JP3897202B2 - Glass ceramic composite material for partition wall formation - Google Patents
Glass ceramic composite material for partition wall formation Download PDFInfo
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- JP3897202B2 JP3897202B2 JP1341398A JP1341398A JP3897202B2 JP 3897202 B2 JP3897202 B2 JP 3897202B2 JP 1341398 A JP1341398 A JP 1341398A JP 1341398 A JP1341398 A JP 1341398A JP 3897202 B2 JP3897202 B2 JP 3897202B2
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C10/00—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition
- C03C10/0009—Devitrified glass ceramics, i.e. glass ceramics having a crystalline phase dispersed in a glassy phase and constituting at least 50% by weight of the total composition containing silica as main constituent
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
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- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Description
【０００１】
【産業上の利用分野】
本発明は、プラズマ放電空間を有する薄型ディスプレイ装置の隔壁形成用ガラスセラミックス複合材料に関し、特に３５〜５０×１０-7／℃の熱膨張係数を有する無アルカリガラスを基板として用いたプラズマ放電空間を有する薄型ディスプレイ装置の隔壁形成用ガラスセラミックス複合材料に関するものである。
【０００２】
【従来の技術】
プラズマディスプレイ装置（ＰＤＰ）等のプラズマ放電空間を有する薄型ディスプレイ装置は、従来のＣＲＴディスプレイ装置に比べて薄型化、軽量化できるため、盛んに開発が行われている。これらディスプレイ装置は、２枚のガラス基板が一定の間隔を保持して気密封止され、両ガラス基板間に隔壁形成材料によってプラズマ放電空間が形成される。
【０００３】
ガラス基板には、歪点が６００℃前後の板ガラスが使用されており、放電空間を形成する隔壁材料には６００℃以下で熱処理可能な材料が選択される。このような隔壁材料には、例えば特開平４−３３７２２６号や特開平６−１４４８７１号等に開示されているような、焼結性に優れ、低軟化点化が容易なＰｂＯ系ガラス粉末を用いた複合材料が使用されている。
【０００４】
また特開平５−２９７３６３号に開示されているようなプラズマアドレスド電気光学装置では、液晶層に悪影響を与えないようにガラス基板に無アルカリガラスが使用されているが、この種のガラスは一般に熱膨張係数が約３５〜５０×１０-7／℃と低いため、隔壁材料にはＰｂＯ系ガラス粉末とともにＰｂＴｉＯ3 粉末等の低膨張フィラーが使用される。
【０００５】
【発明が解決しようとする課題】
しかしながら鉛元素等の重元素を含有するガラスやフィラーを使用すると、環境汚染や人的健康を損なうおそれがある。
【０００６】
また、放電空間を形成する隔壁材料は使用量が多く、装置の重量に与える影響が大きいが、ＰｂＯ系ガラスは比重が大きいために装置が重くなる、という問題を有している。
【０００７】
本発明の目的は、環境問題等を生じることが無く、しかも比重の小さな隔壁形成用複合材料を提供することである。
【０００８】
【課題を解決するための手段】
本発明の隔壁形成用ガラスセラミックス複合材料は、プラズマ放電空間を有する薄型ディスプレイ装置の隔壁形成用ガラスセラミックス複合材料であって、重量％でＺｎＯ ５０〜６５％、Ｂ 2 Ｏ 3 ２０〜３５％、ＳｉＯ 2 ７〜１５％、Ｒ 2 Ｏ＋ＲＯ ３〜１０％（ただしＲ 2 Ｏ：Ｌｉ 2 Ｏ＋Ｎａ 2 Ｏ＋Ｋ 2 Ｏ、ＲＯ：ＭｇＯ＋ＣａＯ＋ＳｒＯ＋ＢａＯ）の組成を含有するＺｎＯ−Ｂ2Ｏ3−ＳｉＯ2系ガラス粉末とフィラー粉末からなることを特徴とする。
【０００９】
【作用】
本発明の隔壁形成用ガラスセラミックス複合材料は、ＺｎＯ−Ｂ2 Ｏ3 −ＳｉＯ2 系のガラス粉末を使用する。この系のガラスを使用すると、６００℃以下の温度で緻密に焼結することが可能であり、またＰｂＯ系ガラスよりも比重が小さいため、装置を軽量化することが可能である。さらにＰｂＯ系に比べて容易に低膨張化できる。
【００１０】
ＺｎＯ−Ｂ2 Ｏ3 −ＳｉＯ2 系の結晶性ガラス粉末としては、種々の組成を有するものが使用可能であるが、Ｐｂ、Ｔｌ、Ｂｉ等の重元素を含むものは避けるべきである。即ち、これらの重元素は環境上好ましくなく、またガラスの比重を大きくしてしまう。
【００１１】
また６００℃以下の熱処理によってＺｎＯ・Ｂ2 Ｏ3 系結晶やＺｎＯ・ＳｉＯ2 系結晶を析出する性質を有する結晶性ガラスを使用すると、焼成後の熱膨張係数を著しく低下させることができ、無アルカリガラス基板のそれに適合させることができる。このような低膨張のガラス粉末には、重量％でＺｎＯ ５０〜６５％、Ｂ2 Ｏ3 ２０〜３５％、ＳｉＯ2 ７〜１５％、Ｒ2 Ｏ＋ＲＯ ３〜１０％（ただしＲ2 Ｏ：Ｌｉ2 Ｏ＋Ｎａ2 Ｏ＋Ｋ2 Ｏ、ＲＯ：ＭｇＯ＋ＣａＯ＋ＳｒＯ＋ＢａＯ）の組成を有するガラスを使用することが好ましい。ガラス組成をこのように限定した理由は以下の通りである。
【００１２】
ＺｎＯは軟化点を著しく上昇させることなく熱膨張係数を低下させる働きがあり、また析出結晶の結晶核となる成分である。ＺｎＯが５０％より少ないと熱処理時の結晶特性が弱くなって低膨張化が困難になり、無アルカリガラス基板に使用し難くなる。６５％より多くなると溶融時に結晶が析出し易くなってガラス化が困難となる。なおＺｎＯの好適な範囲は５０〜６３％である。
【００１３】
Ｂ2 Ｏ3 はガラス構造体を形成する成分であり、またガラスの溶融温度や軟化点を下げる成分である。Ｂ2 Ｏ3 が２０％より少ないとガラス化が困難になり、３５％より多いと熱処理時の結晶特性が弱くなって低膨張化が困難になる。なおＢ2 Ｏ3 の好適な範囲は２２〜３０％である。
【００１４】
ＳｉＯ2 はガラス構造体の形成に不可欠な成分である。ＳｉＯ2 が７％より少ないとガラス化が困難になり、１５％より多いとガラスの軟化点が上昇して６００℃以下での焼成が困難になる。なおＳｉＯ2 の好適な範囲は８〜１２％である。
【００１５】
Ｒ2 Ｏ（Ｌｉ2 Ｏ、Ｎａ2 Ｏ、Ｋ2 Ｏ）及びＲＯ（ＭｇＯ、ＣａＯ、ＳｒＯ、ＢａＯ）はガラスの溶融温度及び軟化点を下げる成分である。これらの合量が３％より少ないとガラスの軟化点が低下せず、６００℃以下の温度で焼成が困難になる。またこれらの合量が１０％より多い場合は熱膨張係数が大きくなって無アルカリガラス基板に使用し難くなる。なおこれら成分の合量の好適な範囲は３〜７％であり、また各成分の範囲はＬｉ2 Ｏ ０〜３％（好ましくは０〜２％）、Ｎａ2 Ｏ ０〜５％（好ましくは０〜３％）、Ｋ2 Ｏ ０〜５％（好ましくは０〜３％）、ＭｇＯ ０〜５％（好ましくは０〜３％）、ＣａＯ ０〜５％（好ましくは０〜３％）、ＳｒＯ ０〜５％（好ましくは０〜３％）、ＢａＯ ０〜５％（好ましくは０〜３％）である。
【００１６】
なお上記以外にも、Ａｌ2 Ｏ3 、ＳｎＯ2 等を各５％まで添加することが可能である。
【００１７】
また本発明の複合材料は、焼結時の収縮を防止したり、熱膨張係数や焼結強度を調整するために従来より知られている種々のフィラー粉末を含有する。例えば収縮率や焼結強度の調整のためにアルミナ等のフィラーを使用することができる。また基板に無アルカリガラスを使用する場合、低膨張化するためにコージエライト、ウイレマイト、ジルコン、石英ガラス、β−ユークリプタイト、β−スポジュウメン等の低膨張フィラー粉末を使用することができる。中でもコージエライト、ウイレマイト、ジルコンから選ばれる１種以上を使用することが好ましい。またフィラー粉末全体の８０重量％以上をこれら低膨張フィラー粉末で占めるようにするとより効果的である。なおＰｂＴｉＯ3 のようにＰｂ等の重元素を含むフィラーの使用は環境上好ましくないため避けるべきである。
【００１８】
本発明において、ガラス粉末とフィラー粉末の混合割合は、重量％でガラス粉末１５〜６０％、フィラー粉末４０〜８５％からなることが好ましい。混合割合をこのように限定する理由は、ガラス粉末が１５％より少ないとセラミック粉末を焼結させることが困難になり、６０％より多いと焼成時の収縮率が大きくなって、隔壁のクラックや断線等が生じ易くなるためである。なおプラズマアドレスド電気光学装置に使用する場合は、無アルカリガラス基板と隙間なく接着させる必要があり、緻密に焼結することが要求される。このためガラス粉末とフィラー粉末の混合割合をガラス粉末２５〜６０％、フィラー粉末４０〜７５％にすることが好ましい。
【００１９】
また本発明の材料は、さらに色調を調整するために無機顔料粉末を１５重量％まで含有させてもよい。
【００２０】
上記各成分からなる複合材料は、焼成後の比重が２．０〜４．０ｇ／ｃｍ3 、体積収縮率が１５％以下の隔壁材料を得ることができる。また無アルカリガラスに用いる場合、ガラス組成、フィラーの種類等を調整して、焼成後の熱膨張係数が３０〜４５×１０-7／℃（３０〜３００℃）となるようにすればよい。
【００２１】
なお、本発明の隔壁形成用ガラスセラミックス複合材料を用いて、隔壁を形成するには、例えば上記材料と有機ビークルとを混合してペーストを作製し、これをスクリーンを介して印刷積層する方法や、ペーストを塗布、乾燥させ、ドライレジストフィルムを密着させて露光、現像した後に、サンドブラストする方法を採用することができる。
【００２２】
【実施例】
以下、本発明を実施例に基づいて説明する。
【００２３】
表１は本発明の実施例で使用するガラス粉末（試料Ａ〜Ｄ）、及び従来より使用されているＰｂＯ系ガラス粉末（試料Ｅ）を示している。
【００２４】
【表１】
各ガラス粉末は次のようにして調製した。まず表の組成となるように調合したガラス原料を１１００〜１４５０℃で１〜３時間溶融し、薄板状に成形した。その後、粉砕、分級することによって、スクリーン印刷に適する粒径１．５〜３．０μｍのガラス粉末を得た。
【００２６】
このようにして得られた試料Ａ〜Ｄの各ガラス粉末は、ガラス軟化点が５５０〜５８５℃であり、焼成すると５ＺｎＯ・２Ｂ2 Ｏ3 、ＺｎＯ・Ｂ2 Ｏ3 、及び２ＺｎＯ・ＳｉＯ2 を主結晶として析出する性質を有していた。また焼成後の比重は３．５５〜３．７０ｇ／ｃｍ3 、３０〜３００℃における熱膨張係数は５０〜５５×１０-7／℃、であった。一方、従来例である試料Ｅは、ガラス軟化点が５５０℃、比重が４．６２ｇ／ｃｍ3 、３０〜３００℃における熱膨張係数が６７．５×１０-7／℃の非晶質ガラスであった。
【００２７】
次に、これらのガラス粉末にフィラー粉末や無機顔料粉末を混合し、隔壁形成用ガラスセラミックス複合材料とした。なおフィラー粉末及び無機顔料粉末には、平均粒径が０．５〜２．５μｍのものを使用した。
【００２８】
表２〜４は本発明の実施例（試料Ｎｏ．１〜１０）、及び従来例（試料Ｎｏ．１１）を示している。
【００２９】
【表２】
【表３】
【表４】
続いて各試料を６００℃で５〜３０分間焼成し、焼結性、体積収縮率、比重及び熱膨張係数を測定した。結果を各表に示す。
【００３３】
表から明らかなように、本発明の実施例である試料Ｎｏ．１〜１０は、焼結性が良好であり、体積収縮率が１〜７％、熱膨張係数が３３〜４２×１０-7／℃であり、基板に無アルカリガラスを使用するプラズマアドレスド電気光学装置の隔壁形成用として好適である。また比重が３．９９ｇ／ｃｍ3 以下であり、従来例に比べてかなり小さい値であった。
【００３４】
なお焼結性は、熱処理時に試料粉末が焼結するかどうかで評価した。体積収縮率及び比重は、アルキメデス法を用いて測定した。熱膨張係数は、焼成した試料を棒状に加工し、熱膨張係数測定装置を用いて３０〜３００℃の温度範囲における平均熱膨張係数を測定したものである。
【００３５】
【発明の効果】
本発明の隔壁形成用ガラスセラミックス複合材料は、ＰｂＯ系ガラスの代わりにＺｎＯ−Ｂ2 Ｏ3 −ＳｉＯ2 系ガラスを用いるために、従来の材料に比べて比重が小さく、プラズマ放電空間を有するディスプレイ装置の軽量化に有効な材料である。また環境や人体に悪影響を与えることがない。しかも６００℃以下で焼成でき、焼成時の体積収縮も少ないため、隔壁形成材料として好適である。
【００３６】
さらにＺｎＯ−Ｂ2 Ｏ3 −ＳｉＯ2 系ガラスは低膨張化が容易であるため、無アルカリガラスを基板に用いるプラズマアドレスド電気光学装置の隔壁形成材料としても好適である。[0001]
[Industrial application fields]
The present invention relates to a glass-ceramic composite material for forming barrier ribs of a thin display device having a plasma discharge space, and in particular, a plasma discharge space using an alkali-free glass having a thermal expansion coefficient of 35 to 50 × 10 −7 / ° C. as a substrate. The present invention relates to a glass-ceramic composite material for forming a partition wall of a thin display device.
[0002]
[Prior art]
Thin display devices having a plasma discharge space such as a plasma display device (PDP) have been actively developed because they can be made thinner and lighter than conventional CRT display devices. In these display devices, two glass substrates are hermetically sealed while maintaining a certain interval, and a plasma discharge space is formed between both glass substrates by a partition wall forming material.
[0003]
A plate glass having a strain point of around 600 ° C. is used for the glass substrate, and a material that can be heat-treated at 600 ° C. or less is selected as the partition wall material that forms the discharge space. As such a partition wall material, for example, PbO-based glass powder having excellent sinterability and low softening point as disclosed in JP-A-4-337226 and JP-A-6-144487 is used. Used composite material.
[0004]
Further, in the plasma addressed electro-optical device as disclosed in JP-A-5-297363, an alkali-free glass is used for the glass substrate so as not to adversely affect the liquid crystal layer. Since the thermal expansion coefficient is as low as about 35 to 50 × 10 −7 / ° C., a low expansion filler such as PbTiO 3 powder is used together with the PbO glass powder as the partition wall material.
[0005]
[Problems to be solved by the invention]
However, if glass or filler containing heavy elements such as lead element is used, there is a risk of environmental pollution and human health.
[0006]
The partition wall material forming the discharge space has a large amount of use and has a large influence on the weight of the device. However, PbO-based glass has a problem that the device becomes heavy because of its large specific gravity.
[0007]
An object of the present invention is to provide a composite material for forming a partition wall which does not cause environmental problems and has a small specific gravity.
[0008]
[Means for Solving the Problems]
The glass-ceramic composite material for barrier rib formation of the present invention is a glass-ceramic composite material for barrier rib formation of a thin display device having a plasma discharge space, and ZnO 50 to 65% by weight%, B 2 O 3 20 to 35%, ZnO—B 2 O 3 —SiO 2 glass powder containing a composition of SiO 2 7-15%, R 2 O + RO 3-10% (provided that R 2 O: Li 2 O + Na 2 O + K 2 O, RO: MgO + CaO + SrO + BaO) It consists of filler powder.
[0009]
[Action]
The glass-ceramic composite material for forming a partition wall of the present invention uses ZnO—B 2 O 3 —SiO 2 glass powder. When this type of glass is used, it is possible to sinter densely at a temperature of 600 ° C. or less, and since the specific gravity is smaller than that of PbO-based glass, it is possible to reduce the weight of the apparatus. Furthermore, the expansion can be easily reduced as compared with the PbO system.
[0010]
As the ZnO—B 2 O 3 —SiO 2 crystalline glass powder, those having various compositions can be used, but those containing heavy elements such as Pb, Tl, Bi should be avoided. That is, these heavy elements are environmentally undesirable and increase the specific gravity of the glass.
[0011]
In addition, the use of crystalline glass having the property of precipitating ZnO.B 2 O 3 -based crystals and ZnO.SiO 2 -based crystals by heat treatment at 600 ° C. or lower can significantly reduce the thermal expansion coefficient after firing. It can be adapted to that of an alkali glass substrate. Such low-expansion glass powder includes ZnO 50 to 65% by weight, B 2 O 3 20 to 35%, SiO 2 7 to 15%, R 2 O + RO 3 to 10% (where R 2 O: Li It is preferable to use a glass having a composition of 2 O + Na 2 O + K 2 O, RO: MgO + CaO + SrO + BaO). The reason for limiting the glass composition in this way is as follows.
[0012]
ZnO has the function of lowering the thermal expansion coefficient without significantly raising the softening point, and is a component that becomes a crystal nucleus of the precipitated crystal. If the ZnO content is less than 50%, the crystal characteristics at the time of heat treatment are weakened, making it difficult to reduce the expansion, making it difficult to use for an alkali-free glass substrate. If it exceeds 65%, crystals are likely to precipitate during melting and vitrification becomes difficult. In addition, the suitable range of ZnO is 50 to 63%.
[0013]
B 2 O 3 is a component that forms a glass structure, and is a component that lowers the melting temperature and softening point of glass. If B 2 O 3 is less than 20%, vitrification becomes difficult, and if it is more than 35%, the crystal characteristics during heat treatment become weak and it is difficult to reduce expansion. Note preferable range of B 2 O 3 is 22 to 30%.
[0014]
SiO 2 is an essential component for forming a glass structure. If the SiO 2 content is less than 7%, vitrification becomes difficult, and if it exceeds 15%, the softening point of the glass rises and firing at 600 ° C. or less becomes difficult. Incidentally preferred range of SiO 2 is 8 to 12%.
[0015]
R 2 O (Li 2 O, Na 2 O, K 2 O) and RO (MgO, CaO, SrO, BaO) are components that lower the melting temperature and softening point of glass. If the total amount is less than 3%, the softening point of the glass does not decrease, and baking at a temperature of 600 ° C. or less becomes difficult. Moreover, when these total amounts are more than 10%, a thermal expansion coefficient becomes large and it becomes difficult to use for an alkali free glass substrate. Incidentally preferred range for the total amount of these components is 3 to 7%, and the range of each component is Li 2 O 0~3% (preferably 0~2%), Na 2 O 0~5 % ( preferably 0~3%), K 2 O 0~5 % ( preferably 0-3% are) 0 to 5% MgO (preferably 0-3%), CaO 0 to 5% (preferably 0-3%), SrO is 0 to 5% (preferably 0 to 3%) and BaO is 0 to 5% (preferably 0 to 3%).
[0016]
In addition to the above, it is possible to add up to 5% of Al 2 O 3 , SnO 2 or the like.
[0017]
In addition, the composite material of the present invention contains various filler powders conventionally known for preventing shrinkage during sintering and adjusting the thermal expansion coefficient and sintering strength. For example, a filler such as alumina can be used for adjusting the shrinkage rate and the sintering strength. Further, when alkali-free glass is used for the substrate, low expansion filler powders such as cordierite, willemite, zircon, quartz glass, β-eucryptite, β-spodumene can be used to reduce the expansion. Among these, it is preferable to use one or more selected from cordierite, willemite, and zircon. Further, it is more effective if 80% by weight or more of the whole filler powder is occupied by these low expansion filler powders. The use of a filler containing a heavy element such as Pb such as PbTiO 3 is not environmentally preferable and should be avoided.
[0018]
In the present invention, the mixing ratio of the glass powder and the filler powder is preferably 15 to 60% glass powder and 40 to 85% filler powder by weight. The reason for limiting the mixing ratio in this way is that if the glass powder is less than 15%, it becomes difficult to sinter the ceramic powder, and if it exceeds 60%, the shrinkage ratio during firing becomes large, cracks in the partition walls, This is because disconnection or the like is likely to occur. When used in a plasma addressed electro-optical device, it is necessary to adhere to a non-alkali glass substrate without a gap, and it is required to sinter densely. For this reason, it is preferable to make the mixing ratio of glass powder and filler powder into glass powder 25-60% and filler powder 40-75%.
[0019]
The material of the present invention may further contain up to 15% by weight of inorganic pigment powder in order to further adjust the color tone.
[0020]
The composite material composed of the above components can provide a partition material having a specific gravity after firing of 2.0 to 4.0 g / cm 3 and a volume shrinkage of 15% or less. Moreover, when using for an alkali free glass, what is necessary is just to adjust a glass composition, the kind of filler, etc., and to make the thermal expansion coefficient after baking become 30-45 * 10 < -7 > / degreeC (30-300 degreeC).
[0021]
In order to form a partition using the glass-ceramic composite material for forming a partition according to the present invention, for example, a paste is prepared by mixing the above-mentioned material and an organic vehicle, and this is printed and laminated via a screen. It is possible to employ a method in which a paste is applied and dried, a dry resist film is adhered, exposed and developed, and then sandblasted.
[0022]
【Example】
Hereinafter, the present invention will be described based on examples.
[0023]
Table 1 shows the glass powder (samples A to D) used in the examples of the present invention and the PbO-based glass powder (sample E) used conventionally.
[0024]
[Table 1]
Each glass powder was prepared as follows. First, the glass raw material prepared so as to have the composition shown in the table was melted at 1100 to 1450 ° C. for 1 to 3 hours and formed into a thin plate shape. Then, the glass powder with a particle size of 1.5-3.0 micrometers suitable for screen printing was obtained by grind | pulverizing and classifying.
[0026]
Each glass powder of samples A to D thus obtained has a glass softening point of 550 to 585 ° C., and when fired, 5ZnO · 2B 2 O 3 , ZnO · B 2 O 3 , and 2ZnO · SiO 2 are obtained. It had the property of precipitating as a main crystal. The specific gravity after firing was 3.55 to 3.70 g / cm 3 , and the thermal expansion coefficient at 30 to 300 ° C. was 50 to 55 × 10 −7 / ° C. On the other hand, Sample E, which is a conventional example, is an amorphous glass having a glass softening point of 550 ° C., a specific gravity of 4.62 g / cm 3 , and a thermal expansion coefficient of 67.5 × 10 −7 / ° C. at 30 to 300 ° C. there were.
[0027]
Next, filler glass and inorganic pigment powder were mixed with these glass powders to obtain a glass-ceramic composite material for partition wall formation. As the filler powder and the inorganic pigment powder, those having an average particle diameter of 0.5 to 2.5 μm were used.
[0028]
Tables 2 to 4 show examples of the present invention (sample Nos. 1 to 10) and conventional examples (sample No. 11).
[0029]
[Table 2]
[Table 3]
[Table 4]
Subsequently, each sample was baked at 600 ° C. for 5 to 30 minutes, and sinterability, volume shrinkage, specific gravity, and thermal expansion coefficient were measured. The results are shown in each table.
[0033]
As is apparent from the table, sample No. which is an example of the present invention is shown. Nos. 1 to 10 are plasma addressed electricity having good sinterability, volume shrinkage of 1 to 7%, thermal expansion coefficient of 33 to 42 × 10 −7 / ° C., and using alkali-free glass for the substrate. It is suitable for forming a partition wall of an optical device. Further, the specific gravity was 3.99 g / cm 3 or less, which was a considerably smaller value than the conventional example.
[0034]
Sinterability was evaluated based on whether the sample powder was sintered during the heat treatment. Volume shrinkage and specific gravity were measured using Archimedes method. The thermal expansion coefficient is obtained by processing a fired sample into a rod shape and measuring an average thermal expansion coefficient in a temperature range of 30 to 300 ° C. using a thermal expansion coefficient measuring device.
[0035]
【The invention's effect】
Since the glass-ceramic composite material for barrier rib formation of the present invention uses ZnO—B 2 O 3 —SiO 2 glass instead of PbO glass, the specific gravity is smaller than that of conventional materials and a display having a plasma discharge space It is an effective material for reducing the weight of the device. In addition, the environment and human body are not adversely affected. Moreover, since it can be fired at 600 ° C. or less and the volume shrinkage during firing is small, it is suitable as a partition wall forming material.
[0036]
Furthermore, since ZnO—B 2 O 3 —SiO 2 -based glass can be easily reduced in expansion, it is also suitable as a partition wall forming material for a plasma addressed electro-optical device using non-alkali glass as a substrate.
Claims (9)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1341398A JP3897202B2 (en) | 1997-07-14 | 1998-01-06 | Glass ceramic composite material for partition wall formation |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9-205249 | 1997-07-14 | ||
| JP20524997 | 1997-07-14 | ||
| JP1341398A JP3897202B2 (en) | 1997-07-14 | 1998-01-06 | Glass ceramic composite material for partition wall formation |
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| Publication Number | Publication Date |
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| JPH1179786A JPH1179786A (en) | 1999-03-23 |
| JP3897202B2 true JP3897202B2 (en) | 2007-03-22 |
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| JP1341398A Expired - Fee Related JP3897202B2 (en) | 1997-07-14 | 1998-01-06 | Glass ceramic composite material for partition wall formation |
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| JP2005264138A (en) * | 2004-02-20 | 2005-09-29 | Jsr Corp | Glass powder-containing resin composition, transfer film and method of manufacturing plasma display panel using the same |
| JP2008214152A (en) * | 2007-03-06 | 2008-09-18 | Hitachi Powdered Metals Co Ltd | Glass paste composition |
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