JP3861548B2 - Carbon heater - Google Patents

Carbon heater Download PDF

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Publication number
JP3861548B2
JP3861548B2 JP2000036798A JP2000036798A JP3861548B2 JP 3861548 B2 JP3861548 B2 JP 3861548B2 JP 2000036798 A JP2000036798 A JP 2000036798A JP 2000036798 A JP2000036798 A JP 2000036798A JP 3861548 B2 JP3861548 B2 JP 3861548B2
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Japan
Prior art keywords
carbon heater
center
disk
bent portion
resistance value
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JP2000036798A
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Japanese (ja)
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JP2001226191A (en
Inventor
秀延 阿部
伸一 宮本
裕章 田口
健真 安井
義則 田村
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Sumco Corp
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Sumco Corp
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Description

【0001】
【発明の属する技術分野】
本発明は、特に半導体単結晶引上装置において半導体融液貯留用の石英ルツボを下部から加熱するボトムヒータに用いて好適なカーボンヒータに関する。
【0002】
【従来の技術】
シリコン(Si)やガリウム・ヒ素(GaAs)等の半導体単結晶を製造する装置として、CZ法(チョクラルスキー法)を用いた半導体単結晶引上装置が実用化されている。この半導体単結晶引上装置は、図1に示すように、チャンバ1の内部にカーボンサセプタ2を配置し、該カーボンサセプタ2の上方に配置した石英ルツボ3に半導体融液Lを貯留し、この半導体融液Lを石英ルツボ3の周囲に配置した円筒状のカーボンヒータ4(サイドヒータ)及び石英ルツボ3の下方に配置した略円盤状のカーボンヒータ5(ボトムヒータ)によって所定の単結晶成長温度となるように加熱しつつ、引上ワイヤ5によって半導体単結晶Cを順次引き上げるものである。
【0003】
図2は上記ボトムヒータ5の正面図であり、当該ボトムヒータ5は、円盤形状に形成されたヒータ本体5aと、該ヒータ本体5aから左右に突出するように設けられた一対の端子部5b,5cとから構成されている。ヒータ本体5aには、中心部に円形の孔5dが形成されており、その中心点Oに対して所定角度毎に外周側から中心点Oに向けて所定深さかつ所定幅のスリット5e,5e,……が複数形成されると共に、該スリット5e,5e,……の間に孔5d側から外周側に向けて所定深さかつ所定幅のスリット5f,5f,……が複数形成されている。
【0004】
このようにスリット5e,5e,……及びスリット5f,5f,……が交互にヒータ本体5aに形成されることにより、当該ヒータ本体5aには直線部5g,5g,……と屈曲部(内側屈曲部5h,5h,……と外側屈曲部5i,5i,……が交互に形成されることになる。直線部5g,5g,……は、矢印で示すように上記各端子部5b,5cを介して当該ボトムヒータ5に供給された印加電流の通過経路が直線的になる部位であり、屈曲部5h,5h,……,5i,5i,……は、当該印加電流の通過経路が屈曲する部位である。印加電流は、直線部5g,5g,……と屈曲部5h,5h,……,5i,5i,……とを交互に、すなわち中心点Oから離間する方向と中心点Oに接近する方向とに交互に流れる。印加電流がこのように流れることによって、ヒータ本体5aが全体的に均等に発熱して上方に配置される石英ルツボ3を斑なく加熱することができる。
【0005】
【発明が解決しようとする課題】
ところで、上記従来のボトムヒータ5は、屈曲部5h,5h,……,5i,5i,……の内側、つまり○印を付した部位(高電流密度部位)に印加電流が集中して電流密度が高くなるために、当該部位の劣化が他の部位に比較して著しい。このため、高電流密度部位の寿命がボトムヒータ5の寿命を支配しており、他の部位が劣化していなくても高電流密度部位つまり屈曲部5h,5h,……,5i,5i,……の劣化に従ってボトムヒータ5を交換しなければならなかった。
【0006】
本発明は、上述する問題点に鑑みてなされたもので、以下の点を目的としている。
(1)劣化を抑えて長寿命化を図る。
(2)印加電流の集中を抑制する。
(3)半導体単結晶引上装置のメンテナンス性を向上させる。
【0007】
【課題を解決するための手段】
本発明のカーボンヒータは、半導体融液貯留用の石英ルツボを下部から加熱するように略円盤状に形成され、印加電流が円盤中心から離間する方向と円盤中心に接近する方向とに交互に流れるように直線部と屈曲部とが交互に形成されたカーボンヒータであって、
前記直線部に対して印加電流が集中して電流密度が高くなる前記屈曲部における断面積を相対的に増大させるよう前記直線部に対して前記屈曲部の厚みが相対的に厚くされてなることにより上記課題を解決した。
本発明は、互いに隣り合う前記直線部の間に外周側から円盤中心に向けて形成されるスリットの幅は、前記屈曲部のうち円盤中心側の内側屈曲部の内側における印加電流の集中が緩和されるように、円盤中心に近づく程狭く形成される手段や、あるいは、互いに隣り合う前記直線部の間に円盤中心から外周側に向けて形成されるスリットの幅は、前記屈曲部のうち円盤中心から離れる側の外側屈曲部の内側における印加電流の集中が緩和されるように、円盤中心から離れる程広く形成される手段を採用することができる。
本発明のカーボンヒータの抵抗値設定方法は、上述されたカーボンヒータの抵抗値設定方法であって、予めカーボンヒータの全体的な抵抗値を設定し、
前記屈曲部の厚みを厚くし、これによって抵抗値が低下する分を、前記直線部の厚みを薄くすることにより、前記全体の抵抗値を調整することができる。
上記目的を達成するために、本発明では、第1の手段として、複数の直線部と少なくとも1つの屈曲部から成るカーボン製のヒータにおいて、直線部に対して屈曲部の断面積を相対的に増大させるという手段を採用する。
【0008】
また、第2の手段として、半導体融液貯留用の石英ルツボを下部から加熱するように略円盤状に形成され、印加電流が円盤中心から離間する方向と円盤中心に接近する方向とに交互に流れるように直線部と屈曲部とが交互に形成されたカーボンヒータにおいて、直線部に対して屈曲部の断面積を相対的に増大させるという手段を採用する。
【0009】
第3の手段として、上記第2の手段において、互いに隣り合う直線部の間に外周側から円盤中心に向けて形成されるスリットの幅を円盤中心に近づく程狭く形成するという手段を採用する。
【0010】
第4の手段として、上記第2または第3の手段において、互いに隣り合う直線部の間に円盤中心から外周側に向けて形成されるスリットの幅を円盤中心から離れる程広く形成するという手段を採用する。
【0011】
第5の手段として、上記各手段において、直線部に対して屈曲部の断面積を相対的に増大させる具体的な手段として、直線部に対して屈曲部の厚みを相対的に厚くするという手段を採用する。
【0012】
【発明の実施の形態】
以下、図面を参照して、本発明に係わるカーボンヒータの一実施形態について説明する。図3は、本実施形態の構成を示す正面図及び一部断面図である。なお、本実施形態のボトムヒータ10(カーボンヒータ)は、上述した従来のボトムヒータ5と比較してヒータ本体10aの構成のみが相違しているので、以下の説明では当該ヒータ本体10aの構成について詳細を説明する。
【0013】
このヒータ本体10aは、略円盤状に形成されている点では、従来のボトムヒータ5と類似しているが、従来の屈曲部5h,5h,……,5i,5i,……の内側における印加電流の集中を抑制するために、屈曲部10h,10h,……,10i,10i,……の厚みを直線部10g,10g,……の厚みよりも厚く形成している。
【0014】
この場合、ボトムヒータ10の全体的な抵抗値は設計パラメータの1つとして予め規定されているので、従来のボトムヒータ5の抵抗値と同等の抵抗値となるように、従来の屈曲部5h,5h,……,5i,5i,……よりも本実施形態の屈曲部10h,10h,……,10i,10i,……の厚みを厚くし、これによって抵抗値が低下する分を、直線部10g,10g,……の厚みを従来の直線部5g,5g,……よりも薄くすることにより調整している。
【0015】
このように屈曲部10h,10h,……,10i,10i,……の厚みを直線部10g,10g,……の厚みよりも相対的に厚く設定することにより、ボトムヒータ10の全体的な抵抗値を変えることなく、屈曲部10h,10h,……,10i,10i,……の断面積を増大させることができる。したがって、設計パラメータを変更することなく、屈曲部10h,10h,……,10i,10i,……の内側における電流密度の上昇を抑制することができるので、当該屈曲部10h,10h,……,10i,10i,……の劣化を抑えてボトムヒータ10の寿命を延ばすことが可能である。
【0016】
また、従来のスリット5e,5e,……の幅は一定であったが、本実施形態のスリット10e,10e,……は、若干ではあるが奥にいく程(中心点Oに近づく程)幅を狭くしている。このようにスリット10e,10e,……を形成することにより、孔10d側に位置する内側屈曲部10h,10h,……における電流経路の屈曲率が小さくなるので、当該内側屈曲部10h,10h,……の内側(スリット10e,10e,……側)における印加電流の集中が緩和される。
【0017】
さらに、本実施形態のスリット10f,10f,……は、上記スリット10e,10e,……とは逆に奥にいく程(中心点Oから離れる程)幅が広くなるように形成され、これによって外周側に位置する外側屈曲部10i,10i,……は、2つの屈曲部a1,a1,……とこれらの間に直線部a2,a2,……が挟まれる形状となっている。外側屈曲部10i,10i,……をこのような形状とすることにより、従来の外側屈曲部5i,5i,……に比較して電流経路の屈曲率が小さくなるので、当該外側屈曲部10i,10i,……の内側(スリット10f,10f,……側)における印加電流の集中が緩和される。
【0018】
【発明の効果】
以上説明したように、本発明に係わるカーボンヒータによれば、以下のような効果を奏する。
(1)発明によれば、屈曲部における印加電流の集中を抑制することができるので、屈曲部の劣化を抑えて長寿命化を図ることができ、また当該長寿命化によって半導体単結晶引上装置のメンテナンス性を向上させることが可能である。
(2)また、発明によれば、屈曲部における電流経路の屈曲率が小さくなるので、屈曲部の内側における印加電流の集中が緩和され、よって屈曲部の劣化を抑えて長寿命化を図ることができる。
【図面の簡単な説明】
【図1】 半導体単結晶引上装置の概要を示す断面図である。
【図2】 従来の半導体単結晶引上装置用のボトムヒータを示す正面図である。
【図3】 本発明の一実施形態に係わるボトムヒータを示す正面図及び一部断面図である。
【符号の説明】
10……ボトムヒータ(カーボンヒータ)
10a……ヒータ本体
10b,10c……端子部
10d……孔
10e,10f……スリット
10g……直線部
10h……内側屈曲部(屈曲部)
10i……外側屈曲部(屈曲部)
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a carbon heater suitable for use in a bottom heater that heats a quartz crucible for storing a semiconductor melt from below, particularly in a semiconductor single crystal pulling apparatus.
[0002]
[Prior art]
A semiconductor single crystal pulling apparatus using a CZ method (Czochralski method) has been put into practical use as an apparatus for manufacturing a semiconductor single crystal such as silicon (Si) or gallium arsenide (GaAs). In this semiconductor single crystal pulling apparatus, as shown in FIG. 1, a carbon susceptor 2 is disposed inside a chamber 1, and a semiconductor melt L is stored in a quartz crucible 3 disposed above the carbon susceptor 2, A predetermined single crystal growth temperature is obtained by a cylindrical carbon heater 4 (side heater) in which the semiconductor melt L is disposed around the quartz crucible 3 and a substantially disk-shaped carbon heater 5 (bottom heater) disposed below the quartz crucible 3. The semiconductor single crystal C is sequentially pulled up by the pull-up wire 5 while being heated.
[0003]
FIG. 2 is a front view of the bottom heater 5. The bottom heater 5 includes a heater main body 5a formed in a disk shape, and a pair of terminal portions 5b and 5c provided so as to protrude left and right from the heater main body 5a. It is composed of A circular hole 5d is formed in the center of the heater body 5a, and slits 5e and 5e having a predetermined depth and a predetermined width from the outer peripheral side toward the central point O with respect to the central point O at predetermined angles. Are formed, and a plurality of slits 5f, 5f,... Having a predetermined depth and a predetermined width are formed between the slits 5e, 5e,. .
[0004]
In this way, the slits 5e, 5e,... And the slits 5f, 5f,... Are alternately formed in the heater body 5a, so that the heater body 5a has straight portions 5g, 5g,. The bent portions 5h, 5h, ... and the outer bent portions 5i, 5i, ... are alternately formed, and the straight portions 5g, 5g, ... are indicated by the respective terminal portions 5b, 5c as indicated by arrows. Is a portion where the passage path of the applied current supplied to the bottom heater 5 is linear, and the passage section of the applied current is bent at the bent portions 5h, 5h,..., 5i, 5i,. The applied current is alternated between the straight portions 5g, 5g,... And the bent portions 5h, 5h,..., 5i, 5i,. It flows alternately in the approaching direction, and the applied current flows in this way. It allows the quartz crucible 3 in which the heater main body 5a is disposed above and generally evenly heating can be heated without unevenness.
[0005]
[Problems to be solved by the invention]
By the way, in the conventional bottom heater 5, the applied current concentrates in the bent portions 5h, 5h,..., 5i, 5i,. In order to become high, deterioration of the said site | part is remarkable compared with another site | part. Therefore, the life of the high current density portion dominates the life of the bottom heater 5, and even if the other portions are not deteriorated, the high current density portion, that is, the bent portions 5h, 5h, ..., 5i, 5i, ... The bottom heater 5 had to be replaced in accordance with the deterioration.
[0006]
The present invention has been made in view of the above-described problems, and has the following objects.
(1) Achieving a long life by suppressing deterioration.
(2) Suppresses concentration of applied current.
(3) To improve the maintainability of the semiconductor single crystal pulling apparatus.
[0007]
[Means for Solving the Problems]
The carbon heater of the present invention is formed in a substantially disk shape so that a quartz crucible for storing semiconductor melt is heated from below, and the applied current flows alternately in a direction away from the center of the disk and a direction approaching the center of the disk. A carbon heater in which straight portions and bent portions are alternately formed,
The thickness of the bent portion is formed by thickened relative to so that the linear portion of the cross-sectional area is relatively increased in the bent portion applied current the current density is increased to concentrate to the straight portion This solves the above problem.
The present invention, the width of the slit formed toward the disk center from the outer peripheral side between the straight portions adjacent to each other, concentration relaxation of the applied current in the inside of the inner bent portion of the disc center side of the bent portion as means and is narrower the closer to the disk center, or the width of the slit formed toward the outer circumferential side of a disk centered between the straight portions adjacent to each other, a disc of the bent portion Means that are formed so as to be farther away from the center of the disk can be employed so that the concentration of the applied current on the inner side of the outer bent portion on the side farther from the center is alleviated .
The carbon heater resistance value setting method of the present invention is the above-described carbon heater resistance value setting method, wherein the overall resistance value of the carbon heater is set in advance,
The overall resistance value can be adjusted by increasing the thickness of the bent portion and reducing the resistance value by reducing the thickness of the linear portion.
In order to achieve the above object, in the present invention, as a first means, in a carbon heater composed of a plurality of straight portions and at least one bent portion, the cross-sectional area of the bent portion is relatively set with respect to the straight portion. Adopt a means to increase.
[0008]
Further, as a second means, the quartz crucible for storing semiconductor melt is formed in a substantially disk shape so as to be heated from below, and the applied current alternates between a direction away from the center of the disk and a direction approaching the center of the disk. In the carbon heater in which the straight portions and the bent portions are alternately formed so as to flow, means for relatively increasing the cross-sectional area of the bent portion with respect to the straight portions is adopted.
[0009]
As a third means, in the second means, a means is adopted in which the width of the slit formed from the outer peripheral side toward the disk center between the adjacent linear portions is narrowed toward the disk center.
[0010]
As a fourth means, in the second or third means, a means is formed in which the width of the slit formed from the center of the disk toward the outer peripheral side between the adjacent straight portions is increased as the distance from the center of the disk increases. adopt.
[0011]
As a fifth means, in each of the above means, as a specific means for relatively increasing the cross-sectional area of the bent portion relative to the straight portion, a means for relatively increasing the thickness of the bent portion relative to the straight portion. Is adopted.
[0012]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, an embodiment of a carbon heater according to the present invention will be described with reference to the drawings. FIG. 3 is a front view and a partial cross-sectional view showing the configuration of the present embodiment. The bottom heater 10 (carbon heater) of the present embodiment is different from the conventional bottom heater 5 described above only in the configuration of the heater main body 10a. Therefore, in the following description, the configuration of the heater main body 10a will be described in detail. explain.
[0013]
This heater body 10a is similar to the conventional bottom heater 5 in that it is formed in a substantially disc shape, but the applied current inside the conventional bent portions 5h, 5h,..., 5i, 5i,. .., 10i, 10i,... Are thicker than the straight portions 10g, 10g,.
[0014]
In this case, since the overall resistance value of the bottom heater 10 is defined in advance as one of the design parameters, the conventional bent portions 5h, 5h, .., 5i, 5i,..., 10i, 10i,.. The thickness of 10 g,... Is adjusted by making it thinner than the conventional straight portions 5 g, 5 g,.
[0015]
Thus, by setting the thickness of the bent portions 10h, 10h,..., 10i, 10i,... Relative to the thickness of the straight portions 10g, 10g,. Without changing the cross-sectional area of the bent portions 10h, 10h,..., 10i, 10i,. Therefore, an increase in current density inside the bent portions 10h, 10h,..., 10i, 10i,... Can be suppressed without changing the design parameters, so that the bent portions 10h, 10h,. It is possible to extend the life of the bottom heater 10 by suppressing the deterioration of 10i, 10i,.
[0016]
Further, the width of the conventional slits 5e, 5e,... Is constant, but the slits 10e, 10e,... Of the present embodiment are slightly deeper toward the back (closer to the center point O). Is narrowed. By forming the slits 10e, 10e,... In this way, the bending rate of the current path at the inner bent portions 10h, 10h,... Located on the hole 10d side is reduced, so that the inner bent portions 10h, 10h,. ... Is less concentrated on the inner side (slits 10e, 10e,...).
[0017]
Further, the slits 10f, 10f,... Of the present embodiment are formed so as to increase in width toward the back (away from the center point O) as opposed to the slits 10e, 10e,. The outer bent portions 10i, 10i,... Located on the outer peripheral side have a shape in which the two bent portions a1, a1,... And the straight portions a2, a2,. By forming the outer bent portions 10i, 10i,... In such a shape, the bending rate of the current path is smaller than that of the conventional outer bent portions 5i, 5i,. The concentration of the applied current on the inner side (slits 10f, 10f,...) Of 10i,.
[0018]
【The invention's effect】
As described above, the carbon heater according to the present invention has the following effects.
(1) According to the present invention, the concentration of the applied current in the bent portion can be suppressed, so that the lifetime of the bent portion can be suppressed and the life of the single crystal can be increased. It is possible to improve the maintainability of the upper device.
(2) Further, according to the present invention, since the bending rate of the current path in the bent portion is reduced, the concentration of the applied current on the inner side of the bent portion is alleviated, thereby suppressing the deterioration of the bent portion and extending the life. it is Ru can.
[Brief description of the drawings]
FIG. 1 is a cross-sectional view showing an outline of a semiconductor single crystal pulling apparatus.
FIG. 2 is a front view showing a bottom heater for a conventional semiconductor single crystal pulling apparatus.
FIG. 3 is a front view and a partial sectional view showing a bottom heater according to an embodiment of the present invention.
[Explanation of symbols]
10 …… Bottom heater (carbon heater)
10a: Heater body 10b, 10c: Terminal portion 10d: Holes 10e, 10f ... Slit 10g ... Linear portion 10h ... Inner bent portion (bent portion)
10i ...... Outer bending part (bending part)

Claims (4)

半導体融液貯留用の石英ルツボを下部から加熱するように略円盤状に形成され、印加電流が円盤中心から離間する方向と円盤中心に接近する方向とに交互に流れるように直線部と屈曲部とが交互に形成されたカーボンヒータであって、
前記直線部に対して印加電流が集中して電流密度が高くなる前記屈曲部における断面積を相対的に増大させるよう前記直線部に対して前記屈曲部の厚みが相対的に厚くされてなることを特徴とするカーボンヒータ。
A quartz crucible for storing semiconductor melt is formed in a substantially disk shape so as to be heated from below, and a linear part and a bent part so that the applied current flows alternately in a direction away from the center of the disk and a direction approaching the center of the disk. Is a carbon heater formed alternately,
The thickness of the bent portion is formed by thickened relative to so that the linear portion of the cross-sectional area is relatively increased in the bent portion applied current the current density is increased to concentrate to the straight portion A carbon heater characterized by that.
互いに隣り合う前記直線部の間に外周側から円盤中心に向けて形成されるスリットの幅は、前記屈曲部のうち円盤中心側の内側屈曲部の内側における印加電流の集中が緩和されるように、円盤中心に近づく程狭く形成されることを特徴とする請求項記載のカーボンヒータ。Width of slit formed towards the disk center from the outer peripheral side between the straight portions adjacent to each other, as the concentration of the applied current in the inside of the inner bent portion of the disc center side is alleviated of the bent portion The carbon heater according to claim 1 , wherein the carbon heater is narrower as it approaches the center of the disk. 互いに隣り合う前記直線部の間に円盤中心から外周側に向けて形成されるスリットの幅は、前記屈曲部のうち円盤中心から離れる側の外側屈曲部の内側における印加電流の集中が緩和されるように、円盤中心から離れる程広く形成されることを特徴とする請求項1または2記載のカーボンヒータ。Width of slit formed toward the outer circumferential side of a disk center between the straight portions adjacent to each other, concentrating the applied current in the inside of the outer bent portion of the side away from the disk center is alleviated of the bent portion The carbon heater according to claim 1 , wherein the carbon heater is formed so as to be farther away from the center of the disk. 請求項1から3いずれかに記載されたカーボンヒータの抵抗値設定方法であって、A carbon heater resistance value setting method according to any one of claims 1 to 3,
予めカーボンヒータの全体的な抵抗値を設定し、  Set the overall resistance value of the carbon heater in advance,
前記屈曲部の厚みを厚くし、これによって抵抗値が低下する分を、前記直線部の厚みを薄くすることにより、前記全体の抵抗値を調整することを特徴とするカーボンヒータの抵抗値設定方法。  A resistance value setting method for a carbon heater, characterized in that the overall resistance value is adjusted by increasing the thickness of the bent portion and thereby decreasing the resistance value, thereby reducing the thickness of the linear portion. .
JP2000036798A 2000-02-15 2000-02-15 Carbon heater Expired - Fee Related JP3861548B2 (en)

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