JP3819089B2 - Method for producing novolac type compound - Google Patents

Method for producing novolac type compound Download PDF

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Publication number
JP3819089B2
JP3819089B2 JP30088196A JP30088196A JP3819089B2 JP 3819089 B2 JP3819089 B2 JP 3819089B2 JP 30088196 A JP30088196 A JP 30088196A JP 30088196 A JP30088196 A JP 30088196A JP 3819089 B2 JP3819089 B2 JP 3819089B2
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Japan
Prior art keywords
compound
reaction
aromatic
bis
type compound
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JP30088196A
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JPH10130352A (en
Inventor
良一 長谷川
泰昌 赤塚
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Nippon Kayaku Co Ltd
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Nippon Kayaku Co Ltd
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  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)

Description

【0001】
【発明の属する技術分野】
本発明はノボラック型化合物の製造法に関する。
【0002】
【従来の技術】
特開平4−110317には、ハロゲン化メチル芳香族化合物と芳香族ヒドロキシ化合物の反応により、目的とするノボラックが製造できることが記載されている。しかし同時に、ハロゲン化水素ガスの発生等の問題があることも記載されている。また、この反応は、原理的に、酸触媒であるハロゲン化水素が発生し、加速度的に反応速度が増加するため反応のコントロ−ルが難しいという問題があった。
【0003】
【発明が解決しようとする課題】
本発明は、工業的に安価なハロゲノメチル芳香族化合物を用いて、ノボラック型樹脂の製造を、装置の腐食や、反応の激しさのために生成物がゲル化を起こしたりすることのない方法で実現することを目的とする。
【0004】
【課題を解決するための手段】
すなわち本発明は
(1)下記式(1)で示されるハロゲン化メチル芳香族化合物を、アルカリ性物質の存在下、芳香族ヒドロキシル化合物と反応させることによるノボラック型化合物の製造方法、
R(−CH2 X)n (1)
(式中、nは2〜3の整数を表す。Rは2価または3価の芳香族基、XはClまたはBrを表す。)
(2)Rがフェニル、ナフチル、ビフェニル由来の基であるハロゲン化メチル芳香族化合物を用いる上記(1)記載の製造方法、
(3)芳香族ヒドロキシル化合物が、フェノ−ル、ナフト−ル類またはビフェノ−ル類から選ばれる上記(1)または(2)記載の製造方法
を提供する。
【0005】
【発明の実施形態】
上記式(1)で示される具体的化合物としては、1,4−ビス(クロロメチル)ベンゼン、1,2−ビス(クロロメチル)ベンゼン、1,3−ビス(クロロメチル)ベンゼン、1,4−ビス(ブロモメチル)ベンゼン、4,4’−ビス(クロロメチル)ビフェニル、2,4’−ビス(クロロメチル)ビフェニル、2,2’−ビス(クロロメチル)ビフェニル、4,4’−ビス(ブロモメチル)ビフェニル、2,4’−ビス(ブロモメチル)ビフェニル、2,2’−ビス(ブロモメチル)ビフェニル、2,6−ビス(クロロメチル)ナフタレン、1,4−ビス(クロロメチル)ナフタレン、等のビスクロロメチルナフタレン類、ビス(ブロモフェニル)ナフタレン類、があげられるが上記式(1)で表される限り、これらに限定されるものではない。
【0006】
芳香族ヒドロキシル化合物としては、フェノ−ル、o−クレゾ−ル、m−クレゾ−ル、p−クレゾ−ル、2,6−キシレノ−ル、2,4−キシレノ−ル、カテコ−ル、レゾルシン、ハイドロキノン、α−ナフト−ル、β−ナフト−ル、2,6−ジヒドロキシナフタレン、1,5−ジヒドロキシナフタレン、ビフェノ−ル、ビスフェノ−ル−A、ビスフェノ−ル−F、等があげられる。
これらの芳香族ヒドロキシル化合物は、1種または、2種以上を混合して使用することができ、その使用量は、式(1)の化合物中のハロゲン化メチル基1モルに対して通常0.8〜20モル、好ましくは1〜10モルである。
【0007】
使用するアルカリ物質としては、苛性ソ−ダ、苛性カリ、水酸化リチウム、炭酸ソ−ダ、炭酸カリ、炭酸リチウム、重炭酸ソ−ダ、重炭酸カリ、炭酸カルシウム、炭酸マグネシウム、酸化カルシウム、酸化マグネシウム、酢酸ソ−ダ、酢酸カリ、シュウ酸ソ−ダまたは炭酸アンムニウム並びにトリエチルアミンまたはジメチルアニリン等の有機アミン類等があげられる。その使用量は式(1)の化合物中ハロゲン化メチル基1モルに対して等モルかまたは若干過剰となるように使用する。
【0008】
反応は、通常溶媒中で行う。溶媒としては、ヘキサン、ヘプタン、トルエン、キシレン、プソイドキュメン、シクロヘキサン等の炭化水素類、ジクロロエタン、塩化エチレン、クロロベンゼン等のハロゲン化炭化水素類、ジブチルエ−テル、ジオキサンまたはメトキシエタノ−ル等のエ−テル類、ジメチルフォルムアミド、ジメチルスルフォキシドまたはジメチルイミダゾリジノン等の非プロトン性極性溶媒、メタノ−ル、エタノ−ル、プロパノ−ルまたはブタノ−ル等のアルコ−ル類、アセトン、メチルエチルケトンまたはメチルイソブチルケトン等のケトン類、水、等が使用できるが、溶媒を使用しなくても良い。溶媒を使用する場合は、式(1)の化合物の、10重量%〜20重量倍程度使用するのが好ましい。また、ジメチルスルフォキシド等の非プロトン性極性溶媒を使用する場合は、これらがアルカリ性物質をよく溶解するため若干反応速度が遅くなるので、使用量を全反応混合物中の50重量%以下、好ましくは20重量%以下程度に制限するのが良い。またテトラブチルアンモニウムクロライド、トリトンB等の相関移動触媒を全反応混合物中の0.1〜1重量%程度使用できる。
【0009】
反応温度は、通常40℃〜200℃、好ましくは60℃〜150℃で行うことが出来る。また、生成する水を、共沸等により抜き出しながら反応を行う事もできる。
反応を制御するために、式(1)の化合物または、アルカリ性物質は少量ずつ添加する事もできるが、アルカリ性物質が式(1)の化合物より少し過剰に存在する様にするのが好ましい。反応時間は通常1時間〜25時間、好ましくは3〜15時間である。例えば、非プロトン性極性溶媒を使用した場合のように反応が遅くなった場合は若干、酸類の添加を行うことで解決できる。ここで用いることが出来る酸類は、塩酸、硫酸、リン酸、メタンスルフォン酸、トルエンスルフォン酸類、BF3 、塩化アルミニウム、塩化第二鉄等のルイス酸類があげられる。
【0010】
反応系は弱酸性〜中性に保つのが好ましい。溶媒系としてアルカリ性物質を完全に溶解しない溶媒を用いるのが、この条件を保つのに適している。例えば、原料の芳香族ヒドロキシ化合物を溶媒とした場合、及び、トルエン、キシレン、プソイドキュメン、クロロベンゼン、ヘキサン、シクロヘキサン、ヘプタン、ジクロロエタン、塩化エチレン等の炭化水素またはハロゲン化炭化水素類、ジブチルエ−テル、ジオキサン等のエーテル類、アセトン、メチルエチルケトン、メチルイソブチルケトン等のケトン類等を用いた場合はアルカリ性物質を一時に加えても反応はスム−ズに進行する。また、アルカリ性物質は固体で用いるのが好ましい。また、反応によるハロゲン化水素の発生が、ほぼ終わった時点で上記の酸触媒を添加し、ノボラック化反応を完結させるのが好ましい。この場合酸触媒の濃度が、0.01〜5重量%程度が適している。
【0011】
反応により塩類が生成する。反応終了後、塩類を濾過、水洗等により除いた後、溶媒及び/または、未反応の芳香族ヒドロキシ化合物を、蒸留または、溶媒に溶解して除去し、ノボラック化合物を得ることが出来る。
【0012】
【実施例】
以下実施例で本発明を更に詳細に説明するが、本発明はこれらの実施例に限定されるものではない。
【0013】
実施例1
300ml、4口フラスコに、トルエン55g、フェノ−ル20.7g、炭酸ソ−ダ23.3g、を仕込み70℃に昇温した。ここに、4,4’−ビス(クロロメチル)ビフェニル25.1gを少量ずつ仕込んだ。1時間で添加を終了した。この後、80℃で8時間、95℃で5時間反応させた。塩化水素ガスの発生は殆ど認められなかった。反応終了後、析出した塩を除去し、濾液に念のためメタンスルフォン酸を0.1g添加し、90℃で1時間反応させた。過剰のメタンスルフォン酸を苛性ソ−ダで中和した後、トルエンを留去し、冷却後34gのノボラック型化合物を得た。得られたノボラック型化合物の軟化点は75℃、であり、150℃における溶融粘度は2.4ポイズであった。
【0014】
実施例2
式(1)の化合物として1,4−ビス(クロロメチル)ベンゼンを17.5gを用いた以外は、実施例1と同様に反応させ、26.8gのノボラック型化合物を得た。得られたノボラック型化合物の軟化点は73℃であり、150℃における溶融粘度は3.1ポイズであった。
【0015】
実施例3
実施例1においてトルエンを用いず、フェノ−ルを50g使用し、炭酸ソ−ダの代わりに炭酸カリを19g使用した以外は、実施例1と同様に反応させ、34.8gのノボラック型化合物を得た。得られたノボラック型化合物の軟化点は108℃であり、150℃における溶融粘度は0.9ポイズであった。
【0016】
【発明の効果】
本発明によればハロゲン化メチル芳香族化合物より、効率的にノボラック型化合物が得られるようになった。得られたノボラック型化合物は、半導体封止用のエポキシ樹脂硬化剤やエポキシ樹脂の合成原料として有用である。
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a method for producing a novolac type compound.
[0002]
[Prior art]
JP-A-4-110317 describes that the desired novolak can be produced by the reaction of a halogenated methyl aromatic compound and an aromatic hydroxy compound. However, it is also described that there are problems such as generation of hydrogen halide gas. In addition, this reaction has a problem that, in principle, hydrogen halide which is an acid catalyst is generated, and the reaction rate increases at an accelerated speed, so that it is difficult to control the reaction.
[0003]
[Problems to be solved by the invention]
The present invention relates to the production of a novolak type resin using an industrially inexpensive halogenomethyl aromatic compound, in which the product does not cause gelation due to the corrosion of the apparatus or the severity of the reaction. It aims to be realized with.
[0004]
[Means for Solving the Problems]
That is, the present invention provides (1) a method for producing a novolak type compound by reacting a halogenated methyl aromatic compound represented by the following formula (1) with an aromatic hydroxyl compound in the presence of an alkaline substance,
R (—CH 2 X) n (1)
(In the formula, n represents an integer of 2 to 3. R represents a divalent or trivalent aromatic group, and X represents Cl or Br.)
(2) The production method according to the above (1), wherein a methyl halide aromatic compound in which R is a group derived from phenyl, naphthyl, or biphenyl,
(3) The production method according to the above (1) or (2), wherein the aromatic hydroxyl compound is selected from phenol, naphthols or biphenols.
[0005]
DETAILED DESCRIPTION OF THE INVENTION
Specific compounds represented by the above formula (1) include 1,4-bis (chloromethyl) benzene, 1,2-bis (chloromethyl) benzene, 1,3-bis (chloromethyl) benzene, 1,4 -Bis (bromomethyl) benzene, 4,4'-bis (chloromethyl) biphenyl, 2,4'-bis (chloromethyl) biphenyl, 2,2'-bis (chloromethyl) biphenyl, 4,4'-bis ( Bromomethyl) biphenyl, 2,4′-bis (bromomethyl) biphenyl, 2,2′-bis (bromomethyl) biphenyl, 2,6-bis (chloromethyl) naphthalene, 1,4-bis (chloromethyl) naphthalene, etc. Bischloromethylnaphthalene and bis (bromophenyl) naphthalene are exemplified, but are not limited to these as long as represented by the above formula (1).
[0006]
Aromatic hydroxyl compounds include phenol, o-cresol, m-cresol, p-cresol, 2,6-xylenol, 2,4-xylenol, catechol, resorcinol Hydroquinone, α-naphthol, β-naphthol, 2,6-dihydroxynaphthalene, 1,5-dihydroxynaphthalene, biphenol, bisphenol A, bisphenol F, and the like.
These aromatic hydroxyl compounds can be used singly or in combination of two or more, and the amount used is usually 0.1 with respect to 1 mol of the methyl halide group in the compound of formula (1). 8 to 20 mol, preferably 1 to 10 mol.
[0007]
Alkaline substances used include caustic soda, caustic potash, lithium hydroxide, soda, potassium carbonate, lithium carbonate, soda bicarbonate, potassium bicarbonate, calcium carbonate, magnesium carbonate, calcium oxide, magnesium oxide And soda acetate, potassium acetate, soda oxalate or ammonium carbonate, and organic amines such as triethylamine or dimethylaniline. The amount used is equimolar or slightly excessive with respect to 1 mole of the methyl halide group in the compound of formula (1).
[0008]
The reaction is usually carried out in a solvent. Solvents include hydrocarbons such as hexane, heptane, toluene, xylene, pseudocumene and cyclohexane, halogenated hydrocarbons such as dichloroethane, ethylene chloride and chlorobenzene, ethers such as dibutyl ether, dioxane and methoxyethanol. Aprotic polar solvents such as dimethylformamide, dimethylsulfoxide or dimethylimidazolidinone, alcohols such as methanol, ethanol, propanol or butanol, acetone, methyl ethyl ketone or methyl Although ketones such as isobutyl ketone, water, and the like can be used, it is not necessary to use a solvent. When using a solvent, it is preferable to use about 10 to 20 weight times of the compound of Formula (1). Also, when using aprotic polar solvents such as dimethyl sulfoxide, the reaction rate is slightly slow because they dissolve alkaline substances well, so the amount used is preferably 50% by weight or less in the total reaction mixture, preferably Is preferably limited to about 20% by weight or less. Further, a phase transfer catalyst such as tetrabutylammonium chloride and Triton B can be used in an amount of about 0.1 to 1% by weight based on the total reaction mixture.
[0009]
The reaction temperature is usually 40 ° C to 200 ° C, preferably 60 ° C to 150 ° C. Further, the reaction can be carried out while extracting generated water by azeotropic distillation or the like.
In order to control the reaction, the compound of the formula (1) or the alkaline substance can be added little by little, but it is preferable that the alkaline substance is present in a little excess than the compound of the formula (1). The reaction time is usually 1 hour to 25 hours, preferably 3 to 15 hours. For example, when the reaction slows down as in the case of using an aprotic polar solvent, it can be solved by adding some acids. Examples of acids that can be used here include Lewis acids such as hydrochloric acid, sulfuric acid, phosphoric acid, methanesulfonic acid, toluenesulfonic acids, BF3, aluminum chloride, and ferric chloride.
[0010]
The reaction system is preferably kept weakly acidic to neutral. Use of a solvent that does not completely dissolve the alkaline substance as the solvent system is suitable for maintaining this condition. For example, when the raw material aromatic hydroxy compound is used as a solvent, and hydrocarbons or halogenated hydrocarbons such as toluene, xylene, pseudocumene, chlorobenzene, hexane, cyclohexane, heptane, dichloroethane, ethylene chloride, dibutyl ether, dioxane When ethers such as acetone, ketones such as acetone, methyl ethyl ketone, and methyl isobutyl ketone are used, the reaction proceeds smoothly even if an alkaline substance is added at one time. The alkaline substance is preferably used as a solid. Further, it is preferable to complete the novolak reaction by adding the above acid catalyst when the generation of hydrogen halide by the reaction is almost completed. In this case, the concentration of the acid catalyst is suitably about 0.01 to 5% by weight.
[0011]
Salts are produced by the reaction. After completion of the reaction, salts are removed by filtration, washing with water, etc., and then the solvent and / or unreacted aromatic hydroxy compound is removed by distillation or dissolution in a solvent to obtain a novolak compound.
[0012]
【Example】
EXAMPLES Hereinafter, the present invention will be described in more detail with reference to examples, but the present invention is not limited to these examples.
[0013]
Example 1
A 300 ml, 4-necked flask was charged with 55 g of toluene, 20.7 g of phenol, and 23.3 g of soda carbonate, and the temperature was raised to 70 ° C. Here, 25.1 g of 4,4′-bis (chloromethyl) biphenyl was charged little by little. The addition was completed in 1 hour. Then, it was made to react at 80 degreeC for 8 hours, and 95 degreeC for 5 hours. Little generation of hydrogen chloride gas was observed. After completion of the reaction, the precipitated salt was removed, 0.1 g of methanesulfonic acid was added to the filtrate just in case, and the mixture was reacted at 90 ° C. for 1 hour. After excess methanesulfonic acid was neutralized with caustic soda, toluene was distilled off, and after cooling, 34 g of a novolak type compound was obtained. The resulting novolak compound had a softening point of 75 ° C. and a melt viscosity at 150 ° C. of 2.4 poise.
[0014]
Example 2
The reaction was conducted in the same manner as in Example 1 except that 17.5 g of 1,4-bis (chloromethyl) benzene was used as the compound of formula (1) to obtain 26.8 g of a novolak type compound. The resulting novolak compound had a softening point of 73 ° C. and a melt viscosity at 150 ° C. of 3.1 poise.
[0015]
Example 3
In Example 1, except that toluene was used, 50 g of phenol was used, and 19 g of potassium carbonate was used instead of soda carbonate, the reaction was carried out in the same manner as in Example 1, and 34.8 g of novolak type compound was obtained. Obtained. The resulting novolac compound had a softening point of 108 ° C. and a melt viscosity at 150 ° C. of 0.9 poise.
[0016]
【The invention's effect】
According to the present invention, a novolak type compound can be obtained more efficiently than a methyl halide aromatic compound. The obtained novolac-type compound is useful as an epoxy resin curing agent for semiconductor encapsulation or a raw material for epoxy resin synthesis.

Claims (3)

下記式(1)で示されるハロゲン化メチル芳香族化合物を、アルカリ性物質の存在下、芳香族ヒドロキシル化合物と反応させることによるノボラック型化合物の製造方法。
R(−CH2 X)n (1)
(式中、nは2〜3の整数を表す。Rは2価または3価の芳香族基、XはClまたはBrを表す。)
A method for producing a novolak type compound by reacting a halogenated methyl aromatic compound represented by the following formula (1) with an aromatic hydroxyl compound in the presence of an alkaline substance.
R (—CH 2 X) n (1)
(In the formula, n represents an integer of 2 to 3. R represents a divalent or trivalent aromatic group, and X represents Cl or Br.)
Rがフェニル、ナフチルまたはビフェニル由来の基であるハロゲン化メチル芳香族化合物を用いる請求項1記載の製造方法。The production method according to claim 1, wherein a halogenated methyl aromatic compound in which R is a group derived from phenyl, naphthyl or biphenyl is used. 芳香族ヒドロキシル化合物が、フェノ−ル、ナフト−ル類またはビフェノ−ル類から選ばれる1種以上である請求項1または2記載の製造方法。The method according to claim 1 or 2, wherein the aromatic hydroxyl compound is at least one selected from phenol, naphthols and biphenols.
JP30088196A 1996-10-28 1996-10-28 Method for producing novolac type compound Expired - Fee Related JP3819089B2 (en)

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JP4782930B2 (en) * 2001-02-22 2011-09-28 日本化薬株式会社 Method for producing varnish containing polyphenol resin
JP4692080B2 (en) * 2005-06-01 2011-06-01 宇部興産株式会社 p-Xylylene-phenolic resin and process for producing the same
JP5088949B2 (en) * 2007-11-19 2012-12-05 日本化薬株式会社 Epoxy resin composition
JP4939521B2 (en) * 2008-12-12 2012-05-30 Jfeケミカル株式会社 Method for producing 4,4'-biphenyldiylmethylene-phenol resin
JP5686770B2 (en) * 2012-07-18 2015-03-18 日本化薬株式会社 Epoxy resin composition

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