JP4093530B2 - Water-sealed vacuum pump for inert gas exhaust system of single crystal puller - Google Patents

Water-sealed vacuum pump for inert gas exhaust system of single crystal puller Download PDF

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JP4093530B2
JP4093530B2 JP2001260680A JP2001260680A JP4093530B2 JP 4093530 B2 JP4093530 B2 JP 4093530B2 JP 2001260680 A JP2001260680 A JP 2001260680A JP 2001260680 A JP2001260680 A JP 2001260680A JP 4093530 B2 JP4093530 B2 JP 4093530B2
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water
chamber
rotor
vacuum pump
single crystal
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JP2003065268A (en
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良一 大地
勉 樋口
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Sumco Corp
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C19/00—Rotary-piston pumps with fluid ring or the like, specially adapted for elastic fluids
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C13/00—Adaptations of machines or pumps for special use, e.g. for extremely high pressures
    • F04C13/005—Removing contaminants, deposits or scale from the pump; Cleaning
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C2220/00—Application
    • F04C2220/10—Vacuum
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04C—ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; ROTARY-PISTON, OR OSCILLATING-PISTON, POSITIVE-DISPLACEMENT PUMPS
    • F04C29/00—Component parts, details or accessories of pumps or pumping installations, not provided for in groups F04C18/00 - F04C28/00
    • F04C29/0092—Removing solid or liquid contaminants from the gas under pumping, e.g. by filtering or deposition; Purging; Scrubbing; Cleaning

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)

Description

【０００１】
【発明の属する技術分野】
本発明は、単結晶引上げ機に供給された不活性ガスを吸引して排出する排気系に関する。更に詳しくは排気系に設けられた水封式の真空ポンプに関するものである。
【０００２】
【従来の技術】
従来、単結晶引上げ機の不活性ガス排気系では、図５に示すようにシリコン単結晶の引上げ機１が排気管２を介して水封式の真空ポンプ３の吸込口に接続され、引上げ機１に供給された不活性ガス（例えば、Ａｒガス）が上記真空ポンプ３により排気管２を通して吸引され、引上げ機１の上部には不活性ガスを引上げ機１内に供給する吸気管４の一端が接続され、この吸気管４の他端は不活性ガスを貯留するタンク（図示せず）に接続される。また真空ポンプ３内には水５が封入され、この水は循環ポンプ４によりセパレータタンク６及び水冷却器７を通って循環して使用される。セパレータタンク６の底壁にはこのタンク６内の水５を排出可能な水排出管８が接続され、この管８には水排出弁８ａが設けられる。更にセパレータタンク６の蓋には清浄水供給管９が接続され、この管９には清浄水供給弁９ａが設けられる。
【０００３】
このように構成された不活性ガス排気系では、引上げ機１によりシリコン単結晶を引上げるときには、吸気管４から引上げ機１内に不活性ガスを供給し、この引上げ機１内の不活性ガスを真空ポンプ３により吸引して引上げ機１内が所定の負圧に保たれる。一方、引上げ機１内の不活性ガスにはＳｉＯやＳｉＯ2等の粉塵が混入するため、この粉塵は排気管２を通って真空ポンプ３に封入された水５に混入する。このため、引上げ機１による単結晶の引上げ完了毎（１バッチ毎）に真空ポンプ３を停止し、水排出弁８ａを開いてセパレータタンク６内の水５を排出し、更に清浄水供給弁９ａを開いてセパレータタンク６に粉塵を含まない清浄な水５を新たに供給している。
【０００４】
【発明が解決しようとする課題】
しかし、上記従来の単結晶引上げ機の不活性ガス排気系では、不活性ガスに混入したＳｉＯやＳｉＯ2等の粉塵が真空ポンプの吸込口近傍に堆積して吸込口を狭め、真空ポンプによる不活性ガスの吸引力が低下する不具合があった。
また上記真空ポンプの吸込口に堆積した粉塵は、真空ポンプを頻繁に分解・洗浄して除去しなければならず、真空ポンプの保守作業が煩わしい問題点もあった。
本発明の目的は、不活性ガスに混入した粉塵が吸込口近傍に堆積するのを防止できるとともに、保守作業の間隔を長くすることができる、単結晶引上げ機の不活性ガス排気系の水封式真空ポンプを提供することにある。
【０００５】
【課題を解決するための手段】
請求項１に係る発明は、図１及び図４に示すように、単結晶引上げ機１１に排気管１４を介して連通接続されたガス導入室２１と、複数のロータ羽根２２が偏心した状態で回転可能に収容されかつ所定の流量の水が水供給手段３５により供給されるロータ室２４と、ガス導入室２１とロータ室２４とを区画しかつガス導入室とロータ室とを連通接続する吸込口２７ａを有するロータガイド板２７とを備え、単結晶引上げ機１１に供給された不活性ガスを吸込口２７ａから吸込みかつ圧縮して水２３とともに排出するように構成された単結晶引上げ機の不活性ガス排気系の水封式真空ポンプの改良である。
その特徴ある構成は、先端が封止され長手方向に複数の噴射孔３３ａが形成されかつ基端が水供給手段３５に接続された洗浄パイプ３３が、複数の噴射孔３３ａをロータガイド板２７に対向してガス導入室２１の内部に設けられたところにある。
【０００６】
この請求項１に記載された単結晶引上げ機の不活性ガス排気系の水封式真空ポンプでは、単結晶を構成する元素の酸化物等からなる粉塵が不活性ガスに混入し、この粉塵が不活性ガスとともに真空ポンプ１６のガス導入室２１に流入してロータガイド板２７に付着しても、水供給手段３５から洗浄パイプ３３に供給された水２３が複数の噴射孔３３ａからロータガイド板２７に向って噴射されるので、この噴射された水２３によりロータガイド板２７に付着した粉塵は洗い流される。
【０００７】
【発明の実施の形態】
次に本発明の実施の形態を図面に基づいて説明する。
この実施の形態では、引上げ機により引上げられる単結晶はシリコン単結晶である。図４に示すように、引上げ機１１は、チャンバ１２と、このチャンバの上端に接続されたケーシング１３とを有する。上記チャンバ１２内には、図示しないがシリコン融液が貯留される石英るつぼや、この石英るつぼを包囲し上記シリコン融液を加熱するヒータ等が収容される。またケーシング１３にはシリコン単結晶を引上げる引上げ手段が設けられる。チャンバ１２の下面には排気管１４を介して真空ポンプ１６が接続され、ケーシング１３の上部には吸気管１７が接続される。吸気管の一端はケーシング１３の上面に接続され、吸気管の他端は不活性ガス（この実施の形態ではＡｒガス）が貯留されるタンク（図示せず）に接続される。また排気管１４は一端がチャンバ１２の下面にそれぞれ接続され他端が合流する一対の第１及び第２分岐管１４ａ，１４ｂと、一端が第１及び第２分岐管の合流端に接続され他端が水封式の真空ポンプ１６のガス導入室２１に接続された集合管１４ｃとを有する。なお、水封式の真空ポンプはメカニカルブースタと組合せて用いてもよい。
【０００８】
真空ポンプ１６より排気上流側の集合管１４ｃには後述するサイクロン１８（図１）が設けられ、このサイクロンの下端にはダストチャンバ１９が設けられる。このサイクロン１８によりＡｒガスに含まれるＳｉＯやＳｉＯ2等の粉塵（単結晶を構成する元素の酸化物等からなる粉塵）がＡｒガスから分離され、分離された粉塵はダストチャンバ１９に貯留されるように構成される。但し、上記サイクロン１８は引上げ機１１内を所定の負圧に保つために、排気管１４の内径をサイクロン１８の入口直前であまり絞らないようにして圧力損失を少なくしている。このため、サイクロンによる粉塵の分離能力はあまり高くない。
【０００９】
真空ポンプ１６は、図１〜図３に詳しく示すように、引上げ機１１に排気管１４を介して連通接続された上記ガス導入室２１と、複数のロータ羽根２２が偏心した状態で回転可能に収容されかつ所定の流量の水２３が供給されるロータ室２４と、ロータ室で圧縮されたＡｒガス及びロータ室からオーバフローした水２３が流入する排出室２６と、ガス導入室２１及び排出室２６とロータ室２４とを区画するロータガイド板２７とを備える。ロータガイド板２７の一方の面にはカバー体２８が取付けられ、このロータガイド板２７とカバー体２８により第１空間３１が形成される（図１及び図２）。カバー体２８の内部には一対の第１仕切り板４１，４１（図２）が配設され、これらの仕切り板により第１空間３１が狭いガス導入室２１と広い排出室２６に区画される（図１及び図２）。
【００１０】
上記カバー体２８の側壁２８ａ上部にはガス導入室２１に臨む第１導入口２８ｂが形成され、この第１導入口には集合管１４ｃが接続される（図１）。ガス導入室２１の内部には洗浄パイプ３３が設けられる（図１及び図２）。この洗浄パイプ３３は予め先端が封止されかつ長手方向に複数の噴射孔３３ａ（図１）が形成される。また洗浄パイプ３３の基端はカバー体２８の周壁２８ｃ上部を通って循環ポンプ３５（水供給手段）に接続され（図４）、複数の噴射孔３３ａはロータガイド板２７に対向して設けられる（図１）。更にカバー体２８の周壁２８ｃ下部には第２排出口２８ｄが形成される（図１及び図２）。この第２排出口には気水排出管３４の一端が接続され、気水排出管の他端は不活性ガスと水２３を分離するセパレータタンク３６（図４）に接続される。
【００１１】
ロータ室２４は、ロータガイド板２７の他方の面にケーシング２９の一方の面を取付けることにより形成され（図１及び図３）、ケーシングの他方の面には第１モータ５１が取付けられる（図１）。この第１モータ５１はその出力軸５１ａがケーシング２９の中心線から偏心した状態でケーシング２９に取付けられ（図１及び図３）、出力軸５１ａには複数のロータ羽根２２と一体的に形成されたロータホルダ３７が嵌着される（図１）。これにより複数のロータ羽根２２はケーシング２９の中心線から偏心した状態でロータ室２４に回転可能に収容される。
【００１２】
またロータガイド板２７にはポートシリンダ３８が一体的に設けられる（図１及び図３）。このポートシリンダは第１モータ５１の出力軸５１ａと中心線が一致し、かつロータ室２４内に突出するように設けられる。このポートシリンダ３８は同心状の外筒３８ａ及び内筒３８ｂを有し、外筒及び内筒間の空間は一対の第２仕切り板４２，４２（図３）により狭い吸込室３８ｃ及び広い吐出室３８ｄに区画される。上記一対の第２仕切り板４２，４２は一対の第１仕切り板４１，４１と第１モータ５１の出力軸５１ａを中心としてそれぞれ同一角度になるように形成される、即ち一対の第２仕切り板４２，４２は一対の第１仕切り板４１，４１にそれぞれ重合するように形成される（図２及び図３）。またロータガイド板２７には、外筒３８ａ及び内筒３８ｂの間に位置しかつガス導入室２１及び吸込室３８ｃを連通接続する円弧状の吸込口２７ａと、外筒３８ａ及び内筒３８ｂの間に位置しかつ排出室３４及び吐出室３８ｄを連通接続する円弧状の吐出口２７ｂとが形成される（図２）。更に外筒３８ａには、吸込室３８ｃ及びロータ室２４を連通接続する第２導入口３８ｅと、ロータ室２４及び吐出室３８ｄを連通接続する第１排出口３８ｆとがそれぞれ形成される（図１及び図３）。なお、複数のロータ羽根２２は外筒３８ａの外周面に接しかつ外筒の外周面を摺動しながら回転するようにロータホルダ３７に等間隔に配設される。
【００１３】
一方、図４に示すように、セパレータタンク３６の下部には循環パイプ５３の一端が接続され、循環パイプの他端は第１及び第２分岐パイプ６１，６２の一端に接続される。第１分岐パイプ６１の他端は真空ポンプ１６のケーシング２９の上部に接続され、第２分岐パイプ６２の他端は洗浄パイプ３３の基端に接続される。循環パイプ５３には、水２３を循環させる前述の循環ポンプ３５（水供給手段）と、水２３を冷却する水冷却器５５とが設けられる。また第１分岐パイプ６１にはこのパイプを流れる水２３の流量を測定する第１流量計７１が設けられ、第２分岐パイプ６２にはこのパイプを流れる水２３の流量を測定する第２流量計７２が設けられる。なお、上記循環ポンプ３５は第２モータ５２により駆動される。
【００１４】
セパレータタンク３６の側壁３６ａ上部には清浄水供給管５４が接続され、清浄水供給管にはこの管を開閉可能な清浄水供給弁５６が設けられる。セパレータタンク３６の底壁３６ｂには水排出管５７が接続され、この水排出管にはこの管を開閉可能な水排出弁５８が設けられる。清浄水供給弁５６及び水排出弁５８は２ポート２位置切換の電磁弁であり、オンすると管５４，５７を開き、オフすると管５４，５７を閉じるように構成される。更にセパレータタンク３６の蓋３６ｃには回収管５９の一端が接続され、回収管の他端はＡｒガスを回収する回収タンク（図示せず）に接続される。
【００１５】
なお、図４の符号６３及び６４は吸気管１７及び集合管１４ｃを流れるＡｒガスの流量をそれぞれ調整する電動式のコントロール弁であり、これらの弁６３，６４によりチャンバ１２内の圧力が制御される。また符号６６及び６７は集合管１４ｃを開閉するエア作動式のアングル弁であり、符号６８は集合管１４ｃの途中から分岐する第３分岐管１４ｄの上端に設けられたフラッパバルブである。このバルブ６８は排気管１４内に堆積した粉塵が燃焼して排気管内の圧力が急激に上昇したときに排気管内を大気に開放するために設けられる。更に第１分岐パイプ６１には第１電磁弁８１及び第１絞り弁９１が設けられ、第２分岐パイプ６２には第２電磁弁８２及び第２絞り弁９２が設けられる。第１及び第２電磁弁８１，８２は第１及び第２分岐パイプ６１，６２を電磁気的にそれぞれ開閉する開閉弁であり、第１及び第２絞り弁９１，９２は第１及び第２分岐パイプ６１，６２を流れる水２３の流量をそれぞれ調整する弁である。
【００１６】
このように構成されたシリコン単結晶引上げ機１１の不活性ガス排気系の水封式真空ポンプ１６の動作を説明する。
引上げ機１１を稼働してシリコン単結晶を引上げるときには、吸気管１７から引上げ機１１内にＡｒガスを供給し、この引上げ機内のＡｒガスを真空ポンプ１６により吸引して引上げ機内を所定の負圧に保つ。第１モータ５１により駆動されて真空ポンプ１６のロータ羽根２２が回転すると、ロータ室２４に供給された水２３がロータ室の内周面に沿って流れ、ロータ室２４の略中央に、複数のロータ羽根２２の間に位置しかつポートシリンダ３８の外筒３８ａの外径より大径の略円柱状の第２空間３２（ロータポケット）が発生する（図３）。このとき第２空間の外周面に対して、即ちロータ室２４内をリング状に流れる水２３の内周面に対して、複数のロータ羽根２２の回転中心が偏心しているので、ガス導入室２１内のＡｒガスは吸込口２７ａ及び第２導入口３８ｅを通ってロータ室２４のロータ羽根２２間に流入した後に、ロータ羽根の回転に伴って次第に圧縮され、第１排出口３８ｆ及び吐出口２７ｂを通って排出室２６に排出される。同時にロータ室２４からオーバフローした水２３も第１排出口３８ｆ及び吐出口２７ｂを通って排出室２６に排出される。
【００１７】
一方、引上げ機１１内のＡｒガスには、ＳｉＯやＳｉＯ2等の粉塵が混入するため、この粉塵はＡｒガスとともに排気管１４を通って真空ポンプ１６のガス導入室２１に流入する。このときＡｒガスは第１導入口２８ｂからガス導入室２１に流入してロータガイド板２７に吹付けられるため、Ａｒガスに含まれる粉塵の多くはロータガイド板２７に付着する。しかし真空ポンプ１６の稼働中には、循環ポンプ３５により洗浄パイプ３３に水２３が供給されるので、洗浄パイプに形成された複数の噴射孔３３ａからロータガイド板２７に向って水２３が噴射される（図１）。この結果、上記噴射された水によりロータガイド板２７に付着した粉塵が洗い流され、Ａｒガスに混入した粉塵が吸込口２７ａ近傍に堆積するのを防止できるので、真空ポンプ１６によるＡｒガスの吸引力が低下することはない。また真空ポンプ１６のガス導入室２１の内面に粉塵が堆積しないので、真空ポンプを分解して洗浄する保守作業の間隔を長くし、保守作業の頻度を少なくすることができる。
【００１８】
上記噴射孔３３ａから噴射された水２３は洗い流した粉塵とともに、吸込口２７ａ及び第２導入口３８ｅを通ってロータ室２４に流入し、ロータ室２４内の水２３と混合される。また排出室２６に流入したＡｒガス及び水２３は気水排出管３４を通ってセパレータタンク３６に戻され、更に循環ポンプ３５により再びロータ室２４及びガス導入室２１に送出される。このため、上記水２３に含まれる粉塵は次第に増大するので、引上げ機１１によるシリコン単結晶の引上げ完了毎（１バッチ毎）に真空ポンプ１６を停止し、水排出弁５８を開いてセパレータタンク３６内の水２３を排出した後に、水排出弁５８を閉じ、更に清浄水供給弁５６を開いてセパレータタンク３６に、粉塵を含まない清浄な水２３を新たに供給する。
なお、この実施の形態では、不活性ガスとしてＡｒガスを挙げたが、窒素ガス等でもよい。
【００１９】
【発明の効果】
以上述べたように、本発明によれば、先端が封止され長手方向に複数の噴射孔が形成されかつ基端が水供給手段に接続された洗浄パイプを、複数の噴射孔をロータガイド板に対向してガス導入室の内部に設けたので、不活性ガスに混入した粉塵が不活性ガスとともに真空ポンプのガス導入室に流入してロータガイド板に付着しても、この粉塵は洗浄パイプの複数の噴射孔から噴射される水により洗い流される。この結果、不活性ガスに混入した粉塵が真空ポンプの吸込口近傍に堆積するのを防止できるので、真空ポンプによる不活性ガスの吸引力が低下することはない。また真空ポンプのガス導入室の内面に粉塵が堆積しないので、真空ポンプを分解して洗浄する保守作業の間隔を長くし、保守作業の頻度を少なくすることができる。
【図面の簡単な説明】
【図１】本発明実施形態の水封式真空ポンプの縦断面図。
【図２】図１のＡ−Ａ線断面図。
【図３】図１のＢ−Ｂ線断面図。
【図４】その真空ポンプを含む単結晶引上げ機の不活性ガス排気系の回路構成図。
【図５】従来例を示す図４に対応する単結晶引上げ機の不活性ガス排気系の回路構成図。
【符号の説明】
１１ 単結晶引上げ機
１４ 排気管
２１ ガス導入室
２２ ロータ羽根
２３ 水
２４ ロータ室
２７ ロータガイド板
２７ａ 吸込口
３３ 洗浄パイプ
３３ａ 噴射孔
３５ 循環ポンプ（水供給手段）[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an exhaust system that sucks and discharges an inert gas supplied to a single crystal puller. More specifically, the present invention relates to a water-sealed vacuum pump provided in an exhaust system.
[0002]
[Prior art]
Conventionally, in an inert gas exhaust system of a single crystal puller, a silicon single crystal puller 1 is connected to a suction port of a water-sealed vacuum pump 3 via an exhaust pipe 2 as shown in FIG. An inert gas (for example, Ar gas) supplied to 1 is sucked through the exhaust pipe 2 by the vacuum pump 3, and one end of an intake pipe 4 that supplies the inert gas into the puller 1 is provided above the puller 1. The other end of the intake pipe 4 is connected to a tank (not shown) for storing an inert gas. Further, water 5 is enclosed in the vacuum pump 3, and this water is circulated and used through the separator tank 6 and the water cooler 7 by the circulation pump 4. A water discharge pipe 8 capable of discharging the water 5 in the tank 6 is connected to the bottom wall of the separator tank 6, and a water discharge valve 8 a is provided on the pipe 8. Further, a clean water supply pipe 9 is connected to the lid of the separator tank 6, and a clean water supply valve 9 a is provided on the pipe 9.
[0003]
In the inert gas exhaust system configured as described above, when the silicon single crystal is pulled by the puller 1, the inert gas is supplied from the intake pipe 4 into the puller 1, and the inert gas in the puller 1 is supplied. Is sucked by the vacuum pump 3 to keep the inside of the pulling machine 1 at a predetermined negative pressure. On the other hand, since dust such as SiO and SiO 2 is mixed in the inert gas in the pulling machine 1, this dust passes through the exhaust pipe 2 and is mixed into the water 5 sealed in the vacuum pump 3. For this reason, the vacuum pump 3 is stopped each time the single crystal is pulled by the puller 1 (every batch), the water discharge valve 8a is opened, the water 5 in the separator tank 6 is discharged, and the clean water supply valve 9a is further discharged. Is opened, and clean water 5 not containing dust is newly supplied to the separator tank 6.
[0004]
[Problems to be solved by the invention]
However, in the inert gas exhaust system of the conventional single crystal puller, dust such as SiO and SiO 2 mixed in the inert gas accumulates in the vicinity of the suction port of the vacuum pump, narrowing the suction port, There was a problem that the suction force of the active gas was reduced.
In addition, the dust accumulated at the suction port of the vacuum pump must be removed by frequently disassembling and cleaning the vacuum pump, and there is a problem that maintenance work of the vacuum pump is troublesome.
The object of the present invention is to prevent the dust mixed in the inert gas from accumulating in the vicinity of the suction port and to increase the interval between maintenance operations, and to seal the inert gas exhaust system of the single crystal puller. It is to provide a vacuum pump.
[0005]
[Means for Solving the Problems]
In the invention according to claim 1, as shown in FIGS. 1 and 4, the gas introduction chamber 21 connected to the single crystal puller 11 through the exhaust pipe 14 and the plurality of rotor blades 22 are eccentric. A suction chamber that partitions the rotor chamber 24, the gas introduction chamber 21, and the rotor chamber 24 that are rotatably accommodated and supplied with water at a predetermined flow rate by the water supply means 35, and that connects the gas introduction chamber and the rotor chamber. And a rotor guide plate 27 having a port 27a. The inert gas supplied to the single crystal puller 11 is sucked from the suction port 27a, compressed, and discharged together with the water 23. This is an improvement of the water-sealed vacuum pump of the active gas exhaust system.
The characteristic configuration is that the cleaning pipe 33 whose tip is sealed and a plurality of injection holes 33 a are formed in the longitudinal direction and whose base end is connected to the water supply means 35 is connected to the rotor guide plate 27. Oppositely provided in the gas introduction chamber 21.
[0006]
In the water-sealed vacuum pump of the inert gas exhaust system of the single crystal puller described in claim 1, dust consisting of oxides of elements constituting the single crystal is mixed in the inert gas, and the dust is Even if the inert gas flows into the gas introduction chamber 21 of the vacuum pump 16 and adheres to the rotor guide plate 27, the water 23 supplied from the water supply means 35 to the cleaning pipe 33 is supplied from the plurality of injection holes 33a to the rotor guide plate. Since the spray is directed toward the rotor 27, the dust adhering to the rotor guide plate 27 is washed away by the sprayed water 23.
[0007]
DETAILED DESCRIPTION OF THE INVENTION
Next, embodiments of the present invention will be described with reference to the drawings.
In this embodiment, the single crystal pulled by the puller is a silicon single crystal. As shown in FIG. 4, the puller 11 includes a chamber 12 and a casing 13 connected to the upper end of the chamber. Although not shown, the chamber 12 houses a quartz crucible in which a silicon melt is stored, a heater that surrounds the quartz crucible and heats the silicon melt, and the like. The casing 13 is provided with a pulling means for pulling up the silicon single crystal. A vacuum pump 16 is connected to the lower surface of the chamber 12 via an exhaust pipe 14, and an intake pipe 17 is connected to the upper part of the casing 13. One end of the intake pipe is connected to the upper surface of the casing 13, and the other end of the intake pipe is connected to a tank (not shown) in which an inert gas (Ar gas in this embodiment) is stored. The exhaust pipe 14 has one end connected to the lower surface of the chamber 12 and the other end joined to the pair of first and second branch pipes 14a and 14b, and one end connected to the joining end of the first and second branch pipes. The collecting pipe 14c is connected to the gas introduction chamber 21 of the water-sealed vacuum pump 16 at its end. A water-sealed vacuum pump may be used in combination with a mechanical booster.
[0008]
A cyclone 18 (FIG. 1) described later is provided in the collecting pipe 14c upstream of the vacuum pump 16, and a dust chamber 19 is provided at the lower end of the cyclone. The cyclone 18 separates dust such as SiO and SiO 2 contained in the Ar gas (dust made of oxides of elements constituting a single crystal) from the Ar gas, and the separated dust is stored in the dust chamber 19. Configured as follows. However, in order to keep the inside of the pulling machine 11 at a predetermined negative pressure, the cyclone 18 reduces the pressure loss by reducing the inner diameter of the exhaust pipe 14 just before the inlet of the cyclone 18. For this reason, the separation capacity of the dust by the cyclone is not so high.
[0009]
As shown in detail in FIGS. 1 to 3, the vacuum pump 16 is rotatable in a state where the gas introduction chamber 21 connected to the puller 11 through the exhaust pipe 14 and the plurality of rotor blades 22 are eccentric. A rotor chamber 24 that is accommodated and supplied with water 23 of a predetermined flow rate, a discharge chamber 26 into which Ar gas compressed in the rotor chamber and water 23 overflowed from the rotor chamber flow, a gas introduction chamber 21 and a discharge chamber 26. And a rotor guide plate 27 that partitions the rotor chamber 24. A cover body 28 is attached to one surface of the rotor guide plate 27, and a first space 31 is formed by the rotor guide plate 27 and the cover body 28 (FIGS. 1 and 2). A pair of first partition plates 41 and 41 (FIG. 2) is disposed inside the cover body 28, and the first space 31 is partitioned into a narrow gas introduction chamber 21 and a wide discharge chamber 26 by these partition plates ( 1 and 2).
[0010]
A first introduction port 28b facing the gas introduction chamber 21 is formed on the upper side wall 28a of the cover body 28, and a collecting pipe 14c is connected to the first introduction port (FIG. 1). A cleaning pipe 33 is provided inside the gas introduction chamber 21 (FIGS. 1 and 2). The cleaning pipe 33 is sealed in advance and has a plurality of injection holes 33a (FIG. 1) formed in the longitudinal direction. The proximal end of the cleaning pipe 33 passes through the upper part of the peripheral wall 28c of the cover body 28 and is connected to the circulation pump 35 (water supply means) (FIG. 4), and the plurality of injection holes 33a are provided to face the rotor guide plate 27. (FIG. 1). Furthermore, the 2nd discharge port 28d is formed in the lower part of the surrounding wall 28c of the cover body 28 (FIG.1 and FIG.2). One end of an air / water discharge pipe 34 is connected to the second discharge port, and the other end of the air / water discharge pipe is connected to a separator tank 36 (FIG. 4) that separates the inert gas and the water 23.
[0011]
The rotor chamber 24 is formed by attaching one surface of the casing 29 to the other surface of the rotor guide plate 27 (FIGS. 1 and 3), and the first motor 51 is attached to the other surface of the casing (FIG. 1). 1). The first motor 51 is attached to the casing 29 with the output shaft 51a being eccentric from the center line of the casing 29 (FIGS. 1 and 3), and the output shaft 51a is formed integrally with the plurality of rotor blades 22. The rotor holder 37 is fitted (FIG. 1). Accordingly, the plurality of rotor blades 22 are rotatably accommodated in the rotor chamber 24 in a state of being eccentric from the center line of the casing 29.
[0012]
Further, a port cylinder 38 is provided integrally with the rotor guide plate 27 (FIGS. 1 and 3). This port cylinder is provided so that the output shaft 51 a of the first motor 51 and the center line coincide with each other and project into the rotor chamber 24. The port cylinder 38 has a concentric outer cylinder 38a and an inner cylinder 38b, and a space between the outer cylinder and the inner cylinder is narrowed by a pair of second partition plates 42, 42 (FIG. 3) and a wide discharge chamber. It is divided into 38d. The pair of second partition plates 42, 42 are formed to have the same angle around the pair of first partition plates 41, 41 and the output shaft 51 a of the first motor 51, that is, a pair of second partition plates. 42 and 42 are formed to be superposed on the pair of first partition plates 41 and 41, respectively (FIGS. 2 and 3). The rotor guide plate 27 includes an arcuate suction port 27a located between the outer cylinder 38a and the inner cylinder 38b and connecting the gas introduction chamber 21 and the suction chamber 38c, and between the outer cylinder 38a and the inner cylinder 38b. And an arcuate discharge port 27b that communicates and connects the discharge chamber 34 and the discharge chamber 38d (FIG. 2). Further, the outer cylinder 38a is formed with a second introduction port 38e that connects the suction chamber 38c and the rotor chamber 24, and a first discharge port 38f that connects the rotor chamber 24 and the discharge chamber 38d (FIG. 1). And FIG. 3). The plurality of rotor blades 22 are arranged on the rotor holder 37 at equal intervals so as to contact the outer peripheral surface of the outer cylinder 38a and rotate while sliding on the outer peripheral surface of the outer cylinder.
[0013]
On the other hand, as shown in FIG. 4, one end of the circulation pipe 53 is connected to the lower part of the separator tank 36, and the other end of the circulation pipe is connected to one end of the first and second branch pipes 61 and 62. The other end of the first branch pipe 61 is connected to the upper part of the casing 29 of the vacuum pump 16, and the other end of the second branch pipe 62 is connected to the base end of the cleaning pipe 33. The circulation pipe 53 is provided with the above-described circulation pump 35 (water supply means) that circulates the water 23 and a water cooler 55 that cools the water 23. The first branch pipe 61 is provided with a first flow meter 71 for measuring the flow rate of the water 23 flowing through the pipe, and the second branch pipe 62 is provided with a second flow meter for measuring the flow rate of the water 23 flowing through the pipe. 72 is provided. The circulation pump 35 is driven by the second motor 52.
[0014]
A clean water supply pipe 54 is connected to the upper part of the side wall 36a of the separator tank 36, and a clean water supply valve 56 capable of opening and closing the pipe is provided in the clean water supply pipe. A water discharge pipe 57 is connected to the bottom wall 36b of the separator tank 36, and a water discharge valve 58 capable of opening and closing the pipe is provided in the water discharge pipe. The clean water supply valve 56 and the water discharge valve 58 are 2-port 2-position switching electromagnetic valves, and are configured to open the tubes 54 and 57 when turned on and close the tubes 54 and 57 when turned off. Further, one end of a recovery pipe 59 is connected to the lid 36c of the separator tank 36, and the other end of the recovery pipe is connected to a recovery tank (not shown) for recovering Ar gas.
[0015]
Reference numerals 63 and 64 in FIG. 4 are electric control valves for adjusting the flow rates of Ar gas flowing through the intake pipe 17 and the collecting pipe 14c, respectively, and the pressure in the chamber 12 is controlled by these valves 63 and 64. The Reference numerals 66 and 67 are air-operated angle valves for opening and closing the collecting pipe 14c, and reference numeral 68 is a flapper valve provided at the upper end of the third branch pipe 14d branched from the middle of the collecting pipe 14c. The valve 68 is provided to open the exhaust pipe to the atmosphere when dust accumulated in the exhaust pipe 14 burns and the pressure in the exhaust pipe suddenly increases. Further, the first branch pipe 61 is provided with a first electromagnetic valve 81 and a first throttle valve 91, and the second branch pipe 62 is provided with a second electromagnetic valve 82 and a second throttle valve 92. The first and second electromagnetic valves 81 and 82 are open / close valves that electromagnetically open and close the first and second branch pipes 61 and 62, respectively. The first and second throttle valves 91 and 92 are the first and second branches. It is a valve for adjusting the flow rate of the water 23 flowing through the pipes 61 and 62, respectively.
[0016]
The operation of the water-sealed vacuum pump 16 of the inert gas exhaust system of the silicon single crystal puller 11 configured as described above will be described.
When pulling up the silicon single crystal by operating the pulling machine 11, Ar gas is supplied into the pulling machine 11 from the intake pipe 17, and the Ar gas in the pulling machine is sucked by the vacuum pump 16 so that the inside of the pulling machine has a predetermined negative pressure. Keep pressure. When the rotor blades 22 of the vacuum pump 16 are rotated by being driven by the first motor 51, the water 23 supplied to the rotor chamber 24 flows along the inner peripheral surface of the rotor chamber, and a plurality of A substantially cylindrical second space 32 (rotor pocket) located between the rotor blades 22 and having a diameter larger than the outer diameter of the outer cylinder 38a of the port cylinder 38 is generated (FIG. 3). At this time, the rotation center of the plurality of rotor blades 22 is eccentric with respect to the outer peripheral surface of the second space, that is, the inner peripheral surface of the water 23 flowing in the rotor chamber 24 in a ring shape. After the Ar gas passes through the suction port 27a and the second introduction port 38e and flows between the rotor blades 22 of the rotor chamber 24, it is gradually compressed as the rotor blades rotate, and the first discharge port 38f and the discharge port 27b. It is discharged to the discharge chamber 26 through. At the same time, the water 23 overflowing from the rotor chamber 24 is also discharged into the discharge chamber 26 through the first discharge port 38f and the discharge port 27b.
[0017]
On the other hand, since dust such as SiO and SiO 2 is mixed in the Ar gas in the puller 11, this dust flows into the gas introduction chamber 21 of the vacuum pump 16 through the exhaust pipe 14 together with the Ar gas. At this time, since Ar gas flows into the gas introduction chamber 21 from the first introduction port 28 b and is blown onto the rotor guide plate 27, much of the dust contained in the Ar gas adheres to the rotor guide plate 27. However, since the water 23 is supplied to the cleaning pipe 33 by the circulation pump 35 while the vacuum pump 16 is in operation, the water 23 is sprayed from the plurality of injection holes 33a formed in the cleaning pipe toward the rotor guide plate 27. (FIG. 1). As a result, the dust adhering to the rotor guide plate 27 is washed away by the jetted water, and the dust mixed in the Ar gas can be prevented from accumulating in the vicinity of the suction port 27a. Will not drop. Further, since dust does not accumulate on the inner surface of the gas introduction chamber 21 of the vacuum pump 16, the interval of maintenance work for disassembling and cleaning the vacuum pump can be increased, and the frequency of maintenance work can be reduced.
[0018]
The water 23 injected from the injection hole 33a flows into the rotor chamber 24 through the suction port 27a and the second introduction port 38e together with the washed dust, and is mixed with the water 23 in the rotor chamber 24. The Ar gas and water 23 that have flowed into the discharge chamber 26 are returned to the separator tank 36 through the gas / water discharge pipe 34, and further sent out to the rotor chamber 24 and the gas introduction chamber 21 by the circulation pump 35. For this reason, since the dust contained in the water 23 gradually increases, the vacuum pump 16 is stopped every time the pulling machine 11 pulls up the silicon single crystal (every batch), the water discharge valve 58 is opened, and the separator tank 36 is opened. After the water 23 is discharged, the water discharge valve 58 is closed, and the clean water supply valve 56 is further opened to supply fresh water 23 containing no dust to the separator tank 36.
In this embodiment, Ar gas is used as the inert gas, but nitrogen gas or the like may be used.
[0019]
【The invention's effect】
As described above, according to the present invention, the cleaning pipe having the tip sealed and the plurality of injection holes formed in the longitudinal direction and the base end connected to the water supply means is connected to the rotor guide plate. Since the dust mixed in the inert gas flows into the gas introduction chamber of the vacuum pump together with the inert gas and adheres to the rotor guide plate, the dust is still washed in the cleaning pipe. It is washed away with water sprayed from the plurality of spray holes. As a result, the dust mixed in the inert gas can be prevented from accumulating in the vicinity of the suction port of the vacuum pump, so that the suction force of the inert gas by the vacuum pump does not decrease. Further, since dust does not accumulate on the inner surface of the gas introduction chamber of the vacuum pump, the interval between maintenance operations for disassembling and cleaning the vacuum pump can be increased, and the frequency of maintenance operations can be reduced.
[Brief description of the drawings]
FIG. 1 is a longitudinal sectional view of a water ring vacuum pump according to an embodiment of the present invention.
FIG. 2 is a cross-sectional view taken along line AA in FIG.
3 is a cross-sectional view taken along line BB in FIG.
FIG. 4 is a circuit configuration diagram of an inert gas exhaust system of a single crystal puller including the vacuum pump.
FIG. 5 is a circuit configuration diagram of an inert gas exhaust system of a single crystal puller corresponding to FIG. 4 showing a conventional example.
[Explanation of symbols]
11 Single crystal pulling machine 14 Exhaust pipe 21 Gas introduction chamber 22 Rotor blade 23 Water 24 Rotor chamber 27 Rotor guide plate 27a Suction port 33 Cleaning pipe 33a Injection hole 35 Circulation pump (water supply means)

Claims (1)

単結晶引上げ機(11)に排気管(14)を介して連通接続されたガス導入室(21)と、複数のロータ羽根(22)が偏心した状態で回転可能に収容されかつ所定の流量の水(23)が水供給手段(35)により供給されるロータ室(24)と、前記ガス導入室(21)と前記ロータ室(24)とを区画しかつ前記ガス導入室と前記ロータ室とを連通接続する吸込口(27a)を有するロータガイド板(27)とを備え、前記単結晶引上げ機(11)に供給された不活性ガスを吸込口(27a)から吸込みかつ圧縮して前記水(23)とともに排出するように構成された単結晶引上げ機の不活性ガス排気系の水封式真空ポンプにおいて、
先端が封止され長手方向に複数の噴射孔(33a)が形成されかつ基端が前記水供給手段(35)に接続された洗浄パイプ(33)が、前記複数の噴射孔(33a)を前記ロータガイド板(27)に対向して前記ガス導入室(21)の内部に設けられたことを特徴とする単結晶引上げ機の不活性ガス排気系の水封式真空ポンプ。A gas introduction chamber (21) connected to the single crystal puller (11) through an exhaust pipe (14) and a plurality of rotor blades (22) are rotatably accommodated in an eccentric state and have a predetermined flow rate. The rotor chamber (24) in which water (23) is supplied by the water supply means (35), the gas introduction chamber (21), and the rotor chamber (24) are partitioned, and the gas introduction chamber and the rotor chamber And a rotor guide plate (27) having a suction port (27a) that communicates with each other, and sucks and compresses the inert gas supplied to the single crystal puller (11) through the suction port (27a) to compress the water. In the water-sealed vacuum pump of the inert gas exhaust system of the single crystal puller configured to be discharged together with (23),
A cleaning pipe (33) having a distal end sealed and a plurality of injection holes (33a) formed in the longitudinal direction and having a proximal end connected to the water supply means (35) includes the plurality of injection holes (33a). A water-sealed vacuum pump for an inert gas exhaust system of a single crystal puller, which is provided inside the gas introduction chamber (21) so as to face the rotor guide plate (27).
JP2001260680A 2001-08-30 2001-08-30 Water-sealed vacuum pump for inert gas exhaust system of single crystal puller Expired - Lifetime JP4093530B2 (en)

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JP5067406B2 (en) * 2009-08-26 2012-11-07 信越半導体株式会社 Silicon single crystal manufacturing method and silicon single crystal manufacturing apparatus
JP2015036516A (en) * 2013-08-12 2015-02-23 株式会社ネクスト Water sealing type steam compressor
KR101642842B1 (en) * 2015-02-16 2016-07-26 (주)에프티이 System for seawater concentrating and scale crystallizing
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