JP4092694B2 - Plasma exhaust gas treatment tower structure - Google Patents

Description

  The present invention relates to a structure of a plasma exhaust gas treatment tower provided with a spiral discharge plate inside a cylindrical body.

Conventionally, a plasma exhaust gas treatment tower provided with a spiral discharge plate inside a cylindrical body as described above is known (see, for example, Patent Documents).
Japanese Unexamined Patent Publication No. 2003-010638 (Pages 2-6, FIG. 2)

  However, in the plasma exhaust gas treatment tower as described above, there is usually a reaction distribution in the plasma, and therefore the decomposition efficiency decreases when the exhaust gas passes through a low reaction part. Therefore, in order to improve the decomposition efficiency of exhaust gas, it takes time for the exhaust gas to pass through the part where the plasma density is high, so an expensive power supply device is required to enlarge the device itself or to generate more powerful plasma. There was a problem of rising costs.

The present invention has been made in view of the above problems, and provides a structure of a plasma exhaust gas treatment tower in which the inside of the plasma exhaust gas treatment tower is in a uniform plasma generation state so that variations in the decomposition of the passing gas do not occur. Objective.

In order to achieve the above object, the structure of the plasma exhaust gas treatment tower according to the present invention is a structure of a plasma exhaust gas treatment tower having a spiral discharge plate extending from the upper end to the lower end inside the plasma exhaust gas treatment tower. plate is an insulating material, and its conductor which sandwich the upper and lower surfaces, have a, a parallel-plate by applying a high voltage to the conductor sandwiching the upper and lower surfaces reactor.
Moreover, the upper and lower surfaces of the conductor sandwiching the upper and lower surfaces of the insulator are further sandwiched by an insulator to form a dielectric.
Further, the plasma exhaust gas treatment tower structure is provided with a spiral discharge plate extending from the upper end to the lower end inside, the spiral discharge plate comprising a conductor, an insulator sandwiching the upper and lower surfaces thereof, And conductors attached to the upper and lower surfaces.

  Since the present invention has a structure in which the surface of the spiral discharge plate is subjected to a special treatment, the time for passing the exhaust gas through a portion having a high plasma density can be lengthened and the decomposition efficiency of the exhaust gas can be improved. .

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
In FIG. 1, there is a core 2 made of an insulator at the center of a cylindrical body 1, and a plasma exhaust gas treatment tower having a spiral discharge plate 3 attached around the core 2, and FIGS. is there. The spiral discharge plates 3, 8 and 9 have three types as shown in FIGS.

As shown in FIG. 2, the discharge plate 3 has an insulator 5 sandwiched between conductors 4, 4, and a high voltage is applied to the upper and lower conductors 4, 4 to form a parallel plate reactor. Plasma is generated during this period.

  Further, as shown in FIG. 3, the conductors 4 and 4 are further covered with insulators 6 and 6, and a discharge plate 8 which is a dielectric 7 can be a barrier discharge reactor. The dielectric 7 may be either one of the upper and lower surfaces.

Furthermore, it is also possible to helical discharge plate 9 utilizing along surface discharge as shown in FIG.
That is, the conductor 4 is covered with an insulator 6 to form a dielectric 7, and a conductor 10 is further mounted thereon. As a result, a portion with a high plasma density is generated on the surface of the dielectric 7 between the conductors 10, and the decomposition efficiency is improved by earning time to pass through this portion.
2 to 4, the spiral discharge plates 3, 8, and 9 are attached to the core 2, but they may be attached to the inner surface of the cylindrical body 1 as shown in FIG.

  According to the present invention, in the exhaust gas treatment by the plasma reactor, the exhaust gas can stay in and pass through a portion having a high plasma density for a long time, and the decomposition efficiency of the exhaust gas can be improved.

1 is a basic configuration diagram of the present invention. It is AA arrow 1st Example figure in FIG. It is AA arrow 2nd Example figure in FIG. It is AA arrow 3rd Example figure in FIG. It is a basic block diagram which shows another Example of this invention.

Explanation of symbols

3 8 9 Spiral discharge plate 4 10 Conductor 5 6 Insulator 7 Dielectric

Claims (2)

It is a structure of a plasma exhaust gas treatment tower having a spiral discharge plate from the upper end to the lower end inside,
The spiral discharge plate is made of an insulator,
A conductor sandwiching the upper and lower surfaces;
Yes, and the structure of the plasma exhaust gas treatment tower, characterized in that the said upper and lower surface conductors sandwiching the high voltage of parallel-plate by applying a reactor a. The structure of the plasma exhaust gas treatment tower according to claim 1, wherein the upper and lower surfaces of the conductor sandwiching the upper and lower surfaces of the insulator are further sandwiched by an insulator to form a dielectric.

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