been immersed is once discharged from the drug solution discharge section 2 0, of the chemical 2 liquid level Decreases and the workpiece 2 is exposed. Incidentally, even in the case where the drug solution discharge unit 2 0 downward even in the case where the drug solution discharge unit 2 0 on the side of the drug solution reservoir 1, chemical 2 is discharged at once as well from the drug solution discharge unit 2 0.
[0038]
Subsequently, the transport line 5 through which the transport line 5 has passed through the part that matches the chemical solution discharge unit 20 moves to a part where the partition part 6 exists on the left and right of the transport line 5, and the transport line 5 in the part. The chemical solution immersion process is performed again on the workpiece 3 by the chemical solution 2 (for example, the chemical solution 2 different from the previously used chemical solution 2) supplied from the chemical solution supply unit 10 below.
[0039]
That is, after the workpiece 2 is subjected to the chemical solution immersion process in the partition part 6 , the chemical solution is horizontally moved in the transport line 5 by once reaching the other partition part 6 via the chemical solution discharge part 20 of the partition part 6. Although it is a processing apparatus, different chemical treatments can be performed on the workpiece 3. That is, unlike the conventional example, the workpiece 3 can be moved horizontally with the performing one chemical process to another liquid medicine reservoir 1 for one of the chemical reservoir 1 or we other chemical processing, the one of the chemical The chemical solution 2 used in the reservoir 1 and the chemical solution 2 used in the other chemical reservoir 1 may not be mixed, and an independent chemical immersion process can be performed.
[0040]
Similarly, pre-processing, surface adjustment processing, chemical dipping processing, cleaning processing, and drying processing necessary for chemical processing of the workpiece 3 are sequentially performed on the workpiece 3 along with the movement of the transfer line 5.
[0041]
In the present embodiment, as described above, since the workpiece 3 moves in the horizontal direction, the front and rear length of the chemical solution reservoir 1 that performs the chemical immersion process on the workpiece 3 is the minimum necessary length, that is, the workpiece 3 is the chemical solution reservoir. A chemical immersion treatment apparatus excellent in practicality and compactness, which can be made as long as it is immersed in the chemical liquid 2 in 1, and thus the overall length of the chemical immersion treatment apparatus 4 can be shortened. Become.
[0042]
In addition, since the workpiece 3 does not move upward or downward as in the conventional example, the time required for the workpiece 3 to move upward or downward is reduced from one chemical treatment of the workpiece 3. The time to other chemical solutions can be shortened, and even when different chemical solution immersion treatments are to be performed continuously as quickly as possible, the different chemical solution immersions can be performed quickly by reducing the transport time. It becomes a chemical immersion treatment apparatus excellent in practicality capable of performing the treatment.
[0043]
Further, by storing the chemical liquid 2 in the chemical liquid reservoir 1 or removing the chemical liquid 2 from the chemical reservoir 1 where the chemical liquid 2 is stored, the transfer line 5 is moved horizontally between the front and rear chemical reservoirs 1. In addition, the chemical solution immersion treatment apparatus excellent in practicality can perform the chemical solution immersion treatment satisfactorily without mixing the chemical solutions 2 in the chemical solution reservoirs 1 before and after.
[0044]
Further, depending on the correlation between the amount of the chemical liquid 2 supplied and the amount of the chemical liquid 2 discharged, the chemical liquid 2 is stored in the chemical liquid reservoir 1 or the chemical liquid 2 is removed from the chemical liquid reservoir 1 in which the chemical liquid 2 is stored. Therefore, even if the transport line 5 is moved horizontally with a simple configuration, the chemical solution immersion process can be performed satisfactorily without mixing the chemical solution 2 in the front and rear chemical solution reservoirs 1. This is a chemical immersion treatment apparatus.
[0045]
Further, the presence or absence of the partition 6 in the vicinity of the chemical liquid reservoir 1 changes the amount of the chemical liquid 2 discharged from the chemical liquid reservoir 1 and the amount of the chemical liquid 2 supplied and the chemical liquid 2. Since the correlation with the amount discharged is changed, the chemical solution excellent in practicality and ease of setting that can set the time of chemical solution immersion treatment with the same chemical solution 2 depending on the longitudinal length of the partition part 6 It becomes an immersion treatment device.
[0046]
In addition, since the chemical solution 2 is configured to be supplied from below the chemical solution reservoir 1, the chemical solution 2 can be satisfactorily immersed in the chemical solution without bubbles being included in the chemical solution 2. It becomes an excellent chemical solution immersion treatment device.
[0047]
Further, since the transfer line 5 is an intermittent transfer line 5 that repeats advancing and stopping in a predetermined time, the state in which the work 3 is surrounded by the front and rear wall parts 7 and the partition part 6 is as long as possible. (When the conveyance line 5 only advances, the gap between the partition portion 6 and the wall portion 7 is always gradually widened by the movement of the conveyance line 5, and the chemical solution 2 is likely to leak from the gap.) Therefore, a chemical solution immersion treatment apparatus excellent in practicality capable of performing a good chemical solution immersion treatment is obtained.
[Brief description of the drawings]
FIG. 1 is an explanatory diagram of a conventional example.
FIG. 2 is an explanatory diagram of another example of the conventional example.
FIG. 3 is a side sectional view illustrating the present embodiment.
FIG. 4 is an explanatory plan view of the present embodiment.
FIG. 5 is an explanatory perspective view of the main part of the present embodiment , in which the first and third work arrangements among the first, second and third work arrangement parts 25 arranged side by side are arranged. It is omitted from the wall portion 7 of the portion 25.
FIG. 6 is an explanatory longitudinal sectional view of the present embodiment.
FIG. 7 is an explanatory longitudinal sectional view of the present embodiment.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Chemical solution storage part 2 Chemical solution 3 Workpiece 4 Chemical solution immersion processing apparatus 5 Conveyance line, workpiece conveyance body 6 Compartment part 7 Wall part
19 Chemical fluid passage
20 Chemical solution outlet, notch
21 Chemical solution introduction part
22 Chemical solution outlet
25 Work placement area

Claims

A chemical solution immersion treatment apparatus for immersing a chemical solution in a workpiece, wherein a workpiece arrangement partitioned by a wall portion arranged at a predetermined interval in a conveyance direction of the workpiece is arranged on a conveyance means that enables the workpiece to move linearly. A plurality of installation parts are arranged side by side in the conveying direction of the work, and the work placement part is configured to be movable in a close state in a non-movable partition part, and a chemical solution for introducing a chemical into the work placement part introduction part and the drug solution outlet portion is provided to derive the chemical, liquid chemical reservoir which allowed to chemical immersion in the workpiece, when the workpiece disposing portion to move said compartment portion, surrounding said wall portion by said partition portion The chemical solution immersion treatment apparatus is characterized in that the chemical solution is stored and formed by reducing the amount of the chemical solution derived from the chemical solution deriving portion as compared with the amount of chemical solution introduced from the chemical solution introducing portion.

The chemical solution immersion treatment apparatus according to claim 1 , wherein a chemical solution discharge unit is provided in the partition part .

The chemical solution immersion treatment apparatus according to any one of claims 1 and 2 , wherein the workpiece placement unit is moved by intermittent movement that repeats advancing and stopping in a predetermined time. Immersion processing equipment.

The chemical | medical solution immersion treatment apparatus of any one of Claims 1-3 WHEREIN : The said workpiece | work arrangement | positioning is provided on the conveyance line which carries out an infinite circulation movement, The chemical | medical solution immersion treatment apparatus characterized by the above-mentioned.

The chemical | medical solution immersion treatment apparatus of any one of Claims 1-4 WHEREIN: The said chemical | medical solution is comprised so that it may be supplied from the downward direction of the said chemical | medical solution storage part, The chemical | medical solution immersion treatment apparatus characterized by the above-mentioned.