JP3475761B2 - Organosilicon polymer and method for producing the same - Google Patents

Organosilicon polymer and method for producing the same

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Publication number
JP3475761B2
JP3475761B2 JP36723197A JP36723197A JP3475761B2 JP 3475761 B2 JP3475761 B2 JP 3475761B2 JP 36723197 A JP36723197 A JP 36723197A JP 36723197 A JP36723197 A JP 36723197A JP 3475761 B2 JP3475761 B2 JP 3475761B2
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Japan
Prior art keywords
reaction
temperature
group
polysilane
polymer
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JP36723197A
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Japanese (ja)
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JPH11189652A (en
Inventor
吉隆 濱田
滋 森
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Shin Etsu Chemical Co Ltd
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Shin Etsu Chemical Co Ltd
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Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【発明の属する技術分野】本発明は、ポリシランの優れ
た化学的性質を有する上、各種溶剤への溶解性に優れ、
かつ室温で固体の形状を示し、取り扱いが容易であり、
炭化ケイ素セラミックスの前駆体、フォトレジスト材
料、光重合開始剤、各種導電性材料等として有効に利用
できる新規な有機ケイ素系ポリマー及びその製造方法に
関する。
TECHNICAL FIELD The present invention has excellent chemical properties of polysilane and excellent solubility in various solvents.
And it shows a solid shape at room temperature, easy to handle,
The present invention relates to a novel organosilicon polymer that can be effectively used as a precursor of silicon carbide ceramics, a photoresist material, a photopolymerization initiator, various conductive materials, etc., and a method for producing the same.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】従来、
ポリシランの製造方法としては、ジオルガノジクロロシ
ランの金属ナトリウムによるウルツ反応を利用したもの
が一般的であるが、この方法は金属ナトリウムの使用と
合成時のポットイールドの悪さが問題となっていた。
2. Description of the Related Art Conventionally, the problems to be solved by the invention
As a method for producing polysilane, a method using a Wurtz reaction of diorganodichlorosilane with metallic sodium is generally used, but this method has a problem of using metallic sodium and poor pot yield at the time of synthesis.

【0003】これに対して、ポリシランを脱水素縮合法
を利用して製造する方法は、ポリシランの収率、ポット
イールド共に高いものであるが、生成するポリシランの
分子量があまり大きくならないという欠点を有してい
た。
On the other hand, the method for producing polysilane by using the dehydrogenative condensation method has a high yield of polysilane and a high pot yield, but has a drawback that the molecular weight of the produced polysilane does not become so large. Was.

【0004】この場合、ポリシランの光学的性質等の化
学的特性は、重合度20以上のポリシランであれば分子
量の大小にあまり依存することなく同等であることか
ら、上記脱水素縮合法によるポリシランの製造方法にお
いては、ポリシランの高分子量化のため側鎖水素基を利
用した架橋を行うことによる材料化が検討されている。
In this case, the chemical properties such as optical properties of polysilane are the same as those of polysilane having a degree of polymerization of 20 or more, without being much dependent on the molecular weight. In the production method, materialization by cross-linking using a side chain hydrogen group has been studied for increasing the molecular weight of polysilane.

【0005】従来、脱水素縮合法の検討においては、高
い重合度のポリマーを得ることに注意が向けられ、この
ためにはジルコノセン触媒を利用して100℃以下の低
い温度で長時間反応させることが必要であるということ
が見出されている。このように長時間反応させることで
重量平均分子量10,000程度のポリシランを合成し
得ることが報告されているが、しかしこの程度の分子量
10,000以下のポリマーは、室温下でその形状が水
飴状となり、取り扱いに問題があった。
Conventionally, in the study of the dehydrogenative condensation method, attention has been paid to obtaining a polymer having a high degree of polymerization. For this purpose, a zirconocene catalyst is used to carry out a reaction at a low temperature of 100 ° C. or lower for a long time. Have been found to be necessary. It has been reported that a polysilane having a weight average molecular weight of about 10,000 can be synthesized by such a long-term reaction, but a polymer having a molecular weight of 10,000 or less at such a level has a starch syrup shape at room temperature. And there was a problem in handling.

【0006】本発明は、上記事情に鑑みなされたもの
で、ポリシランとしての優れた化学的性質を有し、かつ
室温下で取扱いの容易な有機ケイ素系ポリマー及びこの
ポリマーを再現性良く高収率で製造することができる上
記有機ケイ素系ポリマーの製造方法を提供することを目
的とする。
The present invention has been made in view of the above circumstances, and has an excellent chemical property as a polysilane and is easy to handle at room temperature, and an organosilicon polymer and a high yield of this polymer with good reproducibility. It is an object of the present invention to provide a method for producing the above organosilicon polymer that can be produced by

【0007】[0007]

【課題を解決するための手段及び発明の実施の形態】本
発明者は、上記目的を達成するため鋭意検討を重ねた結
果、トリヒドロシランを出発原料とし、メタロセン触
媒、特にジルコノセン脱水素縮合触媒の存在下、不活性
気体雰囲気中で無溶媒又は溶媒存在下において20〜8
0℃の低温条件で反応を開始してこの温度範囲で24時
間以上反応を行い、ある程度の重合度を得た後、徐々に
反応温度を上昇させて最終的に120〜180℃の温度
条件で反応を行うことにより、脱水素縮合法により再現
性良く下記一般式(1)で示される新規な有機ケイ素系
ポリマーを得ることができ、このポリマーは重合度がポ
リシランの化学的性質を示すことが可能な20以上であ
り、ポリシランとして高分子量ポリシランと同等の優れ
た化学的性質を有する上、溶解性に優れ、かつ室温(2
0℃)以上のガラス転移点(Tg)を有して室温で固体
の形状を示し、取り扱いも容易であること、そして上記
式(1)の有機ケイ素系ポリマーは、炭化ケイ素セラミ
ックスの前駆体、フォトレジスト材料、光重合開始剤、
導電性材料、光導電性材料、非線形光学材料等として有
効に利用できることを知見し、本発明をなすに至った。
Means for Solving the Problems and Modes for Carrying Out the Invention As a result of intensive studies to achieve the above object, the present inventors have found that trihydrosilane is used as a starting material and metallocene catalysts, particularly zirconocene dehydrogenative condensation catalysts, are used. 20 to 8 in the presence of a solvent or in the presence of a solvent in an inert gas atmosphere.
After starting the reaction under the low temperature condition of 0 ° C. and performing the reaction for 24 hours or more in this temperature range to obtain a certain degree of polymerization, the reaction temperature is gradually raised and finally under the temperature condition of 120 to 180 ° C. By carrying out the reaction, a novel organosilicon polymer represented by the following general formula (1) can be obtained with good reproducibility by the dehydrogenative condensation method, and the polymer has a degree of polymerization showing the chemical properties of polysilane. It is possible to be 20 or more, has excellent chemical properties equivalent to high molecular weight polysilane as polysilane, is excellent in solubility, and has room temperature (2
It has a glass transition point (Tg) of 0 ° C. or higher, exhibits a solid shape at room temperature, and is easy to handle, and the organosilicon-based polymer of the above formula (1) is a precursor of silicon carbide ceramics, Photoresist material, photopolymerization initiator,
The inventors have found that they can be effectively used as a conductive material, a photoconductive material, a non-linear optical material, etc., and completed the present invention.

【0008】 即ち、上述したように、ジルコノセン触
媒を用いた低温、長時間の反応では比較的高分子量のポ
リシランが得られるものの、これは水飴状となるもので
あるが、更に120〜180℃の高温で反応させると低
分子量のポリマーしか生成しないものの、得られたポリ
マーはガラス転移点(Tg)が高く、室温で固体状態を
示すものである。
That is, as described above, a relatively high molecular weight polysilane can be obtained by a reaction using a zirconocene catalyst at a low temperature for a long time, but it has a starch syrup-like form, but at 120 to 180 ° C. Although only a low molecular weight polymer is produced when reacted at a high temperature, the obtained polymer has a high glass transition point (Tg) and exhibits a solid state at room temperature.

【0009】 従って、本発明は、トリヒドロシランを
出発原料とし、メタロセン触媒の存在下に20〜80℃
の温度で反応を行った後、120〜180℃の温度で更
に反応を行って得られる、下記一般式(1)で示され、
20℃以上のガラス転移点を有することを特徴とする有
機ケイ素系ポリマーを提供する。
Therefore, in the present invention, trihydrosilane is used as a starting material in the presence of a metallocene catalyst at 20 to 80 ° C.
After the reaction is performed at the temperature of, the reaction is further performed at the temperature of 120 to 180 ° C., which is represented by the following general formula (1),
Provided is an organosilicon polymer having a glass transition point of 20 ° C. or higher.

【0010】[0010]

【化2】 (式中、Rは炭素数1〜10の置換及び非置換の直鎖状
及び分岐状のアルキル基並びに炭素数6〜14の置換及
び非置換の芳香族炭化水素基から選ばれる基を示す。ま
た、n、mはそれぞれn+m≧20を満足する整数であ
る。)
[Chemical 2] (In the formula, R represents a group selected from a substituted or unsubstituted linear or branched alkyl group having 1 to 10 carbon atoms and a substituted or unsubstituted aromatic hydrocarbon group having 6 to 14 carbon atoms. Further, n and m are integers that satisfy n + m ≧ 20.)

【0011】 また、本発明は、トリヒドロシランを出
発原料とし、メタロセン触媒の存在下に不活性雰囲気中
で20〜80℃の温度で反応を行った後、反応温度を昇
温し、120〜180℃の温度で更に反応を行うことを
特徴とする上記有機ケイ素系ポリマーの製造方法を提供
する。
Further, in the present invention, trihydrosilane is used as a starting material, the reaction is carried out in the presence of a metallocene catalyst in an inert atmosphere at a temperature of 20 to 80 ° C., and then the reaction temperature is raised to 120 to 180. There is provided a method for producing the above organosilicon polymer, which is characterized in that the reaction is further carried out at a temperature of ° C.

【0012】 この場合、上記した本発明の製造方法
は、トリヒドロシランの脱水素縮合反応の選択性が反応
温度により異なることを利用したもので、まず、反応初
期の20〜80℃の低温反応では、ヒドロシランの鎖長
延長反応が選択的に進行し、しかも鎖長延長反応以外の
副反応が抑制されること、更に、この低温反応に続く1
20〜180℃の高温条件の反応では、デグラデーショ
ンを伴いながら3次元架橋反応の割合が徐々に増加し、
3次元架橋反応が比較的ゆっくり進むものと考えられ、
これにより重合度が20以上でポリシランとしての優れ
た化学的性質を有し、溶解性に優れ、かつ室温で固体の
形状を示す取り扱い易い有機ケイ素系ポリマーを再現性
良く製造できるものである。
In this case, the above-mentioned production method of the present invention utilizes the fact that the selectivity of the dehydrogenative condensation reaction of trihydrosilane differs depending on the reaction temperature. First, in the low temperature reaction of 20 to 80 ° C. at the initial stage of the reaction, , The chain extension reaction of hydrosilane selectively proceeds, and side reactions other than the chain extension reaction are suppressed.
In the reaction under the high temperature condition of 20 to 180 ° C., the proportion of the three-dimensional crosslinking reaction gradually increases with deterioration,
It is thought that the three-dimensional crosslinking reaction proceeds relatively slowly,
As a result, an organosilicon polymer having a polymerization degree of 20 or more, excellent chemical properties as a polysilane, excellent solubility, and exhibiting a solid shape at room temperature and easy to handle can be produced with good reproducibility.

【0013】 以下、本発明につき更に詳細に説明する
と、本発明の有機ケイ素系ポリマーは、トリヒドロシラ
ンを出発原料とし、メタロセン触媒の存在下に20〜8
0℃の温度で反応を行った後、120〜180℃の温度
で更に反応を行って得られる、下記一般式(1)で示さ
れるものである。
The present invention will be described in more detail below. The organosilicon-based polymer of the present invention is prepared by using trihydrosilane as a starting material in the presence of a metallocene catalyst for 20 to 8 parts.
It is represented by the following general formula (1), which is obtained by carrying out a reaction at a temperature of 0 ° C. and then a further reaction at a temperature of 120 to 180 ° C.

【0014】[0014]

【化3】 (式中、Rは炭素数1〜10の置換及び非置換の直鎖状
及び分岐状のアルキル基並びに炭素数6〜14の置換及
び非置換の芳香族炭化水素基から選ばれる基を示す。ま
た、n、mはそれぞれn+m≧20を満足する整数であ
る。)
[Chemical 3] (In the formula, R represents a group selected from a substituted or unsubstituted linear or branched alkyl group having 1 to 10 carbon atoms and a substituted or unsubstituted aromatic hydrocarbon group having 6 to 14 carbon atoms. Further, n and m are integers that satisfy n + m ≧ 20.)

【0015】ここで、上記非置換のアルキル基として
は、メチル基、エチル基、n−プロピル基、イソプロピ
ル基、n−ブチル基、イソブチル基、tert−ブチル
基、ペンチル基、ネオペンチル基、ヘキシル基、オクチ
ル基、デシル基などが例示され、非置換の芳香族炭化水
素基としては、フェニル基、ナフチル基、トリル基、ベ
ンジル基、フェニルエチル基などが例示される。また、
置換のアルキル基、芳香族炭化水素基としては、上記非
置換のアルキル基、芳香族炭化水素基の水素原子の一部
又は全部をフッ素等のハロゲン原子、三級アミノ基、カ
ルボキシル基、(メタ)アクリル基、メルカプト基、ポ
リエーテル基、高級脂肪酸エステル基などで置換した基
を挙げることができる。
Here, examples of the unsubstituted alkyl group include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a tert-butyl group, a pentyl group, a neopentyl group and a hexyl group. , An octyl group, a decyl group, and the like, and the unsubstituted aromatic hydrocarbon group includes a phenyl group, a naphthyl group, a tolyl group, a benzyl group, a phenylethyl group, and the like. Also,
As the substituted alkyl group and aromatic hydrocarbon group, a part or all of the hydrogen atoms of the above-mentioned unsubstituted alkyl group and aromatic hydrocarbon group are halogen atoms such as fluorine, tertiary amino group, carboxyl group, ) A group substituted with an acrylic group, a mercapto group, a polyether group, a higher fatty acid ester group or the like can be mentioned.

【0016】n,mはn+m≧20を満足する整数であ
るが、n+mは大きいほど好ましい。上限は特に制限さ
れないが、mの割合が多くかつm+nが大きすぎると一
般の有機溶媒に対して溶解性が悪くなるので好ましくな
い。
N and m are integers satisfying n + m ≧ 20, and the larger n + m is, the more preferable. The upper limit is not particularly limited, but if the ratio of m is large and m + n is too large, the solubility in general organic solvents deteriorates, which is not preferable.

【0017】なお、式(1)のポリマーの重量平均分子
量は、通常2,000以上であり、特に2,500〜
4,000であることが好ましい。
The weight average molecular weight of the polymer of the formula (1) is usually 2,000 or more, particularly 2,500 to
It is preferably 4,000.

【0018】また、上記式(1)の有機ケイ素系ポリマ
ーは、Tgが室温(20℃)以上、好ましくは40〜7
0℃であることが必要であり、Tgが室温より低いと取
扱いが困難になってしまう。
The organosilicon polymer of the above formula (1) has a Tg of room temperature (20 ° C.) or higher, preferably 40 to 7.
It is necessary to be 0 ° C., and if Tg is lower than room temperature, handling becomes difficult.

【0019】 本発明の上記式(1)の有機ケイ素系ポ
リマーは、トリヒドロシランを出発原料とし、メタロセ
ン触媒の存在下に不活性雰囲気中で20〜80℃の温度
で反応を行った後、反応温度を昇温し、120〜180
℃の温度で更に反応を行うものである。
The organosilicon-based polymer of the above formula (1) of the present invention is obtained by reacting trihydrosilane as a starting material in the presence of a metallocene catalyst in an inert atmosphere at a temperature of 20 to 80 ° C. Increase the temperature to 120-180
The reaction is further carried out at a temperature of ° C.

【0020】ここで、トリヒドロシランとしては、RS
iH3(Rは上記と同様の意味を示す)で示されるもの
を使用する。
Here, RS is trihydrosilane.
iH 3 (R has the same meaning as above) is used.

【0021】また、メタロセン触媒としては、通常ジル
コノセン触媒が用いられる。ジルコノセン脱水素縮合触
媒としては、通常使用されているものを用いることがで
き、具体的には系内でジクロロジルコノセンとアルキル
リチウムとを反応させて脱水素縮合触媒を調製し、すぐ
に重合反応を行うことが好ましい。なお、上記触媒の使
用量は、触媒量とすることができるが、例えば100〜
1,000ppmの範囲が好適である。
A zirconocene catalyst is usually used as the metallocene catalyst. As the zirconocene dehydrogenative condensation catalyst, a commonly used one can be used. Specifically, a dihydrozirconocene and an alkyllithium are reacted in the system to prepare a dehydrogenative condensation catalyst, and the polymerization reaction is immediately performed. It is preferable to carry out. The amount of the above catalyst used may be the amount of catalyst, for example, 100 to
The range of 1,000 ppm is preferred.

【0022】不活性気体としては、アルゴン、窒素等が
用いられる。
Argon, nitrogen or the like is used as the inert gas.

【0023】上記脱水素縮合反応は、無溶媒で行うこと
が一般的である。溶媒を使用する場合は、例えばオクタ
ン、デカン等の溶媒をトリヒドロシランと同量程度の使
用量で使用することが望ましい。
The above-mentioned dehydrogenative condensation reaction is generally carried out without a solvent. When a solvent is used, it is desirable to use a solvent such as octane or decane in the same amount as that of trihydrosilane.

【0024】本発明においては、上記トリヒドロシラン
原料及び脱水素縮合触媒を用いて、まず通常室温(20
℃)以上80℃以下、好ましくは50〜70℃の低温条
件で脱水素縮合反応を開始し、この低温条件下で24時
間以上、好ましくは48〜72時間反応を行う。この低
温条件下での反応では、原料のヒドロシランが徐々に水
素を発生しながら重量平均分子量が3,000〜5,0
00でほぼ正規分布に近い分子量分布を持つポリシラン
を得ることができるが、このポリシランは通常室温で水
飴状の外観を示す。
In the present invention, the above-mentioned trihydrosilane raw material and the dehydrogenative condensation catalyst are used first at room temperature (20
C.) to 80.degree. C., preferably 50 to 70.degree. C., the dehydrogenative condensation reaction is started under the low temperature condition, and the reaction is carried out for 24 hours or more, preferably 48 to 72 hours. In the reaction under the low temperature condition, the raw material hydrosilane gradually generates hydrogen and the weight average molecular weight thereof is 3,000 to 5,0.
A polysilane having a molecular weight distribution close to a normal distribution can be obtained with a value of 00, but the polysilane usually has a starch syrup-like appearance at room temperature.

【0025】重量平均分子量が3,000以上になった
ところで反応温度を120℃以上、好ましくは120〜
180℃、より好ましくは120〜150℃に上昇さ
せ、1〜12時間、好ましくは2〜8時間脱水素縮合反
応を行う。反応の最終段階の温度が高すぎるとデグラデ
ーションの進行がきわめて速く、反応時間の精密な調整
が必要となり、面倒であり、120℃未満ではTgの上
昇に寄与する反応の進行が遅く、反応に長時間を要する
ために実用的でない。反応時間は1時間未満では十分な
反応が行われず、12時間を超えるような長時間では実
用的ではないのでやや高めの温度で短時間で行うのが実
用的である。
When the weight average molecular weight becomes 3,000 or more, the reaction temperature is 120 ° C. or more, preferably 120 to
The temperature is raised to 180 ° C., more preferably 120 to 150 ° C., and the dehydrogenative condensation reaction is performed for 1 to 12 hours, preferably 2 to 8 hours. If the temperature of the final stage of the reaction is too high, the progress of the degradation is extremely fast and the reaction time needs to be precisely adjusted, which is troublesome. Not practical because it takes a long time. If the reaction time is less than 1 hour, sufficient reaction is not carried out, and if the reaction time is longer than 12 hours, it is not practical. Therefore, it is practical to carry out the reaction at a slightly elevated temperature in a short time.

【0026】[0026]

【発明の効果】本発明の上記式(1)で示され、ケイ素
鎖長20以上で室温以上のガラス転移点を持つ新規な有
機ケイ素ポリマーは、ポリシランとしての光学的性質な
どが高分子量ポリシランと同等でありながら溶解性に優
れ、かつ室温で固形形状であるために取り扱いが容易で
酸化等の化学劣化を受け難く、架橋反応等による強固な
ポリシラン膜への応用などに利用し易いポリシランであ
り、炭化ケイ素セラミックスの前駆体、フォトレジスト
材料、光重合開始剤、導電性材料、光導電性材料、非線
形光学材料等として有効に利用することができる。ま
た、本発明の有機ケイ素系ポリマーの製造方法によれ
ば、上記式(1)の有機ケイ素系ポリマーを脱水素縮合
法により再現性良く製造することができる。
INDUSTRIAL APPLICABILITY The novel organosilicon polymer represented by the above formula (1) of the present invention, having a silicon chain length of 20 or more and a glass transition point of room temperature or more, is a polysilane having a high molecular weight polysilane. It is a polysilane that is equivalent, but has excellent solubility, and is easy to handle because it is in solid form at room temperature and is not susceptible to chemical deterioration such as oxidation, and is easy to use for applications such as a strong polysilane film due to a crosslinking reaction. , A precursor of silicon carbide ceramics, a photoresist material, a photopolymerization initiator, a conductive material, a photoconductive material, a non-linear optical material, and the like. Further, according to the method for producing an organosilicon polymer of the present invention, the organosilicon polymer of the above formula (1) can be produced with good reproducibility by the dehydrogenative condensation method.

【0027】[0027]

【実施例】以下、実施例を示して本発明を具体的に説明
するが、本発明は下記実施例に制限されるものではな
い。
EXAMPLES The present invention will now be specifically described with reference to examples, but the present invention is not limited to the following examples.

【0028】〔実施例1〕アルゴン雰囲気中、ジクロロ
ジルコノセン30mgと無水エーテル20ml及びメチ
ルリチウム1.6Nエーテル溶液50μlを仕込み、室
温で1時間反応させることにより脱水素縮合触媒を調製
した。次に、減圧にて溶媒を留去し、得られた触媒を乾
固させた後、フェニルシラン50gを仕込み、80℃で
24時間反応させたところ、徐々に水素を発生しながら
重量平均分子量(Mw)約3,300でほぼ正規分布に
近い分子量分布を持つポリシランが得られた。このとき
のTgは16.3℃で、水飴状の外観を示した。その
後、反応温度を130℃に上昇させ、更に3時間脱水素
反応を行ったところ、若干の低分子量化が見られたもの
の(Mw=2,600)、室温でガラス状のポリマー
(Tg32.3℃)がほぼ定量的に得られた。得られた
ポリマーの1H NMR分析結果より推定される構造
は、下記式で示されるものであった。分析結果を表1に
示す。
Example 1 A dehydrogenative condensation catalyst was prepared by charging 30 mg of dichlorozirconocene, 20 ml of anhydrous ether and 50 μl of a methyllithium 1.6N ether solution in an argon atmosphere and reacting at room temperature for 1 hour. Next, the solvent was distilled off under reduced pressure, the obtained catalyst was dried and solidified, 50 g of phenylsilane was charged, and the reaction was carried out at 80 ° C. for 24 hours. Gradually hydrogen was generated, and the weight average molecular weight ( Mw) at about 3,300, polysilane having a molecular weight distribution close to a normal distribution was obtained. At this time, Tg was 16.3 ° C., and a candy-like appearance was exhibited. After that, when the reaction temperature was raised to 130 ° C. and the dehydrogenation reaction was further carried out for 3 hours, although a slight reduction in molecular weight was observed (Mw = 2,600), a glassy polymer (Tg 32.3) was obtained at room temperature. C) was obtained almost quantitatively. The structure estimated from the 1 H NMR analysis result of the obtained polymer was represented by the following formula. The analysis results are shown in Table 1.

【0029】[0029]

【化4】 [Chemical 4]

【0030】なお、上記130℃、3時間の反応後、更
に反応温度を200℃まで上昇させ、5時間反応を行っ
たところ、更に水素ガスの発生を伴う反応が進行し、M
wは910に減少し、一方Tgは78.2℃となり、こ
の結果は脱水素反応を200℃で行った場合と同等の結
果となった。
After the reaction at 130 ° C. for 3 hours, the reaction temperature was further raised to 200 ° C. and the reaction was carried out for 5 hours. As a result, the reaction accompanied by the generation of hydrogen gas proceeded, and M
w was decreased to 910, while Tg was 78.2 ° C., which was the same result as when the dehydrogenation reaction was carried out at 200 ° C.

【0031】従って、以上より反応温度として80℃以
下で24時間以上を行った後、120〜150℃程度に
て数時間反応を行うことが最適であり、80℃以下の反
応条件では鎖長延長以外の副反応が抑制され、またデグ
ラデーション反応は150℃以下の条件ではそれほど速
くないということを利用する方法は、再現性よく所望の
重合度、Tgを有する3次元架橋ポリシランを得ること
ができる。
Therefore, it is optimal to carry out the reaction at a reaction temperature of 80 ° C. or lower for 24 hours or more, and then to carry out the reaction at 120 to 150 ° C. for several hours. Other side reactions are suppressed, and the degradation reaction is not so fast under the condition of 150 ° C. or less, so that a three-dimensional crosslinked polysilane having a desired degree of polymerization and Tg can be obtained with good reproducibility. .

【0032】〔実施例2〜5〕実施例1に準じて80℃
にて鎖長延長反応を行った後、表1に示す温度、時間で
高温反応を行った。その結果いずれの場合も室温以上に
ガラス転移点を有するポリマーが得られた。
[Examples 2 to 5] 80 ° C. according to Example 1
After the chain extension reaction was carried out at, the high temperature reaction was carried out at the temperature and time shown in Table 1. As a result, in each case, a polymer having a glass transition point at room temperature or higher was obtained.

【0033】[0033]

【表1】 [Table 1]

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) C08G 77/00 - 77/62 ─────────────────────────────────────────────────── ─── Continuation of front page (58) Fields surveyed (Int.Cl. 7 , DB name) C08G 77/00-77/62

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 トリヒドロシランを出発原料とし、メタ
ロセン触媒の存在下に20〜80℃の温度で反応を行っ
た後、120〜180℃の温度で更に反応を行って得ら
れる、下記一般式(1)で示され、20℃以上のガラス
転移点を有することを特徴とする有機ケイ素系ポリマ
ー。 【化1】 (式中、Rは炭素数1〜10の置換及び非置換の直鎖状
及び分岐状のアルキル基並びに炭素数6〜14の置換及
び非置換の芳香族炭化水素基から選ばれる基を示す。ま
た、n、mはそれぞれn+m≧20を満足する整数であ
る。)
1. A compound represented by the following general formula (I) obtained by reacting trihydrosilane as a starting material in the presence of a metallocene catalyst at a temperature of 20 to 80 ° C. and then further reacting at a temperature of 120 to 180 ° C. 1) An organic silicon-based polymer having a glass transition point of 20 ° C. or higher. [Chemical 1] (In the formula, R represents a group selected from a substituted or unsubstituted linear or branched alkyl group having 1 to 10 carbon atoms and a substituted or unsubstituted aromatic hydrocarbon group having 6 to 14 carbon atoms. Further, n and m are integers that satisfy n + m ≧ 20.)
【請求項2】 トリヒドロシランを出発原料とし、メタ
ロセン触媒の存在下に不活性雰囲気中で20〜80℃の
温度で反応を行った後、反応温度を昇温し、120〜1
80℃の温度で更に反応を行うことを特徴とする請求項
1記載の有機ケイ素系ポリマーの製造方法。
2. A reaction starting from trihydrosilane as a starting material in the presence of a metallocene catalyst in an inert atmosphere at a temperature of 20 to 80 ° C. and then raising the reaction temperature to 120 to 1
The method for producing an organosilicon polymer according to claim 1, wherein the reaction is further performed at a temperature of 80 ° C.
JP36723197A 1997-12-25 1997-12-25 Organosilicon polymer and method for producing the same Expired - Fee Related JP3475761B2 (en)

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JP5296961B2 (en) * 2005-09-12 2013-09-25 大阪瓦斯株式会社 Copolysilane and resin composition containing this copolysilane
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WO2010005106A1 (en) * 2008-07-11 2010-01-14 独立行政法人科学技術振興機構 Polymer manufacturing method
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