JP3986047B2 - 事前のパターニングを有する、マイクロメカニカルおよびマイクロオプトメカニカルな構造物を製造するための方法 - Google Patents
事前のパターニングを有する、マイクロメカニカルおよびマイクロオプトメカニカルな構造物を製造するための方法 Download PDFInfo
- Publication number
- JP3986047B2 JP3986047B2 JP2001360360A JP2001360360A JP3986047B2 JP 3986047 B2 JP3986047 B2 JP 3986047B2 JP 2001360360 A JP2001360360 A JP 2001360360A JP 2001360360 A JP2001360360 A JP 2001360360A JP 3986047 B2 JP3986047 B2 JP 3986047B2
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- Japan
- Prior art keywords
- layer
- single crystal
- crystal silicon
- etching
- patterning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 65
- 238000000059 patterning Methods 0.000 title claims description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000010410 layer Substances 0.000 claims description 148
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 51
- 229920005591 polysilicon Polymers 0.000 claims description 49
- 238000005530 etching Methods 0.000 claims description 47
- 230000003287 optical effect Effects 0.000 claims description 38
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 37
- 239000000758 substrate Substances 0.000 claims description 27
- 229910052751 metal Inorganic materials 0.000 claims description 25
- 239000002184 metal Substances 0.000 claims description 25
- 230000008569 process Effects 0.000 claims description 20
- 238000012545 processing Methods 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 9
- 238000000576 coating method Methods 0.000 claims description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 239000010931 gold Substances 0.000 claims description 5
- 238000000206 photolithography Methods 0.000 claims description 5
- 239000011241 protective layer Substances 0.000 claims description 5
- 239000011651 chromium Substances 0.000 claims description 4
- 238000001312 dry etching Methods 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 230000001681 protective effect Effects 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 65
- 238000001020 plasma etching Methods 0.000 description 34
- 239000010409 thin film Substances 0.000 description 21
- 238000005459 micromachining Methods 0.000 description 16
- 229920002120 photoresistant polymer Polymers 0.000 description 13
- 150000004767 nitrides Chemical class 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 238000005229 chemical vapour deposition Methods 0.000 description 8
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 239000012212 insulator Substances 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000013078 crystal Substances 0.000 description 6
- 238000013461 design Methods 0.000 description 6
- 239000002019 doping agent Substances 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 5
- 238000001465 metallisation Methods 0.000 description 5
- 238000002310 reflectometry Methods 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 3
- 238000005498 polishing Methods 0.000 description 3
- 238000012876 topography Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 208000005647 Mumps Diseases 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000000708 deep reactive-ion etching Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 238000004377 microelectronic Methods 0.000 description 2
- 208000010805 mumps infectious disease Diseases 0.000 description 2
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 2
- 238000012805 post-processing Methods 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 206010067482 No adverse event Diseases 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 238000002120 advanced silicon etching Methods 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000000347 anisotropic wet etching Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000002242 deionisation method Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000005226 mechanical processes and functions Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-M nitrite group Chemical group N(=O)[O-] IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00642—Manufacture or treatment of devices or systems in or on a substrate for improving the physical properties of a device
- B81C1/0065—Mechanical properties
- B81C1/00666—Treatments for controlling internal stress or strain in MEMS structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/04—Optical MEMS
- B81B2201/047—Optical MEMS not provided for in B81B2201/042 - B81B2201/045
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/01—Suspended structures, i.e. structures allowing a movement
- B81B2203/0118—Cantilevers
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Micromachines (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Element Separation (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/724,506 US6479311B1 (en) | 2000-11-27 | 2000-11-27 | Process for manufacturing micromechanical and microoptomechanical structures with pre-applied patterning |
| US09/724,506 | 2000-11-27 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002283296A JP2002283296A (ja) | 2002-10-03 |
| JP2002283296A5 JP2002283296A5 (enExample) | 2004-11-11 |
| JP3986047B2 true JP3986047B2 (ja) | 2007-10-03 |
Family
ID=24910687
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001360360A Expired - Fee Related JP3986047B2 (ja) | 2000-11-27 | 2001-11-27 | 事前のパターニングを有する、マイクロメカニカルおよびマイクロオプトメカニカルな構造物を製造するための方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US6479311B1 (enExample) |
| EP (1) | EP1213260B1 (enExample) |
| JP (1) | JP3986047B2 (enExample) |
| DE (1) | DE60128440T2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6506620B1 (en) * | 2000-11-27 | 2003-01-14 | Microscan Systems Incorporated | Process for manufacturing micromechanical and microoptomechanical structures with backside metalization |
| US20040240034A1 (en) * | 2001-11-30 | 2004-12-02 | Scharf Bruce R. | Diffraction compensation using a patterned reflector |
| US6755982B2 (en) * | 2002-01-07 | 2004-06-29 | Xerox Corporation | Self-aligned micro hinges |
| US7067355B2 (en) * | 2004-05-26 | 2006-06-27 | Hewlett-Packard Development Company, L.P. | Package having bond-sealed underbump |
| US20090088618A1 (en) | 2007-10-01 | 2009-04-02 | Arneson Michael R | System and Method for Manufacturing a Swallowable Sensor Device |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6149190A (en) | 1993-05-26 | 2000-11-21 | Kionix, Inc. | Micromechanical accelerometer for automotive applications |
| DE4318466B4 (de) | 1993-06-03 | 2004-12-09 | Robert Bosch Gmbh | Verfahren zur Herstellung eines mikromechanischen Sensors |
| US5476819A (en) | 1993-07-26 | 1995-12-19 | Litton Systems, Inc. | Substrate anchor for undercut silicon on insulator microstructures |
| US5589083A (en) | 1993-12-11 | 1996-12-31 | Electronics And Telecommunications Research Institute | Method of manufacturing microstructure by the anisotropic etching and bonding of substrates |
| US5660680A (en) | 1994-03-07 | 1997-08-26 | The Regents Of The University Of California | Method for fabrication of high vertical aspect ratio thin film structures |
| US5645684A (en) | 1994-03-07 | 1997-07-08 | The Regents Of The University Of California | Multilayer high vertical aspect ratio thin film structures |
| US5484073A (en) | 1994-03-28 | 1996-01-16 | I/O Sensors, Inc. | Method for fabricating suspension members for micromachined sensors |
| US5569355A (en) | 1995-01-11 | 1996-10-29 | Center For Advanced Fiberoptic Applications | Method for fabrication of microchannel electron multipliers |
| US6084257A (en) | 1995-05-24 | 2000-07-04 | Lucas Novasensor | Single crystal silicon sensor with high aspect ratio and curvilinear structures |
| SE9502258D0 (sv) | 1995-06-21 | 1995-06-21 | Pharmacia Biotech Ab | Method for the manufacture of a membrane-containing microstructure |
| DE19603829A1 (de) | 1996-02-02 | 1997-08-07 | Daimler Benz Ag | Verfahren zur Herstellung von mikromechanischen Strukturen aus Silizium |
| US6074890A (en) * | 1998-01-08 | 2000-06-13 | Rockwell Science Center, Llc | Method of fabricating suspended single crystal silicon micro electro mechanical system (MEMS) devices |
| US5853960A (en) | 1998-03-18 | 1998-12-29 | Trw Inc. | Method for producing a micro optical semiconductor lens |
| US6117344A (en) | 1998-03-20 | 2000-09-12 | Borealis Technical Limited | Method for manufacturing low work function surfaces |
| US6002507A (en) * | 1998-12-01 | 1999-12-14 | Xerox Corpoation | Method and apparatus for an integrated laser beam scanner |
| US6014240A (en) | 1998-12-01 | 2000-01-11 | Xerox Corporation | Method and apparatus for an integrated laser beam scanner using a carrier substrate |
| US6238581B1 (en) | 1998-12-18 | 2001-05-29 | Eastman Kodak Company | Process for manufacturing an electro-mechanical grating device |
-
2000
- 2000-11-27 US US09/724,506 patent/US6479311B1/en not_active Expired - Lifetime
-
2001
- 2001-11-27 DE DE60128440T patent/DE60128440T2/de not_active Expired - Lifetime
- 2001-11-27 JP JP2001360360A patent/JP3986047B2/ja not_active Expired - Fee Related
- 2001-11-27 EP EP01128169A patent/EP1213260B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002283296A (ja) | 2002-10-03 |
| EP1213260A3 (en) | 2004-06-16 |
| EP1213260A2 (en) | 2002-06-12 |
| DE60128440D1 (de) | 2007-06-28 |
| EP1213260B1 (en) | 2007-05-16 |
| US6479311B1 (en) | 2002-11-12 |
| DE60128440T2 (de) | 2008-01-24 |
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