JP3412120B2 - Heating and drying equipment for cleaning equipment - Google Patents
Heating and drying equipment for cleaning equipmentInfo
- Publication number
- JP3412120B2 JP3412120B2 JP01608294A JP1608294A JP3412120B2 JP 3412120 B2 JP3412120 B2 JP 3412120B2 JP 01608294 A JP01608294 A JP 01608294A JP 1608294 A JP1608294 A JP 1608294A JP 3412120 B2 JP3412120 B2 JP 3412120B2
- Authority
- JP
- Japan
- Prior art keywords
- plate
- heating
- heating plate
- lower heating
- drying device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Rollers For Roller Conveyors For Transfer (AREA)
- Drying Of Solid Materials (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は液晶ガラス基板を洗浄対
象物とした洗浄装置に係り、加熱板を用いて加熱乾燥を
行う洗浄装置の加熱乾燥装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning device in which a liquid crystal glass substrate is an object to be cleaned, and more particularly to a heating / drying device of a cleaning device for heating and drying using a heating plate.
【０００２】[0002]
【従来の技術】液晶ガラス基板のウェット洗浄の最終工
程として乾燥プロセスが必要であり、目視レベルでの水
分の除去のみならず分子レベルの水分を除去する乾燥方
法として加熱乾燥が挙げられる。加熱乾燥の原理は、加
熱板からの放射赤外線により基板を加熱し、その熱で分
子レベルの水分を除去するものであり、プロセス時間の
短縮のため、基板の上下両面から加熱する方法がしばし
ばとられる。従来の技術では、図６に示すように、上下
両面加熱の乾燥においてガラス基板７の下面を加熱する
下加熱板１９は、ガラス基板７を搬送するローラ６及び
それに回転力を伝える回転軸５よりも下側に設置されて
いた。前工程から搬送されたガラス基板７は、ローラ６
により搬送され、下加熱板１９と図６には図示されてい
ない上加熱板との間を通過または停止し、上下両面から
加熱される構造になっていた。2. Description of the Related Art A drying process is required as a final step of wet cleaning of a liquid crystal glass substrate, and heat drying can be mentioned as a drying method for removing water at a molecular level as well as water at a visual level. The principle of heat drying is to heat the substrate with infrared radiation from the heating plate and remove moisture at the molecular level by the heat, and in order to shorten the process time, the method of heating from both the upper and lower sides of the substrate is often used. To be In the conventional technique, as shown in FIG. 6, the lower heating plate 19 that heats the lower surface of the glass substrate 7 in the drying by heating both the upper and lower sides includes a roller 6 that conveys the glass substrate 7 and a rotary shaft 5 that transmits a rotational force to the roller 6. Was also installed on the lower side. The glass substrate 7 conveyed from the previous step is the roller 6
It is conveyed by, and is passed or stopped between the lower heating plate 19 and an upper heating plate not shown in FIG. 6, and is heated from both upper and lower surfaces.
【０００３】[0003]
【発明が解決しようとする課題】前記の従来技術では、
ガラス基板と下加熱板の間にローラ及び回転軸を挟んで
いるため、ガラス基板と下加熱板の距離が離れていた。
そのため、下加熱板からの赤外線はガラス基板に到達す
る前に散乱，減衰してしまい、ガラス基板の昇温に長い
時間を要するという問題があった。又、回転軸が下加熱
板の上部にあるため下加熱板からの赤外線により加熱さ
れてしまい回転軸及び軸受の温度が上昇してしまうとい
う装置の安全上の問題があった。In the above prior art,
Since the roller and the rotary shaft are sandwiched between the glass substrate and the lower heating plate, the distance between the glass substrate and the lower heating plate is large.
Therefore, there is a problem in that infrared rays from the lower heating plate are scattered and attenuated before reaching the glass substrate, and it takes a long time to raise the temperature of the glass substrate. Further, since the rotary shaft is located above the lower heating plate, it is heated by infrared rays from the lower heating plate, which raises the temperature of the rotary shaft and the bearing, which is a safety problem of the device.
【０００４】本発明の目的はガラス基板の昇温速度を速
め、尚且つ下加熱板から回転軸への熱伝導を防止した加
熱乾燥装置を与えることにある。It is an object of the present invention to provide a heating / drying device which accelerates the temperature rising rate of the glass substrate and prevents heat conduction from the lower heating plate to the rotary shaft.
【０００５】[0005]
【課題を解決するための手段】上記目的は、下加熱板を
搬送用ローラの回転軸の外周上位置とローラの外周上位
置との間に配置して、ローラ外周上を搬送されるガラス
基板と下加熱板との距離を近づけるとともに、下加熱板
の下側には、この下加熱板からの熱が回転軸に伝達され
るのを防止する反射板を設けることによって達成され
る。また、反射板下に冷却板を設けることによって、ロ
ーラの回転軸への熱の伝達防止機能がさらに向上する。 [Means for Solving the Problems] The above object is to provide a lower heating plate.
The position on the outer circumference of the rotation axis of the transport roller and the outer circumference of the roller
Placed between the table and the glass that is conveyed on the outer circumference of the roller
Make the distance between the substrate and the lower heating plate shorter, and lower the heating plate.
The heat from this lower heating plate is transferred to the rotating shaft on the lower side of
Achieved by providing a reflector to prevent
It Also, by installing a cooling plate under the reflection plate,
The heat transfer prevention function to the rotary shaft of the roller is further improved.
【０００６】[0006]
【作用】ガラス基板と下加熱板が近接しているため下加
熱板からの赤外線は減衰することなくガラス基板に伝達
され、ガラス基板の加熱が効率良く行え、昇温速度が速
まる。又、下加熱板からの赤外線のうちガラス基板とは
反対側へ向かうものは反射板により反射されるため、ロ
ーラの回転軸への赤外線の伝達は防止される。更に冷却
板によりその周辺の雰囲気が冷されるためローラの回転
軸の温度上昇は避けられる。Since the glass substrate and the lower heating plate are close to each other, infrared rays from the lower heating plate are transmitted to the glass substrate without being attenuated, the glass substrate can be efficiently heated, and the temperature rising speed is increased. Further, of the infrared rays from the lower heating plate, those directed toward the side opposite to the glass substrate are reflected by the reflecting plate, so that the infrared rays are prevented from being transmitted to the rotating shaft of the roller. Further, since the atmosphere around the cooling plate is cooled by the cooling plate, the temperature rise of the rotating shaft of the roller can be avoided.
【０００７】[0007]
【実施例】以下、発明の実施例を図を用いて説明する。Embodiments of the present invention will be described below with reference to the drawings.
【０００８】図１は本発明の特徴をもっとも良く表して
いる加熱乾燥装置の斜視図であり、上加熱板，ハウジン
グ及び機構部を除いたものである。図２は洗浄装置の加
熱乾燥装置の搬送方向の側面図であり、上ブタ及びハウ
ジングは断面し、駆動源及び駆動機構は省略してある。
図３はローラ回転軸方向の断面図、図４は冷却プレート
単体の斜視図、図５は加熱乾燥装置を含む洗浄装置の構
成例である。図６は従来技術の加熱乾燥装置の構造の斜
視図、図７は本発明と従来技術によるガラス基板昇温速
度を示すグラフである。FIG. 1 is a perspective view of a heating / drying apparatus which best represents the features of the present invention, and excludes an upper heating plate, a housing and a mechanical portion. FIG. 2 is a side view of the heating / drying device of the cleaning device in the transport direction, in which the upper lid and the housing are cross-sectional, and the drive source and the drive mechanism are omitted.
FIG. 3 is a sectional view in the direction of the roller rotation axis, FIG. 4 is a perspective view of the cooling plate alone, and FIG. 5 is a configuration example of a cleaning device including a heating and drying device. FIG. 6 is a perspective view of the structure of a conventional heating and drying apparatus, and FIG. 7 is a graph showing the glass substrate temperature rising rate according to the present invention and the prior art.
【０００９】これらの図１，図２，図３において、上ブ
タ１はハウジング３の上部に隙間なく乗せられていて、
その内側上部には上加熱板２が下向きに取り付けられて
いる。ハウジング３の側壁にはベアリング４があり回転
軸５を支持する。その回転軸５は、駆動源１３の回転力
によりローラ６を回転させる。下加熱板８は、挿入孔９
よりローラ６の外周上位置がのぞくように、回転軸５の
外周上位置よりも上側に設置される。ガラス基板７はロ
ーラ６により搬送され、上加熱板２，下加熱板８の両方
から加熱される。この構造によりガラス基板７は下加熱
板８に近接した位置で加熱される。In these FIGS. 1, 2 and 3, the upper lid 1 is placed on the upper part of the housing 3 without any gap,
The upper heating plate 2 is attached to the upper part of the inner side of the upper part so as to face downward. A bearing 4 is provided on the side wall of the housing 3 to support the rotating shaft 5. The rotating shaft 5 rotates the roller 6 by the rotating force of the drive source 13. The lower heating plate 8 has an insertion hole 9
The roller 6 is installed above the outer peripheral position of the rotary shaft 5 so that the upper peripheral position of the roller 6 can be seen. The glass substrate 7 is conveyed by the rollers 6 and heated by both the upper heating plate 2 and the lower heating plate 8. With this structure, the glass substrate 7 is heated at a position close to the lower heating plate 8.
【００１０】上加熱板２及び下加熱板８に遠赤外線ヒー
タを用いた場合、下加熱板８をガラス基板７に近づける
ことにより、周囲への遠赤外線の散乱量を減少でき、ガ
ラス基板７にのみ遠赤外線を照射するため、高効率で基
板温度を上昇させることができる。昇温速度は、上下両
加熱板の出力等によって変わってくるが、一例として本
発明の構造による昇温速度と、図６に示す従来技術の構
造すなわちガラス基板７と下加熱板１９の距離の大きい
ものによる昇温速度のグラフを図７に示す。本発明の構
造により加熱したものの方が立上りが速く、効率が良い
ことが示されている。本例において本発明での下加熱板
８からの照射距離は４mm、従来技術での下加熱板１９か
らの照射距離は１００mmである。When far infrared heaters are used for the upper heating plate 2 and the lower heating plate 8, by bringing the lower heating plate 8 closer to the glass substrate 7, the amount of far infrared rays scattered to the surroundings can be reduced, and the glass substrate 7 can be reduced. Since far infrared rays are emitted only, the substrate temperature can be raised with high efficiency. The heating rate depends on the outputs of the upper and lower heating plates, and the like. As an example, the heating rate according to the structure of the present invention and the distance between the glass substrate 7 and the lower heating plate 19 of the prior art shown in FIG. FIG. 7 shows a graph of the temperature rising rate according to the larger one. It has been shown that the structure heated according to the present invention has a faster rise and a higher efficiency when heated. In this example, the irradiation distance from the lower heating plate 8 in the present invention is 4 mm, and the irradiation distance from the lower heating plate 19 in the conventional technique is 100 mm.
【００１１】一方、本発明では回転軸５と下加熱板８も
また接近した構造になり、回転軸５への伝熱が考えられ
る。回転軸５に伝熱した場合、ギヤ１２及び軸受４へも
熱が伝達され、特にギヤ１２がプラスチックの場合その
耐熱性において好ましくない状態となる。又更には駆動
源１３にも熱が伝達され悪影響を及ぼし兼ねないことと
なる。そこで、回転軸５への熱影響を減少させるため
に、下加熱板８下側と回転軸５との間に反射板１０を下
加熱板８とギャップをもたせて設置する。これにより下
加熱板８からの遠赤外線は反射され、回転軸５への伝熱
は防止される。また、このギャップは空気による断熱の
効果を持つ。下加熱板８は数本の小面積の接合ピン１１
により前記ギャップを保ちながら反射板１０へ固定され
ている。これにより下加熱板８から反射板１０への熱伝
達を低減することができる。更に、反射板１０及び回転
軸５を冷却するために、熱伝導の良い材質の冷却プレー
ト１４を反射板１０下に反射板１０と面で接するよう固
定する。On the other hand, in the present invention, the rotary shaft 5 and the lower heating plate 8 are also close to each other, and heat transfer to the rotary shaft 5 can be considered. When the heat is transferred to the rotary shaft 5, the heat is also transferred to the gear 12 and the bearing 4, and particularly when the gear 12 is made of plastic, the heat resistance thereof is not preferable. Further, heat is also transferred to the drive source 13, which may have an adverse effect. Therefore, in order to reduce the influence of heat on the rotating shaft 5, the reflecting plate 10 is installed between the lower side of the lower heating plate 8 and the rotating shaft 5 with a gap with the lower heating plate 8. As a result, far infrared rays from the lower heating plate 8 are reflected and heat transfer to the rotary shaft 5 is prevented. In addition, this gap has the effect of heat insulation by air. The lower heating plate 8 has several small-area joint pins 11
Is fixed to the reflection plate 10 while maintaining the gap. As a result, heat transfer from the lower heating plate 8 to the reflecting plate 10 can be reduced. Further, in order to cool the reflection plate 10 and the rotary shaft 5, a cooling plate 14 made of a material having good heat conduction is fixed under the reflection plate 10 so as to be in surface contact with the reflection plate 10.
【００１２】図４において冷却プレート１４には冷却水
の水路１５が形成されており、この水路１５に水を通す
ことで直接冷却プレート１４は冷却される。また、冷却
プレート１４上部には挿入溝１６が形成されている。こ
の挿入溝１６に図１のごとく回転軸５を非接触で挿入
し、その上面に反射板１０を固定すると、冷却プレート
１４を冷却することで反射板１０と挿入溝１６とで作ら
れる空間も冷され、間接的に回転軸５を冷却する。冷却
プレート１４をハウジング３に固定するのための脚１７
に、熱伝導の良い材質のものを使えばハウジング３全体
をも同時に冷却できる。In FIG. 4, a cooling water channel 15 is formed in the cooling plate 14, and the cooling plate 14 is directly cooled by passing water through this channel 15. Further, an insertion groove 16 is formed on the upper part of the cooling plate 14. When the rotary shaft 5 is inserted into the insertion groove 16 in a non-contact manner as shown in FIG. 1 and the reflection plate 10 is fixed on the upper surface thereof, the space formed by the reflection plate 10 and the insertion groove 16 is also cooled by cooling the cooling plate 14. When cooled, the rotating shaft 5 is indirectly cooled. Legs 17 for fixing the cooling plate 14 to the housing 3.
In addition, the entire housing 3 can be cooled at the same time by using a material having good heat conduction.
【００１３】本発明の加熱乾燥装置を洗浄装置の一部と
して用いる場合は図５のように構成される。純水洗浄の
後、エアナイフ乾燥により目視レベルの水分を除去され
たガラス基板７は加熱乾燥装置へ搬送される。ここでロ
ーラ６の回転を、停止させることや回転スピードを変化
させるなどの制御をすれば任意の時間加熱することがで
きる。分子レベルの水分を除去されたガラス基板７は、
次工程の紫外線照射（ＵＶ処理）へと搬送され、更に冷
却の工程に搬送される。搬送されるガラス基板７の、搬
送方向と垂直方向の幅が広い場合であれば、回転軸５一
本当りのローラ６の数を増やし、それに対応して下加熱
板８の挿入孔９を増やすことでガラス基板をたわむこと
無く搬送できる。When the heating / drying device of the present invention is used as a part of a cleaning device, it is constructed as shown in FIG. After washing with pure water, the glass substrate 7 from which moisture at the visual level has been removed by air knife drying is conveyed to a heating and drying device. Here, if the rotation of the roller 6 is stopped or the rotation speed is changed, the roller 6 can be heated for an arbitrary time. The glass substrate 7 from which water at the molecular level has been removed is
It is transported to the next step of ultraviolet irradiation (UV treatment) and further transported to the cooling step. If the glass substrate 7 to be conveyed has a large width in the direction perpendicular to the conveying direction, the number of rollers 6 per rotating shaft 5 is increased, and the insertion hole 9 of the lower heating plate 8 is increased accordingly. This allows the glass substrate to be transported without bending.
【００１４】[0014]
【発明の効果】以上詳述したように、本発明によればガ
ラス基板の温度を急速に立ち上げることができ、加熱時
間の短縮、又は加熱工程の縮小を図ることができる。As described in detail above, according to the present invention, the temperature of the glass substrate can be raised rapidly, and the heating time or the heating process can be shortened.
【図１】本発明の一実施例である洗浄装置の加熱乾燥装
置の搬送部，下加熱板及び回転軸冷却部の斜視図。FIG. 1 is a perspective view of a transport unit, a lower heating plate, and a rotating shaft cooling unit of a heating / drying device of a cleaning device according to an embodiment of the present invention.
【図２】本発明の一実施例である洗浄装置の加熱乾燥装
置の搬送方向側面図。FIG. 2 is a side view of the heating / drying device of the cleaning device in the carrying direction according to the embodiment of the present invention.
【図３】本発明の一実施例である洗浄装置の加熱乾燥装
置の回転軸方向断面図。FIG. 3 is a sectional view in the rotating shaft direction of the heating / drying device of the cleaning device according to the embodiment of the present invention.
【図４】本発明の一実施例である洗浄装置の加熱乾燥装
置の冷却プレート単体図。FIG. 4 is a schematic view of a cooling plate of a heating / drying device of a cleaning device according to an embodiment of the present invention.
【図５】本発明の一実施例である洗浄装置の加熱乾燥装
置を含んだ全体構成例。FIG. 5 is an example of an entire configuration including a heating / drying device of a cleaning device that is an embodiment of the present invention.
【図６】従来技術の加熱乾燥装置の搬送部及び下加熱板
の斜視図。FIG. 6 is a perspective view of a transport unit and a lower heating plate of the conventional heating and drying apparatus.
【図７】本発明と従来技術でのガラス基板昇温速度のグ
ラフ。FIG. 7 is a graph of glass substrate temperature rising rates according to the present invention and the prior art.
１…上ブタ、２…上加熱板、３…ハウジング、４…ベア
リング、５…回転軸、６…ローラ、７…ガラス基板、８
…下加熱板、９…挿入孔、１０…反射板、１１…接合ピ
ン、１２…ギヤ、１３…駆動源、１４…冷却プレート、
１５…冷却水水路、１６…挿入溝、１７…脚、１８…搬
送方向、１９…下加熱板。DESCRIPTION OF SYMBOLS 1 ... Upper pig, 2 ... Upper heating plate, 3 ... Housing, 4 ... Bearing, 5 ... Rotating shaft, 6 ... Roller, 7 ... Glass substrate, 8
... lower heating plate, 9 ... insertion hole, 10 ... reflection plate, 11 ... joining pin, 12 ... gear, 13 ... drive source, 14 ... cooling plate,
15 ... Cooling water channel, 16 ... Insertion groove, 17 ... Leg, 18 ... Transport direction, 19 ... Lower heating plate.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 滝沢 芳治 茨城県日立市東多賀町一丁目１番１号 株式会社 日立製作所 リビング機器事 業部内 (72)発明者 佐藤 友宏 茨城県日立市東多賀町一丁目１番１号 株式会社 日立製作所 情報映像メディ ア事業部内 (56)参考文献 特開 昭63−204737（ＪＰ，Ａ) 特開 昭58−75154（ＪＰ，Ａ) 実開 昭62−55341（ＪＰ，Ｕ) (58)調査した分野(Int.Cl.7，ＤＢ名) F26B 13/00 - 15/26 B65G 13/00 H01L 21/68 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Yoshiharu Takizawa 1-1-1, Higashitaga-cho, Hitachi-shi, Ibaraki Hitachi Ltd. Living Equipment Business Department (72) Inventor Tomohiro Sato 1-chome, Higashitaga-cho, Hitachi-shi, Ibaraki No. 1 Hitachi Ltd., Information & Video Media Division (56) References JP 63-204737 (JP, A) JP 58-75154 (JP, A) SAI 62-55341 (JP, U) (58) Fields investigated (Int.Cl. 7 , DB name) F26B 13/00-15/26 B65G 13/00 H01L 21/68
Claims (6)
送する搬送部と、前記被乾燥板の下面を加熱する下加熱
板とを備え、前記搬送部は少なくとも二つの搬送用ロー
ラが幅をとって取り付けられている回転軸を、並列に、
かつ同回転軸の長手方向と直交する方向に複数並べて構
成されている洗浄装置の加熱乾燥装置において、 前記下加熱板は回転軸の外周上位置と前記搬送用ローラ
の外周上位置との間に置かれるように配置され、 また前記下加熱板の下側には、前記搬送用ローラの回転
軸に、この下加熱板からの熱が伝達するのを防止する反
射板を設ける構成と したことを特徴とする洗浄装置の加
熱乾燥装置。1. A transport unit for transporting a plate to be dried such as a glass substrate to be placed, and a lower heating plate for heating the lower surface of the plate to be dried, wherein the transport unit has at least two transport rollers. The rotating shafts attached with a width are arranged in parallel,
And in the heating and drying device of the cleaning device configured by arranging a plurality in a direction orthogonal to the longitudinal direction of the rotation shaft, the lower heating plate is located between the position on the outer circumference of the rotation shaft and the position on the outer circumference of the transport roller. It is arranged to be placed , and below the lower heating plate, the rotation of the transport roller is
The anti-heat that prevents the heat from this lower heating plate from being transferred to the shaft.
A heating / drying device for a cleaning device, characterized in that a firing plate is provided .
送する搬送部と、前記被乾燥板の下面を加熱する下加熱
板とを備え、前記搬送部は少なくとも三つの搬送用ロー
ラが幅をとって取り付けられている回転軸を、並列に、
かつ同回転軸の長手方向と直交する方向に複数並べて構
成されている洗浄装置の加熱乾燥装置において、 前記下加熱板は回転軸の外周上位置と前記搬送用ローラ
の外周上位置との間に置かれるように配置され、 また前記下 加熱板の前記各搬送用ローラに対向する部位
には搬送用ローラが挿入される挿入孔が設けられ、 さらに前記下加熱板の下側には、前記搬送ローラの回転
軸に、この下加熱板からの熱が伝達するのを防止する反
射板を設ける構成と したことを特徴とする洗浄装置の加
熱乾燥装置。2. A transport unit for transporting a plate to be dried such as a glass substrate to be placed, and a lower heating plate for heating a lower surface of the plate to be dried, wherein the transport unit has at least three transport rollers. The rotating shafts attached with a width are arranged in parallel,
And in the heating and drying device of the cleaning device configured by arranging a plurality in a direction orthogonal to the longitudinal direction of the rotation shaft, the lower heating plate is located between the position on the outer circumference of the rotation shaft and the position on the outer circumference of the transport roller. is arranged to be placed, also the lower the heating plate at a portion opposed to each of the transfer rollers are al provided with insertion holes in which the conveyor roller is inserted, further below the lower heating plate, the Rotation of transport rollers
The anti-heat that prevents the heat from this lower heating plate from being transferred to the shaft.
A heating / drying device for a cleaning device, characterized in that a firing plate is provided .
送する搬送部と、前記被乾燥板の上下面を加熱する上加
熱板及び下加熱板とを備え、前記搬送部は少なくとも二
つの搬送用ローラが幅をとって取り付けられている回転
軸を、並列に、かつ同回転軸の長手方向と直交する方向
に複数並べて構成されている洗浄装置の加熱乾燥装置に
おいて、 前記下加熱板は回転軸の外周上位置と前記搬送用ローラ
の外周上位置との間に 置かれるように配置され、 また前記下加熱板の下側には、前記搬送用ローラの回転
軸に、この下加熱板からの熱が伝達するのを防止する反
射板を設ける構成と したことを特徴とする洗浄装置の加
熱乾燥装置。3. A carrying section for carrying a plate to be dried such as a glass substrate to be placed, an upper heating plate and a lower heating plate for heating the upper and lower surfaces of the plate to be dried, and the carrying section has at least two. A heating / drying device of a cleaning device, comprising a plurality of rotating shafts each having a width of one conveying roller attached in parallel and arranged in parallel in a direction orthogonal to the longitudinal direction of the rotating shafts, wherein the lower heating plate Is arranged so as to be placed between the position on the outer circumference of the rotating shaft and the position on the outer circumference of the carrying roller, and the rotation of the carrying roller is provided below the lower heating plate.
The anti-heat that prevents the heat from this lower heating plate from being transferred to the shaft.
A heating / drying device for a cleaning device, characterized in that a firing plate is provided .
の洗浄装置の加熱乾燥装置において、前記反射板の下側
に冷却板を配置したことを特徴とする戦場装置の加熱乾
燥装置。4. The heating and drying unit of the cleaning apparatus according to any one of claims 1 to 3, the heating apparatus for drying battlefield apparatus characterized by disposing the cooling plate on the lower side of the reflector.
置において、前記冷却板の上面に前記回転軸が落とし込
まれて入る挿入溝を設けたことを特徴とする洗浄装置の
加熱乾燥装置。5. The heating / drying device of the cleaning device according to claim 4, wherein an insertion groove into which the rotary shaft is dropped is provided on an upper surface of the cooling plate. .
置において、前記反射板を下加熱板との間に間隙ができ
るように配置するとともに下加熱板を同反射板の接合ピ
ンをもって支持したことを特徴とする洗浄装置の加熱乾
燥装置。6. The heating / drying device of the cleaning apparatus according to claim 5 , wherein the reflector is arranged so that a gap is formed between the reflector and the lower heating plate, and the lower heating plate is supported by a joint pin of the same reflector. A heating and drying device for a cleaning device, which is characterized in that
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP01608294A JP3412120B2 (en) | 1994-02-10 | 1994-02-10 | Heating and drying equipment for cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP01608294A JP3412120B2 (en) | 1994-02-10 | 1994-02-10 | Heating and drying equipment for cleaning equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07225080A JPH07225080A (en) | 1995-08-22 |
| JP3412120B2 true JP3412120B2 (en) | 2003-06-03 |
Family
ID=11906633
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP01608294A Expired - Lifetime JP3412120B2 (en) | 1994-02-10 | 1994-02-10 | Heating and drying equipment for cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3412120B2 (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4482188B2 (en) * | 1999-12-24 | 2010-06-16 | 芝浦メカトロニクス株式会社 | Rectangular substrate processing equipment |
| JP2006292327A (en) * | 2005-04-14 | 2006-10-26 | Matsushita Electric Ind Co Ltd | Drier |
| JP5329286B2 (en) * | 2009-04-16 | 2013-10-30 | 神港精機株式会社 | Substrate heating transfer device |
| JP5372695B2 (en) * | 2009-10-19 | 2013-12-18 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
| JP5431863B2 (en) * | 2009-10-19 | 2014-03-05 | 大日本スクリーン製造株式会社 | Substrate processing equipment |
| KR101117019B1 (en) * | 2009-10-19 | 2012-03-19 | 다이니폰 스크린 세이조우 가부시키가이샤 | Substrate processing apparatus and substrate processing method |
| KR101317741B1 (en) * | 2013-05-15 | 2013-10-15 | 주식회사 썬닉스 | Transfer apparatus with net |
| CN104183526A (en) * | 2013-05-28 | 2014-12-03 | 北京中电科电子装备有限公司 | Workpiece conveying device having heating function |
| CN104444050A (en) * | 2014-11-10 | 2015-03-25 | 芜湖真空科技有限公司 | Conveying unit and transmission |
-
1994
- 1994-02-10 JP JP01608294A patent/JP3412120B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07225080A (en) | 1995-08-22 |
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