JP4034439B2 - Method for producing reflective epoxy sheet and reflective substrate sheet - Google Patents

Description

[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a method for producing a reflective epoxy sheet having excellent mass productivity and a reflective substrate sheet suitable for forming a liquid crystal cell with a built-in reflective layer.
[0002]
[Prior art]
2. Description of the Related Art Conventionally, a reflection type epoxy sheet in which a light reflecting sheet is provided on a cured sheet of an epoxy resin is known in which the cured sheet and the light reflecting sheet are laminated with an adhesive. However, there is a problem in that the bonding process is required and the manufacturing efficiency is poor, and the thickness increases due to the presence of the adhesive layer, resulting in a decrease in flexibility.
[0003]
Up to now, there has been no proposal for continuous production of a cured epoxy resin sheet that is practically difficult due to the difficulty of separation and recovery due to adhesion to the casting spreader, and the damage caused by that. It is necessary to obtain a cured sheet by a method, and there is a problem that the production efficiency of the reflection type epoxy sheet as a whole is poorer than this point.
[0004]
[Technical Problem of the Invention]
An object of the present invention is to obtain a production method capable of efficiently forming a reflective epoxy sheet and to develop a reflective substrate sheet useful for forming a liquid crystal cell with a built-in reflective layer.
[0005]
[Means for solving problems]
According to the present invention, an elongate light reflecting sheet having a light-shielding or light-semi-transmissive reflecting layer that can be separated from a base material supporting the reflecting layer is sequentially run, and an epoxy is formed on the reflecting layer. the resin coating solution was cured by sequentially expanded into a sheet, characterized in that the continuous production of epoxy resin cured layer in close contact with the reflection layer of the reflection sheet, exposed reflective layer by a release of the base material method of manufacturing a reflection type epoxy sheet, and a substrate for supporting the reflective layer on one side of the light-shielding or light semi-transmissive reflective layer which has to be separated, the other surface of the reflective layer, As a it was closed an epoxy resin cured layer in close contact with the reflective layer, there is provided a reflective substrate sheet, wherein a reflective layer is exposed by the separation of the substrate.
[0006]
【The invention's effect】
According to the manufacturing method of the present invention, a reflection type epoxy system in which a light reflection sheet and an epoxy resin cured layer are in close contact with each other through a series of simple operations in which an epoxy resin coating liquid is spread and cured on the light reflection sheet. The sheet can be produced continuously and efficiently, and the mass production speed and thickness of the sheet obtained by adjusting the moving speed of the light reflecting sheet and the development amount of the coating liquid can be easily controlled.
[0007]
In addition, the reinforcing effect by adhesion with the light reflecting sheet enables the use of a brittle epoxy resin and the formation of a cured epoxy resin layer having excellent rigidity, and a wide range of epoxy resins can be selected to obtain epoxy-based sheets having various physical properties. Furthermore, since the obtained reflective epoxy sheet does not go through a peeling process, it is difficult to cause damage such as optical defects, and it is easy to reduce the thickness without interposing an adhesive layer between the light reflective sheet and the cured epoxy resin layer. Therefore, it is possible to easily obtain a product having excellent flexibility.
[0008]
On the other hand, according to the reflective substrate sheet of the present invention, the reflective layer can be easily exposed by peeling and removing the support base material in the light reflective sheet, and the circuit patterning of the reflective layer and the circuit on the reflective layer are possible. By forming the pattern, it is possible to efficiently form a liquid crystal cell with a built-in reflection layer using the cell substrate.
[0009]
DETAILED DESCRIPTION OF THE INVENTION
In the production method according to the present invention, a long light-reflecting sheet comprising a light-shielding or light-semi-transmissive reflective layer that can be separated from a base material supporting the reflective layer is sequentially run while the reflective layer The epoxy resin coating liquid is sequentially developed and cured on the sheet to form a cured epoxy resin layer in close contact with the reflective layer of the light reflecting sheet , and the reflective layer is exposed by peeling off the base material. A type epoxy sheet is continuously produced.
[0010]
An example of the manufacturing process is shown in FIG. This shows a continuous production method by a casting method, wherein 1 is a long light reflecting sheet, 2 is a die for developing an epoxy resin coating liquid into a sheet, and 3 is a curing processing apparatus. . Reference numeral 5 denotes a reflection type epoxy-based sheet, which is obtained by adhering an epoxy resin cured layer 22 on the light reflection sheet 1 composed of the support base 11 and the reflection layer 12 as illustrated in FIG. Become.
[0011]
In the above, the light reflecting sheet 1 is sequentially fed from the winding roll 14 via a winding roll (not shown), and is run at a speed of, for example, 0.1 to 50 m / min, especially 0.2 to 5 m / min. Then, the epoxy resin coating liquid is sequentially developed in the form of a sheet through the die 2 on the reflective layer , and the development layer 21 is cured through an appropriate curing processing device 3 such as a heating type or a light irradiation type. The cured epoxy layer 5 is continuously manufactured in close contact with the reflective layer of the light reflecting sheet in the curing process.
[0012]
As the light reflecting sheet, an appropriate long body having a separable base material that supports the reflecting layer on the reflecting layer exhibiting light shielding properties or light semi-transmitting properties can be used. However, those having excellent flexibility can be preferably used from the viewpoints of handleability and production efficiency of the target product. By the way, as an example, a metal foil made of an appropriate reflective metal such as aluminum, chromium, nickel, silver, gold or the like is supported by a base material, and the metal thin film or inorganic oxide single layer film or multilayer film. that the reflective layer is supported by a substrate made of, such as light-scattering reflective sheet and the reflective layer containing bubbles and light-scattering material it is supported by a substrate Ru mentioned.
[0013]
In the above, the support of the reflective layer by the separable base material can be performed by an appropriate adhesive means such as an adhesive process through an adhesive layer or the like, or a fusion process by melting the support base material.
[0014]
The supporting substrate of said, not particularly limited, a transparent film or foam sheet made of a polymer, may use paper or non-woven fabric of any suitable ones. Among them, those excellent in mechanical strength, thermal stability, moisture resistance, weather resistance and the like are preferable . The thickness of the supporting Jimotozai can properly determined and generally in the following 1mm in purpose of thinning and softening, especially 5 to 500 [mu] m, are particularly 10 to 300 [mu] m.
[0015]
In addition, a suitable thing can be used for the polymer which forms the said transparent film etc., There is no limitation in particular. Examples include acrylic polymers, silicone polymers, polyesters and polyurethanes, polyethers and polyvinyl chloride, polyether sulfones and polycarbonates, polyamides and polyimides, polyolefins and acetate polymers, polyvinyl alcohol and polystyrene, and vinyl acetate polymers. Or phenolic, melamine-based, acrylic-based, urethane-based, urethane-acrylic-based, epoxy-based, or silicone-based thermosetting or ultraviolet curable resins.
[0016]
The reflective layer made of the above-described metal thin film or inorganic oxide film is formed on the support substrate by an appropriate thin film formation method such as a vacuum deposition method, an ion plating method, a sputtering method, or a plating method. Etc. can be obtained by a method of forming and adhering. In that case, in particular, when it is made of a metal thin film, an organic or inorganic transparent protective layer or the like can be provided for the purpose of preventing a decrease in reflectivity due to oxidation or maintaining the initial reflectivity for a long time.
[0017]
The reflective layer made of a metal thin film or an inorganic oxide film can be formed as a single layer film or a multilayer film, and the light transmittance can be controlled by adjusting the film thickness by thickening or multilayering. Therefore, it is possible to form a light shielding or light semi-transmissive reflective layer by controlling the film thickness. As the inorganic oxide forming the reflective layer, for example, one or more suitable oxides such as tin oxide, indium oxide, silica, alumina, titania, zirconia, cadmium oxide and antimony oxide can be used. .
[0018]
The light reflecting sheet used may be of a light scattering reflection type. The purpose of this is to make the brightness uniform over the entire surface of the sheet by the diffusion effect caused by the scattering of the reflected light. The light scattering type reflection sheet is, for example, a sheet in which a reflection layer containing air bubbles or a light scattering material is supported by a base material , or a method using a rolled metal foil having a hairline or the like as the reflection layer , or a rough surface. It can be obtained by a method using a supporting substrate for modification.
[0019]
The bubble-containing reflective layer can be obtained, for example, as a polymer foam sheet layer . The light-scattering substance-containing reflective layer includes, for example, the above-described inorganic oxide particles and metal particles for forming a reflective layer, inorganic particles such as calcium carbonate and glass beads, organic particles such as crosslinked or uncrosslinked polymer particles, It can be obtained as a polymer layer containing an appropriate light-scattering substance such as flaky particles such as mica and a pearl pigment such as a titanium dioxide coating. The average particle diameter of the light scattering material is preferably about 0.1 to 10 μm, but is not limited thereto. As the polymer, an appropriate polymer such as those exemplified for the above-mentioned support base material or rubber-based polymer can be used.
[0020]
Bubble-containing sheet or light-scattering substance-containing sheet, Ru der those supported by the substrate which enables separating a foam layer and a light-scattering material containing layer. The bubble-containing sheet and the light-scattering substance-containing sheet can control the light transmittance depending on the content of the bubbles and the light-scattering substance, the thickness of the containing layer, and the like, and thus a light-shielding or light-semi-transmissive reflective layer it is possible to obtain a reflective sheet having. Favorites bubble-containing sheet or light-scattering substance-containing sheet can be formed, for example, by suitable methods, such as a coating method of the polymer dispersions of the laminate type or a predetermined substance combination sheets such.
[0021]
On the other hand, the method using the support substrate for surface roughening described above is a surface with a fine concavo-convex structure by an appropriate method such as a surface roughening method such as sandblasting or mat treatment or a light scattering material blending method. A reflective layer made of a metal thin film reflecting the fine uneven structure is provided on the support substrate.
[0022]
In the present invention, an epoxy resin and its curing agent are used for the preparation of the epoxy resin coating liquid developed on the reflection layer of the light reflecting sheet, and a curing accelerator or a leveling agent is used in combination as required. The epoxy resin is not particularly limited, and an appropriate one can be used according to the purpose of use of the reflection type epoxy-based sheet to be formed, the purpose of a curing treatment method such as thermal curing or light irradiation curing.
[0023]
Incidentally, examples of the epoxy resin include bisphenol A type, bisphenol F type, bisphenol S type and bisphenol type such as hydrogenated type thereof, novolak type such as phenol novolak type and cresol novolak type, triglycidyl isocyanurate type, Nitrogen-containing ring type such as hydantoin type, alicyclic type and aliphatic type, aromatic type such as naphthalene type, low water absorption type such as glycidyl ether type, biphenyl type, dicyclo type, ester type and ether ester type, etc. The denatured type and the like.
[0024]
An epoxy resin that can be preferably used from the viewpoint of optical properties such as transparency is an alicyclic type resin that does not contain a conjugated double bond such as a benzene ring and has good discoloration prevention properties. In general, an epoxy resin having an epoxy equivalent of 100 to 1000 and a softening point of 120 ° C. or less can be preferably used from the viewpoint of physical properties such as flexibility and strength of the obtained reflective epoxy sheet. Furthermore, from the point of obtaining an epoxy resin coating liquid that is excellent in coating property and developability to a sheet, etc., a two-component mixed type that shows a liquid state at a temperature below the coating temperature, especially at room temperature is preferable. Can be used.
[0025]
One or more epoxy resins can be used, and liquid and solid epoxy resins can be used in combination. The combined use of solid epoxy resin can improve strength and heat resistance, and the viscosity of the coating liquid can be adjusted. Especially, the viscosity of the coating liquid can be increased and the control of the thickness of the spread layer can be facilitated. Can do.
[0026]
On the other hand, the curing agent is not particularly limited, and one or more appropriate curing agents according to the epoxy resin can be used. Examples include tetrahydrophthalic acid and methyltetrahydrophthalic acid, organic acid compounds such as hexahydrophthalic acid and methylhexahydrophthalic acid, ethylenediamine and propylenediamine, diethylenetriamine and triethylenetetramine, their amine adducts and Examples thereof include amine compounds such as phenylenediamine, diaminodiphenylmethane and diaminodiphenylsulfone.
[0027]
Also amide compounds such as dicyandiamide and polyamide, hydrazide compounds such as dihydragit, methylimidazole, 2-ethyl-4-methylimidazole, ethylimidazole, isopropylimidazole, 2,4-dimethylimidazole, phenylimidazole, undecylimidazole Also examples of the curing agent include imidazole compounds such as heptadecylimidazole and 2-phenyl-4-methylimidazole.
[0028]
Further imidazoline compounds such as methyl imidazoline, 2-ethyl-4-methyl imidazoline, ethyl imidazoline, isopropyl imidazoline, 2,4-dimethyl imidazoline, phenyl imidazoline, undecyl imidazoline, heptadecyl imidazoline, 2-phenyl-4-methyl imidazoline. In addition, phenolic compounds, urea compounds, and polysulfide compounds are also examples of the curing agent.
[0029]
In addition, acid anhydride compounds and the like are also exemplified as the curing agent, and it takes longer than the points of work environment property due to low irritation, high temperature durability due to improved heat resistance of the resulting cured layer, discoloration prevention property, etc. An acid anhydride curing agent can be preferably used. Examples include phthalic anhydride, maleic anhydride, trimellitic anhydride, pyromellitic anhydride, nadic anhydride, glutaric anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, hexahydrophthalic anhydride, Examples include methylhexahydrophthalic acid anhydride, methylnadic acid anhydride, dodecenyl succinic acid anhydride, dichlorosuccinic acid anhydride, benzophenone tetracarboxylic acid anhydride, and chlorendic acid anhydride.
[0030]
In particular, it is colorless or pale yellow, such as phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, and methylhexahydrophthalic anhydride, and has an acid anhydride curing with a molecular weight of about 140 to about 200. An agent can be preferably used.
[0031]
The amount of the curing agent used can be appropriately determined according to the type of the epoxy resin, the epoxy equivalent of the epoxy resin, etc. Incidentally, in the above acid anhydride curing agent, 0.5 to 1.5 equivalents, especially 0.6 to 1 with respect to 1 equivalent of the epoxy group from the viewpoint of preventing the hue and moisture resistance of the cured layer obtained. It is preferable to use an acid anhydride curing agent at a ratio of 0.4 equivalent, particularly 0.7 to 1.2 equivalent. In addition, also when using another hardening | curing agent individually or in combination of 2 or more types, the usage-amount can be based on said equivalent ratio.
[0032]
There are no particular limitations on the curing accelerator used as necessary. For example, tertiary amines, imidazoles, quaternary ammonium salts, organometallic salts, phosphorus, etc., depending on the type of epoxy resin or curing agent. One or more suitable compounds such as compounds and urea compounds can be used.
[0033]
By using a curing accelerator, the curing speed can be accelerated to shorten the required curing processing time, and the necessary line length from development to curing processing can be shortened to a fraction of that when the accelerator is not used. . Accordingly, the amount of the curing accelerator used can be appropriately determined according to the acceleration effect and the like, but generally 0.05 to 7 parts by weight per 100 parts by weight of the epoxy resin from the viewpoint of discoloration prevention, etc. 1 to 5 parts by weight, particularly 0.2 to 3 parts by weight is preferred.
[0034]
If necessary, the leveling agent should have a satin-like surface due to variations in surface tension due to scattering of the curing agent, etc. when the development layer of the epoxy resin coating solution is cured in contact with air. For the purpose of preventing the formation of a smooth surface and the like, an appropriate one that can lower the surface tension of various surfactants such as silicone-based, acrylic-based, and fluorine-based ones is used. Two or more species can be used.
[0035]
When preparing the epoxy resin coating liquid, it may be further blended into the cured epoxy resin as necessary, for example, an antioxidant such as phenol, amine, organic sulfur or phosphine, glycols or silicone. Appropriate additives such as denaturing agents, alcohols and the like, antifoaming agents, hydroxyl group-containing compounds, dyes, anti-discoloring agents, and ultraviolet absorbers can be blended. The anti-foaming agent is added for the purpose of preventing air bubbles that cause a decrease in optical properties from being mixed into the obtained cured layer, and polyhydric alcohols such as glycerin can be preferably used.
[0036]
The epoxy resin coating liquid can be prepared by making the blended components into a state that can be fluidly developed by using a solvent together if necessary. Therefore, for the development of the epoxy resin coating liquid, an appropriate method such as a curtain coating method, a roll coating method, a wire bar coating method, an extrusion coating method, or a spray coating method can be adopted. In particular, the extrusion coating method can be preferably applied from the viewpoint of coating efficiency and the like in the casting method using the above-described die or the like.
[0037]
The thickness of the epoxy resin cured layer to be formed can be determined as appropriate, but generally it is 100 to 1000 μm, especially 150 to 800 μm, in terms of rigidity such as bending strength, surface smoothness, low phase difference and thin and light weight. In particular, 200 to 500 μm is preferable. Further, the thickness accuracy is preferably ± 10% or less from the viewpoint of optical use. The thickness accuracy can be achieved by, for example, a method of maintaining the surface of the light reflecting sheet in a horizontal state as much as possible in the process of forming the cured epoxy resin layer.
[0038]
The formed continuum of the reflective epoxy sheet is recovered by cutting it to an appropriate size through an appropriate cutting means such as a laser beam, an ultrasonic cutter, dicing or a water jet according to the purpose of use. You can also. Note as illustrated example described above, the epoxy resin cured layer 22 is Ru provided on the reflective layer 12 of the optical sheet 1.
[0039]
The reflective epoxy sheet according to the present invention can be preferably used in various applications such as a reflective plate in a state where the base material is peeled and removed to expose the reflective layer . In particular, it can be preferably used for optical applications such as a substrate for a liquid crystal cell that is required to withstand high-temperature processing and to be excellent in bending strength, lightness and the like because of its excellent optical characteristics and heat resistance.
[0040]
In particular, in the present invention, a reflective substrate sheet (reflective epoxy sheet) in which a cured epoxy resin layer is closely attached on a reflective layer of a light reflective sheet that can separate the support base and the reflective layer . As shown in FIG. 2B, the support substrate 13 is peeled from the reflective epoxy sheet 5 to obtain a sheet in which the reflective layer 12 adhered to the cured epoxy resin layer 22 is exposed.
[0041]
The epoxy sheet with the reflective layer exposed has a reflective layer built-in reflective liquid crystal cell efficiently by providing an anti-etching protective layer on the reflective layer and forming a circuit pattern thereon. It can be preferably used as a cell substrate that can be formed. When the reflective layer is made of a conductive layer such as a metal foil, the reflective layer is also incorporated in a method of patterning the reflective layer by, for example, applying photolithography to form a circuit pattern that also serves as the reflective layer. A cell substrate which can be preferably used for forming a reflective liquid crystal cell of the type can be obtained.
[0042]
In the above, the light reflecting sheet from which the supporting base material and the reflective layer can be separated is, for example, a peelable adhesion treatment between the supporting base material and the reflective layer via an adhesive layer or the like, or reflection by low temperature heating of the supporting base material. It can be performed by an appropriate adhesion method such as a fusion treatment with weak adhesion to the layer.
[0043]
【Example】
Example 1
3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate 100 parts (parts by weight, the same applies hereinafter), methylhexahydrophthalic anhydride 125 parts, tetra-n-butylphosphonium o, o-diethyl phosphorodithio 3.75 parts of ate, 2.25 parts of glycerin and 0.07 part of a silicone-based surfactant (leveling agent, manufactured by Enomoto Kasei Co., Ltd., Disparon LS-009) are stirred and mixed and aged at 49 ° C. for 90 minutes for epoxy. A resin coating solution was prepared.
[0044]
Next, by the casting method illustrated in FIG. 1, a light reflecting sheet composed of a laminate of a PET film having a thickness of 50 μm and an aluminum foil having a hairline having a thickness of 15 μm is interposed between 0.5 m / min. While running at a constant speed, the epoxy resin coating solution is continuously discharged from the die at a rate of 100 g / min on the aluminum foil, and cast and developed into a sheet shape. Heat-curing treatment was carried out at 30 ° C. for 30 minutes to continuously obtain a light-shielding and light-scattering / reflective epoxy-based sheet (reflective substrate sheet) in which a 300 μm-thick epoxy resin cured layer was in close contact with the aluminum foil.
[0045]
Example 2
400 μm thick epoxy resin cured according to Example 1 except that a 50 μm thick film (DMS film manufactured by Toyo Metallizing Co., Ltd.) with an aluminum vapor deposition film provided on the mat treated surface was used as the light reflecting sheet. A reflective epoxy sheet having a layer was continuously obtained. This sheet was light-shielding and light-scattering / reflecting, and was excellent in durability and thinness due to the absence of an adhesive layer.
[0046]
Example 3
As a light reflecting sheet, a mat-treated surface of a 50 μm-thick PET film (manufactured by Toray Industries, Inc.) was ground-treated, and silver was deposited to a thickness of 100 nm to form a mirror surface. A reflective epoxy sheet having an epoxy resin cured layer having a thickness of 300 μm was continuously obtained in the same manner as in Example 1 except that an antioxidant protective layer was used. This sheet was also light-shielding and light-scattering / reflective, and was excellent in durability and thinness.
[0047]
Example 4
A reflective epoxy sheet was continuously obtained in the same manner as in Example 3 except that a PET film having a thickness of 50 μm which was not matted was used as a support substrate for the light reflecting sheet. This sheet was light-shielding and light-reflective, and was excellent in durability and thinness.
[0048]
Reference Example A reflective epoxy system in which a 400 μm thick cured epoxy resin layer is in close contact with a PET film, except that a white foamed PET film (manufactured by Toray Industries, Inc.) having a thickness of 50 μm was used as the light reflecting sheet. Sheets were obtained continuously. This sheet was semi-transmissive and light scattering reflective, and was excellent in durability and thinness.
[0049]
Example 5
Similar to Example 1, except that a light-reflective sheet is a non-stretched polycarbonate film having a thickness of 50 μm provided with a light-semitransmissive reflective layer made of a metal oxide multilayer deposited film, and having a thickness of 400 μm. A reflective epoxy sheet in which the cured epoxy resin layer was in close contact with the reflective layer was continuously obtained. This sheet was light semi-transmissive and light regular reflection type, and was excellent in durability and thinness.
[0050]
Example 6
As a light reflecting sheet, an acrylic HC resin liquid in which a pearl pigment (manufactured by Nihon Koken Co., Ltd., synthetic mica foil) is dispersed is applied onto a PET film having a thickness of 50 μm, and formed into a film to form a semi-transparent reflection A reflective epoxy sheet in which a 400 μm-thick epoxy resin cured layer was in intimate contact with the reflective layer was obtained continuously in the same manner as in Example 1 except that the layer provided was used. This sheet was semi-transmissive and light scattering reflective, and was excellent in durability and thinness.
[0051]
Example 7
The PET film was peeled and removed from the reflective epoxy sheet obtained according to Example 1, and an etching-resistant protective layer having a thickness of 5 μm was formed on the aluminum surface to withstand ITO film formation and etching treatment. An epoxy sheet reduced by several tens of μm was obtained.
[0052]
Example 8
The PET film was peeled off from the reflective substrate sheet (reflective epoxy sheet) obtained by vapor deposition according to Example 4 to obtain an epoxy sheet in which the aluminum deposited layer was exposed. This sheet was excellent in thinness and flexibility, and was able to be used as an internal specular reflection type liquid crystal cell substrate by patterning the aluminum vapor deposition layer.
[0053]
Comparative Example An epoxy resin coating solution according to Example 1 was developed in a thin layer on a rotationally driven endless stainless steel belt, and was cured by heating to form a film having a thickness of 300 μm. Due to uneven application of the release agent, peeling failure occurred, and a practical epoxy film could not be obtained.
[Brief description of the drawings]
FIG. 1 is an explanatory view of an example of a manufacturing process. FIG. 2 is a cross-sectional view of an example of a reflective epoxy sheet. FIG. 1B is a cross-sectional view of an example of a reflective substrate sheet.
1: Light reflection sheet 11, 13: Support base material 12: Reflection layer 2: Die 21: Development layer of epoxy resin coating liquid 3: Curing treatment device 5: Reflection type epoxy sheet (reflection type substrate sheet)
22: Epoxy resin cured layer

Claims (4)

An epoxy resin coating liquid is applied on the reflective layer while sequentially running a long light reflective sheet having a light-shielding or semi-transparent reflective layer on which a substrate supporting the reflective layer is separable. A reflective epoxy in which the reflective layer is exposed by peeling of the base material, wherein the cured epoxy resin layer is adhered to the reflective layer of the light-reflecting sheet and is continuously produced by curing in a sheet form. A method for manufacturing a sheet. The light reflecting sheet according to claim 1, wherein the light reflecting sheet is a metal foil, a metal thin film, a reflection layer comprising a single layer film or a multilayer film of an inorganic oxide supported by a base material, or a reflection layer containing a bubble or a light scattering material. A method for producing a reflective epoxy sheet, which is a light-scattering / reflecting sheet supported by a substrate, wherein the thickness of the cured epoxy resin layer is 100 μm or more. 3. The method for producing a reflection type epoxy sheet according to claim 1, wherein the light reflection sheet is of a light scattering reflection type using a reflection layer comprising a rolled metal foil or a surface roughened substrate. Have a light-shielding or semitransparent substrate for supporting the reflective layer on one surface of the reflective layer which has to be separated, the other surface of the reflective layer, an epoxy resin cured layer in close contact with the reflective layer of its A reflective substrate sheet , wherein the reflective layer is exposed by peeling of the base material .

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