JP3420024B2 - Laminated coating member including crystal oriented hard film - Google Patents

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a nitride, carbonitride, nitric oxide, carbonic acid of titanium and aluminum having a (200) crystal plane grown on a substrate of a metal, alloy or ceramics sintered body. And one or more hard films of (Ti, Al) compound consisting of oxycarbonitride, carbon nitride, carbonitride, oxynitride, and oxynitride of titanium and aluminum with (111) crystal plane grown And a laminated coating member including a crystallographically oriented hard film obtained by laminating at least one hard film of a (Ti, Al) compound made of carbonitride oxide, and specifically, a metal, alloy or ceramic sintered body. By laminating two kinds of (Ti, Al) compound coatings with different crystal structures on the base material of the above to achieve further peeling resistance, high hardness and high toughness, for example turning tools, milling tools, drills ， Cutting represented by end mill Tool, slitter - cutting blade, such as,
Optimum crystal orientation as a wear-resistant tool such as cutting tools and die tools such as dies and punches, and corrosion-resistant wear-resistant members such as nozzles, tunnel excavation bits, civil engineering tools such as construction tools The present invention relates to a laminated coating member including a hard film.

[0002]

2. Description of the Related Art A ceramic film having a thickness of 20 μm or less is coated on a base material of metal, alloy and ceramics,
A large number of coating members have been proposed in which the respective characteristics of the base material and the coating film are effectively drawn to achieve a long life. The coating method for this coating member is roughly classified into a chemical vapor deposition method (CVD method) and a physical vapor deposition method (PVD method).
Among these, especially the coating film coated by PVD method,
There is an advantage of increasing the wear resistance without deteriorating the strength of the base material. Therefore, in general, the coatings of coated cutting tools represented by drills, end mills, and throw-away inserts for milling, which generally emphasize strength and fracture resistance, are coated by the PVD method.

It has been well known to coat a film of a Ti compound typified by titanium nitride in order to improve wear resistance. However, a metal nitride typified by titanium nitride is apt to be oxidized at a high temperature and has a problem that wear resistance is significantly deteriorated. One proposed from the mid-1980s to improve the problem of oxidation of the titanium nitride coating is a coating member typified by a coating of a (Ti, Al) compound. 62-56565, JP-A-6-210.
There are 502, JP-A-6-210511 and JP-A-7-197235.

On the other hand, it has been proposed to crystallize the coating film on the surface of the base material to enhance the adhesiveness of the coating film, and a typical example thereof is JP-A-56-156767.
Japanese Patent Laid-Open No. 2-159363, Japanese Laid-Open Patent Publication No. 5-2
There are 87322, JP-A-5-287323 and JP-A-5-295517.

[0005]

[Patent Document 1] Japanese Patent Application Laid-Open No. 62-5656 as a prior art relating to a film of a (Ti, Al) compound.
5, JP-A-6-210502, JP-A-6-
In JP-A-210511 and JP-A-7-197235, the surface of a base material is composed of a single layer of two or more kinds of (Ti, Al) carbides, nitrides and carbonitrides. A surface-coated hard member having a hard coating layer and excellent in wear resistance is disclosed.

The conventional (Ti, Al) compound coatings represented by the surface-coated hard members disclosed in these publications have improved oxidation resistance and wear resistance as compared with the Ti compound coatings as originally developed. However, since it is a (Ti, Al) compound film in which the (111) crystal face has grown, the adhesion between the film and the substrate is poor, and the mechanical properties of the film itself are likely to deteriorate. However, there is a problem that cutting performance is deteriorated when applied to a tool, particularly a cutting tool used under severe conditions. That is, the surface-coated hard member described in the publication achieves the improvement of the chemical properties on the surface of the coating as compared with the coating of the Ti compound by containing Al in the coating, while the substrate and the coating are Since no consideration is given to the crystal structure at the interface, the peel resistance and strength of the coating is poor, and the fracture toughness value and fracture resistance of the surface-coated hard member are reduced, especially when used as a tool for high-speed cutting, There is a problem that the life of the coating is shortened due to oxidation of the coating due to high temperature, rapid wear, deterioration due to thermal shock, and welding with the work material.

On the other hand, Japanese Patent Laid-Open No. 56-156767 and Japanese Patent Laid-Open No. Hei 2 (1999) -2 are prior arts relating to a crystal-oriented film.
-159363, JP-A-5-287322, JP-A-5-287323 and 5-2.
Japanese Patent No. 95517 discloses a coated hard member in which a coating of a Ti compound made of titanium nitride, titanium carbide, or titanium carbonitride is crystallized and coated on the surface of a base material.

In the coated hard member disclosed in these publications regarding crystal orientation, although the crystal plane of the coating is oriented, the adhesion between the coating and the base material is improved,
Since the coating is a Ti compound coating that does not contain Al, the mechanical properties of the coating itself are low, especially at high temperatures, and the strength, hardness, wear resistance, heat resistance and oxidation resistance of the coating are still unsatisfactory. There is a problem.

The present invention has solved the above-mentioned problems. Specifically, it has high toughness, high hardness, wear resistance, and oxidation resistance in a wide range from a low temperature region to a high temperature region. Durability, thermal shock resistance, chipping resistance, welding resistance, and peeling resistance, and by stacking two or more hard films with different crystal orientations, a longer life can be achieved. Another object of the present invention is to provide a laminated coating member including a crystallographically oriented hard film.

[0010]

Means for Solving the Problems The present inventors have found that a coated member obtained by coating a film of a (Ti, Al) compound on a base material of a cemented carbide exhibits a relatively excellent effect when used in a low temperature region. On the other hand, when the problem that the effect is reduced when used in a high temperature region was examined, the conventional (Ti, Al) compound coating on the substrate grows the (111) crystal plane. Although the detailed reason is not clear, the (200) crystal plane was grown in contrast to the single layer coating of the (Ti, Al) compound in which the (111) crystal plane was grown. A film of a (Ti, Al) compound, and (11
1) When a film of a (Ti, Al) compound on which a crystal face is grown is laminated, the hardness tends to be high, and the peak intensity of the crystal face obtained by X-ray diffraction is the maximum height at the (200) crystal face. When a laminated coating film containing at least one layer having a peak height of the (111) crystal plane and having a peak intensity of the crystal plane determined by X-ray diffraction is obtained, a peeling resistance and an acid resistance are obtained. The present invention has been completed based on the finding that it has excellent chemical resistance and thermal shock resistance, does not cause reduction in wear resistance from a low temperature to a high temperature region, and that it has a long life by being combined. It came to.

The laminated coating member of the present invention comprises:
A first coating layer and a second coating layer having different crystal orientations are laminated and coated, and both the first coating layer and the second coating layer are nitrides and carbonitrides of titanium and aluminum, A nitric oxide, a carbon oxide, or a mono-layer or a multi-layer of two or more of the carbon monoxide, and the first coating layer and the second coating layer
The total layer thickness is from 0.6 μm to 5 μm, and
The layer thickness of the coating layer is thicker than the layer thickness of the second coating layer.
In the first coating layer, the peak intensity of the crystal plane obtained by X-ray diffraction has the maximum height at the (200) crystal plane,
The second coating layer is characterized in that the peak intensity of the crystal plane obtained by X-ray diffraction has the maximum height in the (111) crystal plane.

[0012]

BEST MODE FOR CARRYING OUT THE INVENTION The base material in the laminated coating member of the present invention is not particularly limited in terms of material, and a material that can withstand the heating temperature when forming the coating layer, such as metal. There is no problem if it is a member, a sintered alloy or a ceramics sintered body. Specifically, for example, stainless steel, heat resistant alloy, high speed steel, die steel, metal alloy represented by Ti alloy, Al alloy, cemented carbide. , Cermet, sintered alloy represented by powder HSS, Al ₂ O ₃ system sintered body, Si
A ceramics sintered body represented by a ₃ N ₄ system sintered body, a sialon system sintered body, and a ZrO ₂ system sintered body can be mentioned. Among these, when used as a cutting tool or a wear resistant tool, a cemented carbide, a nitrogen-containing TiC-based cermet or a ceramics sintered body is preferable.

The composition components of the first coating layer and the second coating layer coated on the base material are, for example, (Ti,
Al) N, (Ti, Al) CN, (Ti, Al) NO,
(Ti, Al) CO and (Ti, Al) CNO can be mentioned. The first coating layer and the second coating layer each include at least one layer having a different crystal structure.
The atomic ratio of Ti element to Al element, which is a metal element contained in the coating layer and the second coating layer, is 48 to 75:52 to 2
When it is 5, the hardness becomes high, peeling resistance, oxidation resistance,
It is preferable because it has excellent thermal shock resistance and has a long life. The first coating layer and the second coating layer are
It may consist of a stoichiometric composition or a non-stoichiometric composition.

Of the first coating layer and the second coating layer,
The maximum intensity peak of the (200) crystal plane of the first coating layer is (20) when X-ray diffraction is performed from the surface of the first coating layer.
It is a film with crystal orientation on the (0) plane. In other words, this first coating layer has the intensity peaks of the (200) crystal face and the (111) crystal face in X-ray diffraction as h (200) and h (111), respectively. , H
The relationship of (200)> h (111) is sufficient, and in order to enhance the effect described later, (2) with respect to the (111) crystal plane
It is preferable that the intensity ratio of (00) crystal planes is in the range of 2 to 100. That is, when the X-ray diffraction is performed from the surface of the first coating layer, the (200) crystal plane and (11)
1) It is preferable that the height of each intensity peak obtained from the crystal plane has a relationship of h (200) / h (111) = 2 to 100.

The second coating layer is a coating in which the (111) crystal plane has a maximum intensity peak when crystallized by X-ray diffraction from the surface of the second coating layer, and the crystal orientation is on the (111) plane. In other words, in this second coating layer, the heights of the intensity peaks due to the (111) crystal face and the (200) crystal face in X-ray diffraction are h (111) and h (200), respectively.
And the strength ratio of the (111) crystal plane to the (200) crystal plane is 1.5 or more in order to enhance the effect described later. Is preferred. That is, the second
(111) when X-ray diffraction is performed from the surface of the coating layer
The height of each intensity peak obtained from the crystal plane and the (200) crystal plane is h (111) / h (200) ≧ 1.5.
It is preferable that the relationship

For the crystal-oriented hard film, which is the total of the first coating layer and the second coating layer, it is necessary to select the film thickness depending on the application or shape.
The film thickness is preferably 0 μm or less, and it is preferable that the layer thickness of the first coating layer is thicker than the layer thickness of the second coating layer. Further, it is preferable that the thickness of the second coating layer of both coating layers is 0.01 to 2.0 μm. Drills that are particularly demanding
In the case of a rotary cutting tool represented by an end mill and a reamer, it is preferable that the film thickness of the crystal-oriented hard film is 0.6 to 5 μm.

The positional relationship between the first coating layer and the second coating layer is as follows: the first coating layer on the substrate side, and the second coating layer adjacent to the first coating layer, Second coating layer on the substrate side,
A second layer structure in which the first film layer is laminated adjacent to the second film layer, a third layer structure in which the first film layer is sandwiched between the second film layers, and a second film layer is A fourth layer structure sandwiched by one coating layer, or
The first coating layer and the second layer in these first to fourth layer configurations
As a representative example, a fifth layer configuration in which another coating layer is laminated in addition to the coating layer can be mentioned. Of these, the first layer structure and the fourth layer structure are preferable because the hardness from the coating surface is high, the wear resistance is excellent, and the life is long.

The fifth layer structure in the positional relationship of these coating layers will be described in more detail. The first coating layer and the second coating layer may differ depending on the material of the substrate because of the problem represented by the coefficient of thermal expansion. There may be almost no effect on the adhesion. In this case, it is also preferable to interpose an underlayer between the substrate and the first coating layer or the second coating layer. It is also preferable to interpose an intermediate layer between the first coating layer and the second coating layer in order to minimize the crystallographic misfit energy at the interface between the two layers. Further, it is also preferable to form the uppermost layer on the surface of the first coating layer or the second coating layer that is farthest from the substrate.

The base layer in the fifth layer structure is a substance having a high affinity with the base material, specifically, Ti, Ti, for example.
Metals or alloys represented by Al, Ti ₃ Al, TiAl ₃ , W, WC, Mo ₂ C, Cr ₂ N, TaN, VB ₂ ,
_{NbB 2, TaB 2, W 2} B 5, MoB 2, CrB 2, Ti
C, ZrC, HfC, TaC, NbC, VC, WC, M
o ₂ C, Cr ₃ C ₂ , TiN, ZrN, HfN, TaN,
CrN, Ti (CN), (Ti, W) C, (Ti, T
Examples include a) a single layer of C, (Ti, Ta) CN, and (Ti, Ta) N, or a multilayer of two or more types. Of these, the underlying layer is preferably a compound containing Ti. The thickness of this underlayer is
The thickness of the first coating layer or the second coating layer coated on the surface of the underlayer may be such that adhesion can be enhanced, and specifically, for example, 0.01 to 2 μm, particularly 0. 1 to
The thickness is preferably 1 μm.

The intermediate layer is specifically made of, for example, Ti.
C, ZrC, HfC, TaC, NbC, VC, WC, M
o ₂ C, Cr ₃ C ₂ , TiN, ZrN, HfN, TaN,
CrN, Ti (CN), (Ti, W) C, (Ti, T
Examples include a) a single layer of C, (Ti, Ta) CN, and (Ti, Ta) N, or a multilayer of two or more types. Among these, it is preferable that the intermediate layer is a compound containing Ti and the crystal plane is oriented. The thickness of the intermediate layer should be such that the crystallographic misfit energy of the first coating layer or the second coating layer coated on the surface of the intermediate layer can be minimized and the adhesion can be improved. It suffices, specifically, for example, 0.01
The thickness is preferably ˜5 μm, more preferably 0.1 to 2 μm.

Further, the uppermost layer is formed for the purpose of enhancing heat resistance and oxidation resistance, coloring of the surface, discrimination before and after use, etc. Specifically, for example, Al ₂ O ₃ , (Al, Si )
ON, (Ti, Al, Si) N, (Ti, Al, Si)
ON, TiC, ZrC, HfC, TaC, NbC, V
C, WC, Mo ₂ C, Cr ₃ C ₂ , TiN, ZrN, Hf
N, TaN, CrN, Ti (CN), (Ti, W) C,
(Ti, Ta) C, (Ti, Ta) CN, (Ti, T
a) The case where it consists of one single layer or two or more multilayers of N can be mentioned. The thickness of the uppermost layer varies depending on the purpose, but specifically, it is preferably, for example, 0.1 to 5 μm.

In producing the laminated coating member of the present invention,
First, the base material is a metal member typified by conventionally commercially available stainless steel, heat resistant alloy, high speed steel, die steel, Ti alloy, Al alloy, cemented carbide, cermet, powdered high speed sintered alloy. , Al2O3 series sintered body, Si3N4 series sintered body, sialon series sintered body, ZrO2 series sintered body as a base material, and preferably JIS standard B405.
P2, which is classified in the selection criteria for use of cemented carbide in 3
0-P40, M20-40 and K10-K20 equivalent cemented carbide material, particularly preferably P30, M20, M3
A base material made of a cemented carbide material equivalent to 0 or K10 may be used. The surface of this base material is polished as necessary with ultrasonic waves,
After performing a cleaning treatment with an organic solvent or the like, the conventional physical vapor deposition method (PVD method) or chemical vapor deposition method (CVD
Method) or a plasma CVD method.

When coating a film on a substrate, PVD method, CVD method, or plasma CVD method is properly used depending on the film quality, including an underlayer, an intermediate layer or an uppermost layer to be coated as necessary. You can also Of these, from the viewpoint of the manufacturing process, it is preferable to perform all coatings by a PVD method represented by an ion plating method or a sputtering method. Among them, a coating treatment is carried out by an ion plating method, particularly an arc ion plating method. It is preferable.

Of the first coating layer and the second coating layer in the laminated coating member of the present invention, particularly the case where the first coating layer is produced by the ion plating method will be described in more detail. Metal titanium as an evaporation source, 2 of metallic aluminum
Types may be used independently, Ti-Al alloy, TiA
An intermetallic compound may be used. The method for ionizing the metal may be arc discharge, glow discharge or high frequency heating. The gas used in the ion plating method may be a gas for generating a nitride, that is, a nitrogen source gas such as ammonia containing nitrogen in addition to the nitrogen gas. It is preferable to introduce this reaction gas into the furnace, ionize the metal, alloy, or intermetallic compound as the evaporation source and apply a negative bias to the base material because the crystal orientation of the film becomes easy. In particular, in order to form a film of a (Ti, Al) compound having a crystallographic orientation by increasing the content of the (200) crystal plane, the bombarding conditions for cleaning the surface of the base material before the film formation and the time of film formation It is important to adjust the partial pressure of nitrogen gas and / or nitrogen source gas and the bias voltage to the substrate.

[0025]

In the laminated coating member of the present invention, the coating film of the (Ti, Al) compound oriented in the (200) crystal plane, which is the first coating layer, enhances the coating hardness, and the first coating layer and the second coating layer. Laminated with acts to improve the fracture toughness value and wear resistance of the entire film, and also to alleviate the residual stress in the vicinity of the interface between the base material and the coating, especially for the base material made of cemented carbide. In this case, the residual compressive stress in the coating film is increased, and the adhesiveness with the substrate is significantly enhanced.

[0026]

[Practical test 1] A commercially available shape SNGA12040
Cemented carbide of No. 8 (JIS standard B4053 equivalent to K10) is used as a base material, and after cleaning the base material surface with an organic solvent, it is installed in the chamber of the arc discharge plasma PVD device (to the flank surface and the rake surface). Installed using a jig that can be coated simultaneously), the initial conditions in the chamber, temperature: 600
C. and pressure: A vacuum of 1 × 10 ⁻⁴ Torr was applied and held for 60 minutes. Then, the pressure was set to a vacuum of 1 × 10 ⁻³ Torr, the arc current was set to 70 A, the substrate bias was set to −600 V, and a bombarding treatment was performed by holding for 10 minutes. After that, the film forming conditions are TiAl containing TiAl intermetallic compound.
Using an evaporation source, pressure: 20 × 10 ⁻³ Torr, arc current: 100 A, other substrate bias, nitrogen flow rate,
The holding time was coated according to the condition (A) shown in Table 1,
A product 1 of the present invention having a three-layered structure including a first coating layer, a second coating layer, and a first coating layer was formed on the surface of the base material in this order. Similarly (B)
A coating treatment was carried out under the conditions, and a product 2 of the present invention having a three-layered structure including a first coating layer, a second coating layer, and a first coating layer on the surface of the base material was produced. Of these, the base material bias voltage under the condition (A) is changed in a stepwise manner, specifically, for example, by a method of changing from −40 V to −100 V at once, and the base material bias voltage under the condition (B) is It was changed gradually and continuously, specifically, by a method of continuously changing from −40 V to −100 V, for example.

For comparison, the pressure under the bombarding condition is a vacuum of 1 × 10 ^-5 Torr, and the substrate bias is -8.
00V, holding time: 4 minutes, except that the film forming condition was changed to the condition (C) in Table 1, the coating treatment was performed in the same manner as the products 1 and 2 of the present invention described above to form a second coating layer on the surface of the substrate. Coated to obtain comparative product 1.

The films of the invention products 1 and 2 and comparative product 1 thus obtained were subjected to X-ray diffraction to examine the composition ratio of the film and the strength ratio of the crystal planes, and the composition was the composition of all (Ti, Al) N. The present invention products 1 and 2 have crystal plane strength ratios (200) / (111) of the first coating layer of 4.1 (present product 1) and 5.7 (present product 2), respectively. And comparison product 1
It was confirmed that the crystal plane strength ratio (111) / (200) of the second coating layer was in the range of 2.5 to 6.7. Further, the atomic ratios of Ti element and Al element present in the coatings of the products 1 and 2 of the present invention and the comparative product 1 were determined by using an X-ray diffractometer and a glow discharge optical emission analyzer, and as a result, the product 1 of the present invention was obtained. Ti:
Al = 56: 44, product 2 of the present invention has Ti: Al = 55: 4
5, It was confirmed that the comparative product was composed of Ti: Al = 60: 40.

Then, using a scanning electron microscope, a Vickers hardness measuring machine, and a film peeling tester corresponding to a scratch abrasion tester, the film thickness and film hardness of the products 1 and 2 of the present invention and the comparative product 1 were measured. , And the peel resistance of the coating,
The scratch strength for determining the critical peeling load until the coating was peeled off was measured, and the average values of the film thickness, the coating hardness, and the scratch strength of the coating are shown in Table 2.

Next, using the products 1 and 2 of the present invention and the comparative product 1, a work material: S48C (HB205 to 223), a cutting speed of 150 m / min, a feed: 0.3 mm / rev, a cut: 1.5 mm, Chip shape: SNGA120408,
A turning test was performed under the cutting conditions of the dry cutting test, and the peeling of the coating, chipping or the average flank wear width was 0.1.
When it reached to mm, it was defined as the life, and the cutting time until the life was obtained was also shown in Table 2.

[0031]

[Table 1]

[0032]

[Table 2]

[0033]

[Practical test 2] Among the conditions of the products 1 and 2 of the present invention in practical test 1, as the film-forming conditions, the base material surface is sequentially coated with the film-forming conditions shown in Tables 3, 4 and 5. Almost the same as Products 1 and 2 of the present invention, except that three layers consisting of a first coating layer (first layer), a second coating layer (second layer) and a first coating layer (third layer) are coated. Then, the present invention products 3 to 18 were obtained.
In addition, as film forming conditions, among the film forming conditions shown in Tables 3, 4, and 5, only the film forming conditions shown in Table 4 were carried out, and the second film was formed on the substrate surface.
Comparative products 2 and 3 were obtained by coating only the coating layer.

In the same manner as in the practical test 1, these products of the present invention 3 were prepared using an X-ray diffractometer and a glow discharge emission spectrometer.
To 18 and comparative products 2 and 3 were investigated for the composition ratio of the film and the strength of the crystal plane, and the film was entirely composed of (Ti, Al) N, and the first film layer had the (200) crystal plane. It was confirmed that the film had the maximum X-ray peak intensity and that the second film layer had the maximum X-ray peak intensity on the (111) crystal plane. Further, as a result of obtaining the atomic ratio of Ti element and Al element present in the coatings of the present invention products 3 to 18 and the comparative products 2 and 3, it was found that Ti: Al = 60 to 62: 4.
It was confirmed that the film was a (Ti, Al) N film having a range of 0 to 38. Then, in the same manner as in the practical test 1, the coating thickness, the coating hardness, the scratch strength of the coating, and the cutting time until the life of the products 3 to 18 of the present invention and the comparative products 2 and 3 were obtained, and their average values were obtained. Is shown in Table 6.

[0035]

[Table 3]

[0036]

[Table 4]

[0037]

[Table 5]

[0038]

[Table 6]

[0039]

[Practical test 3] Almost the same conditions as those of the product 1 of the present invention in practical test 1 except that a mixed gas of ammonia gas and methane gas was used, except that nitrogen gas was introduced during the formation of the second coating layer. The present invention product 19 was obtained. Further, except that a mixed gas of ammonia gas and carbon monoxide was used in place of introducing nitrogen gas at the time of forming the second coating layer, the conditions were substantially the same as those of the product 1 of the present invention in the practical test 1. Invention product 2
I got 0. Furthermore, except that a mixed gas of ammonia gas, methane gas, and carbon monoxide was used, the place where nitrogen gas was introduced at the time of forming the second coating layer was almost the same as the condition of the product 1 of the present invention in the practical test 1. Thus, the present invention product 21 was obtained.

The coating films of the invention products 19 to 21 thus obtained were examined in the same manner as in the practical test 1, and the invention product 1 was obtained.
In the coating of No. 9, the first coating layer has a composition of (Ti, Al) N, and the second coating layer has a composition of (Ti, Al) NC. The composition of Ti, Al) N, the composition of the second coating layer is (Ti, Al) NO, and the coating of the present invention product 34 has the first coating layer of (Ti, A)
It was confirmed that the composition of l) N and the composition of the second coating layer were (Ti, Al) NCO. With respect to the products 19 to 21 of the present invention, the scratch strength of the coating and the cutting time to the end of life were examined in the same manner as in the execution test 1, and as a result, a tendency similar to that of the product 1 of the present invention was exhibited.

[0041]

[Test 4] The substrate bias voltage during film formation, the holding time at the bias voltage and the nitrogen flow rate are shown in Table 7 (D).
The product 22 of the present invention was obtained under the same conditions as those of the product 1 of the implementation test 1, except that the conditions were changed. Further, the invention product 23 was obtained under the same conditions as the invention product 1 of the execution test 1 except that the condition (E) in Table 7 was also used.

When the constitutions of the coating layers of the invention products 22 and 23 were examined in the same manner as the invention product 1 of the practical test 1,
The product 22 of the present invention has the first coating layer and the second coating layer sequentially coated on the surface of the base material, and the product 23 of the present invention has the second coating layer on the surface of the base material.
The coating layer and the first coating layer were sequentially coated. These coating thicknesses were examined separately for the rake face and the flank face, and the average coating layer thickness of each is shown in Table 8.

Next, the hardness, scratch strength, crystal orientation and the ratio of Ti element to Al element of the coatings of the invention products 22 and 23 were determined in the same manner as in the invention product 1 of the practical test 1. The product 22 of the present invention has a hardness (HV): 2950,
Scratch strength (N): 80, Ti / Al (at%):
56/44, crystals of the first coating layer (200) / (11
1): 4.1, crystals of the second coating layer (111) / (20
0): 1.8, and the product 23 of the present invention has a hardness (HV):
2970, scratch strength (N): 80, Ti / Al
(At%): 55/45, crystal of the first coating layer (200)
/(111):5.7, crystals of the second coating layer (111) /
(200): It was 2.0.

[0044]

[Table 7]

[0045]

[Table 8]

[0046]

The laminated coating member of the present invention has a conventional (11
1) Compared with a comparative product coated with a (Ti, Al) N coating oriented on the crystal plane, the coating has excellent peel resistance, and the coating itself has high hardness, high toughness, wear resistance, and acid resistance. Since it has chemical resistance, thermal shock resistance, fracture resistance, and welding resistance,
In this area, there is an effect that the life is extended in the area corresponding to the medium speed cutting area to the high speed cutting area. Therefore, the laminated covering member of the present invention has an excellent effect that a long life can be achieved in a wide area from a low speed cutting area to a high speed cutting area, which is an area of a conventional covering member,
Compared with conventional comparative products, it is expected to have a long life as a cutting tool for milling, a rotary cutting tool such as an end mill and a drill, and a coated member coated with a laminated coating having high toughness and high hardness. In addition, the excellent effect can be exhibited even in the light cutting area to the heavy cutting area.

─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. ⁷ Identification symbol FI // B23B 27/14 B23B 27/14 A (72) Inventor Katsuhiko Seki Solid Square Toshiba, 580 Horikawa-cho, Kawasaki-shi, Kanagawa Tungaloy Stock Association In-house (56) Reference JP-A-9-323205 (JP, A) (58) Fields investigated (Int.Cl. ⁷ , DB name) C23C 14/00-16/56 B23P 15/28 B23B 27 / 14 C22C 29/00 C23C 28/00-28/04

Claims (7)

(57) [Claims] 1. A first substrate having different crystal orientations on a substrate.
A coating layer and a second coating layer are laminated and coated, and both the first coating layer and the second coating layer are nitrides of titanium and aluminum, carbonitrides, oxynitrides, carbonates, and carbons. It consists one single layer or two or more multi-layer in the oxynitride, the first
The total layer thickness of the coating layer and the second coating layer is 0.6 μm to 5 μm.
μm, and the layer thickness of the first coating layer is the second coating.
The first coating layer has a crystal plane peak intensity (200) determined by X-ray diffraction.
A crystalline oriented hard film having a maximum height in a crystal plane and a peak intensity of the crystal plane obtained by X-ray diffraction in the second coating layer has a maximum height in a (111) crystal plane. Laminated coating member including. Wherein said first coating layer, crystal according to claim 1 obtained by X-ray diffraction (111) with respect to the crystal plane (200) intensity ratio of the crystal plane, characterized in that 2 to 100 A laminated coating member including an oriented hard film. 3. The first coating layer is characterized in that the atomic ratio of Ti element to Al element which is a metal element contained in the first coating layer is 48 to 75:52 to 25. Item 3. A laminated coating member comprising the crystallographically oriented hard film according to Item 1 or 2 . 4. The second coating layer according to claim 1, wherein the intensity ratio of the (111) crystal plane to the (200) crystal plane obtained by X-ray diffraction is 1.5 or more . I
A laminated coating member comprising the crystallographically oriented hard film according to item 1 . 5. The second coating layer has a thickness of 0.01 μm.
It is m-2.0 micrometers, It is characterized by the above-mentioned.
A laminated coating film member comprising the crystal-oriented hard film according to any one of items . 6. The second coating layer is characterized in that the atomic ratio of Ti element to Al element, which is a metal element contained in the second coating layer, is 48 to 75:52 to 25. Item 6. A laminated coating film member comprising the crystallographically oriented hard film according to any one of items 1 to 5 . 7. The crystallographic orientation according to claim 1, wherein the second coating layer is coated in a sandwiched state by the first coating layer. Laminated film member including a hard film.