JP3475964B2 - Ultrasonic cleaner - Google Patents

Ultrasonic cleaner

Info

Publication number
JP3475964B2
JP3475964B2 JP17074993A JP17074993A JP3475964B2 JP 3475964 B2 JP3475964 B2 JP 3475964B2 JP 17074993 A JP17074993 A JP 17074993A JP 17074993 A JP17074993 A JP 17074993A JP 3475964 B2 JP3475964 B2 JP 3475964B2
Authority
JP
Japan
Prior art keywords
metal film
magnet
cleaning
cleaned
fine particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP17074993A
Other languages
Japanese (ja)
Other versions
JPH0730234A (en
Inventor
太 位田
Original Assignee
石川島播磨重工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 石川島播磨重工業株式会社 filed Critical 石川島播磨重工業株式会社
Priority to JP17074993A priority Critical patent/JP3475964B2/en
Publication of JPH0730234A publication Critical patent/JPH0730234A/en
Application granted granted Critical
Publication of JP3475964B2 publication Critical patent/JP3475964B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、超音波洗浄器に関する
もので、詳しくは、基板の表面に形成された絶縁膜と磁
性体の金属成膜との間に、パターンを形成している感光
材料を有する洗浄対象物の前記感光材料を有機溶液と超
音波振動作用とによって除去する超音波洗浄器に関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultrasonic cleaning device, and more particularly, to a photosensitive member having a pattern formed between an insulating film formed on the surface of a substrate and a metal film of a magnetic material. The present invention relates to an ultrasonic cleaning device that removes the photosensitive material, which is an object to be cleaned, having the material by an organic solution and ultrasonic vibration.

【0002】[0002]

【従来の技術】従来から超音波洗浄器で洗浄される洗浄
対象物には、いろいろあるが、その1つに、図5に示す
ようなセンサ用のプリント基板がある。図5において、
aは洗浄対象物で、下から順に、後述する1〜4が積層
されている。すなわち、1はSUSまたはインコネルか
らなる基板、2はポリイミド樹脂からなる厚さ1〜5μ
mの絶縁膜、3はパターンを形成しているレジストなど
からなる厚さ約3μmの感光材料、4はホトリソグラフ
ィ法などの手法によりニッケルなどの磁性体の金属を真
空蒸着やスパッタリング法等によって厚さ約0.2μm
に成膜した金属成膜である。
2. Description of the Related Art Conventionally, there are various objects to be cleaned by an ultrasonic cleaner, and one of them is a printed circuit board for a sensor as shown in FIG. In FIG.
a is an object to be cleaned, and 1 to 4 described later are laminated in order from the bottom. That is, 1 is a substrate made of SUS or Inconel, and 2 is a polyimide resin having a thickness of 1 to 5 μm.
m is an insulating film, 3 is a photosensitive material having a thickness of about 3 μm, which is made of a resist forming a pattern, and 4 is a metal such as nickel, which is formed by vacuum deposition or sputtering, by a method such as photolithography. About 0.2 μm
It is a metal film formed on.

【0003】図6は従来の超音波洗浄器の概略を示した
もので、図示されていない高出力の発振器を組込んでい
て、洗浄槽5の中に前記洗浄対象物aを入れ、該洗浄対
象物aの感光材料3をアセトンなどの有機溶液6で除去
している。
FIG. 6 shows an outline of a conventional ultrasonic cleaning device, which incorporates a high-power oscillator (not shown) into which the cleaning object a is put and is cleaned. The photosensitive material 3 of the object a is removed with an organic solution 6 such as acetone.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、前述し
た従来の超音波洗浄器においては、洗浄によって感光材
料3が溶けるが、洗浄時に金属成膜4の一部が細かい破
片となって飛散し、これが降下して絶縁膜2の表面に接
触し、その表面に傷をつけたり、あるいはつきささっ
て、該絶縁膜2の絶縁性を阻害するという問題点があっ
た。
However, in the above-mentioned conventional ultrasonic cleaning device, the photosensitive material 3 is melted by cleaning, but a part of the metal film 4 is scattered as fine fragments during cleaning, and this is scattered. There is a problem in that the insulating film 2 is lowered and comes into contact with the surface of the insulating film 2 to damage or stick to the surface, thereby impairing the insulating property of the insulating film 2.

【0005】本発明は、上記のような問題点を解決しよ
うとするものである。すなわち、本発明は、洗浄時に飛
散した磁性体金属成膜の細片を吸い寄せることができ
て、絶縁膜を損傷させることのないようにした超音波洗
浄器を提供することを目的とするものである。
The present invention is intended to solve the above problems. That is, an object of the present invention is to provide an ultrasonic cleaning device that can attract the scattered pieces of the magnetic metal film formed during cleaning and does not damage the insulating film. Is.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するため
に、本発明は、基板の表面に下から順に絶縁膜とパター
ンを形成している感光材料と磁性体の金属成膜とが積層
している洗浄対象物の前記感光材料を有機溶液と超音波
振動作用とによって除去する超音波洗浄器において、
記金属成膜が上方を向く様に前記基板を前記有機溶液に
浸けて据付け可能になっており、据付られた基板の前記
磁性体の金属成膜に上方から近づけて設けられて洗浄槽
内の有機溶液に浸っている磁性体細片捕集用の磁石を備
えているものとした。
In order to achieve the above object, the present invention provides an insulating film and a pattern on the surface of a substrate in order from the bottom.
The photosensitive material forming the film and the metallic metal film are laminated.
In ultrasonic cleaner for removing the photosensitive material of the cleaning object is by the organic solution and the ultrasonic vibration effect, before
The substrate is placed in the organic solution so that the metal film faces upward.
It is soaked and installable, and is equipped with a magnet for collecting magnetic material fine particles that is provided close to the metal film of the magnetic material on the installed substrate from above and is immersed in the organic solution in the cleaning tank. I was supposed to.

【0007】[0007]

【作用】本発明によれば、基板の表面に下から順に絶縁
膜とパターンを形成している感光材料と磁性体の金属成
膜とが積層している洗浄対象物の前記感光材料を有機溶
液と超音波振動作用とによって除去する超音波洗浄器に
おいて、前記金属成膜が上方を向く様に前記基板を前記
有機溶液に浸けて据付け可能になっており、据付られた
基板の前記磁性体の金属成膜に上方から近づけて設けら
れて洗浄槽内の有機溶液に浸っている磁性体細片捕集用
の磁石を備えているので、該磁石が洗浄時に細かく飛散
した磁性体の金属成膜の破片を吸い寄せて捕集する。
の際、飛散した磁性体の金属成膜の破片は、基板を離れ
て、基板に接触することなく、上方から近づけて設けら
れた磁石に吸い寄せられ、磁石に捕集される。
According to the present invention, the surface of the substrate is insulated from the bottom in order.
The metallization of the photosensitive material and the magnetic material forming the film and pattern
In an ultrasonic cleaning device for removing the photosensitive material of a cleaning object in which a film is laminated by an organic solution and an ultrasonic vibration action, the substrate is arranged so that the metal film formation faces upward.
It can be installed by immersing it in an organic solution,
Since the magnet for collecting magnetic substance fine particles, which is provided close to the metal film of the magnetic substance on the substrate from above and is immersed in the organic solution in the cleaning tank, is scattered finely during cleaning. The fragments of the metal film of the magnetic substance are attracted and collected. This
At the time of scattering, the fragments of the metal film of the magnetic material that scattered
The board from above without touching the board.
Is attracted to the magnets that are trapped and collected by the magnets.

【0008】したがって、飛散した金属破片が洗浄対象
物に接触することがなく、傷をつけることもない。
Therefore, the scattered metal fragments do not come into contact with the object to be cleaned and are not damaged.

【0009】[0009]

【実施例】図1および図2は本発明の第1実施例を示し
ている。図1および図2において、aは図5に示したも
のと同様な洗浄対象物、5は図6に示したものと同様な
洗浄槽、6は同じようなアセトンなどの有機溶液であ
る。
1 and 2 show a first embodiment of the present invention. 1 and 2, a is a cleaning object similar to that shown in FIG. 5, 5 is a cleaning tank similar to that shown in FIG. 6, and 6 is a similar organic solution such as acetone.

【0010】そして、7は磁性体細片捕集用の磁石で、
永久磁石または電磁石などからなり、有機溶液6に浸っ
ていて、洗浄対象物aのまわりを取り囲んでいる。すな
わち、前記磁石7は、図5に示した洗浄対象物aの磁性
体の金属成膜4から遠ざからないように設置されてい
る。図1および図2に示すように構成された超音波洗浄
器においては、磁性体細片捕集用の磁石7が洗浄槽5の
内部に設置されていて、洗浄対象物aのまわりを取り囲
んでいるので、該磁石7が洗浄時に飛散した金属成膜2
の破片を吸い寄せ、該破片が洗浄対象物aに接触するこ
となく、絶縁膜2の表面に傷をつけたり、ささったりす
ることがなく、したがって、絶縁膜2の絶縁性が阻害さ
れない。
Reference numeral 7 is a magnet for collecting magnetic fine particles,
It is composed of a permanent magnet or an electromagnet, is immersed in the organic solution 6, and surrounds the cleaning object a. That is, the magnet 7 is installed so as not to be away from the metal film 4 of the magnetic material of the cleaning object a shown in FIG. In the ultrasonic cleaning device configured as shown in FIGS. 1 and 2, the magnet 7 for collecting magnetic fine particles is installed inside the cleaning tank 5 and surrounds the cleaning object a. Since the magnet 7 is scattered during the cleaning, the metal film 2
Of the debris, the debris does not come into contact with the cleaning object a, does not scratch or touch the surface of the insulating film 2, and therefore the insulating property of the insulating film 2 is not impaired.

【0011】図3および図4は本発明の第2実施例を示
している。この第2実施例では、磁性体細片捕集用磁石
7は、洗浄対象物aの直上に位置して支持腕8で支持さ
れている。図3および図4に示すように構成された超音
波洗浄器においては、磁性体細片捕集用の磁石7が洗浄
対象物aの直上に位置しているので、該磁石7は、洗浄
時に飛散して上昇してきた金属成膜2の破片を下降させ
ないで捕集する。
3 and 4 show a second embodiment of the present invention. In the second embodiment, the magnetic substance collecting magnet 7 is positioned directly above the cleaning object a and is supported by the supporting arm 8. In the ultrasonic cleaner configured as shown in FIG. 3 and FIG. 4, since the magnet 7 for collecting magnetic fine particles is located directly above the object a to be cleaned, the magnet 7 is The fragments of the metal film 2 that have scattered and risen are collected without being lowered.

【0012】したがって、該破片が洗浄対象物aに接触
することなく、絶縁膜2の表面に傷をつけたり、ささっ
たりすることがない。
Therefore, the debris does not come into contact with the object to be cleaned a and the surface of the insulating film 2 is not scratched or rubbed.

【0013】図示はしていないが、本発明の第3実施例
として、洗浄槽自体が磁性体細片捕集用の磁石を兼ねて
いるものが挙げられる。ただし、洗浄対象物の直下に磁
性体細片捕集用の磁石が存在すると、洗浄時に飛散して
上昇する金属成膜の破片を強制的に下降させて洗浄対象
物の表面に接触させることになって、好ましくないの
で、洗浄槽を磁性体細片捕集用の磁石に兼用する場合
は、洗浄槽の底部を磁性体細片捕集用の磁石として作用
しないように構成する必要がある。
Although not shown, as a third embodiment of the present invention, the cleaning tank itself also serves as a magnet for collecting magnetic fine particles. However, if there is a magnet for collecting magnetic fine particles immediately below the object to be cleaned, the metal film fragments that scatter and rise during cleaning may be forcibly lowered and brought into contact with the surface of the object to be cleaned. Since this is not preferable, when the cleaning tank is also used as the magnet for collecting magnetic fine particles, the bottom of the cleaning tank needs to be configured so as not to act as a magnet for collecting magnetic fine particles.

【0014】[0014]

【発明の効果】以上説明したように、本発明によれば、
基板の表面に形成された絶縁膜と磁性体の金属成膜との
間に、パターンを形成している感光材料を有する洗浄対
象物の前記感光材料を有機溶液と超音波振動作用とによ
って除去する超音波洗浄器において、前記磁性体の金属
成膜に近づけて設けられて洗浄槽内の有機溶液に浸って
いる磁性体細片捕集用の磁石を備えているので、該磁石
が洗浄時に細かく飛散した磁性体の金属成膜の破片を吸
い寄せて捕集する。
As described above, according to the present invention,
The photosensitive material of the cleaning target having the photosensitive material having the pattern formed between the insulating film formed on the surface of the substrate and the metal film formation of the magnetic material is removed by the organic solution and the ultrasonic vibration action. In the ultrasonic cleaner, a magnet for collecting magnetic fine particles, which is provided close to the metal film formation of the magnetic material and is immersed in the organic solution in the cleaning tank, is used. The scattered fragments of the metal film of the magnetic substance are attracted and collected.

【0015】したがって、飛散した金属破片が洗浄対象
物に接触することがなく、傷をつけることもなく、該洗
浄対象物の絶縁膜の絶縁性を阻害することが避けられ
る。
Therefore, the scattered metal fragments do not come into contact with the object to be cleaned and do not damage the object to be cleaned, and it is possible to avoid impairing the insulating property of the insulating film of the object to be cleaned.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1実施例を示した断面正面図であ
る。
FIG. 1 is a sectional front view showing a first embodiment of the present invention.

【図2】図1の平面図である。FIG. 2 is a plan view of FIG.

【図3】本発明の第2実施例を示した断面正面図であ
る。
FIG. 3 is a sectional front view showing a second embodiment of the present invention.

【図4】図3の平面図である。FIG. 4 is a plan view of FIG.

【図5】洗浄対象物の一例を示した拡大断面正面図であ
る。
FIG. 5 is an enlarged sectional front view showing an example of an object to be cleaned.

【図6】従来の超音波洗浄器の概略を示した断面正面図
である。
FIG. 6 is a sectional front view schematically showing a conventional ultrasonic cleaner.

【符号の説明】[Explanation of symbols]

a 洗浄対象物 1 基板 2 絶縁膜 3 感光材料 4 磁性体の金属成膜 5 洗浄槽 6 有機溶液 7 磁性体細片捕集用の磁石 a Cleaning object 1 substrate 2 insulating film 3 Photosensitive material 4 Metallic metal film formation 5 cleaning tank 6 Organic solution 7 Magnets for collecting magnetic particles

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 基板の表面に下から順に絶縁膜とパター
ンを形成している感光材料と磁性体の金属成膜とが積層
している洗浄対象物の前記感光材料を有機溶液と超音波
振動作用とによって除去する超音波洗浄器において、前
記金属成膜が上方を向く様に前記基板を前記有機溶液に
浸けて据付け可能になっており、据付られた基板の前記
磁性体の金属成膜に上方から近づけて設けられて洗浄槽
内の有機溶液に浸っている磁性体細片捕集用の磁石を備
えていることを特徴とする、超音波洗浄器。
1. A photosensitive material having an insulating film and a pattern formed on the surface of a substrate in order from the bottom and a metal film of a magnetic material are laminated on the photosensitive material to be cleaned. In an ultrasonic cleaning device that removes by action, the substrate can be dipped in the organic solution so that the metal film is directed upward, and the metal film can be installed on the magnetic material of the installed substrate. An ultrasonic cleaner comprising a magnet for collecting magnetic fine particles which is provided so as to approach from above and is immersed in an organic solution in a cleaning tank.
【請求項2】 洗浄槽内に設置された磁性体細片捕集用
の磁石が洗浄対象物の直上に位置している請求項1記載
の超音波洗浄器。
2. The ultrasonic cleaning device according to claim 1, wherein the magnet for collecting the magnetic fine particles, which is installed in the cleaning tank, is located immediately above the object to be cleaned.
【請求項3】 洗浄槽の底部を除く部分が磁性体細片捕
集用の磁石になっている請求項1記載の超音波洗浄器。
3. The ultrasonic cleaner according to claim 1, wherein a part of the cleaning tank excluding the bottom part is a magnet for collecting magnetic fine particles.
JP17074993A 1993-07-12 1993-07-12 Ultrasonic cleaner Expired - Fee Related JP3475964B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17074993A JP3475964B2 (en) 1993-07-12 1993-07-12 Ultrasonic cleaner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17074993A JP3475964B2 (en) 1993-07-12 1993-07-12 Ultrasonic cleaner

Publications (2)

Publication Number Publication Date
JPH0730234A JPH0730234A (en) 1995-01-31
JP3475964B2 true JP3475964B2 (en) 2003-12-10

Family

ID=15910680

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17074993A Expired - Fee Related JP3475964B2 (en) 1993-07-12 1993-07-12 Ultrasonic cleaner

Country Status (1)

Country Link
JP (1) JP3475964B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005095862A (en) * 2003-08-27 2005-04-14 Optoquest Co Ltd Washing method and washing system of optical component, and holding tool of optical component
WO2007007865A1 (en) * 2005-07-11 2007-01-18 Showa Denko K.K. Method for attachment of solder powder to electronic circuit board and solder-attached electronic circuit board

Also Published As

Publication number Publication date
JPH0730234A (en) 1995-01-31

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