JP3850967B2 - Semiconductor package substrate and manufacturing method thereof - Google Patents

Semiconductor package substrate and manufacturing method thereof Download PDF

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Publication number
JP3850967B2
JP3850967B2 JP35286797A JP35286797A JP3850967B2 JP 3850967 B2 JP3850967 B2 JP 3850967B2 JP 35286797 A JP35286797 A JP 35286797A JP 35286797 A JP35286797 A JP 35286797A JP 3850967 B2 JP3850967 B2 JP 3850967B2
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Prior art keywords
circuit board
semiconductor package
pattern
forming
cutting
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JPH11186439A (en
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芳弘 石田
潔 清水
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Citizen Watch Co Ltd
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Citizen Watch Co Ltd
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Priority to TW087120893A priority patent/TW421980B/en
Priority to KR1019980056724A priority patent/KR100589530B1/en
Priority to US09/216,932 priority patent/US6219912B1/en
Publication of JPH11186439A publication Critical patent/JPH11186439A/en
Priority to US09/569,310 priority patent/US6324068B1/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/93Batch processes
    • H01L24/95Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L24/97Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips the devices being connected to a common substrate, e.g. interposer, said common substrate being separable into individual assemblies after connecting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Structure Of Printed Boards (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は半導体パッケージの製造方法に係わり、更に詳しくは外部接続用の突起電極を有する半導体パッケージの製造方法に関するものである。
【0002】
【従来の技術】
近年、半導体パッケージの小型化、高密度化に伴いベア・チップを直接フェイスダウンで、基板上に実装するフリップチップボンディングが開発されている。カメラ一体型VTRや携帯電話機等の登場により、ベア・チップと略同じ寸法の小型パッケージ、所謂CSP(チップサイズ/スケール・パッケージ)を載せた携帯機器が相次いで登場してきている。最近CSPの開発は急速に進み、その市場要求が本格化している。
【0003】
図6は、多数個取りし、高密度実装化した従来技術が特開平8−153819号公報に開示されている。以下図面に基づいてその概要を説明する。
【0004】
図6において、短冊状の回路基板1にスルーホール2を形成後、銅メッキ層を施す工程と、全ての回路パターンと接続する共通電極14を含む複数個、例えば2個のBGAを構成する回路パターンを形成する回路パターン形成工程と、前記回路基板1の上下両面に感光性樹脂皮膜を施した後、エッチングにより、共通電極14及びICチップ、ボンディングワイヤ、半田バンプの各接続部を除くようにドライフイルムを形成するドライフイルムラミネート工程と、前記共通電極14を利用して前記回路基板1の上下両面の露出している電極の銅メッキ層の表面に、Ni−Auメッキ層を形成する。
【0005】
次に、共通電極14と回路パターンとを分離するパターン分離工程は、製品分離ライン15の四辺に沿って、その四隅に回路基板1と連結する連結部15aを残すように、ルータ加工により長穴16を穴明けする。その後、ワイヤーボンディング及びトランスファーモールドにより樹脂封止し、回路基板1の下面に半田バンプを形成する。
【0006】
製品分離工程は、前記四隅に残した連結部は狭隘なため、プレス抜き等の切り離し手段で余分な負荷をかけることなく極めて容易に分離することにより、単個のBGAを製造することができる。
【0007】
しかしながら、前述した短冊状の複数個取りする半導体パッケージの製造方法は、単個の半導体パッケージの製造方法に比較して生産性は若干向上するが、小型パッケージであるCSPにおいては、回路基板製造時の基板取り個数が少なく、生産コストが高くなる。また、前記CSPのように、前記回路基板の外縁から最外周に位置するボール電極の中心までの距離が差が無くなると、製品分離工程でプレス抜き等の切り離し手段で分離する時の金型押さえ代が無くなる等の問題があった。
【0008】
そこで、小型携帯機器等に搭載するCSPの従来の半導体パッケージの製造方法について以下その概要を説明する。
【0009】
図3は半導体用パッケージ基板製造工程である。両面銅張りされた集合回路基板1Aにスルーホール21を形成した後、無電解銅メッキ及び電解銅メッキにより銅メッキ層22を形成し、スルーホールを樹脂などの穴埋め材23で穴埋めし、エッチングレジストをラミネートし、露光現像してパターンマスクを形成した後、エッチング液を用いてパターンエッチングを行うことにより、前記集合回路基板1Aの上面側には複数個分配列したIC接続用電極3、下面側にパッド電極である外部接続用電極4を形成する。次にソルダーレジスト処理を行い、所定の部分にレジスト膜を形成することにより、前記集合回路基板1Aの下面側には外部接続用電極4を露呈するよう形成し、更に露出したIC接続用電極3及び外部接続用電極4上に金メッキを行い、多数個取りする集合回路基板1Aが完成される。
【0010】
図4(a)は図3詳細を説明した多数個取りする回路基板形成工程であり、集合回路基板1Aの上面側に複数個分配列したIC接続用電極3、下面側にマトリックス状に多数の同一形状の半田付け可能な外部接続用電極4を形成してある。2はX、Y方向に直交するカットラインである。
【0011】
図4(b)に示すICチップ実装工程は、先ず、ICウエハーをバンプ工程に流して前記ICウエハーのパッド電極面に半田バンプ5を形成する。前記半田バンプ5の形成方法には、一般に、スタッドバンプ方式、ボールバンプ方式、及びメッキバンプ方式等があるが、その中で、パッド電極位置にレジストにて窓を形成し半田浴槽中に浸漬してメッキにて半田バンプを形成するメッキバンプ方式は、パッド電極間の狭い配列でバンプを形成することが可能で、ICチップの小型化には有効な半田バンプの形成手段である。
【0012】
前記半田バンプ5を形成後、前記ICウエハーを粘着テープ等で貼着した状態で、所定のチップサイズにダイシングソー等の装置でウエハーの厚みをフルカット方式でX、Y方向に切断した後、ICチップ6を単体に分割する。
【0013】
前記半田バンプ付きICチップ6、又は前述した集合回路基板1Aの前記配線バターンの所定位置にフラックスを塗布して、単体に分割した前記ICチップ6を1個づつ複数個分配列した集合回路基板1Aの個々の回路基板1上の所定位置に搭載した後、半田リフロー工程を経て、フリップチップ実装を行う。
【0014】
図4(c)に示す封止工程は、熱硬化性の封止樹脂7で前記隣接する複数個のICチップ5に跨がった状態で、サイドポッティングにより一体的に樹脂封止することにより、ICチップ6はフェイスダウンで集合回路基板1Aの個々の回路基板1上に固定される。
【0015】
さらに、ICチップ6を実装した集合回路基板1Aの下面側に形成された外部接続用電極4の位置に、半田ボールを配置してリフローすることによりボール電極9を形成する。
【0016】
図5(a)に示す基準部材張り付け工程は、ICチップ6を実装した集合回路基板1Aの下面側に形成された外部接続用電極4を、基準部材8上に接着剤又は粘着テープ等の固定手段で張り付ける。
【0017】
図5(b)は、タイシング工程で、前述のX、Y方向のカットライン2に沿って、ダイシングソー等の切削手段で、図7(a)示すような集合回路基板1Aの下面側に形成された切削用目合わせマーク11を基準に、単個に切削、分割した後、熱等により基準部材8より剥離する。
【0018】
図7(a)は、集合回路基板1Aの下面側の平面図であり、製品内に外部接続用電極4製品外に切削用目合わせマーク11が形成されている。
【0019】
図7(b)は、図7(a)の切削用目合わせマーク11のE−E‘断面図であり、銅パターンにより形成されている。
【0020】
図7(c)は、図7(a)の外部接続用電極4のF−F‘断面図であり、銅パターン上に形成されたソルダーレジストにより形成されている。つまり、外部接続用電極4aは銅パターンによってその表面が形成されるが、電極の外径、位置はソルダーレジストの開口部によって決定されている。
【0021】
【発明が解決しようとする課題】
しかしながら、前述した半導体パッケージの製造方法には次のような問題点がある。即ち、ダイシング工程で基準となる切削用目合わせパターンと外部接続用電極が同一でないため、単個に切削、分割されたとき、製品の外形基準でみた外部端子の位置精度が悪い等の問題があった。即ち、切削用目合わせパターンは銅パターンによってその外径と位置が決まるのに対し、外部接続用電極の外径と位置は銅パターンではなく、ソルダーレジストの開口部によって決まるので、両者の位置を完全に一致させるのは難しかった。
【0022】
製品の外形基準でみた外部端子の位置精度は、切削用目合わせパターンを形成する銅パターンに対する外部接続用電極を形成するソルダーの位置公差±100ミクロンとダイシング公差±50ミクロンを合わせた±150ミクロンとなる。
【0023】
本発明は、上記従来の課題に鑑みなされたものであり、その目的は、小型携帯機器等に搭載する外形基準に対する外部端子の位置精度の良い半導体用基板及び半導体パッケージを提供するものである。
【0024】
【課題を解決するための手段】
上記目的を達成するために、本発明は、ICチップ実装用のボンディングパターンと外部接続用電極を形成するための電極パターンとを集合回路基板面に複数個分配列して形成した回路基板に、複数のICチップを電気的に接続し、該ICチップを樹脂封止したパッケージ集合体を切削して単個の完成半導体パッケージを形成する半導体パッケージ用基板において、前記パッケージ集合体の回路基板は、切削位置を示す位置合わせパターンを有しており、該位置合わせパターンは前記電極パターンを部分的に覆って前記外部接続用電極の位置を規制する部材と同一部材で構成されていることを特徴とするものである。
【0025】
また、 一方の面に設けられたICチップ実装用のボンディングパターンと、他方の面に設けられた外部接続用電極を形成するための電極パターンとを集合回路基板面に複数個分配列して形成する回路基板形成工程と、前記ボンディングパターンにICチップを電気的に接続するICチップ実装工程と、該ICチップを樹脂封止してパッケージ集合体を形成する封止工程と、該パッケージ集合体のICチップ実装面側を基準部材に固定する保持工程と、保持されたパッケージ集合体の回路基板に切削位置である位置合わせパターンを形成する位置合わせパターン形成工程と、前記位置合わせパターンに基づいて前記回路基板を切削して単個の完成半導体パッケージを形成する切削工程とからなる半導体パッケージ用基板において、前記位置合わせパターンは前記回路基板形成工程で形成される外部接続電極の前記電極パターンを部分的に覆って前記外部接続用電極の位置を規制する部材と同一部材で、且つ同一工程で形成されていることを特徴とするものである。
【0027】
また、前記電極パターンを部分的に覆って外部接続電極の位置を規制する部材が、ソルダーレジストであることを特徴とするものである。
【0028】
また、前記切削工程は、ダイシングソーによる切削で行うことを特徴とするものである。
【0029】
【発明の実施の形態】
以下図面に基づいて本発明における半導体パッケージ用基板及びその製造方法について説明する。図1及び図2は本発明の実施の形態で、半導体パッケージ用基板の説明図である。図3は半導体用パッケージ基板の製造工程を示す説明図である。図4及び図5は突起電極付きの半導体パッケージの製造工程を示す説明図である。従来技術と同一部材は同一符号で示す。
【0030】
先ず、図3は半導体パッケージ用基板形成工程の説明図であるが、前述の従来技術と同様であるので、説明は省略する。
【0031】
図1(a)は、本発明の半導体用パッケージ基板を示す平面図である。製品外部にソルダーレジストで形成された切削用目合わせマーク11がある。製品側の銅パターン上には、ソルダーレジストによって外径と位置が決定された外部接続用電極4bがある。即ち本実施形態では、銅パターンの外径がソルダーレジスト開口部の開口径より大きい場合を示しており、切削用目合わせマーク11が外部接続用電極4bの外径と位置を決定するソルダーレジストによって形成されているので、製品外形に対する電極の位置精度が良くなるものである。
【0032】
図1(b)は図1(a)のA−A‘断面図である。
【0033】
図1(c)は図1(a)のB−B‘断面図である。
【0034】
図2(a)は、本発明の半導体用パッケージ基板のもう一つの例である。製品外部に、銅パターンで形成された切削用目合わせマーク11がある。製品側のソルダーレジストを開口した部分には、銅パターンで形成した外部接続用電極4bがある。本実施の形態では、銅パターンの外径がソルダーレジスト開口部の開口径より小さい場合を示しており、切削用目合わせマーク11が、外部接続用電極4bの外径と位置を決定する銅パターンで構成されているので、製品外形に対する電極の位置精度が良くなるものである。
【0035】
図2(b)は図2(a)のC−C‘断面図である。
【0036】
図2(c)は図2(a)のD−D‘断面図である。
【0037】
図4(a)の回路基板形成工程、図4(b)のIC実装工程、図4(c)の樹脂封止工程は、前述の従来技術と同様であるので、説明は省略する。
【0038】
図5(a)に示す基準部材張り付け工程は、ボール電極9a及び半田ボール突起部9bを基準部材8に接着剤、例えば、日東電工(株)製の熱剥離テープ「エレップホルダー感圧型ダイシングテープ、SPV−224」等の固定手段により張りつけることで、基準部材8上に固定する。
【0039】
図2(d)はタイシング工程で、前述のX、Y方向のカットライン2に沿って、ダイシングソー、例えば、ディスコ製のダイシング機「DFD−640」、使用ブレード「NBC−ZB1090S3、0.1mm幅」等を使用した切削手段で製品外部にソルダーレジストで形成された切削用目合わせマーク11を基準にして、単個に切削、分割した後、熱により前述剥離テープの接着力を低下させた後、基準部材8より剥離する。以上の工程により単個のフリップチップBGA10が完成される。
【0040】
【発明の効果】
以上説明したように、本発明の半導体パッケージ基板を使った半導体パッケージでは、ダイシング工程で基準となる目合わせパターンと外部端子パターンの外径と位置を決定する外部接続電極の構成部材とを同一部材、同一工程で形成したので、パッケージ外形に対する外部端子の位置精度が良く、半導体パッケージのマザーボードへの搭載性及び生産性の優れた半導体パッケージを提供することが可能である。
【0041】
製品の外形基準でみた外部端子の位置精度は、切削用目合わせパターンと外部接続用電極を形成する工程が同じなため、銅パターンまたはソルダーレジストの位置公差±10ミクロンとダイシング公差±50ミクロンを合わせた±60ミクロンとなる。
【図面の簡単な説明】
【図1】本発明の実施の形態に係わる半導体用基板の説明図である。
【図2】本発明の実施の形態に係わる半導体用基板の別の説明図である。
【図3】半導体用基板の製造工程を示す説明図である。
【図4】BGA半導体パッケージの製造工程で、回路基板形成工程、IC実装工程、樹脂封止工程を示す説明図である。
【図5】BGA半導体パッケージの製造工程で、回路基板形成工程、IC実装工程、樹脂封止工程を示す説明図である。
【図6】従来の短冊状のBGAの平面図である。
【図7】従来の半導体用基板の説明図である。
【符号の説明】
1 回路基板
1A 集合回路基板
2 カットライン
3 IC接続用電極
4a 外部接続用電極
4b 突起形成パッド
5 半田ボール
6 ICチップ
7 封止樹脂
8 基準部材
9 ボール電極(突起電極)
10 フリップチップBGA
11 切削用目合わせパターン
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method for manufacturing a semiconductor package, and more particularly to a method for manufacturing a semiconductor package having protruding electrodes for external connection.
[0002]
[Prior art]
2. Description of the Related Art In recent years, flip chip bonding has been developed in which a bare chip is directly mounted face-down on a substrate as semiconductor packages become smaller and higher in density. With the advent of camera-integrated VTRs, mobile phones, and the like, mobile devices on which small packages of approximately the same dimensions as bare chips, so-called CSP (chip size / scale packages), have appeared one after another. Recently, the development of CSP is progressing rapidly, and the market demand is in full swing.
[0003]
FIG. 6 shows a conventional technique in which a large number are taken and high-density mounting is disclosed in Japanese Patent Laid-Open No. 8-1553819. The outline will be described below with reference to the drawings.
[0004]
In FIG. 6, after forming a through hole 2 in a strip-shaped circuit board 1, a step of applying a copper plating layer and a circuit constituting a plurality of, for example, two BGAs including a common electrode 14 connected to all circuit patterns. A circuit pattern forming process for forming a pattern, and after applying a photosensitive resin film on both the upper and lower surfaces of the circuit board 1, the common electrode 14 and the connecting portions of the IC chip, bonding wires, and solder bumps are removed by etching. A Ni-Au plating layer is formed on the surface of the exposed copper plating layer of the upper and lower surfaces of the circuit board 1 by using the common electrode 14 and a dry film laminating process for forming a dry film.
[0005]
Next, in the pattern separation process for separating the common electrode 14 and the circuit pattern, a long hole is formed by router processing so that the connection portions 15a connected to the circuit board 1 are left at the four corners along the four sides of the product separation line 15. 16 is drilled. Thereafter, resin sealing is performed by wire bonding and transfer molding, and solder bumps are formed on the lower surface of the circuit board 1.
[0006]
In the product separation process, since the connecting portions left at the four corners are narrow, a single BGA can be manufactured by separating very easily without applying an extra load by a separating means such as press punching.
[0007]
However, although the above-described method for manufacturing a plurality of strip-shaped semiconductor packages is slightly improved in productivity as compared to a method for manufacturing a single semiconductor package, in a CSP which is a small package, a circuit board is manufactured. This reduces the number of substrates that can be produced and increases the production cost. Further, as in the case of the CSP, when there is no difference in the distance from the outer edge of the circuit board to the center of the ball electrode located on the outermost periphery, the mold holder when separating by a separating means such as press punching in the product separation process. There was a problem such as a lack of money.
[0008]
Therefore, an outline of a method for manufacturing a conventional semiconductor package of a CSP mounted on a small portable device or the like will be described below.
[0009]
FIG. 3 shows a manufacturing process of a semiconductor package substrate. After the through hole 21 is formed in the collective circuit board 1A that is copper-coated on both sides, a copper plating layer 22 is formed by electroless copper plating and electrolytic copper plating, and the through hole is filled with a filling material 23 such as a resin, and an etching resist After forming the pattern mask by laminating and exposing and developing, pattern etching is performed using an etching solution, so that a plurality of IC connection electrodes 3 arranged on the upper surface side of the collective circuit board 1A are provided on the lower surface side. The external connection electrode 4 which is a pad electrode is formed on the substrate. Next, a solder resist process is performed to form a resist film on a predetermined portion, so that the external connection electrode 4 is exposed on the lower surface side of the collective circuit board 1A, and the exposed IC connection electrode 3 is exposed. Then, gold plating is performed on the external connection electrodes 4 to complete the collective circuit board 1A to be obtained in large numbers.
[0010]
FIG. 4A is a circuit board forming step for taking a large number of pieces as described in detail in FIG. An external connection electrode 4 having the same shape and solderable is formed. Reference numeral 2 denotes a cut line orthogonal to the X and Y directions.
[0011]
In the IC chip mounting process shown in FIG. 4B, first, the IC wafer is poured into a bump process to form solder bumps 5 on the pad electrode surface of the IC wafer. The solder bumps 5 are generally formed by a stud bump method, a ball bump method, a plated bump method, etc., in which a window is formed with a resist at the pad electrode position and immersed in a solder bath. The plating bump method of forming solder bumps by plating can form bumps with a narrow arrangement between pad electrodes, and is an effective means for forming solder bumps for miniaturization of IC chips.
[0012]
After forming the solder bumps 5, with the IC wafer attached with an adhesive tape or the like, the wafer thickness is cut in the X and Y directions by a full-cut method with a device such as a dicing saw to a predetermined chip size, The IC chip 6 is divided into single pieces.
[0013]
The integrated circuit board 1A in which the IC chips 6 with solder bumps or the integrated circuit board 1A described above are coated with a flux at a predetermined position on the wiring pattern and divided into a plurality of IC chips 6 divided into single pieces. After mounting at a predetermined position on each of the circuit boards 1, flip chip mounting is performed through a solder reflow process.
[0014]
In the sealing step shown in FIG. 4C, the resin is integrally sealed by side potting while straddling the plurality of adjacent IC chips 5 with the thermosetting sealing resin 7. The IC chip 6 is fixed face-down on each circuit board 1 of the collective circuit board 1A.
[0015]
Furthermore, a ball electrode 9 is formed by placing a solder ball at the position of the external connection electrode 4 formed on the lower surface side of the collective circuit board 1A on which the IC chip 6 is mounted and performing reflow.
[0016]
In the reference member pasting step shown in FIG. 5A, the external connection electrode 4 formed on the lower surface side of the collective circuit board 1A on which the IC chip 6 is mounted is fixed on the reference member 8 with an adhesive or an adhesive tape. Stick by means.
[0017]
FIG. 5B is a tiling process, and is formed on the lower surface side of the collective circuit board 1A as shown in FIG. 7A by cutting means such as a dicing saw along the above-described cut lines 2 in the X and Y directions. After cutting and dividing into single pieces based on the cut alignment marks 11, they are peeled off from the reference member 8 by heat or the like.
[0018]
FIG. 7A is a plan view of the lower surface side of the collective circuit board 1A. The external connection electrode 4 and the cutting alignment mark 11 are formed outside the product.
[0019]
FIG.7 (b) is EE 'sectional drawing of the alignment mark 11 for cutting of Fig.7 (a), and is formed with the copper pattern.
[0020]
FIG.7 (c) is FF 'sectional drawing of the electrode 4 for external connection of Fig.7 (a), and is formed of the soldering resist formed on the copper pattern. That is, the surface of the external connection electrode 4a is formed by a copper pattern, but the outer diameter and position of the electrode are determined by the opening of the solder resist.
[0021]
[Problems to be solved by the invention]
However, the semiconductor package manufacturing method described above has the following problems. That is, since the cutting alignment pattern used as a reference in the dicing process and the external connection electrode are not the same, there are problems such as poor position accuracy of the external terminals viewed from the product external reference when cut and divided into single pieces. there were. That is, the outer diameter and position of the cutting alignment pattern are determined by the copper pattern, whereas the outer diameter and position of the external connection electrode are determined not by the copper pattern but by the opening of the solder resist. It was difficult to match perfectly.
[0022]
The position accuracy of the external terminals as seen from the product outline standard is ± 150 microns, which is a combination of the solder position tolerance of ± 100 microns and the dicing tolerance of ± 50 microns with respect to the copper pattern that forms the cutting alignment pattern It becomes.
[0023]
The present invention has been made in view of the above-described conventional problems, and an object of the present invention is to provide a semiconductor substrate and a semiconductor package with good external terminal positional accuracy with respect to an external standard to be mounted on a small portable device or the like.
[0024]
[Means for Solving the Problems]
In order to achieve the above object, the present invention provides a circuit board formed by arranging a plurality of bonding patterns for mounting IC chips and electrode patterns for forming external connection electrodes on the surface of the collective circuit board. In a semiconductor package substrate in which a plurality of IC chips are electrically connected and a package assembly in which the IC chips are sealed with resin is cut to form a single completed semiconductor package, the circuit board of the package assembly includes: It has an alignment pattern indicating a cutting position, and the alignment pattern is formed of the same member as a member that partially covers the electrode pattern and regulates the position of the external connection electrode. To do.
[0025]
In addition, a plurality of bonding patterns for mounting IC chips provided on one surface and electrode patterns for forming external connection electrodes provided on the other surface are arranged on the surface of the collective circuit board. A circuit board forming step, an IC chip mounting step for electrically connecting an IC chip to the bonding pattern, a sealing step for forming a package assembly by resin-sealing the IC chip, and a package assembly A holding step of fixing the IC chip mounting surface side to the reference member, an alignment pattern forming step of forming an alignment pattern that is a cutting position on the circuit board of the held package assembly, and the alignment pattern based on the alignment pattern In a semiconductor package substrate comprising a cutting step of cutting a circuit board to form a single completed semiconductor package, the alignment The cutting pattern is the same member as the member that partially covers the electrode pattern of the external connection electrode formed in the circuit board forming step and regulates the position of the external connection electrode , and is formed in the same step. It is characterized by.
[0027]
Moreover, members for regulating the position of the external connection electrodes to cover the electrode pattern partially is characterized in that a solder resist.
[0028]
The cutting step is performed by cutting with a dicing saw.
[0029]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, a semiconductor package substrate and a manufacturing method thereof according to the present invention will be described with reference to the drawings. 1 and 2 are explanatory views of a substrate for a semiconductor package according to an embodiment of the present invention. FIG. 3 is an explanatory view showing a manufacturing process of a semiconductor package substrate. 4 and 5 are explanatory views showing a manufacturing process of a semiconductor package with protruding electrodes. The same members as those in the prior art are denoted by the same reference numerals.
[0030]
First, FIG. 3 is an explanatory diagram of a semiconductor package substrate forming process, but since it is the same as the above-described prior art, description thereof is omitted.
[0031]
FIG. 1A is a plan view showing a semiconductor package substrate of the present invention. There is a cutting alignment mark 11 formed of a solder resist outside the product. On the copper pattern on the product side, there is an external connection electrode 4b whose outer diameter and position are determined by a solder resist. That is, in the present embodiment, the case where the outer diameter of the copper pattern is larger than the opening diameter of the solder resist opening is shown, and the alignment mark 11 for cutting is determined by the solder resist that determines the outer diameter and position of the external connection electrode 4b. Since it is formed, the positional accuracy of the electrode with respect to the product outer shape is improved.
[0032]
FIG.1 (b) is AA 'sectional drawing of Fig.1 (a).
[0033]
FIG.1 (c) is BB 'sectional drawing of Fig.1 (a).
[0034]
FIG. 2A shows another example of the semiconductor package substrate of the present invention. There is a cutting alignment mark 11 formed of a copper pattern outside the product. In the portion where the solder resist on the product side is opened, there is an external connection electrode 4b formed of a copper pattern. In the present embodiment, the outer diameter of the copper pattern is smaller than the opening diameter of the solder resist opening, and the cutting alignment mark 11 determines the outer diameter and position of the external connection electrode 4b. Therefore, the positional accuracy of the electrode with respect to the product outer shape is improved.
[0035]
FIG. 2B is a cross-sectional view taken along the line CC ′ of FIG.
[0036]
FIG. 2C is a cross-sectional view taken along the line DD ′ of FIG.
[0037]
The circuit board forming process in FIG. 4A, the IC mounting process in FIG. 4B, and the resin sealing process in FIG.
[0038]
The reference member pasting step shown in FIG. 5A is performed by using a ball electrode 9a and a solder ball protrusion 9b as an adhesive to the reference member 8, for example, a heat release tape “ELEP holder pressure-sensitive dicing tape manufactured by Nitto Denko Corporation”. , SPV-224 "or the like, and is fixed on the reference member 8 by being attached thereto.
[0039]
FIG. 2 (d) shows a tiling process, along the above-mentioned cut line 2 in the X and Y directions, a dicing saw, for example, a disco dicing machine “DFD-640”, a blade used “NBC-ZB1090S3, 0.1 mm”. After cutting and dividing into single pieces with reference to the cutting alignment mark 11 formed of solder resist on the outside of the product by cutting means using “width” etc., the adhesive force of the peeling tape was reduced by heat. Then, it peels from the reference member 8. A single flip chip BGA 10 is completed through the above steps.
[0040]
【The invention's effect】
As described above, in the semiconductor package using the semiconductor package substrate of the present invention, the alignment member serving as a reference in the dicing process and the constituent members of the external connection electrodes that determine the outer diameter and position of the external terminal pattern are the same member. Since they are formed in the same process, it is possible to provide a semiconductor package with good positional accuracy of the external terminals with respect to the package outer shape and excellent mounting property and productivity of the semiconductor package on the motherboard.
[0041]
The position accuracy of the external terminals as viewed from the product outline is the same as the process of forming the alignment pattern for cutting and the electrode for external connection, so the positional tolerance of the copper pattern or solder resist is ± 10 microns and the dicing tolerance is ± 50 microns. The total is ± 60 microns.
[Brief description of the drawings]
FIG. 1 is an explanatory diagram of a semiconductor substrate according to an embodiment of the present invention.
FIG. 2 is another explanatory diagram of the semiconductor substrate according to the embodiment of the present invention.
FIG. 3 is an explanatory diagram showing a manufacturing process of a semiconductor substrate.
FIG. 4 is an explanatory diagram showing a circuit board forming process, an IC mounting process, and a resin sealing process in the manufacturing process of the BGA semiconductor package.
FIG. 5 is an explanatory diagram showing a circuit board forming process, an IC mounting process, and a resin sealing process in the manufacturing process of the BGA semiconductor package.
FIG. 6 is a plan view of a conventional strip-shaped BGA.
FIG. 7 is an explanatory diagram of a conventional semiconductor substrate.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Circuit board 1A Collective circuit board 2 Cut line 3 IC connection electrode 4a External connection electrode 4b Protrusion formation pad 5 Solder ball 6 IC chip 7 Sealing resin 8 Reference member 9 Ball electrode (protrusion electrode)
10 Flip chip BGA
11 Cutting alignment pattern

Claims (4)

ICチップ実装用のボンディングパターンと外部接続用電極を形成するための電極パターンとを集合回路基板面に複数個分配列して形成した回路基板に、複数のICチップを電気的に接続し、該ICチップを樹脂封止したパッケージ集合体を切削して単個の完成半導体パッケージを形成する半導体パッケージ用基板において、前記パッケージ集合体の回路基板は、切削位置を示す位置合わせパターンを有しており、該位置合わせパターンは前記電極パターンを部分的に覆って前記外部接続用電極の位置を規制する部材と同一部材で構成されていることを特徴とする半導体パッケージ用基板。A plurality of IC chips are electrically connected to a circuit board formed by arranging a plurality of bonding patterns for mounting IC chips and electrode patterns for forming external connection electrodes on the surface of the collective circuit board, In a semiconductor package substrate that forms a single completed semiconductor package by cutting a package assembly in which an IC chip is sealed with a resin, the circuit board of the package assembly has an alignment pattern indicating a cutting position. The semiconductor package substrate is characterized in that the alignment pattern is made of the same member as the member that partially covers the electrode pattern and regulates the position of the external connection electrode . 一方の面に設けられたICチップ実装用のボンディングパターンと、他方の面に設けられた外部接続用電極を形成するための電極パターンとを集合回路基板面に複数個分配列して形成する回路基板形成工程と、前記ボンディングパターンにICチップを電気的に接続するICチップ実装工程と、該ICチップを樹脂封止してパッケージ集合体を形成する封止工程と、該パッケージ集合体のICチップ実装面側を基準部材に固定する保持工程と、保持されたパッケージ集合体の回路基板に切削位置である位置合わせパターンを形成する位置合わせパターン形成工程と、前記位置合わせパターンに基づいて前記回路基板を切削して単個の完成半導体パッケージを形成する切削工程とからなる半導体パッケージ用基板において、前記位置合わせパターンは前記回路基板形成工程で形成される前記電極パターンを部分的に覆って前記外部接続用電極の位置を規制する部材と同一部材で、且つ同一工程で形成されていることを特徴とする半導体パッケージ用基板の製造方法。A circuit in which a bonding pattern for mounting an IC chip provided on one surface and an electrode pattern for forming an external connection electrode provided on the other surface are arranged on the surface of the collective circuit board. A substrate forming step, an IC chip mounting step for electrically connecting an IC chip to the bonding pattern, a sealing step for forming a package assembly by resin-sealing the IC chip, and an IC chip for the package assembly A holding step of fixing the mounting surface side to the reference member, an alignment pattern forming step of forming an alignment pattern as a cutting position on the circuit board of the held package assembly, and the circuit board based on the alignment pattern In a semiconductor package substrate comprising a cutting step of forming a single completed semiconductor package by cutting Emissions is characterized in that it is formed by members of the same member for regulating the position of the external connection electrodes to cover the electrode pattern formed in the circuit board forming process, in part, and in the same step semiconductor A method for manufacturing a package substrate. 前記電極パターンを部分的に覆って外部接続用電極の位置を規制する部材が、ソルダーレジストであることを特徴とする請求項1に記載の半導体パッケージ用基板。 2. The semiconductor package substrate according to claim 1, wherein the member that partially covers the electrode pattern and restricts the position of the external connection electrode is a solder resist . 前記切削工程は、ダイシングソーによる切削で行うことを特徴とする請求項2に記載の半導体パッケージ用基板の製造方法 The method for manufacturing a substrate for a semiconductor package according to claim 2, wherein the cutting step is performed by cutting with a dicing saw .
JP35286797A 1997-12-22 1997-12-22 Semiconductor package substrate and manufacturing method thereof Expired - Fee Related JP3850967B2 (en)

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JP35286797A JP3850967B2 (en) 1997-12-22 1997-12-22 Semiconductor package substrate and manufacturing method thereof
TW087120893A TW421980B (en) 1997-12-22 1998-12-16 Electronic component device, its manufacturing process, and collective circuits
KR1019980056724A KR100589530B1 (en) 1997-12-22 1998-12-21 Electronic component device, method for manufacture of same, and aggregated circuit board
US09/216,932 US6219912B1 (en) 1997-12-22 1998-12-21 Method for manufacture electronic component device
US09/569,310 US6324068B1 (en) 1997-12-22 2000-05-11 Electronic component device, and main board for circuit boards

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JP5075114B2 (en) * 2006-03-03 2012-11-14 パナソニック株式会社 Product substrate manufacturing method and electronic device
JP5466820B2 (en) * 2007-10-18 2014-04-09 ピーエスフォー ルクスコ エスエイアールエル Semiconductor substrate and method for manufacturing semiconductor device
JP5249651B2 (en) * 2008-07-02 2013-07-31 株式会社フジクラ Substrate material cutting apparatus and method
JP5463092B2 (en) * 2009-07-07 2014-04-09 アルプス電気株式会社 Electronic circuit unit and manufacturing method thereof
US8357254B2 (en) 2010-01-29 2013-01-22 Bridgestone Bandag, Llc Method and apparatus for improved tread splicing
JP5444382B2 (en) * 2012-01-16 2014-03-19 ルネサスエレクトロニクス株式会社 Resin-sealed semiconductor device
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