JP3922833B2

JP3922833B2 - Substrate processing equipment

Info

Publication number: JP3922833B2
Application number: JP16353899A
Authority: JP
Inventors: 卓也柴尾
Original assignee: Screen Holdings Co Ltd; Dainippon Screen Manufacturing Co Ltd
Current assignee: Screen Holdings Co Ltd; Dainippon Screen Manufacturing Co Ltd
Priority date: 1999-06-10
Filing date: 1999-06-10
Publication date: 2007-05-30
Anticipated expiration: 2019-06-10
Also published as: JP2000353731A

Description

【０００１】
【発明の属する技術分野】
本発明は、半導体ウエハや液晶表示器用のガラス基板、フォトマスク用のガラス基板、光ディスク用の基板などの基板を処理する基板処理装置に係り、特には、装置内における雰囲気の流通の遮断などを行うための、所定の仕切り領域と収納領域との間で遮断部材を移動させて仕切り領域を開閉する仕切り開閉手段を備えた基板処理装置の改良技術に関する。
【０００２】
【従来の技術】
この種の基板処理装置として、例えば、図１３に示すように、複数枚の基板を一括して処理するための複数の処理槽１００Ａ、１００Ｂを備えた装置がある。この装置では、各処理槽１００Ａ、１００Ｂに処理液が貯留され、複数枚の基板が、各処理槽１００Ａ、１００Ｂに貯留された処理液内に順次浸漬させて処理される。複数枚の基板は、各処理槽１００Ａ、１００Ｂの上方空間で、図示しない基板搬送機構によって一括して保持され、搬送方向１０１に沿って搬送されるようになっている。
【０００３】
ところで、処理槽１００Ａの上方空間の雰囲気には、処理槽１００Ａに貯留された処理液の成分が含まれ、一方、処理槽１００Ｂの上方空間の雰囲気には、処理槽１００Ｂに貯留された処理液の成分が含まれる。各処理槽１００Ａ、１００Ｂに貯留される処理液が同一である場合には特に問題はないが、各処理槽１００Ａ、１００Ｂに貯留される処理液が異なる場合、処理槽１００Ａの上方空間の雰囲気と処理槽１００Ｂの上方空間の雰囲気とが混じり合って化学反応を起こし、基板に悪影響を与えることもある。
【０００４】
そこで、この種の装置には、処理槽１００Ａの上方空間と処理槽１００Ｂの上方空間との間における雰囲気の流通の遮断を行うために、処理槽１００Ａの上方空間と処理槽１００Ｂの上方空間との間を仕切り領域ＳＡとして、この仕切り領域を開閉する仕切り開閉機構を備えている。すなわち、処理槽１００Ａから処理槽１００Ｂへ基板を搬送するときだけ、仕切り領域ＳＡを開き、それ以外は仕切り領域ＳＡを閉じて、処理槽１００Ａの上方空間の雰囲気と処理槽１００Ｂの上方空間の雰囲気とが混じり合うことを抑制する。
【０００５】
このような仕切り開閉機構を備えた従来の基板処理装置は、例えば、特開平１０−３３５２８５号公報などに開示されている。すなわち、図１３、図１４に示すように、仕切り領域ＳＡと収納領域ＰＡとの間で１つの遮断部材１１０を移動させて仕切り領域ＳＡを開閉するように構成している。なお、仕切り領域ＳＡと収納領域ＰＡとの間の遮断部材１１０の移動は、例えば、図１３、図１４（ａ）に示すように、直線移動でなされるものや、図１４（ｂ）に示すように、１つの軸芯Ｊ周りでの回動動作によってなされるものなどがある。
【０００６】
【発明が解決しようとする課題】
しかしながら、このような構成を有する従来例の場合には、次のような問題がある。
従来装置は、仕切り領域ＳＡにおいて必要とされる遮断面積を有する遮断面１１１を持つ１つの遮断部材１１０を、仕切り領域ＳＡと収納領域ＰＡとの間で移動させて仕切り領域ＳＡを開閉しているので、収納領域ＰＡとして、遮断部材１１０の遮断面１１１方向に、仕切り領域ＳＡと同等の面積の領域を確保しなければならない。また、図１４（ｂ）に示す回動動作によって遮断部材１１０を移動させる構成では、それに加えてさらに、遮断部材１１０を回動させるための斜線で示す余分な移動領域ＩＡも確保しなければならない。
【０００７】
そのため、装置内に組み込む部材（処理液の貯留タンクなど）の配置や、装置内の配線、配管、メンテナンスエリアの確保などを行う上で制約が大きくなり、装置が大型化したり、メンテナンスエリアが確保し難くなったり、メンテナンス作業が行い難くなるなどの問題を招いている。
【０００８】
本発明は、このような事情に鑑みてなされたものであって、仕切り領域において必要とされる遮断面積を遮断することができるとともに、収納領域など仕切り領域を開くために必要な領域を小さくすることができる基板処理装置を提供することを目的とする。
【０００９】
【課題を解決するための手段】
本発明は、このような目的を達成するために、次のような構成をとる。
すなわち、請求項１に記載の発明は、基板の搬送空間において雰囲気の流通を遮断するために基板の搬送空間に形成された仕切り領域と、収納領域との間で遮断部材を移動させて前記仕切り領域を開閉する仕切り開閉手段を備えた基板処理装置において、前記仕切り開閉手段は、前記遮断部材を複数の分割遮断部材に分割するとともに、前記仕切り領域を閉じるように前記各分割遮断部材ごとに割り当てられた各配置位置と、前記各分割遮断部材ごとに設けた各収納領域との間で、前記各分割遮断部材をそれぞれ移動させる移動手段を備え、かつ、前記各収納領域に前記各分割遮断部材を収納したとき、少なくとも一部の分割遮断部材同士は、分割遮断部材の遮断面に向かって見て、それら分割遮断部材の遮断面の少なくとも一部が重複した状態で各々の収納領域に収納されるように前記各収納領域を設けて構成し、かつ、前記複数の分割遮断部材を構成する第１の分割遮断部材と第２の分割遮断部材とを前記仕切り領域内に配置する前記第１の分割遮断部材の第１の配置位置と前記第２の分割遮断部材の第２の配置位置とを、前記仕切り領域内に並べて割り当て、前記第１の分割遮断部材と前記第２の分割遮断部材とをそれぞれ収納する第１の収納領域と第２の収納領域とを、前記仕切り領域に対して分割遮断部材の遮断面に沿った一側方側の位置に設け、前記移動手段は、前記第１の分割遮断部材の一端部を中心に、第１の分割遮断部材の遮断面に向かって見て、前記第２の配置位置を通過するように前記第１の分割遮断部材を回動させて、前記第１の配置位置と前記第１の収納領域との間で前記第１の分割遮断部材を移動させるとともに、前記第２の分割遮断部材の一端部を中心に、第２の分割遮断部材の遮断面に向かって見て、前記第１の配置位置を通過するように前記第２の分割遮断部材を回動させて、前記第２の配置位置と前記第２の収納領域との間で前記第２の分割遮断部材を移動させるように構成したことを特徴とするものである。
【００１０】
請求項２に記載の発明は、上記請求項１に記載の基板処理装置において、基板を処理する処理槽がそれぞれ設けられた複数の処理部と、各処理部の上方空間を水平移動して、基板を各処理部に搬送する基板搬送機構と、を備え、前記仕切り領域は、前記処理部に設けられた各処理槽の上方空間の間とすることを特徴とするものである。
【００１１】
【作用】
請求項１に記載の発明の作用は次のとおりである。
仕切り領域を閉じるための遮断部材を複数の分割遮断部材に分割する。移動手段は、仕切り領域を閉じるように各分割遮断部材ごとに割り当てられた各配置位置と、各分割遮断部材ごとに設けた各収納領域との間で、各分割遮断部材をそれぞれ移動させる。
【００１２】
各分割遮断部材が、それぞれに割り当てられた配置位置に配置されると仕切り領域は閉じた状態になり、各々の収納領域に収納されると仕切り領域は開いた状態になる。
【００１３】
そして、各収納領域に各分割遮断部材を収納したとき、少なくとも一部の分割遮断部材同士は、分割遮断部材の遮断面に向かって見て、それら分割遮断部材の遮断面の少なくとも一部が重複した状態で各々の収納領域に収納されるように各収納領域を設けている。
【００１４】
遮断面の少なくとも一部が重複した状態で収納領域に収納される分割遮断部材同士は、全ての分割遮断部材同士でもよいし、複数の分割遮断部材のうちの一部の分割遮断部材同士でもよいし、複数の分割遮断部材を複数のグループに分けた場合の各グループ内の分割遮断部材同士でもよい。
【００１５】
また、複数の分割遮断部材を構成する２つの分割遮断部材を第１、第２の分割遮断部材として以下のように構成する。なお、この請求項２に記載の発明は、分割遮断部材を２つだけで構成する場合に限らず、例えば、分割遮断部材を３つで構成し、そのうちの２つの分割遮断部材を第１、第２の分割遮断部材として以下のように構成してもよいし、分割遮断部材を４つで構成し、２つの分割遮断部材ずつ２つのグループに分けて、各グループごとに以下のように構成してもよい。
【００１６】
すなわち、第１の分割遮断部材と第２の分割遮断部材とを仕切り領域内に配置する第１の分割遮断部材の第１の配置位置と第２の分割遮断部材の第２の配置位置とを、仕切り領域内に並べて割り当て、第１の分割遮断部材と第２の分割遮断部材とをそれぞれ収納する第１の収納領域と第２の収納領域とを、前記仕切り領域に対して分割遮断部材の遮断面に沿った一側方側の位置に設ける。なお、この第１の収納領域と第２の収納領域とは、各収納領域に各分割遮断部材を収納したとき、分割遮断部材の遮断面に向かって見て、第１、第２の分割遮断部材の遮断面の少なくとも一部が重複した状態で各々収納されるように設けている。
【００１７】
そして、移動手段は、第１の分割遮断部材の一端部を中心に、第１の分割遮断部材の遮断面に向かって見て、第２の配置位置を通過するように第１の分割遮断部材を回動させて、第１の配置位置と第１の収納領域との間で第１の分割遮断部材を移動させるとともに、第２の分割遮断部材の一端部を中心に、第２の分割遮断部材の遮断面に向かって見て、第１の配置位置を通過するように第２の分割遮断部材を回動させて、第２の配置位置と第２の収納領域との間で第２の分割遮断部材を移動させる。
【００１８】
【発明の実施の形態】
以下、図面を参照して本発明の実施の形態を説明する。
図１は本発明の一実施例に係る基板処理装置の全体的な構成を示す平面図であり、図２は図１のＡ−Ａ矢視断面図、図３は図１のＢ−Ｂ矢視断面図、図４は仕切り領域と第１、第２の配置位置と第１、第２の収納領域との位置関係を示す図である。
【００１９】
この実施例装置は、複数枚の基板Ｗ（基板群ＷＧ）を一括して処理することができるバッチ式の処理装置であり、キャリアストッカ１や、基板移載ロボット２、姿勢転換ロボット３、基板受渡しロボット４、基板搬送機構５、処理部６Ａ〜６Ｄ、仕切り開閉手段に相当する仕切り開閉機構７などを備えている。
【００２０】
キャリアストッカ１は、複数枚の基板Ｗを収容するキャリアＣを搬送したり、一時保管したりするためのもので、キャリアＣを一時的に保管するキャリア保管部（図示せず）や、キャリアＣを搬送するキャリア搬送機構１０などを備えている。キャリア搬送機構１０は、キャリア保管部と、キャリアＣを搬入／搬出する搬入搬出位置Ｐ１と、基板移載ロボット２がキャリアＣに対する各基板Ｗの取り出し／収容を行う移載位置Ｐ２との間で、キャリアＣを搬送する。なお、このキャリアストッカ１内では、各基板Ｗが水平姿勢で収納された状態でキャリアＣを扱う。
【００２１】
基板移載ロボット２は、移載位置Ｐ２に置かれたキャリアＣから、未処理の基板Ｗを取り出して姿勢転換ロボット３に引き渡したり、姿勢転換ロボット３から処理済の基板Ｗを受け取って移載位置Ｐ２に置かれたキャリアＣに収納したりする複数枚の基板Ｗの移載動作を行う。なお、この基板移載ロボット２による基板Ｗの移載動作も、基板Ｗを水平姿勢にして行われる。
【００２２】
姿勢転換ロボット３は、複数枚の基板Ｗを平行に並べて保持した状態で水平軸周りで回動させて、各基板Ｗが水平姿勢で垂直方向に並べられた状態と、垂直姿勢で水平方向に並べられた状態との間で姿勢転換する。
【００２３】
基板受渡しロボット４は、垂直姿勢で水平方向に並べられた基板群ＷＧを、姿勢転換ロボット３と基板搬送機構５（挟持機構５ａ）との間で受け渡す。なお、この基板受渡しロボット４による基板Ｗの受渡しや、後述する基板搬送機構５による基板Ｗの搬送、各処理部６Ａ〜６Ｄでの処理は、基板Ｗを垂直姿勢にして行われる。
【００２４】
基板搬送機構５は、一対の挟持機構５ａと、挟持機構５ａを各処理部６Ａ〜６Ｄの並び方向に水平移動させる水平移動機構部５ｂとを備え、垂直姿勢で水平方向に並べられた基板群ＷＧを挟持機構５ａで一括挟持して各処理部６Ａ〜６Ｄの上方空間を水平移動し、各基板Ｗを各処理部６Ａ〜６Ｄに順次搬送する。
【００２５】
処理部６Ａ〜６Ｃは、処理液を貯留し、その処理液内に基板群ＷＧを浸漬させて複数枚の基板Ｗを一括して処理液で処理する処理槽１１Ａ〜１１Ｃをそれぞれ備えるとともに、基板群ＷＧを保持し、一括して昇降させる昇降機構１２をそれぞれ備えている。昇降機構１２は、基板搬送機構５の挟持機構５ａから未処理の基板群ＷＧを受け取って処理槽１１Ａ〜１１Ｃに浸漬させたり、処理済の基板群ＷＧを処理槽１１Ａ〜１１Ｃから引き上げて基板搬送機構５の挟持機構５ａに引き渡したりする。
【００２６】
処理部６Ｄは、基板群ＷＧを回転させて乾燥させる処理を行う。この処理部６Ｄにも、上記昇降機構１２と同様の動作を行う図示しない昇降機構を備え、基板搬送機構５の挟持機構５ａと処理部６Ｄ内との間の基板群ＷＧの受渡しを行うように構成している。
【００２７】
基板搬送機構５の水平移動機構部５ｂと、各処理部６Ａ〜６Ｄの上方空間（基板群ＷＧの搬送空間）との間には仕切り１３が設けられ、上記基板群ＷＧの搬送空間とメンテナンスエリア１４との間とも仕切り１５が設けられている。
【００２８】
また、基板搬送機構５の水平移動機構部５ｂが配置された空間と上記基板群ＷＧの搬送空間との天井部分には、粉塵除去用などのフィルター１６と、気体を下方に送り出すファン１７とを有するファンフィルターユニット１８が配設され、基板搬送機構５の水平移動機構部５ｂが配置された空間と上記基板群ＷＧの搬送空間とに清浄な気体が流下されるようになっている。
【００２９】
本実施例では、各処理槽１１Ａ〜１１Ｃに貯留される処理液の種類が全て異なるものとして、処理槽１１Ａの上方空間と処理槽１１Ｂの上方空間との間における雰囲気の流通の遮断と、処理槽１１Ｂの上方空間と処理槽１１Ｃの上方空間との間における雰囲気の流通の遮断とを行うために、処理槽１１Ａの上方空間と処理槽１１Ｂの上方空間との間と、処理槽１１Ｂの上方空間と処理槽１１Ｃの上方空間との間とをそれぞれ仕切り領域ＳＡとし、各仕切り領域ＳＡごとにそれぞれ仕切り開閉機構７を設けている。
【００３０】
詳細は後述するが、各仕切り開閉機構７はそれぞれ、仕切り領域ＳＡを閉じる遮断部材を、複数（本実施例では２つ）の分割遮断部材（第１の分割遮断部材２０Ａ及び第２の分割遮断部材２０Ｂ）に分割し、仕切り領域ＳＡを閉じるように各分割遮断部材２０Ａ、２０Ｂごとに割り当てられた各配置位置（図１ないし図３で各分割遮断部材２０Ａ、２０Ｂが実線で示された状態の位置であって、図４のＳＡ１、ＳＡ２）と、仕切り領域ＳＡから外れた領域に各分割遮断部材２０Ａ、２０Ｂごとに設けた各収納領域（図２、図３で各分割遮断部材２０Ａ、２０Ｂが二点鎖線で示された状態の位置であって、図４のＰＡ１、ＰＡ２）との間で、各分割遮断部材２０Ａ、２０Ｂをそれぞれ移動させる移動手段に相当する第１、第２の移動機構（詳細は後述する）を備えて構成し、かつ、図３、図４に示すように、各収納領域ＰＡ１、ＰＡ２に各分割遮断部材２０Ａ、２０Ｂを収納したとき、各分割遮断部材同士２０Ａ、２０Ｂは、遮断面２１に向かって見て、それら分割遮断部材２０Ａ、２０Ｂの遮断面２１の少なくとも一部が重複した状態で各々の収納領域ＰＡ１、ＰＡ２に収納されるように各収納領域ＰＡ１、ＰＡ２を設けて構成されている。
【００３１】
このように構成したことにより、仕切り領域ＳＡにおいて必要とされる遮断面積を遮断することができるとともに、第１、第２の収納領域ＰＡ１、ＰＡ２を合わせた全収納領域ＰＡ（図４参照）の、遮断面２１方向の面積を小さくすることができ、収納領域ＰＡ１、ＰＡ２をコンパクトに構成することができる。
【００３２】
次に、本発明の要部である仕切り開閉機構７の詳細な構成を、図１ないし図８を参照して説明する。図５は仕切り開閉機構の外観を示す斜視図であり、図６は分割遮断部材が移動時に通過する開口側から見た拡大断面図、図７は図６のＣ−Ｃ矢視断面図、図８は駆動室側から見た拡大断面図である。
【００３３】
本実施例では、仕切り１３、１５やファンフィルターユニット１８、各処理部６Ａ〜６Ｄの上面などで囲まれた矩形の仕切り領域ＳＡを開閉するために、各分割遮断部材２０Ａ、２０Ｂは、遮断面２１が略矩形である板状の部材で構成している。
【００３４】
また、図３ないし図５に示すように、本実施例では、各分割遮断部材２０Ａ、２０Ｂが仕切り領域ＳＡに配置されたとき、遮断面２１に向かって見て、各分割遮断部材２０Ａ、２０Ｂの各遮断面２１が上下に並んで配置されるように、仕切り領域ＳＡ内に配置する第１の分割遮断部材２０Ａの配置位置（第１の配置位置）ＳＡ１と、第２の分割遮断部材２０Ｂの配置位置（第２の配置位置）ＳＡ２とは、遮断面２１に向かって見て、仕切り領域ＳＡ内に上下方向に並べて割り当てている。
【００３５】
なお、本実施例では、後述するように、第１、第２の分割遮断部材２０Ａ、２０Ｂの対向する側の各遮断面２１の間に隙間が形成された状態で、各配置位置ＳＡ１、ＳＡ２への配置、各収納領域ＰＡ1 、ＰＡ２への収納、及び、それらの間の移動を行うように構成しており、第１の配置位置ＳＡ１と第２の配置位置ＳＡ２とは、遮断面２１に向かって見て、分割遮断部材２０Ａ、２０Ｂの遮断面２１が若干重複するように設定している。
【００３６】
また、第１の収納領域ＰＡ１と第２の収納領域ＰＡ２とを、第１の配置位置ＳＡ１と第２の配置位置ＳＡ１との並び方向に沿った仕切り領域ＳＡの一側方側に設けている。なお、この第１の収納領域ＳＡ１と第２の収納領域ＳＡ２とは、各収納領域ＳＡ１、ＳＡ２に各分割遮断部材２０Ａ、２０Ｂを収納したとき、遮断面２１に向かって見て、第１、第２の分割遮断部材２０Ａ、２０Ｂの遮断面２１の少なくとも一部が重複した状態で各々収納されるように設けている。
【００３７】
そして、第１の分割遮断部材２０Ａを第１の配置位置ＳＡ１と第１の収納領域ＰＡ１との間で移動させる第１の移動機構２２Ａは、第１の分割遮断部材２０Ａの一端部を中心に、遮断面２１に向かって見て、第２の配置位置ＳＡ２を通過するように第１の分割遮断部材２０Ａを回動させて、第１の配置位置ＳＡ１と第１の収納領域ＰＡ１との間で第１の分割遮断部材２０Ａを移動させ、第２の分割遮断部材２０Ｂを第２の配置位置ＳＡ２と第２の収納領域ＰＡ２との間で移動させる第２の移動機構２２Ｂは、第２の分割遮断部材２０Ｂの一端部を中心に、遮断面２１に向かって見て、第１の配置位置ＳＡ１を通過するように第２の分割遮断部材２０Ｂを回動させて、第２の配置位置ＳＡ２と第２の収納領域ＰＡ２との間で第２の分割遮断部材２０Ｂを移動させるように構成している。
【００３８】
より具体液には、第１の分割遮断部材２０Ａを回動させる際の第１の回動軸芯Ｊ１を、第１の配置位置ＳＡ１と第２の配置位置ＳＡ１との並び方向に沿った仕切り領域ＳＡの一側方付近で、かつ、第２の配置位置ＳＡ２及び第２の収納位置ＰＡ２から離れた側の第１の配置位置ＳＡ１及び第１の収納位置ＰＡ１の端部付近に設定し、その第１の回動軸芯Ｊ１周りで、第１の分割遮断部材２０Ａの一端部（本実施例では、第１の分割遮断部材２０Ａの一つの頂点付近の端部）を中心に、遮断面２１に向かって見て、第２の配置位置ＳＡ２を通過する軌跡をとる回動方向に回動させるとともに、第２の分割遮断部材２０Ｂを回動させる際の第２の回動軸芯Ｊ２を、第１の配置位置ＳＡ１と第２の配置位置ＳＡ１との並び方向に沿った仕切り領域ＳＡの一側方付近で、かつ、第１の配置位置ＳＡ１及び第１の収納位置ＰＡ１から離れた側の第２の配置位置ＳＡ２及び第２の収納位置ＰＡ２の端部付近に設定し、その第２の回動軸芯Ｊ２周りで、第２の分割遮断部材２０Ｂの一端部（本実施例では、第２の分割遮断部材２０Ｂの一つの頂点付近の端部）を中心に、遮断面２１に向かって見て、第１の配置位置ＳＡ１を通過する軌跡をとる回動方向に回動させるように構成している。
【００３９】
そのため、本実施例の第１の移動機構２２Ａは、第１の回動軸芯Ｊ１周りで回動可能に支持され、かつ、第１の分割遮断部材２０Ａの一端部に一端側を固定した第１の回動軸部材２３Ａを、第１の駆動源２４Ａにより、第２の回動軸芯Ｊ２に対向するθ（略９０°）の回動範囲で回動させることで、第１の配置位置ＳＡ１と第１の収納領域ＰＡ１との間で第１の分割遮断部材２０Ａを移動させている。また、第２の移動機構２２Ｂも同様に、第２の回動軸芯Ｊ２周りで回動可能に支持され、かつ、第２の分割遮断部材２０Ｂの一端部に一端側を固定した第２の回動軸部材２３Ｂを、第２の駆動源２４Ｂにより、第１の回動軸芯Ｊ１に対向するθ（略９０°）の回動範囲で回動させることで、第２の配置位置ＳＡ２と第２の収納領域ＰＡ２との間で第２の分割遮断部材２０Ｂを移動させている。
【００４０】
このように構成したことにより、図４に示すように、遮断面２１に向かって見て、第１の分割遮断部材２０Ａの移動領域の一部と第２の分割遮断部材２０Ｂの移動領域の一部を重複させ、第１の分割遮断部材２０Ａの移動領域及び第２の分割遮断部材２０Ｂの移動領域の殆ど全てを、第１、第２の配置位置ＳＡ１、ＳＡ２及び第１、第２の収納領域ＰＡ１、ＰＡ２からなる領域内に収めることができる。従って、第１、第２の分割遮断部材２０Ａ、２０Ｂを移動させるための特別な移動領域を殆ど設ける必要もなくなり、仕切り領域ＳＡを開くために必要な領域をさらに小さくすることができる。
【００４１】
なお、第１、第２の回動軸芯Ｊ１、Ｊ２の位置や、第１、第２の回動軸芯Ｊ１、Ｊ２周りで回動させる第１、第２の分割遮断部材２０Ａ、２０Ｂの一端部の位置を適宜に調節することで、第１の分割遮断部材２０Ａの移動領域及び第２の分割遮断部材２０Ｂの移動領域を、第１、第２の配置位置ＳＡ１、ＳＡ２及び第１、第２の収納領域ＰＡ１、ＰＡ２からなる領域内に完全に収めることもでき、第１、第２の分割遮断部材２０Ａ、２０Ｂを移動させるための特別な移動領域を完全に無視するように構成することもできる。
【００４２】
本実施例では、第１、第２の駆動源２４Ａ、２４Ｂをエアシリンダで構成しているが、それ以外にもモーターなどで構成することもできる。なお、第１、第２の駆動源２４Ａ、２４Ｂをエアシリンダで構成すると以下のような利点がある。
【００４３】
例えば、第１、第２の駆動源２４Ａ、２４Ｂをモーターで構成した場合、通常、分割遮断部材２０Ａ、２０Ｂの遮断面２１に直交する方向に、モーターの回転軸を配置することになるが、モーター自体は、通常、モーターの回転軸方向の寸法が長いので、モーターを配置する関係で、仕切り開閉機構７は、分割遮断部材２０Ａ、２０Ｂの遮断面２１に直交する方向の寸法が大きくなる。また、モーターを駆動するための大きなドライバも配置しなければならないので、仕切り開閉機構７が大型化することになる。これに対して、第１、第２の駆動源２４Ａ、２４Ｂをエアシリンダで構成した場合、エアシリンダの長手方向となるロッド２５の伸縮方向を、分割遮断部材２０Ａ、２０Ｂの遮断面２１に平行な方向に配置することができるので、仕切り開閉機構７は、分割遮断部材２０Ａ、２０Ｂの遮断面２１に直交する方向の寸法を小さくすることできる。また、エアシリンダを駆動（ロッド２５を伸縮駆動）するためには、エアの給排管や電磁弁などを配設する必要であるが、エアの給排管は配置の自由度が高く、電磁弁は小型である。従って、第１、第２の駆動源２４Ａ、２４Ｂをエアシリンダで構成すると、仕切り開閉機構７を小型化することができる。
【００４４】
ここで、エアシリンダ２４Ａ（２４Ｂ）により回動軸部材２３Ａ（２３Ｂ）を回動させる原理を、図６ないし図８を参照して簡単に説明する。
【００４５】
すなわち、回動軸部材２３Ａ（２３Ｂ）から側方に突出された突起片２６と、エアシリンダ２４Ａ（２４Ｂ）のロッド２５の先端部を、回動軸芯Ｊ１（Ｊ２）と平行な軸芯Ｑ１（Ｑ２）周りで回動自在に連結する。これにより、ロッド２５を伸縮すると、突起片２６を押し出したり引き戻したりして、軸芯Ｊ１（Ｊ２）周りで回動可能に支持されている回動軸部材２３Ａ（２３Ｂ）を軸芯Ｊ１（Ｊ２）周りで回動させることができる。ここで、回動軸部材２３Ａ（２３Ｂ）の回動の際に、軸芯Ｑ１（Ｑ２）は、図８のＱＲ１（ＱＲ２）に示すような軌跡で移動するので、軸芯Ｑ１（Ｑ２）がこの軌跡ＱＲ１（ＱＲ２）で移動できるように、エアシリンダ２４Ａ（２４Ｂ）の基端部は軸芯Ｒ１（Ｒ２）周りで回動自在に支持している。
【００４６】
また、本実施例では、第１、第２の駆動源２４Ａ、２４Ｂを配置する駆動室２７と、第１、第２の収納領域ＰＡ１、ＰＡ２を設ける収納室２８とを完全に分離している。
【００４７】
すなわち、外壁で囲まれた容器内を、隔壁２９、３０で２つの部屋に分離し、一方の部屋を駆動室２７とし、他方の部屋を収納室２８としている。収納室２８側の外壁には、第１、第２の分割遮断部材２０Ａ、２０Ｂが移動時に通過する開口３１が形成され、駆動室２７側の外壁（開口３１と反対側の外壁）には、エアの給排管を導出するための開口（図示せず）が設けられている。
【００４８】
第１、第２の回動軸部材２３Ａ、２３Ｂは、収納時の第１、第２の分割遮断部材２０Ａ、２０Ｂと、第１、第２の駆動源２４Ａ、２４Ｂとの間に設けられた隔壁２９を貫通して、この隔壁２９に対してそれぞれ第１、第２の回動軸芯Ｊ１、Ｊ２周りで回動自在に支持されている。
【００４９】
また、第１、第２の回動軸部材２３Ａ、２３Ｂを隔壁２９に回動自在に貫通すると、第１、第２の回動軸部材２３Ａ、２３Ｂの周囲にリング状の隙間３２が残るが、本実施例では、この隙間３２も回転シール機構でシールしている。すなわち、この隙間３２の外周を覆うように先端部が隔壁２９に固定された部材３３（隔壁２９の面でもよい）に密着した柔軟なシール部材３４を第１、第２の回動軸部材２３Ａ、２３Ｂに取り付けて回転シール機構を構成している。これにより、第１、第２の回動軸部材２３Ａ、２３Ｂの回動の際もシール部材３４は、その先端部が部材３３に密着した状態を維持して第１、第２の回動軸部材２３Ａ、２３Ｂと一体的に回動し、第１、第２の回動軸部材２３Ａ、２３の回動時も上記隙間３２をシールすることができる。
【００５０】
このように、駆動室２７と収納室２８とを完全に分離したことにより、処理槽１１Ａ〜１１Ｃで扱われる薬液などの雰囲気が、開口３１や収納室２８を介して駆動室２７内に入り込むことを防止でき、薬液などで駆動源２４Ａ、２４Ｂが腐食されることを防止できる。逆に、駆動源２４Ａ、２４Ｂからの発塵が収納室２８や開口３１を介して基板群ＷＧの搬送空間や処理槽１１Ａ〜１１Ｃなどに流出することも防止でき、基板Ｗの汚染も防止することができる。
【００５１】
ところで、本実施例では、隔壁２９からの第１、第２のエアシリンダ２４Ａ、２４Ｂの距離を同じにし、第１、第２の回動軸部材２３Ａ、２３Ｂの長さを違えて、第１、第２の分割遮断部材２０Ａ、２０Ｂの対向する側の各遮断面２１の間に隙間が形成された状態で、各配置位置ＳＡ１、ＳＡ２への配置、各収納領域ＰＡ1 、ＰＡ２への収納、及び、それらの間の移動を行うように構成し、各分割遮断部材２０Ａ、２０Ｂの遮断面２１が擦れないようにしている。これにより、各分割遮断部材２０Ａ、２０Ｂの遮断面２１が擦れて発塵が起きることがなく、基板Ｗの汚染を防止することができる。
【００５２】
ここで、本実施例の構成では、仕切り領域ＳＡに配置された各分割遮断部材２０Ａ、２０Ｂの間には、遮断面２１に直交する方向に隙間が形成される。しかしながら、本実施例では、ファンフィルターユニット１８によって、仕切り領域ＳＡに配置された第１、第２の分割遮断部材２０Ａ、２０Ｂに対して上方から下方に向けて清浄な気体が流下されているので、図９（ａ）に示すように、各分割遮断部材２０Ａ、２０Ｂの各遮断面２１に沿って清浄な気流ＡＲが流下し、この気体ＡＲの流下により形成されるエアカーテンで、各分割遮断部材２０Ａ、２０Ｂの間の隙間３５を閉じられて、雰囲気の流通を遮断することができる。また、各分割遮断部材２０Ａ、２０Ｂの各遮断面２１に沿って流下する清浄な気流ＡＲによって、処理槽１１Ａ〜１１Ｃの上方空間に漂う薬液などの雰囲気が、各分割遮断部材２０Ａ、２０Ｂの各遮断面２１に触れることも防止でき、薬液などにより各分割遮断部材２０Ａ、２０Ｂが腐食されることも防止することができる。
【００５３】
なお、各仕切り領域ＳＡ付近に流下する気流ＡＲは、その流速を速くする方が上記エアカーテンによる遮断をより効果的に達成することが期待できる。そこで、図２に示すように、ファンフィルターユニット１８内のファン１７（気体供給手段）が、少なくとも各仕切り領域ＳＡの上方に配置されるように構成し、各分割遮断部材２０Ａ、２０Ｂの各遮断面２１に沿って流す（流下する）気流ＡＲの流速を任意に調節できるように構成することが好ましい。
【００５４】
また、例えば、各分割遮断部材２０Ａ、２０Ｂの遮断面２１に直交する方向に各分割遮断部材２０Ａ、２０Ｂを接離する接離手段を設けて、仕切り領域ＳＡ（第１、第２の配置位置ＳＡ１、ＳＡ２）に配置されたときには、各分割遮断部材２０Ａ、２０Ｂの対向する側の各遮断面２１の間の隙間を無くすように各分割遮断部材２０Ａ、２０Ｂを配置し、各分割遮断部材２０Ａ、２０Ｂを各配置位置ＳＡ１、ＳＡ２と各収納領域ＰＡ１、ＰＡ２との間で移動する際は、各分割遮断部材２０Ａ、２０Ｂの対向する側の各遮断面２１の間に隙間を形成した状態で各分割遮断部材２０Ａ、２０Ｂの遮断面２１が擦れないように移動させるように構成してもよい。
【００５５】
ただし、本実施例のように仕切り領域ＳＡに気流ＡＲを流す場合は、上述した変形例のように、仕切り領域ＳＡに配置されたときに、各分割遮断部材２０Ａ、２０Ｂの対向する側の各遮断面２１の間の隙間を無くすように各分割遮断部材２０Ａ、２０Ｂを配置するよりも、本実施例のように、仕切り領域ＳＡに配置されたときに、各分割遮断部材２０Ａ、２０Ｂの対向する側の各遮断面２１の間に隙間が形成されて各分割遮断部材２０Ａ、２０Ｂを配置する方が好ましい。
【００５６】
すなわち、上記変形例の構成の場合、図９（ｂ）に示すように、第１の分割遮断部材２０Ａの下端部付近と、第２の分割遮断部材２０Ｂの上端部付近とに形成される段差によって、流下される気流ＡＲに乱流ＲＲが形成され、この乱流ＲＲによって、処理槽１１Ａ〜１１Ｃの上方空間に漂う薬液などの雰囲気を巻き込んで、薬液が各分割遮断部材２０Ａ、２０Ｂの各遮断面２１に触れ、薬液などにより各分割遮断部材２０Ａ、２０Ｂが腐食されることが起こり易くなる。これに対して、本実施例の構成では、図９（ａ）に示すように、各分割遮断部材２０Ａ、２０Ｂの各遮断面２１に沿って流れる清浄な気流ＡＲが乱れ難く、上述した乱流ＲＲなどが発生し難く、各分割遮断部材２０Ａ、２０Ｂの腐食を起き難くすることができる。
【００５７】
なお、移動手段は、上記実施例の構成に限定されない。例えば、図１０に示すように、各分割遮断部材２０Ａ、２０Ｂを直線移動させて、各配置位置ＳＡ１、ＳＡ２と各収納領域ＰＡ１、ＰＡ２との間で、各分割遮断部材２０Ａ、２０Ｂを移動させることも可能である。
【００５８】
ただし、図１０に示すように、移動手段を直線移動する機構で構成すると、各分割遮断部材２０Ａ、２０Ｂを移動させるための移動領域ＩＡ１、ＩＡ２の一部が、斜線で示すように、第１、第２の配置位置ＳＡ１、ＳＡ２及び第１、第２の収納領域ＰＡ１、ＰＡ２からなる領域からはみ出るので、仕切り領域ＳＡを開くために必要な領域が大きくなる。また、各分割遮断部材２０Ａ、２０Ｂを直線移動させるためには、移動方向に沿って配設されたガイド軸に、各分割遮断部材２０Ａ、２０Ｂに連結された部材を摺動させて各分割遮断部材２０Ａ、２０Ｂを移動させることになるので、広範囲にわたって発塵し、発塵量も多くなる。これに対して、上記実施例の構成では、上述したように各分割遮断部材２０Ａ、２０Ｂを移動させるための特別な移動領域ＩＡ１、ＩＡ２を殆ど必要とせず、また、各分割遮断部材２０Ａ、２０Ｂの移動に伴って摺動して変動する部材及びその部材の変動量が少なく、それだけ発塵を少なくすることもできる。従って、図１０に示すように構成するよりも上記実施例のように構成する方が好ましい。
【００５９】
また、上記実施例では、仕切り領域ＳＡを閉じる遮断部材を２つの分割遮断部材２０Ａ、２０Ｂに分割して構成したが、３つ以上の分割遮断部材に分割してもよい。
【００６０】
３つ以上の分割遮断部材に分割する場合、例えば、図１１（ａ）に示すように、遮断面２１に向かって見て、収納時に全ての分割遮断部材２０Ａ〜２０Ｃ同士で遮断面２１が重複するように構成してもよいし、図１１（ｂ）に示すように、遮断面２１に向かって見て、収納時に一部の分割遮断部材２０Ａ、２０Ｂだけ遮断面２１が重複するように構成してもよし、図１２に示すように、遮断面２１に向かって見て、グループ分けされた分割遮断部材２０Ａ、２０Ｂ同士、及び分割遮断部材２０Ｃ、２０Ｄ同士で、それぞれ収納時に遮断面２１が重複するように構成してもよい。
【００６１】
なお、図１１、図１２中の、符号ＳＡ３、ＳＡ４は、分割遮断部材２０Ｃ、２０Ｄそれぞれに割り当てた仕切り領域ＳＡ内の配置位置であり、ＰＡ３、ＰＡ４は、分割遮断部材２０Ｃ、２０Ｄそれぞれの収納領域、Ｊ３、Ｊ４は、分割遮断部材２０Ｃ、２０Ｄそれぞれの移動の際の回動軸芯である。
【００６２】
また、例えば、図１１に示すように、３つ以上の分割遮断部材２０のうちの２つの分割遮断部材２０Ａ、２０Ｂを上記実施例のように構成してもよいし、例えば、図１２に示すように、複数の分割遮断部材２０を２つの分割遮断部材２０ずつにグループ分けして、各グループごとに上記実施例のように構成し、上記実施例を複数組備えて仕切り領域ＳＡを閉じるように構成してもよい。
【００６３】
また、遮断面２１に向かって見て、遮断面２１を重複させて収納する分割遮断部材同士は、収納時に、各分割遮断部材の遮断面２１の一部だけが重複するように構成してもよいし、各分割遮断部材の遮断面２１の全体が完全に重複するように構成してもよい。
【００６４】
さらに、ある分割遮断部材の収納領域は、上記実施例や変形例の図に示すように、その分割遮断部材に割り当てた仕切り領域内の配置位置と隣接するように設けてもよいが、本発明はそれに限定されず、ある分割遮断部材の収納領域を、その分割遮断部材に割り当てた仕切り領域内の配置位置から離れた位置や、配置位置と一部が重複する位置などに設けてもよい。
【００６５】
また、複数の分割遮断部材の遮断面は、全て同じ形状で同じ大きさである必要はなく、仕切り領域ＳＡの形状や大きさなどに応じて、形状や大きさが種々に異なる遮断面を持つ複数の分割遮断部材で構成してもよい。
【００６６】
また、上記実施例では、複数の処理槽１１Ａ〜１１Ｃの上方空間の間を仕切り領域ＳＡとして、その仕切り領域ＳＡの開閉に本発明を適用する場合を例に採ったが、本発明はこのような適用形態に限定されない。例えば、チャンバで囲まれた基板処理部と、そのチャンバの外側に設けられた基板搬送空間とを備え、チャンバに形成された基板搬入搬出口を介して基板搬送空間から基板処理部内に対する基板の搬入搬出を行うように構成された基板処理装置において、基板搬入搬出口を仕切り領域としてその仕切り領域（基板搬入搬出口）を開閉する場合などにも本発明を適用することができる。
【００６７】
また、上記実施例は、基板を一括して処理するバッチ式の基板処理装置を例に採ったが、本発明はこれに限定されず、基板を１枚ずつ処理する枚葉式の基板処理装置にも本発明を適用することができる。
【００６８】
【発明の効果】
以上の説明から明らかなように、請求項１に記載の発明によれば、仕切り領域を閉じる遮断部材を複数の分割遮断部材に分割し、これら各分割遮断部材の収納時に、分割遮断部材の遮断面に向かって見て、少なくとも一部の分割遮断部材同士の遮断面の少なくとも一部が重複した状態で収納領域に収納されるように構成したので、仕切り領域において必要とされる遮断面積を遮断することができるとともに、収納領域を小さくすることができる。
【００６９】
また、複数の分割遮断部材を構成する第１の分割遮断部材と第２の分割遮断部材とをそれぞれ回動させて、各配置位置と各収納領域との間を移動させ、このとき、第１の分割遮断部材の移動領域の一部と第２の分割遮断部材の移動領域の一部を重複させ、第１の分割遮断部材の移動領域及び第２の分割遮断部材の移動領域の殆ど全てを、第１、第２の配置位置及び第１、第２の収納領域からなる領域内に収めることができるように構成したので、第１、第２の分割遮断部材を移動させるための特別な移動領域を設ける必要もなくなり、仕切り領域を開くために必要な領域をさらに小さくすることができる。
【００７０】
また、例えば、第１、第２の分割遮断部材を直線移動させる場合に比べて、第１、第２の分割遮断部材の移動に伴う発塵を少なくすることができ、基板の汚染なども抑制することができる。
【００７１】
さらに、第１、第２の分割遮断部材を回動させる部分を回転シールするだけで、移動手段を構成する駆動源（アクチュエアータ）と、第１、第２の分割遮断部材とを完全に分離することも可能になり、薬液などの雰囲気で移動手段の駆動源が腐食されることを防止できるとともに、駆動源からの発塵で基板が汚染されることも防止することができる。
【図面の簡単な説明】
【図１】本発明の一実施例に係る基板処理装置の全体的な構成を示す平面図である。
【図２】図１のＡ−Ａ矢視断面図である。
【図３】図１のＢ−Ｂ矢視断面図である。
【図４】仕切り領域と第１、第２の配置位置と第１、第２の収納領域との位置関係を示す図である。
【図５】仕切り開閉機構の外観を示す斜視図である。
【図６】仕切り開閉機構を分割遮断部材が移動時に通過する開口側から見た拡大断面図である。
【図７】図６のＣ−Ｃ矢視断面図である。
【図８】仕切り開閉機構を駆動室側から見た拡大断面図である。
【図９】仕切り領域に気流を流下させる場合に各分割部材の分割部分に隙間を形成した状態と隙間を無くした状態とで気流の流れを比較した図である。
【図１０】移動手段の変形例を示す図である。
【図１１】分割遮断部材を３つで構成する場合の変形例を示す図である。
【図１２】分割遮断部材を４つで構成する場合の変形例を示す図である。
【図１３】従来装置の要部構成を示す斜視図である。
【図１４】従来の仕切り開閉機構の概略構成を示す図である。
【符号の説明】
７：仕切り開閉機構
２０Ａ〜２０Ｄ：分割遮断部材
２１：遮断面
２２Ａ、２２Ｂ：移動機構
２４Ａ、２４Ｂ：駆動源（エアシリンダ）
Ｗ：基板
ＳＡ：仕切り領域
ＳＡ１〜ＳＡ４：各分割遮断部材に割り当てられた仕切り領域内の配置位置
ＰＡ１〜ＰＡ４：各分割遮断部材の収納領域
Ｊ１〜Ｊ４：各分割遮断部材の回動軸芯[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a substrate processing apparatus for processing a substrate such as a semiconductor wafer, a glass substrate for a liquid crystal display, a glass substrate for a photomask, or a substrate for an optical disk, and in particular, blocking the circulation of the atmosphere in the apparatus. The present invention relates to a technique for improving a substrate processing apparatus including partition opening / closing means for opening and closing a partition region by moving a blocking member between a predetermined partition region and a storage region.
[0002]
[Prior art]
As this type of substrate processing apparatus, for example, as shown in FIG. 13, there is an apparatus provided with a plurality of processing tanks 100 A and 100 B for collectively processing a plurality of substrates. In this apparatus, the processing liquid is stored in the processing tanks 100A and 100B, and a plurality of substrates are sequentially immersed in the processing liquid stored in the processing tanks 100A and 100B and processed. The plurality of substrates are held together by a substrate transport mechanism (not shown) in the upper space of each processing bath 100A, 100B and transported along the transport direction 101.
[0003]
By the way, the atmosphere of the upper space of the processing tank 100A includes components of the processing liquid stored in the processing tank 100A, while the atmosphere of the upper space of the processing tank 100B has the processing liquid stored in the processing tank 100B. Of ingredients. There is no particular problem when the processing liquid stored in each processing tank 100A, 100B is the same, but when the processing liquid stored in each processing tank 100A, 100B is different, the atmosphere in the upper space of the processing tank 100A The atmosphere in the upper space of the processing bath 100B may mix with each other to cause a chemical reaction and adversely affect the substrate.
[0004]
Therefore, in this type of apparatus, in order to block the circulation of the atmosphere between the upper space of the processing bath 100A and the upper space of the processing bath 100B, the upper space of the processing bath 100A and the upper space of the processing bath 100B A partition opening / closing mechanism for opening and closing the partition region is provided. That is, the partition area SA is opened only when the substrate is transferred from the processing tank 100A to the processing tank 100B, and the partition area SA is closed otherwise, and the atmosphere in the space above the processing tank 100A and the atmosphere in the space above the processing tank 100B. Is suppressed from mixing with each other.
[0005]
A conventional substrate processing apparatus provided with such a partition opening / closing mechanism is disclosed in, for example, Japanese Patent Laid-Open No. 10-335285. That is, as shown in FIGS. 13 and 14, the partition area SA is opened and closed by moving one blocking member 110 between the partition area SA and the storage area PA. The movement of the blocking member 110 between the partition area SA and the storage area PA is, for example, performed by linear movement as shown in FIGS. 13 and 14A, or as shown in FIG. 14B. As described above, there is one that is performed by a rotation operation around one axis J.
[0006]
[Problems to be solved by the invention]
However, the conventional example having such a configuration has the following problems.
The conventional apparatus opens and closes the partition area SA by moving one blocking member 110 having a blocking surface 111 having a blocking area required in the partition area SA between the partition area SA and the storage area PA. Therefore, a region having the same area as the partition region SA must be secured in the direction of the blocking surface 111 of the blocking member 110 as the storage region PA. In addition, in the configuration in which the blocking member 110 is moved by the rotation operation shown in FIG. 14B, an extra movement area IA indicated by the oblique lines for rotating the blocking member 110 must be secured in addition to that. .
[0007]
For this reason, restrictions are placed on the arrangement of members (such as storage tanks for processing liquids) incorporated in the equipment and the securing of wiring, piping, and maintenance areas within the equipment, and the equipment becomes larger and the maintenance area is secured. This causes problems such as difficulty in carrying out maintenance work.
[0008]
The present invention has been made in view of such circumstances, and can block the blocking area required in the partition area and reduce the area necessary for opening the partition area such as a storage area. It is an object of the present invention to provide a substrate processing apparatus that can perform the above processing.
[0009]
[Means for Solving the Problems]
In order to achieve such an object, the present invention has the following configuration.
That is, according to the first aspect of the present invention, the atmosphere is circulated in the substrate transfer space. Shut off To do Formed in the substrate transfer space Partition area and , In the substrate processing apparatus provided with the partition opening / closing means for moving the blocking member between the storage area and opening / closing the partition area, the partition opening / closing means divides the blocking member into a plurality of divided blocking members, and Moving means for moving each of the divided blocking members between each of the arrangement positions assigned to each of the divided blocking members so as to close the partition area and each storage area provided for each of the divided blocking members. And when each of the divided blocking members is stored in each of the storage areas, at least some of the divided blocking members are at least of the blocking surfaces of the divided blocking members when viewed toward the blocking surfaces of the divided blocking members. A first divided blocking member that is configured by providing each of the storage areas so as to be stored in each of the storage areas in a partially overlapping state, and that constitutes the plurality of divided blocking members A first arrangement position of the first divided blocking member and a second arrangement position of the second divided blocking member which are arranged in the partition area are arranged in the partition area. The first storage area and the second storage area for storing the first divided blocking member and the second divided blocking member, respectively, are arranged side by side on the blocking surface of the divided blocking member with respect to the partition area. The second disposition is provided at a position on one lateral side along the second arrangement as viewed from the end of the first divided blocking member toward the blocking surface of the first divided blocking member. The first divided blocking member is rotated so as to pass through the position, and the first divided blocking member is moved between the first arrangement position and the first storage region, and the first The blocking surface of the second divided blocking member centering on one end of the two divided blocking members The second divided blocking member is rotated so as to pass through the first arrangement position when viewed from the top, and the second division position is between the second arrangement position and the second storage area. The division blocking member is configured to move.
[0010]
According to a second aspect of the present invention, in the substrate processing apparatus of the first aspect, A plurality of processing units each provided with a processing tank for processing a substrate, and a substrate transfer mechanism that horizontally moves in an upper space of each processing unit and transfers the substrate to each processing unit, the partition region, Between the upper space of each processing tank provided in the processing unit It is characterized by this.
[0011]
[Action]
The operation of the first aspect of the invention is as follows.
The blocking member for closing the partition region is divided into a plurality of divided blocking members. The moving means moves each divided blocking member between each arrangement position assigned to each divided blocking member so as to close the partition area and each storage area provided for each divided blocking member.
[0012]
When each divided blocking member is arranged at the assigned position, the partition area is closed, and when it is stored in each storage area, the partition area is opened.
[0013]
And when each division | segmentation interruption | blocking member is accommodated in each storage area, at least one part of division | segmentation interruption | blocking members mutually sees toward the interruption | blocking surface of a division | segmentation interruption | blocking member, and at least one part of the interruption | blocking surface of these division | segmentation interruption | blocking members overlaps. Each storage area is provided so as to be stored in each storage area in this state.
[0014]
The divided blocking members stored in the storage area in a state where at least a part of the blocking surface overlaps may be all the divided blocking members, or may be some of the divided blocking members among the plurality of divided blocking members. And the division | segmentation interruption | blocking members in each group at the time of dividing a some division | segmentation interruption | blocking member into a some group may be sufficient.
[0015]
Also, Two divided blocking members constituting the plurality of divided blocking members are configured as first and second divided blocking members as follows. The invention according to claim 2 is not limited to the case where the divided blocking member is composed of only two members. For example, the divided blocking member is composed of three members, and the two divided blocking members are first, The second divided blocking member may be configured as follows, or may be configured with four divided blocking members, each divided into two groups with two divided blocking members, and configured as follows for each group. May be.
[0016]
That is, the 1st division | segmentation interruption | blocking member which arrange | positions a 1st division | segmentation interruption | blocking member and a 2nd division | segmentation interruption | blocking member in a partition area | region And a first arrangement position of Second divided blocking member A second arrangement position of Are arranged side by side in the partition area, and the first storage area and the second storage area for storing the first divided blocking member and the second divided blocking member are respectively assigned to the partition area. Along the blocking surface of the split blocking member One side Position of Provided. The first storage area and the second storage area are the first and second divided blocks when viewed from the divided blocking member when the divided blocking members are stored in the respective storage areas. It is provided so that at least a part of the blocking surface of the member is accommodated in an overlapping state.
[0017]
And the moving means is centered on one end of the first divided blocking member, First The first divided blocking member is rotated so as to pass through the second arrangement position when viewed toward the blocking surface of the divided blocking member, and the first division position and the first storage area are moved to the first position. While moving the 1 division | segmentation interruption | blocking member, focusing on the one end part of a 2nd division | segmentation interruption | blocking member Second The second divided blocking member is rotated so as to pass through the first arrangement position when viewed toward the blocking surface of the divided blocking member, and the second division position and the second storage area are moved to the first position. 2 split blocking members are moved.
[0018]
DETAILED DESCRIPTION OF THE INVENTION
Embodiments of the present invention will be described below with reference to the drawings.
1 is a plan view showing the overall configuration of a substrate processing apparatus according to an embodiment of the present invention, FIG. 2 is a cross-sectional view taken along the line AA in FIG. 1, and FIG. 3 is an arrow along the line BB in FIG. FIG. 4 is a view showing the positional relationship between the partition area, the first and second arrangement positions, and the first and second storage areas.
[0019]
This embodiment apparatus is a batch type processing apparatus capable of processing a plurality of substrates W (substrate group WG) in a lump, and includes a carrier stocker 1, a substrate transfer robot 2, an attitude change robot 3, and a substrate. A delivery robot 4, a substrate transport mechanism 5, processing units 6 A to 6 D, a partition opening / closing mechanism 7 corresponding to partition opening / closing means, and the like are provided.
[0020]
The carrier stocker 1 is for transporting or temporarily storing a carrier C that accommodates a plurality of substrates W. A carrier storage unit (not shown) that temporarily stores the carrier C, a carrier C A carrier transport mechanism 10 for transporting The carrier transport mechanism 10 includes a carrier storage unit, a loading / unloading position P1 for loading / unloading the carrier C, and a transfer position P2 where the substrate transfer robot 2 takes out / accommodates each substrate W with respect to the carrier C. The carrier C is transported. In the carrier stocker 1, the carrier C is handled in a state where each substrate W is stored in a horizontal posture.
[0021]
The substrate transfer robot 2 takes out the unprocessed substrate W from the carrier C placed at the transfer position P2 and delivers it to the posture changing robot 3, or receives the processed substrate W from the posture changing robot 3 and transfers it. A transfer operation of a plurality of substrates W to be stored in the carrier C placed at the position P2 is performed. The transfer operation of the substrate W by the substrate transfer robot 2 is also performed with the substrate W in a horizontal posture.
[0022]
The posture changing robot 3 rotates around the horizontal axis while holding a plurality of substrates W arranged in parallel, and each substrate W is arranged in the vertical direction in the horizontal posture, and in the horizontal direction in the vertical posture. The posture is changed between the arranged states.
[0023]
The substrate delivery robot 4 delivers the substrate group WG arranged in the horizontal direction in the vertical posture between the posture changing robot 3 and the substrate transport mechanism 5 (the clamping mechanism 5a). Note that the transfer of the substrate W by the substrate transfer robot 4, the transfer of the substrate W by the substrate transfer mechanism 5 described later, and the processing in each of the processing units 6A to 6D are performed with the substrate W in a vertical posture.
[0024]
The substrate transport mechanism 5 includes a pair of clamping mechanisms 5a and a horizontal movement mechanism unit 5b that horizontally moves the clamping mechanism 5a in the arrangement direction of the processing units 6A to 6D, and is a group of substrates arranged in a horizontal direction in a vertical posture. The WG is collectively clamped by the clamping mechanism 5a, horizontally moved above the processing units 6A to 6D, and the substrates W are sequentially transferred to the processing units 6A to 6D.
[0025]
The processing units 6A to 6C each include processing tanks 11A to 11C that store the processing liquid, immerse the substrate group WG in the processing liquid, and collectively process the plurality of substrates W with the processing liquid. Each is provided with a lifting mechanism 12 that holds the group WG and lifts the group WG in a lump. The lifting mechanism 12 receives the unprocessed substrate group WG from the clamping mechanism 5a of the substrate transport mechanism 5 and immerses it in the processing tanks 11A to 11C, or lifts the processed substrate group WG from the processing tanks 11A to 11C and transports the substrate. It is handed over to the clamping mechanism 5a of the mechanism 5.
[0026]
The processing unit 6D performs processing for rotating and drying the substrate group WG. The processing unit 6D is also provided with a lifting mechanism (not shown) that performs the same operation as the lifting mechanism 12, so that the substrate group WG is transferred between the clamping mechanism 5a of the substrate transport mechanism 5 and the processing unit 6D. It is composed.
[0027]
A partition 13 is provided between the horizontal movement mechanism 5b of the substrate transport mechanism 5 and the upper space (transport space of the substrate group WG) of the processing units 6A to 6D, and the transport space and maintenance area of the substrate group WG are provided. 14 is also provided with a partition 15.
[0028]
Further, a filter 16 for removing dust and a fan 17 for sending gas downward are provided at the ceiling between the space where the horizontal movement mechanism 5b of the substrate transport mechanism 5 is disposed and the transport space of the substrate group WG. A fan filter unit 18 is provided, and clean gas flows down into the space where the horizontal movement mechanism 5b of the substrate transport mechanism 5 is disposed and the transport space of the substrate group WG.
[0029]
In the present embodiment, the types of processing liquids stored in the processing tanks 11A to 11C are all different, and the flow of the atmosphere between the upper space of the processing tank 11A and the upper space of the processing tank 11B is blocked and the processing is performed. In order to block the circulation of the atmosphere between the upper space of the tank 11B and the upper space of the processing tank 11C, between the upper space of the processing tank 11A and the upper space of the processing tank 11B, and above the processing tank 11B. A space between the space and the upper space of the processing tank 11C is defined as a partition area SA, and a partition opening / closing mechanism 7 is provided for each partition area SA.
[0030]
Although details will be described later, each of the partition opening / closing mechanisms 7 has a plurality of (two in this embodiment) divided blocking members (the first divided blocking member 20A and the second divided blocking block) that close the partition area SA. Each of the divided blocking members 20A and 20B allocated to each of the divided blocking members 20A and 20B so as to close the partition area SA (a state in which the divided blocking members 20A and 20B are indicated by solid lines in FIGS. 1 to 3). 4 and SA1 and SA2 in FIG. 4 and storage areas provided for each of the divided blocking members 20A and 20B in an area outside the partition area SA (in FIG. 2 and FIG. 3, each divided blocking member 20A, 20B is a position in a state indicated by a two-dot chain line, and the first and second corresponding to the moving means for moving each of the divided blocking members 20A and 20B between PA1 and PA2) in FIG. Movement mechanism (Details) When the divided blocking members 20A and 20B are stored in the storage areas PA1 and PA2, as shown in FIGS. 3 and 4, the divided blocking members 20A and 20B are Each storage area PA1, PA2 is provided so as to be stored in each storage area PA1, PA2 with at least a part of the blocking surface 21 of the divided blocking members 20A, 20B overlapped when viewed toward the blocking surface 21. Configured.
[0031]
With this configuration, the blocking area required in the partition area SA can be blocked, and the entire storage area PA (see FIG. 4) including the first and second storage areas PA1 and PA2 is combined. The area in the direction of the blocking surface 21 can be reduced, and the storage areas PA1 and PA2 can be configured compactly.
[0032]
Next, a detailed configuration of the partition opening / closing mechanism 7 which is a main part of the present invention will be described with reference to FIGS. 5 is a perspective view showing an appearance of the partition opening / closing mechanism, FIG. 6 is an enlarged cross-sectional view seen from the opening side through which the divided blocking member passes during movement, and FIG. 7 is a cross-sectional view taken along the line CC in FIG. 8 is an enlarged cross-sectional view seen from the drive chamber side.
[0033]
In the present embodiment, in order to open and close the rectangular partition area SA surrounded by the partitions 13 and 15, the fan filter unit 18, the upper surfaces of the processing units 6 A to 6 D, the divided blocking members 20 A and 20 B Reference numeral 21 denotes a plate-like member having a substantially rectangular shape.
[0034]
Further, as shown in FIGS. 3 to 5, in this embodiment, when each divided blocking member 20A, 20B is arranged in the partition region SA, when viewed toward the blocking surface 21, each divided blocking member 20A, 20B. An arrangement position (first arrangement position) SA1 of the first divided blocking member 20A arranged in the partition area SA and a second divided blocking member 20B so that the respective blocking surfaces 21 are arranged side by side vertically. The second arrangement position (second arrangement position) SA2 is assigned in the vertical direction in the partition area SA when viewed toward the blocking surface 21.
[0035]
In the present embodiment, as will be described later, the arrangement positions SA1 and SA2 are formed with a gap formed between the blocking surfaces 21 on the opposite sides of the first and second divided blocking members 20A and 20B. The first arrangement position SA1 and the second arrangement position SA2 are arranged on the blocking surface 21 so as to perform the arrangement in the storage areas PA1, PA2, and the movement between them. When viewed from the front, the blocking surfaces 21 of the divided blocking members 20A and 20B are set to overlap slightly.
[0036]
In addition, the first storage area PA1 and the second storage area PA2 are provided on one side of the partition area SA along the alignment direction of the first arrangement position SA1 and the second arrangement position SA1. . Note that the first storage area SA1 and the second storage area SA2 are the first storage area SA1 and the second storage area SA2, when the divided blocking members 20A and 20B are stored in the storage areas SA1 and SA2, respectively. At least a part of the blocking surface 21 of the second divided blocking member 20A, 20B is provided so as to be accommodated in an overlapping state.
[0037]
The first moving mechanism 22A that moves the first divided blocking member 20A between the first arrangement position SA1 and the first storage area PA1 is centered on one end of the first divided blocking member 20A. The first divided blocking member 20A is rotated so as to pass through the second arrangement position SA2 when viewed toward the blocking surface 21, and between the first arrangement position SA1 and the first storage area PA1. The second moving mechanism 22B that moves the first divided blocking member 20A and moves the second divided blocking member 20B between the second arrangement position SA2 and the second storage area PA2 is The second divided blocking member 20B is rotated so as to pass through the first arrangement position SA1 when viewed from the blocking surface 21 around the one end portion of the divided blocking member 20B, and the second arrangement position SA2 And a second divided blocking member between the first storage area PA2 and the second storage area PA2 It is configured to move the 0B.
[0038]
More specifically, for the liquid, the first rotation axis J1 when the first divided blocking member 20A is rotated is divided along the arrangement direction of the first arrangement position SA1 and the second arrangement position SA1. Set near one side of the area SA and near the end of the first placement position SA1 and the first storage position PA1 on the side away from the second placement position SA2 and the second storage position PA2. Around the first rotation axis J1, the blocking surface is centered on one end of the first divided blocking member 20A (in this embodiment, the end near one vertex of the first divided blocking member 20A). The second rotation axis J2 when rotating the second division blocking member 20B while rotating in the rotation direction taking a locus passing through the second arrangement position SA2 as viewed toward 21. The partition region S along the arrangement direction of the first arrangement position SA1 and the second arrangement position SA1 Near the end of the second arrangement position SA2 and the second storage position PA2 on the side away from the first arrangement position SA1 and the first storage position PA1. 2 around the rotation axis J2 of the second split blocking member 20B with the blocking surface 21 centered on one end of the second split blocking member 20B (in the present embodiment, the end near one vertex of the second split blocking member 20B). It is configured to rotate in a rotation direction that takes a trajectory passing through the first arrangement position SA1 when viewed from the front.
[0039]
Therefore, the first moving mechanism 22A of the present embodiment is supported so as to be rotatable around the first rotation axis J1, and one end side is fixed to one end of the first divided blocking member 20A. The first rotation shaft member 23A is rotated by a first drive source 24A within a rotation range of θ (approximately 90 °) facing the second rotation shaft core J2, so that the first arrangement position is reached. The first division blocking member 20A is moved between SA1 and the first storage area PA1. Similarly, the second moving mechanism 22B is supported so as to be rotatable around the second rotation axis J2, and one end side is fixed to one end of the second divided blocking member 20B. The rotation shaft member 23B is rotated by a second drive source 24B in a rotation range of θ (substantially 90 °) facing the first rotation axis J1, and the second arrangement position SA2 The second division blocking member 20B is moved between the second storage area PA2.
[0040]
With this configuration, as shown in FIG. 4, when viewed toward the blocking surface 21, a part of the moving area of the first divided blocking member 20A and one of the moving areas of the second divided blocking member 20B are seen. The first and second arrangement positions SA1 and SA2 and the first and second storages are almost completely stored in the moving area of the first divided blocking member 20A and the moving area of the second divided blocking member 20B. It can be accommodated in an area composed of areas PA1 and PA2. Therefore, it is not necessary to provide a special movement area for moving the first and second divided blocking members 20A and 20B, and the area necessary for opening the partition area SA can be further reduced.
[0041]
Note that the positions of the first and second rotating shaft cores J1 and J2 and the first and second divided blocking members 20A and 20B that rotate around the first and second rotating shaft cores J1 and J2 are as follows. By appropriately adjusting the position of the one end, the moving region of the first divided blocking member 20A and the moving region of the second divided blocking member 20B are changed to the first and second arrangement positions SA1, SA2, and the first, It can also be completely accommodated in the area composed of the second accommodation areas PA1, PA2, and is configured to completely ignore the special movement area for moving the first and second divided blocking members 20A, 20B. You can also.
[0042]
In the present embodiment, the first and second drive sources 24A and 24B are constituted by air cylinders, but they can also be constituted by motors or the like. If the first and second drive sources 24A and 24B are composed of air cylinders, there are the following advantages.
[0043]
For example, when the first and second drive sources 24A and 24B are configured by motors, the rotation shaft of the motor is usually arranged in a direction perpendicular to the blocking surface 21 of the divided blocking members 20A and 20B. Since the motor itself usually has a long dimension in the rotation axis direction of the motor, the dimension of the partition opening / closing mechanism 7 in the direction orthogonal to the blocking surface 21 of the divided blocking members 20A and 20B is increased due to the arrangement of the motor. In addition, since a large driver for driving the motor must be arranged, the partition opening / closing mechanism 7 is increased in size. On the other hand, when the first and second drive sources 24A and 24B are formed of air cylinders, the expansion / contraction direction of the rod 25, which is the longitudinal direction of the air cylinder, is parallel to the blocking surfaces 21 of the divided blocking members 20A and 20B. Since the partition opening / closing mechanism 7 can be arranged in any direction, the dimension in the direction orthogonal to the blocking surfaces 21 of the divided blocking members 20A and 20B can be reduced. In order to drive the air cylinder (the rod 25 is extended and retracted), it is necessary to provide an air supply / exhaust pipe, an electromagnetic valve, and the like. The valve is small. Therefore, when the first and second drive sources 24A and 24B are formed of air cylinders, the partition opening / closing mechanism 7 can be reduced in size.
[0044]
Here, the principle of rotating the rotating shaft member 23A (23B) by the air cylinder 24A (24B) will be briefly described with reference to FIGS.
[0045]
That is, the protruding piece 26 protruding laterally from the rotating shaft member 23A (23B) and the tip of the rod 25 of the air cylinder 24A (24B) are connected to the axis Q1 parallel to the rotating axis J1 (J2). (Q2) It connects so that it can rotate freely. Thus, when the rod 25 is expanded or contracted, the protruding piece 26 is pushed out or pulled back, and the rotating shaft member 23A (23B) supported so as to be rotatable around the shaft core J1 (J2) is moved to the shaft core J1 (J2). ) Can be rotated around. Here, when the rotation shaft member 23A (23B) is rotated, the axis Q1 (Q2) moves along a locus shown by QR1 (QR2) in FIG. 8, and therefore the axis Q1 (Q2) is moved. The base end portion of the air cylinder 24A (24B) is rotatably supported around the axis R1 (R2) so that it can move along the locus QR1 (QR2).
[0046]
In this embodiment, the drive chamber 27 in which the first and second drive sources 24A and 24B are arranged and the storage chamber 28 in which the first and second storage areas PA1 and PA2 are provided are completely separated. .
[0047]
That is, the inside of the container surrounded by the outer wall is separated into two rooms by the partition walls 29 and 30, one room is a drive room 27, and the other room is a storage room 28. An opening 31 through which the first and second divided blocking members 20A and 20B pass during movement is formed on the outer wall on the storage chamber 28 side, and an outer wall on the drive chamber 27 side (an outer wall opposite to the opening 31) An opening (not shown) for leading the air supply / discharge pipe is provided.
[0048]
The first and second rotating shaft members 23A and 23B are provided between the first and second divided blocking members 20A and 20B during storage and the first and second drive sources 24A and 24B. It penetrates the partition wall 29 and is supported by the partition wall 29 so as to be rotatable around the first and second rotation axes J1 and J2.
[0049]
Further, when the first and second rotating shaft members 23A and 23B are pivoted through the partition wall 29, a ring-shaped gap 32 remains around the first and second rotating shaft members 23A and 23B. In the present embodiment, this gap 32 is also sealed by the rotary seal mechanism. That is, the first and second rotating shaft members 23 A are provided with the flexible sealing member 34 that is in close contact with a member 33 (or the surface of the partition wall 29) whose tip is fixed to the partition wall 29 so as to cover the outer periphery of the gap 32. , 23B to constitute a rotary seal mechanism. As a result, the seal member 34 maintains the state in which the tip end thereof is in close contact with the member 33 even when the first and second rotation shaft members 23A and 23B are rotated. The gaps 32 can be sealed even when the first and second rotary shaft members 23A and 23 are rotated by rotating integrally with the members 23A and 23B.
[0050]
As described above, the drive chamber 27 and the storage chamber 28 are completely separated, so that an atmosphere such as a chemical solution handled in the processing tanks 11 A to 11 C enters the drive chamber 27 through the opening 31 and the storage chamber 28. It is possible to prevent the drive sources 24A and 24B from being corroded by a chemical solution or the like. Conversely, dust generation from the drive sources 24A and 24B can be prevented from flowing into the transfer space of the substrate group WG, the processing tanks 11A to 11C, etc. via the storage chamber 28 and the opening 31, and contamination of the substrate W can be prevented. be able to.
[0051]
By the way, in the present embodiment, the distance between the first and second air cylinders 24A and 24B from the partition wall 29 is made the same, and the lengths of the first and second rotating shaft members 23A and 23B are made different. In the state where gaps are formed between the respective blocking surfaces 21 on the opposite sides of the second divided blocking members 20A and 20B, the arrangement at the respective arrangement positions SA1 and SA2, the storage in the respective storage areas PA1 and PA2, And it is comprised so that the movement between them may be performed, and the interruption | blocking surface 21 of each division | segmentation interruption | blocking member 20A, 20B is made not to rub. As a result, the blocking surfaces 21 of the divided blocking members 20A and 20B are not rubbed to generate dust, and contamination of the substrate W can be prevented.
[0052]
Here, in the configuration of the present embodiment, a gap is formed in a direction orthogonal to the blocking surface 21 between the divided blocking members 20A and 20B arranged in the partition region SA. However, in the present embodiment, the fan filter unit 18 causes clean gas to flow downward from above to the first and second divided blocking members 20A and 20B arranged in the partition area SA. As shown in FIG. 9 (a), a clean airflow AR flows down along each blocking surface 21 of each divided blocking member 20A, 20B, and each divided blocking is performed by an air curtain formed by the flow of this gas AR. The gap 35 between the members 20A and 20B can be closed to block the circulation of the atmosphere. In addition, the atmosphere such as a chemical drifting in the upper space of the processing tanks 11A to 11C is caused by the clean airflow AR flowing along the respective blocking surfaces 21 of the respective divided blocking members 20A and 20B. Touching the blocking surface 21 can be prevented, and the divided blocking members 20A and 20B can be prevented from being corroded by a chemical solution or the like.
[0053]
In addition, it can be expected that the airflow AR flowing down in the vicinity of each partition area SA is more effectively blocked by the air curtain if the flow velocity is increased. Therefore, as shown in FIG. 2, the fan 17 (gas supply means) in the fan filter unit 18 is configured to be disposed at least above each partition region SA, and each of the divided blocking members 20A and 20B is blocked. It is preferable that the flow velocity of the airflow AR flowing (flowing down) along the surface 21 is arbitrarily adjusted.
[0054]
In addition, for example, contact / separation means for contacting / separating each divided blocking member 20A, 20B in a direction orthogonal to the blocking surface 21 of each divided blocking member 20A, 20B is provided, and the partition area SA (first and second arrangement positions) is provided. When arranged in SA1, SA2), each divided blocking member 20A, 20B is arranged so as to eliminate a gap between each blocking surface 21 on the opposite side of each divided blocking member 20A, 20B, and each divided blocking member 20A. , 20B when moving between the respective arrangement positions SA1, SA2 and the respective storage areas PA1, PA2, with gaps formed between the respective blocking surfaces 21 on the opposite sides of the respective divided blocking members 20A, 20B. You may comprise so that the interruption | blocking surface 21 of each division | segmentation interruption | blocking member 20A, 20B may be moved so that it may not rub.
[0055]
However, when the air flow AR flows in the partition area SA as in the present embodiment, each of the divided blocking members 20A and 20B on the opposite side when arranged in the partition area SA as in the modification described above. Rather than arrange | positioning each division | segmentation interruption | blocking member 20A, 20B so that the clearance gap between the interruption | blocking surfaces 21 may be eliminated, when arrange | positioned in partition area SA like a present Example, each division | segmentation interruption | blocking member 20A, 20B opposes. It is preferable that a gap is formed between each blocking surface 21 on the side to be disposed and the respective divided blocking members 20A and 20B are arranged.
[0056]
That is, in the case of the configuration of the modified example, as shown in FIG. 9B, a step formed between the lower end portion of the first divided blocking member 20A and the upper end portion of the second divided blocking member 20B. As a result, a turbulent flow RR is formed in the flowing down airflow AR, and the turbulent flow RR entrains an atmosphere such as a chemical liquid drifting in the upper space of the treatment tanks 11A to 11C, so that the chemical liquid is in each of the divided blocking members 20A and 20B. Touching the blocking surface 21, the divided blocking members 20 A and 20 B are easily corroded by a chemical solution or the like. On the other hand, in the configuration of the present embodiment, as shown in FIG. 9A, the clean airflow AR flowing along the respective blocking surfaces 21 of the respective divided blocking members 20A and 20B is not easily disturbed. RR or the like hardly occurs, and corrosion of each of the divided blocking members 20A and 20B can be made difficult to occur.
[0057]
In addition, a moving means is not limited to the structure of the said Example. For example, as shown in FIG. 10, the divided blocking members 20A and 20B are linearly moved to move the divided blocking members 20A and 20B between the arrangement positions SA1 and SA2 and the storage areas PA1 and PA2. It is also possible.
[0058]
However, as shown in FIG. 10, when the moving means is configured by a mechanism that linearly moves, a part of the moving areas IA1 and IA2 for moving each of the divided blocking members 20A and 20B is indicated by the diagonal lines. Since the second arrangement positions SA1 and SA2 and the first and second storage areas PA1 and PA2 protrude from the area, the area necessary for opening the partition area SA increases. Further, in order to linearly move each of the divided blocking members 20A and 20B, the members connected to the divided blocking members 20A and 20B are slid on the guide shafts arranged along the moving direction. Since the members 20A and 20B are moved, dust is generated over a wide range and the amount of dust generated is also increased. On the other hand, in the configuration of the above-described embodiment, as described above, the special moving areas IA1 and IA2 for moving the divided blocking members 20A and 20B are hardly required, and the divided blocking members 20A and 20B are required. The member that slides and varies with the movement of the member and the amount of variation of the member are small, and dust generation can be reduced accordingly. Therefore, it is preferable to configure as in the above embodiment rather than as shown in FIG.
[0059]
Moreover, in the said Example, although the interruption | blocking member which closes partition area SA was divided | segmented into two division | segmentation interruption | blocking members 20A and 20B, you may divide | segment into three or more division | segmentation interruption | blocking members.
[0060]
When dividing into three or more divided blocking members, for example, as shown in FIG. 11 (a), the blocking surfaces 21 are overlapped by all the divided blocking members 20A to 20C when stored when viewed toward the blocking surface 21. As shown in FIG. 11 (b), the blocking surface 21 is overlapped by a part of the divided blocking members 20A and 20B when stored when viewed toward the blocking surface 21. However, as shown in FIG. 12, when viewed toward the blocking surface 21, the divided blocking members 20 A and 20 B and the divided blocking members 20 C and 20 D are grouped so that the blocking surface 21 is stored during storage. You may comprise so that it may overlap.
[0061]
11 and 12, reference numerals SA3 and SA4 are arrangement positions in the partition area SA assigned to the divided blocking members 20C and 20D, and PA3 and PA4 are stored in the divided blocking members 20C and 20D, respectively. Regions J3 and J4 are pivot axes when the divided blocking members 20C and 20D are moved.
[0062]
Further, for example, as shown in FIG. 11, two divided blocking members 20A and 20B out of three or more divided blocking members 20 may be configured as in the above embodiment, for example, as shown in FIG. As described above, a plurality of divided blocking members 20 are grouped into two divided blocking members 20, and each group is configured as in the above embodiment, and a plurality of the above embodiments are provided to close the partition area SA. You may comprise.
[0063]
In addition, the divided blocking members that store the overlapping blocking surfaces 21 when viewed toward the blocking surface 21 may be configured such that only a part of the blocking surfaces 21 of the divided blocking members overlap when stored. Alternatively, the entire blocking surface 21 of each divided blocking member may be configured to completely overlap.
[0064]
Further, as shown in the drawings of the above-described embodiments and modifications, the storage area of a certain divided blocking member may be provided adjacent to the arrangement position in the partition area assigned to the divided blocking member. However, the present invention is not limited to this, and a storage area of a certain divided blocking member may be provided at a position away from the arrangement position in the partition area assigned to the divided blocking member or at a position partially overlapping with the arrangement position.
[0065]
Further, the blocking surfaces of the plurality of divided blocking members do not have to be the same shape and the same size, but have blocking surfaces with different shapes and sizes depending on the shape and size of the partition region SA. You may comprise with a some division | segmentation interruption | blocking member.
[0066]
Moreover, in the said Example, although the space between the upper space of several process tank 11A-11C was made into partition area | region SA, the case where this invention was applied to the opening / closing of the partition area | region SA was taken as an example, This invention is such The application form is not limited. For example, a substrate processing unit surrounded by a chamber and a substrate transfer space provided outside the chamber are provided, and a substrate is loaded into the substrate processing unit from the substrate transfer space via a substrate loading / unloading port formed in the chamber. In the substrate processing apparatus configured to carry out the present invention, the present invention can also be applied to the case where the substrate carry-in / out port is used as a partition region and the partition region (substrate carry-in / out port) is opened and closed.
[0067]
Moreover, although the said Example took the case of the batch type substrate processing apparatus which processes a substrate collectively, this invention is not limited to this, The single wafer type substrate processing apparatus which processes a board | substrate one by one The present invention can also be applied to.
[0068]
【The invention's effect】
As is clear from the above description, according to the invention described in claim 1, the blocking member that closes the partition region is divided into a plurality of divided blocking members, and when the divided blocking members are stored, the divided blocking members are blocked. Since it is configured to be stored in the storage area in a state where at least a part of the blocking surfaces of at least some of the divided blocking members overlap when viewed toward the surface, the blocking area required in the partition area is blocked. And the storage area can be reduced.
[0069]
Also, The first divided blocking member and the second divided blocking member constituting the plurality of divided blocking members are respectively rotated to move between the respective arrangement positions and the respective storage areas. At this time, the first divided blocking member is moved. A part of the moving region of the blocking member and a part of the moving region of the second divided blocking member are overlapped, and almost all of the moving region of the first divided blocking member and the moving region of the second divided blocking member are Since the first and second arrangement positions and the first and second storage areas can be accommodated, a special movement area for moving the first and second divided blocking members is provided. There is no need to provide it, and the area required to open the partition area can be further reduced.
[0070]
Further, for example, as compared with the case where the first and second divided blocking members are linearly moved, the generation of dust accompanying the movement of the first and second divided blocking members can be reduced, and the contamination of the substrate is also suppressed. can do.
[0071]
Furthermore, the drive source (actuator) constituting the moving means and the first and second divided blocking members are completely separated from each other only by rotating and sealing the portion for rotating the first and second divided blocking members. It is possible to prevent the drive source of the moving means from being corroded in an atmosphere such as a chemical solution, and it is also possible to prevent the substrate from being contaminated by dust generated from the drive source.
[Brief description of the drawings]
FIG. 1 is a plan view showing an overall configuration of a substrate processing apparatus according to an embodiment of the present invention.
FIG. 2 is a cross-sectional view taken along the line AA in FIG.
FIG. 3 is a cross-sectional view taken along the line BB in FIG. 1;
FIG. 4 is a diagram showing a positional relationship between a partition area, first and second arrangement positions, and first and second storage areas.
FIG. 5 is a perspective view showing an appearance of a partition opening / closing mechanism.
FIG. 6 is an enlarged cross-sectional view of the partition opening / closing mechanism as viewed from the opening side through which the divided blocking member passes during movement.
7 is a cross-sectional view taken along the line CC in FIG. 6;
FIG. 8 is an enlarged cross-sectional view of the partition opening / closing mechanism as viewed from the drive chamber side.
FIG. 9 is a diagram comparing the flow of airflow between a state in which a gap is formed in a divided portion of each divided member and a state in which the gap is eliminated when the airflow is caused to flow down in a partition region.
FIG. 10 is a diagram showing a modification of moving means.
FIG. 11 is a view showing a modified example in the case where three divided blocking members are configured.
FIG. 12 is a view showing a modification in the case where four division blocking members are configured.
FIG. 13 is a perspective view showing a configuration of a main part of a conventional device.
FIG. 14 is a diagram showing a schematic configuration of a conventional partition opening / closing mechanism.
[Explanation of symbols]
7: Partition opening / closing mechanism
20A to 20D: Division blocking member
21: Blocking surface
22A, 22B: Movement mechanism
24A, 24B: Drive source (air cylinder)
W: Substrate
SA: Partition area
SA1 to SA4: Arrangement positions in the partition area assigned to each divided blocking member
PA1 to PA4: Storage area for each divided blocking member
J1 to J4: Rotating shaft cores of the respective divided blocking members

Claims

A substrate provided with a partition opening / closing means for opening and closing the partition region by moving a blocking member between the partition region formed in the substrate transport space and the storage region in order to block the circulation of the atmosphere in the substrate transport space In the processing device,
The partition opening / closing means includes
While dividing the blocking member into a plurality of divided blocking members,
Moving means for moving each of the divided blocking members between each of the arrangement positions assigned to each of the divided blocking members so as to close the partition area and each of the storage areas provided for each of the divided blocking members. And having
When each of the divided blocking members is stored in each of the storage areas, at least some of the divided blocking members are viewed toward the blocking surfaces of the divided blocking members, and at least some of the blocking surfaces of the divided blocking members overlap. Each storage area is provided to be stored in each storage area in a state where
And,
A first arrangement position of the first divided blocking member and the second division, in which the first divided blocking member and the second divided blocking member constituting the plurality of divided blocking members are arranged in the partition region. And assigning the second arrangement position of the blocking member side by side in the partition region,
A first storage area and a second storage area for storing the first divided blocking member and the second divided blocking member, respectively, along the blocking surface of the divided blocking member with respect to the partition area. Provided in the side position,
The moving means is configured to pass through the second arrangement position with the one end portion of the first divided blocking member as the center and viewed toward the blocking surface of the first divided blocking member. The blocking member is rotated to move the first divided blocking member between the first arrangement position and the first storage area, and at one end of the second divided blocking member. The second divided blocking member is rotated so as to pass through the first arrangement position when viewed toward the blocking surface of the second divided blocking member, and the second arrangement position and the second A substrate processing apparatus, wherein the second divided blocking member is moved between the storage area and the storage area.

The substrate processing apparatus according to claim 1,
A plurality of processing units each provided with a processing tank for processing a substrate;
A substrate transport mechanism for horizontally moving the space above each processing unit and transporting the substrate to each processing unit;
With
The substrate processing apparatus, wherein the partition region is between upper spaces of the processing tanks provided in the processing unit.