JP3762998B2 - フッ素イオン検出用剤及びその製造方法 - Google Patents
フッ素イオン検出用剤及びその製造方法 Download PDFInfo
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- JP3762998B2 JP3762998B2 JP2003307721A JP2003307721A JP3762998B2 JP 3762998 B2 JP3762998 B2 JP 3762998B2 JP 2003307721 A JP2003307721 A JP 2003307721A JP 2003307721 A JP2003307721 A JP 2003307721A JP 3762998 B2 JP3762998 B2 JP 3762998B2
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- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 title claims description 50
- 238000004519 manufacturing process Methods 0.000 title claims description 24
- 238000001514 detection method Methods 0.000 title claims description 21
- 239000003795 chemical substances by application Substances 0.000 title claims description 19
- 229920000642 polymer Polymers 0.000 claims description 90
- -1 fluorine ions Chemical class 0.000 claims description 67
- 229910052731 fluorine Inorganic materials 0.000 claims description 56
- 239000011737 fluorine Substances 0.000 claims description 56
- 125000000217 alkyl group Chemical group 0.000 claims description 32
- 239000003054 catalyst Substances 0.000 claims description 29
- 239000000178 monomer Substances 0.000 claims description 23
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 21
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 21
- 238000000862 absorption spectrum Methods 0.000 claims description 12
- 125000004432 carbon atom Chemical group C* 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 12
- 239000010949 copper Substances 0.000 claims description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 10
- 229910052802 copper Inorganic materials 0.000 claims description 10
- 238000002189 fluorescence spectrum Methods 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 10
- 229910052763 palladium Inorganic materials 0.000 claims description 10
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 claims description 5
- RPGWZZNNEUHDAQ-UHFFFAOYSA-N phenylphosphine Chemical compound PC1=CC=CC=C1 RPGWZZNNEUHDAQ-UHFFFAOYSA-N 0.000 claims description 5
- GBRBMTNGQBKBQE-UHFFFAOYSA-L copper;diiodide Chemical group I[Cu]I GBRBMTNGQBKBQE-UHFFFAOYSA-L 0.000 claims description 4
- 230000000379 polymerizing effect Effects 0.000 claims description 4
- 230000008569 process Effects 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 230000008859 change Effects 0.000 description 45
- FPGGTKZVZWFYPV-UHFFFAOYSA-M tetrabutylammonium fluoride Chemical compound [F-].CCCC[N+](CCCC)(CCCC)CCCC FPGGTKZVZWFYPV-UHFFFAOYSA-M 0.000 description 36
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 35
- 229910052710 silicon Inorganic materials 0.000 description 24
- 239000010703 silicon Substances 0.000 description 21
- 238000010521 absorption reaction Methods 0.000 description 19
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 12
- 150000001875 compounds Chemical class 0.000 description 11
- 230000031700 light absorption Effects 0.000 description 11
- 125000003118 aryl group Chemical group 0.000 description 9
- 238000006116 polymerization reaction Methods 0.000 description 9
- COHYTHOBJLSHDF-UHFFFAOYSA-N Indigo Chemical compound N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 8
- 230000035945 sensitivity Effects 0.000 description 8
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- 230000003247 decreasing effect Effects 0.000 description 6
- 230000014759 maintenance of location Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 230000009471 action Effects 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- KFJLISCACANQTJ-UHFFFAOYSA-N bis(4-bromophenyl)-dihexylsilane Chemical compound C=1C=C(Br)C=CC=1[Si](CCCCCC)(CCCCCC)C1=CC=C(Br)C=C1 KFJLISCACANQTJ-UHFFFAOYSA-N 0.000 description 5
- DRCPBHLBJBZQBG-UHFFFAOYSA-N bis(4-ethynylphenyl)-dimethylsilane Chemical compound C=1C=C(C#C)C=CC=1[Si](C)(C)C1=CC=C(C#C)C=C1 DRCPBHLBJBZQBG-UHFFFAOYSA-N 0.000 description 5
- YNHIGQDRGKUECZ-UHFFFAOYSA-N dichloropalladium;triphenylphosphanium Chemical compound Cl[Pd]Cl.C1=CC=CC=C1[PH+](C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1[PH+](C=1C=CC=CC=1)C1=CC=CC=C1 YNHIGQDRGKUECZ-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 230000005284 excitation Effects 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- XILPSSVLDMTWGI-UHFFFAOYSA-N BrC1=CC=C(C=C1)CCCCCCCCCCCC[SiH](C1=CC=C(C=C1)C#C)C Chemical group BrC1=CC=C(C=C1)CCCCCCCCCCCC[SiH](C1=CC=C(C=C1)C#C)C XILPSSVLDMTWGI-UHFFFAOYSA-N 0.000 description 4
- MSPAOVIUWZYDOL-UHFFFAOYSA-N C=1C=C(C#C)C=CC=1[Si](CCCCCC)(CCCCCC)C1=CC=C(C#C)C=C1 Chemical compound C=1C=C(C#C)C=CC=1[Si](CCCCCC)(CCCCCC)C1=CC=C(C#C)C=C1 MSPAOVIUWZYDOL-UHFFFAOYSA-N 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 230000007704 transition Effects 0.000 description 4
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000008602 contraction Effects 0.000 description 3
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000001308 synthesis method Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000012700 ceramic precursor Substances 0.000 description 2
- 238000004587 chromatography analysis Methods 0.000 description 2
- 230000008876 conformational transition Effects 0.000 description 2
- 229920000547 conjugated polymer Polymers 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 239000012043 crude product Substances 0.000 description 2
- 238000005828 desilylation reaction Methods 0.000 description 2
- 230000008034 disappearance Effects 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 230000008846 dynamic interplay Effects 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 230000005281 excited state Effects 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 229920002521 macromolecule Polymers 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920001558 organosilicon polymer Polymers 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- DNAJDTIOMGISDS-UHFFFAOYSA-N prop-2-enylsilane Chemical class [SiH3]CC=C DNAJDTIOMGISDS-UHFFFAOYSA-N 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 150000004756 silanes Chemical class 0.000 description 2
- 150000004760 silicates Chemical class 0.000 description 2
- 238000001542 size-exclusion chromatography Methods 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 125000004800 4-bromophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Br 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000009739 binding Methods 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical compound I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- NRAYZPGATNMOSB-UHFFFAOYSA-N dichloro(dihexyl)silane Chemical compound CCCCCC[Si](Cl)(Cl)CCCCCC NRAYZPGATNMOSB-UHFFFAOYSA-N 0.000 description 1
- ZAADUWCLWTWDSZ-UHFFFAOYSA-N dichloro-dodecyl-methylsilane Chemical compound CCCCCCCCCCCC[Si](C)(Cl)Cl ZAADUWCLWTWDSZ-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 description 1
- 125000005677 ethinylene group Chemical group [*:2]C#C[*:1] 0.000 description 1
- 238000003818 flash chromatography Methods 0.000 description 1
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 description 1
- 230000005283 ground state Effects 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- WYURNTSHIVDZCO-SVYQBANQSA-N oxolane-d8 Chemical compound [2H]C1([2H])OC([2H])([2H])C([2H])([2H])C1([2H])[2H] WYURNTSHIVDZCO-SVYQBANQSA-N 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 229920000867 polyelectrolyte Polymers 0.000 description 1
- 239000005518 polymer electrolyte Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- CWMFRHBXRUITQE-UHFFFAOYSA-N trimethylsilylacetylene Chemical group C[Si](C)(C)C#C CWMFRHBXRUITQE-UHFFFAOYSA-N 0.000 description 1
- 238000002211 ultraviolet spectrum Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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- Investigating Or Analysing Materials By The Use Of Chemical Reactions (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
Description
で示される重合体からなることを特徴としている。
で示される重合体からなることを特徴としている。
で表される第1の単量体と、一般式(4);
で表される第2の単量体と、パラジウムを含む第1の触媒と、銅を含む第2の触媒と、を含む混合物を重合させる工程を含むことを特徴としている。
に示される単量体を重合させ、ポリ[(ジアルキル)シリレンフェニレンエチニレンフェニレン](poly[(dialkyl)silylenephenyleneethelenephenysene]s)を製造するものである。
まず、フッ素イオン源としてのTBAFを、実施例1の重合体を含むTHF内に滴定することより、実施例1の重合体のUV可視光吸収の変化を調査した。具体的には、TBAFが、0,20,40,60,80,100,120,140,160×10−4Mとなった時点での実施例1の重合体の波長約270nmから500nmまでの光の吸収スペクトルをJASCO UV−550を用いて測定した。
この新しいICT複合体の存在の決定的な証拠を得るために、我々は、TBAFを添加して、NMRスペクトルを決定した。これによると、図4に示されるように、TBAFの量が増加するに従い、TBAFを加える前のメチル基の0.545ppmでのピークは徐々に減少し(エチルプロトンの0.867ppmと比べて)、0.12ppmおよび−0.14ppmの周辺で新しいピークが出現した。過剰配位のケイ酸塩は、テトラ配位のシランより電子が豊富であり、より保護されているので、新規の高位のピークはシリレン成分における過剰(例えば、ペンタやヘキサ)配位構造によるのかもしれない。同時に、すべてのアルキルの、あるいは芳香族の重合体のピークは、約0.04ppmだけ僅かに高磁場側にシフトした。これは、TBAFの添加の後、ポリマー鎖の中の電子密度がより高くなることを示す。加えて、Si−アリル結合が変質した場合に形成されるおそれのある、フッ化シリルのメチルプロトンは見つからなかった。したがって、上記重合体とTBAFとの反応は図2に示されるものと想定される。
次に、TBAFを実施例1の重合体を含むTHF内に滴定することより、実施例1の重合体の蛍光スペクトルの変化を調査した。具体的には、TBAFが、0,20,40,60,80,100,120×10−4Mとなった時点で、実施例1の重合体を342nmの光で励起した場合の300nmから700nmまでの蛍光スペクトルを測定した。
続いて、実施例1の重合体へのフッ素イオンを添加量と、390nmUV光の吸収の変化を、プロットした図面を図5に示す。フッ素イオンの添加量は、溶液内のケイ素に対するフッ素イオンの割合にて示している。このプロットは、特有な3ステップ線形の関係を示している。すなわち、最初のステップはケイ素の25倍の過剰TBAFより少ない場合の関係であり、プロットの傾きが緩やかである。2番目のステップは、25倍から100倍濃度のTBAF範囲であり、急な傾きを示している。そして、100倍濃度以上の最後のステップでは傾きは緩やかに戻る。
Claims (9)
- フッ素イオンと接触することで、紫外光の吸収スペクトルが変化することを特徴とする請求項1または2に記載のフッ素イオン検出用剤。
- フッ素イオンと接触することで、蛍光スペクトルが変化することを特徴とする請求項1から3の何れか1項に記載のフッ素イオン検出用剤。
- R10、R11、R14、R15のうちの少なくとも1つが炭素数1以上20以下のアルキル基であることを特徴とする請求項5に記載の重合体の製造方法。
- 上記第1の触媒がビス((H)フェニルホスフィン)パラジウム(II)ジクロリドであることを特徴とする請求項5または6に記載の重合体の製造方法。
- 上記第2の触媒がヨウ化銅であることを特徴とする請求項5ないし7の何れか1項に記載の重合体の製造方法。
- 上記混合物をトリエチルアミンに溶解させて、重合させることを特徴とする請求項5ないし8の何れか1項に記載の重合体の製造方法。
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CN105295009B (zh) * | 2015-09-16 | 2017-09-29 | 南京邮电大学 | 一种用于氟离子检测的共轭聚电解质及其制备和应用 |
WO2020175442A1 (ja) * | 2019-02-25 | 2020-09-03 | 国立大学法人信州大学 | フッ素イオン濃度の測定方法、フッ素イオン濃度測定装置、フッ素イオン濃度検出材料の製造方法及びフッ素イオン濃度検出材料 |
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