JP4054591B2 - Method and apparatus for continuous electroplating of metal plate - Google Patents

Description

[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an improvement in a method and apparatus for continuous electroplating of a metal plate, and more specifically, a metal that is uniformly polished over the entire length in the longitudinal direction of a conductor roll to prevent the occurrence of plating defects on the metal plate. The present invention relates to a continuous electroplating method and apparatus for a plate.
[0002]
[Prior art]
As is well known, a metal plate such as a thin steel plate is shipped as a product after being continuously galvanized in, for example, a continuous electroplating line for rust prevention. As a continuous electroplating line for continuously electroplating a thin steel plate, the following two types of lines are mainly used.
(1) Continuous electroplating line called ferrostan line equipped with a plurality of plating equipment with vertical plating tank
(2) Continuous electroplating line called halogen line equipped with multiple plating equipment with horizontal plating tank
Among such continuous electroplating lines, an outline of one plating apparatus constituting the continuous electroplating line called the halogen line will be described with reference to FIG. 5 of a schematic perspective view thereof.
[0003]
Reference numeral 1 shown in FIG. 5 is a plating apparatus constituting a continuous electroplating line called a halogen line. The plating apparatus 1 includes a plating tank 2 in which a plating solution is placed.
A pair of entry-side dam rolls 3 and an exit-side dam roll 4 for damming the plating solution in the plating tank 2 are provided at the entry and exit positions of the thin steel plate P in the plating tank 2. . A pair of upper and lower inlet electrodes 5 and a pair of upper and lower outlet electrodes 6 are disposed between the inlet dam roll 3 and the outlet dam roll 4 (inside the plating tank 2). ing. In this continuous electroplating line, a plurality of sets of plating apparatuses 1 are arranged in series.
[0004]
Further, an entrance conductor roll 7 is disposed outside the entry dam roll 3, and an exit conductor roll 8 is disposed outside the exit dam roll 4. And the surface of the said entrance side conductor roll 7 and the said exit side conductor roll 8 is comprised so that it may grind | polish with the roll grinding | polishing apparatus 10 used as the structure mentioned later throughout operation | movement. In addition, what is arrange | positioned under the said entrance side conductor roll 7 and the said exit side conductor roll 8 is the backup rolls 9 and 9 raised / lowered by the raising / lowering cylinder which is not shown in figure.
[0005]
The roll polishing apparatus 10 includes a guide rod 11 disposed in parallel with the conductor roll, and a buff support 12 that is operated by an operating device (not shown) and is guided by the guide rod 11 and double-moves. ing. A polishing buff 13 (the abrasive is SiC and the particle size is # 120 to # 600) is supported on the lower portion of the buff support 12. The polishing buff 13 is pressed against the surface of the conductor rolls 7 and 8 with a predetermined surface pressure of 20 to 500 kPa, for example, by a pressing means such as an air cylinder (not shown) provided on the buff support 12. It is comprised so that. Incidentally, the length of the conductor rolls 7 and 8 is 1800 mm, and the width of the polishing buff 13 (dimension in the longitudinal direction of the conductor roll) is 150 mm. However, the dimensions of the conductor rolls 7 and 8 and the polishing buff 13 are only specific examples, and there are various dimensions.
[0006]
According to the plating apparatus 1 configured as described above, the thin steel plate P is passed between the entry-side conductor roll 7 and the backup roll 9, between the pair of entry-side dam rolls 3, and between the pair of entry-side electrodes 5. The Next, the sheet is passed between the pair of output electrodes 6, between the pair of output dam rolls 4, and between the output conductor roll 8 and the backup roll 9, and is continuously galvanized. During the galvanization of the thin steel plate P, the surfaces of the conductor rolls 7 and 8 are continuously polished by the polishing buff 13 that reciprocates in the longitudinal direction of the conductor rolls 7 and 8 while being pressed with a predetermined pressing force. . By passing the thin steel plate P while polishing the conductor rolls 7 and 8, a galvanized layer having a uniform film thickness is formed on the surface of the thin steel plate P. It becomes possible.
[0007]
[Problems to be solved by the invention]
According to the plating apparatus constituting the continuous electroplating line called the halogen line according to the conventional example, as described above, a galvanized product having an excellent quality with a uniform thickness of the galvanized layer can be manufactured. It is considered extremely useful. However, there may be a trouble that the conductor roll must be suddenly changed during operation of the continuous electroplating line. That is, in this continuous electroplating line, as described above, a plurality of plating apparatuses are arranged in series, and the number of conductor rolls is large. For this reason, the surface defects of the conductor rolls occur one after another, resulting in a situation where the conductor rolls must be replaced once every few days.
[0008]
When it is necessary to replace the conductor roll, a time loss of about 0.8 hours is required for the replacement of one conductor roll for about 1.5 hours and the dummy plate for checking the quality of the galvanized product. appear. Since the sheet feeding speed of the thin steel plate in the continuous electroplating line is usually set to 50 to 150 m / min, there is a problem that the productivity of the galvanized product is significantly lowered. The reason why the conductor roll is replaced is that, as described above, surface defects occur in the galvanized layer of the galvanized product, but the surface defects of the galvanized layer include “zinc winding”, “rough skin”, “press” It is a defect that occurs in the plating layer of a galvanized product such as “疵”. Hereinafter, the cause of the occurrence of these defects will be described sequentially.
[0009]
First, “zinc winding” is a phenomenon in which the film thickness of the galvanized layer at the center in the width direction of the thin steel sheet becomes abnormally thicker than the film thickness at both ends. In a continuous electroplating line, a certain conductor roll was “zinc wound” in a galvanized product after two weeks had passed since it was replaced. Therefore, when the amount of wear (diameter) of the removed conductor roll was measured, the amount of wear at the portion where the thin steel plate contacts was 0.05 to 0.2 mm while the amount of wear at the portion where the thin steel plate did not contact was 0.05 to 0.2 mm. Was 0.8 mm. That is, the center portion of the conductor roll is worn more than both end portions to form a drum shape, and when the dimensional difference exceeds the allowable limit, “zinc winding” occurs. Note that both ends of the conductor roll are worn by corrosion due to the plating solution, and the central portion is worn due to corrosion by the plating solution and friction with the thin steel plate.
[0010]
If zinc plating can be performed while correcting the drum shape of the conductor roll to a cylindrical shape, the occurrence of “zinc winding” can be prevented. However, the plating apparatus of the continuous electroplating line according to the conventional example, while pressing the surface of the conductor roll having a length of 1800 mm, the polishing buff having a width of 150 mm (the abrasive is SiC and the particle size is # 180). Is configured to reciprocate at a speed of 2 m / min. That is, such a polishing buff only polishes the surface of the conductor roll following the wear shape, and has no function of finishing the surface in the longitudinal direction of the conductor roll flat. Therefore, since it is impossible to prevent the conductor roll from becoming a drum shape, it is extremely difficult to maintain a state where “zinc winding” does not occur for a long period of time.
[0011]
Further, the “rough skin” is caused by insufficient polishing of the surface of the conductor roll by the polishing buff because the surface of the plating layer of the galvanized product becomes “textured”. Furthermore, “pressing iron” is an indentation that occurs in the plating layer of galvanized products, and is caused by the adhesion of foreign matter such as iron powder or sludge in the plating solution to the surface of the conductor roll. is there. That is, in the 150 mm width polishing buff, when the line speed is low and the conductor roll rotates at a low speed, an unpolished portion is generated on the surface of the conductor roll. For this reason, the foreign matter adhering to the surface of the conductor roll cannot be completely removed by the polishing buff.
[0012]
Accordingly, an object of the present invention is to prevent the conductor roll from being worn and formed into a drum shape, and to prevent the surface from becoming a satin-like shape, and to reliably remove foreign matters attached to the surface. It is to provide a continuous electroplating method and apparatus for a metal plate.
[0013]
[Means for Solving the Problems]
The present invention has been made in view of the above circumstances. Therefore, in order to solve the above problems, the means adopted by the continuous electroplating method of the metal plate according to claim 1 of the present invention is based on a polishing buff. In a continuous electroplating method of a metal plate for plating a metal plate that is in contact with the conductor roll while polishing the conductor roll, a polishing buff having a length exceeding the total length of the conductor roll is provided on the conductor roll. Press on the surface of Shi ,And same Longitudinal direction of conductor roll When reciprocating in the direction, Polishing buff , Movement direction side And opposite The side end of the conductor roll The polishing buff is moved in the opposite direction before passing through the end opposite to the moving direction side. Over the entire length of the conductor roll Polishing buff Always in contact Keep The surface of the conductor roll is polished.
[0014]
Claims of the invention 2 The means employed by the continuous electroplating apparatus for a metal plate according to the present invention includes a plurality of plating tanks, and a conductor roll that is in contact with the metal plate in the through plate is provided on the metal plate entrance / exit side of each of the plating tanks. A state in which the surface of the conductor roll is polished by pressing the surface of the roll, the polishing buff having a length exceeding the entire length of the conductor roll, and the polishing buff is always in contact with the entire length in the longitudinal direction of the conductor roll Further, the present invention is characterized in that a roll polishing apparatus having a buff actuating means for reciprocating in the longitudinal direction of the conductor roll is provided.
[0015]
Claims of the invention 3 The means employed by the continuous electroplating apparatus for metal plates according to claim 2 The continuous electroplating apparatus for a metal plate according to the item 1, wherein the polishing buff of the roll polishing apparatus has an integral configuration.
[0016]
Claims of the invention 4 The means employed by the continuous electroplating apparatus for metal plates according to claim 2 In the continuous electroplating apparatus for a metal plate according to the item 1, the polishing buff of the roll polishing apparatus has a configuration in which a plurality of buff units having a predetermined length are connected in series.
[0017]
Claims of the invention 5 The means employed by the continuous electroplating apparatus for metal plates according to claim 4 In the continuous electroplating apparatus for a metal plate according to the above, a coarser particle size than the abrasive material of the buff unit disposed at both longitudinal ends of the polishing buff of the roll polishing apparatus at the central portion in the longitudinal direction of the polishing buff. A buff unit having an abrasive is provided.
[0018]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, a continuous electroplating apparatus for a metal plate according to an embodiment for carrying out the continuous electroplating method for a metal plate of the present invention will be described with reference to the accompanying drawings. However, the continuous electroplating apparatus for the metal plate according to the present embodiment and the continuous electroplating apparatus for the metal plate according to the above-described conventional example are the same except for the roll polishing apparatus. It is. Therefore, referring to FIG. 1 of the front view of the roll polishing apparatus and FIG. 2 of the A arrow view of FIG. The apparatus (the same structure is also used for the output-side conductor roll) will be described.
[0019]
Reference numeral 20 shown in FIGS. 1 and 2 denotes a roll polishing apparatus that polishes the surface of the entrance conductor roll 7. The roll polishing apparatus 20 includes a lower frame 21 disposed on a shaft support frame that rotatably supports the shaft end of the entry-side conductor roll 7 in parallel with the entry-side conductor roll 7. A pair of shaft support fittings 22 are fixed in the vicinity of both ends of the lower frame 21, specifically, directly above the support portion of the lower frame 21.
Then, the reciprocating frame 23 is reciprocated in the longitudinal direction of the entrance-side conductor roll 7 by slidingly fitting the slide shafts 23a formed on both ends of the reciprocating frame 23 to the shaft support fitting 22. It is supported to be able to.
[0020]
On the reciprocating frame 23, an air cylinder 24 with a telescopic rod facing downward is vertically disposed at a central position in the longitudinal direction. In addition, guide rods 25 and 25 that move up and down in the vertical direction are disposed at two locations that are equidistant from each other with the air cylinder 24 as the center. A buff support frame is provided in parallel with the incoming conductor roll 7 via a connecting pin 27 at the lower end of the telescopic rod extending downward from the lower frame 21 of the air cylinder 24 and the lower ends of the guide rods 25, 25. 26 is detachably connected.
[0021]
In addition, what is disposed horizontally on the reciprocating frame 23 is a compressed air supply hose 24a for supplying compressed air whose pressure is adjusted (for example, 20 to 500 kPa) to the air cylinder 24. The compressed air supply hose 24a is detachably connected to a joint attached to the air inflow port of the air cylinder 24 by a known quick coupler.
[0022]
The length of the buff support frame 26 is 2000 mm, and is set to be 200 mm longer than the entrance conductor roll 7 having a length of 1800 mm. A polishing buff 28 having a length of 2000 mm for polishing the surface of the entry-side conductor roll 7 is detachably fixed to the lower side of the buff support frame 26 by fixing means 29 such as bolts and nuts.
[0023]
By the way, the length of the polishing buff 28 is set corresponding to the length of the entrance conductor roll 7, and therefore the length of the polishing buff 28 is not limited to the above length. Absent. Further, although the length of the polishing buff 28 is 200 mm longer than the length of the entrance-side conductor roll 7, for example, it may be 250 mm longer or 300 mm longer, so the length of the polishing buff 28 is not particularly limited. It is not something.
[0024]
The polishing buff 28 is reciprocated in the longitudinal direction of the entrance-side conductor roll 7 by a buff actuating means 30 described later, which is disposed on one end side of the lower frame 21, that is, on the left end side in FIG. It is like that. Specifically, as shown by a two-dot chain line in FIG. 1, when one end of the polishing buff 28 moves to one end side of the incoming conductor roll 7, the polishing buff 28 reverses before passing through one end of the incoming conductor roll 7. To be moved to. That is, it is considered that the polishing buff 28 is always in contact with the entire length in the longitudinal direction of the entrance-side conductor roll 7 regardless of the moving position of the polishing buff 28, and that no contact area can be eliminated.
[0025]
The buff actuating means 30 includes a gear box 31 with a gear motor disposed on the left end side of the lower frame 21 in FIG. The base end side of the rotary arm 32 is fitted to the output shaft end of the gear box 31 with gear motor, and the rotary arm 32 is configured to rotate around the output shaft. A crank link 33 is interposed between the tip of the rotating arm 32 and a bracket 34 fixed to an intermediate position of the projecting portion of the sliding shaft 23a of the reciprocating frame 23. That is, the reciprocating frame 23 is configured to reciprocate a distance corresponding to twice the length of the rotating arm 32.
[0026]
By the way, in the present embodiment, as described above, in order to reciprocate the polishing buff 28, the dimension from the rotation center to the pin hole of the link connecting pin that connects the crank link 33 is set to be constant. A rotating arm 23 is employed. However, the rotating arm 23 may be replaced with a disk, and pin holes may be provided at different positions from the center of rotation of the disk so that the stroke of the polishing buff 28 can be changed. Further, the buff actuating means is not limited to the above configuration, and various means such as an air cylinder, an electric cylinder, a combination mechanism of a ball screw and a motor, and the like can be adopted.
[0027]
Hereinafter, the operation mode of the continuous electroplating apparatus provided with the roll polishing apparatus 20 according to the above embodiment will be described. That is, as in the conventional example, the thin steel plate P is passed between the entry-side conductor roll 7 and the backup roll 9, between the pair of entry-side dam rolls, and between the pair of entry-side electrodes. Next, the sheet is passed between the pair of output electrodes, between the pair of output dam rolls, between the output conductor roll and the backup roll, and continuously electroplated (zinc plated). During the electroplating of the thin steel plate P, the surface of the entrance conductor roll 7 is reciprocated in the longitudinal direction of the entrance conductor roll 7 by the rotation of the rotary arm 32 while being pressed by the air cylinder 24 with a predetermined pressing force. It continues to be polished by the moving polishing buff 28.
[0028]
In this case, the polishing buff 28 is 200 mm longer than the conductor roll, and when one end of the polishing buff 28 moves to one end side of the conductor roll, The other end of the polishing buff 28 is the Before passing the other end of the conductor roll , One end side of the conductor roll and Reverse direction The other end of Moved to. That is, regardless of the movement position of the polishing buff 28, the entire length of the conductor roll is always polished by the polishing buff 28. Therefore, the flatness in the longitudinal direction of the conductor roll is ensured, the lack of polishing of the surface is eliminated, and the foreign matter adhering to the surface is also reliably removed.
[0029]
Therefore, according to the continuous electroplating apparatus which concerns on the said embodiment, the following various effects can be acquired.
(1) Generation of defects such as “zinc winding”, “skin roughness”, and “pushing” on the plated surface is prevented over a long period of time, and a galvanized product with excellent quality can be manufactured.
(2) Since the conductor roll replacement time interval is extended, the repair cost can be reduced and the productivity of the galvanized product is improved.
[0030]
【Example】
Hereinafter, in the continuous electroplating apparatus of the present invention, an example in which a thin steel plate having a thickness of 0.27 to 3.2 mm and a width of 600 to 1600 mm is passed through at a speed of 50 to 150 m / min and galvanized will be described. To do. The entry side conductor roll (hastelloy C called centrifugal cast SUS) 7 used in this example is a polished surface (surface roughness: 0.26 Ra), and the diameter is 7 The length is 350 mm and the length is 1800 mm. A polishing buff having a length of 2000 mm having a polishing material (SiC) having a particle size of # 600 is reciprocated at a speed of 0 to 42 mm / s (stroke 200 mm) along the longitudinal direction of the entrance conductor roll 7. And while the surface of the entrance-side conductor roll 7 was polished (pressing force per unit length: 20 to 500 kPa), the thin steel plate P was passed through and galvanized. In addition, if the surface of the entrance-side conductor roll is thermally sprayed, for example, with WC-NiCr, the wear resistance of the entrance-side conductor roll can contribute to further improvement.
[0031]
Of course, the outgoing conductor roll is the same as the incoming conductor roll 7. Note that the abrasive having a particle size of # 600 is used for the polishing buff, as in the conventional example, when the abrasive having a particle size of # 180 is used, the surface roughness of the surface of the conductor roll becomes rough. For this reason, it is considered that the current easily flows in the plating solution and the contact resistance with the thin steel plate increases, and as a result, the conductor roll generates heat, the corrosivity increases, and the wear of the conductor roll is further promoted.
[0032]
In this embodiment, when the one end side of the polishing buff moves to 20 mm before the one end side of the incoming conductor roll (the other end side of the polishing buff protrudes 180 mm on the other end side of the incoming conductor roll), this polishing buff is moved. Is moved in the opposite direction. However, the polishing buff may be moved in the opposite direction when the one end side of the polishing buff coincides with the one end side of the incoming conductor roll. However, considering the ease of adjusting the position of the polishing buff, it is preferable to move the one end side of the polishing buff in the opposite direction before the one end side coincides with the one end side of the entry-side conductor roll. The timing for moving the polishing buff in the reverse direction is not limited to 20 mm in front. For example, the polishing buff may be moved in the reverse direction 10 mm before or in the reverse direction 15 mm before. It is.
[0033]
By the way, in the laboratory test of the test piece, Cr is applied to the plating solution containing zinc sulfate as the main component. ₃ C ₂ The corrosion rate of -NiCr was 0.07 mm / year, and the corrosion rate of the WC-NiCr was 0.12 mm / year. Therefore, this Cr ₃ C ₂ It is considered that the conductor roll sprayed with -NiCr can provide wear resistance equal to or higher than that of the conductor roll sprayed with WC-NiCr used in this example. Incidentally, a corrosion test was also performed on Hastelloy C, Co—Mo—Cr—Si, and WC—CoCr. Since their corrosion rates are 0.68 mm / year, 1.1 mm / year and 3.37 mm / year, respectively, WC-NiCr and Cr ₃ C ₂ -It can be seen that the corrosion resistance of the NiCr plating solution is extremely excellent.
[0034]
Even after 40 days, no abnormalities were found on the plated surface, and the galvanized products were completely normal (no defects such as “zinc wound”, “skin rough”, “push”) occurred. It was. However, in order to confirm the situation after the lapse of 40 days, the conductor roll was removed and a dimensional inspection was performed. The result is as shown in FIG. 3 where the vertical axis indicates the amount of wear (mm) and the horizontal axis indicates the length (mm) of the conductor roll. That is, according to FIG. 3, although the central portion of the conductor roll has a slightly larger wear amount than the end portion, the dimensional difference between the end portion and the central portion is within a range of 0.2 mm. Moreover, the surface roughness of the surface of the entry-side conductor roll is in the range of 0.26 to 0.64 Ra, and is comparable to the surface of a new conductor roll having a surface roughness of 0.26 Ra. I found out.
[0035]
Next, the following tests were conducted to confirm the superiority of the continuous electroplating apparatus according to the present invention. That is, a polishing buff having a configuration of the conventional example having a grain size # 600 abrasive (SiC) is reciprocated at a speed of 2 m / min to polish a conductor roll having the same specifications as the conductor roll used in this example. While passing through a thin steel plate, it was galvanized. No problem occurred for a while after the start of the plating of the thin steel sheet, but “zinc winding” occurred after 25 days, so the conductor roll was removed and its dimensions were measured.
[0036]
As a result, the amount of wear (mm) is taken on the vertical axis and the length (mm) of the conductor roll is taken on the horizontal axis, as shown in FIG. In consideration of the fact that when the abrasive grain size is coarse, the corrosiveness is increased and the wear is promoted, the abrasive grain size is similar to that of the conventional example although the abrasive grain size # 600 is used. That is, according to FIG. 4, 0.05 to 0.2 mm is worn at the end portion where the thin steel plate of the conductor roll is not in contact, and 0.8 mm is worn at the center portion where the thin steel plate is in contact.
[0037]
The polishing buff according to the present invention is adopted in a continuous electroplating line having 22 conductor rolls in which 11 plating apparatuses are arranged in series, and two months have passed since the start of use. 45 days have passed since the start of use. However, this continuous electroplating line continues to operate without any abnormality. Therefore, the present invention has greatly improved reliability as compared with the conventional example, and has an excellent effect that it can greatly contribute to reduction of maintenance costs and improvement of productivity of galvanized products. Can do.
[0038]
In the above embodiments and examples, the case where the polishing buff is integrally configured has been described. However, for example, a configuration in which a plurality of buff units having a predetermined length are connected in series can be employed. In this case, it is considered that the polishing function (the surface of the conductor roll may have a streak) may be inferior at the joint portion. However, the polishing buff is reciprocated in the longitudinal direction of the conductor roll. There is no problem with the polished surface.
[0039]
In this way, by making the polishing buffs into an additional configuration, the polishing buff itself can be easily manufactured, so that a cost reduction effect can be obtained in which the polishing buff itself is less expensive than the integrated polishing buff. Furthermore, it is possible to adopt a configuration in which buff units having an abrasive having a coarser particle size than the buff unit disposed at the center portion in the longitudinal direction of the polishing buff are disposed at both ends in the longitudinal direction of the polishing buff. In this way, by making a difference in the particle size of the abrasive material of the buff unit between the end portion and the central portion of the polishing buff, the dimensional difference between the both end portions and the central portion of the conductor roll can be further reduced. Therefore, it is possible to contribute to further extension of the stable operation time of the continuous electroplating line and further improvement of the quality of the galvanized product. It should be noted that buff units having an abrasive having a particle size capable of polishing the surface of the end portion of the conductor roll to an acceptable surface roughness may be disposed at both ends of the polishing buff.
[0040]
By the way, although the case of the electroplating apparatus which galvanizes a thin steel plate was demonstrated as an example above, the technical idea of the present invention is applied not only to a steel plate but also to an electroplating apparatus for plating a copper plate or an aluminum plate, for example. Can be applied. Moreover, the example applied to the conductor roll of the plating apparatus which comprises the continuous electroplating line called a halogen line was demonstrated. However, since the technical idea of the present invention can also be applied to the conductor roll of a plating apparatus constituting a continuous electroplating line called a ferrostan line, the application of the present invention is based on the above-described embodiments and examples. The range is not limited. Furthermore, since the above embodiment is merely one specific example of the present invention, design changes and the like can be freely made without departing from the technical idea of the present invention.
[0041]
【The invention's effect】
As detailed above, the claims of the present invention 1 A method for continuous electroplating of such a metal plate and the claims of the present invention 2 Thru 5 In the continuous electroplating apparatus for metal plates according to the above, the length of the polishing buff is longer than that of the conductor roll. The entire length of the conductor roll is always polished by the polishing buff regardless of the movement position of the polishing buff. For this reason, the flatness in the longitudinal direction of the conductor roll is ensured, the lack of polishing of the surface of the conductor roll is eliminated, and foreign substances adhering to the surface are also reliably removed.
[0042]
Accordingly, the claims of the present invention 1 A method for continuous electroplating of such a metal plate and the claims of the present invention 2 Thru 5 According to the continuous electroplating apparatus for metal plates according to effect Can be obtained.
(1) Generation of defects such as “zinc winding”, “skin roughness”, and “pushing” on the plated surface is prevented over a long period of time, and a galvanized product with excellent quality can be manufactured.
(2) Since the replacement time interval of the conductor roll is extended, it is possible to reduce the repair cost of the plating apparatus, and there are various effects that the productivity of the galvanized product is improved.
[0043]
Claims of the invention 4 In the metal plate continuous electroplating apparatus according to the present invention, the polishing buff has a configuration in which a plurality of buff units are connected in series. Therefore, it is easy to manufacture the polishing buff itself, and there is a cost reduction effect that the polishing buff itself is less expensive than the integrally structured polishing buff.
[0044]
Claims of the invention 5 According to the continuous electroplating device for a metal plate according to the present invention, buff units having a rougher Liu-dang abrasive than the buff unit disposed in the central portion of the polishing buff are disposed at both ends in the longitudinal direction of the polishing buff. ing. Therefore, both end portions of the conductor roll can be polished more effectively than the central portion. Therefore, it is possible to contribute to the improvement of the flatness in the longitudinal direction of the conductor roll, and in turn, to contribute to further extension of the stable operation time of the continuous electroplating line and further improvement of the quality of the galvanized product. There is an effect.
[Brief description of the drawings]
FIG. 1 is a front view of a roll polishing apparatus according to an embodiment of the present invention.
FIG. 2 is a view taken in the direction of arrow A in FIG.
FIG. 3 is an explanatory view of conductor roll wear according to an embodiment of the present invention, in which the vertical axis indicates the amount of wear (mm) and the horizontal axis indicates the length of the conductor roll (mm).
FIG. 4 is a diagram illustrating wear of a conductor roll according to a conventional example, with the amount of wear (mm) on the vertical axis and the length (mm) of the conductor roll on the horizontal axis.
FIG. 5 is a schematic perspective view of one plating apparatus constituting a continuous electroplating line called a halogen line according to a conventional example.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 ... Plating apparatus, 2 ... Plating tank, 3 ... Incoming dam roll, 4 ... Outlet dam roll, 5 ... Incoming electrode, 6 ... Outer electrode, 7 ... Incoming conductor roll, 8 ... Outer conductor roll, 9 ... Backup roll
DESCRIPTION OF SYMBOLS 10 ... Roll grinding | polishing apparatus, 11 ... Guide rod, 12 ... Buff support body, 13 ... Polishing buff
DESCRIPTION OF SYMBOLS 20 ... Roll polisher, 21 ... Lower frame, 22 ... Shaft support bracket, 23 ... Reciprocating frame, 23a ... Sliding shaft, 24 ... Air cylinder, 24a ... Compressed air supply hose, 25 ... Guide rod, 26 ... Buff support Frame 27 ... Connecting pin 28 ... Polishing buff 29 ... Fixing means
30 ... Buff actuating means, 31 ... Gear box with gear motor, 32 ... Rotating arm, 33 ... Crank link, 34 ... Bracket

Claims (5)

In a continuous electroplating method of a metal plate for plating a metal plate that is in contact with the conductor roll while polishing the conductor roll with a polishing buff, a polishing buff having a length exceeding the total length of the conductor roll, was pressed against the surface of the conductor roll, and upon reciprocating in the longitudinal direction of the conductor roll, the Migaku Ken buff, end opposite to the moving direction side, of the conductor roll, and the moving direction Before passing through the opposite end, the polishing buff is moved in the opposite direction, and the surface of the conductor roll is polished while maintaining the state where the polishing buff is always in contact with the entire length of the conductor roll. A continuous electroplating method of a metal plate characterized by the above.   A plurality of plating tanks are provided, and a conductor roll that is brought into contact with the metal plate in the through plate is provided on the metal plate entrance / exit side of each plating tank, and the surface of the conductor roll is polished by pressing the surface of the conductor roll. The buff actuating means has a polishing buff having a length exceeding the entire length of the conductor roll, and reciprocates in the longitudinal direction of the conductor roll so that the polishing buff is always in contact with the entire length of the conductor roll. A continuous electroplating apparatus for a metal plate, comprising: a roll polishing apparatus having:   The continuous electroplating apparatus for a metal plate according to claim 2, wherein the polishing buff of the roll polishing apparatus has an integral structure.   3. The continuous electroplating apparatus for a metal plate according to claim 2, wherein the polishing buff of the roll polishing apparatus has a construction in which a plurality of buff units having a predetermined length are connected in series.   A buff unit having an abrasive having a coarser grain size than the abrasive of the buff unit disposed at the central portion in the longitudinal direction of the polishing buff is disposed at both ends in the longitudinal direction of the polishing buff of the roll polishing apparatus. The continuous electroplating apparatus for a metal plate according to claim 4.

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