JP4070521B2 - ポジ型レジスト組成物 - Google Patents

ポジ型レジスト組成物 Download PDF

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Publication number
JP4070521B2
JP4070521B2 JP2002170065A JP2002170065A JP4070521B2 JP 4070521 B2 JP4070521 B2 JP 4070521B2 JP 2002170065 A JP2002170065 A JP 2002170065A JP 2002170065 A JP2002170065 A JP 2002170065A JP 4070521 B2 JP4070521 B2 JP 4070521B2
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JP
Japan
Prior art keywords
group
repeating unit
acid
alkyl group
alicyclic hydrocarbon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2002170065A
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English (en)
Japanese (ja)
Other versions
JP2003177538A5 (ru
JP2003177538A (ja
Inventor
健一郎 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2002170065A priority Critical patent/JP4070521B2/ja
Publication of JP2003177538A publication Critical patent/JP2003177538A/ja
Publication of JP2003177538A5 publication Critical patent/JP2003177538A5/ja
Application granted granted Critical
Publication of JP4070521B2 publication Critical patent/JP4070521B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2002170065A 2001-06-12 2002-06-11 ポジ型レジスト組成物 Expired - Fee Related JP4070521B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002170065A JP4070521B2 (ja) 2001-06-12 2002-06-11 ポジ型レジスト組成物

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2001-177158 2001-06-12
JP2001177158 2001-06-12
JP2001308717 2001-10-04
JP2001-308717 2001-10-04
JP2002170065A JP4070521B2 (ja) 2001-06-12 2002-06-11 ポジ型レジスト組成物

Publications (3)

Publication Number Publication Date
JP2003177538A JP2003177538A (ja) 2003-06-27
JP2003177538A5 JP2003177538A5 (ru) 2005-09-29
JP4070521B2 true JP4070521B2 (ja) 2008-04-02

Family

ID=27346918

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002170065A Expired - Fee Related JP4070521B2 (ja) 2001-06-12 2002-06-11 ポジ型レジスト組成物

Country Status (1)

Country Link
JP (1) JP4070521B2 (ru)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI300165B (en) * 2003-08-13 2008-08-21 Tokyo Ohka Kogyo Co Ltd Resin for resist, positive resist composition and resist pattern formation method
JP2005300998A (ja) * 2004-04-13 2005-10-27 Tokyo Ohka Kogyo Co Ltd ポジ型レジスト組成物及びレジストパターン形成方法
WO2005121193A1 (ja) 2004-06-08 2005-12-22 Tokyo Ohka Kogyo Co., Ltd. 重合体、ポジ型レジスト組成物およびレジストパターン形成方法
JP4551704B2 (ja) 2004-07-08 2010-09-29 富士フイルム株式会社 液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法
JP4621451B2 (ja) 2004-08-11 2011-01-26 富士フイルム株式会社 液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法
KR100757341B1 (ko) 2005-12-23 2007-09-11 삼성전자주식회사 실록산 화합물, 이를 포함하는 분자 포토레지스트 조성물및 패턴 형성 방법
JPWO2011034007A1 (ja) * 2009-09-16 2013-02-14 Jsr株式会社 感放射線性樹脂組成物及びレジストパターン形成方法
JP5927275B2 (ja) * 2014-11-26 2016-06-01 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、及びレジスト膜

Also Published As

Publication number Publication date
JP2003177538A (ja) 2003-06-27

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