JP3708953B2 - パターン形成方法 - Google Patents
パターン形成方法 Download PDFInfo
- Publication number
- JP3708953B2 JP3708953B2 JP2004375898A JP2004375898A JP3708953B2 JP 3708953 B2 JP3708953 B2 JP 3708953B2 JP 2004375898 A JP2004375898 A JP 2004375898A JP 2004375898 A JP2004375898 A JP 2004375898A JP 3708953 B2 JP3708953 B2 JP 3708953B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- light
- region
- mask
- light shielding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004375898A JP3708953B2 (ja) | 1999-11-08 | 2004-12-27 | パターン形成方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP31675299 | 1999-11-08 | ||
| JP2004375898A JP3708953B2 (ja) | 1999-11-08 | 2004-12-27 | パターン形成方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001536639A Division JP3708875B2 (ja) | 1999-11-08 | 2000-11-02 | フォトマスク及びその作成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005107551A JP2005107551A (ja) | 2005-04-21 |
| JP2005107551A5 JP2005107551A5 (enExample) | 2005-08-11 |
| JP3708953B2 true JP3708953B2 (ja) | 2005-10-19 |
Family
ID=34553903
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004375898A Expired - Fee Related JP3708953B2 (ja) | 1999-11-08 | 2004-12-27 | パターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3708953B2 (enExample) |
-
2004
- 2004-12-27 JP JP2004375898A patent/JP3708953B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005107551A (ja) | 2005-04-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3708875B2 (ja) | フォトマスク及びその作成方法 | |
| JPWO2001035166A1 (ja) | フォトマスク、その作成方法及びそのフォトマスクを用いたパターン形成方法 | |
| JP3197795B2 (ja) | 高解像度の位相エッジ・リソグラフィ方法 | |
| US7569312B2 (en) | Mask data creation method | |
| US7569310B2 (en) | Sub-resolution assist features for photolithography with trim ends | |
| US6706453B2 (en) | Method for formation of semiconductor device pattern, method for designing photo mask pattern, photo mask and process for photo mask | |
| US20090258302A1 (en) | Sub-resolution assist feature of a photomask | |
| KR100564171B1 (ko) | 포토리소그래피 마스크 및 프로젝션 장치에서의 웨이퍼노출 방법 | |
| US20060183030A1 (en) | Photomask, method of generating mask pattern, and method of manufacturing semiconductor device | |
| JP2004177611A (ja) | レチクル、露光モニタ方法、露光方法、及び半導体装置の製造方法 | |
| KR100475083B1 (ko) | 미세한 콘택홀 어레이를 위한 포토마스크, 그 제조방법 및사용방법 | |
| JP2661529B2 (ja) | 位相シフトマスク | |
| JP2004251969A (ja) | 位相シフトマスク、位相シフトマスクを用いたパターンの形成方法および電子デバイスの製造方法 | |
| JP4402195B2 (ja) | フォトマスク、パターン形成方法及びデバイス製造方法 | |
| JP3738267B2 (ja) | パターンレイアウト作成方法及びマスク描画データ作成方法 | |
| JP2003322949A (ja) | フォトマスク及びそれを用いたパターン形成方法 | |
| JP2003209048A (ja) | パターン形成方法 | |
| JPH05273739A (ja) | パターン転写方法 | |
| JP2005107551A (ja) | パターン形成方法 | |
| JP5068357B2 (ja) | 半導体装置の製造方法、フォトマスクのパターン設計方法およびフォトマスクの製造方法 | |
| JP3173025B2 (ja) | 露光方法及び半導体素子の製造方法 | |
| KR20090068638A (ko) | 반도체 소자의 패턴 형성용 마스크 제작 방법 | |
| US20090130572A1 (en) | Reticle for forming microscopic pattern | |
| KR20070069996A (ko) | 반도체 장치의 미세 패턴 형성에 사용되는 포토 마스크와그 제조 방법 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050317 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20050726 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20050804 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080812 Year of fee payment: 3 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090812 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090812 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100812 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110812 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110812 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120812 Year of fee payment: 7 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130812 Year of fee payment: 8 |
|
| LAPS | Cancellation because of no payment of annual fees |