JP3812305B2 - Exhaust gas treatment equipment - Google Patents

Exhaust gas treatment equipment Download PDF

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Publication number
JP3812305B2
JP3812305B2 JP2000240909A JP2000240909A JP3812305B2 JP 3812305 B2 JP3812305 B2 JP 3812305B2 JP 2000240909 A JP2000240909 A JP 2000240909A JP 2000240909 A JP2000240909 A JP 2000240909A JP 3812305 B2 JP3812305 B2 JP 3812305B2
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Japan
Prior art keywords
exhaust gas
chamber
unit
ozone
decomposition
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JP2000240909A
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Japanese (ja)
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JP2002052313A (en
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裕之 山田
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Hitachi Plant Technologies Ltd
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Hitachi Plant Technologies Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02ATECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A50/00TECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE in human health protection, e.g. against extreme weather
    • Y02A50/20Air quality improvement or preservation, e.g. vehicle emission control or emission reduction by using catalytic converters

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  • Separating Particles In Gases By Inertia (AREA)
  • Exhaust Gas Treatment By Means Of Catalyst (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Treating Waste Gases (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、トリクロロエチレン,テトラクロロエチレン等の揮発性有機ハロゲン化合物を含む地下水や土壌の処理で発生する排ガスを処理する排ガス処理装置に関する。
【0002】
【従来の技術】
近年、トリクロロエチレン,テトラクロロエチレン等の人体に有害な揮発性有機ハロゲン化合物による地下水や土壌の汚染が問題となっている。
【0003】
ところで、このような揮発性有機ハロゲン化合物は、水への溶解度が小さく、ストリッピングを行うことで容易に排ガスに移行できることから、地下水,排水中に含まれる有機ハロゲン化合物を含むガスを曝気により取り出し、また土壌中に含まれている揮発性有機ハロゲン化合物を含むガスを抽出井戸を減圧することによって取り出している。そして、この排ガスを活性炭で吸着し無害化した後、大気に放出している。
【0004】
しかし、このように排ガスを吸着処理したとしても、吸着後の活性炭を再生しようとすると、その際に離脱させた成分の無害化処理が必要となり、また焼却時には有害な副生成物が発生する等の問題がある。
【0005】
そこで、このような問題を解決するための手段として、特開平09−136017号のガス処理方法が提供されている。この方法では、有機ハロゲン化合物等の有害成分を含む排ガスにオゾンを生成する波長を含む紫外線を照射するとともに、紫外線照射下にある光触媒に接触させることにより、トリクロロエチレン等の有機ハロゲン化合物の分解を促進している。
【0006】
【発明が解決しようとする課題】
ところで、上記従来技術では、有機ハロゲン化合物が低濃度では接触効率が悪く分解速度が低下するための反応時間が長く、分解処理槽が大型になる問題があった。
【0007】
また排ガス中の水滴が処理槽または触媒担持材に付着し、そこに有機ハロゲン化合物の分解生成物である塩素または塩化水素が溶け込み、強酸の液体となって処理槽または触媒担持材の腐蝕の原因となる。
【0008】
また排ガス中の水滴はランプの保護管と触媒表面にも付着し分解性能を低下させる。
【0009】
そこで、本発明の目的は、処理効率が高く、したがって分解処理槽のコンパクト化が図れ、さらに処理槽の耐久性を向上することができる排ガス処理装置を提供することにある。
【0012】
課題を解決するための手段
本発明に係る請求項1は、処理槽の内部を、排ガス中の水滴をルーバにより分離する水滴分離部と、該水滴分離部の下方に設けられ前記排ガスを導入するための導入口と、を有する第1の室と、該第1の室と第1の隔壁により仕切られると共に、光触媒をチップまたはメッシュ状のシートに担持させて構成した光触媒担持体が紫外線ランプ近傍に配設され、前記水滴分離部を経た前記排ガス中の有機ハロゲン化合物を分解処理するための紫外線分解部を有する第2の室と、該第2の室と第2の隔壁により仕切られ、前記紫外線分解部で分解処理によって生成された前記排ガス中のオゾンを分解するオゾン分解部と、該オゾン分解部の上方に設けられ前記オゾン分解部を経た前記排ガスを排出するための排出口と、を有する第3の室と、に画成し、前記第1の隔壁の上部には前記水分分離部を通過した前記排ガスを前記第2の室に導入するための第1の通気孔を設けると共に、前記第2の隔壁の下部には前記第2の室を経た前記排ガスを前記第3の室に導入するための第2の通気孔を設け、前記第2の室及び前記第3の室における前記第2の通気孔を含む底部には、前記紫外線分解部で分解処理によって生成され且つ前記オゾン分解部に導入される前の酸性生成物およびオゾンを含む排ガスを、アルカリ性液に通過させて前記酸性生成物を中性化するためのpH調整部を備えたことを特徴としている。
【0013】
この発明の排ガス処理装置によれば、紫外線分解によって生成される塩素または塩化水素等と水滴とによって生成される強酸の液体が生成される前に、排ガス中の水滴を分離することで、それらの強酸の液体を抑制する。したがって、強酸の液体が処理槽や触媒担持材に付着する虞れがなくなり、それらが腐蝕されることがなく、またそれらの強酸の液体がランプの保護管や触媒表面に付着することもなく安定して分解処理が可能になる。
【0014】
また、この発明の排ガス処理装置によれば、水滴分離部,紫外線分解部,pH調整部,オゾン分解部が1つの処理槽内に纏められいるので、装置のコンパクト化が図れる。
【0016】
この発明の排ガス処理装置によれば、光触媒が高密度で分布させることができ、排ガスを光触媒に高効率で接触させることができ、有機ハロゲン化合物が低濃度でも短時間で分解処理が可能となる。
【0017】
光触媒担持体は、ステンレス,グラスファイバー等の光触媒が担持可能な材質のメッシュ状のシートやチップに光触媒を担持させたものが好ましい。また、光触媒としては、酸化チタン,酸化タングステン,酸化亜鉛が挙げられる。
【0018】
【発明の実施の形態】
以下添付図面に従って本発明に係る排ガス処理方法および装置の好ましい実施の形態について詳説する。
【0019】
図1は本発明に係る排ガス処理方法のフローを示している。
【0020】
本発明に係る排ガス処理方法では、図1のフローに示したように、有機ハロゲン化合物に汚染された地下水,排水を曝気槽1に導き、該曝気槽1から揮発される排ガスを水滴分離部2,紫外線分解部3,pH調整部4,オゾン分解部5を経て大気に放出させる。
【0021】
排ガスは、水滴分離部2で水滴が除去され、紫外線分解部3でオゾンを生成する波長を含む紫外線が照射され、さらに、紫外線照射下にある光触媒に接触されることによりトリクロロエチレン等の有害成分が分解される。その際、紫外線分解部3から排出されるガス中には、塩化水素等の分解生成物と、紫外線照射により生成されるオゾンが含まれている。このガスはpH調整部4でアルカリ液中を通過し中性化処理され、残存オゾンはオゾン分解部5にて分解される。
【0022】
図2は、本発明に係る排ガス処理装置を概念的に示している。
【0023】
この処理装置10では、処理槽11の内部が第1の隔壁12と第2の隔壁13とによって第1の室14,第2の室15および第3の室16に画成されており、第1の隔壁12の上部には第1の室14と第2の室15とを連通する通気孔17が形成され、第2の隔壁13の下部には第2の室15と第3の室16とを連通する通気孔18が形成されている。さらに、処理槽11の第1の室14を画成する側壁下部には、外部から処理槽11内に排ガスAを導入する排ガス導入口19が形成され、処理槽11の第3の室16を画成する側壁上部には、処理槽11内から外部へ排ガスを排出する排ガス排出口20が形成されている。
【0024】
そして、第1の室14の中段部、即ち排ガス導入口19と通気孔17との間には、ルーパー21が設置され、第1の室14の底部、即ち排ガス導入口19の下方には、液溜め22が形成されている。
【0025】
また、第2の室15には、紫外線ランプ23が排ガスの流れに沿って、即ち上下方向に配設され、該室15の周壁には図3に示したように、光触媒担持体24が添設されている。この光触媒担持体24は、図4に示したように、メッシュ状のシート24aに光触媒24bを担持させたものである。
【0026】
また、第3の室16の中段部、即ち通気孔18と排ガス排出口20との間には、オゾン分解材25が配設されている。
【0027】
また、第2の室15の底部と第3の室16の底部、即ち通気孔18によって互いに連通されるそれらの底部には、pH調整液を溜めておくpH調整液溜め26が形成されている。
【0028】
そして、上記排ガス処理装置では、光触媒24bとして二酸化チタンが使用され、紫外線ランプ23は波長が約380nm以下のものが採用されている。また、pH調整液溜め26にはアルカリ性液が収容され、オゾン分解材25としては白金系,酸化マンガン系のオゾン分解触媒が採用される。
【0029】
このように構成された排ガス処理装置10では、トリクロロエチレン等の有害成分を含んだ排ガスがポンプ等によって処理槽11の排ガス導入口19から第1の室14に導入される。そのガスはルーバ21を経て通気孔17から第2の室15に送られるが、ルーバ21によってガス中の水分が除去される。そして、ルーバ21によって捕捉された水分は水滴となって液溜め22に落下し、該液溜め22に溜められた液は適宜な時期に外部へ排出される。
【0030】
第2の室15に送られたガスは、紫外線ランプ23によって生成されるオゾンと赤外線が照射される光触媒24bとによってガス中の酸化され易い成分,有機ハロゲン化合物等が分解される。その際に、ガス中には分解生成物として塩素,塩化水素,オゾン等が生成される。
【0031】
そして、そのガスはpH調整液溜め26内の通気孔18を経て第3の室16に送られ、pH調整液溜め26のアルカリ性液によって分解生成物のうちの塩素または塩化水素が中性化される。
【0032】
さらに、第3の室16に送られたガスはオゾン分解材25によって無害化され、排ガス排出口20から処理槽11外へ排出される。
【0033】
なお、上記実施の形態では、光触媒担持体24をメッシュ状のシート24aに光触媒24bを担持させて構成しているが、図5に示したように、チップ24cに光触媒24bを担持させてもよい。この場合には、図6に示したように、光触媒24bを担持さたチップ24cを網状のケース27に充填させて、該ケース27を室14内に装架させる。
【0034】
【発明の効果】
以上説明したように本発明の排ガス処理装置では、紫外線分解による副生成物が生成する前に、排ガス中の水滴を分離することで、処理槽,触媒担持材が腐蝕することがない。またランプの保護管と接触表面に付着することがなく安定して分解処理が可能になる。
【0035】
また、光触媒を担持したシートまたはチップを紫外線ランプ付近に充填し紫外線と光触媒を高効率で接触させることにより、有機ハロゲン化合物が低濃度でも短時間で分解処理が可能となる。
【0036】
また、水滴分離部,紫外線分解部,pH調整部,オゾン分解部を同一槽構造としたことでコンパクトな処理槽になり省スペース化が図れる。
【図面の簡単な説明】
【図1】本発明に係る排ガス処理方法を示した排ガス処理フロー図
【図2】本発明に係る排ガス処理装置を概念的に示した断面斜視図
【図3】本発明に係る排ガス処理装置における光触媒担持体の設置状態を示した概念的な部分断面斜視図
【図4】図3に示した光触媒担持体の部分を示した拡大図
【図5】本発明に係る排ガス処理装置における光触媒担持体の他の実施例を示した拡大図
【図6】図5に示した光触媒担持体の設置状態を示した概念的な部分断面斜視図
【符号の説明】
1…曝気槽、2…水滴分離部、3…紫外線分解部、4…pH調整部、5…オゾン分解部、10…排ガス処理装置、11…処理槽、12…第1の隔壁、13…第2の隔壁、14…第1の室、15…第2の室、16…第3の室、17…通気孔、18…通気孔、19…排ガス導入口、20…排ガス排出口、21…ルーパー、22…液溜め、23…紫外線ランプ、24…光触媒担持体、24a…シート、24b…光触媒、24c…チップ、25…オゾン分解材、26…pH調整液溜め、27…ケース、A…排ガス
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to an exhaust gas treatment apparatus that treats exhaust gas generated in the treatment of groundwater or soil containing volatile organic halogen compounds such as trichlorethylene and tetrachloroethylene.
[0002]
[Prior art]
In recent years, contamination of groundwater and soil by volatile organic halogen compounds harmful to the human body such as trichlorethylene and tetrachlorethylene has become a problem.
[0003]
By the way, since such a volatile organic halogen compound has low solubility in water and can be easily transferred to exhaust gas by stripping, a gas containing an organic halogen compound contained in groundwater or wastewater is taken out by aeration. Moreover, the gas containing the volatile organic halogen compound contained in the soil is taken out by depressurizing the extraction well. And after exhausting this exhaust gas with activated carbon and detoxifying it, it discharge | releases to air | atmosphere.
[0004]
However, even if the exhaust gas is adsorbed in this way, if the activated carbon after adsorption is regenerated, it is necessary to detoxify the components separated at that time, and harmful by-products are generated during incineration. There is a problem.
[0005]
Therefore, as a means for solving such a problem, a gas processing method disclosed in Japanese Patent Application Laid-Open No. 09-136017 is provided. In this method, the exhaust gas containing harmful components such as organic halogen compounds is irradiated with ultraviolet rays including a wavelength that generates ozone, and contact with a photocatalyst under ultraviolet irradiation to promote decomposition of organic halogen compounds such as trichlorethylene. is doing.
[0006]
[Problems to be solved by the invention]
By the way, in the said prior art, when organic halogen compound was low concentration, the contact efficiency was bad and the reaction time for a decomposition rate to fall was long, and there existed a problem that a decomposition processing tank became large.
[0007]
In addition, water droplets in the exhaust gas adhere to the treatment tank or catalyst support material, and chlorine or hydrogen chloride, which is a decomposition product of the organic halogen compound, dissolves into it and becomes a strong acid liquid, causing corrosion of the treatment tank or catalyst support material. It becomes.
[0008]
In addition, water droplets in the exhaust gas also adhere to the protective tube of the lamp and the catalyst surface and degrade the decomposition performance.
[0009]
SUMMARY OF THE INVENTION An object of the present invention is to provide an exhaust gas treatment apparatus that has high processing efficiency and can therefore be made compact in the decomposition treatment tank and can further improve the durability of the treatment tank.
[0012]
[ Means for Solving the Problems ]
According to a first aspect of the present invention, there is provided a water droplet separation part for separating water droplets in the exhaust gas with a louver, and an inlet for introducing the exhaust gas provided below the water droplet separation part. A first chamber having a photocatalyst carrying member configured to carry a photocatalyst on a chip or mesh-like sheet, and is partitioned near the ultraviolet lamp. The second chamber having an ultraviolet decomposition unit for decomposing the organic halogen compound in the exhaust gas having passed through the separation unit, and the second chamber and the second partition wall, and being decomposed by the ultraviolet decomposition unit A third chamber having an ozonolysis unit for decomposing ozone in the generated exhaust gas, and an exhaust port provided above the ozone decomposition unit for exhausting the exhaust gas that has passed through the ozone decomposition unit; Defined The first partition wall is provided with a first vent hole for introducing the exhaust gas that has passed through the water separation part into the second chamber, and the second partition wall is provided with a first vent hole at the bottom. A second vent hole for introducing the exhaust gas having passed through the second chamber into the third chamber, and a bottom portion including the second vent hole in the second chamber and the third chamber, PH adjustment for neutralizing the acidic product by passing the exhaust gas containing the acidic product and ozone generated by the decomposition process in the ultraviolet decomposition unit and before being introduced into the ozone decomposition unit through an alkaline liquid It is characterized by having a part.
[0013]
According to the exhaust gas treatment apparatus of the present invention, before the liquid of strong acid generated by chlorine or hydrogen chloride generated by ultraviolet decomposition and water droplets is generated, by separating the water droplets in the exhaust gas, Inhibits strong acid liquids. Therefore, there is no risk of strong acid liquids adhering to the treatment tank and the catalyst support material, they are not corroded, and they are stable without adhering to the lamp protection tube or catalyst surface. Thus, disassembly can be performed.
[0014]
Further, according to the exhaust gas treatment apparatus of the present invention, the water droplet separation unit, the ultraviolet decomposition unit, the pH adjustment unit, and the ozone decomposition unit are combined in one treatment tank, so that the apparatus can be made compact.
[0016]
According to the exhaust gas treatment apparatus of the present invention, the photocatalyst can be distributed at a high density, the exhaust gas can be brought into contact with the photocatalyst with high efficiency, and the decomposition treatment can be performed in a short time even when the concentration of the organic halogen compound is low. .
[0017]
The photocatalyst carrier preferably has a photocatalyst supported on a mesh sheet or chip made of a material capable of supporting a photocatalyst such as stainless steel or glass fiber. Examples of the photocatalyst include titanium oxide, tungsten oxide, and zinc oxide.
[0018]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, preferred embodiments of an exhaust gas treatment method and apparatus according to the present invention will be described in detail with reference to the accompanying drawings.
[0019]
FIG. 1 shows a flow of an exhaust gas treatment method according to the present invention.
[0020]
In the exhaust gas treatment method according to the present invention, as shown in the flow of FIG. 1, groundwater and wastewater contaminated with an organic halogen compound are guided to the aeration tank 1, and the exhaust gas volatilized from the aeration tank 1 is removed by the water droplet separation unit 2. , The ultraviolet light decomposing unit 3, the pH adjusting unit 4, and the ozone decomposing unit 5 to be released to the atmosphere.
[0021]
The exhaust gas is subjected to removal of water droplets by the water droplet separation unit 2, irradiation of ultraviolet rays including a wavelength that generates ozone at the ultraviolet decomposition unit 3, and contact with a photocatalyst under ultraviolet irradiation to cause harmful components such as trichlorethylene. Disassembled. In that case, in the gas discharged | emitted from the ultraviolet decomposition part 3, decomposition products, such as hydrogen chloride, and the ozone produced | generated by ultraviolet irradiation are contained. This gas passes through the alkaline solution by the pH adjusting unit 4 and is neutralized, and the residual ozone is decomposed by the ozone decomposing unit 5.
[0022]
FIG. 2 conceptually shows an exhaust gas treatment apparatus according to the present invention.
[0023]
In this processing apparatus 10, the inside of the processing tank 11 is defined by a first partition wall 12 and a second partition wall 13 into a first chamber 14, a second chamber 15, and a third chamber 16. A vent hole 17 that communicates the first chamber 14 and the second chamber 15 is formed in the upper portion of the first partition wall 12, and the second chamber 15 and the third chamber 16 are formed in the lower portion of the second partition wall 13. Are formed. Further, an exhaust gas introduction port 19 for introducing the exhaust gas A from the outside into the processing tank 11 is formed in the lower portion of the side wall that defines the first chamber 14 of the processing tank 11, and the third chamber 16 of the processing tank 11 is opened. An exhaust gas discharge port 20 for exhausting exhaust gas from the inside of the treatment tank 11 to the outside is formed at the upper side of the defining side wall.
[0024]
A looper 21 is installed between the middle portion of the first chamber 14, that is, between the exhaust gas inlet 19 and the vent hole 17, and at the bottom of the first chamber 14, that is, below the exhaust gas inlet 19, A liquid reservoir 22 is formed.
[0025]
Further, an ultraviolet lamp 23 is disposed in the second chamber 15 along the flow of the exhaust gas, that is, in the vertical direction, and the photocatalyst carrier 24 is attached to the peripheral wall of the chamber 15 as shown in FIG. It is installed. As shown in FIG. 4, the photocatalyst carrier 24 is obtained by carrying a photocatalyst 24b on a mesh sheet 24a.
[0026]
In addition, an ozone decomposing material 25 is disposed in the middle portion of the third chamber 16, that is, between the vent hole 18 and the exhaust gas discharge port 20.
[0027]
Further, a pH adjusting liquid reservoir 26 for storing a pH adjusting liquid is formed at the bottom of the second chamber 15 and the bottom of the third chamber 16, that is, at the bottoms thereof that are communicated with each other by the vent hole 18. .
[0028]
In the exhaust gas treatment apparatus, titanium dioxide is used as the photocatalyst 24b, and the ultraviolet lamp 23 has a wavelength of about 380 nm or less. The pH adjusting liquid reservoir 26 contains an alkaline liquid, and the ozone decomposing material 25 is a platinum-based or manganese oxide-based ozone decomposing catalyst.
[0029]
In the exhaust gas treatment apparatus 10 configured as described above, exhaust gas containing harmful components such as trichlorethylene is introduced into the first chamber 14 from the exhaust gas inlet 19 of the treatment tank 11 by a pump or the like. The gas passes through the louver 21 and is sent from the vent hole 17 to the second chamber 15, and moisture in the gas is removed by the louver 21. The water trapped by the louver 21 is dropped into the liquid reservoir 22 as water droplets, and the liquid stored in the liquid reservoir 22 is discharged to the outside at an appropriate time.
[0030]
In the gas sent to the second chamber 15, components that are easily oxidized, organic halogen compounds, and the like in the gas are decomposed by ozone generated by the ultraviolet lamp 23 and the photocatalyst 24 b irradiated with infrared rays. At that time, chlorine, hydrogen chloride, ozone and the like are generated as decomposition products in the gas.
[0031]
Then, the gas is sent to the third chamber 16 through the vent hole 18 in the pH adjusting liquid reservoir 26, and chlorine or hydrogen chloride in the decomposition products is neutralized by the alkaline liquid in the pH adjusting liquid reservoir 26. The
[0032]
Further, the gas sent to the third chamber 16 is rendered harmless by the ozone decomposition material 25 and is discharged out of the treatment tank 11 from the exhaust gas discharge port 20.
[0033]
In the above embodiment, the photocatalyst carrier 24 is configured by supporting the photocatalyst 24b on the mesh-like sheet 24a. However, as shown in FIG. 5, the photocatalyst 24b may be supported on the chip 24c. . In this case, as shown in FIG. 6, the chip 24 c carrying the photocatalyst 24 b is filled in the net-like case 27 and the case 27 is mounted in the chamber 14.
[0034]
【The invention's effect】
As described above, in the exhaust gas treatment apparatus of the present invention, the treatment tank and the catalyst support material are not corroded by separating the water droplets in the exhaust gas before the by-product due to ultraviolet decomposition is generated. In addition, it can be stably decomposed without adhering to the protective tube and the contact surface of the lamp.
[0035]
In addition, by filling a sheet or chip carrying a photocatalyst in the vicinity of the ultraviolet lamp and bringing the ultraviolet ray and the photocatalyst into contact with each other with high efficiency, the decomposition treatment can be performed in a short time even when the concentration of the organic halogen compound is low.
[0036]
Moreover, since the water droplet separation unit, the ultraviolet decomposition unit, the pH adjustment unit, and the ozone decomposition unit have the same tank structure, a compact processing tank can be realized and space can be saved.
[Brief description of the drawings]
FIG. 1 is an exhaust gas treatment flowchart showing an exhaust gas treatment method according to the present invention. FIG. 2 is a cross-sectional perspective view conceptually showing an exhaust gas treatment apparatus according to the present invention. FIG. 4 is a conceptual partial cross-sectional perspective view showing an installed state of a photocatalyst carrier. FIG. 4 is an enlarged view showing a portion of the photocatalyst carrier shown in FIG. 3. FIG. 5 is a photocatalyst carrier in an exhaust gas treatment apparatus according to the present invention. FIG. 6 is an enlarged perspective view showing another embodiment of the present invention. FIG. 6 is a conceptual partial sectional perspective view showing the installation state of the photocatalyst carrier shown in FIG.
DESCRIPTION OF SYMBOLS 1 ... Aeration tank, 2 ... Water droplet separation part, 3 ... Ultraviolet decomposition part, 4 ... pH adjustment part, 5 ... Ozone decomposition part, 10 ... Exhaust gas processing apparatus, 11 ... Treatment tank, 12 ... 1st partition, 13 ... 1st 2 partition walls, 14 ... first chamber, 15 ... second chamber, 16 ... third chamber, 17 ... vent hole, 18 ... vent hole, 19 ... exhaust gas introduction port, 20 ... exhaust gas discharge port, 21 ... looper 22 ... Liquid reservoir, 23 ... UV lamp, 24 ... photocatalyst carrier, 24a ... sheet, 24b ... photocatalyst, 24c ... chip, 25 ... ozone decomposition material, 26 ... pH adjustment reservoir, 27 ... case, A ... exhaust gas

Claims (1)

処理槽の内部を、排ガス中の水滴をルーバにより分離する水滴分離部と、該水滴分離部の下方に設けられ前記排ガスを導入するための導入口と、を有する第1の室と、A first chamber having a water droplet separation part for separating water droplets in the exhaust gas with a louver inside the treatment tank, and an introduction port provided below the water droplet separation part for introducing the exhaust gas;
該第1の室と第1の隔壁により仕切られると共に、光触媒をチップまたはメッシュ状のシートに担持させて構成した光触媒担持体が紫外線ランプ近傍に配設され、前記水滴分離部を経た前記排ガス中の有機ハロゲン化合物を分解処理するための紫外線分解部を有する第2の室と、A photocatalyst carrying member constituted by supporting the photocatalyst on a chip or a mesh-like sheet and being partitioned by the first chamber and the first partition wall is disposed in the vicinity of the ultraviolet lamp, and in the exhaust gas having passed through the water droplet separation unit A second chamber having an ultraviolet decomposition section for decomposing the organic halogen compound;
該第2の室と第2の隔壁により仕切られ、前記紫外線分解部で分解処理によって生成された前記排ガス中のオゾンを分解するオゾン分解部と、該オゾン分解部の上方に設けられ前記オゾン分解部を経た前記排ガスを排出するための排出口と、を有する第3の室と、に画成し、An ozone decomposing unit that is partitioned by the second chamber and the second partition and decomposes ozone in the exhaust gas generated by the decomposing process in the ultraviolet decomposition unit, and the ozone decomposing unit provided above the ozone decomposing unit And a third chamber having a discharge port for discharging the exhaust gas that has passed through the section,
前記第1の隔壁の上部には前記水滴分離部を通過した前記排ガスを前記第2の室に導入するための第1の通気孔を設けると共に、A first vent for introducing the exhaust gas that has passed through the water droplet separator into the second chamber is provided on the upper part of the first partition,
前記第2の隔壁の下部には前記第2の室を経た前記排ガスを前記第3の室に導入するための第2の通気孔を設け、A second ventilation hole for introducing the exhaust gas having passed through the second chamber into the third chamber is provided at a lower portion of the second partition wall,
前記第2の室及び前記第3の室における前記第2の通気孔を含む底部には、前記紫外線分解部で分解処理によって生成され且つ前記オゾン分解部に導入される前の酸性生成物およびオゾンを含む排ガスを、アルカリ性液に通過させて前記酸性生成物を中性化するためのpH調整部を備えたことを特徴とする排ガス処理装置。The bottoms including the second vent holes in the second chamber and the third chamber have an acidic product and ozone generated by the decomposition process in the ultraviolet decomposition unit and before being introduced into the ozone decomposition unit. An exhaust gas treatment apparatus comprising a pH adjusting unit for passing an exhaust gas containing a neutral solution by passing the exhaust gas through an alkaline liquid.
JP2000240909A 2000-08-09 2000-08-09 Exhaust gas treatment equipment Expired - Fee Related JP3812305B2 (en)

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Publication number Priority date Publication date Assignee Title
KR20200021691A (en) * 2018-08-21 2020-03-02 한국조선해양 주식회사 Exhaust gas treatment system

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CN112316569A (en) * 2020-10-15 2021-02-05 东风汽车集团有限公司 Fuel cell gas-liquid separator with adjustable separation efficiency

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20200021691A (en) * 2018-08-21 2020-03-02 한국조선해양 주식회사 Exhaust gas treatment system
KR102110666B1 (en) * 2018-08-21 2020-05-13 한국조선해양 주식회사 Exhaust gas treatment system

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