JP3662310B2 - Silica glass for filter and method for producing the same - Google Patents

Silica glass for filter and method for producing the same Download PDF

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Publication number
JP3662310B2
JP3662310B2 JP27509995A JP27509995A JP3662310B2 JP 3662310 B2 JP3662310 B2 JP 3662310B2 JP 27509995 A JP27509995 A JP 27509995A JP 27509995 A JP27509995 A JP 27509995A JP 3662310 B2 JP3662310 B2 JP 3662310B2
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Prior art keywords
silica glass
filter
temperature
closed cells
ceramic
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JPH0986953A (en
Inventor
恭一 稲木
宜正 吉田
護 遠藤
仁 関根
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Shin Etsu Quartz Products Co Ltd
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Shin Etsu Quartz Products Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/08—Other methods of shaping glass by foaming
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould

Description

【０００１】
【産業上の利用分野】
本発明は、フィルター用シリカガラス及びその製造方法、さらに詳しくは高温液体や腐食性液体等、通常の濾過装置では処理し難い液体類を濾過精製するための濾材、或は高温ガス、腐食性ガス等の反応性の高いガスを流量調節するためのフィルター用シリカガラス及びその製造方法に係る。
【０００２】
【従来の技術】
シリカガラスは、高純度で、耐熱性、耐薬品性、耐熱衝撃性に優れているところから、例えば高温で使用される半導体素子製造用治具、或は高温又は腐食性液体やガスの濾過或は流量調節用フィルター等として、幅広く利用されている。前記高温又は腐食性液体やガスの濾過或は流量調節用フィルターとしては、例えば石英ガラス粉を焼結したフィルター、石英ガラスファイバーの織物又は不織布を加工したフィルター、或は石英ガラス発泡体を加工したフィルター（特開平３ー２４７５２４号公報）等が提案されている。しかしながら前記フィルターのうち焼結手段で作成したフィルターは、加熱焼結中に予備成形された成形体が収縮し、所望の形状のフィルターを寸法精度良く作成できない欠点があった。また、石英ガラスファイバーの織物或は不織布を加工したフィルターは、形状維持性に難点があるばかりでなく、多くの製造工程を必要とし、石英ガラスが有する高純度で安定性に優れた利点が損なわれ易いという欠点があった。さらに、前記特開平３ー２４７５２４号公報に記載の石英ガラス発泡体を基体とするフィルターは、発泡剤による異常発泡が部分的に発生し、均質な発泡体が得られないところから、液体やガスを濾過する位置の設定が困難であるという欠点があった。このように前記各フィルターは濾液等を所定の位置に放出するのが困難であるため、該フィルターを溶接等の手段で石英ガラスに溶接し流出位置を特定する必要があり、その製造工程が複雑で、コスト高になるという欠点があった。
【０００３】
【発明が解決しようとする課題】
こうした現状に鑑み、本発明者等は、高温又は腐食性液体やガスの濾材或は流量調節用フィルターについて鋭意研究を重ねた結果、連通気泡の開口部が規則的に存在する不透明シリカガラスをフィルター用素材とすることで、高温又は腐食性液体やガスを所定の位置から放出できるフィルターが得られることを見出した。そして前記不透明シリカガラスが耐熱性材料に孔を形成し、その孔に接触するように石英原料粉を充填したのち加熱溶融することで容易に製造できることをも見出した。こうした知見に基づいて本発明は完成したものである。すなわち
【０００４】
本発明は、連通気泡の開口部が規則的な配置で存在するフィルター用シリカガラスを提供することを目的とする。
【０００５】
また、本発明は、高温又は腐食性液体やガスの濾材或は流量調節用フィルター用素材として有用なフィルター用シリカガラスを提供することを目的とする。
【０００６】
さらに、本発明は、上記フィルター用シリカガラスの製造方法を提供することを目的とする。
【０００７】
【課題を解決するための手段】
上記目的を達成する本発明は、直径が１〜２０００μｍ、含有量が１０，０００〜２，０００，０００個／ｃｍ ３ の独立気泡が分散すると共に、独立気泡を浸食して形成した開口部を有する連通気泡が規則的な配置で存在することを特徴とするフィルター用シリカガラス及びその製造方法に係る。
【０００８】
本発明のフィルター用シリカガラスリカガラスは、高純度の石英原料粉を溶融して得た微細な独立気泡が分散するとともに、連通気泡の開口部が規則的に存在する不透明なシリカガラスである。前記「規則的な配置」とは、ほぼ設定された位置に存在する状態をいう。前記フィルター用シリカガラス中に分散する独立気泡はその直径が１〜２０００μｍ、好ましくは１０〜１０００μｍ、その含有量が１０，０００〜２，０００，０００個／ｃｍ３であるのが好ましい。そして、連通気泡を形成する前のシリカガラスの嵩密度は１．０ｇ／ｃｍ３以上であることを必須とする。本発明のフィルター用シリカガラスに存在する連通気泡の開口部は、ほぼ規則的な配置で存在する比較的径の大きい独立気泡が浸食されて形成された開口部である。このように本発明のフィルター用シリカガラスは連通気泡の開口部をほぼ規則的な配置で有するところから、液体やガスを所定の場所に放出できる上に、高純度で、耐熱性、耐薬品性、耐熱衝撃性等に優れているところから、濾材又は流量調節用フィルターとして、特に高温又は腐食性液体やガスの濾材或は流量調節用フィルターとして有用である。
【０００９】
上記フィルター用シリカガラスに分散する独立気泡の直径が１μｍ未満のシリカガラスは製造が難しく、また直径が２０００μｍを超えると得られたシリカガラスの機械的強度が低下し実用的なフィルターが得られない。独立気泡の含有量が１０，０００個／ｃｍ３未満では、連通気泡の開口部の形成が少なくフィルター性能が劣り、また独立気泡の含有量が２，０００，０００個／ｃｍ３を超えるとシリカガラスの機械的強度が低下する。さらに、シリカガラスの嵩密度が１．０ｇ／ｃｍ３未満では機械的強度が低く、浸食時にボロボロになる。
【００１０】
上記本発明のフィルター用シリカガラスは、規則的な配置で形成されたガス抜き孔を有するセラミック型を耐熱性型枠に配置し、該耐熱性型枠内に石英原料粉を充填したのち、加熱溶融して独立気泡が分散するシリカガラスを製造し、このシリカガラスのセラミック型のガス抜き孔近傍に形成された比較的径の大きい独立気泡を浸食して連通気泡を形成し、その開口部をほぼ規則的に存在させる方法で製造できる。前記製造方法を図にしたがって詳しく説明する。すなわち、図１において、１は耐熱性型、２はセラミック型、３は独立気泡、４は連通気泡及び５は開口部を示す。高純度の石英原料粉、好ましくは粒度１０〜３５０μｍの結晶質石英粉又は非晶質石英粉を、底部に規則的なガス抜き孔を有するセラミック型２が設置された耐熱性型枠に充填し、それを不活性ガス雰囲気下で加熱溶融、好ましくは５〜２０リットル／分の窒素ガスを流しながら室温から石英原料粉の溶融する温度より５０〜１５０℃低い温度までを１０〜５０℃／分の昇温速度で、前記温度を超え石英原料粉の融点より１０〜８０℃高い温度までを１０℃／分以下の昇温速度で昇温し溶融する。その結果、直径１〜２０００μｍの独立気泡が１０，０００〜２，０００，０００個／ｃｍ３、好ましくは１００，０００〜１，０００，０００個／ｃｍ３均一に分散し、ガス抜き孔の近傍には図３（拡大図）に示すように比較的径の大きい独立気泡が規則的な配置で存在するとともに、シリカガラスの嵩密度が１．０ｇ／ｃｍ３以上の高品質で不透明なシリカガラスが製造される。前記加熱溶融には、ＯＨ基の混入が少ない電気溶融法が好ましい。また使用する耐熱性型枠としては、カーボン製型枠、セラミック製型枠、または前記型枠内に挿入された透明石英ガラス管等が挙げられる。特に、透明石英ガラス管の使用は、原料の高純度が維持されるとともに、製造されるシリカガラスに形崩れが起らず良好なシリカガラスが得られる。さらに前記耐熱性型枠内に設置される規則的に配置されたガス抜き孔を有するセラミック型としては、図２（ａ）の規則的に刻んだ溝を有するセラミック型、又は図２（ｂ）の規則的に穿孔されたセラミック型等が使用できる。
【００１１】
上記製造方法において、浸食に使用される溶液としては酸又はアルカリの溶液がよく、酸としては、弗化水素酸、硝酸、塩酸、硫酸、リン酸又はこれらの酸の混合液が、またアルカリとしては、アンモニア、水酸化ナトリウム、メタリン酸ナトリウムが使用できる。前記溶液の濃度は特に限定されないが、高濃度の溶液を用いれば処理時間が短てよく、また溶液を加熱或は加圧すれば浸食時間を短縮することができる。
【００１２】
【実施の形態】
以下、実施例に基づいてを本発明を具体的に説明するが、本発明はこれに限定されるものではない。
【００１３】
【実施例】
実施例１
内径２７０ｍｍ、高さ３００ｍｍのグラファイト製枠内に外径２７０ｍｍ、肉厚４ｍｍ、高さ３００ｍｍの石英ガラス管を挿入した。この石英ガラス管の底部に縦横２ｃｍ置きに約１ｍｍφのガス抜き孔を穿孔したカーボンシートを設置した。前記カーボンシートを設置した石英ガラス管に粒径が５０〜２００μｍ、平均粒径が約１００μｍ、嵩密度が１．４ｇ／ｃｍ3の天然石英結晶粉（融点１７５０℃）を充填し、それを電気炉内に設置し、１０-2ｔｏｒｒ以下に真空排気して粒子間に残留している空気を除去した。次いで、炉内を窒素で真空破壊し、１０リットル／分の流量で窒素ガスを流しながら室温から１，２００℃までを１２０分で、１，２００℃から１，６３０℃までを９０分で、１，６３０℃から１，７５０℃までを２４０分で昇温させ、次いで１７５０℃に保持しながら６０分加熱した後、加熱を止めて室温まで冷却し、シリカガラスブロックを取り出した。得られたシリカガラスブロックのセラミック型に接した面から厚さ１ｍｍをバンドソーで薄板にカットした。得られた薄板は図３に示すようにカーボンシートの孔が接触した部分には直径が比較的大きい独立気泡がみられた。前記薄板を２５％弗化水素酸溶液で１時間エッチングしたのち薄板の表面を観察したところ、２ｃｍ毎に連続気泡の開口部が観察された。
【００１４】
比較例
特開平３ー２４７５２４号公報記載の製造方法で製造した密度０．５ｇ／ｃｍ3の発泡体を２５％弗化水素酸溶液で１０分浸食したところ、連通気泡が形成され液体の通過が認められたが、連続気泡の分布が均一でなく、一部に大きな開放泡が確認された。また強度が低く取扱時に端が欠けてしまった。
【００１５】
【発明の効果】
本発明のフィルター用シリカガラスは独立気泡が分散するとともに、所望の位置に連通気泡の開口部が存在し高温又は腐食性液体やガスを任意の位置で放出するフィルターが作成できる上に、寸法精度が高く、高純度で、耐熱性、耐熱衝撃性も高い。
【図面の簡単な説明】
【図１】 図１は、耐熱性型枠の概略図である。
【図２】 図２は、セラミック型の例を示す。図２（ａ）は溝のガス抜き孔を有するセラミック型、（ｂ）は穿孔したガス抜き孔を有するセラミック型を示す。
【図３】 図３は、本発明のフィルター用シリカガラスのセラミック型と接触していた部分の平面図である。
【図４】 図４は、図３のシリカガラスを浸食し底部の厚さ１ｍｍをカットして得た薄板の断面気泡状態図を拡大して示す。[0001]
[Industrial application fields]
The present invention relates to a silica glass for a filter and a method for producing the same, more specifically, a filter medium for filtering and purifying liquids that are difficult to process with a normal filtration device, such as a high temperature liquid and a corrosive liquid, or a high temperature gas and a corrosive gas. The present invention relates to a silica glass for a filter for adjusting the flow rate of a highly reactive gas such as a gas and a method for producing the same.
[0002]
[Prior art]
Silica glass has high purity and is excellent in heat resistance, chemical resistance, and thermal shock resistance. For example, a jig for manufacturing semiconductor elements used at high temperatures, or filtration of high temperature or corrosive liquids or gases. Is widely used as a flow control filter. Examples of the high-temperature or corrosive liquid or gas filtration or flow rate control filter include a filter obtained by sintering quartz glass powder, a filter obtained by processing a woven or nonwoven fabric of quartz glass fiber, or a quartz glass foam. A filter (Japanese Patent Laid-Open No. 3-247524) has been proposed. However, the filter prepared by the sintering means among the above filters has a drawback that a preform formed during heat sintering shrinks and a filter having a desired shape cannot be formed with high dimensional accuracy. In addition, a filter made of quartz glass fiber woven fabric or non-woven fabric has not only difficulty in maintaining shape but also requires many manufacturing processes, and the high purity and stability advantages of quartz glass are impaired. There was a drawback that it was easy to get. Further, the filter based on the quartz glass foam described in Japanese Patent Application Laid-Open No. 3-247524 has abnormal foaming caused by a foaming agent in part and a homogeneous foam cannot be obtained. There is a drawback that it is difficult to set the position for filtering the slag. As described above, since it is difficult for each filter to discharge filtrate or the like to a predetermined position, it is necessary to identify the outflow position by welding the filter to quartz glass by means such as welding, and the manufacturing process is complicated. However, there was a drawback of high cost.
[0003]
[Problems to be solved by the invention]
In view of this situation, the present inventors have conducted extensive research on filter media for high-temperature or corrosive liquids and gases or filters for flow rate control. It was found that a filter capable of releasing a high temperature or corrosive liquid or gas from a predetermined position can be obtained by using the material for use. It was also found that the opaque silica glass can be easily manufactured by forming holes in the heat-resistant material, filling the quartz raw material powder so as to be in contact with the holes, and then melting by heating. Based on these findings, the present invention has been completed. That is, [0004]
An object of this invention is to provide the silica glass for filters in which the opening part of a communicating bubble exists in regular arrangement | positioning.
[0005]
Another object of the present invention is to provide a silica glass for a filter that is useful as a filter medium for high-temperature or corrosive liquids or gases or as a filter material for flow rate adjustment.
[0006]
Furthermore, this invention aims at providing the manufacturing method of the said silica glass for filters .
[0007]
[Means for Solving the Problems]
The present invention that achieves the above object has an opening formed by dispersing closed cells having a diameter of 1 to 2000 μm and a content of 10,000 to 2,000,000 / cm 3 and eroding the closed cells. The present invention relates to a silica glass for a filter and a method for producing the same, characterized in that the communicating bubbles are present in a regular arrangement .
[0008]
The silica glass Rica glass for filter of the present invention is an opaque silica glass in which fine closed cells obtained by melting high-purity quartz raw material powder are dispersed and openings of open cells regularly exist. The “regular arrangement” means a state that exists at a substantially set position. The closed cells dispersed in the filter silica glass preferably have a diameter of 1 to 2000 μm, preferably 10 to 1000 μm, and a content of 10,000 to 2,000,000 / cm 3 . And it is essential that the bulk density of the silica glass before forming a communication bubble is 1.0 g / cm < 3 > or more. The opening portion of the communicating bubble present in the silica glass for a filter of the present invention is an opening portion formed by eroding closed cells having a relatively large diameter and present in a substantially regular arrangement. As described above, the silica glass for a filter of the present invention has openings of open cells in a substantially regular arrangement, so that liquid and gas can be discharged to a predetermined place, and also has high purity, heat resistance, and chemical resistance. From the viewpoint of excellent thermal shock resistance, etc., it is useful as a filter medium or a flow rate adjusting filter, particularly as a high temperature or corrosive liquid or gas filter medium or a flow rate adjusting filter.
[0009]
Silica glass having a closed cell diameter of less than 1 μm dispersed in the filter silica glass is difficult to produce, and if the diameter exceeds 2000 μm, the mechanical strength of the obtained silica glass is lowered and a practical filter cannot be obtained. . When the content of closed cells is less than 10,000 / cm 3 , the formation of open portions of open cells is small and the filter performance is poor, and when the content of closed cells exceeds 2,000,000 / cm 3 , silica The mechanical strength of the glass decreases. Furthermore, when the bulk density of silica glass is less than 1.0 g / cm 3 , the mechanical strength is low, and it becomes tattered during erosion.
[0010]
The silica glass for a filter according to the present invention has a ceramic mold having a gas vent hole formed in a regular arrangement in a heat resistant mold, and is filled with quartz raw material powder in the heat resistant mold, and then heated. A silica glass in which closed cells are dispersed by melting is manufactured, and closed cells having a relatively large diameter formed in the vicinity of the ceramic type gas vent holes of the silica glass are eroded to form open cells, and the openings are formed. It can be produced by a method that exists almost regularly. The manufacturing method will be described in detail with reference to the drawings. That is, in FIG. 1, 1 is a heat resistant type, 2 is a ceramic type, 3 is a closed cell, 4 is an open cell, and 5 is an opening. A high-purity quartz raw material powder, preferably crystalline quartz powder or amorphous quartz powder having a particle size of 10 to 350 μm, is filled into a heat-resistant mold having a ceramic mold 2 having a regular vent hole at the bottom. The mixture is heated and melted under an inert gas atmosphere, preferably from 10 to 50 ° C./min from room temperature to a temperature lower by 50 to 150 ° C. than the melting temperature of the quartz raw material powder while flowing nitrogen gas of 5 to 20 liter / min. The temperature is raised at a rate of 10 ° C./min or less until the temperature exceeds 10 ° C./min. As a result of the comparison, 10,000 to 2,000,000 or closed cell diameter 1～2000Myuemu / cm 3, preferably dispersed in 100,000 to 1,000,000 pieces / cm 3 uniformly, degassing holes As shown in FIG. 3 (enlarged view), closed cells having relatively large diameters are present in a regular arrangement, and the silica glass has a bulk density of 1.0 g / cm 3 or more and is a high-quality and opaque silica glass. Is manufactured. For the heating and melting, an electric melting method with less mixing of OH groups is preferable. Examples of the heat-resistant mold used include a carbon mold, a ceramic mold, or a transparent quartz glass tube inserted into the mold. In particular, the use of the transparent quartz glass tube maintains the high purity of the raw material, and a good silica glass can be obtained without being deformed in the produced silica glass. Furthermore, as the ceramic mold having regularly arranged vent holes installed in the heat-resistant mold, the ceramic mold having regularly chopped grooves of FIG. 2 (a), or FIG. 2 (b). Regularly perforated ceramic molds can be used.
[0011]
In the above production method, the solution used for erosion is preferably an acid or alkali solution, and the acid is hydrofluoric acid, nitric acid, hydrochloric acid, sulfuric acid, phosphoric acid, or a mixture of these acids, and an alkali. Ammonia, sodium hydroxide, and sodium metaphosphate can be used. The concentration of the solution is not particularly limited, but if a high concentration solution is used, the treatment time may be short, and if the solution is heated or pressurized, the erosion time can be shortened.
[0012]
Embodiment
EXAMPLES Hereinafter, although this invention is demonstrated concretely based on an Example, this invention is not limited to this.
[0013]
【Example】
Example 1
A quartz glass tube having an outer diameter of 270 mm, a wall thickness of 4 mm, and a height of 300 mm was inserted into a graphite frame having an inner diameter of 270 mm and a height of 300 mm. At the bottom of this quartz glass tube, a carbon sheet having a gas vent hole of about 1 mmφ was installed at intervals of 2 cm in length and width. A quartz glass tube provided with the carbon sheet is filled with natural quartz crystal powder (melting point: 1750 ° C.) having a particle size of 50 to 200 μm, an average particle size of about 100 μm, and a bulk density of 1.4 g / cm 3. It was placed in a furnace and evacuated to 10 −2 torr or less to remove air remaining between particles. Next, the inside of the furnace was vacuum-breaked with nitrogen, while flowing nitrogen gas at a flow rate of 10 liters / minute, from room temperature to 1,200 ° C. in 120 minutes, from 1,200 ° C. to 1,630 ° C. in 90 minutes, The temperature was raised from 1,630 ° C. to 1,750 ° C. in 240 minutes, and then heated for 60 minutes while maintaining the temperature at 1750 ° C. Then, the heating was stopped and the mixture was cooled to room temperature, and the silica glass block was taken out. A 1 mm thickness was cut into a thin plate with a band saw from the surface of the resulting silica glass block in contact with the ceramic mold. In the obtained thin plate, as shown in FIG. 3, closed cells having a relatively large diameter were observed at the portion where the holes of the carbon sheet contacted. After the thin plate was etched with a 25% hydrofluoric acid solution for 1 hour, the surface of the thin plate was observed, and openings of open cells were observed every 2 cm.
[0014]
Comparative Example When a foam having a density of 0.5 g / cm 3 produced by the production method described in JP-A-3-247524 was eroded with a 25% hydrofluoric acid solution for 10 minutes, open bubbles were formed and the liquid could pass through. Although it was recognized, the distribution of open cells was not uniform, and large open bubbles were confirmed in part. Also, the strength was low and the edges were chipped during handling.
[0015]
【The invention's effect】
The silica glass for filter according to the present invention can create a filter in which closed cells are dispersed and a communicating bubble opening exists at a desired position to discharge a high temperature or corrosive liquid or gas at any position. High purity, high heat resistance, and high thermal shock resistance.
[Brief description of the drawings]
FIG. 1 is a schematic view of a heat-resistant formwork.
FIG. 2 shows an example of a ceramic mold. FIG. 2A shows a ceramic mold having groove vent holes, and FIG. 2B shows a ceramic mold having perforated gas vent holes.
FIG. 3 is a plan view of a portion in contact with the ceramic mold of the silica glass for a filter according to the present invention .
FIG. 4 is an enlarged view of a cross-sectional bubble state diagram of a thin plate obtained by eroding the silica glass of FIG. 3 and cutting the bottom thickness of 1 mm.

Claims (8)

直径が１〜２０００μｍ、含有量が１０，０００〜２，０００，０００個／ｃｍ ３ の独立気泡が分散すると共に、製造時にセラミック型のガス抜き孔に接触する部分に形成された独立気泡が浸食され連通気泡の開口部が規則的な配置で存在することを特徴とするフィルター用シリカガラス。 Closed cells with a diameter of 1 to 2000 μm and a content of 10,000 to 2,000,000 / cm 3 are dispersed, and the closed cells formed at the portions that contact the ceramic-type gas vent holes during the production are eroded. A silica glass for a filter, wherein the openings of the communication bubbles are present in a regular arrangement. 独立気泡を含有するシリカガラスの嵩密度が１．０ｇ／ｃｍ３以上であることを特徴とする請求項１記載のフィルター用シリカガラス。 The silica glass for a filter according to claim 1, wherein the bulk density of the silica glass containing closed cells is 1.0 g / cm 3 or more. 高温又は腐食性液体やガスの濾材或は流量調節用フィルター形成用シリカガラスであることを特徴とする請求項１記載のフィルター用シリカガラス。High temperature or corrosive filter for silica glass according to claim 1, wherein a liquid or a filter material or a flow rate adjusting filter forming silica glass of the gas. 規則的に配置されたガス抜き孔を有するセラミック型を耐熱性型枠の底部に設置し、該耐熱性型枠内に石英原料粉を充填したのち、加熱溶融して独立気泡が分散するシリカガラスを製造し、次いで前記ガス抜き孔近傍に形成された独立気泡を浸食し、開口部が規則的な配置で存在する連通気泡に形成することを特徴とするフィルター用シリカガラスの製造方法。Silica glass in which ceramic molds with regularly arranged vent holes are installed at the bottom of a heat-resistant mold, and after filling quartz raw material powder into the heat-resistant mold, it is heated and melted to disperse closed cells to produce, then the gas release openings to erode closed cells formed in the vicinity, the method for producing a silica glass filter, characterized in that the opening is formed in the open cells present in a regular arrangement. 加熱溶融を５〜２０リットル／分の窒素ガスを流しながら室温から石英原料粉の溶融する温度より５０〜１５０℃低い温度までは１０〜５０℃／分の昇温速度で、前記温度を超え石英原料粉の融点より１０〜８０℃高い温度までは１０℃／分以下の昇温速度で昇温することを特徴とする請求項４記載のフィルター用シリカガラスの製造方法。While heating and melting with flowing nitrogen gas at 5 to 20 liters / minute, the temperature is increased from 10 to 50 ° C./minute from the room temperature to a temperature lower by 50 to 150 ° C. than the temperature at which the quartz raw material powder melts. method for producing a full Iruta for silica glass according to claim 4, wherein more to 10 to 80 ° C. higher melting point, characterized by raising the temperature at a heating rate of 10 ° C. / min or less of the raw material powder. 浸食を酸又はアルカリ溶液で行うことを特徴とする請求項４記載のフィルター用シリカガラスの製造方法。The method for producing silica glass for a filter according to claim 4, wherein the erosion is performed with an acid or an alkali solution. セラミック型がカーボン、炭化珪素、チッ化珪素、チッ化アルミニウム又はチッ化ホウ素からなる群から選ばれたセラミックスの板、シート又はフェルトであることを特徴とする請求項４記載のフィルター用シリカガラスの製造方法。5. The silica glass for a filter according to claim 4, wherein the ceramic mold is a ceramic plate, sheet or felt selected from the group consisting of carbon, silicon carbide, silicon nitride, aluminum nitride or boron nitride. Production method. セラミック型のガス抜き孔が溝または穿孔であることを特徴とる請求項４記載のフィルター用シリカガラスの製造方法。The method for producing silica glass for a filter according to claim 4, wherein the ceramic-type gas vent hole is a groove or a hole.
JP27509995A 1995-09-29 1995-09-29 Silica glass for filter and method for producing the same Expired - Fee Related JP3662310B2 (en)

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