JP3437995B2 - Double side coating device - Google Patents

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus for applying a liquid material to a substantially uniform coating thickness by rotating a thin plate around an axis orthogonal to the plate surface and spraying the liquid material on both surfaces, and particularly to semiconductor manufacturing. The present invention relates to a double-sided coating device suitable for coating a resist solution on a sample.

[0002]

2. Description of the Related Art In order to form a resist film on the surface of a semiconductor sample, a method has been used in which the sample is horizontally rotated and a resist solution is dropped on the surface and spread by centrifugal force. However, according to this conventional method, in order to form a resist film on both surfaces of the sample, it is necessary to work on each surface one by one. Therefore, at the time of the work on the other side, the already-formed one-side coating may be deteriorated as a result of repeating the same work for the heating step and the like. In addition, it is almost impossible to keep the quality of both sides strictly constant because the work is always performed one by one. The reason why the work has conventionally been carried out one by one is that it is necessary to adsorb and hold the sample on the rotating member.

[0003]

SUMMARY OF THE INVENTION The present invention has been made in view of the above points, and its object is to apply a resist solution or the like to both surfaces of a semiconductor sample, or similarly to a thin plate material. When the liquid material is applied to both surfaces, the application material is applied to both surfaces of the thin plates at the same time.

Another object of the present invention is to form a coating film of the same quality on both sides of a thin plate, and to support and rotate it regardless of the shape of the thin plate so that double-sided coating can be performed. To do.

[0005]

In order to solve the above-mentioned problems, the present invention has a recess (12) which can be engaged with the peripheral edge of a thin plate.
And the upper part (14) in the axial direction of the recess is lower than the lower part (15).
By also Rukoto provided in the body (10) to be movable in the radial retention piece which was small (11) from the three center of rotation, the thin plate
Is held at three points, and a movable mechanism 20 that biases all the holding pieces 11 toward the center in order to automatically hold the thin pieces by the holding pieces 11 is incorporated into the main body 10.
It is configured to rotate by rotating 0 and one nozzle 31 for spraying the liquid material on the thin plate is provided at the center of rotation of the main body 10.

[0006]

Each drawing is an illustration of an apparatus relating to an apparatus for rotating a thin plate D around an axis orthogonal to the plate surface, spraying a liquid material on both surfaces, and applying a uniform coating film thickness.

In order to hold the thin plate D in contact with the peripheral edge of the thin plate D having different outer shape and size at three points, three holding pieces 11 are provided on the main body 10 so as to be movable in the radial direction from the center of rotation. Its body 1
0 is a circular flat substrate 10a having a cylindrical shaft portion 32 attached to the rotary shaft 30 as a center, and a circular flat substrate 10a attached so as to overlap the substrate surface on the opposite side of the shaft portion 32. Consisting of a flat outer plate 10b, the outer plate 10b
A nozzle 31, which will be described later, is provided outside the central portion of the.

The shaft portion 32 is connected to a motor M having a rotating shaft 30, and the rotation of the rotating shaft 30 causes the main body 10 to rotate. The rotating shaft 30 is composed of a tubular shaft body,
It is a structure in which a liquid material is ejected axially from the tip through the inside. That is, the tip of the rotary shaft 30 is the nozzle 31 as it is. However, the rotary shaft 30 may be a driven shaft instead of the shaft of the motor M.

The three holding pieces 11 have a thin plate D and a rotary shaft 30.
In order to hold the thin plate D so that it can be rotated by a rotation surface orthogonal to, it has a substantially hourglass-shaped outer shape having concave portions 12 each having a corner shape that can be coupled to the peripheral edge of the thin plate D. The upper and lower portions of the recess 12 in the axial direction are configured such that the upper portion 14 is small and the lower portion 15 is large, and the inclination of the side surface is adjusted so that the thin plate D can be easily set and is hard to fall. Each holding piece 11 is fixed to the tip of a support shaft 16 which is kept parallel to the rotary shaft 30, and each support shaft 16 is attached to a slider 21 of a movable mechanism 20 incorporated in the main body 10.

As the movable mechanism 20, a mechanism for simultaneously moving the three holding pieces 11 in the radial direction by the same size is adopted, and all the holding pieces 11, 11, 11 are urged in the center direction, whereby the thin plates. D is pressed inward by each holding piece 11 and automatically held.

Since the movable mechanism 20 moves the holding piece 11 in accordance with the size of the thin plate D, the outer plate 1 of the main body 10 is moved.
It has three radial long grooves 22 formed in the 0b portion, a start end 23a that coincides with the inner end of each long groove 22 and a terminal end 23b that coincides with the outer end thereof, and is curved so as to intersect with each long groove 22. The rotary plate 24 has a guide groove 23 (which may be inclined only), and an engaging projection 25 attached to the slider 21 so as to engage with the guide groove 23. Rotating plate 24
Can be rotated by operating the lever 26 attached thereto, but since the lever 26 is provided, the operation port 19 is opened on the peripheral side of the main body 10, and the lever operation range is within the long groove 22 of the holding piece 11. It corresponds to the entire movable range of.

Further, the movable mechanism 20 includes all the holding pieces 11,
A coil spring 27 is attached as a means for urging 11, 11 toward the center. The illustrated spring 27 is arranged in an annular space 18 between the rotating plate 24 and the peripheral wall of the recess formed in the main body substrate 10a for accommodating the rotating plate 24, and one end thereof is hooked on the locking means 13 which will be described later. One end of the is hung on the lever 26. Reference numeral 29 is a partition plate, which is a space 22a below the long groove.
A long groove 29a is provided between the substrate 10a and the outer plate 10b in order to prevent the sliding member 21 moving therethrough from falling, and a long groove 29a is formed in the same direction as the long groove 22 for passing the engaging projection 25.

The above-mentioned locking means 13 is for stopping the rotating plate 24, and in the case of the example, it has a locking screw 13a attached to the peripheral edge of the base plate 10a of the main body 10 by screwing so as to project into the annular space 18. The tip 13b is pressed against the peripheral surface 24a of the rotating plate 24. Lock screw 1
3a and the spring hook may be separated. Thus, the nozzle 33 for spraying the liquid material on the other surface of the thin plate D is arranged toward the center of the main body, but this can be retracted to the side to facilitate the attachment / detachment of the thin plate D.

Suitable results can be obtained by applying the above-mentioned double-sided coating device A to a device for forming a resist coating on both sides of a semiconductor sample. An example of the device is shown in FIGS. The device has a cylindrical middle cylinder 4 on the upper surface of the device body 40.
1 in which the device A is arranged with the center part thereof as a sample table 42 with the holding piece 11 facing upward. The upper part of the main body is openably and closably covered, and the rocking is made from the side surface of the cover 43 into the inside. It has a swing arm 44 that can be moved, and the one nozzle 33 is provided at the tip thereof. Reference numeral 45 denotes a rotating shaft that supports the arm 44. The inside of the middle cylinder 41 has a forced evacuation means 46 in order to prevent turbulence of the air flow (including the atomized liquid material) and to consider the solvent.

When the coating work is carried out by this double-sided coating device, the thin plate D opens the three holding pieces 11, 11, 11 (see FIG. 3) and holds them at three points to operate the motor M,
The liquid material is supplied from the nozzles 31 and 33 while rotating with the main body 10. In many semiconductor samples, the thin plate D is circular and has a flat side called an orientation flat in part, but the thin plate D can be held at three points with or without avoiding it.

However, not only such a circular plate or a thin plate D which can easily provide a rotation center, but also a thin plate such as a cracked irregular sample or a deformed sample whose rotation center is difficult to determine can be securely held. There is a feature of the present invention. FIG. 4 shows an example thereof, which holds a semicircular thin plate D. However, in such a shape, if the linear portion S is locked to the two holding pieces 11, 11, it is easily displaced. The linear portion S is more stable when locked to one holding piece 11. If only these points are taken into consideration, it is possible to stably hold all shapes of the thin plate D capable of holding three points, fix the center, and rotate at high speed.

Nozzles 31 are provided on both sides of the thin plate D which is rotating at a high speed.
The liquid material sprayed from 33 spreads from the center of rotation by centrifugal force and has a constant coating thickness suitable for the resist film,
The film thickness corresponds to the rotation speed. Therefore, when it is desired to reduce the film thickness, high speed rotation is performed. At that time, the holding piece 11 may move outward due to centrifugal force. For this, the holding piece 11 is locked by the locking means 13.
Further, the thin plate D having an irregular shape may be accompanied by vibration. In such a case, the fulcrum of the holding piece 11 is changed to adjust the balance.

[0018]

EFFECTS OF THE INVENTION Since the present invention is constructed and operates as described above, it is extremely easy to apply the liquid material to both sides of the thin plate at the same time. However, since it can be rotated, it is possible to effectively utilize a sample or the like that was conventionally discarded as unusable .
The upper part 14 is smaller than the lower part 15, so the lower part
Passing the thin plate D supported by 15 between the upper parts 14.
It is also possible to set the thin plate D easily, and it is difficult to drop the thin plate D, and there is an effect that it is suitable when the resist film is simultaneously formed on both surfaces of the semiconductor sample.

[Brief description of drawings]

FIG. 1 is a plan view showing an embodiment of a double-sided coating device according to the present invention.

FIG. 2 is a sectional view taken along line II-II of FIG.

FIG. 3 is a diagram for explaining the operation of the above apparatus.

FIG. 4A is an explanatory view of the same operation. (B) Similarly, the operation explanatory view.

FIG. 5 is a plan view in which the device is incorporated.

FIG. 6 is a front view of the same.

─────────────────────────────────────────────────── ─── Continuation of the front page (56) Reference JP-A-64-31419 (JP, A) JP-A-58-100425 (JP, A) JP-A-57-194070 (JP, A) JP-A-5- 237435 (JP, A) JP-A-4-320022 (JP, A) JP-A-2-197126 (JP, A) Actual development 4-59155 (JP, U) (58) Fields investigated (Int.Cl. ⁷ , DB name) H01L 21/027 B05C 11/08 G03F 7/16 H01L 21/68

Claims (5)

(57) [Claims] 1. A device for applying a liquid material to a substantially uniform coating thickness by rotating the thin plate around an axis orthogonal to the plate surface and spraying the liquid material on both surfaces, and a recess that can be locked to the peripheral edge of the thin plate. (12) and on the axial direction of the recess
The holding piece (1 ) in which the part (14) is smaller than the lower part (15)
3) 1) can be moved in the radial direction from the center of rotation.
The Rukoto provided 0), and holds the thin plate at three points
Then , in order to automatically hold the thin plate by the holding pieces (11), a movable mechanism (2) that urges all the holding pieces (11) toward the center.
0) is incorporated in the main body (10), and the thin plate is configured to rotate by rotating the main body 10. One nozzle (31) for spraying a liquid material onto the thin plate is provided with the main body (1).
(2) A double-sided coating device provided at the center of rotation. 2. A substrate (1) having a shaft (32) as a center, for attaching the main body (10) to the rotating shaft (30).
0a) and an outer plate (10b) provided with a nozzle (31), wherein the rotary shaft (30) has a tubular shape, the tip of which is the nozzle (31). apparatus. 3. The double-sided coating apparatus according to claim 1, wherein the holding piece (11) has a substantially drum-shaped outer shape having a recess (12) engageable with the peripheral edge of the thin plate. 4. A holding piece (11) by centrifugal force during rotation.
2. The double-sided coating apparatus according to claim 1, further comprising a lock means (13) for locking the holding piece (11) to the main body 10 in order to prevent the moving of the holding piece outward. 5. The movable mechanism (20) has three radial long grooves (22) formed in the main body (10) for moving the holding piece (11) according to the size of the thin plate, and each long groove (2).
A rotating plate (24) having a guide groove (23) having a start end corresponding to the inner end and a end end corresponding to the outer end of 2) and curved so as to intersect the long groove (22), and each guide. It has an engaging projection (25) provided in a portion that moves integrally with the holding piece (11) so as to be engageable with the groove (23), and rotates to urge the holding piece (11) inward in the radial direction. The spring (2
7. The double-sided coating device according to claim 1, further comprising 7).