JP3547832B2 - Apparatus and method for heat recovery and reuse of waste liquid - Google Patents

Apparatus and method for heat recovery and reuse of waste liquid Download PDF

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JP3547832B2
JP3547832B2 JP06024995A JP6024995A JP3547832B2 JP 3547832 B2 JP3547832 B2 JP 3547832B2 JP 06024995 A JP06024995 A JP 06024995A JP 6024995 A JP6024995 A JP 6024995A JP 3547832 B2 JP3547832 B2 JP 3547832B2
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gas
chemical
chemical solution
water
filter
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JPH08261676A (en
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正孝 福泉
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Fujitsu Ltd
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Fujitsu Ltd
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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Description

【０００１】
【産業上の利用分野】
本発明は、いろいろな薬液処理工程を経て製造される半導体装置やＬＣＤなどの電子デバイスの製造工程において、薬液を供給する装置と薬液の廃液を回収する装置を備えた熱回収再利用装置に関する。
【０００２】
薬液処理工程を経て製造される電子デバイスの製造工程においては、例えば、７０°Ｃとか１８０ °Ｃといった温度に加温した薬液を用いて半導体ウェーハやガラスなどの基板処理を行っており、供給する薬液の加温と廃液の冷却に莫大なエネルギを消費している。この消費エネルギを削減することが望まれている。
【０００３】
また、こうした薬液処理工程を経て製造される電子デバイスでは、例えば、サブμｍの微細なパターンあるいは一辺が数百ｍｍの大きな基板に数千本の無欠陥のパターンを形成するので、製造工程で用いられる薬液の純度はいわゆる半導体グレードであり、夾雑物などの混入も厳しく抑える必要がある。従って、供給薬液と廃液とを直接熱交換することは熱交換体の損傷などによる汚染の危険性があって採用できない。そのため、汚染の危険性が少ない熱媒体を使った熱交換が望まれている。
【０００４】
【従来の技術】
図３は従来の廃液回収装置の要部のブロック図、図４は従来の薬液供給装置の要部のブロック図である。図において、４は薬液、７はポンプ、８はろ過フィルタ、９は薬液処理装置、１１は薬液回収装置、１２は貯液槽、１３は廃液回収装置、１４は廃液回収槽である。
【０００５】
図３において、従来の廃液回収装置１１では、薬液処理装置９で使用済みの薬液４が使用中の温度のまゝか若干冷やされたあと廃液回収槽１２に回収される。
図４において、従来の薬液供給装置１３では、貯液槽１４に蓄えられている使用前の薬液４をポンプ７によって取り出し、ろ過フィルタ８を透してろ過して図示してない薬液処理装置へ供給される。薬液４は図３に示した薬液処理装置９内で適宜加温されて使用される。
【０００６】
【発明が解決しようとする課題】
このように、従来の薬液供給装置と廃液回収装置のそれぞれは、互いに独立していたために、昇温された使用済みの薬液のもつ熱量が有効に利用されずにむざむざ捨てられており、薬液を昇温するためのエネルギの消費量とコストが大きかった。
【０００７】
そこで本発明は、薬液に対して不活性なガスを熱交換媒体として用い、回収した廃液の熱を供給する薬液の加温に再利用できる廃液の熱回収再利用装置を提供することを目的としている。
【０００８】
【課題を解決するための手段】
上で述べた課題は、
使用済みの薬液を回収する回収槽と、使用前の薬液を貯留する供給槽と、熱交換媒体のガスを、第一の撥水性フィルタを介して該回収槽の薬液中に送入し、該薬液中をバブリングして送出した該ガスを第二の撥水性フィルタと第一のバルブと第三の撥水性フィルタと第四の撥水性フィルタをこの順序で介して排気するガス用主管路と、該供給槽内の薬液を、第三と第四の撥水性フィルタとの中間部で該ガス主管路に送入して該ガスで熱交換し、第四の撥水性フィルタで該ガスと分離されてポンプとろ過フィルタと第二のバルブをこの順序で介して薬液処理装置へ送出する薬液用主管路とで構成された廃液の熱回収再利用装置と、該装置を用いて使用済みの薬液の熱を回収して使用前の薬液を加温する廃液の熱回収再利用方法とによって解決される。
【０００９】
また、前記薬液用主管路内の薬液を、前記ろ過フィルタと前記第二のバルブの中間部から分岐して第三のバルブを介して前記供給槽に送入する薬液用バイパス管路、あるいは前記第四の撥水性フィルタで分離された前記ガスを分岐して前記第一の撥水性フィルタの手前のガス用主管路へ送入するガス用バイパス管路を有する廃液の熱回収再利用装置と、これらの装置を用いた廃液の熱回収再利用方法によって解決される。
【００１０】
さらに、前記薬液には、りん酸、硫酸、塩酸の少なくとも一つを含む薬液が適用でき、該薬液に対して難溶性のＨｅ、Ａｒ、Ｎ２ の少なくとも一つを含むガスが適用できる。
【００１１】
【作用】
撥水性フィルタは、ガスと液体とを分離できるフィルタで、例えば、ふっ素化高分子の延伸多孔質膜で形成されたフィルタである。このフィルタは水を透さない性質、いわゆる撥水性が強く、水の表面張力のためにろ過膜の微細な空孔に毛細管現象を生じない。従って、この撥水性フィルタは、液体の中に泡粒状に混入している気体を液体から分離する脱泡に用いることができる。
【００１２】
そこで、本発明においては、まず、薬液に難溶性のガスを撥水性フィルタを透して使用済みの高温の廃液の中にバブリングさせて熱を回収するようにしている。そして、加温されたガスを撥水性フィルタを透して使用前の低温の薬液に接触させて熱交換し、薬液を加温するようにしている。さらに、撥水性フィルタを透してガスと薬液を分離するようにしている。
【００１３】
こうして、ガスを熱交換媒体として廃液の冷却を兼ねて廃液の熱を回収し、使用前の薬液を加温するので、半導体装置などの製造工程において消費されるエネルギの使用効率を改善することができる。
【００１４】
【実施例】
図１は本発明になる熱回収再利用装置の実施例を説明するブロック図、図２は本発明になる熱回収方法を示す工程図である。図において、１は回収槽、２は供給槽、３はガス、３ａはガス用主管路、３ｂはガス用バイパス管路、４は薬液、４ａは薬液用主管路、４ｂは薬液用バイパス管路、５ａは第一の撥水性フィルタ、５ｂは第二の撥水性フィルタ、５ｃは第三の撥水性フィルタ、５ｄは第四の撥水性フィルタ、６ａは第一のバルブ、６ｂは第二のバルブ、６ｃは第三のバルブ、７はポンプ、８はろ過フィルタ、９は薬液処理装置、１０は熱回収再利用装置である。
【００１５】
図１〜２において、本発明になる熱回収再利用装置１０の基本構成は、回収槽１と供給槽２と、ガス３を輸送するガス用主管路３ａやガス用バイパス管路３ｂ、薬液４を輸送する薬液用主管路４ａや薬液用バイパス管路４ｂが両槽１、２に連なった構成になっている。
【００１６】
半導体ウェーハなどの基板を薬液処理装置９の中で酸洗い処理する工程を例にとると、その薬液処理装置９の中に入っている例えば、りん酸、硫酸、塩酸などを含む薬液４は、例えば７０°Ｃないし１８０ °Ｃといった高い温度に加温されている。この薬液処理装置９の中の薬液４は、使用済みになると回収槽１に回収され貯留されるようになっている。
【００１７】
一方、ガス３がガス用主管路３ａから第一の撥水性フィルタ５ａを透して回収槽１の底部から送入される。このガス３には、薬液４に対して難溶性であり、かつ化学的に安定なＨｅ、Ａｒなどの希ガスやＮ２ガスなどが用いられる。また、第一の撥水性フィルタ５ａには、例えば、ふっ素化高分子の延伸多孔質膜、つまりＰＴＦＥ（ポリテトラフロロエチレン）とかＰＶＤＦ（ポリビニルフロライド）などのろ過膜で形成されたフィルタが用いられる。この第一の撥水性フィルタ５ａは、膜の素材自体が水に濡れないいわゆる撥水性が強い。従って、水の界面自由エネルギのためにろ過膜の微細な空孔に毛細管現象を生じない特異な性質をもっている。その結果、液体の中に泡粒状に混入している気体は透すが水を透さず、つまり、薬液４を透さずガス３だけが透過し、薬液４とガス３を分離することができる。第二〜第三の撥水性フィルタ５ｂ、５ｃ も同一の特性をもったフィルタである。第四の撥水性フィルタ ５ｄ も特性は同一であるが、薬液４から分離したガス３がガス用バイパス管路 ３ｂ に分岐して輸送される構成になっている。
【００１８】
回収槽１に貯留された薬液４の中はいわゆる熱吸収領域となっており、薬液４の中をバブリングして加温されたガス３は、第二の撥水性フィルタ５ｂを透ってガス用主管路３ａに送出される。そして、第一のバルブ６ａを透って使用済みの薬液４と分離されたあと第三の撥水性フィルタ５ｃを透り、第四の撥水性フィルタ５ｄからバイパスして排気されるようになっている。
【００１９】
一方、供給槽２には薬液処理装置９に送入する使用前の薬液４が貯留されている。この薬液４は、供給槽２から連なる薬液用主管路４ａを通り第三の撥水性フィルタ５ｃと第四の撥水性フィルタ５ｄとの中間でガス用主管路３ａに連結されている。第三の撥水性フィルタ５ｃは薬液４がガス用主管路３ａの方へ逆流することを防ぎ、第四の撥水性フィルタ５ｄでは分離されたガス３がガス用パイパス管路 ３ｂ に分岐され、薬液用主管路４ａの方へ輸送されて薬液４に混入することを防いでいる。つまり、第三の撥水性フィルタ５ｃと第四の撥水性フィルタ５ｄとの間の管路領域では、ガス用主管路３ａと薬液用主管路４ａとが共通になっており、回収槽１で薬液４から熱吸収して加温されたガス３と供給槽２から送出された薬液４とが共存して熱交換が行われる熱交換領域となっている。
【００２０】
ガス３は第四の撥水性フィルタ５ｄでバイパスされ、加温された薬液４のみがポンプ７で輸送されてろ過フィルタ８を通り、第二のバルブ６ｂを通って薬液処理装置９に送入されるようになっている。
【００２１】
こうして、本発明になる熱回収再利用装置１０によれば、例えば、７０°Ｃで回収槽１に回収された硫酸を含む薬液４をＨｅのガス３で熱交換したところ、２５°Ｃの室温の薬液４を４０°Ｃまで予熱することができた。
【００２２】
薬液４と熱交換したあとバイパスされたガス３は、排気せずにガス用バイパス管路３ｂを通って第一の撥水性フィルタ５ａの手前のガス用主管路３ａへ戻せば再度使用することができる。また、加温された薬液４を薬液処理装置９に送入しない場合には、第二のバルブ６ｂを閉栓して第三のバルブ６ｃを開栓する。そして、薬液用主管路４ａから薬液用バイパス管路４ｂへバイパスして供給槽２へ還流させる。そうすると、供給槽２の中の薬液処理装置９へ輸送する前の使用前の薬液４の加温を繰り返し予熱することができ、使用済みの廃液の熱回収効率を上げることができる。
【００２３】
【発明の効果】
半導体ウェーハなどの基板を加温した薬液を用いて行う処理において、使用済みの廃液をそのまゝ廃棄していたが、本発明によれば、不活性なガスを熱交換媒体として用い、回収した廃液の熱を薬液の加温に再利用することができる。
【００２４】
その結果、エネルギ効率を格段に高めることが可能となり、特に半導体装置などの電子デバイスの製造コストの削減と省エネルギに対して本発明は寄与するところが大である。
【図面の簡単な説明】
【図１】本発明になる熱回収再利用装置の実施例を説明するブロック図である。
【図２】本発明になる熱回収方法を示す工程図である。
【図３】従来の廃液回収装置の要部のブロック図である。
【図４】従来の薬液供給装置の要部のブロック図である。
【符号の説明】
１ 回収槽
２ 供給槽
３ ガス ３ａ ガス用主管路 ３ｂ ガス用バイパス管路
４ 薬液、 ４ａ 薬液用主管路 ４ｂ 薬液用バイパス管路
５ａ 第一の撥水性フィルタ ５ｂ 第二の撥水性フィルタ
５ｃ 第三の撥水性フィルタ ５ｄ 第四の撥水性フィルタ
６ａ 第一のバルブ ６ｂ 第二のバルブ ６ｃ 第三のバルブ
７ ポンプ、
８ ろ過フィルタ
９ 薬液処理装置
１０ 熱回収再利用装置[0001]
[Industrial applications]
The present invention relates to a heat recovery and reuse apparatus including a device for supplying a chemical solution and a device for collecting a waste liquid of a chemical solution in a process of manufacturing an electronic device such as a semiconductor device or an LCD manufactured through various chemical solution treatment processes.
[0002]
In a manufacturing process of an electronic device manufactured through a chemical treatment process, for example, a substrate treatment of a semiconductor wafer or glass is performed by using a chemical heated to a temperature of 70 ° C. or 180 ° C. Huge energy is consumed for heating the chemical and cooling the waste liquid. It is desired to reduce this energy consumption.
[0003]
Further, in an electronic device manufactured through such a chemical solution processing step, for example, a submicron fine pattern or a thousands of defect-free patterns are formed on a large substrate having a side of several hundred mm. The purity of the chemical solution to be used is a so-called semiconductor grade, and it is necessary to strictly suppress the contamination of foreign substances and the like. Therefore, direct heat exchange between the supplied chemical liquid and the waste liquid cannot be adopted due to the risk of contamination due to damage to the heat exchanger. Therefore, heat exchange using a heat medium with low risk of contamination is desired.
[0004]
[Prior art]
FIG. 3 is a block diagram of a main part of a conventional waste liquid collecting apparatus, and FIG. 4 is a block diagram of a main part of a conventional chemical liquid supply apparatus. In the figure, 4 is a chemical solution, 7 is a pump, 8 is a filtration filter, 9 is a chemical solution processing device, 11 is a chemical solution recovery device, 12 is a storage tank, 13 is a waste liquid recovery device, and 14 is a waste liquid recovery tank.
[0005]
In FIG. 3, in the conventional waste liquid collecting apparatus 11, the used chemical liquid 4 in the chemical liquid processing apparatus 9 is cooled down to a temperature in use, and then collected in the waste liquid collecting tank 12.
In FIG. 4, in the conventional chemical liquid supply device 13, the chemical liquid 4 before use stored in the liquid storage tank 14 is taken out by the pump 7, filtered through the filtration filter 8, and filtered to the chemical liquid processing device (not shown). Supplied. The chemical solution 4 is appropriately heated and used in the chemical solution processing device 9 shown in FIG.
[0006]
[Problems to be solved by the invention]
As described above, since the conventional chemical liquid supply device and the waste liquid recovery device are independent of each other, the amount of heat of the used chemical liquid whose temperature has been raised is not effectively used and is discarded without necessity. Energy consumption and cost for raising the temperature were large.
[0007]
Therefore, an object of the present invention is to provide a waste liquid heat recovery and reuse device that can be reused for heating a chemical liquid that supplies heat of the collected waste liquid, using a gas that is inert to the chemical liquid as a heat exchange medium. I have.
[0008]
[Means for Solving the Problems]
The issues mentioned above are:
A recovery tank for collecting used chemicals, a supply tank for storing chemicals before use, and a gas of a heat exchange medium are fed into the chemicals in the recovery tank through a first water-repellent filter, A gas main pipe that exhausts the gas that has been delivered by bubbling through the chemical solution through the second water repellent filter, the first valve, the third water repellent filter, and the fourth water repellent filter in this order, The chemical solution in the supply tank is fed into the gas main pipe at an intermediate portion between the third and fourth water repellent filters and exchanges heat with the gas, and is separated from the gas by the fourth water repellent filter. A heat recovery and reuse device for waste liquid, which comprises a pump, a filtration filter, and a main line for chemical liquid that is sent to the chemical liquid treatment apparatus through the second valve in this order, and a chemical liquid used by using the apparatus. Solved by heat recovery and reuse method of waste liquid that recovers heat and heats chemical solution before use That.
[0009]
In addition, the chemical liquid in the main liquid chemical channel is branched from an intermediate portion between the filtration filter and the second valve, and is fed into the supply tank via a third valve. A heat recovery and reuse device for waste liquid having a gas bypass pipe for branching the gas separated by the fourth water repellent filter and feeding the gas to the gas main pipe before the first water repellent filter, The problem is solved by a method for recovering and reusing waste liquid using these devices.
[0010]
Further, wherein the chemical solution, phosphoric acid, sulfuric acid, can be applied chemical solution containing at least one hydrochloric acid, can hardly soluble He, Ar, a gas containing at least one N 2 applied to the liquid chemical.
[0011]
[Action]
The water-repellent filter is a filter capable of separating gas and liquid, for example, a filter formed of a stretched porous membrane of a fluorinated polymer. This filter has the property of being impermeable to water, that is, has high water repellency, and does not cause capillary action in fine pores of the filtration membrane due to the surface tension of water. Therefore, this water repellent filter can be used for defoaming for separating gas mixed in the form of bubbles into the liquid from the liquid.
[0012]
Therefore, in the present invention, first, heat is recovered by bubbling a gas that is hardly soluble in a chemical solution through a water-repellent filter into a used high-temperature waste liquid. Then, the heated gas is passed through a water-repellent filter and brought into contact with a low-temperature chemical solution before use to exchange heat, thereby heating the chemical solution. Further, the gas and the chemical are separated through a water-repellent filter.
[0013]
In this way, since the heat of the waste liquid is recovered by also using the gas as a heat exchange medium to cool the waste liquid and the chemical liquid before use is heated, it is possible to improve the use efficiency of the energy consumed in the manufacturing process of the semiconductor device and the like. it can.
[0014]
【Example】
FIG. 1 is a block diagram illustrating an embodiment of a heat recovery and reuse apparatus according to the present invention, and FIG. 2 is a process diagram illustrating a heat recovery method according to the present invention. In the figure, 1 is a recovery tank, 2 is a supply tank, 3 is a gas, 3a is a gas main line, 3b is a gas bypass line, 4 is a chemical solution, 4a is a chemical line, 4b is a chemical liquid bypass line. 5a is a first water repellent filter, 5b is a second water repellent filter, 5c is a third water repellent filter, 5d is a fourth water repellent filter, 6a is a first valve, and 6b is a second valve. , 6c is a third valve, 7 is a pump, 8 is a filtration filter, 9 is a chemical solution treatment device, and 10 is a heat recovery and reuse device.
[0015]
1 and 2, the basic configuration of a heat recovery and reuse apparatus 10 according to the present invention includes a recovery tank 1, a supply tank 2, a gas main pipe 3a for transporting a gas 3, a gas bypass pipe 3b, and a chemical 4 The main line 4a for chemicals and the bypass line 4b for chemicals for transporting water are connected to both tanks 1 and 2.
[0016]
Taking the step of pickling a substrate such as a semiconductor wafer in the chemical processing apparatus 9 as an example, the chemical 4 containing phosphoric acid, sulfuric acid, hydrochloric acid, etc., contained in the chemical processing apparatus 9, For example, it is heated to a high temperature of 70 ° C. to 180 ° C. The chemical solution 4 in the chemical treatment device 9 is collected and stored in the collection tank 1 when it is used.
[0017]
On the other hand, the gas 3 is fed from the bottom of the recovery tank 1 through the gas main pipe 3a through the first water-repellent filter 5a. As the gas 3, a rare gas such as He or Ar or N 2 gas which is hardly soluble in the chemical solution 4 and is chemically stable is used. As the first water-repellent filter 5a, for example, a stretched porous membrane of a fluorinated polymer, that is, a filter formed of a filtration membrane such as PTFE (polytetrafluoroethylene) or PVDF (polyvinyl fluoride) is used. Can be The first water-repellent filter 5a has strong so-called water repellency in which the material of the film itself is not wetted by water. Therefore, the filter has a unique property that does not cause a capillary phenomenon in the fine pores of the filtration membrane due to the interfacial free energy of water. As a result, the gas mixed in the form of bubbles in the liquid can pass through but not water, that is, only the gas 3 can pass without passing through the chemical solution 4 and the gas 3 can be separated from the chemical solution 4. it can. The second and third water repellent filters 5b and 5c are filters having the same characteristics. The fourth water repellent filter 5d also has the same characteristics, but is configured so that the gas 3 separated from the chemical solution 4 is branched and transported to the gas bypass pipe 3b .
[0018]
The inside of the chemical solution 4 stored in the recovery tank 1 is a so-called heat absorption region, and the gas 3 heated by bubbling in the chemical solution 4 passes through the second water repellent filter 5b and is used for gas. It is sent to the main pipeline 3a. Then, after being separated from the used chemical solution 4 through the first valve 6a, it passes through the third water-repellent filter 5c and is exhausted by bypass from the fourth water-repellent filter 5d. I have.
[0019]
On the other hand, in the supply tank 2, the chemical solution 4 before use to be fed into the chemical solution processing device 9 is stored. The chemical solution 4 is connected to the gas main pipeline 3a at an intermediate position between the third water-repellent filter 5c and the fourth water-repellent filter 5d through the main liquid pipeline 4a connected to the supply tank 2. The third water repellent filter 5c prevents the chemical 4 from flowing back toward the gas main pipe 3a, and the fourth water repellent filter 5d separates the separated gas 3 into the gas bypass pipe 3b , It is prevented from being transported toward the main use line 4a and mixed into the chemical solution 4. That is, in the pipe region between the third water repellent filter 5c and the fourth water repellent filter 5d, the gas main pipe 3a and the chemical liquid main pipe 4a are common, and the chemical liquid is collected in the collection tank 1. The heat exchange region is a heat exchange region in which the gas 3 heated by absorbing heat from the gas 4 and the chemical solution 4 delivered from the supply tank 2 coexist to perform heat exchange.
[0020]
The gas 3 is bypassed by the fourth water-repellent filter 5d, and only the heated chemical 4 is transported by the pump 7, passes through the filtration filter 8, passes through the second valve 6b, and is sent to the chemical processing apparatus 9. It has become so.
[0021]
Thus, according to the heat recovery and reuse apparatus 10 of the present invention, for example, when the chemical solution 4 containing sulfuric acid recovered in the recovery tank 1 at 70 ° C. is heat-exchanged with the He gas 3, the room temperature of 25 ° C. Was preheated to 40 ° C.
[0022]
The gas 3 that has been bypassed after heat exchange with the chemical solution 4 can be reused if it is returned to the gas main pipe 3a in front of the first water-repellent filter 5a through the gas bypass pipe 3b without being exhausted. it can. When the heated chemical 4 is not fed into the chemical processing device 9, the second valve 6b is closed and the third valve 6c is opened. Then, the chemical solution is returned to the supply tank 2 by bypassing the chemical solution main pipe 4a to the chemical solution bypass pipe 4b. Then, the heating of the chemical solution 4 before use before being transported to the chemical solution treatment device 9 in the supply tank 2 can be repeatedly preheated, and the heat recovery efficiency of the used waste liquid can be increased.
[0023]
【The invention's effect】
In a process performed using a heated chemical solution for a substrate such as a semiconductor wafer, used waste liquid was discarded as it was, but according to the present invention, an inert gas was used as a heat exchange medium and recovered. The heat of the waste liquid can be reused for heating the chemical.
[0024]
As a result, energy efficiency can be significantly improved, and the present invention greatly contributes to reduction of manufacturing cost and energy saving of electronic devices such as semiconductor devices.
[Brief description of the drawings]
FIG. 1 is a block diagram illustrating an embodiment of a heat recovery and reuse apparatus according to the present invention.
FIG. 2 is a process chart showing a heat recovery method according to the present invention.
FIG. 3 is a block diagram of a main part of a conventional waste liquid collecting device.
FIG. 4 is a block diagram of a main part of a conventional chemical liquid supply device.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Recovery tank 2 Supply tank 3 Gas 3a Gas main line 3b Gas bypass line 4 Chemical liquid, 4a Chemical liquid main line 4b Chemical liquid bypass line 5a First water repellent filter 5b Second water repellent filter 5c Third Water-repellent filter 5d fourth water-repellent filter 6a first valve 6b second valve 6c third valve 7 pump,
8 Filtration filter 9 Chemical treatment device 10 Heat recovery and reuse device

Claims (6)

使用済みの薬液を回収する回収槽と、使用前の薬液を貯留する供給槽と、ガス用主管路と、薬液用主管路とを有し、
前記ガス用主管路は、熱交換媒体のガスを、第一の撥水性フィルタを介して前記回収槽の薬液中に送入し、該薬液中をバブリングして送出した該ガスを第二の撥水性フィルタと第一のバルブと第三の撥水性フィルタと第四の撥水性フィルタをこの順序で介して排気するものであり、
前記薬液用主管路は、前記供給槽内の薬液を、第三と第四の撥水性フィルタとの中間部で前記ガス主管路に送入して前記ガスで熱交換し、第四の撥水性フィルタで該ガスと分離されてポンプとろ過フィルタと第二のバルブをこの順序で介して薬液処理装置へ送出するものである
ことを特徴とする廃液の熱回収再利用装置。A collection tank for collecting used chemicals, a supply tank for storing chemicals before use, a main pipe for gas, and a main pipe for chemicals,
The gas main line feeds the gas of the heat exchange medium into the chemical solution in the recovery tank via the first water-repellent filter, and bubbling through the chemical solution and sends out the gas to the second liquid repellent. A water filter, a first valve, a third water repellent filter, and a fourth water repellent filter are exhausted in this order,
The chemical liquid main conduit is configured to supply the chemical liquid in the supply tank to the gas main conduit at an intermediate portion between the third and fourth water repellent filters and to perform heat exchange with the gas, thereby forming a fourth water repellent. A heat recovery and reuse device for waste liquid, wherein the waste gas is separated from the gas by a filter and sent to a chemical solution treatment device through a pump, a filtration filter, and a second valve in this order. 薬液用バイパス管路を有し、
前記薬液用バイパス管路は、前記薬液用主管路内の薬液を、前記ろ過フィルタと前記第二のバルブの中間部から分岐して第三のバルブを介して前記供給槽に送入するものである請求項１記載の廃液の熱回収再利用装置。It has a chemical bypass line,
The bypass for chemical solution is a device for branching a chemical solution in the main pipeline for chemical solution from an intermediate portion between the filtration filter and the second valve and feeding the branched solution to the supply tank via a third valve. The waste liquid heat recovery and reuse apparatus according to claim 1. ガス用バイパス管路を有し、
前記ガス用バイパス管路は、前記第四の撥水性フィルタで分離された前記ガスを分岐して前記第一の撥水性フィルタの手前のガス用主管路へ送入するものである請求項１記載の廃液の熱回収再利用装置。Having a gas bypass line,
2. The gas bypass pipe is for branching the gas separated by the fourth water-repellent filter and feeding the branched gas into a gas main pipe before the first water-repellent filter. 3. Waste liquid heat recovery and reuse equipment. 前記薬液が、りん酸、硫酸、塩酸の少なくとも一つを含む請求項１記載の廃液の熱回収再利用装置。The waste heat recovery and reuse apparatus according to claim 1, wherein the chemical solution contains at least one of phosphoric acid, sulfuric acid, and hydrochloric acid. 前記ガスが、前記薬液に対して難溶性のＨｅ、Ａｒ、Ｎ２ の少なくとも一つを含む請求項１または４記載の廃液の熱回収再利用装置。Said gas, He hardly soluble with respect to the chemical solution, Ar, heat recovery and reuse system of waste according to claim 1 or 4, wherein at least one of N 2. 請求項１記載の廃液の熱回収再利用装置を用いて、使用済みの薬液の熱を回収して使用前の薬液を加温する
ことを特徴とする廃液の熱回収再利用方法。A method for heat recovery and reuse of waste liquid, comprising recovering heat of a used chemical liquid and heating the chemical liquid before use by using the waste liquid heat recovery and reuse apparatus according to claim 1.
JP06024995A 1995-03-20 1995-03-20 Apparatus and method for heat recovery and reuse of waste liquid Expired - Lifetime JP3547832B2 (en)

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