JP3935858B2 - Edge mask device for continuous electroplating equipment - Google Patents

Edge mask device for continuous electroplating equipment Download PDF

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JP3935858B2
JP3935858B2 JP2003113749A JP2003113749A JP3935858B2 JP 3935858 B2 JP3935858 B2 JP 3935858B2 JP 2003113749 A JP2003113749 A JP 2003113749A JP 2003113749 A JP2003113749 A JP 2003113749A JP 3935858 B2 JP3935858 B2 JP 3935858B2
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edge mask
edge
steel strip
tip
mask
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JP2004315922A (en
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泰夫 松浦
圭司 神尾
勝洋 浜口
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Nippon Steel Corp
Nippon Steel Engineering Co Ltd
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Nippon Steel Corp
Nippon Steel Engineering Co Ltd
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Description

【発明の属する技術分野】
本発明は、めっき槽に設置した電極間を走行させて鋼帯に電気めっきを施す連続式電気めっき設備のエッジマスク装置に関する。
具体的には、連続して走行する鋼帯の表面に電気めっきを施す際に発生する鋼帯端部のエッジオーバーコートを防止する連続式電気めっき設備のエッジマスク装置に関する。
【従来の技術】
図５は、連続式電気めっき設備のめっきセルの断面構造を示す図である。
めっきセル４内において、鋼帯１を連続的に上電極5と下電極6間を走行させて電気めっきを行う際に、鋼帯１の両エッジ部近傍にめっき電流が集中することによって過剰めっき、即ち、いわゆるエッジオーバーコートが生じる。
また、鋼帯１両端部では、めっき電流の集中が大きくまた迷走電流の影響により、デンドライト状析出物が生成する。このデンドライト状析出物は非常に脆弱で需要家でのプレス成形時に剥離し易く、押し込み疵を誘発する怖れがある。従って、電気めっき時において、このデンドライト状析出物の発生を防止することが重要となる。
そこで、鋼帯１のエッジオーバーコート、および、デンドライト状析出物を抑制する方法として、従来から、鋼帯端部にエッジマスク装置を設置する方法が採用されており、このエッジマスク装置は、エッジマスク先端部２と連結部３から構成されたエッジマスクが、鋼帯１端部に追従する機構を有することにより、鋼帯端部付近のめっき電流の集中を緩和し、エッジオーバーコートを軽減するものである。
例えば、特開平７−２７８８５号公報には、断面がコの字状のエッジマスク開口部の懐高さ（本従来技術では“マスク開口部両先端間距離ａ”と表現）を上下電極間（ｄ）の１/３以下とし、さらにエッジマスク開口部のつば厚み（本従来技術では“マスク材厚みｂ”と表現）を上下電極間の距離（ｄ）の１/１５以上としたエッジマスクが提案されている。
そして、この従来技術文献には、エッジマスクのつば厚みｔを大きくすることにより、エッジマスクの開口端部を、鋼帯端部から離した位置に設置した場合でもエッジオーバーコートを防止できることが記載されている。
【特許文献１】
特開平７−２７８８５号公報
【発明が解決しようとする課題】
ところで、電気めっき工程においては、電極間（電極と鋼帯間、または上部電極と下部電極間）の距離をできるだけ短くすることによって電力原単位を向上させることが必要である。
従って、このように電極間を短くしなければならない状況のもとでは、鋼帯の形状が悪く耳伸び状態になっているときや、鋼帯１に急な蛇行が発生した場合には、図７に示すように鋼帯１の端部がエッジマスク先端部２に干渉したり、乗り上げたりすることがあり、エッジマスク自体を損傷したり、鋼帯１のエッジ部に疵を生じたりする不具合が生じる。
図１０は、このエッジマスク先端部の拡大図であるが、このようなトラブルは、すなわちエッジマスク先端部２のつば部厚みｔが大きくなり、従って上下電極間距離が制限されているためにエッジマスク先端部２の懐高さｂが小さくなる場合に発生する。
前述の特開平７−２７８８５号公報にて提案されているエッジマスクは、積極的にこのつば部厚みｔを大きくし、エッジマスク先端部２の懐高さｂを小さくすることで、エッジマスク先端部と鋼帯端部との距離を離した状態での操業を可能としているが、実際、エッジマスク先端部２と鋼帯１端部との距離の限界値は、最大でも上下電極間距離の0.4倍程度であるため、鋼帯１に急な蛇行が発生した場合には、この方法においてもエッジマスク先端部２と鋼帯１端部とが接触を防止することは難しいという問題点があった。
従って、できるだけエッジマスク先端部２の懐高さｂを大きくすると同時に、鋼帯1の蛇行発生時には、エッジマスクの追従性の遅れを考慮してエッジマスク先端部２の懐長さLをできるだけ広くとることが望まれる。
すなわち、図６に示すエッジマスクの追従制御のシステムフローにおいて、鋼帯１の幅情報およびトラッキング情報は信号ａとしてエッジマスク制御盤８にインプットされ、さらに出側に設けられた蛇行検知器１０、蛇行検知器制御盤９からの蛇行検知信号ｂによって補正されて、エッジマスク制御盤８からアクチュエーター１１を作動させることによってエッジマスクの追従制御を行っているが、複数並ぶめっきセルにおいてトラッキング情報や蛇行検知信号による補正制御の遅れがあると、鋼帯１とエッジマスク先端部２が接触する怖れが生じるので、予めエッジマスク先端部２の懐長さＬを大きく設けて多少の制御遅れが生じた場合でも鋼帯端部とエッジマスク先端部２が接触することがないようすることが有効である。
しかし、懐長さLが長い形状では、エッジマスクのめっき液流の影響による振動やエッジマスク自身の垂れ下がりなどの問題を誘発する怖れがあり、従来実機化が困難とされ実用に供されていなかった。
このように、従来はエッジマスクの懐を広くとることが不可能とされており、従って鋼帯の耳伸びや蛇行等通常操業において不可避的に生じる操業条件を考慮して、鋼帯１端部にエッジマスク先端部２を安定的にオーバーラップさせて操業することは困難であった。従って、エッジマスク先端部２を図８に示すように断面を若干凹型にして、鋼帯エッジ端面と距離Ｓまで近接させるか、若しくは図９に示すように距離Cだけ僅かにオーバーラップさせて使用するに留まり、鋼帯端部のめっき電流の集中を十分に緩和することができなかった。
そこで、本発明は、鋼帯の蛇行や幅変更があってもエッジマスクの追従制御の遅れをカバーし、鋼帯端部とエッジマスクの接触を未然に防ぎ、鋼帯幅方向全域にわたってエッジオーバーコート、デンドライト析出物やエッジ部付近のアンダーコートを防止できるエッジマスクを提供することを課題とする。
【課題を解決するための手段】
本発明では、前述の課題を解決するために鋭意検討の結果なされたものであり、その要旨とするところは、特許請求の範囲に記載した通りの下記内容である。
（１）エッジマスク先端部を、鋼帯端部を挟むようにしてコの字状になし、エッジマスクのつば厚みtと開口部の奥行きを示す懐長さＬとの比率（ｔ／Ｌ）が０．００８から０．０５の範囲内とした、めっき槽に設置した電極間を走行させて鋼帯に電気めっきを施す連続式電気めっき投備のエッジマスク装置において、エッジマスクの開口部の高さを示す懐高さbと電極間距離hとの比率（ｂ／ｈ）を０．６５以上１．０未満として、めっき液流によって生じるエッジマスク先端部の懐内圧力Ｐ １ と背面の圧力Ｐ ２ との圧力差Ｐ １ −Ｐ ２ を利用してエッジマスク先端部のつば部を電極側に押し広げることを特徴とする連続式電気めっき設備のエッジマスク装置。
【発明の実施の形態】
図１に本発明におけるエッジマスク先端部の形状の実施例を示す。
本発明のエッジマスクは、連結部３の先端に断面形状がコの字状のエッジマスク先端部２が取り付いて構成されている。ここでは、エッジマスクのコの字状の開口部における上下つば部の厚みを“つば厚みｔ”、エッジマスク開口部の奥行きを“懐長さＬ”、エッジマスク開口部の高さを“懐高さｂ”と称している。尚、エッジマスク先端部２は、ＦＲＰ等の非電導体を材料として用いている。
図２および図３は連続式電気めっき設備の電気めっきセル内に設置された上電極５と下電極６の間に本発明のエッジマスクを設置した状態を示した図である。
電気めっきセルにおいて、上下の電極５，６間距離ｈは１８ｍｍ〜３５mmの範囲で出きるだけ短くすることにより電力効率を高めるようになされている。この上下電極５，６間において鋼帯１の幅に応じて追従するエッジマスクについて、発明者らは種々考察を重ねた結果、エッジマスクのつば厚みｔと、懐長さＬとの比率（ｔ／Ｌ）を、下記（Ａ）式を満足する範囲にすることによって、図２に示すようにめっき液流によって生じるエッジマスク先端部２の懐内圧力P1と背面の圧力P2との圧力差P1-P2 を利用して、図３に示すようにエッジマスク先端部のつば部を電極５，６側に各々押し広げることが可能になることを見出した。
０.００８≦ｔ／Ｌ≦０.０５・・・（Ａ）
これによって、めっき操業中に常に内側から圧力P1を受けるエッジマスクのつば部は、従来のようにめっき液流の影響を受けず振動することがなくなり、加えてエッジマスク自身の剛性低下に伴う垂れ下がり現象を回避することができるようになる。
エッジマスクのつば部を電極側に押し広げる原動力となるエッジマスク先端部２の懐内部の圧力P1は、エッジマスク先端部２の形状によって変化し圧力差P1-P2 とエッジマスク先端部の懐高さｂと電極間距離ｈの比（ｂ／ｈ）との関係で整理すると図４に示すようになる。発明者らは数多くの考察と実験により、エッジマスクのつば厚みｔと、懐長さＬの比率ｔ／Ｌを０．００８〜０．０５の範囲になしたエッジマスク先端部において、つば部を電極の方向に押し広げるために必要な圧力差Ｐを得るためには、ｂ／ｈを０．６５以上にすることが必要であることを見出し、下記（Ｂ）式を満足する範囲を適正範囲とした。
・ ６５ ≦ｂ／ｈ＜１.０ ・・・（Ｂ）
ｂ／ｈが０．６５未満の場合には、ｔ／Ｌを０．００８〜０．０５の範囲としたエッジマスクであっても、つば部の電極５、６側への押し広げ代が大きくなるため、つば部の剛性、めっき液流の影響により、つば部を安定的に上下電極５，６側へ押し広げることができない。また、エッジマスクの構造上、ｂはｈ以上となることはないのでｂ／ｈを１未満とした。
ここでいうエッジマスク開口部の懐高さｂとは、設計時の値であり、圧力差P1-P2により押し広げられた状態での値ではない。
なお、図１に示す実施例おいては、つば厚ｔを通常０．５ｍｍ乃至２．０ｍｍとし、懐長さＬを４０ｍｍ乃至６０ｍｍとしており、ｔ／Ｌは０．００８乃至０．０５となる範囲とし、且つ、エッジマスクのつば部懐高さｂは１５ｍｍ乃至１８ｍｍとし電極間距離ｈ＝２０mmの場合、ｂ／ｈを０．７５乃至０．９としたところ、本発明の効果を確認することができた。
【発明の効果】
本発明によれば、エッジマスクを十分な懐長さを有したコの字型形状とすることができるため、エッジマスクを鋼帯端部に近接させることや十分にオーバーラップさせることができるようになるので、鋼帯幅方向全域にわたってエッジオーバーコート、デンドライト状析出物やエッジ部付近のアンダーコートを防止でき優れためっき付着量均一性を得ることができるようになる。
また、コの字型形状においてｔ／Ｌおよびｂ／ｈを適正範囲に設定しているので、懐が長く、鋼帯の蛇行や幅変更があってもエッジマスクの追従制御の遅れをカバーし鋼帯端部とエッジマスクの接触を防ぐ充分な距離を確保することができるので、エッジマスクの変形や鋼帯の疵入り若しくはスパーク現象を未然に防ぎ生産効率を高めることができるようになる。
さらにｔ／Ｌを０．００８〜０．０５の適正範囲に設定し、ｂ／ｈを０．６５以上とすることによってエッジマスク先端部をめっき液流によって発生する圧力差P1-P2 を利用してエッジマスク先端部のつば部を電極側に押し広げることが可能になるため、エッジマスク先端部自身の剛性低下を補償しつつエッジマスク先端部のつば部の振動や垂れ下がりを防止できるとともに、エッジマスクの開口部の懐高さを広げることができ、その相当分だけ電極間距離を従来に比べてさらに短くすることができるのでめっき電力原単位を従来以上に高めることができるなど、産業上有用な著しい効果を奏する。
【図面の簡単な説明】
【図１】本発明におけるエッジマスク装置の先端形状の実施形態を例示するの図である。
【図２】エッジマスク先端部に発生するめっき液流による圧力を模式的に示す図である。
【図３】エッジマスク先端部のつば部が押し広げられる状況を示す図である。
【図４】ｂ／ｈと発生圧力差P1-P2 をの関係を示す説明図である。
【図５】めっきセルの断面構造を示す図である。
【図６】従来のエッジバーナーの追従制御を示すフロー図である。
【図７】従来のエッジマスクに鋼帯が乗り上げた状態を示す図である。
【図８】従来のエッジマスクと鋼帯端部との位置関係を示す図であり、隙間Ｓを隔てて鋼帯とエッジマスクが近接している状態を示す。
【図９】従来のエッジマスクと鋼帯端部との位置関係を示す図であり、距離Cだけオーバーラップしている状態を示す。
【図１０】従来のエッジマスク先端形状の拡大図である。
【符合の説明】
１・・・鋼帯、
２・・・エッジマスク先端部、
３・・・連結部、
４・・・めっきセル、
５・・・上電極、
６・・・下電極、
８・・・エッジマスク制御盤、
９・・・蛇行検出器制御盤、
１０・・・蛇行検出器、
１１・・・アクチュエーター、
信号ａ・・・トラッキング信号、
信号ｂ・・・蛇行量検知信号BACKGROUND OF THE INVENTION
The present invention relates to an edge mask device for a continuous electroplating facility in which a steel strip is electroplated by running between electrodes installed in a plating tank.
Specifically, the present invention relates to an edge mask device for a continuous electroplating facility that prevents edge overcoat at the end of a steel strip that occurs when the surface of a steel strip that runs continuously is electroplated.
[Prior art]
FIG. 5 is a diagram showing a cross-sectional structure of a plating cell of a continuous electroplating facility.
In the plating cell 4, when the steel strip 1 is continuously run between the upper electrode 5 and the lower electrode 6 and electroplating is performed, the plating current concentrates in the vicinity of both edge portions of the steel strip 1, thereby overplating. That is, a so-called edge overcoat is generated.
Further, at both ends of the steel strip 1, the dendrite-like precipitates are generated due to the large concentration of plating current and the influence of stray current. This dendrite-like precipitate is very fragile, easily peeled off during press molding by a customer, and may cause indentation wrinkles. Accordingly, it is important to prevent the formation of dendritic precipitates during electroplating.
Therefore, as a method for suppressing the edge overcoat of the steel strip 1 and dendrite-like precipitates, a method of installing an edge mask device at the end of the steel strip has been conventionally employed. The edge mask composed of the mask front end portion 2 and the connecting portion 3 has a mechanism that follows the end of the steel strip 1, thereby reducing the concentration of plating current near the end of the steel strip and reducing the edge overcoat. Is.
For example, in Japanese Patent Laid-Open No. 7-27885, the height of an edge mask opening having a U-shaped cross section (expressed as “distance a between both ends of the mask opening” in this prior art) is defined between the upper and lower electrodes ( An edge mask in which the thickness of the brim of the edge mask opening (expressed as “mask material thickness b” in the conventional technology) is 1/15 or more of the distance (d) between the upper and lower electrodes is 1/3 or less of d). Proposed.
And this prior art document describes that by increasing the brim thickness t of the edge mask, the edge overcoat can be prevented even when the opening end of the edge mask is installed at a position away from the end of the steel strip. Has been.
[Patent Document 1]
Japanese Patent Laid-Open No. 7-27885 [Problems to be Solved by the Invention]
By the way, in the electroplating process, it is necessary to improve the power intensity by shortening the distance between the electrodes (between the electrode and the steel strip or between the upper electrode and the lower electrode) as much as possible.
Therefore, under such a situation where the distance between the electrodes must be shortened, when the shape of the steel strip is bad and the ear strip is stretched, or when a sudden meandering occurs in the steel strip 1, 7, the end of the steel strip 1 may interfere with or ride on the edge mask tip 2 and damage the edge mask itself or cause wrinkles at the edge of the steel strip 1 Occurs.
FIG. 10 is an enlarged view of the edge mask tip. Such a trouble is caused by the fact that the thickness t of the edge mask tip 2 is increased, and therefore the distance between the upper and lower electrodes is limited. This occurs when the height b of the mask tip 2 is reduced.
The edge mask proposed in the above-mentioned Japanese Patent Application Laid-Open No. 7-27885 actively increases the collar portion thickness t and decreases the height b of the edge mask tip portion 2 to thereby reduce the edge mask tip. The distance between the edge of the steel strip and the end of the steel strip is enabled, but in fact, the maximum distance between the edge mask tip 2 and the end of the steel strip 1 is the maximum distance between the upper and lower electrodes. Since it is about 0.4 times, when a sudden meandering occurs in the steel strip 1, it is difficult to prevent contact between the edge mask tip 2 and the steel strip 1 even in this method. It was.
Accordingly, the height b of the edge mask tip 2 is made as large as possible, and at the same time, when the steel strip 1 meanders, the length L of the edge mask tip 2 is made as wide as possible in consideration of the delay in the followability of the edge mask. It is desirable to take.
That is, in the system flow for tracking control of the edge mask shown in FIG. 6, the width information and tracking information of the steel strip 1 are input to the edge mask control panel 8 as a signal a, and the meander detector 10 provided on the output side, The edge mask follow-up control is performed by operating the actuator 11 from the edge mask control board 8 after being corrected by the meander detection signal b from the meander detector control board 9. If there is a delay in the correction control by the detection signal, there is a fear that the steel strip 1 and the edge mask tip 2 come into contact with each other. Therefore, a long control length L of the edge mask tip 2 is set in advance to cause a slight control delay. Even in such a case, it is effective to prevent the steel strip end and the edge mask tip 2 from contacting each other.
However, the shape with a long length L may cause problems such as vibration due to the influence of the plating solution flow of the edge mask and drooping of the edge mask itself. There wasn't.
As described above, it is conventionally impossible to take a wide pocket of the edge mask. Therefore, considering the operating conditions that are unavoidable in the normal operation such as the elongation of the steel strip and the meandering, the end of the steel strip 1 is considered. It was difficult to operate with the edge mask tip 2 stably overlapping. Accordingly, the edge mask tip 2 is used with a slightly concave cross section as shown in FIG. 8 and close to the steel strip edge end surface to a distance S, or slightly overlapped by a distance C as shown in FIG. However, the concentration of the plating current at the end of the steel strip could not be relaxed sufficiently.
Therefore, the present invention covers the delay in the tracking control of the edge mask even if the steel strip meanders or changes its width, prevents the contact between the edge of the steel strip and the edge mask in advance, and the edge over the entire width of the steel strip. It is an object of the present invention to provide an edge mask capable of preventing coating, dendrite deposits and undercoat in the vicinity of the edge portion.
[Means for Solving the Problems]
The present invention has been made as a result of intensive studies in order to solve the above-described problems, and the gist thereof is the following contents as described in the claims.
(1) The edge mask tip portion is formed in a U shape so as to sandwich the steel strip end portion, and the ratio (t / L) between the brim thickness t of the edge mask and the length L indicating the depth of the opening is 0. In the edge mask device for continuous electroplating, in which the steel strip is electroplated by running between the electrodes installed in the plating tank within the range of .008 to 0.05, the height of the opening of the edge mask the ratio of the Futokorodaka of b and the electrode distance h shown (b / h) as less than 0.65 1.0, Huai internal pressure P 1 and the back pressure P of the edge mask tip caused by the plating liquid flow 2 and continuous electroplating equipment edge mask device by utilizing the pressure difference P 1 -P 2, characterized in that push the flange portion of the edge mask tip electrode side of the.
DETAILED DESCRIPTION OF THE INVENTION
FIG. 1 shows an example of the shape of the edge mask tip in the present invention.
The edge mask of the present invention is configured by attaching an edge mask tip 2 having a U-shaped cross section to the tip of the connecting portion 3. Here, the thickness of the upper and lower collars of the U-shaped opening of the edge mask is “collar thickness t”, the depth of the edge mask opening is “length L”, and the height of the edge mask opening is “volume”. It is referred to as height b ". The edge mask tip 2 uses a non-conductor such as FRP as a material.
2 and 3 are views showing a state in which the edge mask of the present invention is installed between the upper electrode 5 and the lower electrode 6 installed in the electroplating cell of the continuous electroplating equipment.
In the electroplating cell, the distance h between the upper and lower electrodes 5 and 6 is shortened as much as possible within a range of 18 mm to 35 mm so as to improve the power efficiency. As a result of various studies on the edge mask that follows the width of the steel strip 1 between the upper and lower electrodes 5 and 6, the inventors have conducted various studies. As a result, the ratio of the thickness t of the edge mask to the length L (t / L) within a range that satisfies the following formula (A), as shown in FIG. 2, the pressure between the pocket pressure P 1 at the edge mask tip 2 and the pressure P 2 at the back surface caused by the plating solution flow. Difference P 1 -P 2 As shown in FIG. 3, it has been found that the collar portion at the tip of the edge mask can be pushed and expanded toward the electrodes 5 and 6, respectively.
0.008 ≦ t / L ≦ 0.05 (A)
As a result, the edge portion of the edge mask that is constantly subjected to pressure P 1 from the inside during plating operation does not vibrate without being affected by the flow of the plating solution as in the past, and in addition, the rigidity of the edge mask itself is reduced. The drooping phenomenon can be avoided.
The pressure P 1 in the pocket of the edge mask tip 2 that becomes the driving force for pushing the collar portion of the edge mask toward the electrode side changes depending on the shape of the edge mask tip 2 and the pressure difference P 1 -P 2 FIG. 4 shows the relationship between the height b of the edge mask tip and the ratio (b / h) of the inter-electrode distance h. The inventors of the present invention have conducted a number of examinations and experiments, and in the edge mask tip where the ratio t / L of the edge thickness t to the length L is in the range of 0.008 to 0.05, In order to obtain the pressure difference P required to spread in the direction of the electrode, it was found that b / h must be 0.65 or more, and the range satisfying the following formula (B) is an appropriate range. It was.
65 ≦ b / h <1.0 (B)
When b / h is less than 0.65, even if the edge mask has t / L in the range of 0.008 to 0.05, the allowance for expanding the collar portion toward the electrodes 5 and 6 is large. Therefore, due to the rigidity of the collar part and the influence of the plating solution flow, the collar part cannot be stably spread to the upper and lower electrodes 5 and 6 side. Further, b / h is set to less than 1 because b does not exceed h due to the structure of the edge mask.
Here, the height b of the edge mask opening is a value at the time of design, and is not a value when the edge mask is expanded by the pressure difference P 1 -P 2 .
In the embodiment shown in FIG. 1, the collar thickness t is normally 0.5 mm to 2.0 mm, the length L is 40 mm to 60 mm, and t / L is 0.008 to 0.05. When the range and the height b of the edge portion of the edge mask is 15 mm to 18 mm and the inter-electrode distance h = 20 mm, the effect of the present invention is confirmed when b / h is set to 0.75 to 0.9. I was able to.
【The invention's effect】
According to the present invention, since the edge mask can be formed into a U-shape having a sufficient length, the edge mask can be brought close to the end of the steel strip or can be sufficiently overlapped. Therefore, edge overcoat, dendrite-like precipitates, and undercoat near the edge portion can be prevented over the entire width direction of the steel strip, and excellent plating adhesion amount uniformity can be obtained.
In addition, t / L and b / h are set within the proper range in the U-shaped shape, so that there is a long pocket and the delay in tracking control of the edge mask is covered even if the steel strip meanders or changes its width. Since a sufficient distance for preventing contact between the edge of the steel strip and the edge mask can be ensured, it becomes possible to prevent the deformation of the edge mask, the wrinkle of the steel strip or the spark phenomenon, and increase the production efficiency.
Furthermore, by setting t / L to an appropriate range of 0.008 to 0.05 and setting b / h to 0.65 or more, the pressure difference P 1 -P 2 generated at the edge mask edge by the plating solution flow Since it is possible to push the collar part of the edge mask tip part to the electrode side by using, it is possible to prevent vibration and sagging of the collar part of the edge mask tip part while compensating for the rigidity reduction of the edge mask tip part itself. At the same time, the height of the opening of the edge mask can be expanded, and the distance between the electrodes can be further shortened by a corresponding amount, so that the plating power intensity can be increased more than before. There are significant industrially useful effects.
[Brief description of the drawings]
FIG. 1 is a diagram illustrating an embodiment of a tip shape of an edge mask device according to the present invention.
FIG. 2 is a diagram schematically showing pressure due to a plating solution flow generated at the edge mask edge portion.
FIG. 3 is a diagram showing a situation in which a collar portion at a tip portion of an edge mask is pushed and widened.
[Figure 4] b / h and generated pressure difference P 1 -P 2 It is explanatory drawing which shows the relationship.
FIG. 5 is a view showing a cross-sectional structure of a plating cell.
FIG. 6 is a flowchart showing conventional edge burner tracking control.
FIG. 7 is a view showing a state in which a steel strip rides on a conventional edge mask.
FIG. 8 is a diagram showing a positional relationship between a conventional edge mask and a steel strip end, and shows a state in which the steel strip and the edge mask are close to each other with a gap S therebetween.
FIG. 9 is a diagram showing a positional relationship between a conventional edge mask and a steel strip end portion, and shows a state where they overlap each other by a distance C.
FIG. 10 is an enlarged view of a conventional edge mask tip shape.
[Explanation of sign]
1 ... steel strip,
2 ... Edge mask tip,
3 ... connection part,
4 ... Plating cell,
5 ... Upper electrode,
6 ... Lower electrode,
8 ... Edge mask control panel,
9 ... Meander detector control panel,
10 ... Meander detector,
11 ... Actuator,
Signal a ... Tracking signal,
Signal b ... Meander amount detection signal

Claims (1)

エッジマスク先端部を、鋼帯端部を挟むようにしてコの字状になし、エッジマスクのつば厚みtと開口部の奥行きを示す懐長さＬとの比率（ｔ／Ｌ）が０．００８から０．０５の範囲内とした、めっき槽に設置した電極間を走行させて鋼帯に電気めっきを施す連続式電気めっき投備のエッジマスク装置において、
エッジマスクの開口部の高さを示す懐高さbと電極間距離hとの比率（ｂ／ｈ）を０．６５以上１．０未満として、めっき液流によって生じるエッジマスク先端部の懐内圧力Ｐ １ と背面の圧力Ｐ ２ との圧力差Ｐ １ −Ｐ ２ を利用してエッジマスク先端部のつば部を電極側に押し広げることを特徴とする連続式電気めっき設備のエッジマスク装置。The edge mask tip is formed in a U shape so as to sandwich the steel strip end, and the ratio (t / L) between the collar thickness t of the edge mask and the length L indicating the depth of the opening is 0.008. In an edge mask device for continuous electroplating, in which a steel strip is electroplated by running between electrodes installed in a plating tank, within a range of 0.05,
The ratio (b / h) between the height b indicating the height of the opening of the edge mask and the distance h between the electrodes is set to 0.65 or more and less than 1.0, and the pocket of the edge mask tip generated by the plating solution flow An edge mask device for a continuous electroplating facility, wherein a collar portion at the tip of the edge mask is pushed to the electrode side by utilizing a pressure difference P 1 -P 2 between the pressure P 1 and the pressure P 2 on the back surface .
JP2003113749A 2003-04-18 2003-04-18 Edge mask device for continuous electroplating equipment Expired - Lifetime JP3935858B2 (en)

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