JP3717477B2 - Spiral inductor - Google Patents

Spiral inductor Download PDF

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Publication number
JP3717477B2
JP3717477B2 JP2002381368A JP2002381368A JP3717477B2 JP 3717477 B2 JP3717477 B2 JP 3717477B2 JP 2002381368 A JP2002381368 A JP 2002381368A JP 2002381368 A JP2002381368 A JP 2002381368A JP 3717477 B2 JP3717477 B2 JP 3717477B2
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JP
Japan
Prior art keywords
wiring
spiral
spiral inductor
along
inductor
Prior art date
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Expired - Fee Related
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JP2002381368A
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Japanese (ja)
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JP2004214377A (en
Inventor
貴司 丸山
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株式会社半導体理工学研究センター
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Priority to JP2002381368A priority Critical patent/JP3717477B2/en
Publication of JP2004214377A publication Critical patent/JP2004214377A/en
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Description

【0001】
【発明の属する技術分野】
本発明は、集積回路内に設けられるスパイラルインダクタに関する。
【0002】
【従来の技術】
高周波集積回路では、インピーダンスマッチングなどの目的でスパイラル状に導体を形成してインダクタとするスパイラルインダクタが用いられている。
【0003】
【発明が解決しようとする課題】
従来のスパイラルインダクタでは、通常の配線の厚みが薄いため、導体の厚みが薄くて、直流抵抗が大きく、高いQ値(Quality Facter)のインダクタが得られない、という問題があった。配線層の厚みを増やすと他のブロックの配線の厚みも増え、それに応じて配線間の距離も増やす必要があるのでチップ面積が増大する。このため、配線層を厚くして配線の厚みを増やすことはできない。
【0004】
したがって本発明の目的は、Q値の高いスパイラルインダクタを提供することにある。
【0005】
【課題を解決するための手段】
本発明によれば、第1の配線層においてスパイラル状に形成された第1の配線と、第2の配線層において、第1の配線の全長に沿って設けられた第2の配線と、第2の配線を第1の配線に接続する複数のビアとを具備するスパイラルインダクタが提供される。
【0006】
このスパイラルインダクタにおいて、第1の配線のスパイラルの最も外側に位置する部分に沿う第2の配線の部分は、第1の配線の外側の縁に沿って形成され、第1の配線のスパイラルの最も内側に位置する部分に沿う第2の配線の部分は、第1の配線の内側の縁に沿って形成されることが好ましい。
【0007】
【発明の実施の形態】
図1は本発明の第1の実施例に係るスパイラルインダクタを示し、(a)欄はその平面図、(b)欄は(a)欄におけるA−A′の断面図である。図1において、スパイラル状に形成された配線10が属する配線層よりも下の配線層に配線10に沿って配線12が同様にスパイラル状に形成されている。配線10と配線12の間は多数のビア14で接続されている。なお、図1(a)では配線10の一部の領域のみにビア14が描かれているが、実際には配線10の領域全体にわたってビア14が形成されている。
【0008】
これによって、配線層の厚みを増やすことなく、スパイラルインダクタを構成する導体の実質的な厚みが増加し、直流抵抗が小さくなるので、図2に示すように、Q値を高くすることができる。
【0009】
図2からわかるように、実施例1では全体としてQ値が改善されるが、より高周波領域でのQ値の抵下が著しく、より高周波の領域ではインダクタとして使用することができない。これは、導体の厚みの増加により、配線間容量および対基板容量が大きくなって自己共振周波数が低下したためである。
【0010】
本発明の第2の実施例では、配線に流れる電流が磁界の影響により偏在することに着目し、電流が偏在する部分のみを厚くすることにより、Q値を改善しつつ配線間容量および対基板容量の増加を抑制する。
【0011】
図3は本発明の第2の実施例に係るスパイラルインダクタを示し、図3(a)はその平面図、図3(b)は図3(a)におけるB−B′の断面図である。配線16のスパイラルの最外周では外側の電流密度が高く、最内周では内側の電流密度が高い。そこで、配線18は、スパイラルの最外周では配線16の外側の縁に沿って形成され、最内周では配線16の内側の縁に沿って形成される。最外周および最内周以外の部分では、配線18が途切れると反射が起こって好ましくないので、より外側の配線とより内側の配線の双方からの距離をとるため、配線16の中央部に沿って配線18が形成される。また、配線18の領域全体にわたってビア20が形成される。
【0012】
図4のグラフからわかるように、実施例2では実施例1と同様な程度までにQ値が改善され、かつ、共振周波数が低下しないので、高周波領域での使用が可能である。
【0013】
インダクタを実現する配線は、通常、相互インダクタンスを得るためにスパイラル状に形成されるが、その形状は、図示した例のような方形に限らず、円形でも多角形でも良い。
【0014】
【発明の効果】
以上説明したように本発明によれば、Q値の高いスパイラルインダクタを得ることができる。
【図面の簡単な説明】
【図1】本発明の第1の実施例に係るスパイラルインダクタを示す図である。
【図2】図1のスパイラルインダクタのQ値を従来例のものと共に示すグラフである。
【図3】本発明の第2の実施例に係るスパイラルインダクタを示す図である。
【図4】図3のスパイラルインダクタのQ値を図1のスパイラルインダクタおよび従来例のものと共に示す図である。
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a spiral inductor provided in an integrated circuit.
[0002]
[Prior art]
In a high-frequency integrated circuit, a spiral inductor is used in which a conductor is formed in a spiral shape for the purpose of impedance matching or the like.
[0003]
[Problems to be solved by the invention]
The conventional spiral inductor has a problem that the thickness of the normal wiring is thin, the conductor is thin, the DC resistance is large, and an inductor having a high Q value (Quality Factor) cannot be obtained. When the thickness of the wiring layer is increased, the thickness of the wirings of other blocks also increases, and the distance between the wirings needs to be increased accordingly, so that the chip area increases. For this reason, it is impossible to increase the thickness of the wiring by increasing the wiring layer.
[0004]
Accordingly, an object of the present invention is to provide a spiral inductor having a high Q value.
[0005]
[Means for Solving the Problems]
According to the present invention, the first wiring formed in a spiral shape in the first wiring layer, the second wiring provided along the entire length of the first wiring in the second wiring layer, There is provided a spiral inductor comprising a plurality of vias connecting two wirings to a first wiring.
[0006]
In this spiral inductor, the portion of the second wiring along the outermost portion of the spiral of the first wiring is formed along the outer edge of the first wiring, and is the outermost portion of the spiral of the first wiring. The portion of the second wiring along the portion located on the inner side is preferably formed along the inner edge of the first wiring.
[0007]
DETAILED DESCRIPTION OF THE INVENTION
FIG. 1 shows a spiral inductor according to a first embodiment of the present invention, in which (a) column is a plan view thereof, and (b) column is a cross-sectional view taken along line AA 'in (a) column. In FIG. 1, the wiring 12 is similarly formed in the spiral shape along the wiring 10 in the wiring layer below the wiring layer to which the wiring 10 formed in the spiral shape belongs. A large number of vias 14 are connected between the wiring 10 and the wiring 12. In FIG. 1A, the via 14 is drawn only in a partial region of the wiring 10, but actually the via 14 is formed over the entire region of the wiring 10.
[0008]
Thereby, the substantial thickness of the conductor constituting the spiral inductor is increased and the direct current resistance is decreased without increasing the thickness of the wiring layer, so that the Q value can be increased as shown in FIG.
[0009]
As can be seen from FIG. 2, the Q value as a whole is improved in Example 1, but the degradation of the Q value in the higher frequency region is significant, and cannot be used as an inductor in the higher frequency region. This is because the capacitance between the wiring and the capacitance with respect to the substrate is increased due to the increase in the thickness of the conductor, and the self-resonance frequency is lowered.
[0010]
In the second embodiment of the present invention, attention is paid to the fact that the current flowing in the wiring is unevenly distributed due to the influence of the magnetic field, and by increasing only the portion where the current is unevenly distributed, the inter-wiring capacitance and the substrate are improved Suppress the increase in capacity.
[0011]
FIG. 3 shows a spiral inductor according to a second embodiment of the present invention, FIG. 3 (a) is a plan view thereof, and FIG. 3 (b) is a sectional view taken along line BB 'in FIG. 3 (a). The outer current density is high at the outermost periphery of the spiral of the wiring 16, and the inner current density is high at the innermost periphery. Therefore, the wiring 18 is formed along the outer edge of the wiring 16 at the outermost periphery of the spiral, and is formed along the inner edge of the wiring 16 at the innermost periphery. In portions other than the outermost periphery and the innermost periphery, if the wiring 18 is interrupted, reflection occurs, which is not preferable. Therefore, the distance from both the outer wiring and the inner wiring is taken. A wiring 18 is formed. A via 20 is formed over the entire area of the wiring 18.
[0012]
As can be seen from the graph of FIG. 4, in the second embodiment, the Q value is improved to the same extent as in the first embodiment and the resonance frequency does not decrease.
[0013]
The wiring that realizes the inductor is usually formed in a spiral shape to obtain mutual inductance, but the shape is not limited to a square as in the illustrated example, and may be a circle or a polygon.
[0014]
【The invention's effect】
As described above, according to the present invention, a spiral inductor having a high Q value can be obtained.
[Brief description of the drawings]
FIG. 1 is a diagram showing a spiral inductor according to a first embodiment of the present invention.
FIG. 2 is a graph showing a Q value of the spiral inductor of FIG. 1 together with a conventional example.
FIG. 3 is a diagram showing a spiral inductor according to a second embodiment of the present invention.
4 is a diagram showing the Q value of the spiral inductor of FIG. 3 together with the spiral inductor of FIG. 1 and the conventional example.

Claims (1)

第1の配線層においてスパイラル状に形成された第1の配線と、
第2の配線層において、第1の配線の全長に沿って設けられた第2の配線と、
第2の配線を第1の配線に接続する複数のビアとを具備し、
第1の配線のスパイラルの最も外側に位置する部分に沿う第2の配線の部分は、第1の配線の外側の縁に沿って形成され、
第1の配線のスパイラルの最も内側に位置する部分に沿う第2の配線の部分は、第1の配線の内側の縁に沿って形成されるスパイラルインダクタ。
A first wiring formed in a spiral shape in the first wiring layer;
A second wiring provided along the entire length of the first wiring in the second wiring layer;
A plurality of vias connecting the second wiring to the first wiring;
A portion of the second wiring along the outermost portion of the spiral of the first wiring is formed along the outer edge of the first wiring;
The portion of the second wiring along the innermost portion of the spiral of the first wiring is a spiral inductor formed along the inner edge of the first wiring.
JP2002381368A 2002-12-27 2002-12-27 Spiral inductor Expired - Fee Related JP3717477B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002381368A JP3717477B2 (en) 2002-12-27 2002-12-27 Spiral inductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002381368A JP3717477B2 (en) 2002-12-27 2002-12-27 Spiral inductor

Publications (2)

Publication Number Publication Date
JP2004214377A JP2004214377A (en) 2004-07-29
JP3717477B2 true JP3717477B2 (en) 2005-11-16

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4668719B2 (en) * 2005-07-25 2011-04-13 Okiセミコンダクタ株式会社 Inductor characteristics adjustment method
JP5090688B2 (en) * 2006-08-17 2012-12-05 ルネサスエレクトロニクス株式会社 Semiconductor device
JP2009272360A (en) * 2008-05-01 2009-11-19 Panasonic Corp Inductor and its manufacturing method
JP2016092267A (en) * 2014-11-06 2016-05-23 株式会社豊田自動織機 Reactor coil

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