JP3966848B2 - Substrate processing equipment - Google Patents

Description

  The present invention relates to a substrate processing apparatus for sequentially processing a substrate by rotating a substrate such as a semiconductor wafer or a glass substrate for a liquid crystal display while supplying a chemical solution or a rinsing solution onto the substrate, and is particularly shaken from the periphery of the substrate. The present invention relates to a technique for separating and recovering chemical liquid and rinse liquid.

  Conventionally, as this type of substrate processing apparatus, for example, there is one described in Japanese Utility Model Publication No. 4-34902 (see Patent Document 1). As shown in FIG. 7, the substrate processing apparatus includes a spin chuck 1 that holds the substrate W in a horizontal posture. The spin chuck 1 is connected to the output shaft of the motor 2. The motor 2 is driven up and down by an air cylinder 3 so that the spin chuck 1 is set at an ascending position and a descending position. Above the spin chuck 1, a nozzle 4 for supplying a chemical solution, a rinse solution or the like to the substrate W is provided. Further, around the spin chuck 1, cups 5 and 6 for separating and collecting the chemical solution and the rinse solution shaken off from the periphery of the substrate W are provided. The opening 5a of the cup 5 is set to face the substrate W in the raised position, and the opening 6a of the cup 6 is set to face the substrate W in the lowered position.

This substrate processing apparatus supplies a chemical solution to the substrate W while rotating the substrate W and performs a required chemical solution treatment, then supplies a rinse solution such as pure water to the substrate W to replace the chemical solution with the rinse solution, Subsequently, a series of processes of rotating the substrate W at a high speed and drying the substrate W are performed. In general, the chemical processing is performed by rotating the substrate W at a relatively low speed from the viewpoint of preventing the occurrence of mist, whereas the rinsing liquid processing and the drying processing are performed by rotating the substrate W at a higher speed than in the chemical processing. Done. Therefore, the chemical solution during the chemical treatment is not shaken off from the substrate W so vigorously, whereas the rinse solution during the rinse treatment or the drying treatment is shaken off horizontally from the peripheral edge of the substrate W. Therefore, when separating and recovering the chemical liquid and the rinse liquid shaken off from the substrate W, the chemical liquid is recovered by the inner cup 6 and the rinse liquid is recovered by the outer cup 5. In other words, when the chemical solution processing is performed with the substrate W set at the lowered position, the chemical solution shaken off from the substrate W is reliably received and collected by the inner cup 6, and then the substrate W is set at the raised position to perform the rinsing / drying process. As a result, most of the rinse liquid shaken off from the substrate W is collected in the outer cup 5.
Japanese Utility Model Publication No. 4-34902

However, the conventional example having such a configuration has the following problems.
Recently, many types of substrate processing apparatuses of this type take the form of collecting chemicals collected in a cup in a chemical tank in the apparatus from the viewpoint of saving resources. In such a substrate processing apparatus, when the cup arrangement structure as shown in FIG.

  That is, during the rinsing / drying process, the substrate W is rotated at a high speed, but it is inevitable that a portion of the rinse liquid shaken off from the periphery of the substrate W enters the inner cup 6. In particular, the amount of the rinsing liquid entering the inner cup 6 is not small at the start of rotation where the rotation speed of the substrate W is not sufficiently increased. The rinse liquid that has entered the cup 6 flows into the chemical tank in the apparatus and causes the disadvantage of reducing the concentration of the chemical liquid. Of course, the concentration of the chemical solution in the substrate processing apparatus is controlled, and it is configured so that the chemical solution is replenished in the event of a decrease in concentration. There is a request.

  The present invention has been made in view of such circumstances, and an object of the present invention is to provide a substrate processing apparatus that can suppress a change in concentration of a chemical solution as much as possible when the chemical solution shaken off from the substrate is collected by a cup. It is said.

In order to achieve such an object, the present invention has the following configuration.
That is, the invention according to claim 1 is a substrate processing apparatus for processing a substrate by sequentially supplying a chemical solution and a rinse solution to the substrate, and a substrate rotation holding means for holding and rotating the substrate, and the substrate rotation holding means. A rinsing liquid supply means for supplying a rinsing liquid to the substrate held on the substrate, a chemical liquid supply means for supplying a chemical liquid to the substrate held by the substrate rotation holding means, and an outer periphery of the substrate rotation holding means holding the substrate And a rinse liquid recovery cup having an opening for recovering the rinse liquid shaken off from the peripheral edge of the substrate, and an outer peripheral side of the substrate rotation holding means for holding the substrate. A chemical recovery cup having an opening for recovering the chemical liquid shaken off from above the opening of the rinse liquid recovery cup, a vertically movable intermediate cup wall separating the two cups, and a chemical During the processing, the intermediate cup wall is lowered to widen the opening of the chemical solution recovery cup, and this opening is made to face the peripheral edge of the substrate, while during the rinsing liquid processing, the intermediate cup wall is raised and the rinse liquid recovery cup An intermediate cup wall lifting / lowering means that opens the opening widely and opposes the opening to the periphery of the substrate, and the intermediate cup wall closes the opening of the chemical recovery cup when raised during the rinsing liquid treatment. It is characterized by that.

  According to a second aspect of the present invention, in a substrate processing apparatus for processing a substrate by sequentially supplying a chemical solution and a rinsing solution to the substrate, the substrate rotation holding means for holding and rotating the substrate, and the substrate rotation holding means A rinsing liquid supply means for supplying a rinsing liquid to the substrate, a chemical liquid supply means for supplying a chemical liquid to the substrate held by the substrate rotation holding means, and an outer peripheral side of the substrate rotation holding means holding the substrate. A rinse liquid recovery cup having an opening for recovering the rinse liquid that is disposed and shaken off from the periphery of the substrate, and disposed on the outer peripheral side of the substrate rotation holding means holding the substrate, and is shaken from the periphery of the substrate. A chemical recovery cup having an opening for recovering the received chemical liquid above the opening of the rinse liquid recovery cup, an intermediate cup wall that can be raised and lowered to separate the two cups, and during chemical processing The intermediate cup wall is lowered to allow the chemical liquid shaken off from the peripheral edge of the substrate to reach the opening of the chemical liquid recovery cup, while at the time of rinsing liquid treatment, the intermediate cup wall is raised to move from the peripheral edge of the substrate. An intermediate cup wall lifting / lowering means for receiving the rinsed rinse liquid and guiding it to the opening of the rinse liquid recovery cup, and when the intermediate cup wall is raised during the rinse liquid treatment, the opening of the chemical liquid recovery cup It is characterized in that it is a blocker.

According to a third aspect of the present invention, in a substrate processing apparatus for processing a substrate by sequentially supplying a chemical solution and a rinsing solution to the substrate, the substrate rotation holding means for holding and rotating the substrate, and the substrate rotation holding means A rinsing liquid supply means for supplying a rinsing liquid to the substrate, a chemical liquid supply means for supplying a chemical liquid to the substrate held by the substrate rotation holding means, and an outer peripheral side of the substrate rotation holding means holding the substrate. A rinse liquid recovery cup having an opening for recovering the rinse liquid that is disposed and shaken off from the periphery of the substrate, and disposed on the outer peripheral side of the substrate rotation holding means holding the substrate, and is shaken from the periphery of the substrate. A chemical recovery cup having an opening for recovering the received chemical liquid above the opening of the rinse liquid recovery cup, an intermediate cup wall that can be raised and lowered to separate the two cups, and during chemical processing The intermediate cup wall is lowered to widen the opening of the chemical solution recovery cup, and this opening is opposed to the peripheral edge of the substrate, while at the time of rinsing liquid treatment, the intermediate cup wall is raised to open the opening of the rinse liquid recovery cup. An intermediate cup wall lifting / lowering means that opens wide and opposes the opening to the periphery of the substrate, and the intermediate cup wall is configured to prevent the rinsing liquid from entering the opening of the chemical liquid recovery cup when raised during the rinsing liquid treatment. The upper end portion of the chemical solution recovery cup is formed by overhanging, and the intermediate cup wall is raised to close the opening of the chemical solution recovery cup .

According to a fourth aspect of the present invention, in a substrate processing apparatus for processing a substrate by sequentially supplying a chemical solution and a rinsing solution to the substrate, the substrate rotation holding means for holding and rotating the substrate, and the substrate rotation holding means A rinsing liquid supply means for supplying a rinsing liquid to the substrate, a chemical liquid supply means for supplying a chemical liquid to the substrate held by the substrate rotation holding means, and an outer peripheral side of the substrate rotation holding means holding the substrate. A rinse liquid recovery cup having an opening for recovering the rinse liquid that is disposed and shaken off from the periphery of the substrate, and disposed on the outer peripheral side of the substrate rotation holding means holding the substrate, and is shaken from the periphery of the substrate. A chemical recovery cup having an opening for recovering the received chemical liquid above the opening of the rinse liquid recovery cup, an intermediate cup wall that can be raised and lowered to separate the two cups, and during chemical processing The intermediate cup wall is lowered to allow the chemical liquid shaken off from the peripheral edge of the substrate to reach the opening of the chemical liquid recovery cup, while at the time of rinsing liquid treatment, the intermediate cup wall is raised to move from the peripheral edge of the substrate. An intermediate cup wall lifting / lowering means for receiving the rinsed rinse liquid and guiding it to the opening of the rinse liquid recovery cup, and when the intermediate cup wall is raised during the rinse liquid treatment, the opening of the chemical liquid recovery cup The rinsing liquid is prevented from penetrating into the cup, and the upper end of the chemical liquid recovery cup is formed so as to protrude, and the intermediate cup wall is lifted to close the opening of the chemical liquid recovery cup. To do.

  According to a fifth aspect of the present invention, in a substrate processing apparatus for processing a substrate by sequentially supplying a chemical solution and a rinsing solution to the substrate, the substrate rotation holding means for holding and rotating the substrate, and the substrate rotation holding means A rinsing liquid supply means for supplying a rinsing liquid to the substrate, a chemical liquid supply means for supplying a chemical liquid to the substrate held by the substrate rotation holding means, and an outer peripheral side of the substrate rotation holding means holding the substrate. A rinse liquid recovery cup having an opening for recovering the rinse liquid that is disposed and shaken off from the periphery of the substrate, and disposed on the outer peripheral side of the substrate rotation holding means holding the substrate, and is shaken from the periphery of the substrate. A liquid recovery cup having an opening for recovering the received chemical liquid above the opening of the rinse liquid recovery cup, and a height lower than the upper end of the chemical liquid recovery cup are provided to be raised and lowered, An intermediate cup wall that separates the two cups, and the intermediate cup wall is lowered during chemical solution processing to widen the opening of the chemical recovery cup, and this opening is opposed to the peripheral edge of the substrate. An intermediate cup wall lifting / lowering means that opens the opening of the rinsing liquid recovery cup and opens the opening of the rinsing liquid recovery cup so as to face the peripheral edge of the substrate, and when the intermediate cup wall is raised during the rinsing liquid treatment, The opening of the recovery cup is closed.

  According to a sixth aspect of the present invention, in a substrate processing apparatus for processing a substrate by sequentially supplying a chemical solution and a rinsing solution to the substrate, the substrate rotation holding means for holding and rotating the substrate, and the substrate rotation holding means A rinsing liquid supply means for supplying a rinsing liquid to the substrate, a chemical liquid supply means for supplying a chemical liquid to the substrate held by the substrate rotation holding means, and an outer peripheral side of the substrate rotation holding means holding the substrate. A rinse liquid recovery cup having an opening for recovering the rinse liquid that is disposed and shaken off from the periphery of the substrate, and disposed on the outer peripheral side of the substrate rotation holding means holding the substrate, and is shaken from the periphery of the substrate. A liquid recovery cup having an opening for recovering the received chemical liquid above the opening of the rinse liquid recovery cup, and a height lower than the upper end of the chemical liquid recovery cup are provided to be raised and lowered, The intermediate cup wall that separates the cups and the intermediate cup wall are lowered during chemical solution processing to allow the chemical solution shaken off from the peripheral edge of the substrate to reach the opening of the chemical solution recovery cup, while during the rinse solution treatment An intermediate cup wall lifting / lowering means for raising the intermediate cup wall, receiving the rinse liquid shaken off from the substrate periphery and guiding it to the opening of the rinse liquid recovery cup, the intermediate cup wall being a rinse liquid treatment It is characterized by closing the opening of the chemical liquid recovery cup when it is sometimes raised.

According to a seventh aspect of the present invention, in a substrate processing apparatus for processing a substrate by sequentially supplying a chemical solution and a rinsing solution to the substrate, the substrate rotation holding means for holding and rotating the substrate, and the substrate rotation holding means A rinsing liquid supply means for supplying a rinsing liquid to the substrate, a chemical liquid supply means for supplying a chemical liquid to the substrate held by the substrate rotation holding means, and an outer peripheral side of the substrate rotation holding means holding the substrate. A rinse liquid recovery cup having an opening for recovering the rinse liquid that is disposed and shaken off from the periphery of the substrate, and disposed on the outer peripheral side of the substrate rotation holding means holding the substrate, and is shaken from the periphery of the substrate. A liquid recovery cup having an opening for recovering the received chemical liquid above the opening of the rinse liquid recovery cup, and a height lower than the upper end of the chemical liquid recovery cup are provided to be raised and lowered, An intermediate cup wall that separates the two cups, and when the chemical solution is processed, the intermediate cup wall is lowered to open a large opening of the chemical solution recovery cup, and this opening is opposed to the peripheral edge of the substrate. An intermediate cup wall lifting / lowering means that opens the opening of the rinsing liquid recovery cup and opens the opening of the rinsing liquid recovery cup so as to face the peripheral edge of the substrate, and when the intermediate cup wall is raised during the rinsing liquid treatment, This prevents the rinsing liquid from entering the opening of the recovery cup. The upper end of the chemical recovery cup is formed by overhanging, and the intermediate cup wall is lifted to close the opening of the recovery cup. characterized in that it.

According to an eighth aspect of the present invention, in a substrate processing apparatus for processing a substrate by sequentially supplying a chemical solution and a rinsing solution to the substrate, the substrate rotation holding means for holding and rotating the substrate, and the substrate rotation holding means A rinsing liquid supply means for supplying a rinsing liquid to the substrate, a chemical liquid supply means for supplying a chemical liquid to the substrate held by the substrate rotation holding means, and an outer peripheral side of the substrate rotation holding means holding the substrate. A rinse liquid recovery cup having an opening for recovering the rinse liquid that is disposed and shaken off from the periphery of the substrate, and disposed on the outer peripheral side of the substrate rotation holding means holding the substrate, and is shaken from the periphery of the substrate. A liquid recovery cup having an opening for recovering the received chemical liquid above the opening of the rinse liquid recovery cup, and a height lower than the upper end of the chemical liquid recovery cup are provided to be raised and lowered, The intermediate cup wall that separates the cups and the intermediate cup wall are lowered during chemical solution processing to allow the chemical solution shaken off from the peripheral edge of the substrate to reach the opening of the chemical solution recovery cup, while during the rinse solution treatment An intermediate cup wall lifting / lowering means for raising the intermediate cup wall, receiving the rinse liquid shaken off from the substrate periphery and guiding it to the opening of the rinse liquid recovery cup, the intermediate cup wall being a rinse liquid treatment When it is raised sometimes, it prevents the rinsing liquid from entering the opening of the chemical liquid recovery cup, and is formed by projecting the upper end of the chemical liquid recovery cup, and by raising the intermediate cup wall, The opening of the chemical solution recovery cup is closed .

  According to a ninth aspect of the present invention, in the substrate processing apparatus according to any one of the first to eighth aspects, when the intermediate cup wall is lowered during the chemical liquid processing, the opening of the rinse liquid recovery cup is opened. It is characterized by occlusion.

According to a tenth aspect of the present invention, in the substrate processing apparatus according to any one of the first , second, fifth, sixth, and ninth aspects, an upper end portion of the chemical solution recovery cup is projected. The opening of the chemical solution recovery cup is closed by forming and raising the intermediate cup wall.

[Action]
The operation of the first aspect of the invention is as follows.
At the time of the chemical solution processing, the intermediate cup wall elevating means lowers the intermediate cup wall so as to widen the opening of the chemical solution recovery cup, and this opening is opposed to the substrate periphery. In this state, the substrate rotation holding unit rotates the substrate, and the chemical solution supply unit supplies the chemical solution to the substrate. The chemical liquid shaken off from the peripheral edge of the substrate enters the opening of the chemical liquid recovery cup that faces the peripheral edge of the substrate and is recovered. When the chemical solution treatment is completed, the rinsing solution treatment is started. At the time of the rinsing liquid treatment, the intermediate cup wall lifting / lowering means raises the intermediate cup wall so as to widen the opening of the rinsing liquid recovery cup, and this opening is opposed to the peripheral edge of the substrate. In this state, the substrate rotation holding unit rotates the substrate, and the rinse liquid supply unit supplies the rinse liquid to the substrate. The rinse liquid shaken off from the peripheral edge of the substrate enters the opening of the rinse liquid recovery cup facing the peripheral edge of the substrate and is recovered. During the rinsing liquid treatment, the opening of the chemical recovery cup narrowed by the rise of the intermediate cup is positioned above the edge of the substrate, so that the rinsing liquid shaken off from the peripheral edge of the substrate moves to the opening of the chemical recovery cup. There is no invasion. Therefore, the concentration of the chemical solution does not fluctuate due to the mixing of the rinse solution.
In addition, when the intermediate cup wall rises during the rinsing liquid treatment, the intermediate cup wall closes the opening of the chemical recovery cup, so that the substrate is contaminated by the chemical atmosphere leaking from the chemical recovery cup opening. There is no.

The operation of the invention described in claim 2 is as follows.
At the time of chemical treatment, the intermediate cup wall lifting means lowers the intermediate cup wall. In this state, the substrate rotation holding unit rotates the substrate, and the chemical solution supply unit supplies the chemical solution to the substrate. The chemical liquid shaken off from the periphery of the substrate jumps over the opening of the rinse liquid recovery cup on the inner side and the intermediate cup wall at the lowered position, and enters the opening of the chemical liquid recovery cup on the outer side. When the chemical solution treatment is completed, the rinsing solution treatment is started. During the rinsing liquid treatment, the intermediate cup wall lifting / lowering means raises the intermediate cup wall. In this state, the substrate rotation holding unit rotates the substrate, and the rinse liquid supply unit supplies the rinse liquid to the substrate. The rinse liquid shaken off from the peripheral edge of the substrate is guided to the intermediate cup wall at the ascending position and is collected by entering the opening of the rinse liquid recovery cup. During the rinsing liquid treatment, the rinsing liquid is prevented from entering the chemical liquid recovery cup because the intermediate liquid is lifted to prevent the rinsing liquid shaken off from the periphery of the substrate from reaching the opening of the chemical liquid recovery cup. . Therefore, the concentration of the chemical solution does not fluctuate due to the mixing of the rinse solution.
In addition, when the intermediate cup wall rises during the rinsing liquid treatment, the intermediate cup wall closes the opening of the chemical recovery cup, so that the substrate is contaminated by the chemical atmosphere leaking from the chemical recovery cup opening. There is no.

The operation of the invention according to claim 3 is as follows.
At the time of the chemical solution processing, the intermediate cup wall elevating means lowers the intermediate cup wall so as to widen the opening of the chemical solution recovery cup, and this opening is opposed to the substrate periphery. In this state, the substrate rotation holding unit rotates the substrate, and the chemical solution supply unit supplies the chemical solution to the substrate. The chemical liquid shaken off from the peripheral edge of the substrate enters the opening of the chemical liquid recovery cup that faces the peripheral edge of the substrate and is recovered. When the chemical solution treatment is completed, the rinsing solution treatment is started. At the time of the rinsing liquid treatment, the intermediate cup wall lifting / lowering means raises the intermediate cup wall so as to widen the opening of the rinsing liquid recovery cup, and this opening is opposed to the peripheral edge of the substrate. In this state, the substrate rotation holding unit rotates the substrate, and the rinse liquid supply unit supplies the rinse liquid to the substrate. The rinse liquid shaken off from the peripheral edge of the substrate enters the opening of the rinse liquid recovery cup facing the peripheral edge of the substrate and is recovered. During the rinsing liquid treatment, the opening of the chemical recovery cup narrowed by the rise of the intermediate cup is positioned above the edge of the substrate, so that the rinsing liquid shaken off from the peripheral edge of the substrate moves to the opening of the chemical recovery cup. There is no invasion. Therefore, the concentration of the chemical solution does not fluctuate due to the mixing of the rinse solution.
Further, when the intermediate cup wall rises during the rinsing liquid treatment, the intermediate cup wall prevents the rinsing liquid from entering the opening of the chemical liquid recovery cup.
Furthermore, the upper end portion of the chemical solution recovery cup is formed so as to protrude and the intermediate cup wall is raised to close the opening of the chemical solution recovery cup.

The operation of the invention described in claim 4 is as follows.
At the time of chemical treatment, the intermediate cup wall lifting means lowers the intermediate cup wall. In this state, the substrate rotation holding unit rotates the substrate, and the chemical solution supply unit supplies the chemical solution to the substrate. The chemical liquid shaken off from the periphery of the substrate jumps over the opening of the rinse liquid recovery cup on the inner side and the intermediate cup wall at the lowered position, and enters the opening of the chemical liquid recovery cup on the outer side. When the chemical solution treatment is completed, the rinsing solution treatment is started. During the rinsing liquid treatment, the intermediate cup wall lifting / lowering means raises the intermediate cup wall. In this state, the substrate rotation holding unit rotates the substrate, and the rinse liquid supply unit supplies the rinse liquid to the substrate. The rinse liquid shaken off from the peripheral edge of the substrate is guided to the intermediate cup wall at the ascending position and is collected by entering the opening of the rinse liquid recovery cup. During the rinsing liquid treatment, the rinsing liquid is prevented from entering the chemical liquid recovery cup because the intermediate liquid is lifted to prevent the rinsing liquid shaken off from the periphery of the substrate from reaching the opening of the chemical liquid recovery cup. . Therefore, the concentration of the chemical solution does not fluctuate due to the mixing of the rinse solution.
Further, when the intermediate cup wall rises during the rinsing liquid treatment, the intermediate cup wall prevents the rinsing liquid from entering the opening of the chemical liquid recovery cup.
Furthermore, the upper end portion of the chemical solution recovery cup is formed so as to protrude and the intermediate cup wall is raised to close the opening of the chemical solution recovery cup.

The operation of the fifth aspect of the invention is as follows.
At the time of the chemical solution processing, the intermediate cup wall elevating means lowers the intermediate cup wall so as to widen the opening of the chemical solution recovery cup, and this opening is opposed to the substrate periphery. In this state, the substrate rotation holding unit rotates the substrate, and the chemical solution supply unit supplies the chemical solution to the substrate. The chemical liquid shaken off from the peripheral edge of the substrate enters the opening of the chemical liquid recovery cup that faces the peripheral edge of the substrate and is recovered. When the chemical solution treatment is completed, the rinsing solution treatment is started. At the time of the rinsing liquid treatment, the intermediate cup wall lifting / lowering means raises the intermediate cup wall so as to widen the opening of the rinsing liquid recovery cup, and this opening is opposed to the peripheral edge of the substrate. In this state, the substrate rotation holding unit rotates the substrate, and the rinse liquid supply unit supplies the rinse liquid to the substrate. The rinse liquid shaken off from the peripheral edge of the substrate enters the opening of the rinse liquid recovery cup facing the peripheral edge of the substrate and is recovered. During the rinsing liquid treatment, the opening of the chemical recovery cup narrowed by the rise of the intermediate cup is positioned above the edge of the substrate, so that the rinsing liquid shaken off from the peripheral edge of the substrate moves to the opening of the chemical recovery cup. There is no invasion. Therefore, the concentration of the chemical solution does not fluctuate due to the mixing of the rinse solution.
In addition, when the intermediate cup wall rises during the rinsing liquid treatment, the intermediate cup wall closes the opening of the chemical recovery cup, so that the substrate is contaminated by the chemical atmosphere leaking from the chemical recovery cup opening. There is no.
Furthermore, the intermediate cup is provided so as to be movable up and down at a height equal to or lower than the upper end of the chemical solution recovery cup.

The operation of the sixth aspect of the invention is as follows.
At the time of chemical treatment, the intermediate cup wall lifting means lowers the intermediate cup wall. In this state, the substrate rotation holding unit rotates the substrate, and the chemical solution supply unit supplies the chemical solution to the substrate. The chemical liquid shaken off from the periphery of the substrate jumps over the opening of the rinse liquid recovery cup on the inner side and the intermediate cup wall at the lowered position, and enters the opening of the chemical liquid recovery cup on the outer side. When the chemical solution treatment is completed, the rinsing solution treatment is started. During the rinsing liquid treatment, the intermediate cup wall lifting / lowering means raises the intermediate cup wall. In this state, the substrate rotation holding unit rotates the substrate, and the rinse liquid supply unit supplies the rinse liquid to the substrate. The rinse liquid shaken off from the peripheral edge of the substrate is guided to the intermediate cup wall at the ascending position and is collected by entering the opening of the rinse liquid recovery cup. During the rinsing liquid treatment, the rinsing liquid is prevented from entering the chemical liquid recovery cup because the intermediate liquid is lifted to prevent the rinsing liquid shaken off from the periphery of the substrate from reaching the opening of the chemical liquid recovery cup. . Therefore, the concentration of the chemical solution does not fluctuate due to the mixing of the rinse solution.
In addition, when the intermediate cup wall rises during the rinsing liquid treatment, the intermediate cup wall closes the opening of the chemical recovery cup, so that the substrate is contaminated by the chemical atmosphere leaking from the chemical recovery cup opening. There is no.
Furthermore, the intermediate cup is provided so as to be movable up and down at a height equal to or lower than the upper end of the chemical solution recovery cup.

The operation of the seventh aspect of the invention is as follows.
At the time of the chemical solution processing, the intermediate cup wall elevating means lowers the intermediate cup wall so as to widen the opening of the chemical solution recovery cup, and this opening is opposed to the substrate periphery. In this state, the substrate rotation holding unit rotates the substrate, and the chemical solution supply unit supplies the chemical solution to the substrate. The chemical liquid shaken off from the peripheral edge of the substrate enters the opening of the chemical liquid recovery cup that faces the peripheral edge of the substrate and is recovered. When the chemical solution treatment is completed, the rinsing solution treatment is started. At the time of the rinsing liquid treatment, the intermediate cup wall lifting / lowering means raises the intermediate cup wall so as to widen the opening of the rinsing liquid recovery cup, and this opening is opposed to the peripheral edge of the substrate. In this state, the substrate rotation holding unit rotates the substrate, and the rinse liquid supply unit supplies the rinse liquid to the substrate. The rinse liquid shaken off from the peripheral edge of the substrate enters the opening of the rinse liquid recovery cup facing the peripheral edge of the substrate and is recovered. During the rinsing liquid treatment, the opening of the chemical recovery cup narrowed by the rise of the intermediate cup is positioned above the edge of the substrate, so that the rinsing liquid shaken off from the peripheral edge of the substrate moves to the opening of the chemical recovery cup. There is no invasion. Therefore, the concentration of the chemical solution does not fluctuate due to the mixing of the rinse solution.
Further, when the intermediate cup wall rises during the rinsing liquid treatment, the intermediate cup wall prevents the rinsing liquid from entering the opening of the chemical liquid recovery cup.
Furthermore, the upper end portion of the chemical solution recovery cup is formed so as to protrude and the intermediate cup wall is raised to close the opening of the chemical solution recovery cup.
Furthermore, the intermediate cup is provided so as to be movable up and down at a height equal to or lower than the upper end of the chemical solution recovery cup.

The operation of the eighth aspect of the invention is as follows.
At the time of chemical treatment, the intermediate cup wall lifting means lowers the intermediate cup wall. In this state, the substrate rotation holding unit rotates the substrate, and the chemical solution supply unit supplies the chemical solution to the substrate. The chemical liquid shaken off from the periphery of the substrate jumps over the opening of the rinse liquid recovery cup on the inner side and the intermediate cup wall at the lowered position, and enters the opening of the chemical liquid recovery cup on the outer side. When the chemical solution treatment is completed, the rinsing solution treatment is started. During the rinsing liquid treatment, the intermediate cup wall lifting / lowering means raises the intermediate cup wall. In this state, the substrate rotation holding unit rotates the substrate, and the rinse liquid supply unit supplies the rinse liquid to the substrate. The rinse liquid shaken off from the peripheral edge of the substrate is guided to the intermediate cup wall at the ascending position and is collected by entering the opening of the rinse liquid recovery cup. During the rinsing liquid treatment, the rinsing liquid is prevented from entering the chemical liquid recovery cup because the intermediate liquid is lifted to prevent the rinsing liquid shaken off from the periphery of the substrate from reaching the opening of the chemical liquid recovery cup. . Therefore, the concentration of the chemical solution does not fluctuate due to the mixing of the rinse solution.
Further, when the intermediate cup wall rises during the rinsing liquid treatment, the intermediate cup wall prevents the rinsing liquid from entering the opening of the chemical liquid recovery cup.
Furthermore, the upper end portion of the chemical solution recovery cup is formed so as to protrude and the intermediate cup wall is raised to close the opening of the chemical solution recovery cup.
Furthermore, the intermediate cup is provided so as to be movable up and down at a height equal to or lower than the upper end of the chemical solution recovery cup.

  According to the ninth aspect of the present invention, the intermediate cup wall closes the opening of the rinsing liquid recovery cup when lowered during the chemical liquid processing, and therefore enters the rinsing liquid recovery cup during the chemical liquid processing. Since the amount of the chemical solution is reduced, the chemical solution can be saved by that amount.

  According to invention of Claim 10, the upper end part of the said chemical | medical solution collection | recovery cup is projected and formed, and the opening of the chemical | medical solution collection | recovery cup is obstruct | occluded by raising an intermediate | middle cup wall.

The present invention has the following effects.
According to the first aspect of the present invention, the intermediate cup wall is lowered during the chemical treatment to open the upper chemical recovery cup opening widely, while the intermediate cup wall is raised during the rinse treatment to lower the rinse solution. Since the opening of the recovery cup is greatly opened and each opening is opposed to the periphery of the substrate, the rinse liquid does not enter the chemical recovery cup, and the concentration fluctuation of the chemical can be prevented.
In addition, since the opening of the chemical recovery cup is closed by the intermediate cup wall during the rinsing liquid treatment, the substrate is not contaminated by the chemical atmosphere leaking from the opening of the chemical recovery cup.

According to the second aspect of the present invention, the intermediate cup wall is lowered during the chemical treatment to allow the chemical liquid shaken off from the peripheral edge of the substrate to reach the opening of the outer chemical recovery cup, while the intermediate cup wall is removed during the rinse treatment. The rinse liquid that has been lifted and shaken off from the periphery of the substrate is guided to the opening of the inner rinse liquid recovery cup, so that the rinse liquid does not enter the chemical recovery cup and prevents fluctuations in the chemical concentration. Can do.
In addition, since the opening of the chemical recovery cup is closed by the intermediate cup wall during the rinsing liquid treatment, the substrate is not contaminated by the chemical atmosphere leaking from the opening of the chemical recovery cup.

According to the third aspect of the present invention, the intermediate cup wall is lowered during the chemical liquid treatment to widen the opening of the upper chemical liquid recovery cup, while the intermediate cup wall is raised during the rinse liquid treatment to lower the lower rinse liquid. Since the opening of the recovery cup is greatly opened and each opening is opposed to the periphery of the substrate, the rinse liquid does not enter the chemical recovery cup, and the concentration fluctuation of the chemical can be prevented.
Further, the rinse liquid does not enter the opening of the chemical liquid recovery cup by the intermediate cup wall during the rinse liquid treatment.
Furthermore, the upper end portion of the chemical solution recovery cup is formed so as to protrude and the intermediate cup wall is raised to close the opening of the chemical solution recovery cup.

According to the fourth aspect of the present invention, the chemical cup shaken off from the periphery of the substrate is made to reach the opening of the outer chemical solution collecting cup while the intermediate cup wall is lowered at the time of the rinsing liquid treatment. The rinse liquid that has been lifted and shaken off from the periphery of the substrate is guided to the opening of the inner rinse liquid recovery cup, so that the rinse liquid does not enter the chemical recovery cup and prevents fluctuations in the chemical concentration. Can do.
Further, the rinse liquid does not enter the opening of the chemical liquid recovery cup by the intermediate cup wall during the rinse liquid treatment.
Furthermore, the upper end portion of the chemical solution recovery cup is formed so as to protrude and the intermediate cup wall is raised to close the opening of the chemical solution recovery cup.

  According to the ninth aspect of the present invention, the intermediate cup wall closes the opening of the rinsing liquid recovery cup when lowered during the chemical liquid processing, and therefore enters the rinsing liquid recovery cup during the chemical liquid processing. Since the amount of the chemical solution is reduced, the chemical solution can be saved by that amount.

  According to invention of Claim 10, the upper end part of the said chemical | medical solution collection | recovery cup is projected and formed, and the opening of the chemical | medical solution collection | recovery cup is obstruct | occluded by raising an intermediate | middle cup wall.

  Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 is a longitudinal sectional view showing a schematic configuration of a first embodiment of a substrate processing apparatus according to the present invention.
Similar to the conventional apparatus shown in FIG. 7, the substrate processing apparatus of this embodiment includes a spin chuck 11 that holds and holds a substrate W such as a semiconductor wafer in a horizontal posture, and a motor 12 that rotationally drives the spin chuck 11. ing. The spin chuck 11 and the motor 12 correspond to the substrate rotation holding means in the present invention. The substrate rotation holding means is not limited to the one that holds the substrate W by suction, but may be one that holds and holds the edge of the substrate W with a plurality of support pins erected on the turntable.

  The motor 12 is driven up and down by an air cylinder 13, and the spin chuck 11 is set at the raised position and the lowered position. The air cylinder 13 corresponds to the lifting means in the present invention. Above the spin chuck 11, a nozzle 14 for selectively supplying a chemical solution or a rinse solution such as pure water to the substrate W by switching the three-way valve VL is provided. The nozzle 14 corresponds to the chemical liquid supply means and the rinse liquid supply means in the present invention. Of course, the chemical liquid supply means and the rinse liquid supply means may be configured by individual nozzles.

  Around the spin chuck 1, a chemical solution recovery cup 15 and a rinse solution recovery cup 16 for separating and recovering the chemical solution and the rinsing solution shaken off from the periphery of the substrate W are provided.

  As a characteristic configuration of the present embodiment, the chemical solution recovery cup 15 is provided outside the periphery of the rotation axis of the substrate W, and an opening 15a for recovering the chemical solution shaken off from the periphery of the substrate W is formed by rotating the substrate W. It is set on the upper side along the axis. Further, the rinsing liquid recovery cup 16 is provided on the inner side around the rotation axis of the substrate W, and an opening 16a for recovering the rinsing liquid shaken off from the peripheral edge of the substrate W is located below the rotation axis of the substrate W. Is set to the side. The peripheral edge of the substrate W in the raised position faces the opening 15a of the chemical liquid recovery cup 15, and the peripheral edge of the substrate W in the lowered position faces the opening 16a of the rinse liquid recovery cup 16, respectively. The up / down stroke is set.

  The substrate processing apparatus of this embodiment is configured to circulate and use the chemical solution collected in the chemical solution recovery cup 15. Specifically, the chemical waste liquid led out from the waste liquid port 15 b of the chemical liquid recovery cup 15 is collected in the chemical liquid tank 18 through the pipe line 17. The chemical solution in the chemical solution tank 18 is sent to the pipe line 20 by the pump 19 and returned to the nozzle 14 through the particle removal filter 21 provided in the middle of the pipe line 20. The pipe lines 17 and 20, the chemical liquid tank 18, the pump 19 and the like correspond to the chemical liquid circulation means in the present invention.

Next, the operation when performing the chemical treatment, the rinse treatment, and the drying treatment in this order using the embodiment apparatus having the above-described configuration will be described.
The substrate W to be processed is mounted on the spin chuck 11 by an unillustrated substrate transport robot or the like and is sucked and held. During the chemical treatment, the air cylinder 13 extends to lift the substrate W to the raised position (the position of the substrate W indicated by a chain line in FIG. 1). In this state, while the substrate W is rotated, the chemical solution is supplied from the nozzle 14 onto the substrate W to perform the chemical treatment. The chemical liquid shaken off from the peripheral edge of the substrate with the rotation of the substrate W is collected in the chemical liquid recovery cup 15 from the opening 15a facing the peripheral edge of the substrate. The collected chemical liquid is collected in the chemical liquid tank 18 via the pipe line 17, and then sent to the pipe line 20 by the pump 19 and returned to the nozzle 14 again.

  When the chemical treatment for a predetermined time is finished, the rinsing solution treatment is started. In the rinsing liquid treatment, the air cylinder 13 contracts to lower the substrate W to the lowered position (the position of the substrate W indicated by a solid line in FIG. 1). In this state, the three-way valve VL is switched while rotating the substrate W, and the rinse liquid is supplied onto the substrate W from the nozzle 14. The rinse liquid shaken off from the periphery of the substrate with the rotation of the substrate W is recovered in the rinse liquid recovery cup 16 from the opening 16a facing the periphery of the substrate. The recovered rinse liquid is discharged from the waste liquid port 16 b of the rinse liquid recovery cup 16.

  At the time of the rinsing liquid treatment, the opening 15a of the chemical liquid recovery cup 15 is at a higher position above the substrate W, so that the rinsing liquid shaken off from the periphery of the substrate does not enter the chemical liquid recovery cup 15. Therefore, since the rinse liquid is not mixed into the circulating chemical solution, the concentration fluctuation of the chemical solution can be suppressed.

  When the rinsing liquid treatment for a predetermined time is completed, the supply of the rinsing liquid is stopped, and the substrate in the lowered position is rotated at a high speed in that state, whereby the excess rinsing liquid is shaken off from the substrate W to dry the substrate W. The dried substrate W is carried out of the apparatus by the substrate transfer robot. Thus, a series of substrate processing is completed, and then processing of a new substrate is repeated in the same manner.

  FIG. 2 is a longitudinal sectional view showing a schematic configuration of a second embodiment of the substrate processing apparatus according to the present invention. 2 are the same as those in the first embodiment, and the description thereof is omitted here.

  In the first embodiment, the substrate W is moved up and down so that the peripheral edge of the substrate faces the openings 15a and 16a of the cups 15 and 16, but in the second embodiment, the chemical recovery cup 15 is not changed without changing the position of the substrate W. The rinse liquid recovery cup 16 is lifted and lowered integrally. Specifically, the integrally formed chemical liquid recovery cup 15 and rinse liquid recovery cup 16 are attached to a ring-shaped base member 23 via a support arm 22, and the base member 23 is moved up and down by a plurality of air cylinders 24. It is designed to drive. These air cylinders 24 correspond to the lifting means in the present invention. In addition, the waste liquid ports 15b and 16b of the cups 15 and 16 are loosely inserted into the large-diameter connecting pipe 25 so that the cups 15 and 16 move up and down.

  According to the apparatus of this embodiment, when the chemical solution is processed, the air cylinder 24 contracts and the chemical solution recovery cup 15 and the rinse solution recovery cup 16 are integrally lowered, so that the opening 15a of the chemical solution recovery cup 15 spins. Opposite the periphery of the substrate W on the chuck 11. In this state, the chemical solution is processed in the same manner as in the first embodiment, whereby the chemical solution shaken off from the substrate W is collected in the chemical solution recovery cup 15 and collected in the chemical solution tank 18. At the time of the rinsing liquid treatment, as shown in FIG. 3, as the air cylinder 24 extends, the chemical liquid recovery cup 15 and the rinsing liquid recovery cup 16 rise together to open the rinsing liquid recovery cup 16. 16 a faces the peripheral edge of the substrate W. In this state, similarly to the first embodiment, the rinsing liquid treatment and the drying treatment are sequentially performed, and the rinsing liquid shaken off from the peripheral edge of the substrate is recovered in the rinsing liquid recovery cup 16.

  Also in this embodiment, as in the first embodiment, the opening 15a of the chemical solution recovery cup 15 is located higher than the substrate W during the rinsing liquid treatment shown in FIG. The rinse liquid does not enter the chemical liquid recovery cup 15.

  FIG. 4 is a longitudinal sectional view showing a schematic configuration of a third embodiment of the substrate processing apparatus according to the present invention. In FIG. 4, the components indicated by the same reference numerals as those in FIGS. 1 to 3 are the same as those in the first and second embodiments, and the description thereof is omitted here.

  Similar to the first and second embodiments, the apparatus according to the present embodiment is provided outside the periphery of the rotation axis of the substrate W, and an opening 15a for taking in the chemical liquid shaken off from the periphery of the substrate is provided at the rotation axis of the substrate W. An opening 16a that is provided on the inner side around the rotation axis of the substrate W and that takes in the rinse liquid that has been shaken off from the peripheral edge of the substrate W is provided on the lower side along the rotation axis of the substrate W. A rinse liquid recovery cup 16 is provided. As a feature of the present embodiment, an intermediate cup wall 30 that separates both the cups 15 and 16 is configured to be movable up and down.

  Specifically, the intermediate cup wall 30 is a cylindrical body that is narrowed so that the upper end portion is inclined inward, and the base end portion is formed with double ring-shaped skirt portions 30a and 30b. ing. The skirt portions 30a and 30b are loosely fitted on the outer sides of the ring-shaped guide walls 31a and 31b that are double-formed on the bottom surfaces of the cups 15 and 16. A plurality of rods 32a of the air cylinders 32 are connected to the inside middle of the skirts 30a and 30b of the intermediate cup wall 30. The periphery of the rod 32a of each air cylinder 32 is shielded by a bellows 33 so that the atmosphere in the cups 15 and 16 does not leak out of the apparatus, or particles do not enter the cups 15 and 16 from the outside of the apparatus. Yes. The intermediate cup wall 30 moves up and down as these air cylinders 32 expand and contract. The air cylinder 32 corresponds to the intermediate cup wall lifting / lowering means in the present invention.

  The apparatus according to the present embodiment includes two nozzles 14a and 14b that individually supply a chemical solution and a rinse solution. In addition, an air cylinder 34 is provided below the motor 12 for raising the spin chuck 11 to the substrate loading position when the substrate W is loaded into the apparatus. Further, an exhaust port 35 (not shown in FIGS. 1 to 3) for exhausting the inside of the cups 15 and 16 is provided inside the rinse liquid recovery cup 16.

Next, the operation of the third embodiment apparatus having the above-described configuration will be described.
First, in order to carry the substrate W into the apparatus, the air cylinder 34 is extended and the spin chuck 11 is raised. When the substrate W is mounted on the spin chuck 11, the air cylinder 34 contracts to lower the substrate W to the processing position (the position of the substrate W indicated by a solid line in FIG. 4).

  During chemical treatment, the air cylinder 32 contracts and the intermediate cup wall 30 is in the lowered position. As a result, the opening 15a of the chemical solution recovery cup 15 is wide open and faces the periphery of the substrate W. In this state, the chemical liquid treatment is performed by supplying the chemical liquid from the nozzle 14 a onto the substrate W while rotating the substrate W. The chemical liquid shaken off from the periphery of the substrate with the rotation of the substrate W is collected in the chemical liquid recovery cup 15 through the opening 15a. The collected chemical is circulated and returned to the nozzle 14a in the same manner as in the first and second embodiments.

  When the chemical solution treatment is finished, the supply of the chemical solution is stopped and the rinsing solution treatment is started. In the rinsing liquid treatment, the air cylinder 32 extends and the intermediate cup wall 30 rises. As shown in FIG. 5, the intermediate cup wall 30 is raised and the upper end of the intermediate cup wall 30 comes into contact with the upper inner wall of the chemical liquid recovery cup 15, thereby closing the opening 15 a of the chemical liquid recovery cup 15 and recovering the rinse liquid. The opening 16a of the working cup 16 is wide open and faces the periphery of the substrate W. In this state, the rinsing liquid treatment is performed by supplying the rinsing liquid from the nozzle 14b onto the substrate W while rotating the substrate W. The rinse liquid shaken off from the periphery of the substrate with the rotation of the substrate W is collected in the rinse liquid collection cup 16 through the opening 16a. When the rinsing liquid treatment is finished, the supply of the rinsing liquid is stopped, and the substrate W is rotated at a high speed while the opening 16a is largely opened, and the substrate W is dried.

  During the rinsing liquid process and the drying process, the opening 15a of the chemical recovery cup 15 is closed by the raised intermediate cup wall 30, and the butt portion between the upper end of the intermediate cup wall 30 and the upper inner wall of the chemical recovery cup 15 is Since it is at a position higher than the substrate W, the rinse liquid shaken off from the periphery of the substrate does not enter the chemical recovery cup 15 through the gap between the chemical recovery cup 15 and the intermediate cup wall 30. Further, since the opening 15a of the chemical solution recovery cup 15 is closed, the chemical solution atmosphere leaking out from the chemical solution recovery cup 15 does not contaminate the substrate W that has been subjected to the rinsing liquid treatment or the drying treatment.

  If the opening 16a of the rinsing liquid recovery cup 16 is closed by the intermediate cup wall 30 when the intermediate cup wall 30 is descending, the rinsing liquid recovery cup 16 enters the chemical liquid processing. Since the amount of the chemical solution is reduced, the chemical solution can be saved by that amount.

  FIG. 6 is a longitudinal sectional view showing a schematic configuration of a fourth embodiment of the substrate processing apparatus according to the present invention. In FIG. 6, the components indicated by the same reference numerals as those in FIGS. 1 to 5 are the same as those in the first to third embodiments, and the description thereof is omitted here.

  Similarly to the first to third embodiments, the apparatus of the present embodiment is also provided with the chemical recovery cup 15 provided on the outer periphery of the rotation axis of the substrate W and the inner periphery of the rotation axis of the substrate W. And a rinse liquid recovery cup 16. In the apparatus of the present embodiment, the rinsing liquid recovery that takes in the rinsing liquid that has been shaken off from the peripheral edge of the substrate W to the outside around the rotation axis of the substrate W by the opening 15a of the chemical recovery cup 15 that takes in the chemical liquid that has been shaken off from the peripheral edge of the substrate. The openings 16 a of the working cups 16 are respectively arranged inside the periphery of the rotation axis of the substrate W. An intermediate cup wall 30 that separates the openings 15a and 16a disposed concentrically with the rotation axis of the substrate W is provided so as to be movable up and down.

  According to the present embodiment apparatus, when the intermediate cup wall 30 is lowered during the chemical liquid processing, the chemical liquid shaken off from the peripheral edge of the substrate moves through the opening 16a of the rinse liquid recovery cup 16 and the intermediate cup wall 30 by the momentum. It jumps over and enters the opening 15a of the chemical solution recovery cup 15 to be recovered. On the other hand, during the rinsing liquid treatment and the drying process, the intermediate cup wall 30 is lifted, so that the rinsing liquid shaken off from the peripheral edge of the substrate is completely received by the intermediate cup wall 30 and collected in the rinsing liquid collection cup 16. . Also according to the present embodiment apparatus, the rinse liquid shaken off from the peripheral edge of the substrate does not enter the chemical liquid recovery cup 15, so that it is possible to prevent fluctuations in the concentration of the chemical liquid to be circulated.

  Also in the present embodiment apparatus, if the upper end portion of the chemical solution recovery cup 15 is formed so as to protrude inward, the intermediate cup wall 30 is raised during the rinsing solution treatment or the drying treatment, so that the chemical solution recovery cup 15 The opening 15a can be closed.

The present invention is not limited to the above-described embodiments, and can be modified as follows.
In each of the above-described embodiments, the substrate processing apparatus including two cups of the chemical solution recovery cup 15 and the rinse solution recovery cup 16 is taken as an example. However, each chemical solution is separated and circulated using a plurality of types of chemical solutions. When used, three or more cups may be arranged concentrically around the rotation axis of the substrate. In such a case, the rinse liquid recovery cup may be disposed on the inner side closest to the rotation axis of the substrate, and a plurality of cups corresponding to the respective chemical solutions may be disposed concentrically on the outer side.

1 is a longitudinal sectional view showing a schematic configuration of a first embodiment of a substrate processing apparatus according to the present invention. It is a longitudinal cross-sectional view which shows schematic structure of a 2nd Example apparatus. It is a longitudinal cross-sectional view which shows the state of the rinse liquid process of 2nd Example apparatus. It is a longitudinal cross-sectional view which shows schematic structure of a 3rd Example apparatus. It is a longitudinal cross-sectional view which shows the state of the rinse liquid process of a 3rd Example apparatus. It is a longitudinal cross-sectional view which shows schematic structure of a 4th Example apparatus. It is a longitudinal cross-sectional view which shows schematic structure of a conventional apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 11 ... Spin chuck 12 ... Motor 13 ... Air cylinder 14 ... Nozzle 15 ... Chemical solution collection cup 15a ... Opening 16 ... Rinse solution collection cup 16a ... Opening 18 ... Chemical solution tank 24 ... Air cylinder 30 ... Intermediate cup wall 3
32 ... Air cylinder

Claims (10)

In a substrate processing apparatus for processing a substrate by sequentially supplying a chemical solution and a rinse solution to the substrate,
Substrate rotation holding means for holding and rotating the substrate;
Rinsing liquid supply means for supplying a rinsing liquid to the substrate held by the substrate rotation holding means;
Chemical supply means for supplying a chemical to the substrate held by the substrate rotation holding means;
A rinse liquid recovery cup disposed on the outer peripheral side of the substrate rotation holding means holding the substrate and having an opening for recovering the rinse liquid shaken off from the periphery of the substrate;
A chemical recovery cup disposed on the outer peripheral side of the substrate rotation holding means holding the substrate and having an opening for recovering the chemical liquid shaken off from the peripheral edge of the substrate above the opening of the rinse liquid recovery cup; ,
An intermediate cup wall that can be raised and lowered to separate the two cups;
During the chemical treatment, the intermediate cup wall is lowered to widen the opening of the chemical solution collection cup, and this opening is opposed to the peripheral edge of the substrate. On the other hand, during the rinse treatment, the intermediate cup wall is raised to raise the rinse solution collection cup. And an intermediate cup wall elevating means that makes the opening oppose to the peripheral edge of the substrate, and the intermediate cup wall closes the opening of the chemical liquid recovery cup when raised during the rinse liquid treatment. There is provided a substrate processing apparatus. In a substrate processing apparatus for processing a substrate by sequentially supplying a chemical solution and a rinse solution to the substrate,
Substrate rotation holding means for holding and rotating the substrate;
Rinsing liquid supply means for supplying a rinsing liquid to the substrate held by the substrate rotation holding means;
Chemical supply means for supplying a chemical to the substrate held by the substrate rotation holding means;
A rinse liquid recovery cup disposed on the outer peripheral side of the substrate rotation holding means holding the substrate and having an opening for recovering the rinse liquid shaken off from the periphery of the substrate;
A chemical recovery cup disposed on the outer peripheral side of the substrate rotation holding means holding the substrate and having an opening for recovering the chemical liquid shaken off from the peripheral edge of the substrate above the opening of the rinse liquid recovery cup; ,
An intermediate cup wall that can be raised and lowered to separate the two cups;
The intermediate cup wall is lowered during the chemical treatment, and the chemical liquid shaken off from the periphery of the substrate is allowed to reach the opening of the chemical recovery cup, while the intermediate cup wall is raised during the rinse treatment, An intermediate cup wall lifting / lowering means for receiving the rinse liquid shaken off from the periphery of the substrate and guiding the rinse liquid to the opening of the rinse liquid recovery cup, and the intermediate cup wall is used for collecting the chemical liquid when raised during the rinse liquid treatment. A substrate processing apparatus for closing an opening of a cup. In a substrate processing apparatus for processing a substrate by sequentially supplying a chemical solution and a rinse solution to the substrate,
Substrate rotation holding means for holding and rotating the substrate;
Rinsing liquid supply means for supplying a rinsing liquid to the substrate held by the substrate rotation holding means;
Chemical supply means for supplying a chemical to the substrate held by the substrate rotation holding means;
A rinse liquid recovery cup disposed on the outer peripheral side of the substrate rotation holding means holding the substrate and having an opening for recovering the rinse liquid shaken off from the periphery of the substrate;
A chemical recovery cup disposed on the outer peripheral side of the substrate rotation holding means holding the substrate and having an opening for recovering the chemical liquid shaken off from the peripheral edge of the substrate above the opening of the rinse liquid recovery cup; ,
An intermediate cup wall that can be raised and lowered to separate the two cups;
During the chemical treatment, the intermediate cup wall is lowered to widen the opening of the chemical solution collection cup, and this opening is opposed to the peripheral edge of the substrate. On the other hand, during the rinse treatment, the intermediate cup wall is raised to raise the rinse solution collection cup. And an intermediate cup wall lifting / lowering means for making the opening face the substrate periphery, and when the intermediate cup wall is raised during the rinsing liquid treatment, the rinsing liquid enters the chemical liquid recovery cup opening. it is intended to prevent that,
A substrate processing apparatus characterized in that an upper end portion of the chemical liquid recovery cup is formed so as to project and an intermediate cup wall is raised to close an opening of the chemical liquid recovery cup . In a substrate processing apparatus for processing a substrate by sequentially supplying a chemical solution and a rinse solution to the substrate,
Substrate rotation holding means for holding and rotating the substrate;
Rinsing liquid supply means for supplying a rinsing liquid to the substrate held by the substrate rotation holding means;
Chemical supply means for supplying a chemical to the substrate held by the substrate rotation holding means;
A rinse liquid recovery cup disposed on the outer peripheral side of the substrate rotation holding means holding the substrate and having an opening for recovering the rinse liquid shaken off from the periphery of the substrate;
A chemical recovery cup disposed on the outer peripheral side of the substrate rotation holding means holding the substrate and having an opening for recovering the chemical liquid shaken off from the peripheral edge of the substrate above the opening of the rinse liquid recovery cup; ,
An intermediate cup wall that can be raised and lowered to separate the two cups;
The intermediate cup wall is lowered during the chemical treatment, and the chemical liquid shaken off from the periphery of the substrate is allowed to reach the opening of the chemical recovery cup, while the intermediate cup wall is raised during the rinse treatment, An intermediate cup wall lifting / lowering means for receiving the rinse liquid shaken off from the periphery of the substrate and guiding the rinse liquid to the opening of the rinse liquid recovery cup, and the intermediate cup wall is used for collecting the chemical liquid when raised during the rinse liquid treatment. It prevents the rinse liquid from entering the cup opening ,
A substrate processing apparatus characterized in that an upper end portion of the chemical liquid recovery cup is formed so as to project and an intermediate cup wall is raised to close an opening of the chemical liquid recovery cup . In a substrate processing apparatus for processing a substrate by sequentially supplying a chemical solution and a rinse solution to the substrate,
Substrate rotation holding means for holding and rotating the substrate;
Rinsing liquid supply means for supplying a rinsing liquid to the substrate held by the substrate rotation holding means;
Chemical supply means for supplying a chemical to the substrate held by the substrate rotation holding means;
A rinse liquid recovery cup disposed on the outer peripheral side of the substrate rotation holding means holding the substrate and having an opening for recovering the rinse liquid shaken off from the periphery of the substrate;
A chemical recovery cup disposed on the outer peripheral side of the substrate rotation holding means holding the substrate and having an opening for recovering the chemical liquid shaken off from the peripheral edge of the substrate above the opening of the rinse liquid recovery cup; ,
An intermediate cup wall that is provided so as to be movable up and down at a height equal to or lower than the upper end of the chemical solution recovery cup; and
During the chemical treatment, the intermediate cup wall is lowered to widen the opening of the chemical solution collection cup, and this opening is opposed to the peripheral edge of the substrate. On the other hand, during the rinse treatment, the intermediate cup wall is raised to raise the rinse solution collection cup. And an intermediate cup wall elevating means for making the opening face the substrate periphery, and the intermediate cup wall closes the opening of the chemical recovery cup when raised during the rinse liquid treatment There is provided a substrate processing apparatus. In a substrate processing apparatus for processing a substrate by sequentially supplying a chemical solution and a rinse solution to the substrate,
Substrate rotation holding means for holding and rotating the substrate;
Rinsing liquid supply means for supplying a rinsing liquid to the substrate held by the substrate rotation holding means;
Chemical supply means for supplying a chemical to the substrate held by the substrate rotation holding means;
A rinse liquid recovery cup disposed on the outer peripheral side of the substrate rotation holding means holding the substrate and having an opening for recovering the rinse liquid shaken off from the periphery of the substrate;
A chemical recovery cup disposed on the outer peripheral side of the substrate rotation holding means holding the substrate and having an opening for recovering the chemical liquid shaken off from the peripheral edge of the substrate above the opening of the rinse liquid recovery cup; ,
An intermediate cup wall that is provided so as to be movable up and down at a height equal to or lower than the upper end of the chemical solution recovery cup; and
The intermediate cup wall is lowered during the chemical treatment, and the chemical liquid shaken off from the periphery of the substrate is allowed to reach the opening of the chemical recovery cup, while the intermediate cup wall is raised during the rinse treatment, An intermediate cup wall lifting / lowering means for receiving the rinse liquid shaken off from the periphery of the substrate and guiding the rinse liquid to the opening of the rinse liquid recovery cup, and the intermediate cup wall is used for collecting the chemical liquid when raised during the rinse liquid treatment. A substrate processing apparatus for closing an opening of a cup. In a substrate processing apparatus for processing a substrate by sequentially supplying a chemical solution and a rinse solution to the substrate,
Substrate rotation holding means for holding and rotating the substrate;
Rinsing liquid supply means for supplying a rinsing liquid to the substrate held by the substrate rotation holding means;
Chemical supply means for supplying a chemical to the substrate held by the substrate rotation holding means;
A rinse liquid recovery cup disposed on the outer peripheral side of the substrate rotation holding means holding the substrate and having an opening for recovering the rinse liquid shaken off from the periphery of the substrate;
A chemical recovery cup disposed on the outer peripheral side of the substrate rotation holding means holding the substrate and having an opening for recovering the chemical liquid shaken off from the peripheral edge of the substrate above the opening of the rinse liquid recovery cup; ,
An intermediate cup wall that is provided so as to be movable up and down at a height equal to or lower than the upper end of the chemical solution recovery cup; and
During the chemical treatment, the intermediate cup wall is lowered to widen the opening of the chemical solution collection cup, and this opening is opposed to the peripheral edge of the substrate. On the other hand, during the rinse treatment, the intermediate cup wall is raised to raise the rinse solution collection cup. And an intermediate cup wall lifting / lowering means for making the opening face the substrate periphery, and when the intermediate cup wall is raised during the rinsing liquid treatment, the rinsing liquid enters the chemical liquid recovery cup opening. it is intended to prevent that,
A substrate processing apparatus characterized in that an upper end portion of the chemical liquid recovery cup is formed so as to project and an intermediate cup wall is raised to close an opening of the chemical liquid recovery cup . In a substrate processing apparatus for processing a substrate by sequentially supplying a chemical solution and a rinse solution to the substrate,
Substrate rotation holding means for holding and rotating the substrate;
Rinsing liquid supply means for supplying a rinsing liquid to the substrate held by the substrate rotation holding means;
Chemical supply means for supplying a chemical to the substrate held by the substrate rotation holding means;
A rinse liquid recovery cup disposed on the outer peripheral side of the substrate rotation holding means holding the substrate and having an opening for recovering the rinse liquid shaken off from the periphery of the substrate;
A chemical recovery cup disposed on the outer peripheral side of the substrate rotation holding means holding the substrate and having an opening for recovering the chemical liquid shaken off from the peripheral edge of the substrate above the opening of the rinse liquid recovery cup; ,
An intermediate cup wall that is provided so as to be movable up and down at a height equal to or lower than the upper end of the chemical solution recovery cup; and
The intermediate cup wall is lowered during the chemical treatment, and the chemical liquid shaken off from the periphery of the substrate is allowed to reach the opening of the chemical recovery cup, while the intermediate cup wall is raised during the rinse treatment, An intermediate cup wall lifting / lowering means for receiving the rinse liquid shaken off from the periphery of the substrate and guiding the rinse liquid to the opening of the rinse liquid recovery cup, and the intermediate cup wall is used for collecting the chemical liquid when raised during the rinse liquid treatment. It prevents the rinse liquid from entering the cup opening ,
A substrate processing apparatus characterized in that an upper end portion of the chemical liquid recovery cup is formed so as to project and an intermediate cup wall is raised to close an opening of the chemical liquid recovery cup . In the substrate processing apparatus in any one of Claims 1-8,
The substrate processing apparatus, wherein the intermediate cup wall closes the opening of the rinse liquid recovery cup when lowered during the chemical processing. In the substrate processing apparatus in any one of Claim 1 , Claim 2, Claim 5, Claim 6, and Claim 9,
A substrate processing apparatus characterized in that an upper end portion of the chemical liquid recovery cup is formed so as to project and an intermediate cup wall is raised to close an opening of the chemical liquid recovery cup.

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