JP3490393B2 - Substrate cleaning device - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate cleaning apparatus for cleaning a semiconductor substrate, a glass substrate or the like, and particularly to remove particles (foreign matter, dirt, etc.) attached to the substrate,
The present invention relates to a substrate cleaning apparatus configured to perform scrubbing cleaning using a rotating brush.

[0002]

2. Description of the Related Art In recent years, in order to remove particles adhering to semiconductor substrates and glass substrates that have undergone a predetermined processing step, a scrubbing cleaning step is performed as a subsequent process in which scrubbing cleaning is performed using a rotating brush. To be done. This scrubbing cleaning step is usually positioned as one processing step in a series of flow operations performed by the substrate cleaning apparatus.

As a scrubbing cleaning means for executing this cleaning step, for example, according to Japanese Patent Laid-Open No. 10-321571, a substrate held by a chucking portion of a substrate holding device is placed in a brush scrubbing tank. A configuration is disclosed in which a pair of roller-shaped rotating brushes that come into contact with both front and back surfaces of a substrate are rotated in opposite directions to scrape particles adhering to the substrate surface downward.

According to the substrate cleaning apparatus of the publication,
Substrates immersed in pure water in the previous step are sequentially transported into the brush scrubbing tank and subjected to scrubbing cleaning treatment, and the substrates subjected to this treatment are sequentially transported to the rinse tank to be subjected to the rinse treatment. There is. Therefore, while the flow work is being performed, the scraping work of particles by the rotating brush is repeatedly performed on the surface of the substrate successively conveyed into the brush scrubbing tank at a predetermined time interval. In this case, as the rotating brush, one having fine fibers such as nylon fibers provided in a brush shape on the outer periphery thereof is used.

[0005]

By the way, when the scraping work of the substrate surface by the rotating brush is frequently performed as described above, particles, brush debris and the like adhere to the rotating brush, and the amount of the scraping is the above scraping amount. It increases according to the number of repeated executions of work. Then, when the amount of these adhered increases beyond a predetermined limit, proper scrubbing cleaning cannot be performed by the rotating brush, resulting in a problem that the yield of products is reduced.

In order to deal with such a problem, conventionally, the rotating brush is periodically replaced with a new one, or the rotating brush is manually removed by removing it from the brush scrubbing tank. Was common. However, in such a method, a rotating brush without any damage cannot be used for a long period of time, or complicated cleaning work is forced, which is disadvantageous in terms of cost and makes maintenance difficult. .

The present invention has been made in view of the above circumstances, and keeps the rotating brush in a clean state at all times so that the scrubbing cleaning of the substrate is not hindered and the product yield is improved. At the same time, it is a technical object to provide a substrate cleaning apparatus capable of prolonging the period of use of the rotating brush and simplifying its maintenance.

[0008]

In order to achieve the above-mentioned technical object, the present invention performs scrubbing cleaning on a substrate held by a substrate holding means using a rotating brush in a brush scrubbing tank. In the substrate cleaning apparatus configured as described above, auxiliary cleaning means for cleaning the rotary brush is provided, and the auxiliary cleaning means cleans the outer peripheral portion of the rotary brush.
With a fluid injection means for injecting and supplying a cleaning fluid,
The rotating brush is supported so as to be reciprocally movable in the axial direction, and
The fluid ejecting means in the axial direction of the rotating brush.
It is characterized in that it is supported so that it can reciprocate .

According to such a configuration, the auxiliary brush is used to wash the rotary brush periodically or every time the number of times of scrubbing cleaning reaches a predetermined number, so that particles and brush residue attached to the rotary brush are removed. Is washed off before the amount exceeds the limit. As a result, the rotating brush can always perform scrubbing cleaning on the substrate in a clean state, and can prevent a reduction in product yield that may occur when cleaning is improper. Further, since the auxiliary cleaning means is provided with the fluid ejecting means for ejecting the cleaning fluid to the outer peripheral portion of the rotating brush, particles and brush residue attached to the rotating brush are
It is washed off by the cleaning fluid ejected from the fluid ejecting means. In this case, examples of the cleaning fluid include high-pressure water, high-pressure cleaning liquid, high-pressure air, and a mixed fluid in which these are arbitrarily combined. Further, the fluid ejecting means is supported so as to be capable of reciprocating in the axial direction of the rotating brush , and the rotating brush is capable of reciprocating in the axial direction.
Since the cleaning fluid is supported, even if the characteristic area of the cleaning fluid sprayed by the fluid spraying means is narrow, the movement of the fluid spraying means causes the cleaning fluid to flow over the entire axial direction of the rotating brush. Can be injected.

[0010]

[0011]

Further, in the fluid ejecting means, it is preferable that the direction in which the cleaning fluid is ejected is offset from the axis of the rotary brush. That is, if the cleaning fluid is sprayed toward the axis of the rotary brush, particles or the like adhering to the outer periphery of the rotary brush may be pushed toward the inner periphery and remain around the shaft. Occurs. On the contrary,
When the cleaning fluid is sprayed toward the position offset from the axis of the rotary brush, it is unlikely that particles or the like will remain around the shaft portion, and the particles or the like are reliably washed off.

Further, it is preferable that the fluid ejecting means includes a pin spot type ejecting portion. Here, the pin spot type means a type in which the jet diameter of the cleaning fluid jetted from the jet portion is maintained in a small diameter state even after jetting. When the cleaning fluid is sprayed from the spraying unit of this type, the flow velocity of the cleaning fluid at the time of reaching the rotating brush is kept high, and therefore particles and the like adhering to the rotating brush are vigorously activated. Washed away.

On the other hand, the auxiliary cleaning means can also be constructed by rotating the rotary brush at a speed higher than the rotational speed at the time of scrubbing cleaning. That is, by rotating the rotating brush at a high speed, particles or the like attached to the rotating brush are separated by centrifugal force. Therefore, the rotating brush rotates at a speed higher than the speed at which particles can be separated by centrifugal force. In this case, the drive source used for cleaning the rotary brush may be the same as the drive source used for scrubbing cleaning, or may be separate.

[0015]

DETAILED DESCRIPTION OF THE INVENTION Embodiments of the present invention will be described below with reference to the drawings.

FIG. 1 is a schematic perspective view showing the overall structure of a substrate cleaning apparatus according to an embodiment of the present invention. As shown in FIG. 1, the substrate cleaning apparatus 1 includes a first storage container 3 for storing a plurality of substrates 2 in order from the upstream side in the process flow direction, and scrubbing cleaning for removing particles adhering to the substrates 2. A brush scrubbing tank 4 as a first tank for executing the process, a rinse cleaning process for removing particles and a cleaning liquid remaining on the substrate 2, and a second cleaning process for drying the substrate after that. A rinse drying tank 5 as a tank and a second storage container 6 for sequentially storing the dried substrates 2 are provided. Examples of the substrate 2 include a semiconductor substrate (including a DVD original plate and a CD original plate), a glass substrate, and the like.

In the first storage container 3, a plurality of sheets (for example, 20 to 30) are arranged in the direction (front-back direction) orthogonal to the process flow direction.
A plurality of substrates 2 are housed in a vertical posture in a stack at predetermined intervals. The first storage container 3 is configured to move in the front-rear direction by the operation of a drive means such as a drive cylinder, and a lid body, such as a slide type shutter, for opening and closing the upper opening is arranged at the upper end portion thereof. It is installed (not shown). The lid is configured to open the upper opening slightly only when the substrate 2 is taken out. Further, inside the first storage container 3, spray nozzles 7 as spraying means for atomizing and spraying a wetting liquid such as pure water are installed at a plurality of locations. To each of these spray nozzles 7, for example, a steam introducing passage for introducing the wetting liquid as vapor is communicated, or a mixture introducing passage for introducing a mixture of the wetting liquid and air is communicated.

Inside the brush scrubbing tank 4, a scrubbing cleaning area 8 for cleaning the substrate 2 is provided, and immediately above the brush scrubbing tank 4, the substrate 2 is evacuated and handed over. The evacuation area 9 is provided. Further, in this area, a cleaning jig 10 as a substrate holding means for holding the substrate 2 between the scrubbing cleaning area 8 and the retreat area 9 and transferring it back and forth is provided.

In the transfer path between the first storage container 3 and the brush scrubbing tank 4, the substrates 2 stored in the first storage container 3 are taken out one by one and conveyed to the retreat area 9. In addition to the substrate transfer robot 11, the reversing robot 12 that rotates the substrate 2 by 180 degrees so that the substrate 2 is turned upside down is provided in the retreat area 9.

Inside the rinse drying tank 5, there is provided a rinse drying area 13 which serves as both a rinse area for rinsing the substrate 2 and a drying area for drying the substrate 2. And brush scrubbing tank 4 and rinse drying tank 5
A second substrate transfer robot 14 that transfers the substrate 2 transferred from the reversing robot 12 to the rinsing / drying area 13 is provided on the transfer path between and.

Substrates 2 which have undergone the final process (drying process) are housed in a second storage container 6 in a vertical posture in the front-rear direction at predetermined intervals in a stacked form. The second storage container 6 is also configured to move in the front-rear direction by the operation of a drive means such as a drive cylinder, and a lid body, such as a slide shutter, for opening and closing the upper opening is arranged at the upper end portion thereof. It is installed (not shown). This lid is configured to open the upper opening slightly only when the substrate 2 is stored. In the transfer path between the rinse drying tank 5 and the second storage container 6, a third substrate transfer robot 15 for storing the substrate 2 transferred in the rinse drying area 13 in the second storage container 6 is provided. It has been deployed.

First, second and third substrate transfer robots 1
Reference numerals 1, 14 and 15 respectively denote sliders 17 slidably supported by upper and lower horizontal rails 16 extending horizontally along the process flow direction, and sliders 17 formed integrally with the sliders 17 and extending vertically. Each extending vertical rail 18, each supporting bracket 19 slidably supported by each vertical rail 18, and each hand unit 20 suspended from each supporting bracket 19 are provided. Each of the substrate transfer robots 11, 14, and 15 is configured to move in the process flow direction and move in the vertical direction by the operation of driving means such as a driving cylinder. In addition, these board transfer robots, first of all,
The third substrate transfer robots 11 and 15 are capable of turning 90 degrees around a vertical axis.

Each of the substrate transfer robots 11 and 14,
As shown in FIG. 2, the hand unit 20 of 15 includes a base frame 22 rotatably connected to a lower side of a support bracket 19 via a vertical shaft 21, and a horizontal direction inside the base frame 22. Two (one or three or more) guide rods 23 arranged in parallel with each other, a pair of hand members 24 supported by the guide rods 23 so as to be movable in the axial direction and extending in the vertical direction, and a pair of the pair. Gripping control means 25 for moving the hand member 24 toward and away from each other.

The gripping control means 25 comprises a drive cylinder 26 such as an air cylinder installed inside the base end frame 22, a cam body 28 fixed to the tip of the retractable rod 27 of the drive cylinder 26, and a pair of pairs. And a coil spring 29 as an elastic body for urging the hand member 24 in the approaching direction. The cam body 28 is formed such that both side surfaces are inclined so that the width becomes narrower as it moves to the tip end, and each base end portion (two guide rods 2) of the pair of hand members 24 is formed.
Between 3), the guide rollers 30 with which the both side surfaces of the cam body 28 abut are attached.

In the pair of hand members 24, a plurality of supporting rollers for holding the substrate 2 (one or more than one hand member 24, two in each hand member 24 in the illustrated example, four in total) are provided. 31 is mounted on each supporting roller 3
A concave groove, such as a V groove, is formed on the outer peripheral surface of the substrate 1 to regulate the axial movement of the substrate 2 when it is held. Then, the push-out rod 27 of the drive cylinder 26 projects to move the pair of hand members 24 back and forth to release the holding of the substrate 2, while the push-out rod 27 moves backward to move the pair of hand members 24 back and forth. The hand member 24 moves close to each other and holds the substrate 2 by the spring force of the coil spring 29.

The reversing robot 12 is constructed so as to reciprocate in the process flow direction within a predetermined size range, and has two hand units 32, which are arranged close to each other in the process flow direction.
33 (see FIG. 1). Of these, the substrate 2 is transferred from the upstream side to the hand unit 32 on the upstream side (hereinafter, simply referred to as the upstream side) in the process flow direction, and the hand unit 32 on the downstream side (hereinafter, simply referred to as the downstream side) in the process flow direction. The substrate 2 is transferred to the hand unit 33 from its downstream side. In addition, the two hand units 32 and 33 are configured to integrally rotate 180 degrees.

More specifically, as shown in FIG. 3, the reversing robot 12 is provided with a base end frame 34 common to the two hand units 32 and 33. The base end frame 34 is horizontal in the front-rear direction. It is rotatably supported by 180 degrees via a shaft (not shown). Regarding the other components, the two hand units 32 and 33 have substantially the same configuration as the hand unit 20 of each of the substrate transfer robots 11, 14 and 15 described above. That is, although not shown in detail, each hand unit 3 of the reversing robot 12
Reference numerals 2 and 33 respectively denote two (one or three or more) guide rods arranged in parallel in the vertical direction inside the base end frame 34, and a phase approaching movement and a phase separating recoil to these guide rods. A pair of hand members 35, 36 that are supported movably and extend in the front-back direction, and a pair of hand members 35,
And a gripping control means for moving the 36 toward and away from each other.

Each grip control means has a base frame 34.
Drive cylinders such as air cylinders installed in the above, a cam body fixed to the push-out rod of each drive cylinder, and a coil spring as an elastic body for urging the pair of hand members 35 and 36 in the approaching direction. I have it. Further, the pair of hand members 35 and 36 are configured to independently move toward and away from each other in association with the movement of each cam body associated with the operation of each drive cylinder. The pair of upstream hand members 35 has a plurality of support rollers (one or two or more per one hand member 35, two in each hand member 35 in total, four in total in the figure) which protrude upstream. 35a is mounted, and a plurality of downstream hand members 36 project downstream (the same as above).
Support roller 36a is mounted. In addition, a concave groove such as a V groove is formed on the outer peripheral surface of each of the support rollers 35a and 36a so as to restrict the axial movement of the substrate 2 when the substrate 2 is held.

As shown in FIG. 1, the cleaning jig 10 includes a hanger portion 37 and a substrate holding portion 38, and the hanger portion 37 is slidably supported by a vertical rail 39 extending in the vertical direction. It is configured to move up and down by the operation of the driving means. Specifically, the cleaning jig 10
As shown in FIG. 4, the substrate holder 38 includes a plurality of (three in the illustrated example) rolls 40, 41, 42 that hold the substrate 2 in a vertical posture and rotate it in the circumferential direction. On the outer peripheral surface of each of the rolls 40, 41, 42, a concave groove such as a V groove that restricts the axial movement of the substrate 2 when it is held is formed, and one of these rolls 4
2 is attached to the swing arm 43. In this case, a plurality (two) of rolls 40 and 41 other than the roll 42 mounted on the swing arm 43 are rotationally driven by, for example, the operation of a drive motor and a belt transmission mechanism.

The swing arm 43 is constructed so as to swing within a predetermined angle range by the operation of a drive means (not shown) such as a drive cylinder, and the swing arm 20 reaches the swing end toward one side. In this case, the rolls 40, 41, and 42 restrict the radial movement and the axial movement of the substrate 2 and the substrate 2 cannot be removed, whereas the swing arm 43.
Is reached to the swing end to the other side, the movement restriction of the substrate 2 is released, and the substrate 2 is removable. Further, the substrate holding portion 38 of the cleaning jig 10 has an L-shape that protrudes forward from the lower end of the hanger portion 37 and hangs downward from the front end of the hanger portion 37. It is an escape portion 45 for avoiding the interference with 44.

Inside the rear surface of the brush scrubbing tank 4, a pair of rotating brushes 44 arranged in parallel in the front-rear direction are supported in a cantilever manner, and the pair of rotating brushes 44 are located in the scrubbing cleaning area 8. . Each rotating brush 44 is
A roller-shaped body whose axial dimension is equal to or larger than the radius of the substrate 2 and smaller than the diameter (2/3 or less of the diameter), and the shaft portion 4
Fine fibers such as nylon fibers are fixed to the outer periphery of 4a. When the substrate holding portion 38 of the cleaning jig 10 reaches the scrubbing cleaning area 8 as shown in the drawing, the tip side portions of the pair of rotary brushes 44 are positioned in the area of the escape portion 45 of the substrate holding portion 38. Then, the substrate 2 is sandwiched, and the rotating brushes 44 and the cleaning jig 10 are in a non-interference state. In addition, the substrate holder 3 of the cleaning jig 10
The rotating brush 44 and the cleaning jig 10 are configured so as not to interfere with each other in the process of entering the scrubbing cleaning area 8 and in the process of retracting from the scrubbing cleaning area 8.

Outside the rear surface of the brush scrubbing tank 4, a pair of drive motors 46 are provided as driving means for rotating and driving the rotary brushes 44. Each rotating brush 44
Are arranged so as to come into contact with portions from the outer periphery to the center on both front and back surfaces of the substrate 2, and both rotary brushes 44 are urged toward each other during scrubbing cleaning. The rotary brushes 44 are configured to reciprocate in the axial direction within a predetermined size range and at a predetermined cycle by the operation of a drive means such as a drive cylinder, and to move toward and away from each other. It is configured. A pair of injection pipes 47 extending in the front-rear direction are arranged inside the upper end of the brush scrubbing tank 4, and the cleaning liquid is sprayed from the spray nozzles 48 of the spray pipes 47 to the rotary brushes 44 and their surroundings. It has become.

Further, the brush scrubbing tank 4 is provided with auxiliary cleaning means 49 for removing particles, brush residue and the like adhering to the rotary brush 44. As a first example, the auxiliary cleaning means 49 is, as shown in FIG. 5A, a fluid ejecting means extending in the outer peripheral space (upper space in the illustrated example) of the pair of rotating brushes 44 in the same direction as them. A pair of cleaning pipes 50 are provided, and a plurality of cleaning nozzles 5 as an injection unit are provided in the pair of cleaning pipes 50.
1 (or fluid ejection ports) are arranged at a predetermined pitch along the longitudinal direction. Each cleaning nozzle 51 is a so-called pin spot type in which the fluid diameter is kept small even after the fluid is ejected.

In this case, the jet port of each cleaning nozzle 51, that is, the jetting direction of the fluid, is offset in a direction symmetrical to the axial center of each rotary brush 44, as shown in FIG. 5B. There is. More specifically, the ejection direction is offset to a position where it does not interfere with the shaft portion 44a of the rotating brush 44. Further, the rotating direction of each rotating brush 44 is, as shown by an arrow a, a direction in which an upward pressing force is applied to the substrate 2, and therefore, a direction in which the fluid is ejected from each cleaning nozzle 51. The directionality is set so as to be substantially the same as the moving direction of the injection portion of the rotary brush 44.

The base ends of the pair of cleaning pipes 50 are connected by a connecting pipe 53 (see FIG. 5A), and a high pressure water, a high pressure cleaning liquid, or a high pressure air is supplied through a feed pipe 54 leading to the connecting pipe 53. Alternatively, a cleaning fluid composed of a mixed fluid or the like in which these are arbitrarily selected and combined is pressure-fed to the cleaning pipe 50. The pair of cleaning pipes 50 is a side surface portion (rear surface portion) of the brush scrubbing tank 4.
Is movably supported in the front-back direction, and is reciprocated within a predetermined size range (for example, a size range corresponding to the arrangement pitch of the cleaning nozzles 51) along the axial direction of the rotating brush 44 by the operation of the drive cylinder 55 as the drive means. It is configured to move.

The auxiliary cleaning means 49 directs the cleaning fluid from the cleaning nozzles 51 to the rotating brush 44 which rotates from the cleaning nozzles 51 periodically or whenever the number of substrates 2 subjected to the scrubbing cleaning reaches a predetermined number. To spray. The cleaning pipe 50 reciprocates in the axial direction while the injection is being performed. As a result, particles, brush residue, and the like attached to the rotary brush 44 during scrubbing cleaning are washed off.

In this case, since the direction of spraying the cleaning fluid from the cleaning nozzle 51 is offset with respect to the axis of the rotating brush 44, the particles or the like pressed by the cleaning fluid are not supported by the shaft of the rotating brush 44. Particles and the like are reliably washed off without remaining around the portion 44a. Also,
Since the cleaning pipe 50 reciprocates in the axial direction, the cleaning fluid is sprayed over the entire area of the rotary brush 44 in the axial direction, although the spraying area from each cleaning nozzle 51 is narrow. If the reciprocating range of the cleaning pipe 50 has a size corresponding to the arrangement pitch of the cleaning nozzles 56, the cleaning fluid is efficiently and uniformly ejected.

On the other hand, the auxiliary cleaning means 49, as a second example, as shown in FIGS. 6 (a) and 6 (b), is a space on the outer peripheral side of the pair of rotating brushes 44 rotating in the direction of the arrow (upper side in the illustrated example). In the space), one or two or more pairs of cleaning nozzle units 56 (pin spot type) as fluid ejecting means are arranged. Each cleaning nozzle unit 56 is movably supported over the entire axial length of the rotary brush 44, and each cleaning nozzle unit 56 is moved by the operation of driving means such as a drive cylinder (not shown).
Also in this case, high-pressure water from each cleaning nozzle unit 56,
A high-pressure cleaning liquid, or high-pressure air, or a cleaning fluid composed of a mixed fluid, etc., in which these are arbitrarily selected and combined,
Injecting toward the outer peripheral portion of each rotating brush 44. The directions of the cleaning fluid ejected from the cleaning nozzle units 56 are offset symmetrically with respect to the axes of the rotating brushes 44. In addition, the direction in which the cleaning fluid is ejected from the cleaning nozzle 56 and the rotating brush 4
It is set so that the movement direction of the injection portion of 4 is substantially the same direction.

Further, as a third example, the auxiliary cleaning means 49 is configured to rotate the rotary brush 44 at a higher speed than that at the time of scrubbing cleaning so as to separate particles and the like adhering to the rotary brush 44 by centrifugal force. To do. In this case, the rotating brush 44 rotates at a high speed at which particles or the like can be separated by centrifugal force. Specifically, it is preferable that the rotation speed of the rotary brush 44 during the centrifugal separation is 5 to 1000 times the rotation speed during the scrubbing cleaning. If it is 5 times or less, a sufficient centrifugal force cannot remove the particles and the like.
If it is 0 times or more, a problem will occur in the performance of the drive motor 46. More preferably, the rotating brush 4 during the centrifugal separation
The rotation speed of 4 is 10 to 500 times the rotation speed during scrubbing cleaning. If it is 10 times or less, there is a problem in obtaining the action of removing particles and the like by a more appropriate centrifugal force, and if it is 500 times or more, it becomes difficult to downsize the drive motor 46. Occurs. The drive motor used for cleaning the rotary brush 44 may be the same as the drive motor 46 used for scrubbing cleaning, or may be separate.

The above first and second examples are also as follows.
Similarly to the third example, it is preferable that the rotational speed of the rotary brush 44 during the auxiliary cleaning be higher than the rotational speed during the scrubbing cleaning.

FIG. 7 shows a substrate spinning device 57 arranged at a position corresponding to the rinse drying tank 5. The substrate spin device 57 includes a spin unit 58 as a spin unit for holding and rotating the substrate 2 in a vertical posture, and the spin unit 58 is arranged in the rinse drying area 13 in the rinse drying tank 5. There is. More specifically, the substrate spin device 57 includes a chuck mechanism 59 for holding the substrate 2 in a vertical posture.
A rotation drive mechanism 60 for rotating the substrate 2 gripped by the chuck mechanism 59, a release mechanism 61 for releasing the grip of the substrate 2 by the chuck mechanism 59, and the chuck mechanism 5.
The tilt mechanism 62 for tilting the substrate 2 gripped by 9 from the vertical posture. In this case, a mounting member 81 is arranged on the base 112 outside the rinse drying tank 5 on the downstream side, and a rotary base 83 is rotatably supported by the mounting member 81 via a bearing 82. This rotating base 83
A chuck mechanism 59 is connected to the upstream side of the so as to be integrally rotatable.

As shown in FIGS. 8 and 9, a plurality of chuck mechanisms 59 are arranged (at least three or more, six in the illustrated example) arranged at predetermined intervals in the circumferential direction on the outer peripheral side of the annular rotating body 63. Gripping members 64 and these gripping members 64
And a link mechanism 65 as a linear movement mechanism for linearly moving the substrate 2 in the radial direction of the substrate 2. In this case, the spin unit 58 is composed of a plurality of gripping members 64 that grip the substrate 2 in a vertical posture and rotate it in the circumferential direction. Each of the gripping members 64 extends from the outer periphery of the annular rotating body 63 to the upstream side along the process flow direction, and the tip end portion is bent toward the outer peripheral side at an obtuse angle, and is bent at the tip end of the inclined portion 66. A recess 67 with which the outer peripheral end surface of the substrate 2 abuts
Are formed. The link mechanism 65 has a linear motion link 68 extending in the radial direction, and a swing link 69 connected to the linear motion link 68 and arranged along the process flow direction. More specifically, in the linear motion link 68, the base end portion of the grip member 64 is fixed to the outer peripheral side end portion of the linear rotary link 63.
It is supported by a bearing 70 so as to be slidable in the radial direction. The swinging link 69 has the upstream end portion of the linear motion link 6
8 is rotatably connected to an end portion on the inner peripheral side, and an intermediate portion in the longitudinal direction thereof is swingably supported by a support connecting member 71 that connects and fixes the annular rotating body 63 and the rotating base body 83 via a support pin 72. Has been done.

In this case, the direct drive link 68 and the swing link 6
As shown in FIG. 10, the connecting portion with 9 is a linear motion link 68.
A long hole 74 that is long in the process flow direction is formed in the connecting bracket 73 fixed to the inner peripheral side end portion, and the connecting pin 75 fixed to the upstream end portion of the swing link 69 is inserted into the long hole 74. Is configured. A coil spring 76, which serves as an elastic member, biases the linear motion link 68 toward the inner peripheral side between the connecting bracket 73 and the bearing 70 so as to apply a gripping force toward the center of the substrate 2 to the gripping member 64. Is installed. Further, the swinging link 69 has a support pin 7
A weight 77 having a predetermined weight is fixed to a portion downstream of 2, and a centrifugal force acts on the weight 77 in the direction in which the gripping force of the substrate 2 by the gripping member 64 increases when the chuck mechanism 59 rotates. It is configured. In addition, between a connecting body 78 that connects and fixes the grip member 64 and the linear motion link 68, and a member 79 that covers the outer peripheral side of the bearing 70,
More specifically, the outer peripheral side of the linear motion link 68 is covered and directly connected between the connecting body 78 and the projecting body 79 projecting on the outer peripheral side of the annular rotary body 63 so as to correspond to each gripping member 64. A bellows-like member (bellows) 80 that expands and contracts as the moving link 68 moves in the radial direction is provided.

The rotary drive mechanism 60, as shown in FIG.
The rotary torque from the drive motor 84 is transmitted to the rotary substrate 81 and then to the chuck mechanism 59. Specifically, the rotary base 83, the timing pulley,
An auxiliary mounting member 88, which is fixed to a driven wheel 86 such as a V-pulley, a sprocket (hereinafter referred to as a wheel), and is fixed to a downstream side of the mounting member 81 with a predetermined gap.
A drive motor 84 is installed on the drive motor 84, and an endless transmission belt 87 composed of a timing belt, a V-belt, a chain, and the like is provided between a drive-side wheel 85 fixed to the output shaft of the drive motor 84 and a driven-side wheel 86. It is constructed by wrapping.
The rotary drive mechanism 60 can also have a gear train or the like that transmits the rotary torque of the output shaft of the drive motor 84 to the rotary base body 83 as a constituent element.

As shown in FIG. 11, the releasing mechanism 61 includes a drive cylinder 89 such as an air cylinder fixed to the auxiliary mounting member 88, and a pressing member 91 fixed to the tip of the rod 90 of the drive cylinder 89. A plurality of moving rods 92, which the pressing member 91 can contact and separate from, and are supported by the rotary base body 83 so as to be movable in the process flow direction, and a downstream end of the rotary rod 83 which is arranged along the process flow direction. A guide shaft 93 having a fixed portion and a slide member 94 movably supported along the guide shaft 93 are provided.

As shown in FIG. 10, the slide member 94 includes two slide annular bodies 95 which are fitted onto the guide shaft 93 so as to be movable in the axial direction and arranged in series, and the outer peripheral side of the slide annular body 95. And two covering annular bodies 96 that are fixed by covering and are arranged in series. A coil spring 98 as an elastic body is provided between the flange portion 97 formed at the upstream end of the guide shaft 93 and the slide member 94. The coil spring 98 causes the slide member 94 to move toward the downstream side. Being energized.

Each of the two covering annular bodies 96 is formed with an annular convex portion 99 projecting to the outer peripheral side, and both annular convex portions 99 are provided at circumferential positions corresponding to the link mechanisms 65, respectively. A pair of locking projections 1 facing each other with a predetermined gap interposed
00 is fixed. Then, a projecting piece 101 formed so as to project to the inner peripheral side at the longitudinal intermediate portion of the swinging link 69 is inserted between both locking convex portions 100.
In this case, the projecting piece 101 extends in the radial direction around the support pin 72.

Therefore, when the push-out rod 90 of the drive cylinder 89 is projected, the pressing member 91 moves the moving rod 92 to the upstream side, and the slide member 94 resists the spring force of the coil spring 98 accordingly. Then, by moving to the upstream side, the locking convex portion 100 on the downstream side presses and swings the projecting piece 101 to swing the swinging link 69 around the support pin 72. Thereby, the linear motion link 68 of each link mechanism 65 moves to the outer peripheral side against the spring force of the coil spring 76, and each gripping member 64 moves linearly to the outer peripheral side as shown by the chain line in FIG. 7. . As a result, the holding of the substrate 2 by the holding members 64 is released.

When each gripping member 64 and each link mechanism 65 is rotated by the operation of the rotary drive mechanism 60, the centrifugal force acting on the gripping member 64 and the centrifugal force acting on the weight 77 are set to be balanced with each other. ing. That is, the force by which the gripping member 64 attempts to link the link mechanism 65 to one side during rotation and the force by which the weight 77 attempts to link the link mechanism 65 to the other side are set to be substantially the same. Has been done. Therefore, the gripping force acting on the substrate 2 from each gripping member 64 during rotation is substantially equal to the sum of the spring forces of the coil spring 98 on the guide shaft 93 side and the coil springs 76 on the linear motion link 68 side.

When each gripping member 64 holds the substrate 2, each coil spring 7 on each linear motion link 68 side is held.
6 may be set to have a natural length, and in this case, the gripping force becomes substantially equal to the spring force of the coil spring 98 on the guide shaft 93 side. Further, in the same state, the coil spring 98 on the side of the guide shaft 93 may be set to have a natural length. In this case, the above-mentioned gripping force is applied to each linear motion link 6
It becomes approximately equal to the sum of the spring forces of the coil springs 76 on the eight side. Further, similarly to this, in order to obtain the gripping force by only one of the coil springs, one of the coil springs on the side of each linear motion link 68 or the guide shaft 93 may be eliminated.

As shown in FIG. 7, the inner surface of the rinse drying tank 5 serves as a rinse liquid spraying means for spraying a rinse liquid such as pure water onto both front and back surfaces of the substrate 2 held by the grip member 64. A plurality of injection nozzles 102 are attached. In this case, with respect to the back surface (the surface on the downstream side) of the substrate 2, the gap 103 between the grip members 64 (see FIG. 8).
The position is set so that the rinse liquid is jetted and supplied from the jet nozzle 102 through the. A cover disk 104 is mounted on the surface (upstream surface) of the annular rotating body 63 so as to cover the inner peripheral opening.

The tilt mechanism 62 supports the mounting member 81 so as to be tiltable via the support shaft 106 in the front-rear direction above the lower support member 105 as a base-side member fixedly installed on the base 112. It is configured. Then, the mounting member 81 is configured to tilt in the process flow direction by the operation of the driving means 107 which is a driving cylinder such as an air cylinder. More specifically, as shown in FIG.
The lower support members 105 are respectively arranged on the front and rear sides of the mounting member 81, and the support shafts 106 rotatably supported by the lower support members 105 respectively support the mounting members 8.
It is connected to both the front and rear sides of the lower end of 1. In this case, each of the support shafts 106 serving as the tilt center is arranged at a position lower than the lowest part of the rotation trajectory of the grip member 64. It should be noted that each of the support shafts 106 may be arranged at a height position between the lowest part and the highest part of the rotation trajectory of the grip member 64, or a position higher than the highest part of the rotation trajectory of the grip member 64. It may be arranged at.

The tip end of the rod 108 of the drive cylinder 107 is fixed to the back surface of the mounting member 81.
9, which is rotatably connected to the cylinder member 1
10 The rear end is a bracket 111 fixed to the base 112.
Is rotatably connected to (see FIG. 7). The axis of the drive cylinder 107 is inclined at a predetermined angle (for example, about 45 degrees) in a vertical plane along the process flow direction. Then, when the retractable rod 108 of the drive cylinder 107 moves backward by a predetermined dimension from the state shown in FIG. 7, the surface of the mounting member 81 is directed obliquely upward and is held by each gripping member 64 accordingly. The surface of the substrate 2 is also directed obliquely upward by the same angle. On the contrary, when the retractable rod 108 is projected, the surface of the mounting member 81 and the surface of the substrate 2 are directed obliquely downward by the same angle. It should be noted that one side surface portion (downstream side surface portion) of the rinse drying tank 5 is provided with an opening 5a through which a connecting portion (smaller diameter than the arrangement diameter of the gripping members 64) between the rotary base body 83 and the chuck mechanism 59 is inserted. Has been formed. The size and position of the opening 5a are set so that interference does not occur with the connecting portion even if the respective components mounted on the mounting member 81 incline as described above. .

The substrate cleaning apparatus having the above structure performs each processing on the substrate 2 according to the following procedure.

When the first substrate transfer robot 11 shown in FIG. 1 takes out the substrate 2 from the first storage container 3 arranged at the end portion on the upstream side, its hand unit 20 moves from the state shown in the drawing to 90. The substrate 2 arranged in the front end row is held by the support rollers 31 of the pair of hand members 24 and then moved up after the substrate 2 is rotated downward in the direction b. The first storage container 3 is the first substrate transfer robot 11
Thus, by the operation of the driving means, the substrate 2 is moved forward by a size corresponding to the storage space for one substrate until the next substrate 2 is taken out. Therefore, the first substrate transfer robot 11 can accurately take out the substrate 2 from the first storage container 3 even if it does not have the function of moving in the front-back direction.

In order to hold the substrate 2, the projecting and retracting rod 27 of the drive cylinder 26 shown in FIG. 2 is caused to project and the cam body 28 is pushed down, so that the spring force of the coil spring 29 is resisted between the pair of hand members 24. The width of each support roller 31 of both hand members 24 is positioned in the outer peripheral side space of the substrate 2 in this state. After that, the retracting rod 27 of the drive cylinder 26 is moved backward to pull up the cam body 28, and the width between the pair of hand members 24 is narrowed by the spring force of the coil spring 29. As a result, the substrate 2 is held by the support rollers 31.

In this case, the hand member 24 of the first substrate transfer robot 11 moves downward and upward to move the first storage container 3
When passing through the upper opening of the storage container 3, the lid provided in the upper opening of the storage container 3 moves the upper opening by a slight width within a range in which the hand member 24 can pass. The upper opening is closed by the lid after opening and passing the hand member 24.

On the other hand, since the inside of the first storage container 3 is filled with the atomized liquid sprayed from the spray nozzle 7 (the atomized liquid is atomized), it is stored therein. Both front and back surfaces of the plurality of substrates 2 are in a wet state. Therefore, the dirt adhering to the substrate 2 is not dried and is maintained in a wet state as in the case of being immersed in the liquid, which makes it difficult to remove the dirt in the scrubbing cleaning step in the subsequent step. Avoided.

Then, after the first substrate transfer robot 11 moves up to a predetermined height position while holding the substrate 2, the hand unit 20 is turned 90 degrees in the direction a in FIG. In this state, the first substrate transfer robot 11 is moved from this state to a position downstream of the reversing robot 12, and the first substrate transfer robot 11 is moved downward.
The hand unit 20 and the hand unit 33 on the downstream side of the reversing robot 12 face each other. Thereafter, the pair of hand members 36 on the downstream side of the reversing robot 12 are moved by the same operation as described above, so that the substrate 2 held by the first substrate transfer robot 11 is moved to the downstream side of the reversing robot 12. It is also held by the hand unit 33. From such a state, by expanding the width between the pair of hand members 24 of the first substrate transfer robot 11, the substrate from the first substrate transfer robot 11 to the hand unit 33 on the downstream side of the reversing robot 12 is expanded. The delivery of 2 is completed. In this case, the hand member 24 of the first substrate transfer robot 11 extends in the vertical direction, whereas the hand member 36 of the reversing robot 12 extends in the front-back direction. There is no interference when handing over.

Simultaneously with such an operation or with a slight time lag, the upstream hand member 35 of the reversing robot 12 and the substrate holding portion 38 of the cleaning jig 10 face each other, and the cleaning jig 10 holds the cleaning material. The processed substrate 2 is delivered to the upstream hand member 35 of the reversing robot 12.
In this case, the substrate 2 is delivered in the same manner as described above for the reversing robot 12 side, and for the cleaning jig 10 side, the swing arm 43 is swung in a predetermined direction to release the roll 42 from the substrate holding position. It is done by moving to a position.

After that, when the first substrate transfer robot 11 retreats and moves to the first storage container 3 side again, the reversing robot 12 rotates 180 degrees to hold the substrate 2 before the cleaning process. The hand member 36 that moves to the upstream side and holds the substrate 2 after the cleaning process.
5 shifts to the downstream side. Under such a state, the substrate 2 before the cleaning process held by the reversing robot 12 is transferred to the cleaning jig 10, and the substrate 2 after the cleaning process is transferred to the second substrate transfer robot 14. .

After the pre-cleaning substrate 2 is transferred from the reversing robot 12 to the cleaning jig 10, the cleaning jig 10 moves downward and the substrate 2 reaches the scrubbing cleaning area 8 in the brush scrubbing tank 4. At this point, as shown in FIG. 4, the pair of rotating brushes 44 come into contact with the region from the outer periphery to the center of the substrate 2, and scrubbing cleaning is performed under such a state. That is, the rotational torque is applied to the two rolls 40 and 41 by the operation of the drive motor and the belt transmission mechanism (not shown), and the substrate 2 rotates in the circumferential direction in the vertical posture, and each rotary brush 44 drives the drive motor. The operation of 46 rotates in opposite directions, and the cleaning operation is performed on the substrate 2 under the supply of the cleaning liquid from the injection nozzle 48 of the injection pipe 47.

In this case, although the axial dimension of the rotary brush 44 is smaller than the diameter of the substrate 2, the scrubbing cleaning by the rotary brush 44 is performed because the substrate 2 rotates in the circumferential direction.
It is evenly applied over the entire surface of the substrate 2. Moreover, substrate 2
Rotates with the edge portion (outer peripheral end surface portion) exposed, so that the edge portion is appropriately subjected to scrubbing cleaning by the rotating brush 44. After such a cleaning operation is performed for a predetermined time, the cleaning jig 10 moves up to transfer the substrate 2 to the retreat area 9, and in the retreat area 9, the reversing robot 12 moves from the cleaning jig 10 to the retreat area 9. The substrate 2 after the cleaning process is delivered to the substrate, and the substrate 2 is transferred from the reversing robot 12 to the second substrate transfer robot 1 as described above.
Handed over to 4.

After that, the second substrate transfer robot 14
After moving to the downstream side by a predetermined distance, it moves downward, and the spin portion 58 of the substrate spin device 57 in the rinse drying tank 5 is moved.
The substrate 2 is transferred to the (holding member 64). At the time of this delivery, the retracting rod 90 of the drive cylinder 89 of the releasing mechanism 61 shown in FIG. 7 is projected and the gripping member 64 of the chuck mechanism 59 is linearly moved to the outer peripheral movement end position shown by the chain line in the figure. While moving, the push-out rod 108 of the drive cylinder 107 of the tilt mechanism 62 moves backward to move the attachment member 81.
The components installed in the unit are tilted integrally by a predetermined angle, and the surface side of the chuck mechanism 59 is directed obliquely upward. Therefore, the plurality of gripping members 64 are in a state in which the gripping members 64 located below project more toward the front side than the gripping members 64 located above.

In this state, the second substrate transfer robot 14 holding the substrate 2 is moved downward, so that the gripping member 64 of the chuck mechanism 59 and the substrate 2 do not interfere with each other. 2 is handed over. That is, when the second substrate transfer robot 14 moves vertically downward, if the chuck mechanism 59 is supported in the vertical posture, the gripping member 64 located above the chuck mechanism 59.
The substrate 2 comes into contact with and the downward movement is prevented.
However, if the chuck mechanism 59 is inclined as described above, the substrate 2 can be moved down to the vicinity of the gripping member 64 located below without interfering with the gripping member 64 located above. In this case, the pair of hand members 24
Passes through the gap 103 between the gripping members 64.

Then, when the substrate 2 reaches the lower end,
Leaving rod 10 of drive cylinder 107 of tilt mechanism 62
8 is moved in a protruding manner to return each constituent element mounted on the mounting member 81 to the vertical posture. After this return, the rod 90 of the drive cylinder 89 of the release mechanism 61 is retracted.
Of the slide member 94 is moved to the downstream side by the spring force of the coil spring 98 on the side of the guide shaft 93, and the link mechanisms 65 are linked to move the direct-acting link 68 to the inner peripheral side. Moving. As a result, each gripping member 64 linearly moves to the inner peripheral side, and the substrate 2 is gripped by each gripping member 64 by the spring force of the coil spring 98 on the guide shaft 93 side and / or the coil spring 76 on the linear motion link 68 side.
Held in. In this case, the gripping force of each gripping member 64 is
Since it acts toward the center (center of gravity) of the substrate 2, no shearing force or bending stress acts on the substrate 2,
Occurrence of chipping or cracking of the substrate 2 is avoided. Further, since each of the gripping members 64 moves linearly, even if the gripping member 64 is short, the gripping member 64 can be sufficiently expanded by moving to the outer peripheral side, and the gripping work of the substrate 2 (same for the releasing work. 2) can be performed smoothly, and the holding member 64 can be shortened, and the substrate spin device 57 can be downsized.

Thereafter, the width between the pair of hand members 24 of the second substrate transfer robot 14 is expanded to release the holding of the substrate 2 by the second substrate transfer robot 14, and the substrate 2 is chucked. The holding member 59 is held only by 59. From this state, the drive cylinder 107 of the tilt mechanism 62 is operated to operate the substrate 2
Surface is directed diagonally downward (in this state, the gripping member 64 existing below is also slightly moved to the upstream side at the same time as the inclination), or the chuck mechanism 59 is supported in a vertical posture. The substrate transfer robot 14 of FIG.
The (support roller 31) and the substrate 2 are separated from each other in the process flow direction. As a result, the second substrate transfer robot 14 moves up and retracts from the rinse drying area 13 without the hand member 24 and the substrate 2 interfering with each other, and the reversing robot 12 again.
Inversion robot 12 to transfer substrate 2 to and from
Move to the side.

Then, under the condition that the chuck mechanism 59 is supported in the vertical posture, the drive motor 84 of the rotary drive mechanism 60 rotates, so that the chuck mechanism 59 and the substrate 2 held by the chuck mechanism 59 are in the vertical posture. While rotating in the circumferential direction, the rinse liquid is jetted and supplied from the plurality of jet nozzles 102 to both front and back surfaces of the substrate 2. By performing such an operation for a predetermined time, the cleaning liquid or the like adhering to the substrate 2 is washed off, and the rinse cleaning process is completed.

After that, the supply of the rinse liquid from the spray nozzle 102 is stopped, and the drive motor 84 is rotated at a higher speed than in the rinse cleaning process, so that the rinse liquid adhering to the substrate 2 is removed. Centrifuge. During the drying process by such an operation, the rinse liquid scattered by centrifugal separation or the like, and the rinse liquid adhering to the upper surface of the rinse drying tank 5 drops along with this, but in this case, the substrate 2
When the surface of the substrate is a surface more important than the back surface, such as a pattern forming surface, it is necessary to protect the surface of the substrate 2 from dropping the rinse liquid. Therefore, in such a case, the drive cylinder 107 of the tilt mechanism 62 is operated before the drying process is performed so that the surface of the substrate 2 is directed obliquely downward. Thus, the drive motor 84 is rotated at high speed. As a result, the rinse liquid or the like scatters in an oblique direction and does not scatter vertically upward, so that the scattered rinse liquid or the like does not drip toward the substrate 2 or even if it drips toward the substrate 2, The droplets will be dropped on the back surface of the substrate 2, and the surface of the substrate 2 will be subjected to a drying treatment in an extremely clean state. In the latter case, since the dropped rinse liquid or the like is subjected to the centrifugal separation action again on the back surface of the substrate 2, an appropriate drying process is performed, and in any case, the rinse liquid or the like is not dropped. If the centrifugal action is carried out until it does not occur, the drying process will not be hindered.

Then, when the rinsing liquid is not dropped (at this time, the surface of the substrate 2 is directed obliquely downward), the third substrate transfer robot 15 is moved to the lower end. Immediately after this, the drive cylinder 107 of the tilt mechanism 62 is operated to bring the substrate 2 into a vertical posture, so that the substrate 2 and the hand member 24 of the third substrate transfer robot 15 face each other. As another example for performing such a face-to-face operation, the third substrate transfer robot 15 is moved to the lower end while the substrate 2 held by the chuck mechanism 59 is in a vertical posture. Immediately after that, the third substrate transfer robot 15 may be slightly moved upstream. Then, under such a state, after the substrate 2 is held by the third substrate transfer robot 15, the drive cylinder 89 of the release mechanism 61 is operated to release the holding of the substrate 2 by the holding members 64. After that, the drive cylinder 107 of the tilt mechanism 62 is operated so that the front surface side of the chuck mechanism 59 is directed obliquely upward. Under this condition, the third substrate transfer robot 15 is moved upward to move upward. The substrate 2 is transferred vertically upward by the third substrate transfer robot 15 without causing interference between the existing holding member 64 and the substrate 2.

In this way, the third substrate transfer robot 15
When the substrate 2 is received from the substrate spin device 57 (the second substrate transfer robot 14 causes the substrate spin device 57 to transfer the substrate 2).
The same applies when handing over the substrate) to the substrate transfer robot 15 (1
In the case of 4), an appropriate operation can be performed by simply moving the rinse drying tank 5 up and down, and even if it is moved in the process flow direction, a small amount of movement is required. Therefore, it is possible to avoid an increase in the capacity of the rinse drying tank 5 and an increase in the size of the substrate cleaning apparatus 1.

After the third substrate transfer robot 15 moves up to a predetermined height position, it moves a predetermined distance downstream and reaches a position above the second storage container 6 when the hand unit 20 is reached. Turns 90 degrees in the direction d from the state shown in the figure and moves downward to store the substrates 2 in the front end row in the second storage container 6. The second storage container 6 is moved backward by a size corresponding to a storage space for one substrate 2 by the operation of the driving means until the next substrate 2 is stored by the third substrate transfer robot 15. Move to.

Therefore, the third substrate transfer robot 15
Can accurately store the substrate 2 in the second storage container 6 without having the function of moving in the front-back direction. The second substrate transfer robot 14 also
Even without the function of moving in the front-back direction, the substrate 2 can be accurately transferred between the reversing robot 12 and the substrate spinning device 57.

In this case, the first and second substrate transfer robots 14 are dedicated to the transfer of the wet substrate 2, and the third substrate transfer robot 15 is dedicated to the transfer of the dried substrate 2. Therefore, each component of the third substrate transfer robot 15 does not get wet, and as a result, high quality substrate 2 in which wetness and moisture do not become a problem in the second storage container 6 is obtained.
Can be stored.

Moreover, since the rinse cleaning process and the drying process for the substrate 2 are performed in the single rinse drying tank 5,
Compared with the conventional case where a rinse tank and a drying tank are separately provided, the number of constituent elements to be arranged in the process flow direction is reduced, and the substrate cleaning apparatus can be further downsized.

In the above embodiment, the attachment member 81 side of the substrate spinning device 57 is located on the downstream side, and the spin unit 5 is provided.
Although the 8 side is positioned on the upstream side, conversely, the mounting member 81 side may be positioned on the upstream side and the spin portion 58 side may be positioned on the downstream side.

[0077]

As described above, according to the present invention, in addition to the scrubbing cleaning means for scrubbing the substrate using the rotating brush, the auxiliary cleaning means for cleaning the rotating brush is provided. Adhering particles, brush debris, etc. are washed off by the auxiliary cleaning means before exceeding the limit adhesion amount. Therefore, the scrubbing cleaning of the substrate is performed by the rotating brush which is always clean, the reduction of the product yield is prevented, the period of use of the rotating brush is extended, and the maintenance is simplified.

If the auxiliary cleaning means is provided with a fluid ejecting means for ejecting a cleaning fluid to the outer peripheral portion of the rotary brush, particles, brush residue, etc. adhering to the rotary brush are ejected from the fluid ejecting means. Since the cleaning fluid is washed off, the rotating brush can be properly cleaned.

If the fluid ejecting means is supported so as to be reciprocally movable in the axial direction of the rotary brush, the entire area in the axial direction of the rotary brush can be achieved without using a large ejecting area as the fluid ejecting means. The cleaning fluid can be jetted over the entire length, and the rotary brush can be efficiently washed while the fluid jetting device is made compact.

When the jetting direction of the cleaning fluid in the fluid jetting means is offset with respect to the axis of the rotary brush, particles and the like adhering to the outer peripheral portion of the rotary brush are pushed toward the inner peripheral side. It is less likely that the particles will be left around the shaft portion, and the particles and the like will be washed off with certainty.

If the fluid ejecting means is provided with a pin spot type ejecting section, the flow velocity of the cleaning fluid at the time of reaching the rotating brush is maintained high, and the particles and the like adhering to the rotating brush are accelerated. The particles will be scattered to the outside well, and the particles and the like can be washed off more reliably.

If the auxiliary cleaning means is constituted so that the rotary brush is rotated at a speed higher than the rotation speed at the time of scrubbing cleaning, it becomes possible to separate the particles and the like adhering to the rotary brush by centrifugal force. With a simple structure, sufficient washing action of particles and the like is performed.

[Brief description of drawings]

FIG. 1 is a perspective view showing a schematic overall configuration of a substrate cleaning apparatus according to an embodiment of the present invention.

FIG. 2 is a vertical cross-sectional side view of a substrate transfer robot equipped in a substrate cleaning apparatus according to an embodiment of the present invention.

FIG. 3 is a schematic perspective view showing an inversion robot equipped in the substrate cleaning apparatus according to the embodiment of the present invention.

FIG. 4 is a perspective view showing an internal structure of a brush scrubbing tank equipped in the substrate cleaning apparatus according to the embodiment of the present invention.

FIG. 5 is a perspective view of an essential part showing an example of an auxiliary cleaning device provided in the substrate cleaning device according to the embodiment of the present invention (FIG. 5).
(A)), It is a principal part front view (FIG.5 (b)).

FIG. 6 is a perspective view of a main part showing another example of the auxiliary cleaning device provided in the substrate cleaning device according to the embodiment of the invention (FIG. 6).
(A)), The principal part front view (FIG.6 (b)).

FIG. 7 is a vertical cross-sectional front view showing a rinse drying tank and a spin device provided in the substrate cleaning apparatus according to the embodiment of the present invention.

FIG. 8 is a side view of a single spin device provided in the substrate cleaning apparatus according to the embodiment of the present invention.

FIG. 9 is an enlarged vertical sectional front view showing a main part of a spin device equipped in the substrate cleaning apparatus according to the embodiment of the present invention.

FIG. 10 is an enlarged vertical sectional front view showing a main part of a spin device equipped in the substrate cleaning apparatus according to the embodiment of the present invention.

FIG. 11 is an enlarged vertical sectional front view showing a main part of a spin device equipped in the substrate cleaning apparatus according to the embodiment of the present invention.

[Explanation of symbols]

1 Substrate cleaning equipment 2 substrates 4 brush scrubbing tank 10 Cleaning jig (substrate holding means) 44 rotating brush 50 Washing pipe (fluid injection means) 51 Washing nozzle (spray part) 56 Cleaning nozzle unit (fluid ejecting means)

─────────────────────────────────────────────────── ─── Continuation of front page (58) Fields surveyed (Int.Cl. ⁷ , DB name) B08B 1/04 B08B 3/02 B08B 7/04 H01L 21/304 644

Claims (4)

(57) [Claims] 1. An auxiliary cleaning means for cleaning a rotating brush in a substrate scrubbing apparatus configured to perform scrubbing cleaning using a rotating brush on a substrate held by a substrate holding means in a brush scrubbing tank. The auxiliary cleaning means includes a fluid ejecting means for ejecting and supplying a cleaning fluid to the outer peripheral portion of the rotating brush, supports the rotating brush so as to be reciprocally movable in the axial direction, and further includes the fluid ejecting means. Is supported so as to be capable of reciprocating in the axial direction of the rotary brush. 2. The substrate cleaning apparatus according to claim 1, wherein the fluid ejecting means has an ejection direction of the cleaning fluid offset with respect to an axis of the rotary brush. 3. The substrate cleaning apparatus according to claim 1, wherein the fluid ejecting unit includes a pin spot type ejecting unit. 4. The auxiliary cleaning means is configured to rotate the rotary brush at a speed higher than a rotational speed during the scrubbing cleaning.
The substrate cleaning apparatus according to.