JP3430561B2 - Method for removing mold release agent remaining on aluminum nitride substrate - Google Patents

Method for removing mold release agent remaining on aluminum nitride substrate

Info

Publication number
JP3430561B2
JP3430561B2 JP16953093A JP16953093A JP3430561B2 JP 3430561 B2 JP3430561 B2 JP 3430561B2 JP 16953093 A JP16953093 A JP 16953093A JP 16953093 A JP16953093 A JP 16953093A JP 3430561 B2 JP3430561 B2 JP 3430561B2
Authority
JP
Japan
Prior art keywords
aluminum nitride
release agent
nitride substrate
substrate
agent remaining
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP16953093A
Other languages
Japanese (ja)
Other versions
JPH0782030A (en
Inventor
幹夫 植木
一成 渡辺
幹夫 佐々木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP16953093A priority Critical patent/JP3430561B2/en
Publication of JPH0782030A publication Critical patent/JPH0782030A/en
Application granted granted Critical
Publication of JP3430561B2 publication Critical patent/JP3430561B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、表面性状に優れた高熱
伝導性窒化アルミニウム基板の製造方法に関するもので
ある。本発明で得られる高熱伝導性窒化アルミニウム基
板は、特に、電子材料分野において、高放熱特性を要求
されるIC及びLSIの絶縁基板、HIC基板等に用い
られる。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a highly heat conductive aluminum nitride substrate having excellent surface properties. The highly heat conductive aluminum nitride substrate obtained by the present invention is used for an IC and LSI insulating substrate, a HIC substrate, and the like, which are required to have high heat dissipation characteristics, particularly in the field of electronic materials.

【0002】[0002]

【従来の技術】近年、半導体技術の進歩に伴い、半導体
用基板材料にも様々な特性が求められるようになった。
その中の一つに、半導体チップの高密度化、高出力化に
伴う基板材料の放熱特性の向上がある。従来の基板材料
としては、アルミナ基板が、その絶縁特性や機械的な強
度、そして価格の点から、最も多く用いられてきた。し
かし、アルミナ基板では、その材料の持つ熱伝導率や熱
膨張率から、放熱特性には限界があった。
2. Description of the Related Art In recent years, with the progress of semiconductor technology, various characteristics have been required for semiconductor substrate materials.
One of them is the improvement of the heat dissipation characteristics of the substrate material accompanying the higher density and higher output of semiconductor chips. As a conventional substrate material, an alumina substrate has been most often used because of its insulating properties, mechanical strength, and price. However, in the alumina substrate, the heat dissipation characteristics are limited due to the thermal conductivity and thermal expansion coefficient of the material.

【0003】これまで、このような高放熱特性を要求さ
れる分野では、ベリリア基板が使用されてきたが、ベリ
リアは毒性を有し、また非常に高価であるという欠点が
あった。このようなことから、アルミナ並みの材料特性
を有し、放熱特性の高い窒化アルミニウム基板が近年、
使用されるようになった。しかしながら、窒化アルミニ
ウムは難焼結性材料であるので、加圧焼成に比べ、製造
コストの安い常圧焼成では、イットリア等の焼結助剤を
添加する(例えば、特公昭63−31434号など)こ
とにより、液相焼結を行わせている。
Up to now, beryllia substrates have been used in the field where such high heat dissipation characteristics are required, but there are drawbacks that beryllia is toxic and very expensive. Due to these facts, aluminum nitride substrates, which have material characteristics similar to those of alumina and have high heat dissipation characteristics, have been developed in recent years.
Came to be used. However, aluminum nitride is a material that is difficult to sinter, so a sintering aid such as yttria is added in normal pressure firing, which has a lower manufacturing cost than pressure firing (for example, Japanese Examined Patent Publication No. 63-31434). As a result, liquid phase sintering is performed.

【0004】窒化アルミニウム基板の製造工程におい
て、焼成工程では製造コストを下げるために、一般的に
は、樹脂と窒化アルミニウム粉末からなる焼成前の窒化
アルミニウム基板(窒化アルミニウムグリーンシートと
いう)の表面に窒化ホウ素粉末等の離型剤(以下、敷粉
ともいう)をスプレー等で塗布し多数枚段重ねにして焼
成する事が行われている(以下これを多段焼成とい
う)。
In the manufacturing process of an aluminum nitride substrate, in order to reduce the manufacturing cost in the firing process, generally, the surface of an unfired aluminum nitride substrate (called an aluminum nitride green sheet) made of resin and aluminum nitride powder is nitrided. It has been practiced to apply a release agent such as boron powder (hereinafter, also referred to as spread powder) by spraying or the like, and fire a multi-layered stack (hereinafter referred to as multi-stage firing).

【0005】しかしながら、この離型剤として用いてい
る窒化ホウ素は、非常に安定なセラミックスであり、こ
れが窒化アルミニウム基板表面に残ると、後の金属メタ
ライズの接着強度を低下させる要因となる。このような
多段焼成の窒化アルミニウム基板の表面には、液相中、
または表面の凹部に離型剤として用いている窒化ホウ素
が残留しており、これを除去する種々の方法がとられて
いる。例えば、砥石研磨、ベルト研磨、湿式・乾式ホー
ニング等が行われている。
However, the boron nitride used as the mold release agent is a very stable ceramic, and if it remains on the surface of the aluminum nitride substrate, it becomes a factor that reduces the adhesive strength of the metal metallization later. On the surface of such a multi-stage fired aluminum nitride substrate, in the liquid phase,
Alternatively, boron nitride used as a release agent remains in the recesses on the surface, and various methods for removing it have been taken. For example, grindstone polishing, belt polishing, wet / dry honing and the like are performed.

【0006】[0006]

【発明が解決しようとする課題】しかしながら、砥石研
磨はコストが高いという問題があり、また、ベルト研
磨、湿式・乾式ホーニング等は、窒化ホウ素の除去を充
分に行うためには、処理時間を長くする、又は装置を大
きくする必要がある等の問題があった。
However, grinding with a grindstone has a problem of high cost, and belt grinding, wet / dry honing, etc. require a long treatment time in order to sufficiently remove boron nitride. However, there is a problem in that the size of the device must be increased.

【0007】[0007]

【課題を解決するための手段】本発明は、前述の課題を
解決すべくなされたものであり、窒化アルミニウム基板
の多段焼成時に用いられる敷粉の除去を、樹脂とダイヤ
モンドを複合させたブラシを用いることにより、残留敷
粉の無い優れた窒化アルミニウム基板を得る敷粉除去方
法を提供するすなわち、窒化アルミニウム基板焼成
後、表面に残留した離型剤を除去する方法であって、ダ
イヤモンド粉を付着したブラシによりブラッシングを行
うことを特徴とする窒化アルミニウム基板に残留した離
型剤の除去方法を提供する。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems, and removes spread powder used in multi-step firing of an aluminum nitride substrate by using a brush made of a composite of resin and diamond. Provided is a method for removing spread powder, which is used to obtain an excellent aluminum nitride substrate without residual spread powder . That is, a method for removing the release agent remaining on the surface after firing the aluminum nitride substrate, which is characterized in that brushing is performed with a brush to which diamond powder is attached, and a method for removing the release agent remaining on the aluminum nitride substrate. that provides.

【0008】ここで、ダイヤモンド粉を毛に付着したブ
ラシとして特に好ましいものは、毛の中に、ダイヤモン
ド粉を一部露出した状態で埋設したものである。例え
ば、毛の材料として、ナイロン等の樹脂を用いた場合
は、毛を成型する際に、材料の中にダイヤモンド粉を練
り込み、一体として成型することにより、作成すること
ができる。こうすると、ダイヤモンド粉が毛から遊離し
にくく、かつ、遊離した場合も、樹脂内部に埋設された
ダイヤモンド粉があらたに露出して、研磨に寄与するよ
うになるので、ダイヤモンドブラシの寿命を実用的な程
度まで伸ばすことができる。
Here, a particularly preferable brush in which diamond powder is attached to the bristles is a brush in which the diamond powder is partially exposed and embedded in the bristles. For example, when a resin such as nylon is used as the material for the hair, it can be produced by kneading diamond powder into the material and molding the hair as a unit when molding the hair. By doing so, the diamond powder is less likely to be released from the hair, and even when it is released, the diamond powder embedded in the resin is exposed to the outside and contributes to polishing, so that the life of the diamond brush is practically used. Can be extended to any extent.

【0009】[0009]

【実施例】まず、原料となる窒化アルミニウム粉末と焼
結助剤である酸化イットリウム及び成形用バインダーを
所定の割合で混合後、ドクターブレード法、プレス法等
により所定の形状に成形する。こうして得られた窒化ア
ルミニウム成形体の表面に多段焼成を行うために、離型
剤(今回は、粒径0.5〜5.0ミクロンの窒化ホウ素
粉末を用いた)を有機溶剤に分散させた懸濁液を用意
し、これをスプレー法により成形体表面に吹き付け窒化
ホウ素粉末層を均一に形成した。
EXAMPLE First, aluminum nitride powder which is a raw material, yttrium oxide which is a sintering aid and a molding binder are mixed at a predetermined ratio and then molded into a predetermined shape by a doctor blade method, a pressing method or the like. In order to perform multi-stage firing on the surface of the aluminum nitride compact thus obtained, a release agent (this time, a boron nitride powder having a particle size of 0.5 to 5.0 microns was used) was dispersed in an organic solvent. A suspension was prepared and sprayed onto the surface of the compact to form a boron nitride powder layer uniformly.

【0010】得られた窒化アルミニウム成形体を30枚
重ねて窒化ホウ素焼結体の上にのせ窒素雰囲気中600
〜700℃で5時間脱バインダーを行い、その後、窒素
雰囲気中、1900℃で10時間焼成した。得られた窒
化アルミニウム焼結体の表面には窒化ホウ素が残留して
おりこれを以下に述べる種々の表面処理装置にて残留し
ている窒化ホウ素の除去を行った。
Thirty sheets of the obtained aluminum nitride compacts were stacked and placed on a boron nitride sintered body, and the mixture was placed in a nitrogen atmosphere at 600.
The binder was removed at ˜700 ° C. for 5 hours and then fired at 1900 ° C. for 10 hours in a nitrogen atmosphere. Boron nitride remained on the surface of the obtained aluminum nitride sintered body, and the remaining boron nitride was removed by various surface treatment apparatuses described below.

【0011】種々の表面処理装置とは、湿式ホーニング
・乾式ホーニング・ダイヤモンドブラシ研磨・ダイヤモ
ンドベルト式研磨である。湿式ホーニングとは、水に研
磨材を分散させた状態で、高圧で基板表面に吹き付け表
面処理する方法、乾式ホーニングとは、研磨材のみをエ
アーを用い高圧で基板表面に吹き付ける方法、ダイヤモ
ンドブラシ研磨とは、ブラシのナイロン等の樹脂内にダ
イヤモンドの微粉を分散させた毛を持つブラシを回転さ
せ基板表面をラビング(研磨)する方法、ダイヤモンド
ベルト式研磨とは、ダイヤモンドの微粉を固着させたベ
ルトを回転させ基板表面を研磨する方法である。
The various surface treatment devices are wet honing, dry honing, diamond brush polishing, and diamond belt polishing. Wet honing is a method in which an abrasive is dispersed in water and is sprayed onto the substrate surface at high pressure to perform surface treatment.Dry honing is a method in which only the abrasive is sprayed onto the substrate surface at high pressure using air, diamond brush polishing. Is a method of rubbing (polishing) the substrate surface by rotating a brush having bristles of fine diamond powder dispersed in resin such as nylon of the brush, and diamond belt polishing is a belt to which fine diamond powder is fixed. Is rotated to polish the substrate surface.

【0012】次に超音波洗浄を行い、乾燥させて得られ
た窒化アルミニウム焼結体上に残留しているホウ素量を
量するため、白金皿上、炭酸塩を融剤として反応ガ
スの発生が止むまで加熱し、放冷後塩酸にて溶解し、I
CPで単位面積当たりのホウ素量を測定した。
[0012] Next subjected to ultrasonic cleaning, dried boron amount remaining in the obtained aluminum nitride sintered body on by <br/> constant amount to order, on a platinum dish, a carbonate fusion As an agent, heat the reaction gas until it stops, let it cool, and dissolve with hydrochloric acid.
The amount of boron per unit area was measured by CP.

【0013】また、上記のようにして得られた窒化アル
ミニウム基板の表面に市販の窒化アルミニウム用銀パラ
ジウムペーストを印刷し、空気中850℃1時間焼
したものについて、単位面積あたりの銀パラジウム層と
窒化アルミニウム基板の界面のフクレ発生量との関係
を、また、銀パラジウムメタライズの上にワイヤーを半
田付けしメタライズ面に対して90度の方向に引っ張り
試験を行い密着強度を調べた。それぞれの結果を表1に
示す。
Further, for those print a commercial aluminum for silver-palladium paste nitride on the surface of the aluminum nitride substrate obtained as described above were form sintered for 1 hour at 850 ° C. in air, per unit area of silver The relationship between the amount of blistering generated at the interface between the palladium layer and the aluminum nitride substrate was examined, and a wire was soldered on the silver-palladium metallized layer, and a tensile test was conducted in the direction of 90 degrees to the metallized surface to examine the adhesion strength. The respective results are shown in Table 1.

【0014】[0014]

【表1】 [Table 1]

【0015】表1の中で、速度とあるのは、ノズルでの
噴射速度である。処理時間の単位は(秒/枚)である。
残Bとあるのは、単位面積あたりの残留ホウ素量であ
り、単位は、μg/cm2 である。密着強度とあるの
は、メタライズ密着強度であり、単位は、kg/mm 2
である。×は接合しなかったことを示す。WAはホワイ
トアランダム、Dはダイヤモンドを示す。
[0015] Among the Table 1, there a rate Ru injection velocity der at the nozzle. Unit of processing time is Ru der (seconds / sheet).
The residual B is the amount of residual boron per unit area, and the unit is μg / cm 2 . The adhesion strength is the metallized adhesion strength, and the unit is kg / mm 2.
Is. X indicates that they were not joined. WA indicates white alundum, and D indicates diamond.

【0016】また、フクレ発生数の表示は、0:なし、
1:2個以下、2:5〜10個、3:10〜50個、4:部分
的に多数、5:全面に多数、を示す。
The display of the number of blisters is 0: none,
1: 2 or less, 2: 5 to 10, 3:10 to 50, 4: partially large, 5: large all over.

【0017】表1に示した様に、焼成時の敷粉の窒化ホ
ウ素の成分である、ホウ素が窒化アルミニウム基板上に
残留しホウ素量が少ない程、銀ペーストでは、フクレ発
生が少なく、密着強度が高くなっている。樹脂とダイヤ
モンドを複合させたブラシを用いたものはその中でも特
に優れている。これは、残留ホウ素量がゼロであるため
と思われる。なお、他の表面研磨では、残留ホウ素をゼ
ロにすることは不可能ではないが、時間が長い等のコス
トアップとなる。
As shown in Table 1, as the amount of boron remaining on the aluminum nitride substrate, which is a component of boron nitride in the spread powder during firing, and the amount of boron is smaller, the silver paste is less likely to cause blistering and the adhesion strength is improved. Is high. The one using a brush in which a resin and diamond are combined is particularly excellent. This is probably because the amount of residual boron is zero. It should be noted that it is not impossible to reduce the residual boron to zero by other surface polishing, but the cost is increased due to a long time.

【0018】[0018]

【発明の効果】以上述べたように、短時間の処理で従来
一般的に行われていた敷粉除去法よりも敷粉除去効果の
高い方法が見出された。
As described above, a method has been found that has a higher effect of removing the spread powder than the conventional method of removing the spread powder, which is generally performed in a short time.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) C04B 35/581 C04B 35/64 B24B 1/00 - 15/00 ─────────────────────────────────────────────────── ─── Continuation of the front page (58) Fields surveyed (Int.Cl. 7 , DB name) C04B 35/581 C04B 35/64 B24B 1/00-15/00

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】窒化アルミニウム基板焼成後、表面に残留
した離型剤を除去する方法であって、ダイヤモンド粉を
付着したブラシによりブラッシングを行うことを特徴と
する窒化アルミニウム基板に残留した離型剤の除去方
法。
1. A method of removing a release agent remaining on a surface of an aluminum nitride substrate after firing, which comprises brushing with a brush to which diamond powder is attached, the release agent remaining on an aluminum nitride substrate. Removal method.
【請求項2】窒化アルミニウム基板焼成後、表面に残留
した離型剤を除去する方法であって、ダイヤモンド粉を
一部露出した状態で毛に埋設したブラシによりブラッシ
ングを行うことを特徴とする窒化アルミニウム基板に残
留した離型剤の除去方法。
2. A method of removing a release agent remaining on a surface after firing an aluminum nitride substrate, wherein brushing is performed by a brush embedded in bristles with a part of diamond powder exposed. A method for removing a release agent remaining on an aluminum substrate.
JP16953093A 1993-06-16 1993-06-16 Method for removing mold release agent remaining on aluminum nitride substrate Expired - Fee Related JP3430561B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16953093A JP3430561B2 (en) 1993-06-16 1993-06-16 Method for removing mold release agent remaining on aluminum nitride substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16953093A JP3430561B2 (en) 1993-06-16 1993-06-16 Method for removing mold release agent remaining on aluminum nitride substrate

Publications (2)

Publication Number Publication Date
JPH0782030A JPH0782030A (en) 1995-03-28
JP3430561B2 true JP3430561B2 (en) 2003-07-28

Family

ID=15888212

Family Applications (1)

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Country Status (1)

Country Link
JP (1) JP3430561B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1825979B1 (en) * 2006-02-28 2012-03-28 Ibiden Co., Ltd. Manufacturing method of honeycomb structured body

Also Published As

Publication number Publication date
JPH0782030A (en) 1995-03-28

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